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JPH0746655B2 - Soft magnetic thin film - Google Patents
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JPH0746655B2 - Soft magnetic thin film - Google Patents

Soft magnetic thin film

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Publication number
JPH0746655B2
JPH0746655B2 JP60244563A JP24456385A JPH0746655B2 JP H0746655 B2 JPH0746655 B2 JP H0746655B2 JP 60244563 A JP60244563 A JP 60244563A JP 24456385 A JP24456385 A JP 24456385A JP H0746655 B2 JPH0746655 B2 JP H0746655B2
Authority
JP
Japan
Prior art keywords
magnetic
thin film
soft magnetic
head
magnetic thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60244563A
Other languages
Japanese (ja)
Other versions
JPS62104109A (en
Inventor
理 石川
正俊 早川
和彦 林
祥隆 落合
秀樹 松田
洋 岩崎
興一 阿蘇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP60244563A priority Critical patent/JPH0746655B2/en
Publication of JPS62104109A publication Critical patent/JPS62104109A/en
Publication of JPH0746655B2 publication Critical patent/JPH0746655B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は例えば薄膜磁気ヘッドに用いて好適な軟磁性薄
膜に係わる。
The present invention relates to a soft magnetic thin film suitable for use in, for example, a thin film magnetic head.

〔発明の概要〕[Outline of Invention]

本発明は、Fe−Co−Si−Al系合金にCrを添加した軟磁性
薄膜であり、その組成の特定により高い飽和磁束密度Bs
を有し、透磁率μが高く、特に耐摩耗性にすぐれた軟磁
性薄膜を得るものである。
The present invention is a soft magnetic thin film in which Cr is added to an Fe-Co-Si-Al alloy, and a high saturation magnetic flux density Bs is determined by specifying its composition.
And a high magnetic permeability μ, and in particular, a soft magnetic thin film excellent in wear resistance is obtained.

〔従来の技術〕 各種磁気記録再生装置において、高密度記録化、高周波
数化の要求が高まり、これに対応して高い飽和磁化、高
い保磁力の磁気記録媒体が用いられる。この種の磁気記
録媒体としては、Fe,Co,Ni等の強磁性金属の粉末を用い
たいわゆるメタルテープや、強磁性金属材料をベースフ
ィルム上に被着して成るいわゆる蒸着テープなどが用い
られるに至っている。
[Prior Art] In various magnetic recording / reproducing apparatuses, there is an increasing demand for higher density recording and higher frequency, and correspondingly, magnetic recording media having high saturation magnetization and high coercive force are used. As this kind of magnetic recording medium, a so-called metal tape using a powder of a ferromagnetic metal such as Fe, Co, or Ni, a so-called vapor deposition tape formed by coating a ferromagnetic metal material on a base film, and the like are used. Has reached.

これに伴い、この種の磁気記録媒体に対する磁気ヘッド
としては、高い飽和磁束密度と高透磁率のヘッド材料に
よることが要求されると共に、高密度記録の要求から、
磁気媒体と磁気ヘッドとの相対速度が、より速められる
傾向にあり、これに伴ってヘッド材料としてできるだ
け、耐摩耗性が高く、耐蝕性にすぐれているなど、磁気
特性はもとより、化学的に安定で機械的特性にすぐれて
いることなどが要求される。
Along with this, a magnetic head for this type of magnetic recording medium is required to be made of a head material having high saturation magnetic flux density and high magnetic permeability, and from the requirement of high density recording,
The relative speed between the magnetic medium and the magnetic head tends to be faster, and as a result, it is chemically stable as well as having magnetic properties such as high wear resistance and excellent corrosion resistance as a head material. Therefore, it is required to have excellent mechanical properties.

この磁性材として、高い透磁率を有し高い飽和磁束密度
Bsを有する非晶質(アモルファス)磁性合金材料を用い
ることが考えられているが、この非晶質磁性合金材料は
耐熱性に難点があり、長時間の加熱や熱サイクルにより
透磁率が大きく劣化し再生効率が悪くなる。特に結晶化
の可能性が大きいので500℃以上の温度を長時間加える
ことはできないものであり、これがため、磁気ヘッドの
製造工程において例えばガラス融着のように500℃以上
の温度での処理を必要とする工程を採ることは好ましく
ないなどの問題点がある。
As this magnetic material, it has high permeability and high saturation magnetic flux density.
It has been considered to use an amorphous magnetic alloy material containing Bs, but this amorphous magnetic alloy material has a difficulty in heat resistance, and its magnetic permeability greatly deteriorates due to long-term heating or thermal cycling. However, the regeneration efficiency becomes poor. In particular, since there is a high possibility of crystallization, it is not possible to apply a temperature of 500 ° C or higher for a long time, and for this reason, in the manufacturing process of the magnetic head, for example, glass fusion treatment at a temperature of 500 ° C or higher is required. There is a problem that it is not preferable to take the necessary steps.

このような状況から、さらに良好な軟磁気特性を示す軟
磁性材料の研究が進められ、例えば山本達治・千葉久喜
共著,「日本金属学会誌」第14巻B,第2号(1950年)に
は、Fe,Co,Siを主成分とするFe−Co−Si系合金材料が良
好な軟磁気特性を示すことが報告されている。
Under such circumstances, research on soft magnetic materials exhibiting even better soft magnetic properties has been promoted. For example, in Tatsuharu Yamamoto and Kuki Chiba, “Journal of the Japan Institute of Metals”, Volume 14, B, No. 2 (1950). Have reported that an Fe-Co-Si based alloy material containing Fe, Co, and Si as main components exhibits excellent soft magnetic properties.

しかしながら、このFe−Co−Si系合金材は、極めて脆弱
で実用性に乏しく、そのまま磁気ヘッドのコア材料とし
て用いることには問題がある。
However, this Fe-Co-Si alloy material is extremely fragile and poor in practicality, and there is a problem in using it as it is as a core material of a magnetic head.

一方、高密度記録化に伴って記録トラック幅、したがっ
て磁気ヘッドにおける、作動磁気ギャップのトラック幅
の狭小化が要求され、この要求に対応し、しかも特に多
トラック磁気ヘッドにおいて著しく量産性の向上をはか
ることができるものとして非磁性ないしは磁性基板上に
軟磁性薄膜による磁気ヘッドコアを被着形成する薄膜技
術を用いた薄膜磁気ヘッドの普及がめざましい。この種
の軟磁性薄膜としてはFe,Al,Siを主成分とするセンダス
ト合金薄膜が注目を集めている。
On the other hand, along with the high density recording, it is required to reduce the recording track width, and hence the track width of the working magnetic gap in the magnetic head, and to meet this requirement, particularly, the mass productivity is remarkably improved in the multi-track magnetic head. As a measure that can be measured, a thin film magnetic head using a thin film technique for forming a magnetic head core of a soft magnetic thin film on a non-magnetic or magnetic substrate is remarkably popularized. As a soft magnetic thin film of this kind, a sendust alloy thin film containing Fe, Al and Si as main components has been attracting attention.

このセンダスト合金薄膜は、高い飽和磁束密度Bsを有
し、比較的高硬度を有するので、上述したメタルテープ
等のように高い残留磁束密度を有する磁気記録媒体に対
しても適用することが可能である。
Since this sendust alloy thin film has a high saturation magnetic flux density Bs and a relatively high hardness, it can be applied to a magnetic recording medium having a high residual magnetic flux density such as the metal tape described above. is there.

しかしながら、このセンダスト合金薄膜は比較的高硬度
を有するものの例えばフェライト材等に比し耐摩耗性及
び耐蝕性に劣る。
However, although this sendust alloy thin film has a relatively high hardness, it is inferior in wear resistance and corrosion resistance to, for example, a ferrite material.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明は上述した諸問題の改善をはかり、飽和磁束密度
Bs、透磁率μの低下を来すことなく、保磁力Hcが小、磁
歪λsが殆ど零、磁気異方性が小さい、すぐれた磁気的
特性を有すると共に、特に耐摩耗性にすぐれた軟磁性薄
膜を提供するものである。
The present invention has improved the above-mentioned various problems, and has a saturation magnetic flux density.
Bs and magnetic permeability μ do not decrease, coercive force Hc is small, magnetostriction λs is almost zero, magnetic anisotropy is small, and it has excellent magnetic properties and soft magnetism with excellent wear resistance. A thin film is provided.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、Fe,Co,Si及びAlを主成分とする磁性薄膜にク
ロムCrを添加する。
In the present invention, chromium Cr is added to the magnetic thin film containing Fe, Co, Si and Al as the main components.

すなわち、本発明は、Fe,Co,Si及びAlを主成分とし、そ
の組成を、Coが5〜15原子%、Siが6〜17原子%、Alが
2〜13原子%、Crが0.5〜7原子%、残部Feとする。
That is, the present invention is mainly composed of Fe, Co, Si and Al, and the composition thereof is 5 to 15 atom% of Co, 6 to 17 atom% of Si, 2 to 13 atom% of Al, and 0.5 to 10% of Cr. 7 atomic% and the balance Fe.

尚、上述の組成を有する本発明による軟磁性薄膜の膜厚
としては、10Å以上1mm以下であることが好ましく、さ
らに10Å以上100μm以下であることがより好ましい。
The thickness of the soft magnetic thin film of the present invention having the above composition is preferably 10 Å or more and 1 mm or less, and more preferably 10 Å or more and 100 μm or less.

〔作用〕 上述したように本発明による軟磁性薄膜は、Fe,Co,Si及
びAlを主成分とするもので、Alの添加によってFe−Co−
Si系軟磁性体に比し、保磁力や磁歪の小さい透磁率の高
い軟磁性体が得られるものであるが、加えて本発明にお
いては、これにCrを含有することに特徴があり、これに
より、特に耐摩耗性が向上する。
[Operation] As described above, the soft magnetic thin film according to the present invention contains Fe, Co, Si and Al as the main components, and by adding Al, Fe--Co--
Compared to Si-based soft magnetic material, it is possible to obtain a soft magnetic material having high magnetic permeability with small coercive force and magnetostriction, but in the present invention, it is characterized by containing Cr in it. Thereby, the wear resistance is particularly improved.

本発明者等の実験によれば、Coの含有量が5〜15原子%
の範囲を外れると、保磁力の増大や透磁率の低下が見ら
れた。
According to the experiments by the present inventors, the content of Co is 5 to 15 atom%.
Outside the range, the coercive force increased and the magnetic permeability decreased.

また、Si,Alについては、それぞれSiが6〜17原子%、A
lが2〜13原子%とする必要がある。これは、Si及びAl
の含有量がこれら範囲を外れると、例えば保磁力が大と
なり磁気ヘッドのコア材料としては使用し得なくなると
同時に、飽和磁束密度の低下や透磁率の低下が見られる
ことによる。これに対し、上述の範囲とすれば、低保磁
力化、高飽和磁束密度化、高透磁率化が達せられ、更に
零磁歪化が得られる。
Regarding Si and Al, Si is 6 to 17 atomic%, A
l must be 2 to 13 atomic%. This is Si and Al
When the content of is out of these ranges, for example, the coercive force becomes large and it cannot be used as the core material of the magnetic head, and at the same time, the saturation magnetic flux density and the magnetic permeability decrease. On the other hand, in the above range, low coercive force, high saturation magnetic flux density and high magnetic permeability can be achieved, and further zero magnetostriction can be obtained.

また、Crについては、Crが0.5原子%未満では高い耐摩
耗性が得られず、15原子%を超えると、飽和磁束密度な
どの磁気的特性の低下を招来する。
Regarding Cr, if Cr is less than 0.5 atom%, high wear resistance cannot be obtained, and if it exceeds 15 atom%, magnetic properties such as saturation magnetic flux density are deteriorated.

〔実施例〕〔Example〕

実施例1 99.9%以上の純度の純鉄と、電解コバルトと、クロム
と、アルミニウムと、99.999%以上の純度のシリコンを
用いそれぞれ秤量し、高周波誘導加熱炉を用いてアルミ
ナるつぼ内でアルゴンカス中で溶解し直径105mmのター
ゲット母材を鋳造した。この母材の両面を平面研削盤に
より研削し、厚さ5mmのスパッタリング用のターゲット
を作製した。
Example 1 Pure iron having a purity of 99.9% or more, electrolytic cobalt, chromium, aluminum, and silicon having a purity of 99.999% or more were weighed, respectively, and in an alumina crucible in an alumina crucible using a high frequency induction heating furnace. It was melted and a target base material having a diameter of 105 mm was cast. Both surfaces of this base material were ground by a surface grinder to prepare a sputtering target having a thickness of 5 mm.

このターゲットを用いてプレナーマグネトロン型高周波
スパッタリング装置によって結晶化ガラス基板上に厚さ
2μmの膜厚のスパッタリングを行った。
Using this target, a planar magnetron type high frequency sputtering apparatus was used to perform sputtering with a thickness of 2 μm on a crystallized glass substrate.

このスパッタリングの条件は、 到達ガス圧 6.0×10-6Torr 基板温度 加熱せず Arガス圧 7.0×10-3Torr 予備スパッタ 1時間 スパッタ時間 約1時間 とした。The conditions of this sputtering were as follows: ultimate gas pressure of 6.0 × 10 -6 Torr substrate temperature without heating, Ar gas pressure of 7.0 × 10 -3 Torr, 1 hour of preliminary sputtering, and 1 hour of sputtering time.

このようにスパッタリング薄膜を形成した基板を500℃
で1時間真空アニールし、薄膜の磁気特性、すなわち飽
和磁束密度Bsと、保磁力Hcと、5MHzの周波数における透
磁率μeffとを夫々膜組成を変えて測定した。また、各
組成について夫々その摩耗量を測定した。その結果を第
1図に示す。上記Crが添加されたFe−Co−Si−Al系合金
薄膜は、温度500℃、1時間の熱処理によって、結晶質
合金薄膜となる。
The substrate on which the sputtering thin film was formed was
After vacuum annealing for 1 hour, the magnetic properties of the thin film, that is, the saturation magnetic flux density Bs, the coercive force Hc, and the magnetic permeability μeff at a frequency of 5 MHz were measured by changing the film composition. The amount of wear was measured for each composition. The results are shown in FIG. The Fe-Co-Si-Al alloy thin film to which Cr is added becomes a crystalline alloy thin film by heat treatment at a temperature of 500 ° C for 1 hour.

ここに、摩耗量の測定は、第2図に示すように摩耗量測
定用のダミーヘッド(1)を作製して行った。このヘッ
ド(1)は幅Wが3.0mm、厚さtが0.5mmで前方に円筒面
状の磁気媒体との対接面を形成し、この面に被測定薄膜
(2)を被着し、このヘッド(1)を1インチVTR用の
回転磁気ヘッドドラムの台板に配し、ドラム面から80μ
±5μmで突出させ、γ−Fe2O3系の磁気媒体に接続さ
せた。この場合、テープ走行時間5時間毎に膜面(2)
を顕微鏡(倍率400倍)を用いて、ヘッド(1)の所定
位置に付したマーカー(3)からの距離をもってその摩
耗量を測定した。尚、このダミーヘッドへの被測定膜の
スパッタリングは、 到達ガス圧 6.0×10-6Torr 基体温度 300〜400℃ Arガス圧 7.0×10-3Torr 予備スパッタリング 1時間 スパッタ時間 4〜5時間 とした。そして、各1の組成について6個のダミーヘッ
ドを用いて、夫々その測定を行ってその平均摩耗量を第
1図に示した。
The amount of wear was measured by making a dummy head (1) for measuring the amount of wear as shown in FIG. This head (1) has a width W of 3.0 mm and a thickness t of 0.5 mm and forms a front surface which is in contact with a cylindrical magnetic medium, and a thin film to be measured (2) is deposited on this surface. This head (1) is placed on the base plate of the rotary magnetic head drum for 1 inch VTR, and 80μ from the drum surface.
It was projected at ± 5 μm and connected to a γ-Fe 2 O 3 based magnetic medium. In this case, the film surface (2) was measured every 5 hours of tape running time.
The amount of wear was measured using a microscope (magnification: 400 times) at a distance from the marker (3) attached to a predetermined position of the head (1). For the sputtering of the film to be measured onto this dummy head, the ultimate gas pressure was 6.0 × 10 −6 Torr, the substrate temperature was 300 to 400 ° C., the Ar gas pressure was 7.0 × 10 −3 Torr, the presputtering time was 1 hour, and the sputtering time was 4 to 5 hours. . Then, for each composition of 1, six dummy heads were used to perform the measurement, and the average wear amount is shown in FIG.

第1図からわかるように、Cr添加のFe−Co−Al−Si系に
よる本発明の軟磁性薄膜は、磁気的特性の低下を来すこ
となく時間当りの摩耗量の向上がはかられている。
As can be seen from FIG. 1, the soft magnetic thin film of the present invention made of a Cr-added Fe-Co-Al-Si system can improve the wear amount per hour without deteriorating the magnetic properties. There is.

また、上述の本発明による軟磁性薄膜において、更に耐
蝕性や耐摩耗性そのほか各種特性を改善するために各種
元素を添加剤として加えてもよい。この添加剤として使
用される元素としては、Ti,Zr,Hf等のIVa族元素、V,Nb,
Ta等のVa族元素、Mo,W等のVIa族元素、Mn等のVIIa族元
素、さらに白金族元素として第5周期の白金族元素、す
なわちRu,Rh,Rd、第6周期の白金族元素、すなわちOs,I
r,Pt等を挙げることができるものであり、これら添加剤
の1種または2種以上を組み合わせて、上記磁性薄膜に
対して0〜10重量%の範囲で添加し得る。
Further, in the above-mentioned soft magnetic thin film according to the present invention, various elements may be added as an additive in order to further improve various properties such as corrosion resistance and abrasion resistance. As the element used as this additive, Ti, Zr, IVa group elements such as Hf, V, Nb,
Va group elements such as Ta, VIa group elements such as Mo and W, VIIa group elements such as Mn, and platinum group elements of the fifth period platinum group elements, that is, Ru, Rh, Rd, and sixth period platinum group elements. , Ie Os, I
r, Pt and the like can be mentioned, and one or more of these additives can be combined and added in the range of 0 to 10% by weight with respect to the magnetic thin film.

〔発明の効果〕〔The invention's effect〕

上述したように本発明による軟磁性薄膜によれば、飽和
磁束密度の低下や、保磁力を高めることなく、高透磁率
を有し、耐摩耗性にすぐれ、更にアモルファス磁性薄膜
におけるような熱的に不安定性のない耐熱性にすぐれた
軟磁性薄膜を得ることができるので、例えば高密度記録
用の薄膜磁気ヘッドの薄膜磁気コアとして用いて、その
利益は極めて大である。
As described above, according to the soft magnetic thin film of the present invention, the saturation magnetic flux density is not lowered and the coercive force is not increased, the magnetic permeability is high and the wear resistance is excellent. Since it is possible to obtain a soft magnetic thin film that is free from instability and has excellent heat resistance, it is extremely profitable when used as a thin film magnetic core of a thin film magnetic head for high density recording, for example.

【図面の簡単な説明】[Brief description of drawings]

第1図は軟磁性薄膜の組成と各特性の測定結果を示す表
図、第2図はその摩耗量測定用ダミーヘッドの拡大斜視
図である。 (1)はダミーヘッド、(2)は被測定薄膜である。
FIG. 1 is a table showing the composition of the soft magnetic thin film and the measurement results of each characteristic, and FIG. 2 is an enlarged perspective view of the wear amount measuring dummy head. (1) is a dummy head, and (2) is a thin film to be measured.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 落合 祥隆 東京都品川区北品川6丁目7番35号 ソニ ー株式会社内 (72)発明者 松田 秀樹 東京都品川区北品川6丁目7番35号 ソニ ー株式会社内 (72)発明者 岩崎 洋 東京都品川区北品川6丁目7番35号 ソニ ー株式会社内 (72)発明者 阿蘇 興一 東京都品川区北品川6丁目7番35号 ソニ ー株式会社内 (56)参考文献 特開 昭58−67845(JP,A) 特開 昭55−2783(JP,A) 特開 昭53−70021(JP,A) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Yoshitaka Ochiai 6-735 Kitashinagawa, Shinagawa-ku, Tokyo Sony Corporation (72) Hideki Matsuda 6-735 Kitashinagawa, Shinagawa-ku, Tokyo Sony Corporation (72) Inventor Hiroshi Iwasaki 6-735 Kitashinagawa, Shinagawa-ku, Tokyo Sony Corporation (72) Inventor Koichi Aso 6-735 Kita-Shinagawa, Shinagawa-ku, Tokyo Soni -Incorporated (56) Reference JP 58-67845 (JP, A) JP 55-2783 (JP, A) JP 53-70021 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】Fe,Co,Si及びAlを含む結晶質合金薄膜にCr
が添加されて構成され、Coが5〜15原子%、Siが6〜17
原子%、Alが2〜13原子%、Crが0.5〜7原子%、残部F
eの組成を有することを特徴とする軟磁性薄膜。
1. A crystalline alloy thin film containing Fe, Co, Si and Al containing Cr
Is added, Co is 5 to 15 atom%, Si is 6 to 17
Atomic%, Al 2-13 atomic%, Cr 0.5-7 atomic%, balance F
A soft magnetic thin film having a composition of e.
JP60244563A 1985-10-31 1985-10-31 Soft magnetic thin film Expired - Lifetime JPH0746655B2 (en)

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JP60244563A JPH0746655B2 (en) 1985-10-31 1985-10-31 Soft magnetic thin film

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JP60244563A JPH0746655B2 (en) 1985-10-31 1985-10-31 Soft magnetic thin film

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JPS62104109A JPS62104109A (en) 1987-05-14
JPH0746655B2 true JPH0746655B2 (en) 1995-05-17

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01217708A (en) * 1988-02-24 1989-08-31 Tokin Corp Magnetic alloy
CN104762553A (en) * 2014-05-21 2015-07-08 北京北冶功能材料有限公司 Novel high resistivity crystalline state magnetically soft alloy

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831386B2 (en) * 1976-12-03 1983-07-05 古河電気工業株式会社 Corrosion resistant high permeability alloy
JPS5813617B2 (en) * 1978-11-10 1983-03-15 日立金属株式会社 Wear resistant high permeability alloy
JPS5867845A (en) * 1981-10-19 1983-04-22 Hitachi Metals Ltd High permeability alloy thin strip

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JPS62104109A (en) 1987-05-14

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