JPH0733428B2 - Method for producing silicone-modified epoxy resin - Google Patents
Method for producing silicone-modified epoxy resinInfo
- Publication number
- JPH0733428B2 JPH0733428B2 JP62312282A JP31228287A JPH0733428B2 JP H0733428 B2 JPH0733428 B2 JP H0733428B2 JP 62312282 A JP62312282 A JP 62312282A JP 31228287 A JP31228287 A JP 31228287A JP H0733428 B2 JPH0733428 B2 JP H0733428B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- formula
- silicone
- product
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 25
- 229920000647 polyepoxide Polymers 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 16
- 229920001296 polysiloxane Polymers 0.000 claims description 15
- 239000004593 Epoxy Substances 0.000 claims description 14
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 229920003986 novolac Polymers 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 239000000047 product Substances 0.000 description 29
- 238000006243 chemical reaction Methods 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 230000035939 shock Effects 0.000 description 7
- 229920002050 silicone resin Polymers 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229920002545 silicone oil Polymers 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000007664 blowing Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000000853 cresyl group Chemical group C1(=CC=C(C=C1)C)* 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体等の電子部品封止等に使用されるエポキ
シ樹脂、特に内部応力が低減し耐ヒートショック性に優
れた半導体封止用として優れたエポキシ樹脂の製造方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to an epoxy resin used for encapsulation of electronic parts such as semiconductors, especially for semiconductor encapsulation with reduced internal stress and excellent heat shock resistance. The present invention relates to a method for producing an excellent epoxy resin.
エポキシ樹脂は、誘電特性、体積抵抗率等の電気特性、
また曲げ強度、圧縮強度、衝撃強度等の機械特性に優れ
ているため、各種の電気、電子部品の絶縁材料として使
用され、特に近年半導体の封止材料として有用されるよ
うになり、現在では半導体封止の主流はエポキシ樹脂封
止になった。Epoxy resin has dielectric properties, electrical properties such as volume resistivity,
In addition, it has excellent mechanical properties such as bending strength, compressive strength, and impact strength, so it is used as an insulating material for various electrical and electronic parts, and in recent years it has become particularly useful as a sealing material for semiconductors. The mainstream of sealing has been epoxy resin sealing.
半導体の特性を維持するために、封止用樹脂に対して種
々の性質が要求されているが、特に最近半導体の高集績
化による素子の大型化や、新しい実装方式が取り入れら
れるようになつたため、硬化時の内部応力が熱衝撃時の
内部応力による樹脂のクラツクの発生は大きな問題とな
つている。In order to maintain the characteristics of the semiconductor, various properties are required for the encapsulating resin, but in particular, recently due to the increase in the size of the element due to the high density of the semiconductor and the introduction of new mounting methods, The occurrence of resin cracking due to the internal stress during curing due to the internal stress during thermal shock is a serious problem.
内部応力を低減させる方法として、弾性率を低下させる
方法が種々考案されており特に可とう性樹脂を添加する
方法が検討され、可とう性樹脂としてシリコーン樹脂を
用いてエポキシ樹脂を変性する方法が試みられている。As a method of reducing the internal stress, various methods of lowering the elastic modulus have been devised, and in particular, a method of adding a flexible resin has been studied, and a method of modifying an epoxy resin with a silicone resin as the flexible resin has been proposed. Being tried.
しかしながら、目的とする低応力化に対して充分な効果
をあげているとは言えない。〔問題点を解決するための
手段〕 本発明者らはエポキシ樹脂のシリコーン変性を鋭意検討
した結果、エポキシ樹脂とシリコーン樹脂を充分反応さ
せること、即ちエポキシ樹脂のエポキシ基と反応しやす
い官能基を有するシリコーン樹脂とエポキシ樹脂を反応
させて得られる樹脂の硬化物は内部応力が低減し耐ヒー
トシヨツク性に優れることを見い出し本発明を完成させ
るに至つた。However, it cannot be said that it is sufficiently effective in reducing the target stress. [Means for Solving Problems] As a result of intensive studies on silicone modification of an epoxy resin, the present inventors have shown that an epoxy resin and a silicone resin are sufficiently reacted, that is, a functional group that easily reacts with an epoxy group of the epoxy resin is added. We have found that a cured product of a resin obtained by reacting a silicone resin with an epoxy resin has a reduced internal stress and is excellent in heat shock resistance, and has completed the present invention.
即ち、本発明は、 下式(1)〜(4) (式中x,yは整数を表し、Rは炭素2または3のアルキ
レンを表す。) で表されるエポキシシリコーンから選ばれる1種と下式
(5)又は(6) (式中R1は水素原子またはメチル基を表す。) で表されるフェノール類とを反応させて得られるフェノ
ール性水酸基を有するシリコーン化合物と 下式(7) (式中R2は水素原子またはメチル基を表し、nは整数で
ある。) で表されるノボラック型エポキシ樹脂とを反応させるこ
とを特徴とするシリコーン変性エポキシ樹脂の製造方法
に関する。That is, the present invention provides the following formulas (1) to (4) (Wherein x and y represent integers and R represents alkylene having 2 or 3 carbons) and one type selected from epoxy silicones represented by the following formula (5) or (6) (In the formula, R 1 represents a hydrogen atom or a methyl group.) A silicone compound having a phenolic hydroxyl group obtained by reacting with a phenol represented by the following formula (7) (In the formula, R 2 represents a hydrogen atom or a methyl group, and n is an integer.) The present invention relates to a method for producing a silicone-modified epoxy resin, which is characterized by reacting with a novolac type epoxy resin.
上記エポキシシリコーンのうち式(1)又は式(3)で
表される化合物は末端のエポキシ基がより反応性に富む
ため好適に使用される。Among the above epoxy silicones, the compound represented by the formula (1) or the formula (3) is preferably used because the terminal epoxy group is more reactive.
また上記のようにして得られるシリコン化合物の分子量
は、小さいと充分な効果を発揮せず、大きすぎるとフェ
ノール類との反応性が低下するため1,000〜40,000が好
ましく、より好ましくは2,000〜20,000である。本発明
で用いられるフェノール類のうち式(5)で表される化
合物としてはビスフェノールA、ビスフェノールFが具
体的に挙げられる。Further, the molecular weight of the silicon compound obtained as described above, if it is small does not exert a sufficient effect, and if it is too large, the reactivity with phenols decreases, so 1,000 to 40,000 is preferable, and more preferably 2,000 to 20,000. is there. Among the phenols used in the present invention, examples of the compound represented by the formula (5) include bisphenol A and bisphenol F.
エポキシシリコーンと式(5)の化合物の反応は、フエ
ノール性水酸基とエポキシ基の反応に通常用いられる触
媒、例えばアミン類、ホスフイン類等を用いればよく、
式(6)の化合物との反応の場合は特に触媒を用いなく
てもよい。しかし反応物の貯蔵時での安定性を考慮すれ
ばホスフイン類が好ましく、その使用量はエポキシシリ
コーンに対して0.1〜1重量%程度で充分である。The reaction between the epoxy silicone and the compound of the formula (5) may be carried out using a catalyst usually used for the reaction between the phenolic hydroxyl group and the epoxy group, such as amines and phosphines.
In the case of the reaction with the compound of formula (6), no catalyst may be used. However, phosphines are preferable in consideration of the stability of the reaction product during storage, and the amount of the phosphine used is about 0.1 to 1% by weight based on the epoxy silicone.
反応溶媒は特に用いなくてもよいが、エポキシシリコー
ンの粘度が高い場合には、反応を円滑に行わせるために
キシレン等の反応に直接関与しない溶媒であれば用いる
ことができる。A reaction solvent is not particularly required, but when the viscosity of the epoxy silicone is high, a solvent such as xylene that does not directly participate in the reaction can be used in order to smoothly carry out the reaction.
反応温度は特に限定されないが、反応速度との関係から
比較的高温が好ましく100〜180℃、特に120〜150℃が好
ましい。The reaction temperature is not particularly limited, but a relatively high temperature is preferable in view of the reaction rate, and 100 to 180 ° C, particularly 120 to 150 ° C is preferable.
式(5)又は式(6)の化合物の使用量はエポキシシリ
コーンのエポキシ基1モルに対して0.5〜5モル好まし
くは0.7〜3モルより好ましくは0.8〜1.5モル量用いれ
ばよいが、式(6)の化合物の場合、未反応で残存する
と次にエポキシ樹脂と反応させる際にゲル化を起す可能
性があるので反応後未反応式(6)の化合物を除去する
のが望ましい。The compound of formula (5) or formula (6) may be used in an amount of 0.5 to 5 mol, preferably 0.7 to 3 mol, more preferably 0.8 to 1.5 mol, based on 1 mol of the epoxy group of the epoxysilicone. In the case of the compound of 6), if it remains unreacted, gelation may occur in the next reaction with the epoxy resin, so it is desirable to remove the unreacted compound of the formula (6) after the reaction.
このようにして得られた変性シリコーン樹脂(フエノー
ル性水酸基を有するシリコーン化合物)とエポキシ樹脂
の反応は、両者を加熱下撹拌すればよいが、エポキシ樹
脂を加熱溶融させた液に変性シリコーン樹脂を滴下する
のが好ましい。またキシレン等の反応に直接関与しない
溶媒を用いることもできる。The reaction of the modified silicone resin (silicone compound having a phenolic hydroxyl group) thus obtained with the epoxy resin may be carried out by stirring the two under heating. Preferably. It is also possible to use a solvent such as xylene that does not directly participate in the reaction.
反応温度は100〜180℃が好ましく特に120〜150℃が好ま
しいが特に限定されない。エポキシ樹脂と変性シリコー
ン樹脂の使用割合は、変性シリコーン樹脂が少ないと目
的とする低応力化が充分達成されず、又多すぎると、得
られる樹脂が均一になりにくいため、エポキシ樹脂100
重量部に対して変性シリコーン樹脂を5〜40重量部用い
るのが好ましく、特に10〜30重量部用いるのが好まし
い。The reaction temperature is preferably 100 to 180 ° C, particularly preferably 120 to 150 ° C, but is not particularly limited. Regarding the usage ratio of the epoxy resin and the modified silicone resin, if the modified silicone resin is small, the target stress reduction cannot be sufficiently achieved, and if it is too large, the resulting resin is hard to be uniform.
The modified silicone resin is preferably used in an amount of 5 to 40 parts by weight, more preferably 10 to 30 parts by weight, based on parts by weight.
触媒は式(5)の化合物とエポキシシリコーンとの反応
物を使用する場合、式(5)の化合物とエポキシシリコ
ーンとの反応時に添加した触媒がそのままもち込まれる
ので、特に追加する必要はない。When the reaction product of the compound of formula (5) and epoxysilicone is used as the catalyst, the catalyst added during the reaction of the compound of formula (5) and the epoxysilicone is brought in as it is, so that it is not particularly necessary to add it.
一方式(6)の化合物とエポキシシリコーンとの反応物
を使用する場合は、新たに触媒として、アミン類又はホ
スフイン類を添加するが、後者の方が好ましい。その使
用量は変性エポキシシリコーン100重量部に対して0.05
〜2重量部が好ましく、特に好ましくは0.1〜1重量部
である。On the other hand, when a reaction product of the compound of formula (6) and epoxy silicone is used, amines or phosphines are newly added as a catalyst, and the latter is preferable. The amount used is 0.05 with respect to 100 parts by weight of modified epoxy silicone.
Is preferably 2 to 2 parts by weight, particularly preferably 0.1 to 1 part by weight.
本発明の製造方法において使用するエポキシ樹脂は、上
記式(7)で表されるノボラック型エポキシ樹脂であっ
て、具体的にはフェノールノボラックエポキシ樹脂(式
(7)におけるR2が水素原子)またはクレゾールノボラ
ックエポキシ樹脂(式(7)におけるR2がメチル基)で
ある。The epoxy resin used in the production method of the present invention is a novolac type epoxy resin represented by the above formula (7), and specifically, a phenol novolac epoxy resin (R 2 in the formula (7) is a hydrogen atom) or It is a cresol novolac epoxy resin (R 2 in the formula (7) is a methyl group).
かくして得られたシリコーン変性エポキシ樹脂を硬化剤
(例えばフエノールノボラツク等)で硬化させた硬化物
は、その曲げ弾性率が低減され低応力性でとくに有用な
封止用熱硬化性樹脂組成物を提供することができる。A cured product obtained by curing the thus obtained silicone-modified epoxy resin with a curing agent (for example, phenol novolac) is a thermosetting resin composition for encapsulation which has a particularly low flexural modulus and low stress. Can be provided.
実施例 以下本発明を実施例で説明する。Examples The present invention will be described below with reference to examples.
合成例1 温度計、冷却管、窒素吹込み管及び撹拌機を付けたガラ
ス容器にシリコーンオイル(I)(トーレシリコーンBX
16−855B MW4400)〔式(3)の化合物に相当する〕10
0g、ビスフエノールA10.4g、トリフエニルホスフイン0.
4gを仕込み、窒素を吹込みながら140℃で18時間反応し
淡黄色液体105g(生成物A)を得た。Synthesis Example 1 Silicone oil (I) (Toray Silicone BX) in a glass container equipped with a thermometer, cooling tube, nitrogen blowing tube and stirrer.
16-855B MW4400) [corresponding to the compound of formula (3)] 10
0 g, bisphenol A 10.4 g, triphenylphosphine 0.
4 g was charged and reacted at 140 ° C. for 18 hours while blowing nitrogen to obtain 105 g (product A) as a pale yellow liquid.
合成例2 合成例1において、シリコーンオイル(I)の代りにシ
リコーンオイル(II)(トーレシリコーンBX16−854B
MW4400)〔式4の化合物に相当する〕100gを用いた以外
は合成例1と同様に反応させ淡黄色液体150g(生成物
B)を得た。Synthesis Example 2 In Synthesis Example 1, silicone oil (II) (Toray Silicone BX16-854B) was used instead of silicone oil (I).
MW4400) [light-weight liquid 150 g (Product B) was obtained by the same reaction as in Synthesis Example 1 except that 100 g of [Compound of formula 4] was used.
合成例3 合成例1においてビスフエノールAの代りにp−メチル
アミノフエノール5.6gを用い、又溶媒としてキシレン50
mlを加え140℃で2時間30分反応後室温迄冷却し、メチ
ルイソブチルケトン2を加え、水洗後、有機層を減圧
下濃縮し、褐色液体101g(生成物C)を得た。Synthesis Example 3 In Synthesis Example 1, 5.6 g of p-methylaminophenol was used instead of bisphenol A, and xylene was used as a solvent.
ml was added, the mixture was reacted at 140 ° C. for 2 hours and 30 minutes, cooled to room temperature, methyl isobutyl ketone 2 was added, washed with water, and the organic layer was concentrated under reduced pressure to obtain 101 g of a brown liquid (product C).
合成例4 合成例1において、シリコーンオイル(I)の代りにシ
リコーンオイル(III)(トーレシリコーンSF−8411 M
W3000)〔式(1)の化合物に相当する〕100gを用い、
ビスフエノールA7.6gを用いた以外は合成例1と同様に
反応させ淡褐色液体103g(生成物D)を得た。Synthesis Example 4 In Synthesis Example 1, the silicone oil (I) was replaced with silicone oil (III) (Toray Silicone SF-8411 M).
W3000) [corresponding to the compound of formula (1)] 100 g,
The reaction was performed in the same manner as in Synthesis Example 1 except that 7.6 g of bisphenol A was used to obtain 103 g of a pale brown liquid (Product D).
実施例1 温度計、冷却管、窒素吹込み管及び撹拌機を付けた1
のガラス容器に、エポキシ樹脂(EOCN1020日本化薬
(株)製エポキシ当量(g/mol)200、軟化温度65℃)50
0gを仕込み、窒素を吹込みながら140℃で撹拌させ、合
成例1で得られた生成物(A)75gを30分間で滴下し更
に140℃で5時間反応させ、淡黄色固体570gを得た(生
成物A1)。生成物(A1)の軟化温度(JIS K7234)は6
2.9℃でエポキシ当量(g/mol)は230であつた。Example 1 1 equipped with a thermometer, cooling tube, nitrogen blowing tube and stirrer
Epoxy resin (EOCN1020, Nippon Kayaku Co., Ltd., epoxy equivalent (g / mol) 200, softening temperature 65 ° C) 50 in a glass container of 50
0 g was charged, the mixture was stirred at 140 ° C. while blowing nitrogen, 75 g of the product (A) obtained in Synthesis Example 1 was added dropwise over 30 minutes, and the mixture was further reacted at 140 ° C. for 5 hours to obtain 570 g of a pale yellow solid. (Product A1). The softening temperature (JIS K7234) of the product (A1) is 6
The epoxy equivalent (g / mol) was 230 at 2.9 ° C.
実施例2 生成物(A)の代りに合成例2で得た生成物(B)75g
を用いた以外は実施例1と同様に反応して淡黄色固体
(B1)570gを得た。Example 2 75 g of the product (B) obtained in Synthesis Example 2 instead of the product (A)
The reaction was performed in the same manner as in Example 1 except that was used to obtain 570 g of a pale yellow solid (B1).
生成物(B1)の軟化温度は64.4℃でエポキシ当量(g/mo
l)は231であつた。The softening temperature of the product (B1) is 64.4 ° C and the epoxy equivalent (g / mo
l) was 231.
実施例3 生成物(A)の代りに合成例3で得た生成物(C)75g
とトリフエニールホスフイン0.4gを用いた以外は実施例
1と同様に反応して淡褐色固体(C1)570gを得た。Example 3 75 g of the product (C) obtained in Synthesis Example 3 instead of the product (A)
Was reacted in the same manner as in Example 1 except that and 0.4 g of triphenylphosphine was used to obtain 570 g of a light brown solid (C1).
生成物(C1)の軟化温度は63.0℃でエポキシ当量(g/mo
l)は231であつた。The softening temperature of the product (C1) is 63.0 ℃ and the epoxy equivalent (g / mo
l) was 231.
実施例4 生成物(A)の代りに合成例4で得た生成物(D)75g
を用いた以外は実施例1と同様に反応して淡黄色固体
(D1)570gを得た。Example 4 75 g of the product (D) obtained in Synthesis Example 4 instead of the product (A)
The reaction was performed in the same manner as in Example 1 except that was used to obtain 570 g of a pale yellow solid (D1).
生成物(C1)の軟化温度は63.0℃でエポキシ当量(g/mo
l)は231であつた。The softening temperature of the product (C1) is 63.0 ℃ and the epoxy equivalent (g / mo
l) was 231.
実施例4 生成物(A)の代りに合成例4で得た生成物(D)75g
を用いた以外は実施例1と同様に反応して淡黄色固体
(D1)570gを得た。Example 4 75 g of the product (D) obtained in Synthesis Example 4 instead of the product (A)
The reaction was performed in the same manner as in Example 1 except that was used to obtain 570 g of a pale yellow solid (D1).
生成物(D1)の軟化温度は64.5℃でエポキシ当量(g/mo
l)は230であつた。The softening temperature of the product (D1) is 64.5 ° C and the epoxy equivalent (g / mo
l) was 230.
参考例 表−1に示す割合でフエノールノボラツク(日本化薬
(株)製、軟化温度85℃)に実施例1、2、3、4で得
られたシリコーン変性エポキシ樹脂(A1)、(B1)、
(C1)、及び(D1)を配合し、2−メチルイミダゾール
を触媒に用いて160℃で2時間、180℃で8時間加熱硬化
させた。Reference Example The silicone-modified epoxy resins (A1) and (B1) obtained in Examples 1, 2, 3 and 4 were applied to phenol novolak (manufactured by Nippon Kayaku Co., Ltd., softening temperature 85 ° C.) in the proportions shown in Table 1. ),
(C1) and (D1) were blended, and 2-methylimidazole was used as a catalyst for heat curing at 160 ° C. for 2 hours and 180 ° C. for 8 hours.
比較例として実施例1、2、3、及び4で得られた生成
物(A1)〜(D1)の代りに表−1に示す割合で、変性に
用いた原料のエポキシ樹脂を用いて加熱硬化した。As a comparative example, the products (A1) to (D1) obtained in Examples 1, 2, 3, and 4 were heat-cured by using the raw material epoxy resin used for modification at a ratio shown in Table 1 instead of the products. did.
以上の硬化物についてガラス転移温度、熱変形温度及び
曲げ弾性率を測定し、その結果を表−1に示した。The glass transition temperature, heat distortion temperature and bending elastic modulus of the above cured product were measured and the results are shown in Table 1.
表−1から、本発明の製造方法により得られるシリコー
ン変性エポキシ樹脂はガラス転移温度、熱変形温度は比
較例に示した変性しないエポキシ樹脂に比べ差がみられ
ないにもかかわらず、弾性率は大幅に減少し、耐熱性は
保持しながら低応力性に優れていることがわかる。From Table 1, the silicone-modified epoxy resin obtained by the production method of the present invention has a glass transition temperature and a heat distortion temperature which are not different from those of the non-modified epoxy resin shown in Comparative Examples, but the elastic modulus is It is significantly reduced, and it is understood that the low stress is excellent while maintaining the heat resistance.
また、表−1に示す割合で配合して加熱硬化させる際鋼
製のワツシヤーを埋込んだ硬化物の熱衝撃テストを行つ
た。結果は表−2に示される通りであつた。表−2から
明らかなように本発明に係る樹脂組成物の硬化物は熱衝
撃性に非常にすぐれている。In addition, a thermal shock test was conducted on a cured product in which a steel washer was embedded when the components were compounded in the proportions shown in Table 1 and cured by heating. The results are as shown in Table-2. As is clear from Table-2, the cured product of the resin composition according to the present invention has excellent thermal shock resistance.
硬化物形状 φ:50mm 厚さ:5mm ワツシヤー 平座金(JIS M8) 熱衝撃テスト 硬化物を沸騰水に30分つけた後氷水に浸漬。 Cured product shape φ: 50 mm Thickness: 5 mm Washer plain washer (JIS M8) Thermal shock test Soak the cured product in boiling water for 30 minutes and then soak it in ice water.
本発明の製造方法により得られるシリコーン変性エポキ
シ樹脂の硬化物は低応力性を示し、熱衝撃に優れてお
り、電子部品の封止材料として有用である。The cured product of the silicone-modified epoxy resin obtained by the production method of the present invention exhibits low stress and is excellent in thermal shock, and is useful as a sealing material for electronic parts.
フロントページの続き (56)参考文献 特開 昭62−254454(JP,A) 特開 昭63−301220(JP,A) 特開 昭62−192421(JP,A) 特開 昭62−260817(JP,A) 特開 昭62−7723(JP,A)Continuation of the front page (56) Reference JP 62-254454 (JP, A) JP 63-301220 (JP, A) JP 62-192421 (JP, A) JP 62-260817 (JP , A) JP 62-7723 (JP, A)
Claims (1)
レンを表す。) で表されるエポキシシリコーンから選ばれる1種と下式
(5)又は(6) (式中R1は水素原子またはメチル基を表す。) で表されるフェノール類とを反応させて得られるフェノ
ール性水酸基を有するシリコーン化合物と下式(7) (式中R2は水素原子またはメチル基を表し、nは整数で
ある。) で表されるノボラック型エポキシ樹脂とを反応させるこ
とを特徴とするシリコーン変性エポキシ樹脂の製造方
法。1. The following formulas (1) to (4): (Wherein x and y represent integers and R represents alkylene having 2 or 3 carbons) and one type selected from epoxy silicones represented by the following formula (5) or (6) (In the formula, R 1 represents a hydrogen atom or a methyl group.) And a silicone compound having a phenolic hydroxyl group obtained by reacting with a phenol represented by the following formula (7) (In the formula, R 2 represents a hydrogen atom or a methyl group, and n is an integer.) A method for producing a silicone-modified epoxy resin, which comprises reacting with a novolac type epoxy resin represented by the formula:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62312282A JPH0733428B2 (en) | 1987-12-11 | 1987-12-11 | Method for producing silicone-modified epoxy resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62312282A JPH0733428B2 (en) | 1987-12-11 | 1987-12-11 | Method for producing silicone-modified epoxy resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01153713A JPH01153713A (en) | 1989-06-15 |
| JPH0733428B2 true JPH0733428B2 (en) | 1995-04-12 |
Family
ID=18027366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62312282A Expired - Lifetime JPH0733428B2 (en) | 1987-12-11 | 1987-12-11 | Method for producing silicone-modified epoxy resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0733428B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2869077B2 (en) * | 1988-12-27 | 1999-03-10 | 東レ株式会社 | Epoxy resin composition |
| US5102960A (en) * | 1989-09-11 | 1992-04-07 | Bayer Aktiengesellschaft | Silicon-epoxy resin composition |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62254454A (en) * | 1986-04-25 | 1987-11-06 | Nitto Electric Ind Co Ltd | Semiconductor device |
| JPS63301220A (en) * | 1987-05-29 | 1988-12-08 | Sumitomo Chem Co Ltd | Modified epoxy resin composition |
-
1987
- 1987-12-11 JP JP62312282A patent/JPH0733428B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01153713A (en) | 1989-06-15 |
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