Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0735256B2 - Quartz glass manufacturing method - Google Patents
[go: Go Back, main page]

JPH0735256B2 - Quartz glass manufacturing method - Google Patents

Quartz glass manufacturing method

Info

Publication number
JPH0735256B2
JPH0735256B2 JP62246685A JP24668587A JPH0735256B2 JP H0735256 B2 JPH0735256 B2 JP H0735256B2 JP 62246685 A JP62246685 A JP 62246685A JP 24668587 A JP24668587 A JP 24668587A JP H0735256 B2 JPH0735256 B2 JP H0735256B2
Authority
JP
Japan
Prior art keywords
fine particles
silica fine
silica
quartz glass
spherical silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62246685A
Other languages
Japanese (ja)
Other versions
JPS6487522A (en
Inventor
孝明 清水
秀二 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP62246685A priority Critical patent/JPH0735256B2/en
Priority to DE8888402420T priority patent/DE3869308D1/en
Priority to EP88402420A priority patent/EP0310486B1/en
Priority to US07/249,317 priority patent/US4883521A/en
Publication of JPS6487522A publication Critical patent/JPS6487522A/en
Publication of JPH0735256B2 publication Critical patent/JPH0735256B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Glass Melting And Manufacturing (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は石英ガラスの製造方法、特にはシリカゾル液中
で球状シリカ微粒子を濃縮、沈降して最密充填構造をと
らせたのち、昇温ゲル化、乾燥、焼結ガラス化の工程で
発生する割れ、発泡、不透明化を防止するようにした、
ゾルーゲル法によって安価にかつ歩留よく石英ガラスを
製造する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention relates to a method for producing quartz glass, in particular, spherical silica fine particles are concentrated and settled in a silica sol solution to form a close-packed structure and then heated. Prevents cracking, foaming, and opacity that occur in the steps of gelling, drying, and sintering vitrification.
The present invention relates to a method for producing quartz glass at low cost and with good yield by the sol-gel method.

(従来の技術) 高純度の合成石英ガラスは近年、光学用、光通信用など
に使用され始めているが、この合成石英の製造法につい
ては揮発性のけい素化合物を酸水素火炎中で火炎加水分
解するか、プラズマ炎中で酸化分解してターゲット上に
シリカを集積させ、これを溶融透明化する高温合成法
と、金属アルコキシドのアルコール溶液あるいは水ガラ
スのような無機けい酸塩からゲルを作り、ついでこれを
焼成して透明なシリカガラスを作るというゾルーゲル法
と呼ばれている低温合成法が知られている。
(Prior Art) High-purity synthetic quartz glass has recently begun to be used for optical and optical communication applications. Regarding the production method of this synthetic quartz, a volatile silicon compound is added to a oxyhydrogen flame in a flame A high-temperature synthesis method that decomposes or oxidatively decomposes silica in a plasma flame to accumulate silica on the target and melts and makes it transparent, and a gel is made from an alcohol solution of metal alkoxide or an inorganic silicate such as water glass. Then, there is known a low temperature synthesis method called a sol-gel method in which this is fired to produce transparent silica glass.

しかし、この高温合成法には酸水素火炎の燃焼熱、プ
ラズマ発生用電力などに多大のエネルギーが必要とされ
るし、塑性成形時に2,000℃近くまで昇温させなければ
ならないのでこれにも多大のエネルギーが必要とされ
る、高温工程が必要とされるために、屈折率制御のた
めにシリカ成長時に添加されるドーパントの固定比率が
極めて低く、固定されたドーパントも塑性成形時におけ
る高温履歴過程で揮散することが多い、製品を得るま
での工程が長いので経済性に劣る、という不利がある。
However, this high-temperature synthesis method requires a large amount of energy for the combustion heat of the oxyhydrogen flame, the electric power for plasma generation, etc., and since it is necessary to raise the temperature to nearly 2,000 ° C. during plastic forming, this is also a great deal. Since a high temperature process that requires energy is required, the fixed ratio of the dopant added during silica growth for controlling the refractive index is extremely low, and the fixed dopant also remains in the high temperature history process during plastic forming. It has the disadvantages of being often volatilized and being inferior in economic efficiency because it takes a long time to obtain a product.

また、この低温合成法についけはA)アルコキシシラン
をアルコール溶媒中で塩酸などの酸触媒やアンモニアな
どの塩基性触媒の存在下で加水分解し、加温してゲル化
して湿性ゲルを作り、これを乾燥したのち焼結、透明ガ
ラス化する方法(特公昭59−9497号公報参照)、B)1
μm以下の微細なシリカ粒子を水などの分散媒に懸濁し
た溶液に酸性あるいは塩基性のゲル化触媒を加えてこれ
をゲル化させて湿性ゲルを作り、これを乾燥、焼結、透
明ガラス化するか、上記した微細シリカ粒子懸濁液中の
分散媒を揮発させてシリカ乾燥体とし、これを焼結、透
明ガラス化する方法(ジャーナル・オブ・アメリカン・
セラミック・ソサエテイ,66、No.10、第683頁、1983年
参照)、C)アルコキシシランを酸触媒または塩基性触
媒の存在下で加水分解して均一のゾルを作ると共に、1
μm以下の微細なシリカ粒子を水などの分散媒に懸濁し
た液を作り、この両者を混合するか、あるいは上記の加
水分解ゾル液に粉末状の微細シリカを分散処理してシリ
カ微粒子を含んだシリカゾル液を作り、このPH、温度を
調節してこれをゲル化させて湿性ゲルとし、これを乾
燥、焼結、透明ガラス化する方法(特開昭61−91033号
公報参照)などの方法が公知とされており、これによれ
ば最も高温となるときでもそれが1,000〜1,500℃とされ
るので上記した高温合成法にくらべて大巾に省エネルギ
ー化されるし、ドーパントの添加も各種元素のアルコキ
サイドをアルコキシシランに添加して共加水分解する
か、その酸化物微細粒子を添加すればよく、このドーパ
ントは100%収率で固定化することができ、これは揮散
することもないという利益が与えられ、さらにこの場合
にはゲル化を所望の形状の容器中で行なわせれば成形、
切断、切削などの加工操作が不要とされるので経済性に
すぐれているという利点も与えられるけれども、この
A)の方法にはゲルの乾燥時、焼結時に割れまたは発泡
現象が生じ易いので大型のガラスが得難いという不利が
あるし、B)の方法には発泡現象は生じないが乾燥工程
での割れがあるために大型のガラス体は得難く、透明ガ
ラス化温度に1,500℃以上と比較的高温が必要とされる
という不利があり、さらにC)の方法には透明ガラス化
時に時々発泡があり、製品も不透明なものとなる場合が
あるので、再現性がわるく、透明なガラス体を歩留りよ
く製造することが難しいという欠点がある。
For this low temperature synthesis method, A) alkoxysilane is hydrolyzed in an alcohol solvent in the presence of an acid catalyst such as hydrochloric acid or a basic catalyst such as ammonia, and heated to form a wet gel. A method in which the material is dried, then sintered and made into transparent glass (see Japanese Patent Publication No. 59-9497), B) 1.
An acidic or basic gelling catalyst is added to a solution in which fine silica particles of μm or less are suspended in a dispersion medium such as water to gelate the wet gel, and this is dried, sintered, or transparent glass. Or a method of volatilizing the dispersion medium in the fine silica particle suspension described above to obtain a dried silica product, which is then sintered and vitrified (Journal of American.
Ceramic Society, 66 , No. 10, p. 683, 1983), C) Alkoxysilanes are hydrolyzed in the presence of an acid catalyst or a basic catalyst to form a uniform sol.
A solution is prepared by suspending fine silica particles of μm or less in a dispersion medium such as water and mixing them, or by dispersing the powdery fine silica in the above hydrolysis sol solution to contain fine silica particles. A method of preparing a silica sol solution, adjusting the pH and temperature of the solution to gel it into a wet gel, and drying, sintering, and vitrifying it (see JP-A-61-91033). Is known, and according to this, even at the highest temperature, it is set to 1,000 to 1,500 ° C., so that energy can be largely saved compared to the above-mentioned high temperature synthesis method, and addition of dopants can be performed with various elements. The alkoxide of is added to the alkoxysilane for co-hydrolysis, or its oxide fine particles may be added, and this dopant can be immobilized at 100% yield, and the advantage is that it does not volatilize. Given by It is further in this case molded if ask performed gelation in a vessel of desired shape,
Although it is economically advantageous because it does not require processing operations such as cutting and cutting, this method A) is large in size because cracks or foaming phenomena easily occur during gel drying and sintering. However, it is difficult to obtain a large glass body due to cracks in the drying process, and the transparent vitrification temperature is 1,500 ° C or higher. Since the method of C) has the disadvantage that high temperature is required, and that the product sometimes becomes opaque due to occasional foaming during transparent vitrification, the reproducibility is poor and the yield of transparent glass bodies is high. It has the drawback of being difficult to manufacture well.

(発明の構成) 本発明はこのような不利を解決したゾルーゲル法によっ
て再現性よく、透明ガラス体を歩留りよく製造する方法
に関するもので、これはアルコキシシランを塩基性触
媒の存在下で加水分解して得た均一で一定な球形を有す
る球状シリカ微粒子を含む溶液から残存する塩基性触媒
を蒸留除去して液のPHを8以下としたのち、球状シリカ
微粒子を沈降させ、上澄みを除去して球状シリカ微粒子
を得る工程、この球状シリカ微粒子に、アルコキシシ
ランを酸性触媒の存在下で加水分解した液からアルコー
ルおよび水を蒸留除去してシリカ濃度を高めた溶液を氷
冷下に加え、pHを2〜6に調整し、撹拌混合してシリカ
微粒子を再分散させる工程、この溶液から氷冷下でシ
リカ微粒子を最密充填構造として沈降させ、上澄み液を
除去したのち昇温してゲル化させて得た湿性ゲルを、乾
燥、焼結、ガラス化する工程、とからなることを特徴と
するものである。
(Structure of the Invention) The present invention relates to a method for producing a transparent glass body with good reproducibility by a sol-gel method which solves such disadvantages, which is obtained by hydrolyzing an alkoxysilane in the presence of a basic catalyst. The residual basic catalyst was distilled off from the solution containing the spherical silica fine particles having a uniform and constant spherical shape obtained as described above to adjust the pH of the solution to 8 or less, and then the spherical silica fine particles were allowed to settle, and the supernatant was removed to obtain spherical particles. In the step of obtaining silica fine particles, a solution obtained by distilling alcohol and water from a liquid obtained by hydrolyzing an alkoxysilane in the presence of an acidic catalyst to dilute the silica and increasing the silica concentration is added to the spherical silica fine particles under ice cooling to adjust the pH to 2 Step of adjusting to ~ 6, stirring and mixing to redisperse the silica fine particles, the silica fine particles were allowed to settle as a close-packed structure from this solution under ice cooling, and the supernatant was removed. The wet gel obtained by gelation Chi heated, dried, sintering, step of vitrification and is characterized in that it consists of and.

すなわち、本発明者らは前記したゾルーゲル法のC)の
方法を検討した結果、この方法で得られる湿式ゲルはこ
こに存在する微細シリカ粒子が密度の薄いもので機械的
強度が弱く、焼結ガラス化時に多孔質体である乾燥ゲル
表面のシラノールの脱水反応が生じ、副生する水がガラ
ス中に閉じ込められ、その後の加熱過程で水蒸気の体積
膨張によって発泡現象が生じること、また乾燥ゲル中の
シリカ微粒子群を取りまくシリカゾルから形成されるシ
リカは粒子群よりも低温で焼結ガラス化するのでこれが
ガラス体中に不透明部分として散在して残ることになる
ということを確認し、これらの不利を解決する方法につ
いて種々検討した結果、このアンモニア等の塩基触媒に
よる加水分解で得られるシリカ微粒子は比較的大きな口
径の細孔を有する為に焼結、ガラス化の際副生する水蒸
気の揮散する煙道ともなっている。それ故数密度が小さ
いと補強効果が悪くなるとともに上述の副生水蒸気の揮
散を妨げ発泡の原因となることが判明した。
That is, as a result of examining the method C) of the sol-gel method, the present inventors have found that the wet gel obtained by this method has fine silica particles present therein having a low density, weak mechanical strength, and sintering. During vitrification, the dehydration reaction of silanol on the surface of the dried gel, which is a porous body, causes the by-product water to be trapped in the glass and causes a foaming phenomenon due to the volume expansion of water vapor in the subsequent heating process. Since the silica formed from the silica sol surrounding the silica fine particle group of sinter forms vitrified glass at a temperature lower than that of the particle group, it was confirmed that this would remain scattered as an opaque portion in the glass body, and these disadvantages were confirmed. As a result of various studies on methods of solving the problem, the silica fine particles obtained by hydrolysis with a base catalyst such as ammonia have pores with a relatively large diameter. It has sintered, with flue to volatilization of by-product steam during vitrification. Therefore, it has been found that when the number density is small, the reinforcing effect is deteriorated and the vaporization of the above-mentioned by-product steam is hindered, which causes foaming.

一方シリカ微粒子の数密度が小さいとそれを取巻くシリ
カゾル部がゲル化した時の不透明部分の原因となるが、
数密度が大きくなるとシャープな焼結、ガラス化温度を
持ち、しかも低温でガラス化し易く、くもりもなく均一
で透明なガラス体が得られることが判った。従ってゲル
化前にシリカ微粒子の数密度を出来るだけ大とする事が
好ましい。
On the other hand, if the number density of silica fine particles is small, it causes an opaque part when the silica sol part surrounding it is gelled,
It has been found that when the number density increases, the glass body has sharp sintering and vitrification temperatures, is easily vitrified at a low temperature, and is uniform and transparent without clouding. Therefore, it is preferable to make the number density of silica fine particles as high as possible before gelation.

そのためにはこれ等の粒状シリカ微粒子が最密充填構造
をなすことが好ましい。一般に同じ大きさの球を最も密
に積み重ねた構造を最密充填構造というが、本発明の球
状シリカ微粒子が同じ大きさの均一な単分散系よりなる
ことから、これを濃縮し沈殿すると該球状シリカ微粒子
が最密充填構造を成すことを確認した。
For that purpose, it is preferable that these granular silica particles form a close-packed structure. Generally, a structure in which spheres of the same size are most densely stacked is referred to as a close-packed structure, but since the spherical silica fine particles of the present invention are composed of a uniform monodisperse system of the same size, it is possible to concentrate and precipitate the spherical spheres. It was confirmed that the silica fine particles had a close-packed structure.

本発明ではシリカゾル溶液中で球状シリカ微粒子が最密
充填構造を成すことから、このゾル溶液を昇温ゲル化し
て湿性ゲル→乾燥ゲル→焼結→ガラス化の工程における
体積収縮率が従来法では85%以上であったものを60%以
下と小さくして、それによる収縮歪が小さいために割れ
が生じにくい、前述の副生水蒸気等の揮散が容易なため
それ等による発泡現象を防ぎ、くもりの無い透明ガラス
体を再現性よく、しかも歩留りよく得ることを可能にし
た。
In the present invention, since the spherical silica fine particles form a close-packed structure in the silica sol solution, the volumetric shrinkage in the steps of wet gel → dry gel → sintering → vitrification in the conventional sol solution is increased by conventional method. By reducing the ratio of 85% or more to 60% or less, the shrinkage strain caused by it is less likely to cause cracks. It is easy to volatilize the above-mentioned by-product water vapor, etc. It is possible to obtain a transparent glass body with no reproducibility and high yield.

このような粒径が一定な単分散の球状シリカ微粒子はジ
ャーナル・オブ・コロイド・アンド・インターフェイス
サイエンス26 62(1968)や特願昭61−221569号明細書
に記載されている方法で得られる。それによるとアンモ
ニア、有機溶剤、水系で一定温度でアルコキシシランの
加水分解を行なえばそれ等の添加量、温度を変化させる
ことにより0.01〜2.0μmの範囲で粒径のコントロール
が出来る。すなわち、アンモニア量を増すと粒径は大と
なり減ずると小にする。水は粒径の最大を示す値があり
量により変る。溶媒は少ないと大、多いと小、温度は低
いと大、高いと小となる。以上の条件を選ぶことにより
一定の均一な粒径の球状シリカ微粒子が得られる。粒径
は0.1〜2.0μmがよい。0.1μm以下では時間がかかり
好ましくない。
Such monodisperse spherical silica fine particles having a constant particle size can be obtained by the method described in Journal of Colloid and Interface Science 2662 (1968) and Japanese Patent Application No. 61-221569. According to this, if the alkoxysilane is hydrolyzed at a constant temperature with ammonia, an organic solvent, or an aqueous system, the particle size can be controlled in the range of 0.01 to 2.0 μm by changing the addition amount and temperature of the alkoxysilane. That is, when the amount of ammonia is increased, the particle size is increased, and when it is decreased, the particle size is decreased. Water has a maximum particle size, which varies depending on the amount. The amount of solvent is large, small is large, small is large, and high is small. By selecting the above conditions, spherical silica fine particles having a uniform particle size can be obtained. The particle size is preferably 0.1 to 2.0 μm. If it is less than 0.1 μm, it takes time and is not preferable.

本発明で用いるアルコキシシランはは式 (RO)4Siで示され、Rは炭素数が4以上のものとする
とこれから得られるゾル層が疎水性を増して2層に分離
し、均一ゾル層が得られなくなるので炭素数が1〜4の
アルキル基であるものとされるので、これにはテトラメ
トキシシラン、テトラエトキシシラン、テトラプロポキ
シシラン、テトラブトキシシラン、メトキシトリエトキ
シシラン、ジメトキシジエトキシシラン、トリメトキシ
エトキシシランなどが例示されるが、加水分解反応性、
入手のし易さ、価格の点からはテトラメトキシシラン、
テトラエトキシシランが好ましいものとされる。
The alkoxysilane used in the present invention is represented by the formula (RO) 4 Si, and when R has a carbon number of 4 or more, the sol layer obtained from the R has increased hydrophobicity and is separated into two layers. Since it is considered to be an alkyl group having 1 to 4 carbon atoms because it cannot be obtained, this includes tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, methoxytriethoxysilane, dimethoxydiethoxysilane, Examples include trimethoxyethoxysilane, but hydrolysis reactivity,
In terms of availability and price, tetramethoxysilane,
Tetraethoxysilane is preferred.

この石英ガラスを光通信用として使用する場合には、こ
れにドーパントを添加してその屈折率を調整することが
必要とされる。したがって本発明の方法においてドーパ
ントを添加する場合には、リン、チタン、アルミニウ
ム、ボロン、ゲルマニウム、ジルコニウム、ネオジアム
などのアルコキシ化合物、例えばPO(OR)3,Ti(OR)4,
Al(OR)3,B(OR)3,Ge(OR)4,Zr(OR)4,Nd(OR)
(Rは炭素数1〜4のアルキル基)をアルコキシシラン
に所定量添加すればよく、これによれば本発明の方法が
特に高温を必要としないのでドーパントが揮散すること
がなく、略100%の固定率でドープすることができると
いう有利性も与えられる。
When this quartz glass is used for optical communication, it is necessary to add a dopant to it to adjust its refractive index. Therefore, when a dopant is added in the method of the present invention, phosphorus, titanium, aluminum, boron, germanium, zirconium, alkoxy compounds such as neodymium, for example PO (OR) 3 , Ti (OR) 4 ,
Al (OR) 3 , B (OR) 3 , Ge (OR) 4 , Zr (OR) 4 , Nd (OR) 3
(R is an alkyl group having 1 to 4 carbon atoms) may be added to the alkoxysilane in a predetermined amount. According to this method, since the method of the present invention does not particularly require high temperature, the dopant does not evaporate, and the dopant is substantially 100%. The advantage of being able to dope with a fixed rate of

したがって上記した、、工程中で作ったものとす
ると、この第3工程で沈降したシリカ微粒子は最密充填
構造体の数密度の高いものとなり、これを昇温してゲル
化させた湿式ゲルを乾燥、焼結して得られるガラス体に
は割れが発生したり、発泡することがないということを
見出し、これによれば透明ガラス体を再現性よく高い歩
留りで得ることができることを確認して本発明を完成さ
せた。
Therefore, assuming that the fine particles are formed in the above-mentioned step, the silica fine particles precipitated in the third step have a high number density of the close-packed structure, and the wet gel obtained by heating this to form a gel It was found that the glass body obtained by drying and sintering does not crack or foam, and it was confirmed that a transparent glass body can be obtained with good reproducibility and high yield. The present invention has been completed.

以下、本発明の方法をこの工程順にしたがってさらに詳
細に説明する。
Hereinafter, the method of the present invention will be described in more detail according to this order of steps.

本発明の方法における第1工程はアルコキシシランの加
水分解で均一な粒径を有する単分散のシリカ微粒子懸濁
液を得る工程である。アルコキシシランまたはこれにド
ーパントとしての金属アルコキシドを必要に応じて加え
たものを加水分解させるときに添加される塩基性触媒と
してはアンモニア水が用いられるが、この加水分解は塩
基性触媒としてのアンモニア水0.1〜10モルと2〜20モ
ルの水およびアルコキシシランと相溶性のある有機溶
剤、特にはメタノール、エタノール、プロパノール、ブ
タノールのような炭素数4以下のアルコール5〜100モ
ルとの混合液を大気圧下または加圧下に0〜50℃で撹拌
しているところに、上記したアルコキシシラン1モルを
必要に応じ溶剤と共に滴下して行えばよいが、この撹拌
は生成したシリカ粒子が凝集して集合体を作らないよう
にするために高い剪断力を備えた撹拌装置を用いて激し
く撹拌することがよい。この加水分解でアルコキシシラ
ンは球状シリカ微粒子を含有する懸濁液とされるが、こ
のものは蒸留によってここに残存しているアンモニア水
を留去するとpHが低下し、このpH値が8以上であると後
記する第2工程で添加される酸性加水分解均一ゾルが瞬
時にゲル化してしまうので8以下のものとすることが必
要とされる。なお、このpHを8以下とするためにはこの
懸濁液から水と塩基性触媒としてのアンモニアを留去す
ればよく、これによれば懸濁液は次第にSiO2濃度が増加
していくが、これが50重量%を越えるとシリカの凝集ま
たはゲル化が生じ易くなるので、SiO2が50重量%以上に
なってもpHが8以下とならないときには系内に水を加え
て留去を続けることがよい。
The first step in the method of the present invention is a step of obtaining a monodispersed silica fine particle suspension having a uniform particle size by hydrolysis of alkoxysilane. Ammonia water is used as a basic catalyst that is added when the alkoxysilane or a metal alkoxide as a dopant added thereto as needed is hydrolyzed, and this hydrolysis uses ammonia water as a basic catalyst. A large amount of a mixed solution of 0.1 to 10 mol and 2 to 20 mol of water and an organic solvent compatible with alkoxysilane, particularly 5 to 100 mol of an alcohol having a carbon number of 4 or less such as methanol, ethanol, propanol and butanol. While stirring at 0 to 50 ° C under atmospheric pressure or pressure, 1 mol of the above-mentioned alkoxysilane may be added dropwise together with a solvent if necessary, but this stirring aggregates the generated silica particles to aggregate. It is advisable to stir vigorously using a stirrer with high shear to avoid body buildup. By this hydrolysis, the alkoxysilane is made into a suspension containing spherical silica fine particles, but when this solution distills off the ammonia water remaining here by distillation, the pH drops, and when this pH value is 8 or higher, If so, the acidic hydrolysis homogeneous sol added in the second step to be described later is instantly gelled, so that it is required to be 8 or less. In addition, in order to adjust the pH to 8 or less, water and ammonia as a basic catalyst may be distilled off from the suspension. According to this, the SiO 2 concentration of the suspension gradually increases. When the content exceeds 50% by weight, silica aggregates or gels easily, so if the pH does not fall below 8 even when the SiO 2 content exceeds 50% by weight, add water to the system and continue the distillation. Is good.

このようにして得られたシリカは球状であり、均一で一
定の粒径を有する単分散溶液で得られる。これを放置す
るとシリカ微粒子が沈降するが粒径が0.2μm以下の小
さい粒子は短時間では沈降しないのでこれは遠心沈降な
どで沈降させることもよく、この沈降後、上澄み液を除
去すればシリカ微粒子が得られる。
The silica thus obtained is spherical and can be obtained as a monodisperse solution having a uniform and constant particle size. If this is allowed to stand, the silica fine particles will settle, but small particles with a particle size of 0.2 μm or less will not settle in a short time, so this may be settled by centrifugal sedimentation, etc. After this settling, if the supernatant liquid is removed, the silica fine particles Is obtained.

本発明の第2工程はこの第1工程で得られたシリカ微粒
子にアルコキシシランの酸性加水分解で作ったゾルを添
加してこのゾル中でシリカ微粒子と再分散させる工程で
あるが、このアルコキシシランの酸性加水分解は1×10
-4〜10-1モルの塩酸、硫酸、硝酸などの無機酸または酢
酸などの有機酸のような酸性触媒と2〜20モルの水およ
び必要に応じ添加されるアルコールなどの有機溶剤から
なる混合液を常圧または加圧下に0〜50℃で撹拌しなが
ら、これに前記アルコキシシランまたはこれにドーパン
トとしての金属アルコキシドを加えたもの1モルを必要
に応じ添加されるアルコールなどの有機溶剤と共に滴下
すればよく、この加水分解で作られたゾル溶液はついで
水、アルコールなどを留去させてシリカ濃度を高めてか
ら、これを前記した第1工程で得られたシリカ微粒子に
添加すればよい。なお、この水、アルコールなどの留去
は通常の単蒸発操作でも蒸留操作でもよいが、これによ
ると水、アルコールと共に酸も留去され、ゾルのpHはこ
の操作と共に次第に上昇して中性に近づくが、中性に近
つく程加熱によりゲル化し易くなるので、これはできる
だけ低温度で減圧単蒸発とすることがよい。
The second step of the present invention is a step of adding a sol prepared by acidic hydrolysis of alkoxysilane to the silica fine particles obtained in the first step and redispersing the silica fine particles in the sol. Acid hydrolysis of 1 × 10
-4 to 10 -1 mol Mixture of acidic catalyst such as inorganic acid such as hydrochloric acid, sulfuric acid, nitric acid or organic acid such as acetic acid and 2 to 20 mol of water and organic solvent such as alcohol added as needed While stirring the liquid under atmospheric pressure or pressure at 0 to 50 ° C., 1 mol of the alkoxysilane or a metal alkoxide as a dopant added thereto is added dropwise with an organic solvent such as an alcohol added as necessary. The hydrolyzed sol solution may be distilled off water, alcohol, etc. to increase the silica concentration, and then added to the silica fine particles obtained in the first step. The water, alcohol, etc. may be distilled off by a normal single evaporation operation or a distillation operation, but according to this, the acid is distilled off together with water and alcohol, and the pH of the sol gradually increases with this operation to become neutral. However, the closer it is to neutrality, the easier it becomes to gel by heating. Therefore, it is preferable to carry out reduced pressure single evaporation at a temperature as low as possible.

このシリカ濃度を高めたゾル溶液はついでこれを上記し
た第1工程で得たシリカ微粒子に添加し、撹拌混合する
のであるが、このものはpH値が2〜6の範囲のものとす
ることがよいので、ここにはpH調節剤として塩酸、硫酸
などの無機酸またはアンモニア水などのアルカリ性物質
を適宜添加することがよい。また、この混合撹拌はゲル
化を防止するために低温で行なうことがよいので、これ
は0〜20℃に保つ為に氷冷下で行なうことが必要とされ
る。この混合撹拌によって第1工程で得られたシリカ微
粒子はこの工程で添加されるシリカゾル液と混合され、
シリカ微粒子はシリカゾル液中に再分散される。
The sol solution having an increased silica concentration is then added to the silica fine particles obtained in the above-mentioned first step and mixed by stirring, which may have a pH value in the range of 2 to 6. Therefore, an inorganic acid such as hydrochloric acid or sulfuric acid or an alkaline substance such as aqueous ammonia may be appropriately added as a pH adjusting agent. Further, since this mixing and stirring is preferably carried out at a low temperature in order to prevent gelation, it is required to be carried out under ice cooling in order to keep the temperature at 0 to 20 ° C. The silica fine particles obtained in the first step by this mixing and stirring are mixed with the silica sol liquid added in this step,
The silica fine particles are redispersed in the silica sol liquid.

本発明の第3工程はこの第2工程で得られたシリカ微粒
子含有ゾル液をゲル化させて湿性ゲルとし、これを乾
燥、焼結ガラス化するもので、この湿性ゲルは第2工程
で得られたシリカゾル液中に再配分されたシリカ微粒子
を氷冷下で沈降させ、上澄み液を除去したのち、昇温ゲ
ル化することによって得ることができる。この沈降を氷
冷下とすることは沈降によってシリカ微粒子が最密充填
構造体となる前にゲル化することを防止するためである
が、この温度は0〜20℃となるようにすればよい。ま
た、このシリカ微粒子の沈降は自然沈降としても遠心沈
降としてもよい。このゲル化は加熱によって行なわせれ
ばよく、これは温度の高い程ゲル化が速くなるが、余り
高温とすると乾燥が同時に進行して割れの生じるおそれ
があるので30〜60℃とすることがよい。
In the third step of the present invention, the silica fine particle-containing sol liquid obtained in the second step is gelled to obtain a wet gel, which is dried and sintered into glass. This wet gel is obtained in the second step. It can be obtained by precipitating silica fine particles redistributed in the obtained silica sol liquid under ice cooling, removing the supernatant liquid, and then gelating at elevated temperature. This settling is performed under ice cooling in order to prevent gelation of the silica fine particles before forming the closest packed structure by settling, but this temperature may be set to 0 to 20 ° C. . Further, the precipitation of the silica fine particles may be natural precipitation or centrifugal precipitation. This gelation may be carried out by heating. The higher the temperature, the faster the gelation, but if the temperature is too high, drying may proceed at the same time and cracks may occur, so it is preferable to set it to 30 to 60 ° C. .

このようにして得られた湿性ゲルはついで乾燥、焼結す
ることによってガラスされるが、この乾燥は急激乾燥と
すると割れを生じさせるので湿性ゲルに含有されている
水分と残留アルコールの揮発速度を抑えて除々に行なわ
せることがよく、したがってこれには開口率が0.1〜5
%である容器の中で50〜70℃の温度で初期湿性ゲルが15
〜35重量%になるまで乾燥させることがよい。また、こ
の焼結はこの乾燥で得られた乾燥ゲルを室温から1,100
℃に段階的に昇温させることで行なえばよく、100〜300
℃における表面吸着水の脱着、300〜500℃のアルゴンガ
ス雰囲気における残留有機物の酸化、脱炭素、500〜1,1
00℃における表面シラノール基の脱水結合の間における
熱歪みによる割れを防止するためには昇温速度を10〜10
0℃/時とすればよいが、基体中の熱伝導を良好なもの
として割れを防止するためにはこの雰囲気をヘリウムガ
ス雰囲気とすることがよい。なお、この焼結体中のOH基
除去のためには700〜900℃における焼結をCl2、SOCl2
どのCl化剤の存在下で行なって脱OH処理すると共に、こ
れに引続く900〜1,100℃における焼結をO2ガス等の酸化
剤の存在下における酸化脱Cl化処理とすることがよい。
The wet gel thus obtained is then dried and sintered to be glass, and this drying causes cracks when it is rapidly dried, so the rate of evaporation of water and residual alcohol contained in the wet gel is reduced. It is better to hold it down and to do it gradually, so this requires an aperture ratio of 0.1-5.
% Of initial wet gel at a temperature of 50-70 ° C in a container that is
It is recommended to dry to ~ 35% by weight. In addition, this sintering was performed by drying the dried gel obtained by this drying from room temperature at 1,100
It may be carried out by gradually raising the temperature to 100 ° C.
Desorption of surface adsorbed water at ℃, oxidation of residual organic matter in degassed atmosphere of argon gas at 300 to 500 ℃, decarbonization, 500 to 1,1
In order to prevent cracking due to thermal strain during dehydration bonding of surface silanol groups at 00 ° C, the heating rate is set to 10 to 10
The temperature may be 0 ° C./hour, but in order to improve the heat conduction in the substrate and prevent cracking, it is preferable to set this atmosphere as a helium gas atmosphere. In order to remove the OH group in the sintered body, sintering at 700 to 900 ° C. is performed in the presence of a Cl agent such as Cl 2 and SOCl 2 to perform deOH treatment, and subsequently 900 Sintering at ˜1,100 ° C. is preferably an oxidative dechlorination treatment in the presence of an oxidizing agent such as O 2 gas.

このガラス化はこのようにして得られた焼結ゲルを1,10
0〜1,400℃に段階的に昇温して行なえばよいが、これは
1,100〜1,200℃で細孔の閉孔を行ない、1,200〜1,400℃
で透明ガラス化するようにすればよい。
This vitrification converts the sintered gel thus obtained into 1,10
The temperature may be raised stepwise from 0 to 1,400 ° C.
Closes pores at 1,100-1,200 ℃, 1,200-1,400 ℃
It may be made transparent glass.

本発明の方法による石英ガラスの製法はアルコキシシラ
ンを上記した第1〜第3工程で処理することによって行
なわれるが、これによればシリカゾル液中で球状シリカ
微粒子の数密度を高め、最密充填構造体と成し、この昇
温ゲル化で得られた湿性ゲルを乾燥、焼結、ガラス化し
て得られる石英ガラスは湿性ゲルからの工程中の体積収
縮率が60%以下と小さく、したがって割れや発泡のない
透明なものとして得られるので、石英ガラスを安価にか
つ歩留りよく生産することができるという工業的な有利
性が与えられる。
The method for producing quartz glass according to the method of the present invention is carried out by treating the alkoxysilane in the above-mentioned first to third steps. According to this method, the number density of the spherical silica fine particles in the silica sol liquid is increased to obtain the closest packing. Quartz glass obtained by drying, sintering, and vitrifying the wet gel obtained by this temperature rise gelation forming a structure has a small volume shrinkage ratio of 60% or less during the process from the wet gel, and therefore cracks. Since it is obtained as a transparent material without foaming or foaming, it has an industrial advantage that quartz glass can be produced inexpensively and with high yield.

つぎに本発明の実施例をあげるが、例中における体積収
縮率は次式で求めたものである。
Next, examples of the present invention will be given. The volumetric shrinkage ratio in the examples is obtained by the following equation.

実施例1 水321g,無水エタノール4,950ml、アンモニア水(NH3
度28重量%)297mlの混合液を滴下ロート、温度計、タ
ービン撹拌翼のついたガラス製フラスコに入れ、温度を
10℃に保って激しく撹拌させながら、これにテトラエト
キシシラン926gを滴下し、2時間撹拌して加水分解させ
たのち、これに純水を断続的に加えつつ減圧下で水、エ
タノール、アンモニアを留去してpHが6.5の濃度30%の
シリカ懸濁液を作り、ついでこれを4,000rpm,20分間で
遠心分離してシリカ微粒子を沈殿させたのち上澄液を除
去して粒径が0.2μmである均一な球状シリカ微粒子を
作った。
Example 1 A mixed solution of 321 g of water, 4,950 ml of absolute ethanol and 297 ml of ammonia water (NH 3 concentration: 28% by weight) was placed in a glass flask equipped with a dropping funnel, a thermometer, and a turbine stirring blade, and the temperature was adjusted.
While maintaining vigorous stirring at 10 ° C, 926 g of tetraethoxysilane was added dropwise to this, and after stirring for 2 hours to hydrolyze, pure water was added intermittently to this, water, ethanol, and ammonia were added under reduced pressure. Distill off to make a silica suspension having a pH of 6.5 and a concentration of 30%, and then centrifuge this at 4,000 rpm for 20 minutes to precipitate silica fine particles, and then remove the supernatant liquid to obtain a particle size of 0.2. Uniform spherical silica microparticles with a size of μm were made.

他方、テトラエトキシシラン260gと、無水エタノール10
3mlとからなる混合液を25℃に保ち、これに激しく撹拌
しながら0.02規定の塩酸水90gを加え、2時間撹拌して
加水分解させたのち、これを減圧下に、40〜50℃に加熱
して水およびエタノールを留去しシリカ濃度が30重量%
であるシリカゾル液を作り、これを上記で得たシリカ微
粒子に添加し、激しく撹拌してシリカ微粒子を再分散し
たのち、氷冷下で激しく撹拌しつつアンモニア水を添加
してそのpHを5に調整し、これを160×160×50mmのテフ
ロン製容器に入れ、氷冷下に一昼夜放置してシリカ微粒
子を沈降させたのちスポイトで上澄液を除去してから得
られたものについてスーパープローブマイクロアナライ
ザーJCXA733〔日本電子(株)製商品名〕を用いて電子
顕微鏡写真を撮影したところ、このものは第1図に示し
たように球状シリカ微粒子が最密充填構造をとっている
ことが確認された。
On the other hand, 260 g of tetraethoxysilane and 10 parts of absolute ethanol
Keep the mixed solution consisting of 3 ml at 25 ℃, add 90 g of 0.02 N hydrochloric acid water to this with vigorous stirring, and stir for 2 hours to hydrolyze, then heat this to 40 to 50 ℃ under reduced pressure. Then, water and ethanol are distilled off, and the silica concentration is 30% by weight.
The silica sol liquid is prepared, and this is added to the silica fine particles obtained above, and the silica fine particles are redispersed by vigorous stirring, and then ammonia water is added while vigorously stirring under ice cooling to adjust the pH to 5. Prepared, put this in a Teflon container of 160 × 160 × 50 mm, let stand for one day under ice cooling to settle the silica fine particles, and then remove the supernatant with a dropper. When an electron micrograph was taken using an analyzer JCXA733 (trade name of JEOL Ltd.), it was confirmed that the spherical silica fine particles had a close-packed structure as shown in FIG. It was

ついで、これを1mmの穴が開口率で0.3%で設けられてい
る蓋を取り付けた恒温槽に入れ30℃に加熱してゲル化さ
せて、同寸法のゲル体10個を作り、この10個のゲル体を
60℃の恒温槽に移し、その温度で16日乾燥したが、ゲル
体にはこの間1個の割れもなかった。つぎに、この10個
の乾燥ゲル体をマッフル炉に入れ、室温から300℃まで
昇温速度30℃/時で昇温し、この温度で5時間加熱した
のち、脱炭素処理を行いながら300℃から700℃まで昇温
速度30℃/時で昇温し、この温度で2時間加熱して細孔
が開いている状態で脱水縮合させ、さらにこの系内をヘ
リウムガス雰囲気としてから700℃から1,100℃まで昇温
速度30℃/時で昇温し、この温度で10時間保持し、細孔
を閉孔化した。引き続き昇温速度30℃/時で1100℃から
1300℃まで昇温して、この温度で5時間加熱してガラス
化したところ、120×120×10mmの大きさの透明な石英ガ
ラス体10個が得られた、このときの湿性ゲルからガラス
体への体積収縮率は58%であった。
Then, put this in a thermostat with a lid having a 1 mm hole with an opening ratio of 0.3% and heat it to 30 ° C to gel it, and make 10 gel bodies of the same size. The gel body
It was transferred to a constant temperature bath of 60 ° C. and dried at that temperature for 16 days, but the gel body did not have one crack during this time. Next, the 10 dried gel bodies were placed in a muffle furnace, heated from room temperature to 300 ° C at a heating rate of 30 ° C / hour, heated at this temperature for 5 hours, and then decarbonized at 300 ° C. To 700 ° C at a heating rate of 30 ° C / hour, and heating at this temperature for 2 hours to dehydrate and condense in the state where the pores are open. The temperature was raised to 30 ° C. at a heating rate of 30 ° C./hour, and this temperature was maintained for 10 hours to close the pores. Then from 1100 ℃ at a heating rate of 30 ℃ / hour
When heated to 1300 ° C and heated at this temperature for 5 hours to vitrify, 10 transparent quartz glass bodies with a size of 120 × 120 × 10 mm were obtained. From this wet gel, glass bodies were obtained. The volumetric shrinkage rate was 58%.

実施例2 実施例1におけるテトラエトキシシラン926gをテトラエ
トキシシラン880gとリン酸トリメチル31gの混合物とし
たほかは実施例1と同様に処理してテトラエトキシシラ
ンの塩基性触媒存在下での加水分解、沈降、上澄液除去
を行なって平均粒径が、0.2μmのリンでドープされた
シリカ微粒子を作った。
Example 2 Hydrolysis of tetraethoxysilane in the presence of a basic catalyst was performed in the same manner as in Example 1 except that 926 g of tetraethoxysilane in Example 1 was changed to a mixture of 880 g of tetraethoxysilane and 31 g of trimethyl phosphate. By performing sedimentation and removal of the supernatant, fine silica particles doped with phosphorus having an average particle size of 0.2 μm were prepared.

また、実施例1におけるテトラエトキシシラン260gの代
わりにテトラエトキシシラン247gとリン酸トリメチル
〔(CH3)O〕3PO8.8gとの混合物を使用したほかは実施
例1と同様に処理してテトラエトキシシランの酸性触媒
存在下での加水分解、水、エタノール除去を行なってリ
ンでドープされたシリカ濃度30重量%のシリカゾル液を
作った。
Also, instead of 260 g of tetraethoxysilane in Example 1, a mixture of 247 g of tetraethoxysilane and 8.8 g of trimethyl phosphate [(CH 3 ) O] 3 PO was used and treated in the same manner as in Example 1 to give tetra. Hydrolysis of ethoxysilane in the presence of an acidic catalyst, removal of water and ethanol were carried out to prepare a silica sol liquid doped with phosphorus and having a silica concentration of 30% by weight.

つぎにこのシリカ微粒子とシリカゾル液とを実施例1と
同様の方法で混合し、再分散、沈降し、上澄みを除去
し、昇温ゲル化して湿性ゲルを作り、これを乾燥、焼
結、ガラス化したところ、この体積収縮率は58%でこの
場合にも割れ、発泡なしでリンでドープされた石英ガラ
ス10個が得られ、このときのリンの固定率はほぼ100%
であった。
Next, the silica fine particles and the silica sol solution were mixed in the same manner as in Example 1, redispersed and settled, the supernatant was removed, and the temperature was gelated to form a wet gel, which was dried, sintered, and glass. As a result, the volumetric shrinkage rate was 58%, and in this case as well, 10 pieces of quartz glass doped with phosphorus were obtained without cracking, and the phosphorus fixation rate at this time was almost 100%.
Met.

比較例1 水209g,無水エタノール3,228ml、28重量%のアンモニア
水194mlの混合物を実施例1で使用したガラス製フラス
コに入れ、これにテトラエトキシシラン604gを滴下し、
2時間撹拌して加水分解させたのち、これに純水を断続
的に加えつつ減圧下で水、エタノール、アンモニアを留
去してpHが6.5になるまで濃縮し、平均粒径が0.16μm
でシリカ濃度が30重量%のシリカ微粒子懸濁液を作っ
た。
Comparative Example 1 A mixture of 209 g of water, 3,228 ml of absolute ethanol and 194 ml of 28% by weight ammonia water was placed in the glass flask used in Example 1, and 604 g of tetraethoxysilane was added dropwise thereto.
After stirring for 2 hours to hydrolyze, water, ethanol, and ammonia were distilled off under reduced pressure while adding pure water intermittently to the solution until the pH was adjusted to 6.5, and the average particle size was 0.16 μm.
A silica fine particle suspension having a silica concentration of 30% by weight was prepared.

他方、テトラエトキシシラン494g、無水エタノール196m
lの混合物を実施例1で使用したガラス製フラスコに入
れ、0.02規定の塩酸水171gを加え、2時間撹拌して加水
分解させてシリカゾル液を作り、これを上記したシリカ
微粒子懸濁液と混合したのちアンモニア水を加えてpHを
5.0に調整したものについて実施例と同じ電子顕微鏡写
真を撮影したところ、これは第2図に示したように球状
シリカ微粒子の各粒子がバラバラとなっており、最密充
填構造となっていないことが判った。
On the other hand, tetraethoxysilane 494g, absolute ethanol 196m
The mixture (1) was placed in the glass flask used in Example 1, 171 g of 0.02N hydrochloric acid was added, and the mixture was stirred for 2 hours for hydrolysis to produce a silica sol solution, which was mixed with the above silica fine particle suspension. After that, add ammonia water to adjust the pH.
The same electron micrograph as that of the example was taken for the one adjusted to 5.0, and it was found that the spherical silica fine particles were scattered as shown in FIG. 2 and did not have a close-packed structure. I understood.

ついで、250×250×50mmのテフロン製容器に入れ、これ
を1mmの穴が開口率0.3%とされている蓋を取りつけた30
℃の恒温槽に入れてゲル化させて同寸法の湿式ゲル体10
個を作り、このゲル体10個を60℃の恒温槽に移し、その
温度で16日間乾燥して乾燥ゲルとしたところ、このもの
は10個のうち2個に割れが生じていた。
Then, put it in a 250 x 250 x 50 mm Teflon container, and attach it to a lid with a 1 mm hole with an opening ratio of 0.3% 30
Wet gel body of the same size by gelling in a constant temperature bath at ℃ 10
10 pieces of this gel were transferred to a constant temperature bath at 60 ° C., and dried at that temperature for 16 days to give a dry gel. As a result, 2 out of 10 pieces had cracks.

つぎにこの残りの8個のゲル体について実施例1と同じ
方法で焼結、ガラス化したところ、このうちの4個は12
0×120×10mmの透明ガラス体となったが、残り4個のう
ちの2個は不透明で1個は割れ、1個は発泡を含むもの
であり、このときの湿性ゲルからガラス体への体積収縮
率は89%であった。
Next, the remaining 8 gel bodies were sintered and vitrified in the same manner as in Example 1, and 4 of them were 12
It became a transparent glass body of 0 × 120 × 10 mm, but two of the remaining four were opaque, one was cracked, and one contained foam. At this time, the wet gel changed to a glass body. The volumetric shrinkage was 89%.

【図面の簡単な説明】[Brief description of drawings]

第1図は実施例1で得られたゲル化前の球状シリカ微粒
子の電子顕微鏡写真、第2図は同じく比較例で得られた
球状シリカ微粒子の電子顕微鏡写真を示したものであ
る。
FIG. 1 is an electron micrograph of the spherical silica fine particles before gelation obtained in Example 1, and FIG. 2 is an electron micrograph of the spherical silica fine particles obtained in the comparative example.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】1)アルコキシシランを塩基性触媒の存在
下で加水分解して得た球状シリカ微粒子を含む溶液から
残存する塩基性触媒を蒸留除去して液のPHを8以下とし
たのち、球状シリカ微粒子を沈降させ、上澄みを除去し
て球状シリカ微粒子を得る工程、 2)この球状シリカ微粒子に、アルコキシシランを酸性
触媒の存在下で加水分解で得た液からアルコールおよび
水を蒸留除去し、シリカ濃度を高めた溶液を氷冷下に加
え、PHを2〜6に調整し撹拌混合してシリカ微粒子を再
分散させる工程、 3)この溶液から氷冷下で球状シリカ微粒子を沈降さ
せ、上澄み液を除去したのち昇温してゲル化させた湿性
ゲルを、乾燥、焼結、ガラス化する工程、 とからなることを特徴とする石英ガラスの製造方法。
1. A method in which the residual basic catalyst is removed by distillation from a solution containing spherical silica fine particles obtained by hydrolyzing an alkoxysilane in the presence of a basic catalyst to bring the pH of the solution to 8 or less, A step of settling the spherical silica fine particles and removing the supernatant to obtain spherical silica fine particles; 2) distilling alcohol and water from the liquid obtained by hydrolysis of the spherical silica fine particles in the presence of an acidic catalyst to obtain alkoxysilane. , A step of adding a solution having a high silica concentration under ice cooling, adjusting PH to 2 to 6 and stirring and mixing to redisperse the silica fine particles, 3) precipitating spherical silica fine particles from this solution under ice cooling, A process for producing quartz glass, which comprises the steps of drying, sintering, and vitrifying a wet gel obtained by removing the supernatant liquid and then raising the temperature to gel.
【請求項2】球状シリカ微粒子を最密充填構造としたの
ち、昇温しゲル化させることを特徴とする特許請求の範
囲第1項記載の石英ガラスの製造方法。
2. The method for producing quartz glass according to claim 1, wherein spherical silica fine particles are made into a close-packed structure and then heated to cause gelation.
【請求項3】湿性ゲルを石英ガラス化する工程における
体積収縮率が60%以下である特許請求の範囲第1項また
は第2項記載の石英ガラスの製造方法。
3. The method for producing quartz glass according to claim 1 or 2, wherein the volumetric shrinkage in the step of vitrifying the wet gel into quartz glass is 60% or less.
【請求項4】アルコキシシランが珪素以外の金属アルコ
キシドもしくは金属オキシアルコキシドを含む該金属の
添加によってドーピングされたものである特許請求の範
囲第1項、第2項または第3項記載の石英ガラスの製造
方法。
4. The silica glass according to claim 1, 2 or 3, wherein the alkoxysilane is doped by adding a metal alkoxide other than silicon or a metal oxyalkoxide. Production method.
JP62246685A 1987-09-30 1987-09-30 Quartz glass manufacturing method Expired - Lifetime JPH0735256B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62246685A JPH0735256B2 (en) 1987-09-30 1987-09-30 Quartz glass manufacturing method
DE8888402420T DE3869308D1 (en) 1987-09-30 1988-09-26 METHOD FOR PRODUCING PEBBLE GLASS.
EP88402420A EP0310486B1 (en) 1987-09-30 1988-09-26 A method for the preparation of silica glass
US07/249,317 US4883521A (en) 1987-09-30 1988-09-26 Method for the preparation of silica glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62246685A JPH0735256B2 (en) 1987-09-30 1987-09-30 Quartz glass manufacturing method

Publications (2)

Publication Number Publication Date
JPS6487522A JPS6487522A (en) 1989-03-31
JPH0735256B2 true JPH0735256B2 (en) 1995-04-19

Family

ID=17152099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62246685A Expired - Lifetime JPH0735256B2 (en) 1987-09-30 1987-09-30 Quartz glass manufacturing method

Country Status (1)

Country Link
JP (1) JPH0735256B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131833A (en) * 1983-12-16 1985-07-13 Seiko Epson Corp Silica glass manufacturing method
JPS61186227A (en) * 1985-02-13 1986-08-19 Seiko Epson Corp Production of quartz glass

Also Published As

Publication number Publication date
JPS6487522A (en) 1989-03-31

Similar Documents

Publication Publication Date Title
EP0310486B1 (en) A method for the preparation of silica glass
EP0293064B1 (en) Sol-gel method for making ultra-low expansion glass
WO2001053225A1 (en) Sol-gel process for producing synthetic silica glass
KR100501759B1 (en) Sol-gel process for the production of tridimensional dry gels, and silica dry gels and silica glasses produced therefrom
US4767433A (en) Spherical silica glass powder particles and process for their production
TW312686B (en)
JPH0735257B2 (en) Quartz glass manufacturing method
WO2010015658A1 (en) Sol-gel process for producing monolithic articles of vitreous silica
JPH0735256B2 (en) Quartz glass manufacturing method
JPH01183421A (en) Production of quartz glass
JP2004161607A (en) Method for producing transparent quartz glass body
JP2003520181A (en) Sol-gel method for producing synthetic silica glass
JP2675819B2 (en) Manufacturing method of quartz glass
JP4268489B2 (en) Method for producing transparent quartz glass body
KR100722378B1 (en) Method for producing transparent silica glass
JPH0776093B2 (en) Quartz glass manufacturing method
KR100722379B1 (en) Method for producing transparent silica glass
JPH0717389B2 (en) Method for producing synthetic quartz glass
JPH0388711A (en) Production of spherical porous body
JPH03199115A (en) Spherical monodispersion beta-sic particle and its production
JPS63171630A (en) Manufacturing method of spherical porous body
JP2621491B2 (en) Method for producing silica glass
JPH01179730A (en) Production of quartz glass
JP2903242B2 (en) Method for producing powdery spherical silica glass
JPH0986919A (en) Method for producing synthetic quartz glass powder

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080419

Year of fee payment: 13