JPH0746737B2 - Laser oscillator - Google Patents
Laser oscillatorInfo
- Publication number
- JPH0746737B2 JPH0746737B2 JP60169752A JP16975285A JPH0746737B2 JP H0746737 B2 JPH0746737 B2 JP H0746737B2 JP 60169752 A JP60169752 A JP 60169752A JP 16975285 A JP16975285 A JP 16975285A JP H0746737 B2 JPH0746737 B2 JP H0746737B2
- Authority
- JP
- Japan
- Prior art keywords
- laser oscillator
- container
- anode
- cathode
- main discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
【発明の詳細な説明】 〔発明の技術分野〕 本発明はレーザ発振器に係り、特にガスレーザ発振器に
関する。Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to a laser oscillator, and more particularly to a gas laser oscillator.
レーザ発振方向に対して垂直方向に放電を発生させる紫
外光予備電離の横方向励起ガスレーザで、大気圧以上の
比較的高い圧力で動作するたとえばTEACO2レーザ装置
は、ICパッケージのマーキングなどに使われる。この方
式の従来例のレーザ装置について第５図にて説明する。
すなわち、円筒形の気密構造になる容器（１）を有し、
この容器（１）にはたとえばCO2,N2,Heの３種類のガス
を所定の割合で混合したガスレーザ媒質がほぼ大気圧に
保持されて封入されている。また、容器（１）内には主
放電電極をなす横断面がかまぼこ状になる板状の陰極
（２）および陽極（３）が容器（１）の軸方向に沿い所
定の間隔をおいて収納されている。また、これら電極と
は別に容器（１）内には保持板（４），（５）が容器
（１）の内壁に取り付けられている案内体（6a），（6
b）上に載置された状態に固着されている。一方の保持
板（４）には陽極（３）が取り付けられている。また、
他方の保持板（５）の陽極（３）側に向く面には絶縁体
（７）および取付板（８）が取り付けられている。取付
板（８）には陰極（２）が取り付けられている。なお、
保持板（４），（５）は陰極（２）または陽極（３）等
とともに容器（１）外へ引き出されるようになつてい
る。保持板（４）と取付板（７）には予備放電のための
多数のピン電極（9a），（9b）が陰極（２），陽極
（３）をはさんで設置されている。一方の各ピン電極
（9a）には予備放電時に充電されるピーキングキャパシ
タ（10）が接続されている。なお、図示せぬが陰極
（２），陽極（３）の両端側に位置して一対の光共振器
が容器（１）の軸に直交して配置されている。A laterally excited gas laser that pre-ionizes ultraviolet light that generates a discharge in the direction perpendicular to the laser oscillation direction.It operates at a relatively high pressure above atmospheric pressure.For example, the TEACO 2 laser device is used for marking IC packages. . A conventional laser device of this type will be described with reference to FIG.
That is, having a container (1) having a cylindrical airtight structure,
In this container (1), for example, a gas laser medium in which three kinds of gases such as CO 2 , N 2 and He are mixed at a predetermined ratio is sealed while being maintained at about atmospheric pressure. Further, in the container (1), a plate-shaped cathode (2) and anode (3), which form a main discharge electrode and whose cross section is a semi-cylindrical shape, are housed at predetermined intervals along the axial direction of the container (1). Has been done. Separately from these electrodes, holding plates (4) and (5) are attached to the inner wall of the container (1) inside the container (1).
b) It is fixed as it is placed on top. An anode (3) is attached to one holding plate (4). Also,
An insulator (7) and a mounting plate (8) are attached to the surface of the other holding plate (5) facing the anode (3) side. The cathode (2) is attached to the attachment plate (8). In addition,
The holding plates (4) and (5) are drawn out of the container (1) together with the cathode (2) or the anode (3). A large number of pin electrodes (9a) and (9b) for pre-discharging are placed on the holding plate (4) and the mounting plate (7) with the cathode (2) and the anode (3) interposed therebetween. A peaking capacitor (10) that is charged at the time of preliminary discharge is connected to each of the pin electrodes (9a). Although not shown, a pair of optical resonators are arranged at both ends of the cathode (2) and the anode (3) so as to be orthogonal to the axis of the container (1).
上記構成で得られたレーザ光のビーム強度は第６図に示
されるように、中央にピークをもった強度分布（11）と
なる。このようなレーザ光でたとえばマーキング加工を
する場合には所定のパターンを形成したマスクにビーム
を通過させ、このパターンを通過したレーザ光を適宜の
面積に縮小して行っているが、上記した強度分布のた
め、中央部分と周辺部分とが加工にバラツキを生じ、特
に周辺部がかすれてマーキングされてしまう不具合があ
った。The beam intensity of the laser light obtained by the above configuration has an intensity distribution (11) having a peak in the center, as shown in FIG. When marking is performed with such a laser beam, for example, the beam is passed through a mask having a predetermined pattern, and the laser beam passing through this pattern is reduced to an appropriate area. Due to the distribution, there was a problem that the central portion and the peripheral portion had variations in processing, and particularly the peripheral portion was faintly marked.
本発明は加工に適したレーザ光を得ることのできるレー
ザ発振器を提供することを目的とする。An object of the present invention is to provide a laser oscillator that can obtain a laser beam suitable for processing.
主放電電極の少なくとも一方の電極の一部に凹部で形成
された非放電部を形成し、上記目的を達成するようにし
たものである。A non-discharge portion formed of a recess is formed in at least one of the main discharge electrodes to achieve the above object.
以下、本発明の実施例を示す図面に基いて説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の第１の実施例で、第５図と共通する部
分には同一符号を付し、以下に説明する。すなわち、従
来例である第４図の構成と異なる点は陰極２の陽極
（３）側に対向している面の中央部になめらかな凹部
（15）を形成したことにある。この凹部（15）の深さは
陰極（２）と陽極（３）の対向間隔の最短部の1/10以下
が好ましい。FIG. 1 shows a first embodiment of the present invention, and the portions common to those in FIG. That is, the point different from the configuration of the conventional example shown in FIG. 4 is that a smooth concave portion (15) is formed in the central portion of the surface of the cathode 2 facing the anode (3) side. The depth of the recess (15) is preferably 1/10 or less of the shortest part of the facing distance between the cathode (2) and the anode (3).
上記の構成によって取付板（７）に高電圧パルスが印加
されると各ピン電極（8a），（8b）間でスパーク放電が
起き、この放電によって紫外光が発生する。この発生し
た紫外光は陰極（２）と陽極（３）の間を予備電離す
る。予備電離の度合は紫外光源からの距離に依存するた
め、ピン電極（8a），（8b）に近い陰極（２），陽極
（３）の端部がよりよく予備電離される。さらに、陰極
（２）の左右両端部は中央凹部（15）よりわずかに電極
間隔が短かいため、凹部（15）を間にして両側に主放電
（16a），（16b）が発生する。このとき、凹部（15）は
電極隔1/10以下で、しかもなめらかであるため、非放電
部となり、両側での放電はアーク放電になることはなく
グロー放電となる。以上の放電により発生するレーザビ
ーム強度は第２図の破線部分を含んだ二つの主放電（16
a），（16b）に対する各々のビーム強度が重量し、全体
としてはその重畳部分の和が加算され、実線で示すよう
にほぼ台形状の強度分布（18）をもつレーザビームとな
る。したがって、強度の平均化に伴なって前述のマーキ
ング加工においてはかすれ現象が解決されるようになっ
た。When a high voltage pulse is applied to the mounting plate (7) with the above configuration, a spark discharge is generated between the pin electrodes (8a) and (8b), and ultraviolet light is generated by this discharge. The generated ultraviolet light pre-ionizes between the cathode (2) and the anode (3). Since the degree of preionization depends on the distance from the ultraviolet light source, the ends of the cathode (2) and the anode (3) near the pin electrodes (8a) and (8b) are better preionized. Further, the left and right ends of the cathode (2) have a slightly shorter electrode interval than the central recess (15), so that main discharges (16a), (16b) are generated on both sides across the recess (15). At this time, since the recess (15) has an electrode gap of 1/10 or less and is smooth, it becomes a non-discharge portion, and the discharge on both sides becomes a glow discharge, not an arc discharge. The intensity of the laser beam generated by the above discharge is two main discharges (16
The respective beam intensities for a) and (16b) are heavy, and the sum of the overlapping portions is added as a whole, resulting in a laser beam having a substantially trapezoidal intensity distribution (18) as shown by the solid line. Therefore, with the averaging of strength, the fading phenomenon has come to be solved in the above-described marking process.
第３図は本発明の第２の実施例で凹部（15）を１個でな
く、複数たとえば２個設けた例であり、また、第４図は
本発明の第３の実施例で凹部に電気絶縁物が配設されて
なる絶縁部（19）を設けたものでこれらはいずれも非放
電部となり、上記第１の実施例と同様な作用効果を奏す
る。なお、絶縁部（19）は図示のように１個でなく複数
個形成しても同様である。FIG. 3 is an example in which a plurality of, for example, two recesses (15) are provided in the second embodiment of the present invention instead of one, and FIG. 4 shows a recess in the third embodiment of the present invention. An insulating portion (19) provided with an electric insulator is provided, and each of them serves as a non-discharging portion, and has the same effect as that of the first embodiment. The insulating portion (19) is not limited to one as shown in the drawing, but may be formed in plural.
さらに上記何れの実施例も陰極側に凹部で形成された非
放電部を設けたが、反対に陽極側もしくは両方の電極に
設けても同じ効果が得られる。Further, in each of the above embodiments, the non-discharging portion formed by the concave portion is provided on the cathode side, but the same effect can be obtained by providing the non-discharging portion on the anode side or both electrodes.
ビームの強度分布が平均化したレーザ光が得られたこと
により加工のためのしきい値を必要以上に上げることな
く均一な加工が行えるようになった。特に、マーキング
加工ではより広い均一な部分をもつレーザ光により、マ
スクの面積を拡大することができた。By obtaining the laser light whose beam intensity distribution is averaged, it becomes possible to perform uniform processing without raising the threshold for processing more than necessary. Particularly, in the marking process, the area of the mask could be expanded by the laser light having a wider and uniform portion.
第１図は本発明の第１の実施例を示す断面図、第２図は
上記第１の実施例で得られたレーザ光のビビーム強度分
布図、第３図および第４図は本発明の第２および第３の
実施例を示す要部断面図、第５図は従来例を示す断面
図、第６図は従来例のビーム強度分布図である。 （１）……容器、（２）……陰極 （３）……陽極、（9a），（9b）……ピン電極 （15）……凹部FIG. 1 is a sectional view showing a first embodiment of the present invention, FIG. 2 is a bi-beam intensity distribution diagram of laser light obtained in the first embodiment, and FIGS. 3 and 4 show the present invention. FIG. 5 is a sectional view showing a conventional example, and FIG. 6 is a beam intensity distribution chart of a conventional example. (1) …… Container, (2) …… Cathode (3) …… Anode, (9a), (9b) …… Pin electrode (15) …… Concave
Claims (3)
封入した容器と、この容器内に所定の間隔をおいて対向
配置された陰極および陽極からなる主放電電極と、この
主放電電極の近傍に配置され主放電域とその近傍を予備
電離する予備放電電極とを備えたレーザ発振器におい
て、上記主放電電極の少なくとも一方は主放電域側の一
部に凹部で形成された非放電部を持つことを特徴とする
レーザ発振器。1. A gas laser medium, a container in which the gas laser medium is sealed, a main discharge electrode composed of a cathode and an anode, which are opposed to each other at a predetermined interval in the container, and arranged in the vicinity of the main discharge electrode. In a laser oscillator having a main discharge region and a preliminary discharge electrode for preionizing the vicinity thereof, at least one of the main discharge electrodes has a non-discharge portion formed in a concave portion at a part of the main discharge region side. Characteristic laser oscillator.
いかつ中央部に形成されたことを特徴とする特許請求の
範囲第１項記載のレーザ発振器。2. The laser oscillator according to claim 1, wherein the non-discharging portion is formed in a central portion along a direction orthogonal to the main discharging direction.
特徴とする特許請求の範囲第１項記載のレーザ発振器。3. The laser oscillator according to claim 1, wherein an electric insulator is provided in the recess.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60169752A JPH0746737B2 (en) | 1985-08-02 | 1985-08-02 | Laser oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60169752A JPH0746737B2 (en) | 1985-08-02 | 1985-08-02 | Laser oscillator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6231185A JPS6231185A (en) | 1987-02-10 |
| JPH0746737B2 true JPH0746737B2 (en) | 1995-05-17 |
Family
ID=15892184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60169752A Expired - Lifetime JPH0746737B2 (en) | 1985-08-02 | 1985-08-02 | Laser oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0746737B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2640345B2 (en) * | 1987-06-30 | 1997-08-13 | 株式会社小松製作所 | Gas laser oscillation device |
| JPH04139777A (en) * | 1990-10-01 | 1992-05-13 | Toshiba Corp | Pulse laser equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61201489A (en) * | 1985-03-04 | 1986-09-06 | Toshiba Corp | Gas laser oscillator |
| JPS61174764U (en) * | 1985-04-22 | 1986-10-30 |
-
1985
- 1985-08-02 JP JP60169752A patent/JPH0746737B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6231185A (en) | 1987-02-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4481634A (en) | RF Excited metal waveguide laser | |
| CA1231424A (en) | Transversely excited gas laser | |
| JPH0746737B2 (en) | Laser oscillator | |
| JPS62139372A (en) | Discharge excitation type short pulse laser device | |
| JP3779031B2 (en) | Corona preionization electrode | |
| JP2772147B2 (en) | Pulsed laser electrode | |
| JPS61201489A (en) | Gas laser oscillator | |
| JP2614231B2 (en) | Gas laser device | |
| JPH06101600B2 (en) | Transversely excited gas laser oscillator | |
| JP2666149B2 (en) | Ultraviolet preionization electrode for discharge-excited gas laser device. | |
| JPS63217684A (en) | Pulse gas laser device | |
| JPH02268476A (en) | Pulse gas laser oscillator | |
| JPH0254978A (en) | Pulse laser oscillator | |
| JPS622678A (en) | Gas laser oscillator | |
| JP2827683B2 (en) | Ion laser oscillator | |
| JPH06188486A (en) | Discharge-pumped excimer laser apparatus | |
| JPH0465174A (en) | Gas laser | |
| JPH05259554A (en) | High repetition pulsed laser electrode | |
| JPS63129681A (en) | excimer laser equipment | |
| JPS63217680A (en) | Pulse gas laser device | |
| JPS63241972A (en) | Gas laser device | |
| JPS63228776A (en) | Gas laser device | |
| JPS61116888A (en) | Discharge excitation short pulse laser device | |
| JPS63228772A (en) | Highly repetitive pulsed laser electrode | |
| JPS61251087A (en) | Discharge excitation type short pulse laser device |