JPH0735576B2 - Continuous strip vacuum deposition equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Use) The present invention continuously coats a thin film such as metal, ceramics or the like on the surface of a strip such as a metal strip by a physical vapor deposition method such as ion plating in a vacuum deposition chamber. The present invention relates to an apparatus for continuously vacuum-depositing a belt-like material for the purpose of coating.

(Prior Art) Conventionally, A is applied to both sides or one side of a strip-shaped material such as a metal strip.
2. Description of the Related Art As a belt-shaped double-sided continuous vacuum deposition processing apparatus for continuously depositing l, Ti, etc., a type as shown in FIG. 4 is known. The continuous vacuum deposition apparatus of the illustrated type is
A vacuum vapor deposition chamber 1 maintained at a high vacuum for performing a vacuum vapor deposition process is provided. Inside the vacuum vapor deposition chamber 1, the strip deflector rolls 3 for performing vapor deposition treatment on both sides of the strip 2 are used. , 4, a lower evaporation source 5 for front surface evaporation and an upper evaporation source 6 for back surface evaporation are provided. On the inlet side and the outlet side of the vacuum vapor deposition chamber 1, while the high vacuum in the vacuum vapor deposition chamber 1 is maintained, the strip 2 to be subjected to the vacuum vapor deposition treatment is introduced into the vacuum vapor deposition chamber 1 from the inlet air atmosphere and is output. The inlet and outlet airlocks 7 and 8 are continuously provided in the vacuum vapor deposition chamber 1 so that they can be led out from the vacuum vapor deposition chamber 1 into the side air atmosphere. The strip-shaped material 2 is composed of a plurality of differential pressure chambers adjusted to have a high degree of vacuum, and the strip 2 is fed from the inlet 1a to the outlet 1b.
It is configured to ensure a vacuum seal for maintaining a high vacuum in the vacuum vapor deposition chamber 1 when the vapor deposition process is performed by continuously passing through the vacuum vapor deposition chamber 1 through the above.

A coil rewinder 9 and a winder 10 are provided on the inlet side of the inlet air lock 7 and the outlet side of the outlet air lock 8, respectively, whereby the rewinder 9 rewinds the coil. The strip 2 is continuously passed from the inlet opening 11 of the inlet side air lock 7 through the vacuum vapor deposition chamber 1 to the outlet opening 12 of the outlet side air lock 8 and evaporated in the vacuum vapor deposition chamber 1 from evaporation sources 5 and 6, respectively. The metal vapor is vapor-deposited on the front surface and the back surface of the strip-shaped material, and the strip-shaped material 2 coming out from the outlet opening 12 of the exit side air lock 8 is wound into a coil by a winding machine 10.

(Problems to be Solved by the Invention) In such a belt-shaped continuous vacuum vapor deposition treatment apparatus, it is necessary to frequently replace the evaporation source installed in the vacuum vapor deposition chamber 1 and replenish the vaporized material. In addition, vapor such as metal evaporated from the evaporation source 5 adheres to vapor deposition equipment and the like installed in the vacuum vapor deposition chamber, and as a result, these equipment do not operate normally. It is necessary to perform cleaning and repair of equipment for use.

However, in the conventional strip continuous vacuum vapor deposition processing apparatus having the above-mentioned configuration, the high vacuum vacuum vapor deposition chamber is opened to the atmosphere for performing each of the above maintenance operations, and the vacuum vapor deposition chamber is opened in the meantime. A certain band does not become a product, the problem that the product yield decreases, and the work time of various maintenance work such as the replacement of the evaporation source, the replenishment of the evaporation, and the repair of the equipment becomes the line down time as it is,
Further, it takes a long time to return the interior of the room to the original degree of vacuum after the completion of various maintenance work, which causes a problem that the operating rate of the equipment is lowered. In addition, the worker's scaffolding was bad, and there was a problem in safety work.

The present invention solves the problems described above, improves product yield,
An object of the present invention is to provide an apparatus for continuously vacuum-depositing a strip-shaped material which shortens the down time of the apparatus, eliminates the decrease in the operating rate of the equipment, and further improves the safety of workers.

(Means for Solving Problems) According to the present invention, as shown in FIG. 1, a vacuum chamber to be evacuated to a high vacuum degree and a vacuum deposition process while maintaining a high vacuum in the vacuum chamber should be performed. Air locks 7 and 8 provided on the inlet side and the outlet side of the vacuum chamber so that the strip 2 can be introduced into the vacuum chamber from the inlet side atmospheric atmosphere and can be led out from the vacuum chamber into the outlet side atmospheric atmosphere, and the vacuum chamber. In the continuous belt-like vacuum vapor deposition processing apparatus including the deflector rolls 3 and 4 for reversing the belt-like material and the evaporation sources 5 and 6, the fixing is constantly maintained at a high degree of vacuum through the inlet and outlet air locks. The vacuum chamber 15 and the evaporation sources 5 and 6 are provided inside and exchangeable vapor deposition chambers 22a and 22b which are respectively connected to the fixed vacuum chamber 15 at the vacuum vapor deposition work position through the openings 20, 21, and 28 with a closed door and the aforesaid Deflector roll 3, through openings 20, 21, 28 with sealing doors 18, 19, 29
It is characterized in that it is provided with devices 24, 25, 26, 27 for moving the 4 from the fixed vacuum chamber 15 into the vapor deposition chamber 22a or 22b.

Further, in carrying out the present invention, a vapor deposition unit 22, which has at least two vapor deposition chambers 22a, 22b, respectively.
23, and an apparatus 28, 20 for moving the vapor deposition units 22, 23 so that either one of the vapor deposition units 22, 23 is connected to the vacuum vapor deposition work position A where the vapor deposition chamber 22a or 22b is connected to the fixed vacuum chamber 15. Is preferably provided.

(Operation) The strip-shaped continuous vapor deposition treatment apparatus of the present invention having the above-mentioned configuration,
The vapor deposition chamber 22a is connected to the fixed vacuum chamber 15 through the openings 20, 21, and 28 with the closed door, the closed doors 18, 19, and 29 are opened, and the deflector rolls 3 and 4 are moved from the fixed vacuum chamber 15 to the vapor deposition chamber 22a. To a predetermined high vacuum level in the fixed vacuum chamber 15 and the vapor deposition chamber 22a communicating with the fixed vacuum chamber 15 through the openings 20, 21, and 28 to maintain the belt-like material 2 in these chambers. , 4 to pass through the vapor deposition chamber 22a, and vaporized from the evaporation sources 5 and 6 in the vapor deposition chamber 22a.

When it becomes necessary to perform maintenance work such as replacement of evaporation source, replenishment of evaporation material, cleaning of vapor deposition equipment, repair, etc., the deflector rolls 3 and 4 located in the vapor deposition chamber 22a are moved and fixed. It is located in the vacuum chamber 15 and has a closed door 18 with openings 20 and 21,
19 is closed and the vapor deposition chamber 22a is exchanged with the alternate vapor deposition chamber 22b.

The replacement vapor deposition chamber 22b completes the above-mentioned maintenance work while performing the vacuum vapor deposition work in the vapor deposition chamber 22a, and preferably closes the sealing door 29 provided in the opening 28 to a predetermined high vacuum inside. It is evacuated by a suitable vacuum device every time.

Therefore, the replacement vapor deposition chamber 22b is moved from the maintenance or standby position B to the vacuum vapor deposition work position A, and the fixed vacuum chamber
After connecting to 15 through the opening 20, 21, 28 with the closed door,
By opening 18,19,29 to connect the vapor deposition chamber 22b to the fixed vacuum chamber 15, and moving the deflector rolls 3 and 4 from the fixed vacuum chamber 15 to the inside of the vapor deposition chamber 22b as described above, The vacuum deposition operation can be restarted immediately.

As described above, according to the present invention, the belt-like material during the vacuum vapor deposition process is always kept in the high vacuum atmosphere, so that the defective product due to the maintenance work can be completely eliminated. In addition, the downtime of the device due to maintenance work can be significantly shortened, and the operating rate of the equipment can be improved. In addition, maintenance work can be performed in a safe place for workers.

(Embodiment) FIGS. 1 to 3 show an embodiment of the present invention. In the example shown,
The fixed vacuum chamber 15 is provided by a vacuum device (not shown) so that it can be evacuated to a predetermined high vacuum degree, and the inlet side air lock 7 is connected to an inlet 15a provided at the bottom of the inlet side wall 16 of the fixed vacuum chamber 15. The outlet side air lock 8 is connected to the outlet 15b provided on the upper side of the outlet side wall 17, and while maintaining a high vacuum in the fixed vacuum chamber 15, the strip to be vacuum-deposited is vacuumed from the inlet side atmospheric atmosphere. It is configured so that it can be introduced into the chamber and led out from the vacuum chamber into the atmosphere on the outlet side.

Lower and upper openings 20 and 21 respectively closed by airtight doors 18 and 19 are provided at the lower part of the outlet side wall 16 and the upper part of the inlet side wall 17 of the fixed vacuum chamber 15, respectively, through the lower and upper openings 20 and 21. Lower and upper vapor deposition units 22 and 23 having a vapor deposition chamber 22a communicating with the fixed vacuum chamber 15 are provided. In the vapor deposition chambers 22a of the vapor deposition units 22 and 23, lower and upper deflector rolls 3 and 4 for reversing strips, a lower evaporation source 5 for front surface evaporation and an upper evaporation source 6 for back surface evaporation are respectively provided.

The lower and upper deflector rolls 3 and 4 are fixed from the vapor deposition units 22 and 23 by rails 24, 25, 26, and 27 provided in the vapor deposition chamber 22a of the lower and upper vaporization units 22 and 23 and the fixed vacuum chamber 15, respectively. It is configured so that it can be moved into the vacuum chamber 15.

The lower and upper vapor deposition units 22 and 23 each have 2
It is provided with individual vapor deposition chambers 22a and 22b, and these vapor deposition chambers are alternately used.For example, while performing vacuum evaporation processing using one vapor deposition chamber 22a, vapor deposition sources and other vapor deposition in the other vapor deposition chamber 22b are performed. It is configured so that various maintenance work such as replacement and repair of equipment for use and replenishment of evaporated materials can be performed, and further, the vacuum can be exhausted to a predetermined vacuum degree by an appropriate vacuum device. Since both vapor deposition units 22 and 23 can have substantially the same structure, only the structure of the lower vapor deposition unit 22 will be described.

As shown in FIG. 3, the lower evaporation units 22 are arranged in parallel.
It has individual vapor deposition chambers 22a, 22b, each vapor deposition chamber has an opening 28 leading to the lower opening 20 of the vacuum chamber 15, each opening 28 is provided with an airtight door 29, inside each vapor deposition chamber 22a, 22b. The above-described deflector roll moving rails 25 are provided respectively, and the wheels 31 running on the vapor deposition unit moving rails 30 extending in a direction perpendicular to the rails 25 allow the vapor deposition chamber 22a of the vapor deposition unit 22 and the wheels 31 to travel on the wheels 31. One of the openings 22b is moved to a position corresponding to the position of the vacuum chamber opening 20, so that one of the deposition chambers, for example, the deposition chamber 22a can be moved to the vacuum deposition work position as shown in FIG. When located at A, the other vapor deposition chamber, that is, the vapor deposition chamber 22b is located at a maintenance position B for various maintenance work.

According to the belt-like continuous vacuum vapor deposition processing apparatus of the illustrated example having the above-mentioned configuration, the belt-shaped article 2 to be vacuum-deposited is passed through the inlet side air lock 7 and the high vacuum degree vacuum chamber 15 as shown in FIG.
After being introduced into the inside, the airtight doors 18 and 29 are opened and opened into the vapor deposition chamber 22a of the lower vapor deposition unit 22 through the openings 20 and 28, and after being inverted through the lower deflector roll 3 of this vapor deposition chamber. The airtight doors 18 and 29 are opened and opened into the vapor deposition chamber 22a of the upper vapor deposition unit 23 through the openings 21 and 28, and the vacuum chamber passes around the upper deflector roll 4 in the vapor deposition chamber 22a. It is led out from the inside of 15 through the outlet side air lock 8 and, during this time, from the lower evaporation source 5 in the evaporation chamber 22a of the lower evaporation unit 22 and the upper evaporation source 6 in the evaporation chamber 22a of the upper evaporation unit 23, respectively. The vaporized vapor deposits a thin coating on both sides of the strip.

Replacing the evaporation sources 5 and 6 in the evaporation chamber 22a of the evaporation units 22 and 23,
During maintenance work such as replenishment of vaporized substances or cleaning of vapor deposition equipment, repair, etc., the deflector rolls 3 and 4 are moved onto the rails, and respectively moved into the fixed vacuum chamber 15 as shown in FIG. After closing the airtight doors 18 and 29, the evaporation units 22 and 23 were moved to the rails 30, and the replacement vapor deposition chamber 22b, which had been exhausted to a predetermined high vacuum level after completing various internal maintenance work, was placed in the maintenance position. It is positioned from B to the vacuum deposition work position A (see FIG. 3).

Next, the airtight doors 18 and 19 of the vacuum chamber 15 and the airtight door 29 of the vapor deposition chamber 22b are opened, and the deflector rolls 3 and 4 are moved from the vacuum chamber 15 to predetermined positions in the vapor deposition chamber 22b of the vapor deposition units 22 and 23. ,
Thereby, the vacuum evaporation work can be started.

(Effects of the Invention) According to the present invention, the belt-like material during the vacuum vapor deposition process is always kept in a high vacuum atmosphere, and therefore it is possible to completely eliminate the occurrence of defective products due to the maintenance work, and to perform the maintenance work. The down time of the device can be remarkably shortened, and the operating rate of the equipment can be improved. In addition, maintenance work can be performed in a safe place for workers.

[Brief description of drawings]

1 is a diagrammatic longitudinal sectional view of the apparatus according to the present invention, FIG. 2 is an explanatory view of the operation of the apparatus shown in FIG. 1 when the vapor deposition chamber is replaced, and FIG. 3 is an arrow on the line III-III in FIG. FIG. 4 is an end view of the device seen in the direction of FIG. 4, and FIG. 4 is a diagrammatic vertical sectional view of the conventional device. 2 ... Strips, 3, 4 ... Deflector rolls 5, 6 ... Evaporation source, 7 ... Inlet air lock 8, Outlet air lock, 11 ... Inlet opening 12 ... Outlet, 15 ... Fixed vacuum chamber 16 ... Outlet side wall, 17 ... Inlet side wall 18,19 ... Sealing door, 20,21 ... Opening 22,23 ... Deposition unit, 22a ... Deposition chamber 24, 25, 26, 27 ... Rail 28 ... Opening, 29 ... Sealing door 30 ... Rail, 31 …Wheel

Claims (2)

[Claims] 1. A vacuum chamber evacuated to a high vacuum, and a belt to be vacuum-deposited while maintaining a high vacuum in the vacuum chamber is introduced into the vacuum chamber from the atmosphere in the inlet side and in the atmosphere in the outlet side. In a belt-like continuous vacuum vapor deposition treatment apparatus comprising an air lock provided on the inlet side and the outlet side of the vacuum chamber so that the belt can be drawn out of the vacuum chamber, a deflector roll for reversing the belt inside the vacuum chamber, and an evaporation source. , A fixed vacuum chamber that is constantly maintained at a high degree of vacuum through the inlet and outlet air locks, and an evaporation source that is internally provided and is connected to the fixed vacuum chamber through a closed door opening at the vacuum deposition work position A strip continuous vacuum vapor deposition treatment apparatus comprising a possible vapor deposition chamber and a device for moving the deflector roll from the fixed vacuum chamber into the vapor deposition chamber through the opening with the closed door. 2. A vapor deposition unit having at least two vapor deposition chambers, and a device for moving the vapor deposition unit so that any one of the vapor deposition units is switched to a vacuum vapor deposition work position where it is connected to a fixed vacuum chamber. A device according to claim 1, characterized in that it comprises: