JPH0737341B2 - Ceramic powder compact coating method - Google Patents
Ceramic powder compact coating methodInfo
- Publication number
- JPH0737341B2 JPH0737341B2 JP61236667A JP23666786A JPH0737341B2 JP H0737341 B2 JPH0737341 B2 JP H0737341B2 JP 61236667 A JP61236667 A JP 61236667A JP 23666786 A JP23666786 A JP 23666786A JP H0737341 B2 JPH0737341 B2 JP H0737341B2
- Authority
- JP
- Japan
- Prior art keywords
- ceramic powder
- powder compact
- coating
- coating liquid
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えばターボチャージ用タービンホィールや
ガスタービン用タービンホィールの如く複雑な形状を有
するセラミック製品などを製造するために、セラミック
等の粉末成形体を静水圧加圧するに先立って成形体中の
空気の脱気と同時に静水圧加圧媒体の浸透を防ぐための
被膜を形成する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a powder of ceramic or the like for producing a ceramic product having a complicated shape such as a turbine wheel for turbocharge or a turbine wheel for gas turbine. The present invention relates to a method of forming a coating for preventing permeation of a hydrostatic pressure medium at the same time as deaeration of air in the molded body prior to hydrostatic pressing of the molded body.
[従来の技術] セラミック粉末成形体(含む脱脂体)の密度を均質化す
る目的で静水圧加圧を行なうことは周知である。この静
水圧加圧手法を、例えばタービンホィールやガスタービ
ンエンジン用ステータ等の複雑形状の部品の製造に適用
するには静水圧加圧被膜コート技術が必要となる。[Prior Art] It is well known that hydrostatic pressing is performed for the purpose of homogenizing the density of a ceramic powder compact (including degreased body). In order to apply this hydrostatic pressurization method to the production of parts having a complicated shape such as a turbine wheel or a stator for a gas turbine engine, a hydrostatic pressurization film coating technique is required.
特開昭61−64801号公報及び特開昭61−69405号公報にこ
の分野の従来技術が開示されている。すなわち特開昭61
−64801号公報においては、弾性材質袋状物に詰めて静
水圧加圧を施す方法が示され、一方特開昭61−69405号
公報には複数形状成形体に被膜を形成する方法が記載さ
れている。Japanese Patent Laid-Open Nos. 61-64801 and 61-69405 disclose prior arts in this field. That is, JP-A-61
JP-A-64801 discloses a method of filling a bag-shaped material of an elastic material and applying hydrostatic pressure, while JP-A-61-69405 discloses a method of forming a film on a molded article having a plurality of shapes. ing.
[発明が解決しようとする問題点] 静水圧加圧工程は通常成形体中の空気の悪影響を避ける
ため、脱気後行うことが望ましく又静水圧加圧工程に先
立って、静水圧加圧時の加圧媒体の浸漬を防止する被膜
を成形体に形成することが重要である。上記従来技術の
うち特開昭61−64801号公報に開示された技術は、脱気
は可能であるが、複雑形状部品の製造に適用することが
できないという難点があり、一方、特開昭61−64905号
公報に開示された技術は、脱気処理を実施することが出
来ないという問題がある。[Problems to be Solved by the Invention] In order to avoid the adverse effect of air in the molded body, it is desirable that the hydrostatic pressure step be performed after deaeration. It is important to form a coating film on the molded body to prevent the immersion of the pressurized medium. Among the above-mentioned conventional techniques, the technique disclosed in Japanese Patent Laid-Open No. 61-64801 is capable of degassing, but has a drawback that it cannot be applied to the production of parts having complicated shapes. The technique disclosed in Japanese Laid-Open Patent Publication No. -64905 has a problem that the degassing process cannot be performed.
本発明は上記した事情に鑑みなされたものであり、その
目的は、セラミック粉末成形体の静水圧加圧に先立つ被
膜形成工程中に脱気持処理を行うことが出来かつ複雑形
状部品の製造に使用するに適したセラミック粉末成形体
用被膜形成方法を提供するにある。The present invention has been made in view of the above circumstances, and an object thereof is to perform deaerating treatment during a film forming step prior to hydrostatic pressure application of a ceramic powder compact and to be used for manufacturing a component having a complicated shape. Another object of the present invention is to provide a method for forming a coating film for a ceramic powder compact, which is suitable for
[問題点を解決するための手段] 本発明のセラミック粉末成形体用被膜形成方法は、セラ
ミック粉末成形体を、圧力室内の被膜液槽に収容された
気泡を含有する被膜液の中へ、該セラミック粉末成形体
の一部が液面から露出した状態で浸漬する浸漬工程と、 該圧力室内を減圧下におき、該セラミック粉末成形体の
脱気を行うと同時に該セラミック粉末成形全体を被膜液
中へ埋没させる埋没工程と、 該脱気及び埋没処理後、該圧力室内の圧力を再び大気圧
に戻し、該セラミック粉末成形体の表面に被膜を形成す
る被膜形成工程とからなることを特徴とするものであ
る。[Means for Solving Problems] A method for forming a coating film for a ceramic powder molded body according to the present invention is a method of forming a ceramic powder molded body into a coating liquid containing bubbles contained in a coating liquid tank in a pressure chamber. An immersion step of immersing the ceramic powder compact in a state where a part of the ceramic powder compact is exposed from the liquid surface, and depressurizing the ceramic powder compact by placing the pressure chamber under a reduced pressure and at the same time coating the entire ceramic powder compact with a coating liquid. And a film forming step of forming a film on the surface of the ceramic powder compact by returning the pressure in the pressure chamber to the atmospheric pressure again after the degassing and burying process. To do.
即ち、本発明の被膜形成方法は、気泡を含有する被膜液
(粘性液体)を減圧下におくと、脱泡のため被膜液面が
上昇する現象を利用してセラミック粉末成形体の脱気と
同時に被膜形成を行うことを特色とするものである。That is, in the method for forming a coating film of the present invention, when a coating liquid (viscous liquid) containing bubbles is put under a reduced pressure, the phenomenon that the coating liquid surface rises due to defoaming is used to degas the ceramic powder compact. The feature is that a film is formed at the same time.
[作用] 本発明によれば、まず圧力室内の被膜液槽(気泡を含有
する被膜液が収容されている)内へセラミック粉末成形
体を、その一部が液面より露出した状態で浸漬させる
(浸漬工程)。この状態で圧力室内の減圧を開始する
と、圧力室全体の脱気が進行し、これに伴い浸漬された
セラミック粉末成形体がその開気孔を介して脱気され
る。この脱気によって被膜液中に含有される気泡が膨脹
し、液面が上昇するため、セラミック粉末成形体が被膜
液中に埋没する(埋没工程)。その後、圧力室内の圧力
を再び大気圧に戻すと液面は下降し、脱気されたセラミ
ック粉末成形体の全表面に被膜が密着形成される。(被
膜形成工程)。[Operation] According to the present invention, first, the ceramic powder compact is immersed in the coating liquid tank (containing the coating liquid containing air bubbles) in the pressure chamber, with a part of the ceramic powder molding exposed from the liquid surface. (Dip step). When decompression in the pressure chamber is started in this state, deaeration of the entire pressure chamber proceeds, and the ceramic powder compact thus immersed is deaerated through the open pores. By this deaeration, the bubbles contained in the coating liquid expand and the liquid surface rises, so that the ceramic powder compact is embedded in the coating liquid (immersion step). Then, when the pressure in the pressure chamber is returned to the atmospheric pressure again, the liquid surface is lowered, and the coating film is adhered to the entire surface of the deaerated ceramic powder compact. (Film forming step).
[実施例] 以下、本発明の具体的な実施例を説明する。本発明の被
膜形成方法を実施するための装置の縦断面図を第1図
に、この装置の平面図を第2図に、第1図及び第2図に
示す装置による被膜形成の原理を説明する説明図を第
3、第4及び第5図にそれぞれ示す。[Examples] Specific examples of the present invention will be described below. FIG. 1 is a longitudinal sectional view of an apparatus for carrying out the film forming method of the present invention, FIG. 2 is a plan view of the apparatus, and the principle of film formation by the apparatus shown in FIGS. 1 and 2 is described. Explanatory diagrams for doing so are shown in FIGS. 3, 4, and 5, respectively.
本発明のセラミック粉末成形体用被膜形成方法は前述の
通り、複数な形状を有する種々のセラミック製品に適用
することが出来るが、ここでは一例として、タービンホ
ィールの製造に適用した場合について説明する。As described above, the method for forming a coating film for a ceramic powder compact of the present invention can be applied to various ceramic products having a plurality of shapes. Here, as an example, a case of applying it to the production of a turbine wheel will be described.
第1図に示す通り、本発明の方法を実施するための装置
は、セラミック粉末成形体1(ターボホィール)、被膜
液槽2、被膜液槽2に収容され、気泡を含有する被膜液
3、ターンテーブル4、ターンテーブルのシャフト5、
セラミック粉末成形体1の保持治具6、隔壁7、圧力用
配管8、バルブ9、真空ポンプ10、制御部11、圧力室13
A、乾燥室13B、成形体のセット室13C、被膜液排出弁1
4、液排出管17、被膜液貯め18、ポンプ19、被膜液供給
管20及び供給口21以上から構成されている。なお前記制
御部11からはバルブ9を制御する信号12が、また15はタ
ーンテーブルの停止信号で被膜液排出弁14を制御する。
16はセラミック粉末成形体1に形成された被膜である。As shown in FIG. 1, the apparatus for carrying out the method of the present invention comprises a ceramic powder compact 1 (turbo wheel), a coating liquid tank 2, a coating liquid tank 2, and a coating liquid 3 containing bubbles, Turntable 4, turntable shaft 5,
Holding jig 6 for ceramic powder compact 1, partition 7, pressure pipe 8, valve 9, vacuum pump 10, controller 11, pressure chamber 13
A, drying chamber 13B, molded body setting chamber 13C, coating liquid discharge valve 1
4. A liquid discharge pipe 17, a coating liquid reservoir 18, a pump 19, a coating liquid supply pipe 20, and a supply port 21 and above. A signal 12 for controlling the valve 9 and a turntable stop signal 15 for controlling the coating liquid discharge valve 14 are supplied from the control unit 11.
Reference numeral 16 is a film formed on the ceramic powder compact 1.
次に本実施例装置による被膜形成方法について原理図を
参照しつつ説明する。Next, a method of forming a film by the apparatus of this embodiment will be described with reference to the principle diagram.
まず、浸漬工程において圧力室13Aの被膜液槽2中の保
持治具6にセラミック粉末成形体1を設置する。保持治
具6は後で行われる成形体1の取出しを考慮すると、テ
フロン等のはがれ易い材質を用いることが望ましい。こ
の場合第3図の原理図に示すようにセラミック粉末成形
体1はその一部が液面から露出した状態で保持治具6に
設置される。First, in the dipping step, the ceramic powder compact 1 is placed on the holding jig 6 in the coating liquid tank 2 of the pressure chamber 13A. The holding jig 6 is preferably made of a material that easily peels off, such as Teflon, in consideration of taking out the molded body 1 performed later. In this case, as shown in the principle diagram of FIG. 3, the ceramic powder compact 1 is placed on the holding jig 6 with a part thereof exposed from the liquid surface.
次に埋没工程に移り、真空ポンプ10を作動させ、圧力室
13A内を減圧する。減圧を開始すると、圧力室13A全体の
脱気が行われ、セラミック粉末成形体1の開気孔(図示
せず)を通じてセラミック粉末成形体1が脱気され、同
時に第4図に示すように、被膜液3中の気泡22が膨脹
し、液面が上昇してセラミック粉末成形体1全体が被膜
液3の中に埋没する。Next, move to the burial process, operate the vacuum pump 10 and
Reduce the pressure in 13A. When the pressure reduction is started, the entire pressure chamber 13A is degassed, and the ceramic powder compact 1 is degassed through the open pores (not shown) of the ceramic powder compact 1, and at the same time, as shown in FIG. The bubbles 22 in the liquid 3 expand, the liquid surface rises, and the entire ceramic powder compact 1 is embedded in the coating liquid 3.
その後被膜形成工程へ移行し、圧力室13A内の圧力を大
気圧にもどすと、液面は下降し第5図に示すように脱気
されたセラミック粉末成形体1に被膜16が形成される。
なお、この減圧状態から大気圧状態への切換えは、セラ
ミック粉末成形体1が被膜液3中に埋没した時点を、液
面、時間、或いは圧力値で検知し、制御部11からの信号
12でバルブ9を開放することによって行う。After that, when the film forming step is started and the pressure in the pressure chamber 13A is returned to the atmospheric pressure, the liquid surface is lowered and the film 16 is formed on the degassed ceramic powder compact 1 as shown in FIG.
The depressurized state is switched to the atmospheric pressure state by detecting the time when the ceramic powder compact 1 is buried in the coating liquid 3 by the liquid level, time or pressure value, and the signal from the control unit 11 is detected.
This is done by opening valve 9 at 12.
以上の固定を経て被膜が形成される。この被膜形成のあ
と、被膜16乾燥のため、ターンテーブル4を回転し、被
膜16で覆われたセラミック粉末成形体1を乾燥室13Bへ
送り込む。この時ターンテーブル4の回転停止信号15に
より、被膜液槽2に設けられた被膜液排出用弁機構を構
成する被膜液排出弁14を開放し被膜に供されなかった被
膜液3を抜き去り、その後乾燥に必要な温度に保持す
る。この温度は溶媒の種類や量により異なるが、急激な
昇温は望ましくなく、15〜60℃雰囲気に維持するのが好
ましい。乾燥室13Bにおいて、被膜形成されセラミック
粉末成形体を取り出し後、ターンテーブル4を更に回転
させセット室13Cにおいて被膜液槽2内へ新たに供給口2
1から被膜液3を充填し、次のセラミック粉末形成体を
保持治具6上にセットする。先の処理工程を完了して弁
14を通じて排出された被膜液3は被膜液貯め18に貯めら
れ、ここで空気を気泡として含有したのち再びポンプ1
9、被膜液供給管20、供給口21を経て前述したように被
膜液槽2内へ注入される。これら被膜液排出排出弁14、
液排出管17、被膜液貯め18、ポンプ19、被膜液供給管20
及び供給口は被膜液循環系を構成する。A coating is formed through the above fixing. After forming this coating, the turntable 4 is rotated to dry the coating 16, and the ceramic powder compact 1 covered with the coating 16 is sent to the drying chamber 13B. At this time, the rotation stop signal 15 of the turntable 4 opens the coating liquid discharge valve 14 constituting the coating liquid discharge valve mechanism provided in the coating liquid tank 2 to remove the coating liquid 3 not used for coating, After that, the temperature required for drying is maintained. Although this temperature varies depending on the kind and amount of the solvent, a rapid temperature rise is not desirable, and it is preferable to maintain the atmosphere at 15 to 60 ° C. In the drying chamber 13B, after taking out the film-formed ceramic powder compact, the turntable 4 is further rotated to newly supply the supply port 2 into the coating liquid tank 2 in the setting chamber 13C.
The coating liquid 3 is filled from 1 and the next ceramic powder forming body is set on the holding jig 6. Valve after completing the previous processing steps
The coating liquid 3 discharged through 14 is stored in the coating liquid storage 18, in which air is contained as bubbles and then pump 1 is again used.
9. Through the coating liquid supply pipe 20 and the supply port 21, it is injected into the coating liquid tank 2 as described above. These coating liquid discharge discharge valve 14,
Liquid discharge pipe 17, coating liquid reservoir 18, pump 19, coating liquid supply pipe 20
And the supply port constitute a coating liquid circulation system.
[発明の効果] 本発明による被膜形成方法によれば、静水圧加圧に先立
つ被膜形成工程中に脱気処理を行なうことができ、かつ
従来法では手作業で行っていた成形体の被膜液への浸漬
工程を自動化することが出来るため工数低減の実現を可
能にする。また制御系による被膜形成工程の管理ができ
るため被膜の厚さの調整を自由に行うことができ被膜の
品質向上を図ることができる。更に被膜中の気泡を消滅
させ得るので乾燥において通常より急激な昇温を行って
も気泡膨脹による被膜破れ等が少なくなりこの点からも
被膜の品質向上が可能である。EFFECTS OF THE INVENTION According to the coating film forming method of the present invention, degassing treatment can be performed during the film forming step prior to hydrostatic pressure application, and the coating liquid for the molded body, which was conventionally manually applied. Since it is possible to automate the soaking process, it is possible to reduce man-hours. Further, since the control system can control the film forming process, the thickness of the film can be freely adjusted and the quality of the film can be improved. Further, since the bubbles in the coating can be eliminated, even if the temperature is raised more rapidly than usual in the drying, the coating is not broken due to the expansion of the bubbles, and the quality of the coating can be improved also from this point.
第1図は本発明のセラミック粉末成形体用被膜形成方法
の実施に用いる装置の縦断面図であり、第2図は第1図
の装置の平面図である。第3図、第4図及び第5図は被
膜形成方法の原理を説明する図である。 1……セラミック粉末成形体 2……被膜液槽、3……被膜液 6……保持治具、9……バルブ 10……真空ポンプ、11……制御部 13A……圧力室 14……被膜液排出弁(被膜液排出用弁機構) 16……被膜 17……液排出管(被膜液循環系) 18……被膜液貯め(被膜液循環系) 19……ポンプ(被膜液循環系) 20……被膜液供給管(被膜液循環系) 21……供給口(被膜液循環系) 22……気泡FIG. 1 is a vertical sectional view of an apparatus used for carrying out the method for forming a coating film for a ceramic powder compact of the present invention, and FIG. 2 is a plan view of the apparatus of FIG. FIG. 3, FIG. 4 and FIG. 5 are views for explaining the principle of the film forming method. 1 …… Ceramic powder compact 2 …… Coating liquid tank 3 …… Coating liquid 6 …… Holding jig, 9 …… Valve 10 …… Vacuum pump, 11 …… Control unit 13A …… Pressure chamber 14 …… Coating Liquid discharge valve (valve mechanism for discharging coating liquid) 16 …… Coating film 17 …… Liquid discharge pipe (coating liquid circulation system) 18 …… Coating liquid storage (coating liquid circulation system) 19 …… Pump (coating liquid circulation system) 20 …… Coating liquid supply pipe (coating liquid circulation system) 21 …… Supply port (coating liquid circulation system) 22 …… Bubbles
Claims (3)
液槽に収容された気泡を含有する被膜液の中へ、該セラ
ミック粉末成形体の一部が液面から露出した状態で浸漬
する浸漬工程と、 該圧力室内を減圧下におき、該セラミック粉末成形体の
脱気を行うと同時に該セラミック粉末成形体全体を被膜
液中へ埋没させる埋没工程と、 該脱気及び埋没処理後、該圧力室内の圧力を再び大気圧
に戻し、該セラミック粉末成形体の表面に被膜を形成す
る被膜形成工程とからなることを特徴とするセラミック
粉末成形体被膜形成方法。1. Immersing a ceramic powder compact in a coating liquid containing air bubbles contained in a coating liquid tank in a pressure chamber with a part of the ceramic powder compact being exposed from the liquid surface. A step of placing the pressure chamber under a reduced pressure to deaerate the ceramic powder compact, and at the same time burying the whole ceramic powder compact in the coating solution; A method for forming a coating film on a ceramic powder compact, comprising: returning the pressure in the pressure chamber to atmospheric pressure again; and forming a coating film on the surface of the ceramic powder compact.
えている特許請求の範囲第1項記載のセラミック粉末形
成体被膜形成方法。2. The method for forming a coating film on a ceramic powder forming body according to claim 1, wherein the coating solution tank is provided with a valve mechanism for discharging the coating solution.
させるための被膜液循環系と連結されている特許請求の
範囲第1項記載のセラミック粉末成形体被膜形成方法。3. The method for forming a coating film on a ceramic powder compact according to claim 1, wherein the coating solution tank is connected to a coating solution circulating system for allowing the coating solution to contain the bubbles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61236667A JPH0737341B2 (en) | 1986-10-04 | 1986-10-04 | Ceramic powder compact coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61236667A JPH0737341B2 (en) | 1986-10-04 | 1986-10-04 | Ceramic powder compact coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6395165A JPS6395165A (en) | 1988-04-26 |
| JPH0737341B2 true JPH0737341B2 (en) | 1995-04-26 |
Family
ID=17004002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61236667A Expired - Lifetime JPH0737341B2 (en) | 1986-10-04 | 1986-10-04 | Ceramic powder compact coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0737341B2 (en) |
-
1986
- 1986-10-04 JP JP61236667A patent/JPH0737341B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6395165A (en) | 1988-04-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4311735A (en) | Impregnation of porous articles | |
| JPS61238315A (en) | Preparation of double-layered filter | |
| CN100494711C (en) | System and method for filling a hydrodynamic bearing with fluid | |
| JPH0737341B2 (en) | Ceramic powder compact coating method | |
| US7753088B2 (en) | System and method for filling hydrodynamic bearings with fluid | |
| JPH05169039A (en) | Ultrasonic cleaning method | |
| JP4205318B2 (en) | Filter medium processing method in liquid flow path | |
| JPS6195760A (en) | Method and device for casting | |
| JPH09272902A (en) | Device for impregnating porous member | |
| JPH0810591A (en) | Hollow fiber membrane edge coating method | |
| JPS6247490A (en) | Method and device for impregnating die-cast product | |
| JP3385894B2 (en) | Semiconductor device manufacturing method and apparatus | |
| JP2976545B2 (en) | Molding method in filling casting method | |
| RU2064097C1 (en) | Method for filling inner spaces with liquid filler | |
| JPH06206043A (en) | Painting method | |
| JP4636226B2 (en) | Vacuum impregnation casting apparatus for armature winding and method for manufacturing armature winding | |
| JP2591884B2 (en) | Isotropic hydrostatic pressing mold, molding method using the same, method and apparatus for manufacturing isotropic hydrostatic pressing mold, and isotropic hydrostatic pressing molded body | |
| CN116638067A (en) | A Method for Reducing the Leakage Rate of Die Casting Aluminum Alloy Products | |
| JP3352190B2 (en) | Immersion device for porous material | |
| JPH0511259A (en) | Production of liquid crystal cell | |
| JPS614628A (en) | Impregnation method and its device | |
| JP2007015133A (en) | Two-component silicone mixed discharge apparatus and two-component silicone mixed discharge method using the same | |
| JPH01271205A (en) | Slip casting molding method | |
| JPH0381121A (en) | Molding method and its device | |
| RU2235924C2 (en) | Method of filling closed systems with fluid |