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JPH0742194B2 - Single crystal manufacturing equipment - Google Patents
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JPH0742194B2 - Single crystal manufacturing equipment - Google Patents

Single crystal manufacturing equipment

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Publication number
JPH0742194B2
JPH0742194B2 JP2729687A JP2729687A JPH0742194B2 JP H0742194 B2 JPH0742194 B2 JP H0742194B2 JP 2729687 A JP2729687 A JP 2729687A JP 2729687 A JP2729687 A JP 2729687A JP H0742194 B2 JPH0742194 B2 JP H0742194B2
Authority
JP
Japan
Prior art keywords
molded body
single crystal
raw material
heating
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2729687A
Other languages
Japanese (ja)
Other versions
JPS63195189A (en
Inventor
敏弘 小谷
紘二 多田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP2729687A priority Critical patent/JPH0742194B2/en
Publication of JPS63195189A publication Critical patent/JPS63195189A/en
Publication of JPH0742194B2 publication Critical patent/JPH0742194B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、GaAs等のIII−V族化合物半導体単結晶、ZnT
e,CdTe等のII−VI族化合物半導体単結晶、Si,Ge等の半
導体単結晶、LiNbO3,Bi12SiO20等の酸化物単結晶を製造
する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention is directed to III-V group compound semiconductor single crystals such as GaAs and ZnT.
The present invention relates to an apparatus for producing II-VI group compound semiconductor single crystals such as e and CdTe, semiconductor single crystals such as Si and Ge, and oxide single crystals such as LiNbO 3 and Bi 12 SiO 20 .

〔従来の技術〕[Conventional technology]

原料融液内に、上部が広く底部が狭く先端に小開口部を
有する成形体を浸漬させて原料融液を内外に二分し、該
成形体内部の原料融液から単結晶を引上げることは、た
とえば特願昭60-199377号に示されている。この成形体
は原料融液内の半径方向の温度分布を制御するためのも
ので、引上結晶の固液界面の平坦化を意図したものであ
つた。
In the raw material melt, a molded body having a wide top and a narrow bottom and a small opening at the tip is dipped to divide the raw material melt into two parts, and a single crystal is pulled from the raw material melt inside the molded body. , For example, in Japanese Patent Application No. 60-199377. This compact was intended to control the temperature distribution in the radial direction within the raw material melt, and was intended to flatten the solid-liquid interface of the pulled crystal.

しかし、成形体の材質や形状によつては、成形体を通し
て融液からの熱逃散が大きいため、引上結晶の固液界面
の形状は上に凸形(concave)になり易い。これは、転
位の増加,リネージの発生等結晶欠陥を増加させる原因
となる。また、熱逃散が著しい場合には結晶と成形体が
固着することもあり、多結晶化の原因となる。
However, depending on the material and shape of the molded body, the heat dissipation from the melt through the molded body is large, so that the shape of the solid-liquid interface of the pulling crystal tends to be upwardly convex (concave). This causes increase of crystal defects such as increase of dislocations and generation of lineage. Further, when the heat dissipation is remarkable, the crystal and the molded body may adhere to each other, which causes polycrystallization.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明は従来の単結晶の製造装置の欠点を解消し、成形
体からの熱の逃散を防止し、成形体自体の温度を調整可
能とし、原料融液の温度分布、さらには、引上結晶の固
液界面の形状の制御を可能とした単結晶の製造装置を提
供しようとするものである。
The present invention eliminates the drawbacks of the conventional single crystal production apparatus, prevents heat from escaping from the molded body, makes it possible to adjust the temperature of the molded body itself, temperature distribution of the raw material melt, and further pulling crystal An object of the present invention is to provide a single crystal manufacturing apparatus capable of controlling the shape of the solid-liquid interface.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、原料融液又は原料融液と液体封止剤を収容す
るるつぼと、るつぼを回転昇降可能に支持する下軸と、
るつぼの周囲に設けた原料加熱用ヒータと、回転昇降可
能で下端に種結晶を取り付けた上軸と、上部が広く底部
が狭く先端に小開口部を有する成形体とを具備し、該成
形体を原料融液に浸漬するように配置した単結晶の製造
装置において、該成形体に加熱手段を保有させることを
特徴とする単結晶の製造装置である。
The present invention is a crucible for containing a raw material melt or a raw material melt and a liquid sealant, and a lower shaft for supporting the crucible so that the crucible can be rotated up and down,
A raw material heating heater provided around the crucible, an upper shaft capable of rotating up and down and having a seed crystal attached to a lower end thereof, and a molded body having a wide upper portion, a narrow bottom portion and a small opening portion at a tip, In the apparatus for producing a single crystal, which is arranged so as to be immersed in the raw material melt, the forming body is provided with a heating means.

成形体に加熱手段を保有させる方法としては、成形体
自体を発熱体で構成する外に、成形体の周囲に加熱体
を一体的に付設すること、又は成形体の周囲に加熱体
を分離した状態で付設することもできる。成形体の加熱
は、抵抗加熱が制御性の点で優れているが、導電性材料
で成形体を構成して高周波加熱をすることもできる。
As a method of holding the heating means in the molded body, in addition to forming the molded body itself with a heating element, a heating body is integrally attached around the molded body, or the heating body is separated around the molded body. It can be attached in the state. Regarding heating of the molded body, resistance heating is excellent in controllability, but it is also possible to form the molded body from a conductive material and perform high frequency heating.

成形体の材料特性としては、原料融液と反応しないこ
と、および耐熱性高純度加工性低価格であるこ
とが要求される。従つて、結晶材料によつて使用できる
成形体の材料は異なる。一般的には、カーボン,石英,P
BN,BN,AlN,SiC,Si3N4,Al2O3などのセラミツクスが使用
でき、必要に応じて表面をコーテイングすることもでき
る。抵抗加熱体で成形体を構成するときにはカーボンや
SiCなどを用いるとよい。
As the material properties of the molded body, it is required that it does not react with the raw material melt and that it has heat resistance, high purity workability, and low cost. Therefore, the material of the molded body that can be used differs depending on the crystalline material. Generally, carbon, quartz, P
Ceramics such as BN, BN, AlN, SiC, Si 3 N 4 and Al 2 O 3 can be used, and the surface can be coated if necessary. When forming a compact with a resistance heating element, carbon or
It is better to use SiC or the like.

第1図は本発明の一具体例である単結晶の製造装置の断
面図である。
FIG. 1 is a cross-sectional view of an apparatus for producing a single crystal which is a specific example of the present invention.

原料融液2及び液体封止剤3を収容するるつぼ4を回転
昇降に下軸6で支持する。るつぼ4の周囲にヒーター7
を設けて原料を加熱溶融する。ヒーター7の外側に断熱
材8を配置する。円筒部の下部には、先端に小開口部を
有する円錐部を付した成形体9を、原料融液2内に浸漬
し、該成形体9の内側の原料融液2に引上げ軸5の先端
に取り付けた種結晶を浸し、単結晶1を引上げる。本発
明の特徴は、この成形体9を発熱体で構成することにあ
り、第1図の装置では成形体9の上部両端を電極10で支
持し、ここから成形体に通電するようになつている。ま
た、成形体は下方の肉厚を薄くして抵抗値を上げて加熱
を高めるとともに、上方の肉厚を厚くして発熱を防止し
かつ、成形体支持のために機械的強度を高めている。な
お、るつぼ4の底、ヒーター7及び成形体9の裏側にそ
れぞれ温度センサー11を設け、原料融液の温度並びにヒ
ーターと成形体の加熱温度を検出する。
A crucible 4 containing the raw material melt 2 and the liquid sealant 3 is supported by a lower shaft 6 for rotation and elevation. Heater 7 around crucible 4
Is provided to heat and melt the raw material. A heat insulating material 8 is arranged outside the heater 7. A molded body 9 having a conical portion having a small opening at the tip is immersed in the raw material melt 2 at the lower part of the cylindrical portion, and the tip of the pulling shaft 5 is applied to the raw material melt 2 inside the molded body 9. The single crystal 1 is pulled up by immersing the seed crystal attached to. The feature of the present invention resides in that the molded body 9 is composed of a heating element. In the apparatus shown in FIG. 1, both upper ends of the molded body 9 are supported by the electrodes 10, and the molded body is energized from there. There is. In addition, the molded body has a lower thickness to increase the resistance value to increase heating, and an upper thickness to increase heat generation to prevent heat generation, and to increase mechanical strength for supporting the molded body. . It should be noted that temperature sensors 11 are provided on the bottom of the crucible 4, the heater 7 and the back side of the molded body 9 to detect the temperature of the raw material melt and the heating temperature of the heater and the molded body.

第2図はカーボン製の抵抗発熱体で構成した成形体の一
例を示した図である。同図(a)は成形体の斜視図であ
り、(b)は正面図である。(c)は成形体の発熱回路
の説明図であり、太線の部分が発熱部である。第2図
(a)(b)のように成形体にはスリツトを入れ、発熱
回路を形成する。成形体表面は、融液との絶縁のため
に、PBNで全面がコーテイングされている。
FIG. 2 is a view showing an example of a molded body composed of a resistance heating element made of carbon. The figure (a) is a perspective view of a molded object, and the figure (b) is a front view. (C) is an explanatory view of a heat generating circuit of the molded body, and a thick line portion is a heat generating portion. As shown in FIGS. 2 (a) and 2 (b), a slit is put in the molded body to form a heating circuit. The surface of the compact is entirely coated with PBN for insulation from the melt.

〔作用〕[Action]

第3図は成形体と引上げ結晶の関係を示した図である。
成形体は原料融液中に底部が浸漬しており、上部は炉内
のガス中に露出している。融液温度に比べて炉内のガス
温度は低いために、成形体の露出部分は著しく冷却され
る。その結果、成形体を通して融液の熱が逃散するよう
になり、成形体壁面附近の融液温度は成形体中央部の温
度より若干低下して、引上結晶の固液界面は上に凸の形
状となる。
FIG. 3 is a diagram showing the relationship between the compact and the pulled crystal.
The molded body has a bottom immersed in the raw material melt and an upper part exposed to the gas in the furnace. Since the gas temperature in the furnace is lower than the melt temperature, the exposed portion of the compact is significantly cooled. As a result, the heat of the melt escapes through the compact, the melt temperature near the wall surface of the compact is slightly lower than the temperature in the center of the compact, and the solid-liquid interface of the pulling crystal is convex upward. It becomes the shape.

本発明は成形体に加熱手段を保有させて高温に維持する
ことにより上記のような成形体の冷却を回避することが
でき、その結果、引上げ結晶の固液界面を平坦化でき、
結晶欠陥を低減することができる。
The present invention can avoid the cooling of the molded body as described above by keeping the molded body with a heating means and maintaining it at a high temperature, and as a result, the solid-liquid interface of the pulled crystal can be flattened.
Crystal defects can be reduced.

〔実施例〕〔Example〕

第2図の成形体を組み込んだ第1図の単結晶の製造装置
を用いて、GaAs単結晶を製造した。
A GaAs single crystal was manufactured using the single crystal manufacturing apparatus of FIG. 1 incorporating the molded body of FIG.

成形体は内径80mmφ,外形90mmφで底部に10mmφの小開
口部を有するもので、全体の高さを10cm,ヒーター部の
高さ6.5cmとし、第2図のようにスリツトを入れた。材
質はカーボン製で表面はPBNでコーテイングされてい
る。
The molded body had an inner diameter of 80 mmφ, an outer diameter of 90 mmφ and a small opening of 10 mmφ at the bottom. The overall height was 10 cm and the heater portion height was 6.5 cm, and a slit was inserted as shown in FIG. The material is made of carbon and the surface is coated with PBN.

るつぼにはアンドーブGaAs原料融液を約1.2kg,液体封止
剤B2O3240gを収容し、種結晶を用いて(100)方向に引
上げた。結晶の回転速度は5rpm,るつぼの回転速度は15r
pmで、両者の回転方向は逆向きとし、引上速度は6mm/H,
固液界面近傍の温度勾配は50℃/cmとした。以上の条件
の下で、成形体を加熱して引上げた結晶と加熱しないで
引上げた結晶についてX線トポグラフ及びEPDによる転
位密度の評価を行なつた。
About 1.2 kg of Andove GaAs raw material melt and 240 g of liquid encapsulant B 2 O 3 were placed in the crucible and pulled in the (100) direction using a seed crystal. Crystal rotation speed is 5 rpm, crucible rotation speed is 15 r
At pm, the rotation directions of both are opposite and the pulling speed is 6 mm / H,
The temperature gradient near the solid-liquid interface was 50 ° C / cm. Under the above-mentioned conditions, dislocation density was evaluated by X-ray topography and EPD for the crystal pulled up by heating the molded body and the crystal pulled up without heating.

X線トポグラフによる固液界面の形状は加熱したものが
若干下に凸でほぼ平坦であつたのに対して、加熱しない
ものは円周部と中央部の結晶がより下方に成長して、断
面M型を呈していた。また、EPDによる転位密度の平均
値は、加熱したものが5×103cm-2でリネージが見られ
なかつたのに対して、加熱しないものは1×104cm-2
リネージが多数見られた。
The shape of the solid-liquid interface by X-ray topography was slightly flat when heated, while it was slightly flattened, whereas in the case where it was not heated, the crystals in the circumferential and central parts grew more downward, It was M type. The average dislocation density by EPD was 5 × 10 3 cm -2 with heating and no lineage was observed, whereas the average value of dislocation density was 1 × 10 4 cm -2 with no heating. Was given.

〔発明の効果〕〔The invention's effect〕

本発明は上記構成を採用することにより、成形体自体の
温度を調整することができ、固液界面近傍の融液の温度
分布を最適に制約でき、その結果、固液界面形状が平坦
化され、結晶欠陥の少ない良質の単結晶を製造すること
ができるようになつた。
According to the present invention, by adopting the above configuration, the temperature of the molded body itself can be adjusted, and the temperature distribution of the melt in the vicinity of the solid-liquid interface can be optimally restricted. As a result, the solid-liquid interface shape is flattened. It has become possible to manufacture high quality single crystals with few crystal defects.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の一具体例である単結晶の製造装置の
断面図、第2図は成形体の一例を示す図であり、同図
(a)は斜視図、(b)は正面図、(c)は発熱回路の
説明図、第3図は成形体と引上結晶の関係を説明するた
めの図である。
FIG. 1 is a cross-sectional view of an apparatus for producing a single crystal which is a specific example of the present invention, FIG. 2 is a view showing an example of a molded body, FIG. 1 (a) is a perspective view, and FIG. FIG. 3C is an explanatory diagram of the heat generating circuit, and FIG. 3 is a diagram for explaining the relationship between the compact and the pulled crystal.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】原料融液又は原料融液と液体封止剤を収容
するるつぼと、るつぼを回転昇降可能に支持する下軸
と、るつぼの周囲に設けた原料加熱ヒータと、回転昇降
可能で下端に種結晶を取り付けた上軸と、上部が広く底
部が狭く先端に小開口部を有する成形体とを具備し、該
成形体を原料融液に浸漬するように配置した単結晶の製
造装置において、該成形体に加熱手段を保有させること
を特徴とする単結晶の製造装置。
1. A crucible for containing a raw material melt or a raw material melt and a liquid sealant, a lower shaft for supporting the crucible so as to be rotatable and vertically movable, a raw material heater provided around the crucible, and a rotatable and vertically movable unit. Apparatus for producing a single crystal comprising an upper shaft having a lower end to which a seed crystal is attached, and a compact having a wide upper portion, a narrow bottom portion and a small opening portion at the tip, arranged so as to be immersed in the raw material melt. 2. The apparatus for producing a single crystal, wherein the molded body is provided with a heating means.
【請求項2】成形体を発熱体で構成し、これにスリツト
を入れて発熱回路を形成したことを特徴とする特許請求
の範囲第1項記載の単結晶の製造装置。
2. The apparatus for producing a single crystal according to claim 1, wherein the compact is composed of a heating element, and a slit is inserted into the heating element to form a heating circuit.
【請求項3】成形体をカーボンで構成し、その表面をPB
Nでコーテイングしたことを特徴とする特許請求の範囲
第1項又は第2項記載の単結晶の製造装置。
3. A molded body made of carbon, the surface of which is PB
An apparatus for producing a single crystal according to claim 1 or 2, wherein the single crystal is coated with N.
JP2729687A 1987-02-10 1987-02-10 Single crystal manufacturing equipment Expired - Lifetime JPH0742194B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2729687A JPH0742194B2 (en) 1987-02-10 1987-02-10 Single crystal manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2729687A JPH0742194B2 (en) 1987-02-10 1987-02-10 Single crystal manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS63195189A JPS63195189A (en) 1988-08-12
JPH0742194B2 true JPH0742194B2 (en) 1995-05-10

Family

ID=12217124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2729687A Expired - Lifetime JPH0742194B2 (en) 1987-02-10 1987-02-10 Single crystal manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH0742194B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007223815A (en) * 2004-03-02 2007-09-06 Nikko Kinzoku Kk METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL, AND ZnTe SINGLE CRYSTAL
JP4668100B2 (en) * 2006-03-17 2011-04-13 コバレントマテリアル株式会社 Recharge tube for solid material and recharge method using the same
JP6969230B2 (en) * 2017-08-30 2021-11-24 住友金属鉱山株式会社 Single crystal growth method and single crystal growth device

Also Published As

Publication number Publication date
JPS63195189A (en) 1988-08-12

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