JPH0727091B2 - Optical element manufacturing method - Google Patents
Optical element manufacturing methodInfo
- Publication number
- JPH0727091B2 JPH0727091B2 JP61306958A JP30695886A JPH0727091B2 JP H0727091 B2 JPH0727091 B2 JP H0727091B2 JP 61306958 A JP61306958 A JP 61306958A JP 30695886 A JP30695886 A JP 30695886A JP H0727091 B2 JPH0727091 B2 JP H0727091B2
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- substrate
- refractive index
- high refractive
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 13
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 229940005657 pyrophosphoric acid Drugs 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 4
- 238000000137 annealing Methods 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
- G02B6/1245—Geodesic lenses
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明はコヒーレント光を使用する光情報処理分野ある
いは光通信、光応用計測制御分野に使用されるジオデシ
ックレンズなどの光素子の製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical element such as a geodesic lens used in the field of optical information processing using coherent light, the field of optical communication, or the field of measurement and control of optical application. .
従来の技術 従来、LiNbO3にジオデシックレンズを作製する方法とし
てNC旋盤による加工法がある。第３図に従来のジオデシ
ックレンズの製造方法の工程図を示す。第２図ａで１は
LiNbO3基板である。このLiNbO3基板10にNC旋盤により半
径100μｍ、最深さ10μｍの円形の加工を行ない凹部11
を形成する。次に第２図ｂでTi拡散を行い光導波層を形
成する。Ti拡散は300Å程度のTiを1000℃、６時間行い
厚み３〜５μｍの光導波層12を形成する。13の部分がジ
オデシックレンズ部分である。第３図にジオデシックレ
ンズの斜視図を示す。14はHe−Neレーザ光で波長は0.63
3μｍであり端面より光導波層12に導いた。このHe−Ne
レーザ光14はジオデシックレンズ13により集光される。Conventional Technology Conventionally, as a method for producing a geodesic lens on LiNbO 3 , there is a processing method using an NC lathe. FIG. 3 shows a process diagram of a conventional method for manufacturing a geodesic lens. 1 in Figure 2a
It is a LiNbO 3 substrate. This LiNbO 3 substrate 10 was machined into a circular shape with a radius of 100 μm and a maximum depth of 10 μm by an NC lathe, and the recess 11 was formed.
To form. Next, in FIG. 2B, Ti diffusion is performed to form an optical waveguide layer. The Ti diffusion is performed by applying Ti of about 300Å at 1000 ° C. for 6 hours to form the optical waveguide layer 12 having a thickness of 3 to 5 μm. 13 is the geodesic lens part. FIG. 3 shows a perspective view of the geodesic lens. 14 is a He-Ne laser beam with a wavelength of 0.63
It was 3 μm, and was guided to the optical waveguide layer 12 from the end face. This He-Ne
The laser light 14 is condensed by the geodesic lens 13.
発明が解決しようとする問題点 上記のような従来の製造方法ではジオデシックレンズ一
つ一つを旋盤により加工を行うため量産性の点で非常に
問題となっていた。Problems to be Solved by the Invention In the conventional manufacturing method as described above, since each geodesic lens is processed by a lathe, mass production is a serious problem.
問題点を解決するための手段 本発明は上記問題点を解決するためLiNbxTa(1-x)O3（０
≦ｘ≦１）基板の表面の一部分に、燐酸またはピロ燐酸
を主成分とする酸を塗布する工程と、前記基板を熱処理
し、前記燐酸またはピロ燐酸の直下の基板中に高屈折率
部を形成する工程と、前記高屈折率部をアニールして、
前記高屈折率部を拡大させる工程と、前記拡大した高屈
折率部を除去する工程とを有する。Means for Solving the Problems In order to solve the above problems, the present invention provides LiNbxTa (1- x ) O 3 (0
≦ x ≦ 1) A step of applying an acid containing phosphoric acid or pyrophosphoric acid as a main component to a part of the surface of the substrate, heat treating the substrate, and forming a high refractive index portion in the substrate immediately below the phosphoric acid or pyrophosphoric acid. A step of forming and annealing the high refractive index portion,
There is a step of enlarging the high refractive index portion and a step of removing the enlarged high refractive index portion.
作用 本発明は上記手段により通常の半導体製造装置を用いて
簡単に光素子が製造でき大幅に量産性が向上する。The present invention can easily manufacture an optical element by using the above-mentioned means by using an ordinary semiconductor manufacturing apparatus, and greatly improve mass productivity.
実施例 本発明の光素子の製造方法の第１の実施例を第１図に示
す。この第１の実施例では光素子としてジオデシックレ
ンズの製造方法について詳細に説明する。第１図ａで１
はLiNbO3基板で方位としては＋Ｚ面を用いた。また２は
LiNbO3基板１〔LiNbxTa1-xO3,0≦Ｘ≦１〕上に塗布され
たピロ燐酸（H4P2O7）である。このピロ燐酸は融点が室
温以下であるため簡単に塗布でき、また0.1mg点滴され
たもので表面張力により丸くなっている。３は230℃、
１時間の熱処理によりプロトン交換が生じ、LiNbO3基板
１に形成された深さ１μｍの高屈折率層である。次に第
１図ｂで３′は260℃、３時間のアニール処理により広
げられた深さ５μｍの高屈折率層である。次に第１図ｃ
でHF、30℃中で５時間エッチングを行い高屈折率層３′
を除去し凹部４を形成する。最後に再びピロ燐酸中での
熱処理（230℃,12分）を行い厚み0.5μｍの光導波層５
を形成する。これにより凹部４はジオデシックレンズ６
となる。製造されたジオデシックレンズ６によりHe−Ne
レーザ光を３μｍに集光できた。EXAMPLE FIG. 1 shows a first example of the method for manufacturing an optical element of the present invention. In the first embodiment, a method of manufacturing a geodesic lens as an optical element will be described in detail. 1 in Figure 1a
Is a LiNbO 3 substrate and the + Z plane is used as the orientation. Also 2
It is pyrophosphoric acid (H 4 P 2 O 7 ) coated on a LiNbO 3 substrate 1 [LiNbxTa 1- xO 3 , 0 ≦ X ≦ 1]. This pyrophosphoric acid has a melting point below room temperature, so it can be easily applied, and 0.1 mg of it is drip-shaped, which makes it round due to surface tension. 3 is 230 ℃,
It is a high-refractive-index layer having a depth of 1 μm formed on the LiNbO 3 substrate 1 due to the occurrence of proton exchange by heat treatment for 1 hour. Next, in FIG. 1b, 3'denotes a high-refractive index layer having a depth of 5 .mu.m expanded by annealing at 260.degree. C. for 3 hours. Next, FIG. 1c
High refractive index layer 3'by etching in HF at 30 ° C for 5 hours
Are removed to form the concave portion 4. Finally, heat treatment (230 ° C, 12 minutes) in pyrophosphoric acid was performed again to form an optical waveguide layer 5 with a thickness of 0.5 μm.
To form. As a result, the concave portion 4 becomes the geodesic lens 6
Becomes He-Ne by the manufactured geodesic lens 6
The laser light could be condensed to 3 μm.
なお、本実施例では＋Ｚ板のLiNbO3を用いたが−Ｚ板で
もプロトン交換時の化学損傷がなく使用できる。In this example, the + Z plate LiNbO 3 was used, but the −Z plate can also be used without chemical damage during proton exchange.
また、本実施例ではピロ燐酸を用いたが、他の融点が90
℃以下であるステアリン酸等を用いた場合でも暖めなが
ら簡単に塗布できるため使用が可能である。Although pyrophosphoric acid was used in this example, other melting points are 90%.
Even when stearic acid or the like having a temperature of ℃ or less is used, it can be applied because it can be easily applied while warming.
発明の効果 本発明の光素子の製造方法によれば通常の半導体装置を
用い簡単にジオデシックレンズなどの光素子が製造で
き、量産性が飛躍的に向上する。EFFECTS OF THE INVENTION According to the method for manufacturing an optical element of the present invention, an optical element such as a geodesic lens can be easily manufactured using an ordinary semiconductor device, and mass productivity is dramatically improved.
第１図は本発明の光素子の製造方法の工程図、第２図は
従来の光素子の製造方法の工程図、第３図は従来の光素
子の斜視図である。 １……LiNbO3基板、２……ピロ燐酸、３……高屈折率
層、６……ジオデシックレンズ。FIG. 1 is a process diagram of a method for manufacturing an optical device of the present invention, FIG. 2 is a process diagram of a method for manufacturing a conventional optical device, and FIG. 3 is a perspective view of a conventional optical device. 1 ... LiNbO 3 substrate, 2 ... Pyrophosphoric acid, 3 ... High refractive index layer, 6 ... Geodesic lens.
Claims (2)
の一部分に、燐酸またはピロ燐酸を主成分とする酸を塗
布する工程と、 前記基板を熱処理し、前記燐酸またはピロ燐酸の直下の
基板中に高屈折率部を形成する工程と、 前記高屈折率部をアニールして、前記高屈折率部を拡大
させる工程と、 前記拡大した高屈折率部を除去する工程と、 を有する光素子の製造方法。1. A step of applying an acid containing phosphoric acid or pyrophosphoric acid as a main component to a part of the surface of a LiNbxTa (1- x ) O 3 (0 ≦ x ≦ 1) substrate, heat treating the substrate, Forming a high refractive index portion in the substrate directly under phosphoric acid or pyrophosphoric acid; annealing the high refractive index portion to expand the high refractive index portion; and removing the enlarged high refractive index portion And a method of manufacturing an optical element, comprising:
ｚ板または−ｚ板である特許請求の範囲１項記載の光素
子の製造方法。2. A LiNbxTa (1- x ) O 3 (0 ≦ x ≦ 1) substrate is +
The method for manufacturing an optical element according to claim 1, wherein the optical element is a z-plate or a -z-plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61306958A JPH0727091B2 (en) | 1986-12-23 | 1986-12-23 | Optical element manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61306958A JPH0727091B2 (en) | 1986-12-23 | 1986-12-23 | Optical element manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63158507A JPS63158507A (en) | 1988-07-01 |
| JPH0727091B2 true JPH0727091B2 (en) | 1995-03-29 |
Family
ID=17963318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61306958A Expired - Lifetime JPH0727091B2 (en) | 1986-12-23 | 1986-12-23 | Optical element manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0727091B2 (en) |
-
1986
- 1986-12-23 JP JP61306958A patent/JPH0727091B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63158507A (en) | 1988-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2093628C (en) | Self-aligned v-grooves and waveguides | |
| JPH0727091B2 (en) | Optical element manufacturing method | |
| JPS6146408B2 (en) | ||
| JPS6079308A (en) | Production of plane lens | |
| US5000774A (en) | Method of masked two stage lithium niobate proton exchange | |
| JPS58117510A (en) | Optical waveguide and its manufacture | |
| JPH0462644B2 (en) | ||
| JPS6053904A (en) | Ridge type light guide | |
| JPH0715528B2 (en) | Method for producing tapered optical waveguide | |
| JPH0197907A (en) | Production of optical waveguide circuit | |
| JPH0573705B2 (en) | ||
| JPS63149607A (en) | Production of light guide | |
| JP2612606B2 (en) | Method for producing photosensitive glass patterned article | |
| JPH03153202A (en) | Integrated optical chip and its manufacture | |
| JPH03284703A (en) | Optical glass member for generating prescribed phase difference and production thereof | |
| JPH0731287B2 (en) | Method of forming optical element | |
| JPS63158506A (en) | Production of optical element | |
| JP2000081527A (en) | Production of proton-exchanged waveguide | |
| JPH0731289B2 (en) | Method for producing tapered optical waveguide | |
| JPS616154A (en) | Manufacturing method of micro optical element | |
| JPS6263904A (en) | Method of manufacturing optical waveguide | |
| JPS62247306A (en) | Optical waveguide device | |
| EP0241162A2 (en) | Optical waveguide lenses | |
| JPS58211106A (en) | Formation of waveguide | |
| JPS60257407A (en) | Production of quartz plane optical waveguide |