JPH0728012B2 - Semiconductor memory - Google Patents
Semiconductor memoryInfo
- Publication number
- JPH0728012B2 JPH0728012B2 JP63326765A JP32676588A JPH0728012B2 JP H0728012 B2 JPH0728012 B2 JP H0728012B2 JP 63326765 A JP63326765 A JP 63326765A JP 32676588 A JP32676588 A JP 32676588A JP H0728012 B2 JPH0728012 B2 JP H0728012B2
- Authority
- JP
- Japan
- Prior art keywords
- memory cell
- cell group
- redundant
- semiconductor memory
- regular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims description 10
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- For Increasing The Reliability Of Semiconductor Memories (AREA)
- Dram (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体メモリに関し、特に正規メモリセル群を
形状的に均一にし、かつチップサイズを小さくするとい
う半導体メモリに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory, and more particularly to a semiconductor memory in which regular memory cell groups are made uniform in shape and the chip size is reduced.
最近半導体メモリはますます大容量化し、それに伴い、
内部パターンはますます微細化している。この様な微細
化が進むと、規則的に並んでいるメモリセル群の端部と
内部では露光やエッチングレートが異なりメモリセルの
端部と内部で形状的に均一なメモリセルを構成すること
が困難となっている。それによってメモリセルの端部と
内部でアクセス差等の弊害が出しまう。そこで第3図に
示す様に正規のメモリセル群の外側に実際のメモリセル
としては機能しない擬似のメモリセルを配置するなど工
夫がなされている。この擬似のメモリセル群を挿入する
ことにより正規のメモリセル群は各々周囲が一定となり
各メモリセルは形状的に均一となるためアクセス差等が
最小限におさえられる様になる。Recently, semiconductor memory has become larger and larger, and with it,
The internal patterns are becoming finer and finer. As such miniaturization progresses, the exposure and etching rates are different at the end and inside of the regularly arranged memory cell group, and it is possible to form memory cells that are geometrically uniform at the end and inside of the memory cell. It has become difficult. As a result, an adverse effect such as an access difference between the end portion of the memory cell and the inside thereof occurs. Therefore, as shown in FIG. 3, a device such as a pseudo memory cell that does not function as an actual memory cell is arranged outside the regular memory cell group. By inserting this pseudo memory cell group, the peripheries of the regular memory cell groups become constant and the respective memory cells become uniform in shape, so that the access difference and the like can be minimized.
上述した従来の半導体メモリ装置は、メモリセル群の周
囲に擬似メモリセル群を配置することにより、正規のメ
モリセル群は形状的に均一となるが、擬似メモリセル群
を挿入するため、チップサイズが大きくなるという欠点
がある。In the conventional semiconductor memory device described above, by arranging the pseudo memory cell group around the memory cell group, the regular memory cell group becomes uniform in shape, but since the pseudo memory cell group is inserted, the chip size is reduced. Has the drawback of becoming large.
本発明の半導体メモリは冗長メモリセル群を有する半導
体メモリにおいて冗長メモリセル群を正規のメモリセル
群の四辺に配置し、正規のメモリセル群における形状の
均一化をはかったことを特徴としている。The semiconductor memory of the present invention is characterized in that, in a semiconductor memory having a redundant memory cell group, the redundant memory cell groups are arranged on four sides of the regular memory cell group so that the regular memory cell group has a uniform shape.
次に、本発明について図面を参照して説明する。第1図
は本発明の一実施例のブロック図である。第1図におい
て1は正規のメモリセル群であり、2は不良ビット救済
用の冗長メモリセル群である。冗長メモリセル群2は正
規メモリセル群1の四辺方向に配置されており、正規メ
モリセル群の各メモリセルは周囲が一定となるため形状
的に均一となる。またこの様に冗長メモリセル群を四辺
方向に配置すれば正規メモリセル群は擬似メモリセル群
を配置しなくても正規のメモリセル群の形状を均一化で
きることになる。しかし冗長メモリセル群の端部では形
状が不均一となってしまうので、不良ビットを救済する
冗長メモリセル群を使用したときは特性に影響がでる可
能性がある。しかし通常、半導体メモリの歩留は量産安
定期には冗長メモリセルを使用しなくともよいレベルま
で向上するので冗長メモリセルを擬似メモリセルとして
も兼用させても問題ないと考えられる。Next, the present invention will be described with reference to the drawings. FIG. 1 is a block diagram of an embodiment of the present invention. In FIG. 1, 1 is a normal memory cell group, and 2 is a redundant memory cell group for relieving defective bits. The redundant memory cell group 2 is arranged in the four side directions of the normal memory cell group 1, and each memory cell of the normal memory cell group has a constant circumference, and therefore has a uniform shape. Further, by arranging the redundant memory cell group in the four side directions in this way, the regular memory cell group can have a uniform shape of the regular memory cell group without arranging the pseudo memory cell group. However, since the shape becomes non-uniform at the end of the redundant memory cell group, the characteristics may be affected when the redundant memory cell group for repairing the defective bit is used. However, the yield of the semiconductor memory is usually improved to a level where the redundant memory cell does not need to be used during the stable period of mass production, so it is considered that there is no problem even if the redundant memory cell is used as a pseudo memory cell.
第2図は本発明の実施例2のブロック図である。第1図
は冗長メモリセル群を正規のメモリセル群の周辺に均等
に配置したが、第2図では少なくとも正規のメモリセル
群の周辺は冗長メモリセル群で囲む様配置したが、冗長
メモリセル群の配置が不均一となっている。この実施例
では、冗長メモリセル活性回路からの配線のうち、Xデ
コーダー及びYデコーダーを横って配線される本数が少
なくなるという利点がある。FIG. 2 is a block diagram of Embodiment 2 of the present invention. In FIG. 1, the redundant memory cell group is evenly arranged around the normal memory cell group, but in FIG. 2, at least the peripheral memory cell group is surrounded by the redundant memory cell group. The arrangement of groups is uneven. This embodiment has an advantage that the number of wirings extending from the redundant memory cell activating circuit across the X decoder and the Y decoder is reduced.
以上説明したように本発明は、冗長メモリセル群を正規
メモリセル群の四辺に隣接するよう配置することによ
り、今まで挿入していた擬似メモリセル群がないためチ
ップサイズを大きくすることなしに正規メモリセル群の
各メモリセルの形状を均一にでき、アクセス差等の弊害
を防ぐことができるという効果がある。As described above, according to the present invention, by arranging the redundant memory cell group so as to be adjacent to the four sides of the normal memory cell group, there is no pseudo memory cell group that has been inserted until now, without increasing the chip size. There is an effect that the shape of each memory cell of the normal memory cell group can be made uniform and an adverse effect such as access difference can be prevented.
第1図及び第2図は本発明のメモリセル群のブロック図
である。第3図は従来のメモリセル群のブロック図であ
る。 1……正規のメモリセル群、2……不良ビット救済用の
冗長メモリセル群、3……擬似メモリセル群。1 and 2 are block diagrams of a memory cell group of the present invention. FIG. 3 is a block diagram of a conventional memory cell group. 1 ... Regular memory cell group, 2 ... Redundant memory cell group for repairing defective bit, 3 ... Pseudo memory cell group.
Claims (1)
おいて、冗長メモリセル群を正規のメモリセル群の四辺
に配置し、正規のメモリセル群における各メモリセルの
形状の均一化をはかったことを特徴とする半導体メモ
リ。1. In a semiconductor memory having a redundant memory cell group, the redundant memory cell group is arranged on four sides of the regular memory cell group so that the shape of each memory cell in the regular memory cell group is made uniform. Characteristic semiconductor memory.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63326765A JPH0728012B2 (en) | 1988-12-23 | 1988-12-23 | Semiconductor memory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63326765A JPH0728012B2 (en) | 1988-12-23 | 1988-12-23 | Semiconductor memory |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02170573A JPH02170573A (en) | 1990-07-02 |
| JPH0728012B2 true JPH0728012B2 (en) | 1995-03-29 |
Family
ID=18191443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63326765A Expired - Lifetime JPH0728012B2 (en) | 1988-12-23 | 1988-12-23 | Semiconductor memory |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0728012B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004047943A (en) * | 2002-03-20 | 2004-02-12 | Fujitsu Ltd | Semiconductor device |
| JP2007335821A (en) * | 2006-06-19 | 2007-12-27 | Ricoh Co Ltd | Semiconductor memory device |
-
1988
- 1988-12-23 JP JP63326765A patent/JPH0728012B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02170573A (en) | 1990-07-02 |
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