JPH0745445B2 - 4,4 '"-bis (3-aminophenoxy) -3,3"', 5,5 '"-tetramethylbiphenyl and process for producing the same - Google Patents
4,4 '"-bis (3-aminophenoxy) -3,3"', 5,5 '"-tetramethylbiphenyl and process for producing the sameInfo
- Publication number
- JPH0745445B2 JPH0745445B2 JP27280386A JP27280386A JPH0745445B2 JP H0745445 B2 JPH0745445 B2 JP H0745445B2 JP 27280386 A JP27280386 A JP 27280386A JP 27280386 A JP27280386 A JP 27280386A JP H0745445 B2 JPH0745445 B2 JP H0745445B2
- Authority
- JP
- Japan
- Prior art keywords
- tetramethylbiphenyl
- bis
- reaction
- aminophenoxy
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- -1 3-aminophenoxy Chemical group 0.000 title description 23
- 238000000034 method Methods 0.000 title description 8
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 11
- YGYPMFPGZQPETF-UHFFFAOYSA-N 4-(4-hydroxy-3,5-dimethylphenyl)-2,6-dimethylphenol Chemical group CC1=C(O)C(C)=CC(C=2C=C(C)C(O)=C(C)C=2)=C1 YGYPMFPGZQPETF-UHFFFAOYSA-N 0.000 claims description 7
- SXQNSTHTOVNMAJ-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)-3,5-dimethylphenyl]-2,6-dimethylphenoxy]aniline Chemical group CC1=CC(C=2C=C(C)C(OC=3C=C(N)C=CC=3)=C(C)C=2)=CC(C)=C1OC1=CC=CC(N)=C1 SXQNSTHTOVNMAJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000002798 polar solvent Substances 0.000 claims description 4
- 230000005494 condensation Effects 0.000 claims description 2
- CMZYGFLOKOQMKF-UHFFFAOYSA-N 1-(3,5-dimethylphenyl)-3,5-dimethylbenzene Chemical group CC1=CC(C)=CC(C=2C=C(C)C=C(C)C=2)=C1 CMZYGFLOKOQMKF-UHFFFAOYSA-N 0.000 claims 2
- 238000009833 condensation Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 24
- 229920001721 polyimide Polymers 0.000 description 22
- 239000002994 raw material Substances 0.000 description 12
- 239000009719 polyimide resin Substances 0.000 description 11
- 238000006722 reduction reaction Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- PTUQZNTWBMUUCO-UHFFFAOYSA-N 5-[3,5-dimethyl-4-(3-nitrophenoxy)phenyl]-1,3-dimethyl-2-(3-nitrophenoxy)benzene Chemical group CC1=CC(C=2C=C(C)C(OC=3C=C(C=CC=3)[N+]([O-])=O)=C(C)C=2)=CC(C)=C1OC1=CC=CC([N+]([O-])=O)=C1 PTUQZNTWBMUUCO-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 5
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- 238000010531 catalytic reduction reaction Methods 0.000 description 4
- 239000012043 crude product Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- JRHZSISUFANECP-UHFFFAOYSA-N 3-[2-(3,5-dimethylphenyl)-4,6-dimethylphenoxy]aniline Chemical group NC=1C=C(OC2=C(C=C(C=C2C)C)C2=CC(=CC(=C2)C)C)C=CC=1 JRHZSISUFANECP-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000010960 cold rolled steel Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 235000011181 potassium carbonates Nutrition 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- ALLIZEAXNXSFGD-UHFFFAOYSA-N 1-methyl-2-phenylbenzene Chemical group CC1=CC=CC=C1C1=CC=CC=C1 ALLIZEAXNXSFGD-UHFFFAOYSA-N 0.000 description 1
- JDTMUJBWSGNMGR-UHFFFAOYSA-N 1-nitro-4-phenoxybenzene Chemical compound C1=CC([N+](=O)[O-])=CC=C1OC1=CC=CC=C1 JDTMUJBWSGNMGR-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229920004738 ULTEM® Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 239000000538 analytical sample Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 125000006575 electron-withdrawing group Chemical group 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- NQXWGWZJXJUMQB-UHFFFAOYSA-K iron trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].Cl[Fe+]Cl NQXWGWZJXJUMQB-UHFFFAOYSA-K 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000003444 phase transfer catalyst Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、4,4′−ビス(3−アミノフェノキシ)−3,
3′,5,5′−テトラメチルビフェニルおよびその製造方
法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention provides 4,4′-bis (3-aminophenoxy) -3,
The present invention relates to 3 ', 5,5'-tetramethylbiphenyl and a method for producing the same.
更に詳しくは、4,4′−ジヒドロキシ−3,3′,5,5′−テ
トラメチルビフェニルとm−ジニトロベンゼンとを塩基
の存在下、非プロトン性極性溶媒中で縮合して得られる
4,4′−ビス(3−ニトロフェノキシ)−3,3′,5,5′−
テトラメチルビフェニルを、更に還元して得られる4,
4′−ビス(3−アミノフェノキシ)−3,3′,5,5′−テ
トラメチルビフェニルに関する。More specifically, it is obtained by condensing 4,4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl and m-dinitrobenzene in the presence of a base in an aprotic polar solvent.
4,4'-bis (3-nitrophenoxy) -3,3 ', 5,5'-
Tetramethylbiphenyl obtained by further reduction 4,
It relates to 4'-bis (3-aminophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl.
本発明の4,4′−ビス(3−アミノフェノキシ)−3,
3′,5,5′−テトラメチルビフェニルはかって製造され
た例がなく、従って、既知の用途も知られていない。4,4′-bis (3-aminophenoxy) -3 of the present invention,
3 ', 5,5'-Tetramethylbiphenyl has never been prepared and therefore its known use is unknown.
しかしながら、その構造上、耐熱性高分子のモノマー、
特にポリアミド、ポリイミドおよびポリアミノビスマレ
イド樹脂等の基幹原料として有用である。However, due to its structure, a monomer of heat-resistant polymer,
In particular, it is useful as a basic raw material for polyamide, polyimide, polyamino bismaleide resin and the like.
(従来技術) 従来、テトラカルボン酸二無水物とジアミンの反応によ
り得られるポリイミドは種々の優れた物性、特に耐熱性
が良好なことが知られ、今後更に耐熱性が要求される分
野に広く利用されることが期待されている。(Prior Art) Conventionally, polyimide obtained by the reaction of tetracarboxylic dianhydride and diamine is known to have various excellent physical properties, particularly good heat resistance, and will be widely used in fields where further heat resistance is required in the future. It is expected to be done.
しかしながら、従来公知のポリイミド樹脂は、優れた耐
熱性を有するものは加工性に乏しく、また加工性の向上
を目的として開発されたものは逆に耐熱性、耐溶剤性に
劣る等、種々の問題点を有している。例えば、式(3) で表される基本骨格からなるポリイミド樹脂(Dupont社
製、商品名Kapton.Vespel)は明確なガラス転移温度を
有しておらず、耐熱性は優れているものの加工性に劣
り、成形材料として用いる場合、焼結成形等の手法を用
いなければ加工できない。However, conventionally known polyimide resins are poor in workability if they have excellent heat resistance, and conversely, those developed for the purpose of improving workability are inferior in heat resistance and solvent resistance. Have a point. For example, equation (3) The polyimide resin consisting of the basic skeleton represented by (Dupont, trade name Kapton.Vespel) does not have a clear glass transition temperature and is excellent in heat resistance but inferior in processability and is used as a molding material. In this case, it cannot be processed unless a technique such as sintering is used.
また、近年、その耐熱性および絶縁性のために、ポリイ
ミド樹脂が電気電子部品の基材として用いられている
が、式(3)で表わされるポリイミド樹脂は吸水性が高
く、電気電子部品の材料として用いる際に重要な因子と
なる寸法安定性、絶縁性、ハンダ耐熱性に悪影響を及ぼ
すという欠点を有している。また、式(4) で表わされる基本骨格を有するポリエーテルイミド系樹
脂(GE社製、商品名ULTEM)は加工性に優れているもの
の、ガラス転移温度が217℃と低く、耐熱性に劣り、し
かもメチレンクロライド等のハロゲン化炭化水素系の溶
媒に可溶であるという欠点を有している。Further, in recent years, a polyimide resin has been used as a base material for electric / electronic components because of its heat resistance and insulating properties. However, the polyimide resin represented by the formula (3) has high water absorption and is a material for electric / electronic components. It has a drawback that it has an adverse effect on dimensional stability, insulation, and solder heat resistance, which are important factors when used as. Also, equation (4) Polyetherimide resin with a basic skeleton represented by (GE Company, trade name ULTEM) has excellent processability, but has a low glass transition temperature of 217 ° C, poor heat resistance, and halogen such as methylene chloride. It has a drawback that it is soluble in a compounded hydrocarbon solvent.
本発明者らは、先に、4,4′−ビス(3−アミノフェノ
キシ)ビニフェルをジアミン成分とするポリイミド樹脂
が優れた耐熱性、加工性、透明性、低吸水性および接着
性を有することを見出し、出願した(特願昭60-21026
6)。The present inventors have previously found that a polyimide resin containing 4,4′-bis (3-aminophenoxy) vinylifer as a diamine component has excellent heat resistance, processability, transparency, low water absorption and adhesiveness. Was filed and filed (Japanese Patent Application No. 60-21026
6).
(発明が解決しようとする問題点) 本発明の課題は、ポリイミド樹脂が本来有する優れた耐
熱性に加え、優れた加工性および耐熱接着性を有する多
目的用途に使用可能なポリイミド樹脂の原料となる新規
な化合物、すなわち、芳香族エーテルジアミンを提供す
ることである。(Problems to be Solved by the Invention) An object of the present invention is to provide a raw material of a polyimide resin which has excellent workability and heat-resistant adhesiveness, in addition to the excellent heat resistance originally possessed by the polyimide resin, and which can be used for multipurpose purposes. It is to provide a novel compound, namely an aromatic ether diamine.
(問題点を解決するための手段) 本発明者らは、上記のような課題達成のため種々のジア
ミンを合成し、それらを原料としポリイミド樹脂を製造
しその性能の評価を行ってきた。その結果、前記式
(1)で表わされる4,4′−ビス(3−アミノフェノキ
シ)−3,3′,5,5′−テトラメチルビフェニルを初めて
製造し、この化合物がテトラカルボン酸二無水物との重
合体において優れた耐熱性、加工性を有し、この新規な
芳香族エーテルジアミンが耐熱性樹脂原料として好まし
いものであることを見出した。(Means for Solving Problems) The present inventors have synthesized various diamines to achieve the above-mentioned problems, manufactured polyimide resins using them as raw materials, and evaluated their performance. As a result, 4,4'-bis (3-aminophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl represented by the formula (1) was produced for the first time, and this compound was used as tetracarboxylic acid dianhydride. It has been found that the novel aromatic ether diamine has excellent heat resistance and processability as a polymer with a polymer and is preferable as a heat resistant resin raw material.
すなわち、本発明は、新規な芳香族エーテルジアミンで
ある4,4′−ビス(3−アミノフェノキシ)−3,3′,5,
5′−テトラメチルビフェニルおよびその製造方法に関
する。That is, the present invention is 4,4'-bis (3-aminophenoxy) -3,3 ', 5, which is a novel aromatic ether diamine.
It relates to 5'-tetramethylbiphenyl and a method for producing the same.
従来、芳香族ニトロ化合物において、o−またはp−位
の電子吸引性基により活性化されている化合物のニトロ
基をフェノール類で置換する反応に関しては多数の例が
知られている。Conventionally, in an aromatic nitro compound, many examples are known regarding the reaction of substituting the nitro group of a compound activated by an electron-withdrawing group at the o- or p-position with a phenol.
しかしながら、m−ジニトロベンゼンのように活性化さ
れていないニトロ基の反応に関しては、大環状ポリエー
テルの存在下、極性有機溶媒中、m−ジニトロベンゼン
とアルカリ金属のフェノキシドとを反応させて3−ニト
ロジフェニルエーテルを製造する方法が知られているに
すぎない(特開昭54-39030)。まして、2個の水酸基を
有する4,4′−ジヒドロキシ−3,3′,5,5′−テトラメチ
ルビフェニルと2分子のm−ジニトロベンゼンとを縮合
させることによって、4,4′−ビス(3−アミノフェノ
キシ)−3,3′,5,5′−ビフェニルのような芳香族エー
テルジアミンを製造しようとする方法は知られておら
ず、勿論、化合物自体も従来全く知られていない。However, regarding the reaction of an unactivated nitro group such as m-dinitrobenzene, m-dinitrobenzene is reacted with an alkali metal phenoxide in a polar organic solvent in the presence of a macrocyclic polyether to give 3- Only a method for producing nitrodiphenyl ether is known (Japanese Patent Laid-Open No. 54-39030). Furthermore, by condensing 4,4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl having two hydroxyl groups and two molecules of m-dinitrobenzene, 4,4'-bis ( There is no known method for producing an aromatic ether diamine such as 3-aminophenoxy) -3,3 ', 5,5'-biphenyl, and, of course, the compound itself has never been known.
本発明者らは、耐熱性樹脂の合成検討の中で、4,4′−
ジヒドロキシ−3,3′,5,5′−テトラメチルビフェニル
とm−ジニトロベンゼンとを塩基の存在下、非プロトン
性極性溶媒中で反応させると4,4′−ビス(3−ニトロ
フェノキシ)−3,3′,5,5′−テトラメチルビフェニル
が製造でき、更にこれを還元することにより4,4′−ビ
ス(3−アミノフェノキシ)−3,3′,5,5′−テトラメ
チルビフェニルを合成することに成功した。ついで、こ
の化合物を原料として重合体を製造し、この重合体が極
めて優れた性能を有することを確認した。すなわち、こ
の化合物が、高度の有用性を有するものであることを確
認し、本発明の課題を達成することができた。The present inventors have investigated 4,4′-
When dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl and m-dinitrobenzene are reacted in the presence of a base in an aprotic polar solvent, 4,4'-bis (3-nitrophenoxy)- 3,3 ', 5,5'-Tetramethylbiphenyl can be produced, and by further reducing it, 4,4'-bis (3-aminophenoxy) -3,3', 5,5'-tetramethylbiphenyl Was successfully synthesized. Then, a polymer was produced using this compound as a raw material, and it was confirmed that this polymer had extremely excellent performance. That is, it was confirmed that this compound has a high degree of usefulness, and the object of the present invention could be achieved.
本発明の化合物を製造するのに用いられる方法は、4,
4′−ジヒドロキシ−3,3′,5,5′−テトラメチルビフェ
ニルとm−ジニトロベンゼンの縮合反応(以下、第1段
の反応という)と還元反応(以下、第2段の反応とい
う)の2種の反応より成る。The method used to prepare the compounds of the present invention is 4,
4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl and m-dinitrobenzene condensation reaction (hereinafter referred to as the first step reaction) and reduction reaction (hereinafter referred to as the second step reaction) It consists of two reactions.
第1段の反応で使用される原料の4,4′−ジヒドロキシ
−3,3′,5,5′−テトラメチルビフェニルは、2,6−ジメ
チルフェノールの酸化により容易に製造できる(特開昭
53-65834およびジャーナル・オブ・オーガニック・ケミ
ストリー(J.Org Chem.),50,3927(1985))。The raw material 4,4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl used in the first-step reaction can be easily produced by oxidation of 2,6-dimethylphenol (Japanese Patent Laid-Open No. 2000-242242).
53-65834 and Journal of Organic Chemistry (J. Org Chem.), 50, 3927 (1985)).
原料の使用量は、特に限定的なものではないが、通常、
m−ジニトロベンゼンが4,4′−ジヒドロキシ−3,3′,
5,5′−テトラメチルビフェニルに対して1.5〜3倍モル
であるように使用する。縮合反応では塩基を使用する。
例えば、アルカリ金属の酸化物、水酸化物、炭酸塩、炭
酸水素塩、水素化物およびアルコキシド類が使用される
が、通常、炭酸カリウム、炭酸ナトリウム、炭酸水素カ
リウム、炭酸水素ナトリウムなどが多使用される。The amount of raw material used is not particularly limited, but usually,
m-dinitrobenzene is 4,4'-dihydroxy-3,3 ',
It is used so as to be 1.5 to 3 times mol with respect to 5,5'-tetramethylbiphenyl. A base is used in the condensation reaction.
For example, alkali metal oxides, hydroxides, carbonates, hydrogen carbonates, hydrides and alkoxides are used, but usually potassium carbonate, sodium carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate and the like are often used. It
塩基の量は通常、原料の4,4′−ジヒドロキシ−3,3′,
5,5′−テトラメチルビフェニルに対して、1〜5倍モ
ル、好ましくは1.5〜3倍モルである。The amount of base is usually 4,4'-dihydroxy-3,3 ', starting material.
The amount is 1 to 5 times, preferably 1.5 to 3 times the mol of 5,5'-tetramethylbiphenyl.
この反応の際に4級アンモニウム塩、4級リン塩、クラ
ウンエーテルのような大環状ポリエーテル、クリプテー
トのような含窒素大環状ポリエーテル、含窒素鎖状ポリ
エーテル、ポリエチレングリコール及びそのアルキルエ
ーテルのような相間移動触媒、銅粉および銅塩などを反
応促進剤として加えてもよい。During this reaction, quaternary ammonium salt, quaternary phosphorus salt, macrocyclic polyether such as crown ether, nitrogen-containing macrocyclic polyether such as cryptate, nitrogen-containing chain polyether, polyethylene glycol and its alkyl ether Such a phase transfer catalyst, copper powder and copper salt may be added as a reaction accelerator.
反応溶媒としては、非プロトン性極性溶媒が使用され
る。例えばN,N−ジメチルホルムアミド、N,N−ジメチル
アセトアミド、ジメチルスルホキシド、ジメチルスルホ
ン、スルホラン、1−メチル−2−ピロリジノンまたは
1,3−ジメチル−2−イミダゾリジノンのようなものが
使用される。これらの溶媒は通常、原料に対して1〜10
重量倍で使用される。An aprotic polar solvent is used as the reaction solvent. For example, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, dimethyl sulfone, sulfolane, 1-methyl-2-pyrrolidinone or
Something like 1,3-dimethyl-2-imidazolidinone is used. These solvents are usually 1 to 10 relative to the raw materials.
Used in weight times.
反応の手順は、通常、m−ジニトロベンゼンを含むすべ
ての原料を最初から装入して、そのまま反応させる方法
で実施される。The reaction procedure is usually carried out by a method in which all raw materials including m-dinitrobenzene are initially charged and reacted as they are.
反応温度は、100〜240℃、好ましくは120〜180℃の範囲
であり、反応時間は5〜30時間の範囲である。反応終了
後、溶媒を留去した後、あるいは反応液をそのまま水中
に排出すると目的の粗製品が得られる。この粗製品は再
結晶などにより精製することができるが、通常は、その
まま第2段の還元反応を行う。The reaction temperature is in the range of 100 to 240 ° C, preferably 120 to 180 ° C, and the reaction time is in the range of 5 to 30 hours. After completion of the reaction, the solvent is distilled off, or the reaction solution is directly discharged into water to obtain the target crude product. This crude product can be purified by recrystallization or the like, but normally, the second stage reduction reaction is carried out as it is.
第2段の反応は特に制限はなく、通常ニトロ基をアミノ
基に還元する方法(例えば、新実験化学講座、15巻、酸
化と還元〔II〕、丸善(1977))を適用できるが、工業
的には接触還元またはヒドラジン還元が好ましい。接触
還元の例をあげれば、ニッケル、パラジウム、白金等の
金属触媒や担持触媒またはニッケルや銅などのラネー触
媒等の還元触媒を原料の4,4′−ビス(3−ニトロフェ
ノキシ)−3,3′,5,5′−テトラメチルビフェニルに対
して、金属として0.01〜10重量%、したがって、金属の
状態で使用する場合は2〜8重量%、担体に担持させた
場合では0.1〜5重量%の範囲で用いて還元反応を行
う。The second step reaction is not particularly limited, and a method of reducing a nitro group to an amino group can be usually applied (for example, New Experimental Chemistry Lecture, Volume 15, Oxidation and Reduction [II], Maruzen (1977)). From the viewpoint, catalytic reduction or hydrazine reduction is preferable. As an example of catalytic reduction, a reducing catalyst such as a metal catalyst such as nickel, palladium or platinum, a supported catalyst or a Raney catalyst such as nickel or copper is used as a raw material for 4,4′-bis (3-nitrophenoxy) -3, 0.01 to 10% by weight of metal based on 3 ', 5,5'-tetramethylbiphenyl, therefore 2 to 8% by weight when used in a metal state, and 0.1 to 5% by weight when loaded on a carrier. The reduction reaction is performed within the range of%.
還元反応に使用する溶媒としては、反応に不活性なメタ
ノール、エタノール、イソプロピルアルコール、メチル
セロソルブのようなものが使用できる。As the solvent used in the reduction reaction, those inert to the reaction such as methanol, ethanol, isopropyl alcohol and methyl cellosolve can be used.
反応温度は、特に限定はない。一般的には20〜200℃の
範囲、特に20〜100℃が好ましい。また、反応圧力は、
通常、常圧〜50kg/cm2 -G程度である。The reaction temperature is not particularly limited. Generally, the range of 20 to 200 ° C, particularly 20 to 100 ° C is preferable. Also, the reaction pressure is
Usually, the atmospheric pressure is about 50 kg / cm 2 -G .
一方、ヒドラジン還元の例をあげれば、ヒドラジンを、
通常、理論量の1.2〜2倍量用いて還元反応を実施す
る。On the other hand, to give an example of hydrazine reduction,
Usually, the reduction reaction is carried out using 1.2 to 2 times the theoretical amount.
触媒としては、一般に接触還元に用いられている金属触
媒を使用することができる。とくにパラジウム/カーボ
ン、白金/カーボンまたは塩化第2鉄を活性炭に吸着さ
せた触媒が好ましい。その使用量は通常、原料の4,4′
−ビス(3−ニトロフェノキシ)−3,3′,5,5′−テト
ラメチルビフェニルに対して、金属として0.01〜30重量
%の範囲である。As the catalyst, a metal catalyst generally used for catalytic reduction can be used. A catalyst in which activated carbon adsorbs palladium / carbon, platinum / carbon or ferric chloride is particularly preferable. The amount used is usually 4,4 '
It is in the range of 0.01 to 30% by weight as a metal based on -bis (3-nitrophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl.
反応溶媒としては、接触還元の場合と同様の溶媒を用い
ることができる。反応温度は特に限定はなく、一般的に
は20〜150℃の範囲、とくに40〜100℃が好ましい。As the reaction solvent, the same solvent as in the case of catalytic reduction can be used. The reaction temperature is not particularly limited and is generally in the range of 20 to 150 ° C, preferably 40 to 100 ° C.
反応終了後、反応液を熱濾過して触媒を除去した後、必
要に応じて溶媒を留去すると目的とする4,4′−ビス
(3−アミノフェノキシ)−3,3′,5,5′−テトラメチ
ルビフェニルの粗製品が得られる。この粗製品は再結晶
または塩酸塩として単離することにより精製することが
できる。After completion of the reaction, the reaction solution is hot filtered to remove the catalyst, and then the solvent is distilled off if necessary to obtain the desired 4,4′-bis (3-aminophenoxy) -3,3 ′, 5,5 A crude product of'-tetramethylbiphenyl is obtained. This crude product can be purified by recrystallisation or isolation as the hydrochloride salt.
以上の方法により本発明の新規の芳香族エーテルジアミ
ンを得ることができる。The novel aromatic ether diamine of the present invention can be obtained by the above method.
本発明の芳香族エーテルジアミンは一種以上のテトラカ
ルボン酸二無水物と重合させてポリアミド酸、更にこれ
を環化脱水してポリイミドを得ることができる。The aromatic ether diamine of the present invention can be polymerized with one or more tetracarboxylic acid dianhydrides to form a polyamic acid, and then cyclized and dehydrated to obtain a polyimide.
本発明の化合物を原料とするポリイミド樹脂は、従来の
ポリイミド樹脂特有の耐熱性を有していながら、熱可塑
性であるため、加工性および耐熱接着性に優れており、
その中のあるものは高耐熱性で溶融成形可能なポリイミ
ド樹脂である。Polyimide resin using the compound of the present invention as a raw material, while having heat resistance peculiar to conventional polyimide resins, since it is thermoplastic, it has excellent processability and heat-resistant adhesiveness,
Some of them are high heat resistant and melt moldable polyimide resins.
従って、宇宙・航空機用基材、電気電子部品基材、更に
は、耐熱性接着剤として、広くその有用性が発揮され
る。Therefore, it is widely used as a space / aircraft base material, electric / electronic component base material, and further as a heat resistant adhesive.
(作用および効果) 本発明の新規な芳香族エーテルジアミンである4,4′−
ビス(3−アミノフェノキシ)−3,3′,5,5′−テトラ
メチルビフェニルは、4,4′−ジヒドロキシ−3,3′,5,
5′−テトラメチルビフェニルとm−ジニトロベンゼン
との縮合、還元反応により工業的に容易に製造できる。
また、この化合物をテトラカルボン酸二無水物と重合さ
せると、新規な重合体が得られ、この重合体は、優れた
耐熱性、加工性および接着能を有している。すなわち、
本発明の化合物は今後更に耐熱性が要求される分野の樹
脂原料として広く利用されうるものである。(Action and Effect) 4,4′- which is the novel aromatic ether diamine of the present invention
Bis (3-aminophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl is 4,4'-dihydroxy-3,3', 5,
It can be industrially easily produced by condensation and reduction reaction of 5'-tetramethylbiphenyl and m-dinitrobenzene.
Further, when this compound is polymerized with tetracarboxylic acid dianhydride, a novel polymer is obtained, and this polymer has excellent heat resistance, processability and adhesive ability. That is,
INDUSTRIAL APPLICABILITY The compound of the present invention can be widely used as a resin raw material in the field where heat resistance is required further in the future.
(実施例) 以下、本発明を実施例により更に具体的に説明する。(Examples) Hereinafter, the present invention will be described in more detail with reference to Examples.
実施例1 攪拌機、温度計、冷却管を装備した反応フラスコに、4,
4′−ジヒドロキシ−3,3′,5,5′−テトラメチルビフェ
ニル48.4g(0.2モル)、m−ジニトロベンゼン80.6g
(0.48モル)、炭酸カリウム66.2g(0.48モル)、N,N−
ジメチルホルムアミド750mlを装入し、140〜147℃で7.5
時間攪拌する。冷却後、水中に排出し、ベンゼンで抽出
後、溶媒を減圧濃縮して、4,4′−ビス(3−ニトロフ
ェノキシ)−3,3′,5,5′−テトラメチルビフェニルの
黄褐色結晶を得た。収量43.6g(収率45.0%)。分析用
サンプルは、クロロホルム/エタノールより再結晶して
得た。Example 1 A reaction flask equipped with a stirrer, a thermometer and a cooling tube was charged with 4,
4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl 48.4 g (0.2 mol), m-dinitrobenzene 80.6 g
(0.48 mol), potassium carbonate 66.2 g (0.48 mol), N, N-
Charge 750 ml of dimethylformamide, and add 7.5 at 140-147 ℃.
Stir for hours. After cooling, it was discharged into water, extracted with benzene, and the solvent was concentrated under reduced pressure to give 4,4'-bis (3-nitrophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl tan crystals. Got Yield 43.6g (yield 45.0%). The analytical sample was obtained by recrystallization from chloroform / ethanol.
m.p186.6〜187.5℃(corr) 黄色立方晶 IR(KBr.cm-1):1530と1350(NO2基)、1225(エーテル
結合) 元素分析値 (C28H24N2O6) C H N 計算値(%) 69.41 4.99 5.78 実測値(%) 69.68 4.99 5.77 このようにして得られた4,4′−ビス(3−ニトロフェ
ノキシ)−3,3′,5,5′−テトラメチルビフェニル43.6g
(0.09モル)と塩化鉄(III)・6水和物90mg、活性炭
(ADP炭、東洋カルゴン製)1.31g、2−メトキシエタノ
ール200mlを反応フラスコに装入し、80〜90℃で30分間
攪拌後、80%ヒドラジン−水和物37.6g(0.6モル)を80
〜90℃で3時間かけて滴下し、更に105℃で1時間攪拌
する。冷却後、濾過、洗浄し、溶媒を減圧濃縮して黄褐
色結晶を得た。これに、2−メトキシエタノールと水の
混合溶媒を加え濃塩酸を加えて加熱溶解し、活性炭処理
後、冷却晶析して塩酸塩の結晶を得た。水中、アンモニ
ア水で中和後、トルエンで再結晶して、目的とする4,
4′−ビス(3−アミノフェノキシ)−3,3′,5,5′−テ
トラメチルビフェニルを白色結晶として得た。m.p 186.6-187.5 ° C (corr) Yellow cubic IR (KBr.cm -1 ): 1530 and 1350 (NO 2 group), 1225 (ether bond) Elemental analysis value (C 28 H 24 N 2 O 6 ) CHN calculated value (%) 69.41 4.99 5.78 Measured value (%) 69.68 4.99 5.77 4,4'-bis (3-nitrophenoxy) -3,3 ', 5,5'-tetra obtained in this way Methylbiphenyl 43.6g
(0.09 mol), iron (III) chloride hexahydrate 90 mg, activated carbon (ADP charcoal, manufactured by Toyo Calgon) 1.31 g, 2-methoxyethanol 200 ml are charged into a reaction flask and stirred at 80 to 90 ° C for 30 minutes. After that, 80% hydrazine hydrate 37.6 g (0.6 mol) was added to 80%.
The mixture is added dropwise at ~ 90 ° C over 3 hours and further stirred at 105 ° C for 1 hour. After cooling, filtration and washing were performed, and the solvent was concentrated under reduced pressure to obtain yellowish brown crystals. To this, a mixed solvent of 2-methoxyethanol and water was added, concentrated hydrochloric acid was added, and the mixture was heated and dissolved, treated with activated carbon, and then cooled and crystallized to obtain crystals of a hydrochloride. After neutralizing in water with aqueous ammonia, recrystallize with toluene to obtain the target 4,
4'-Bis (3-aminophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl was obtained as white crystals.
収量 29.7g(収率77.8%) mp 191.8〜192.6℃(corr) IR(KBr.cm-1):3475と3380(NH2基),1200(エーテル
結合) 元素分析値 (C28H28N2O2) C H N 計算値(%) 79.21 6.65 6.60 実測値(%) 79.14 6.61 6.53 実施例2 溶媒として1,3−ジメチル−2−イミダゾリジノンを用
いる以外は、実施例1と全く同様にして、160℃で5時
間反応を行い、4,4′−ビス(3−ニトロフェノキシ)
−3,3′,5,5′−テトラメチルビフェニルを得た。収量3
6.0g(収率37.2%) このようにして得られた4,4′−ビス(3−ニトロフェ
ノキシ)−3,3′,5,5′−テトラメチルビフェニル29.8g
(0.05モル)を2−メトキシエタノール100mlに溶解
し、5%Pd/C(日本エンゲルハルト(株)製)1gを加え
た。45〜50℃で激しく攪拌しながら水素を導入すると6
時間でそれ以上吸収しなくなり、反応が完了した。Yield 29.7g (Yield 77.8%) mp 191.8-192.6 ° C (corr) IR (KBr.cm -1 ): 3475 and 3380 (NH 2 group), 1200 (ether bond) Elemental analysis value (C 28 H 28 N 2 O 2 ) C H N calculated value (%) 79.21 6.65 6.60 Measured value (%) 79.14 6.61 6.53 Example 2 The same as Example 1 except that 1,3-dimethyl-2-imidazolidinone was used as the solvent. Reaction at 160 ° C for 5 hours to give 4,4'-bis (3-nitrophenoxy)
-3,3 ', 5,5'-Tetramethylbiphenyl was obtained. Yield 3
6.0 g (yield 37.2%) 4,4′-bis (3-nitrophenoxy) -3,3 ′, 5,5′-tetramethylbiphenyl thus obtained 29.8 g
(0.05 mol) was dissolved in 100 ml of 2-methoxyethanol, and 1 g of 5% Pd / C (manufactured by Nippon Engelhard Co., Ltd.) was added. When hydrogen is introduced with vigorous stirring at 45-50 ° C, 6
No more absorption in time and the reaction was complete.
実施例1と同様の方法で、後処理、精製を行い、4,4′
−ビス(3−アミノフェノキシ)−3,3′,5,5′−テト
ラメチルビフェニルを得た。Post-treatment and purification were carried out in the same manner as in Example 1 to obtain 4,4 ′.
-Bis (3-aminophenoxy) -3,3 ', 5,5'-tetramethylbiphenyl was obtained.
収量 13.8g(収率65.0%) mp 191.8〜192.6℃(corr) 参考例1 攪拌機、還流冷却機および窒素導入管を備えた容器に、
4,4′−ビス(3−アミノフェノキシ)−3,3′,5,5′−
テトラメチルビフェニル7.0g(0.0165モル)とN,N−ジ
メチルアセトアミド42.4gを装入し、室温で窒素雰囲気
下に、ピロメリット酸二無水物3.6g(0.0165モル)を溶
液温度の上昇に注意しながら分割して加え、室温で約20
時間攪拌した。Yield 13.8 g (yield 65.0%) mp 191.8 to 192.6 ° C. (corr) Reference Example 1 In a container equipped with a stirrer, a reflux condenser and a nitrogen introducing pipe,
4,4'-bis (3-aminophenoxy) -3,3 ', 5,5'-
Charge tetramethylbiphenyl 7.0 g (0.0165 mol) and N, N-dimethylacetamide 42.4 g, and at room temperature under a nitrogen atmosphere, pay attention to the rise of the solution temperature of 3.6 g (0.0165 mol) of pyromellitic dianhydride. While dividing and adding, about 20 at room temperature
Stir for hours.
このようにして得られたポリアミド酸の対数粘度は1.16
dl/gであった。このポリアミド酸溶液の一部をとり、ガ
ラス板上にキャストした後、100℃、200℃、300℃で各
々1時間加熱して淡黄色透明、フィルム厚35μのポリイ
ミドフィルムを得た。The polyamic acid thus obtained had an inherent viscosity of 1.16.
It was dl / g. A part of this polyamic acid solution was taken, cast on a glass plate, and then heated at 100 ° C., 200 ° C., and 300 ° C. for 1 hour each to obtain a pale yellow transparent polyimide film having a film thickness of 35 μ.
このポリイミドフィルムの引張強さは10.76Kg/mm2、引
張伸び率は8.3%であった(測定方法は、ともにASTM D
−882に拠る。以下同様)。The tensile strength of this polyimide film was 10.76 Kg / mm 2 , and the tensile elongation was 8.3%.
-882. The same applies below).
また、このポリイミドフィルムのガラス転移温度は324
℃(TMA針入法で測定、以下同様)、空気中での5%重
量減少温度は474℃(DTA−TGで測定。以下同様)であっ
た。さらに、このポリイミドフィルムを130℃に予備加
熱した冷間圧延鋼板(JIS G3141,spcc/SD、25×100×1.
6mm。以下同様)間に挿入し、350℃、20Kg/cm2で5分間
加圧圧着させた。このものの室温での引張せん断接着強
さは250Kg/cm2であった。The glass transition temperature of this polyimide film is 324.
C. (measured by TMA penetration method, the same applies below), and the 5% weight loss temperature in air was 474.degree. C. (measured with DTA-TG. The same applies below). Furthermore, this polyimide film was preheated to 130 ℃ cold rolled steel plate (JIS G3141, spcc / SD, 25 × 100 × 1.
6 mm. The same applies to the following), and pressure-bonded at 350 ° C. and 20 kg / cm 2 for 5 minutes. The tensile shear bond strength of this product at room temperature was 250 Kg / cm 2 .
参考例2 攪拌機、還流冷却機および窒素導入管を備えた容器に、
4,4′−ビス(3−アミノフェノキシ)−3,3′,5,5′−
テトラメチルビフェニル6.2g(0.0146モル)とN,N−ジ
メチルアセトアミド43.6gを装入し、室温で窒素雰囲気
下に、ベンゾフェノンテトラカルボン酸二無水物4.7g
(0.0146モル)を温度の上昇に注意しながら分割して加
え、室温で約20時間攪拌した。Reference Example 2 In a container equipped with a stirrer, a reflux condenser and a nitrogen introducing pipe,
4,4'-bis (3-aminophenoxy) -3,3 ', 5,5'-
Tetramethylbiphenyl 6.2 g (0.0146 mol) and N, N-dimethylacetamide 43.6 g were charged, and benzophenone tetracarboxylic acid dianhydride 4.7 g was added at room temperature under a nitrogen atmosphere.
(0.0146 mol) was added in portions while paying attention to increase in temperature, and the mixture was stirred at room temperature for about 20 hours.
このようにして得られたポリアミド酸の対数粘度は0.93
dl/gであった。このポリアミド酸溶液の一部をとり、ガ
ラス板上にキャストした後、100℃、200℃、300℃で各
々1時間加熱して淡黄色透明、フィルム厚35μのポリイ
ミドフィルムを得た。The polyamic acid thus obtained had an inherent viscosity of 0.93.
It was dl / g. A part of this polyamic acid solution was taken, cast on a glass plate, and then heated at 100 ° C., 200 ° C., and 300 ° C. for 1 hour each to obtain a pale yellow transparent polyimide film having a film thickness of 35 μ.
このポリイミドフィルムの引張強さは、10.96Kg/mm2、
引張伸び率は6.3%であった。また、このポリイミドフ
ィルムのガラス転移温度は276℃、空気中での5%重量
減少温度は473℃であった。さらに、このポリイミドフ
ィルムを130℃に予備加熱した冷間圧延鋼板間に挿入
し、350℃、20Kg/cm2で5分間加圧圧着させた。The tensile strength of this polyimide film is 10.96 Kg / mm 2 ,
The tensile elongation was 6.3%. The glass transition temperature of this polyimide film was 276 ° C, and the 5% weight loss temperature in air was 473 ° C. Further, this polyimide film was inserted between cold-rolled steel plates preheated to 130 ° C., and pressure-bonded at 350 ° C. for 20 minutes at 20 kg / cm 2 .
このものの室温での引張・せん断接着強さは275Kg/cm2
であった。The tensile and shear bond strength of this product at room temperature is 275 Kg / cm 2
Met.
Claims (2)
3,3′,5,5′−テトラメチルビフェニル。1. A formula (1) 4,4'-bis (3-aminophenoxy)-
3,3 ', 5,5'-Tetramethylbiphenyl.
ラメチルビフェニルとm−ジニトロベンゼンとを塩基の
存在下、非プロトン性極性溶媒中で縮合して、式(2) で表わされる4,4′−ビス(3−ニトロフェノキシ)−
3,3′,5,5′−テトラメチルビフェニルとし、更にこれ
を還元することを特徴とする式(1) で表わされる4,4′−ビス(3−アミノフェノキシ)−
3,3′,5,5′−テトラメチルビフェニルの製造方法2. Condensation of 4,4'-dihydroxy-3,3 ', 5,5'-tetramethylbiphenyl and m-dinitrobenzene in the presence of a base in an aprotic polar solvent to give a compound of formula ( 2) 4,4'-bis (3-nitrophenoxy)-
Formula (1) characterized in that 3,3 ′, 5,5′-tetramethylbiphenyl is prepared and further reduced 4,4'-bis (3-aminophenoxy)-
Method for producing 3,3 ′, 5,5′-tetramethylbiphenyl
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27280386A JPH0745445B2 (en) | 1986-11-18 | 1986-11-18 | 4,4 '"-bis (3-aminophenoxy) -3,3"', 5,5 '"-tetramethylbiphenyl and process for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27280386A JPH0745445B2 (en) | 1986-11-18 | 1986-11-18 | 4,4 '"-bis (3-aminophenoxy) -3,3"', 5,5 '"-tetramethylbiphenyl and process for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63126848A JPS63126848A (en) | 1988-05-30 |
| JPH0745445B2 true JPH0745445B2 (en) | 1995-05-17 |
Family
ID=17518969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27280386A Expired - Fee Related JPH0745445B2 (en) | 1986-11-18 | 1986-11-18 | 4,4 '"-bis (3-aminophenoxy) -3,3"', 5,5 '"-tetramethylbiphenyl and process for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0745445B2 (en) |
-
1986
- 1986-11-18 JP JP27280386A patent/JPH0745445B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63126848A (en) | 1988-05-30 |
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