JPH0736208B2 - Method of manufacturing magnetic head - Google Patents
Method of manufacturing magnetic headInfo
- Publication number
- JPH0736208B2 JPH0736208B2 JP60202041A JP20204185A JPH0736208B2 JP H0736208 B2 JPH0736208 B2 JP H0736208B2 JP 60202041 A JP60202041 A JP 60202041A JP 20204185 A JP20204185 A JP 20204185A JP H0736208 B2 JPH0736208 B2 JP H0736208B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- layer
- forming
- magnetic
- magnetic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title description 11
- 230000002093 peripheral effect Effects 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 139
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 7
- 238000000059 patterning Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気ヘッドの製造方法に関する。TECHNICAL FIELD The present invention relates to a method of manufacturing a magnetic head.
本発明は、磁気ヘッドの製造方法において、第1絶縁層
もしくは第2絶縁層形成後に磁極先端部と接合部より成
る第1上部磁性層を形成することにより、段差に影響さ
れることなく均一な膜厚で高精度な磁気ヘッドの製造が
できる。According to the present invention, in the method of manufacturing a magnetic head, by forming the first upper magnetic layer composed of the magnetic pole tip and the junction after forming the first insulating layer or the second insulating layer, it is possible to make uniform without being affected by the step. It is possible to manufacture a magnetic head with high accuracy by the film thickness.
従来の磁気ヘッドの製造方法は、第4図に示すようにAl
系セラミックスやフェライト基板11上に磁性膜を被着形
成を行ない下部磁性層12を形成する。次いでSiO2やAl2
−O3といった非磁性膜13をギャップ長と等しい厚さで被
着形成しギャップ部を構成する。次に磁極及びコイルと
の絶縁をとるために樹脂系から成る第1絶縁層14、コイ
ルとする導体層の下コイル15、第2絶縁層16上コイル1
7、第3絶縁層18を各々順次被着形成し積層する。最後
に上部磁性層を被着形成を行ない磁気ヘッドが構成され
る製造方法であった。As shown in FIG. 4, the conventional magnetic head manufacturing method is
A lower magnetic layer 12 is formed by depositing a magnetic film on a ceramics or ferrite substrate 11. Then SiO 2 and Al 2
A non-magnetic film 13 such as —O 3 is deposited and formed with a thickness equal to the gap length to form a gap portion. Next, in order to insulate the magnetic pole and the coil, a first insulating layer 14 made of a resin system, a lower coil 15 of a conductor layer to be a coil, and a second insulating layer 16 upper coil 1
7 and the third insulating layer 18 are sequentially deposited and laminated. Finally, the upper magnetic layer was deposited to form a magnetic head.
しかし前述の従来技術では、上部磁性層を形成する時に
絶縁層やコイルで発生する段差の影響でパターン精度が
わるくなることや、低い部分にはレジストが厚くたまる
ためレジストがぬけなかったり残ったりした。また絶縁
層やコイル、上磁性層など各膜の密着性を良くするため
逆スパッタの影響により、ギャップを構成する非磁性層
の膜厚が薄くなりギャップを構成する非磁性層の膜厚が
薄くなりギャップ長寸度がでないといった問題を有す
る。However, in the above-mentioned conventional technique, the pattern accuracy becomes poor due to the influence of the step generated in the insulating layer and the coil when the upper magnetic layer is formed, and the resist cannot be removed or remains because the resist is thickly accumulated in the lower part. . In addition, the thickness of the non-magnetic layer forming the gap is reduced and the thickness of the non-magnetic layer forming the gap is reduced due to the influence of reverse sputtering in order to improve the adhesion of each film such as the insulating layer, coil, and upper magnetic layer. There is a problem that the gap length is not large.
そこで本発明はこのような問題点を解決するものでその
目的とするところは、高精度で寸度変化がなく歩留の高
い磁気ヘッドの製造方法を提供するところである。Therefore, the present invention solves such a problem, and an object of the present invention is to provide a method of manufacturing a magnetic head having a high accuracy, a high dimensional change and a high yield.
本発明の磁気ヘッドの製造方法は、 基板上に下部磁性層を形成する工程と、 前記下部磁性層上に磁極先端部にギャップを構成する非
磁性層を被着形成する工程と、 前記非磁性層上に磁極先端部を除いて第1絶縁層を形成
する工程と、 前記第1絶縁層上に下部コイルを形成する工程と、 前記下部コイル上に外周縁が前記第1絶縁層の外周縁よ
り内側になるように第2絶縁層を形成する工程と、 前記第2絶縁層の上面を除いた斜面部の一方の側から前
記磁極先端部側の非磁性層上にかけての磁極先端部分と
前記第2絶縁層の斜面部の他方の側から前記磁極先端部
の反対側の接合部を形成する前記下部磁性層上にかけて
の接合部分に第1上部磁性層を形成する工程と、 前記第2絶縁層上に上部コイルを形成する工程と、 前記上部コイル上に外周縁が前記第2絶縁層の外周縁よ
り内側になるよう第3絶縁層を形成する工程、 前記第3絶縁層上に前記第2絶縁層の斜面部に設けられ
た前記磁極先端部分と前記接合部分の第1上部磁性層に
重なるように第2上部磁性層を形成する工程とからなる
ことを特徴とする。A method of manufacturing a magnetic head according to the present invention comprises a step of forming a lower magnetic layer on a substrate, a step of depositing and forming a nonmagnetic layer forming a gap at a magnetic pole tip on the lower magnetic layer, Forming a first insulating layer on the layer except for the magnetic pole tip; forming a lower coil on the first insulating layer; and having an outer peripheral edge on the lower coil an outer peripheral edge of the first insulating layer. Forming a second insulating layer so as to be more inward, and a magnetic pole tip portion extending from one side of the sloped portion excluding the upper surface of the second insulating layer to the nonmagnetic layer on the magnetic pole tip side and the magnetic pole tip portion. Forming a first upper magnetic layer at a junction between the other side of the slope of the second insulating layer and the lower magnetic layer forming a junction opposite to the magnetic pole tip; Forming an upper coil on the layer, and forming an outer coil on the upper coil. Forming a third insulating layer so that the edge is inside the outer peripheral edge of the second insulating layer, the magnetic pole tip portion provided on the sloped portion of the second insulating layer on the third insulating layer, and the junction And a step of forming a second upper magnetic layer so as to overlap the first upper magnetic layer in a part.
本発明の上記構成によれば、第2絶縁層形成後もしくは
第1絶縁層形成後に第1上部磁性層を構成するとこによ
り、第2上部磁性層の形成時に段差が緩和されることに
より、レジストの膜厚が均一となることと露光による光
の散乱が少なくなることにより精度の高いパターニング
ができる。また磁性層の被着に入射角のあるもの(例え
ばスパッタ)では斜面角度が緩和されるので膜が均一に
被着できる。According to the above configuration of the present invention, by forming the first upper magnetic layer after forming the second insulating layer or after forming the first insulating layer, the step is relaxed when the second upper magnetic layer is formed. Since the film thickness is uniform and the light scattering due to exposure is reduced, highly accurate patterning can be performed. Also, in the case where the magnetic layer is deposited with an incident angle (for example, sputtering), the slope angle is relaxed, so that the film can be deposited uniformly.
第1絶縁形成後に第一上部磁性層を構成すれば以降の工
程で密着性改善のために行なう逆スパッタの影響による
ギャップの膜厚変化は第1上部磁性層がカバーとなるこ
とにより発生しない。If the first upper magnetic layer is formed after the formation of the first insulation, the change in the film thickness of the gap due to the influence of reverse sputtering for improving the adhesion in the subsequent steps does not occur due to the cover of the first upper magnetic layer.
第1図は本発明の磁気ヘッドの製造図であり、Al系セラ
ミックス、フェライト系からなる基板1上にCo系アモル
ファス、Fe系磁性層をスパッタもしくはメッキにて被着
形成を行ない下部磁性層2を構成し、その上にAl2O3も
しくはSiO2などの非磁性層3をギャップ長となる膜厚分
被着形成を行なう。次に磁性とコイルとの絶縁をとる樹
脂系の第1絶縁層4を被着形成し、その上部にCu系,Al
系の導体層から成る下部コイル5をメッキまたはスパッ
タで被着形成を行ないその上に第1絶縁層と同質の第2
絶縁層6を被着形成する。第2絶縁層の外周縁は第1絶
縁層の外周縁の内側になるよう形成される。次に磁極先
端部の第1上磁性層7aと上磁性層と下磁性層とを接合す
る接合部の第1上磁性層7bを同時に下部磁性層2と同様
な方法にて被着形成を行なう。第1上磁性層は下磁性層
1と同じ材料を用いる。第1上磁性層7a,7bは、第1絶
縁層4及び第2絶縁層6より成る斜面部分より形成する
方が斜面部の膜厚を厚くでき磁気ヘッドの磁気抵抗を下
げることから望ましい、第2絶縁層の上部な平な部分ま
で延ばすことは、第2絶縁層の上に形成する上部コイル
8との間隔が狭くなりコイルの形成が難しくなるが可能
な限り上部コイル8の近くまで延ばすことが良い。また
斜面の角度のきついところよりも平な面もしくは角度の
ゆるい所でパターニングした方が精度よくきれいにパタ
ーニングできる。FIG. 1 is a manufacturing diagram of a magnetic head of the present invention. A Co-based amorphous and Fe-based magnetic layer is deposited on a substrate 1 made of Al-based ceramics and ferrite-based material by sputtering or plating to form a lower magnetic layer 2. And a non-magnetic layer 3 such as Al 2 O 3 or SiO 2 is deposited thereon by a thickness corresponding to the gap length. Next, a resin-based first insulating layer 4 that insulates the magnet from the coil is formed by deposition, and a Cu-based, Al-based
The lower coil 5 composed of a system conductor layer is deposited by plating or sputtering, and a second insulating layer having the same quality as the first insulating layer is formed thereon.
The insulating layer 6 is deposited. The outer peripheral edge of the second insulating layer is formed inside the outer peripheral edge of the first insulating layer. Next, the first upper magnetic layer 7a at the tip of the magnetic pole and the first upper magnetic layer 7b at the junction for joining the upper magnetic layer and the lower magnetic layer are simultaneously formed by the same method as the lower magnetic layer 2. . The same material as the lower magnetic layer 1 is used for the first upper magnetic layer. It is preferable to form the first upper magnetic layers 7a and 7b from the slope portion formed of the first insulating layer 4 and the second insulating layer 6 because the thickness of the slope portion can be increased and the magnetic resistance of the magnetic head can be reduced. (2) To extend to the upper flat part of the insulating layer makes it difficult to form the coil because the gap between the upper insulating layer and the upper coil 8 formed on the second insulating layer becomes narrower, but to extend as close to the upper coil 8 as possible. Is good. Further, it is possible to perform fine patterning more accurately when patterning on a flat surface or a place where the angle is gentler than where the angle of the slope is tight.
第1上磁性層7a,7bを形成後、下部コイル5と同様な方
法にて上部コイル8を形成し、第1,第2絶縁層と同様な
方法にて第3絶縁層9を形成する。第3絶縁層の外周縁
は第2絶縁層の外周縁により内側になるように形成され
る。この時第3絶縁層は第1上部磁性層7a,7bの端と段
差の無いような形状にパターニングを行なう必要があ
る。位置ズレを考慮すれば、第3絶縁層9は第1上部磁
性層7a,7bに数ミクロン重なるように形成を行なう。After forming the first upper magnetic layers 7a and 7b, the upper coil 8 is formed by the same method as the lower coil 5, and the third insulating layer 9 is formed by the same method as the first and second insulating layers. The outer peripheral edge of the third insulating layer is formed inside the outer peripheral edge of the second insulating layer. At this time, the third insulating layer needs to be patterned into a shape having no step with the ends of the first upper magnetic layers 7a and 7b. Considering the positional deviation, the third insulating layer 9 is formed so as to overlap the first upper magnetic layers 7a and 7b by several microns.
最後に上部磁性層7cを、下部磁性層2、第1上磁性層7
a,7bと同様な方法にて被着形成を行ない磁気ヘッドを構
成する。Finally, the upper magnetic layer 7c is replaced by the lower magnetic layer 2 and the first upper magnetic layer 7c.
The magnetic head is formed by forming the adherend in the same manner as a and 7b.
第3図は前述の方法にて構成した磁気ヘッドの断面図で
あるが、前述の方法と異なる点は前述の製造方法では、
磁極先端の第1上磁性層7aは所望の厚さで形成を行なっ
たのに対して、第3図の方法は、磁極先端の厚さを第1
上磁性層7aと、第2上磁性層7cの重ね合わせで所望の厚
さにしている点である。この方法の利点は斜面部の膜厚
を厚くできる点と、密着性改善のための逆スパッタによ
る第1上磁性層7aの膜厚の減少分を第2上磁性層7cによ
ってコントロールが可能となることである。第2上磁性
層7cの上に第3上磁性層7dを被着形成し上部の平坦部を
所望の膜厚にして磁気ヘッドを構成する。FIG. 3 is a cross-sectional view of the magnetic head constructed by the above-mentioned method. The difference from the above-mentioned method is that
While the first upper magnetic layer 7a at the tip of the magnetic pole was formed to have a desired thickness, the method shown in FIG.
This is that the upper magnetic layer 7a and the second upper magnetic layer 7c are superposed to have a desired thickness. The advantage of this method is that the thickness of the slope can be increased and that the decrease in the thickness of the first upper magnetic layer 7a due to the reverse sputtering for improving the adhesion can be controlled by the second upper magnetic layer 7c. That is. A third upper magnetic layer 7d is deposited on the second upper magnetic layer 7c to form a magnetic head with the upper flat portion having a desired film thickness.
第2図は同様に前述の方法にて構成された磁気ヘッドの
断面図である。前述の方法と異なる点は第1上磁性層7a
の構成工程を第2絶縁層構成後でなく、第1絶縁層構成
後に第1上磁性層7a,7bを構成したことである。この方
法の利点は、段差が小さなところで構成したことによ
り、パターンが高精度に加工できる点と、ギャップ非磁
性層3が逆スパッタされないことにより、精度よいギャ
ップ長が構成できる。FIG. 2 is a sectional view of a magnetic head similarly constructed by the above method. The difference from the above method is that the first upper magnetic layer 7a
That is, the first upper magnetic layers 7a and 7b are formed after the first insulating layer is formed, not after the step of forming the second insulating layer. The advantage of this method is that the pattern can be processed with high accuracy by forming it at a small step, and that the gap nonmagnetic layer 3 is not reverse-sputtered, so that an accurate gap length can be formed.
以上述べたように本発明によれば、第2絶縁層もしくは
第1絶縁層形成後に磁極先端部と接合部より成る第1上
磁性層を形成したことにより、段差や緩和されレジスト
の膜厚が均一となることや露光による光の散乱が少なく
なることにより、第2,第3上磁性層のパターン形状が高
精度に加工できる。また上磁性層の斜面部分は段差が緩
和されたことにより、磁性層の膜の被着時に入射角が大
きいので均一な膜厚となることや、上磁性層の重ね合わ
せで斜面部の膜厚が厚くなることにより磁気抵抗が下り
磁気ヘッドの効率が改善され高再生出力が得られる。磁
極先端部は、密着改善の逆スパッタを行なっても第1上
磁性層がギャップをカバーしているので、ギャップ長の
寸度変化が発生しない。下磁性層と上磁性層との接合部
は、段差が緩和されたことにより、第2もしくは第3上
磁性層の形成時に低い部分のレジストがぬけないことや
残ってしまうといった問題が無くなるという効果を有す
る。As described above, according to the present invention, by forming the first upper magnetic layer composed of the magnetic pole tip and the junction after the second insulating layer or the first insulating layer is formed, the step is reduced and the resist film thickness is reduced. The uniformity of the pattern and the reduction of light scattering due to the exposure allow the pattern shapes of the second and third upper magnetic layers to be processed with high accuracy. In addition, since the steps on the sloped portion of the upper magnetic layer were alleviated, the incident angle was large when the film of the magnetic layer was deposited, resulting in a uniform film thickness. By increasing the thickness, the magnetic resistance is lowered, the efficiency of the magnetic head is improved, and a high reproduction output can be obtained. At the tip of the magnetic pole, the first upper magnetic layer covers the gap even when reverse sputtering for improving adhesion is performed, so that the dimension of the gap length does not change. At the junction between the lower magnetic layer and the upper magnetic layer, since the step is relaxed, there is no problem that the resist in the lower portion cannot be removed or remains when the second or third upper magnetic layer is formed. Have.
即ち、本発明の製造方法では、基板上に下部磁性層を形
成する工程と、 前記下部磁性層上に磁極先端部にギャップを構成する非
磁性層を被着形成する工程と、 前記非磁性層上に磁極先端部を除いて第1絶縁層を形成
する工程と、 前記第1絶縁層上に下部コイルを形成する工程と、 前記下部コイル上に外周縁が前記第1絶縁層の外周縁よ
り内側になるように第2絶縁層を形成する工程と、 前記第2絶縁層の上面を除いた斜面部の一方の側から前
記磁極先端部側の非磁性層上にかけての磁極先端部分と
前記第2絶縁層の斜面部の他方の側から前記磁極先端部
の反対側の接合部を形成する前記下部磁性層上にかけて
の接合部分に第1上部磁性層を形成する工程と、 前記第2絶縁層上に上部コイルを形成する工程と、 前記上部コイル上に外周縁が前記第2絶縁層の外周縁よ
り内側になるよう第3絶縁層を形成する工程、 前記第3絶縁層上に前記第2絶縁層の斜面部に設けられ
た前記磁極先端部分と前記接合部分の第1上部磁性層に
重なるように第2上部磁性層を形成することにより次の
ような効果をもたらす。That is, in the manufacturing method of the present invention, the step of forming a lower magnetic layer on the substrate, the step of depositing and forming a nonmagnetic layer forming a gap at the magnetic pole tip on the lower magnetic layer, the nonmagnetic layer Forming a first insulating layer on top of the magnetic pole tip portion, forming a lower coil on the first insulating layer, and forming an outer peripheral edge on the lower coil from an outer peripheral edge of the first insulating layer. A step of forming a second insulating layer so as to be inside, and a magnetic pole tip portion from one side of the sloped portion excluding the upper surface of the second insulating layer to the non-magnetic layer on the magnetic pole tip side and the first magnetic pole portion. A step of forming a first upper magnetic layer at a junction between the other side of the inclined surface of the insulating layer and the lower magnetic layer forming a junction opposite to the magnetic pole tip; and the second insulating layer Forming an upper coil on the upper coil, and forming an outer peripheral edge on the upper coil. A step of forming a third insulating layer so as to be inside the outer peripheral edge of the second insulating layer; a step of forming the magnetic pole tip portion and the junction portion provided on the sloped surface portion of the second insulating layer on the third insulating layer; The following effects are brought about by forming the second upper magnetic layer so as to overlap the first upper magnetic layer.
即ち、厚い層間絶縁層の上に被着される磁性薄膜を第1
上部磁性層と第2磁性層の2回に分けて配置するためエ
ッチングが可能になり、また第1絶縁層と第2絶縁層と
第3絶縁層の各々を徐々に小さく形成し、且つ第1磁性
層と第2磁性層の斜面部で重ねるように形成したので、
従来あった斜面部での磁性膜の薄化状態が防止でき性能
のよい薄膜磁気ヘッドを提供できるものである。That is, the magnetic thin film deposited on the thick interlayer insulating layer is
Since the upper magnetic layer and the second magnetic layer are arranged in two steps, etching is possible, and the first insulating layer, the second insulating layer, and the third insulating layer are each formed gradually smaller, and Since the magnetic layer and the second magnetic layer are formed so as to overlap each other on the slope portion,
It is possible to provide a thin-film magnetic head with good performance that can prevent the thinned state of the magnetic film on the slope portion that has conventionally been present.
第1図(a)〜(i)は、本発明の磁気ヘッドの製造
図。 第2図、第3図は、本発明の磁気ヘッドの構成を示す断
面図。 第4図(a)〜(h)は従来の磁気ヘッドの製造図。 1……基板 2……下部磁性層 3……ギャップ非磁性層 4……第1絶縁層 5……下部コイル 6……第2絶縁層 7a,7b,7c,7d……上部磁性層 8……上部コイル 9……第3絶縁層 11……基板 12……下部磁性層 13……ギャップ非磁性層 14……第1絶縁層 15……下部コイル 16……第2絶縁層 17……上部コイル 18……第3絶縁層 19……上部磁性層1A to 1I are manufacturing drawings of the magnetic head of the present invention. 2 and 3 are cross-sectional views showing the structure of the magnetic head of the present invention. 4A to 4H are manufacturing drawings of a conventional magnetic head. 1 ... Substrate 2 ... Lower magnetic layer 3 ... Gap non-magnetic layer 4 ... First insulating layer 5 ... Lower coil 6 ... Second insulating layer 7a, 7b, 7c, 7d ... Upper magnetic layer 8 ... … Upper coil 9 …… Third insulating layer 11 …… Substrate 12 …… Lower magnetic layer 13 …… Gap non-magnetic layer 14 …… First insulating layer 15 …… Lower coil 16 …… Second insulating layer 17 …… Upper part Coil 18 ... Third insulating layer 19 ... Upper magnetic layer
Claims (1)
磁性層を被着形成する工程と、 前記非磁性層上に磁極先端部を除いて第1絶縁層を形成
する工程と、 前記第1絶縁層上に下部コイルを形成する工程と、 前記下部コイル上に外周縁が前記第1絶縁層の外周縁よ
り内側になるように第2絶縁層を形成する工程と、 前記第2絶縁層の上面を除いた斜面部の一方の側から前
記磁極先端部側の非磁性層上にかけての磁極先端部分と
前記第2絶縁層の斜面部の他方の側から前記磁極先端部
の反対側の接合部を形成する前記下部磁性層上にかけて
の接合部分に第1上部磁性層を形成する工程と、 前記第2絶縁層上に上部コイルを形成する工程と、 前記上部コイル上に外周縁が前記第2絶縁層の外周縁よ
り内側になるよう第3絶縁層を形成する工程、 前記第3絶縁層上に前記第2絶縁層の斜面部に設けられ
た前記磁極先端部分と前記接合部分の第1上部磁性層に
重なるように第2上部磁性層を形成する工程とからなる
ことを特徴とする磁気ヘッドの製造方法。1. A step of forming a lower magnetic layer on a substrate, a step of depositing and forming a nonmagnetic layer forming a gap at a magnetic pole tip on the lower magnetic layer, and a magnetic pole tip on the nonmagnetic layer. Forming a first insulating layer except for a portion, forming a lower coil on the first insulating layer, and forming an outer peripheral edge on the lower coil so as to be inside an outer peripheral edge of the first insulating layer. Forming a second insulating layer on the non-magnetic layer on one side of the sloped surface excluding the upper surface of the second insulating layer and on the non-magnetic layer on the magnetic pole tip side and the second insulating layer. Forming a first upper magnetic layer at a junction between the other side of the sloped portion and the lower magnetic layer forming a junction opposite to the magnetic pole tip; and an upper coil on the second insulating layer. And a step of forming an outer peripheral edge of the second insulating layer on the upper coil. Forming a third insulating layer so as to be inside the outer peripheral edge, the magnetic pole tip portion provided on the sloped portion of the second insulating layer on the third insulating layer, and the first upper magnetic layer at the junction portion. And a step of forming the second upper magnetic layer so as to overlap each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60202041A JPH0736208B2 (en) | 1985-09-12 | 1985-09-12 | Method of manufacturing magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60202041A JPH0736208B2 (en) | 1985-09-12 | 1985-09-12 | Method of manufacturing magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6262415A JPS6262415A (en) | 1987-03-19 |
| JPH0736208B2 true JPH0736208B2 (en) | 1995-04-19 |
Family
ID=16450949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60202041A Expired - Lifetime JPH0736208B2 (en) | 1985-09-12 | 1985-09-12 | Method of manufacturing magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0736208B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0810485B2 (en) * | 1989-03-20 | 1996-01-31 | 株式会社日立製作所 | Magnetic disk device, thin film magnetic head mounted thereon, manufacturing method thereof, and information writing / reading method |
| US5798897A (en) * | 1996-10-21 | 1998-08-25 | International Business Machines Corporation | Inductive write head with insulation stack configured for eliminating reflective notching |
| US5805391A (en) * | 1996-10-28 | 1998-09-08 | International Business Machines Corporation | Write head with recessed stitched yoke on a planar portion of an insulation layer defining zero throat height |
| JP4702553B2 (en) * | 2006-02-14 | 2011-06-15 | セイコーエプソン株式会社 | Method for forming piezoelectric element portion of liquid jet head |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60119613A (en) * | 1983-12-02 | 1985-06-27 | Hitachi Ltd | Thin film magnetic head and its manufacturing method |
-
1985
- 1985-09-12 JP JP60202041A patent/JPH0736208B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6262415A (en) | 1987-03-19 |
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