JPH073596B2 - Electrophotographic photoreceptor and method for manufacturing the same - Google Patents
Electrophotographic photoreceptor and method for manufacturing the sameInfo
- Publication number
- JPH073596B2 JPH073596B2 JP15920986A JP15920986A JPH073596B2 JP H073596 B2 JPH073596 B2 JP H073596B2 JP 15920986 A JP15920986 A JP 15920986A JP 15920986 A JP15920986 A JP 15920986A JP H073596 B2 JPH073596 B2 JP H073596B2
- Authority
- JP
- Japan
- Prior art keywords
- tungsten
- transport layer
- selenium
- atomic
- charge transport
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08207—Selenium-based
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Description
【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は非晶質セレンまたは非晶質セレン合金を光導電
性材料として用いる電子写真用感光体およびその製造方
法に関する。Description: TECHNICAL FIELD The present invention relates to an electrophotographic photoreceptor using amorphous selenium or an amorphous selenium alloy as a photoconductive material, and a method for producing the same.
〔従来技術とその問題点〕 電子写真装置の像形成部材として用いられる電子写真用
感光体(以下、単に感光体とも称する)の性能として
は、電荷を受容する能力が高くて暗所において充分高い
所要電位に帯電でき、かつ、暗時には電荷の漏れが少な
くて電荷減衰速度が小さくて帯電位を保持することがで
きること、光が照射されたときには表面の帯電電荷が速
やかに放電して帯電位が減衰し、残留電位が充分少ない
こと、帯電・露光を連続して繰り返して行ったとき疲労
が無視できる程小さく、暗減衰の増加や残留電位の蓄積
が少ないことなどが求められる。[Prior Art and its Problems] As for the performance of an electrophotographic photoreceptor (hereinafter, also simply referred to as a photoreceptor) used as an image forming member of an electrophotographic apparatus, it has a high ability to accept electric charges and is sufficiently high in a dark place. It can be charged to the required potential, and in the dark there is little leakage of charge and the charge decay rate is small, so that the charged position can be maintained.When light is irradiated, the charged charge on the surface is quickly discharged and the charged position is It is required to be attenuated so that the residual potential is sufficiently small, fatigue is negligibly small when charging and exposure are continuously repeated, dark decay is increased, and residual potential is less accumulated.
このような要望を満足させるために、最近機能分離型感
光体が注目されてきている。これは、主として暗所での
帯電と露光時のキャリア輸送に寄与するキャリア輸送層
と、主として露光時キャリア発生に寄与するキャリア発
生層とを積層してなる感光体であって、このように機能
分離した各層についてその機能に応じた最適設計を追求
することにより、一つの層にこれらの機能を持たせる単
層型の感光体よりも特性の優れた感光体が得られること
になる。In order to satisfy such a demand, a function-separated type photoconductor has recently attracted attention. This is a photoconductor obtained by laminating a carrier transport layer mainly contributing to charging in the dark and carrier transport at the time of exposure, and a carrier generating layer mainly contributing to generation of carriers at the time of exposure. By pursuing the optimum design according to the function of each separated layer, it is possible to obtain a photoreceptor having excellent characteristics as compared with a single layer type photoreceptor in which one layer has these functions.
セレン系材料を光導電性材料として利用する感光体にお
いても機能分離型が開発され、例えばアルミニウム合金
からなる基体上に非晶質セレンまたは非晶質セレン−テ
ルル合金からなるキャリア輸送層と非晶質セレン−テル
ル合金または非晶質セレン−テルル−ひ素合金からなる
キャリア発生層を有する感光体が知られている。しかし
ながら、このような感光体で連続繰り返し像形成を行う
と第3図に示すように残留電位の蓄積が生じ、その結
果、画像上に地汚れが発生し、現在までのところ、残留
電位の蓄積の少ない満足すべき感光体は得られていな
い。A function-separated type has also been developed in a photoconductor that uses a selenium-based material as a photoconductive material.For example, a carrier transport layer made of amorphous selenium or an amorphous selenium-tellurium alloy and an amorphous material are formed on a substrate made of an aluminum alloy. A photoreceptor having a carrier generation layer made of a selenium-tellurium alloy or an amorphous selenium-tellurium-arsenic alloy is known. However, when continuous image formation is carried out with such a photoreceptor, residual potential is accumulated as shown in FIG. 3, and as a result, scumming occurs on the image, and so far the residual potential is accumulated. A satisfactory photoconductor having a small number of particles has not been obtained.
本発明は、上述の点に鑑みてなされたものであって、連
続繰り返し像形成を行っても残留電位の蓄積が少なく、
画像上地汚れが少ない感光体およびその製造方法を提供
することを目的とする。The present invention has been made in view of the above points, and the residual potential is less accumulated even when image formation is continuously repeated,
An object of the present invention is to provide a photoconductor having less image background stain and a method for producing the photoconductor.
本発明の目的は、真空槽内でセレンまたはセレン合金を
蒸発させて導電性基体上に電荷輸送層を形成するとき
に、タングステンの酸化物を同時に蒸発させて電荷輸送
層中に酸素を50×10-6原子%〜200×10-6原子%,タン
グステンを15×10-6原子%〜110×10-6原子ドープさせ
ることによって達成される。The object of the present invention is to evaporate selenium or a selenium alloy in a vacuum chamber to form a charge transport layer on a conductive substrate and simultaneously evaporate the oxide of tungsten to generate 50 × oxygen in the charge transport layer. It is achieved by doping 10 -6 atomic% to 200 × 10 -6 atomic% and tungsten with 15 × 10 -6 atomic% to 110 × 10 -6 atomic.
以下、本発明の実施例について説明する。 Examples of the present invention will be described below.
第1図は、本発明による感光体の製造の際の電荷輸送層
の蒸着方法を示す説明図であって、真空槽(図示はされ
てない)の中にアルミニウム合金からなる円筒状導電性
基体1が矢印方向に回転可能に配置され、その下方にセ
レン−テルル合金4の充填された蒸着ボート2が設置さ
れ、蒸着ボート2に近接してフラッシュ蒸着ボート5が
並設されている。フラッシュ蒸着ボート5はボートに直
接通電し加熱される方式である。真空槽内を圧力1×10
-5Torrの真空とし、基体1を温度65℃に保持して回転さ
せながら、加熱ヒータ3により蒸着ボート2を約300℃
に加熱し、テルルを5.5重量%含有するセレン−テルル
合金4を蒸発させる。同時にフラッシュ蒸着ボート5に
通電してその温度を1000℃以上に上げ、タングステン酸
化物WO3微粉末(図では便宜上粒上で示してある)を少
量ずつ供給してフラッシュ蒸発させ、その蒸気をセレン
−テルル蒸気と共に基体1上に共蒸着して約1μm/分の
成膜速度で膜厚約60μmの電荷輸送層を形成した。WO3
の量はセレン−テルル合金量に対して比率で500重量ppm
供給した。このようにして形成された電荷輸送層中の酸
素とタングステンの含有量を放射化分析で調べたとこ
ろ、酸素が100×10-6原子%,タングステンが40×10-6
原子%ドープされていた。次にこの電荷輸送層の上に非
晶質セレン−テルル−ひ素合金からなり膜厚5μmの電
荷発生層を形成して感光体とした。FIG. 1 is an explanatory view showing a vapor deposition method of a charge transport layer at the time of manufacturing a photoreceptor according to the present invention, in which a cylindrical conductive substrate made of an aluminum alloy is placed in a vacuum chamber (not shown). 1 is rotatably arranged in the direction of an arrow, a vapor deposition boat 2 filled with a selenium-tellurium alloy 4 is installed below it, and a flash vapor deposition boat 5 is juxtaposed in close proximity to the vapor deposition boat 2. The flash evaporation boat 5 is a system in which the boat is directly energized and heated. Pressure in vacuum chamber 1 × 10
A vacuum of -5 Torr is applied, the substrate 1 is kept at a temperature of 65 ° C., and the vapor deposition boat 2 is heated to about 300 ° C. while rotating by a heater 3.
Then, the selenium-tellurium alloy 4 containing 5.5% by weight of tellurium is evaporated. At the same time, the flash vapor deposition boat 5 is energized to raise its temperature to 1000 ° C. or higher, and tungsten oxide WO 3 fine powder (shown on the grains for convenience in the figure) is supplied little by little to flash vaporize, and the vapor is selenium. Co-evaporated on the substrate 1 with tellurium vapor to form a charge transport layer with a thickness of about 60 μm at a deposition rate of about 1 μm / min. WO 3
Is 500 ppm by weight in proportion to the amount of selenium-tellurium alloy.
Supplied. The content of oxygen and tungsten in this way the charge transport layer formed by were examined by neutron activation analysis, oxygen is 100 × 10 -6 atomic%, tungsten 40 × 10 -6
It was atomically doped. Next, a charge generating layer made of an amorphous selenium-tellurium-arsenic alloy and having a film thickness of 5 μm was formed on the charge transporting layer to obtain a photoreceptor.
この実施例の感光体について連続繰り返し像形成を行っ
てそのときの感光体の残留電位を調べた。その結果を第
2図に示す。第2図に見られる通り残留電位は非常に小
さく最初10V程度であり、しかもその後の増加は極僅少
で、しかも最初の数回の繰り返しのうちに約20Vで飽和
し、その後250回まで残留電位の蓄積は見られない。ま
た、画像上地汚れは認められなかった。Images were continuously and repeatedly formed on the photoconductor of this example, and the residual potential of the photoconductor at that time was examined. The results are shown in FIG. As shown in Fig. 2, the residual potential is very small, about 10V at the beginning, and the increase thereafter is very small, and it saturates at about 20V within the first few repetitions, and then the residual potential up to 250 times. No accumulation of is seen. In addition, the background stain on the image was not recognized.
比較例1として、電荷輸送層の形成にあたってWO3のフ
ラッシュ蒸着のみを行わず、他は実施例と同様にして感
光体を作製し、この比較例の感光体について連続繰り返
し像形成を行って残留電位を調べたところ、初期値約30
Vと大きく、その後50回で80V,100回で100Vと増加し、25
0回で約130Vと大幅な蓄積が見られ、画像上地汚れが発
生した。また、比較例2として実施例のWO3のフラッシ
ュ蒸着を行わずタングステン単体を10,150×10-6at%添
加した2例と、比較例3として実施例のWO3のフラッシ
ュ蒸着を行わず酸素のみを酸化セレンとして50,200×10
-6at%添加した2例と合計4例の感光体を作成した。こ
れらの感光体により連続繰り返し像形成を行った結果の
残留電位と暗中の電荷保持率とを表1に示す。In Comparative Example 1, a photoreceptor was prepared in the same manner as in Example 1 except that WO 3 was not flash-deposited in the formation of the charge transport layer, and the photoreceptor of this Comparative Example was subjected to continuous repeated image formation and remained. When the electric potential was examined, the initial value was about 30
It was as large as V, then increased to 80V at 50 times and 100V at 100 times, and increased to 25
A large accumulation of about 130V was seen at 0 times, and the background stain on the image occurred. Moreover, the two cases with the addition of tungsten alone 10,150 × 10 -6 at% without flash evaporation of WO 3 in Example Comparative Example 2, only oxygen without flash evaporation of WO 3 in Example Comparative Example 3 50,200 × 10 as selenium oxide
A total of 4 cases of photoconductors were prepared, including 2 cases in which -6 at% was added. Table 1 shows the residual potential and the charge retention ratio in the dark as a result of continuously and repeatedly forming images with these photoreceptors.
表1より、タングステン単体では添加量を変えても、暗
中の電荷保持率はいずれも良好であるが、残留電位はい
ずれも上昇し、画像上地汚れが発生した。また、酸化セ
レンの形でのドープによる酸素のみの場合の繰り返し像
形成の結果は、残留電位の点はそれほど上昇しないが、
暗中の電荷保持率が小さくなりすぎることがわかった。
これらの比較例から前述した本実施例におけるWO3の共
蒸着が極めて有効であることが判る。 From Table 1, even if the addition amount of tungsten alone was changed, the charge retention ratios in the dark were all good, but the residual potentials were all high, and the background stain on the image occurred. Also, the result of repeated imaging with only oxygen by doping in the form of selenium oxide shows that the point of residual potential does not rise much,
It was found that the charge retention rate in the dark became too small.
From these comparative examples, it can be seen that the co-evaporation of WO 3 in this example described above is extremely effective.
連続繰り返し像形成したときの残留電位の飽和値は電荷
輸送層中の酸素の含有量に左右される。酸素含有量が少
ないと飽和値が大きく、多いと小さくなる。そのとき表
1に示す結果からわかるようにタングステンが共存する
ことが大切で、タングステンが共存することにより酸素
が非晶質セレンまたは非晶質セレン−テルル合金中に均
一に安定してドープされることになり安定した特性の感
光体が得られる。電荷輸送層中の酸素量が50×10-6原子
%程度、タングステン量が15×10-6原子%程度のとき、
残留電位の飽和量は80V程度で、より少なくなると飽和
値が大きくなり過ぎ画像上地汚れが実用上問題となる。
また、タングステンと酸素の組成比をパラメータとし
て、連続繰り返し像形成回数と残留電位との関係を示す
第4図と、タングステンと酸素のそれぞれの濃度と暗中
電荷保持率との関係を示す第5図からわかるように、酸
素量が200×10-6原子%程度、タングステン量が110×10
-6原子%程度になると飽和値は10V程度で画像上地汚れ
の発生は認められないが、反面、暗減衰が大きくなって
きて、これらの含有量がさらに多くなると帯電量が低く
なり帯電の減衰も大きくなって実用上問題となってく
る。The saturation value of the residual potential when images are continuously and repeatedly formed depends on the oxygen content in the charge transport layer. When the oxygen content is low, the saturation value is high, and when it is high, the saturation value is low. At that time, as is clear from the results shown in Table 1, the coexistence of tungsten is important, and the coexistence of tungsten uniformly and stably dopes oxygen into the amorphous selenium or the amorphous selenium-tellurium alloy. As a result, a photosensitive member having stable characteristics can be obtained. When the amount of oxygen in the charge transport layer is about 50 × 10 -6 atom% and the amount of tungsten is about 15 × 10 -6 atom%,
The saturation level of the residual potential is about 80 V, and when it is smaller, the saturation value becomes too large and the background stain on the image becomes a practical problem.
Further, FIG. 4 showing the relationship between the number of times of continuous image formation and the residual potential with the composition ratio of tungsten and oxygen as a parameter, and FIG. 5 showing the relationship between the respective concentrations of tungsten and oxygen and the charge retention ratio in the dark. As you can see, the amount of oxygen is about 200 × 10 -6 atom%, and the amount of tungsten is 110 × 10 6.
At -6 atom%, the saturation value is around 10 V and no background stain is observed on the image, but on the other hand, the dark decay becomes large, and if the content of these increases further, the charge amount becomes lower and the charging Attenuation also becomes large and becomes a practical problem.
このように電荷輸送層中に適量の酸素とタングステンが
ドープされると感光体の残留電位の蓄積が少なくなる理
由はまだ充分解明されてはいないが、酸素がドープされ
ることにより正孔のトラップ準位が浅くなり、また、正
孔トラップの密度も低減されるためと推定される。The reason why the residual potential of the photoconductor is less accumulated when the charge transport layer is doped with appropriate amounts of oxygen and tungsten has not been fully clarified. It is presumed that the level becomes shallow and the hole trap density is also reduced.
本実施例においてはドーピング材料としてWO3を用いた
がWO3やW4O11も同様に有効に用いることが可能である。In this embodiment, WO 3 was used as the doping material, but WO 3 and W 4 O 11 can be effectively used as well.
本発明によれば、真空槽内でセレンまたはセレン合金を
蒸発させて導電性基体上に電荷輸送層を形成するとき
に、タングステン酸化物を同時に蒸発させて、電荷発生
層中に酸素を50×10-6原子%〜200×10-6原子%,タン
グステンを15×10-6原子%〜110×10-6原子%ドープさ
せる。このようにして製造された電子写真用感光体は、
連続繰り返し像形成を行っても残留電位の蓄積が少な
く、地汚れのない良好な画像を安定して提供することが
可能である。According to the present invention, when selenium or a selenium alloy is evaporated in a vacuum chamber to form a charge transport layer on a conductive substrate, tungsten oxide is evaporated at the same time, and oxygen is added to the charge generation layer at 50 ×. Dopant of 10 -6 atomic% to 200 × 10 -6 atomic% and tungsten of 15 × 10 -6 atomic% to 110 × 10 -6 atomic%. The electrophotographic photoconductor thus manufactured,
It is possible to stably provide a good image free from background stain, because residual electric potential is less accumulated even when continuous image formation is performed.
第1図は本発明の電荷輸送層の蒸着の一実施例の説明
図、第2図は一実施例の感光体の残留電位の蓄積を示す
線図、第3図は従来例の感光体の残留電位の蓄積を示す
線図、第4図は連続繰り返しと残留電位との関係を示す
図、第5図はタングステンと酸素のそれぞれの濃度と暗
中電荷保持率(帯電後5秒時)との関係を示す図であ
る。 1……導電性基体、2……蒸着ボート、3……加熱ヒー
タ、4……セレン合金、5……フラッシュ蒸着ボート、
6……タングステン酸化物。FIG. 1 is an explanatory view of one embodiment of vapor deposition of a charge transport layer of the present invention, FIG. 2 is a diagram showing accumulation of residual potential of a photoreceptor of one embodiment, and FIG. FIG. 4 is a diagram showing the accumulation of residual potential, FIG. 4 is a diagram showing the relationship between continuous repetition and residual potential, and FIG. 5 is a graph showing the respective concentrations of tungsten and oxygen and the charge retention ratio in the dark (at 5 seconds after charging). It is a figure which shows a relationship. 1 ... Conductive substrate, 2 ... Deposition boat, 3 ... Heater, 4 ... Selenium alloy, 5 ... Flash deposition boat,
6 ... Tungsten oxide.
Claims (5)
セレン合金からなる電荷輸送層と非晶質セレン合金から
なる電荷発生層とを有する電子写真用感光体において、
前記電荷輸送層に酸素が50×10-6原子%〜200×10-6原
子%、タングステンが15×10-6原子%〜110×10-6原子
%ドープされていることを特徴とする電子写真用感光
体。1. An electrophotographic photoreceptor having a charge transport layer made of amorphous selenium or an amorphous selenium alloy and a charge generation layer made of an amorphous selenium alloy on a conductive substrate.
Electrons characterized in that the charge transport layer is doped with oxygen at 50 × 10 −6 atomic% to 200 × 10 −6 atomic% and tungsten is doped at 15 × 10 −6 atomic% to 110 × 10 −6 atomic%. Photoreceptor for photography.
金を蒸発源より蒸発させて導電性基体上に電荷輸送層を
形成するときに、タングステンの酸化物を同時に蒸発さ
せて前記電荷輸送層中に酸素を50×10-6原子%〜200×1
0-6原子%,タングステンを15×10-6原子%〜110×10-6
原子%ドープさせることを特徴とする電子写真用感光体
の製造方法。2. When a selenium or selenium-tellurium alloy is evaporated from an evaporation source in a vacuum chamber to form a charge transport layer on a conductive substrate, an oxide of tungsten is simultaneously evaporated to form a charge transport layer in the charge transport layer. Oxygen to 50 × 10 -6 atom% to 200 × 1
0 -6 atom%, tungsten 15 x 10 -6 atom% ~ 110 x 10 -6
A method for producing a photoconductor for electrophotography, which comprises doping at an atomic percentage.
いて、タングステンの酸化物がWO2であることを特徴と
する電子写真用感光体の製造方法。3. The method for producing an electrophotographic photoreceptor according to claim 2 , wherein the oxide of tungsten is WO 2 .
いて、タングステンの酸化物がWO3であることを特徴と
する電子写真用感光体の製造方法。4. The method for producing an electrophotographic photoreceptor according to claim 2, wherein the oxide of tungsten is WO 3 .
いて、タングステンの酸化物がW4O11であることを特徴
とする電子写真用感光体の製造方法。5. The method for producing an electrophotographic photosensitive member according to claim 2, wherein the oxide of tungsten is W 4 O 11 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15920986A JPH073596B2 (en) | 1986-07-07 | 1986-07-07 | Electrophotographic photoreceptor and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15920986A JPH073596B2 (en) | 1986-07-07 | 1986-07-07 | Electrophotographic photoreceptor and method for manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6314163A JPS6314163A (en) | 1988-01-21 |
| JPH073596B2 true JPH073596B2 (en) | 1995-01-18 |
Family
ID=15688704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15920986A Expired - Fee Related JPH073596B2 (en) | 1986-07-07 | 1986-07-07 | Electrophotographic photoreceptor and method for manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH073596B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5030477A (en) * | 1988-11-14 | 1991-07-09 | Xerox Corporation | Processes for the preparation and processes for suppressing the fractionation of chalcogenide alloys |
| KR101502434B1 (en) * | 2013-08-21 | 2015-03-24 | 영동제약 주식회사 | Slide chamber for cell smear |
-
1986
- 1986-07-07 JP JP15920986A patent/JPH073596B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6314163A (en) | 1988-01-21 |
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