JPH0746909B2 - Positioning device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION Object of the Invention (Industrial field of application) The present invention relates to a positioning device that uses a bimorph type piezoelectric element to control minute displacement with high accuracy.

(Prior Art) Generally, an actuator using a piezoelectric element that converts an electric quantity into a displacement quantity is considered as an actuator of a positioning apparatus that controls a minute displacement with high accuracy such as a fine adjustment mechanism of an electron microscope. There is. An actuator using this piezoelectric element has the advantages of high conversion efficiency, small heat generation, and small drift due to thermal deformation, but has the drawback of small displacement.

Therefore, conventionally, a bimorph-type piezoelectric element that causes bending displacement by bonding two piezoelectric elements that expand and contract in the lengthwise direction when a voltage is applied and expanding one side and simultaneously contracting the other side is used as a cantilever. Alternatively, the bimorph type piezoelectric element is used in combination with a displacement magnifying mechanism such as a lever.

However, when the bimorph type piezoelectric element is used as a cantilever, the mechanical strength is weak and there is a problem that the operation becomes unstable, and the free end side of the bimorph type piezoelectric element causes an arc motion centered on the fixed end. Therefore, there is a problem that a complicated mechanism is required to displace the driven body with good linearity. Further, when a piezoelectric element and a displacement magnifying mechanism such as a lever are combined as in the prior art, only a minute amount of about several tens of μm can be displaced, and it is difficult to increase the displacement amount. .

(Problems to be solved and used by the invention) In the conventional structure, when the bimorph type piezoelectric element is used as a cantilever, the mechanical strength is weak and the operation becomes unstable. There is a problem that a complicated mechanism is required to displace the body with good linearity, and when a piezoelectric element and a displacement magnifying mechanism such as a lever are combined, only a small amount of about several tens of μm can be displaced. However, there is a problem that it is difficult to increase the amount of displacement.

The present invention has been made in view of the above circumstances, has a high mechanical strength, can stabilize the operation, and can obtain a large amount of displacement in each of two orthogonal XY directions with high accuracy. In addition, it is an object of the present invention to provide a positioning device capable of downsizing the entire device.

[Structure of the Invention] (Means for Solving the Problems) The present invention is directed to two XY axes which are orthogonal to a stage for mounting a driven body.
In a positioning device equipped with an X-direction micro-displacement mechanism and a Y-direction micro-displacement mechanism that perform micro-displacement in each direction, the actuators of the X-direction micro-displacement mechanism and the Y-direction micro-displacement mechanism are separated in parallel on both sides of the stage. A rectangular frame-shaped support frame is formed by a plurality of bimorph type piezoelectric elements in the X direction and the Y direction which are arranged to face each other and is stacked in a plurality of stages on the same plane so as to surround the periphery of the stage. An X-direction actuator support frame in which an opening for mounting the actuator is formed in a central portion of a pair of frame walls, and a Y-direction actuator in which an opening for mounting the actuator is formed in the center of a pair of frame walls in the Y direction. A support frame to form the actuator in the X-direction actuator support frame. Both ends of the bimorph type piezoelectric element of the X-direction actuator at both ends of the mounting opening of the actuator, and the bimorph of the Y-direction actuator at both ends of the mounting opening of the actuator in the Y-direction actuator support frame. Type piezoelectric element is fixed at both ends thereof, and further, a central portion of a movable portion between both end fixing portions of the bimorph type piezoelectric element in the outer stage and the bimorph type piezoelectric element of the support frame in the inner stage. Displacement amount transmission arms in the X and Y directions connecting the both ends of the mounting opening are provided, and the displacement operation of the movable portion between the both end fixed portions of the bimorph type piezoelectric element at each stage in the X direction is performed. An X-direction displacement amount enlargement mechanism for sequentially transmitting the displacement amount to the stage side while increasing the displacement amount through the X-direction displacement amount transmission arm, and Y The displacement direction of the movable part between the fixed parts on both ends of the bimorph type piezoelectric element in each direction in the opposite direction is sequentially applied through the Y direction displacement amount transmission arm to increase the displacement amount and transmit it to the stage side in the Y direction. Displacement amount expansion mechanisms are provided respectively.

(Operation) By applying a predetermined voltage to each bimorph-type piezoelectric element of each stage of the displacement amount enlarging mechanism of the X-direction micro-displacement mechanism, the movable part between the fixed ends of the bimorph-type piezoelectric element of each stage is formed into a substantially arc shape. And the displacement operation of the movable part of the bimorph type piezoelectric element at each stage at this time is sequentially applied via the X-direction displacement amount transmission arm of the X-direction displacement amount expansion mechanism to expand the displacement amount and move the stage to the X-axis. In the bimorph type piezoelectric element of each stage by applying a predetermined voltage to the bimorph type piezoelectric element of each stage of the displacement amount enlarging mechanism of the Y direction minute displacement mechanism orthogonal to the X direction. The movable portion between the fixed portions at both ends is deformed into a substantially arc shape, and the displacement operation of the movable portion of the bimorph type piezoelectric element at each stage at this time is transmitted in the Y-direction displacement amount of the Y-direction displacement amount expansion mechanism. The stage is displaced in the Y direction and positioned while sequentially adding through the arms to increase the displacement amount.

(Embodiment) An embodiment of the present invention will be described below with reference to FIGS. 1 to 4. 1 and 2 show the schematic configuration of the entire positioning device for controlling minute displacement with high accuracy.
Is the main body of the positioning device. The positioning device main body 11 has a substantially rectangular stage 12 for mounting a driven body at the center thereof, and a substantially rectangular frame-shaped frame body in which four stages are stacked around the stage 12 with a predetermined gap therebetween. (Support frame) 1
3, 14, 15, 16 are arranged respectively. In this case, the stage 12 is formed by a movable member that is movable in two orthogonal directions (X direction and Y direction).

Further, on the outer first frame 13, piezoelectric element mounting openings 17a and 17b are formed on a pair of opposing wall surfaces along the X direction. These piezoelectric element mounting openings 17a, 17b
Is provided with a pair of bimorph type piezoelectric elements 18a and 18b which are arranged in parallel on both sides of the stage 12 in the X direction so as to be spaced apart and face each other. In this case, the bimorph type piezoelectric elements 18a, 18b
Both ends thereof are fixed to both end portions of the openings 17a, 17b, respectively, and the bimorph type piezoelectric elements 18a, 18b are mounted in a erected state between the both ends of the openings 17a, 17b. Then, the first frame 13 forms a first support frame for connecting the both ends of the pair of bimorph type piezoelectric elements 18a, 18b.

The bimorph type piezoelectric elements 18a and 18b are formed by bonding two piezoelectric elements 1 and 2 which expand and contract in the length direction when a voltage is applied, as shown in FIG. Bending displacement is generated by contracting. 3 and 4 show the electrode structure of the bimorph type piezoelectric elements 18a and 18b. The arrows of each piezoelectric element 1 and 2 in FIG. 4 indicate the polarization direction, and the entire figure is cantilevered. 6 shows a supporting bimorph piezoelectric element mechanism. Further, FIG. 3 is an enlarged view of a part of FIG.

Further, on the second frame body 14 inside the first frame body 13, a projection portion 19a is provided at a substantially central portion of a pair of opposing wall surfaces along the X direction so as to project toward the bimorph type piezoelectric elements 18a, 18b side. , 19b are formed. The projections 19a and 19b are fixed to the bimorph type piezoelectric elements 18a and 18b, respectively, at substantially central portions in the longitudinal direction. A first displacement amount transmission arm for transmitting the displacement operation of the bimorph type piezoelectric elements 18a, 18b in the X direction to the stage 12 side is formed by these protrusions 19a, 19b, and the bimorph type piezoelectric element 18a, 18b, first frame 13
A first stage displacement mechanism 20 that moves the stage 12 in the X direction is formed by the projections 19a and 19b.

Further, inside the second frame body 14, a bimorph type piezoelectric element 21 having the same configuration as the bimorph type piezoelectric elements 18a and 18b described above.
The a and 21b are arranged parallel to each other on both sides of the stage 12 in the X direction in a spaced-apart and opposed state. In this case, a pair of support projections 22, 22 protruding inward are provided on the pair of opposed wall surfaces along the Y direction of the second frame 14 on both sides of the stage 12 in the X direction, respectively. Bimorph-type piezoelectric elements 21a and 21b are mounted between the support protrusions 22 and 22 in a erected state. Then, the second frame 14 forms a second support frame for connecting the both ends of the pair of bimorph type piezoelectric elements 21a, 21b.

Further, on the third frame body 15 inside the second frame body 14, a projection portion 23a projecting toward the bimorph type piezoelectric elements 21a, 21b side is provided at substantially central portions of a pair of opposing wall surfaces along the X direction. , 23b are formed. The protrusions 23a, 23b are fixed to the substantially central portion in the longitudinal direction of the bimorph type piezoelectric elements 21a, 21b, and these protrusions 23a, 23b displace the bimorph type piezoelectric elements 21a, 21b in the X direction. A second displacement amount transmitting arm that transmits the force to the stage 12 side is formed.
Then, the bimorph type piezoelectric elements 21a and 21b, the second frame 14
A second stage displacement mechanism 24 that moves the stage 12 in the X direction is formed by the projections 23a and 23b. In this case, the displacement amount of the second stage displacement mechanism 24 in the X direction is transmitted to the stage 12 side while being added to the displacement amount of the first stage displacement mechanism 20 in the X direction,
The first stage displacement mechanism 20 and the second stage displacement mechanism 24 form a displacement amount enlarging mechanism A of an X-direction minute displacement mechanism for minutely displacing and positioning the stage 12 in the X direction.

Further, inside the third frame 15, a bimorph type piezoelectric element 25 having the same configuration as the above-described bimorph type piezoelectric elements 18a, 18b.
The a and 25b are arranged parallel to each other on both sides of the stage 12 in the Y direction in a spaced-apart and opposed state. In this case, a pair of opposing wall surfaces along the X direction of the third frame 15 are provided with a pair of support projections 26, 26 projecting inwardly on both sides of the stage 12 in the Y direction. Bimorph-type piezoelectric elements 25a and 25b are mounted between the support protrusions 26 and 26 in a erected state. The third frame 15 forms a third support frame that connects the two ends of the pair of bimorph piezoelectric elements 25a and 25b.

Further, on the fourth frame body 16 inside the third frame body 15, a protruding portion 27a projecting toward the bimorph type piezoelectric elements 25a, 25b side is formed at substantially central portions of a pair of opposing wall surfaces along the Y direction. , 27b are formed. The protrusions 27a, 27b are fixed to the substantially central portion in the longitudinal direction of the bimorph type piezoelectric elements 25a, 25b, and these protrusions 27a, 27b displace both bimorph type piezoelectric elements 25a, 25b in the Y direction. The stage 12
A third displacement amount transmitting arm that transmits to the side is formed. A third stage displacement mechanism 28 that moves the stage 12 in the Y direction is formed by the bimorph type piezoelectric elements 25a and 25b, the third frame 15 and the protrusions 27a and 27b.

Further, inside the fourth frame body 16, a bimorph type piezoelectric element 29 having the same structure as the above-mentioned bimorph type piezoelectric elements 25a, 25b.
The a and 29b are arranged parallel to each other on both sides of the stage 12 in the Y direction in a spaced-apart and opposed state. In this case, a pair of support projections 30, 30 protruding inward are provided on the pair of opposing wall surfaces along the X direction of the fourth frame 16 on both sides of the stage 12 in the Y direction, respectively. Bimorph type piezoelectric elements 29a and 29b are mounted between the support protrusions 30 and 30 in a erected state. The fourth frame 16 forms a fourth support frame for connecting the two ends of the pair of bimorph piezoelectric elements 29a, 29b.

On the other hand, on the stage 12 inside the fourth frame 16, a bimorph type piezoelectric element is provided at a substantially central portion of a pair of opposing wall surfaces along the Y direction.
Protrusions 31a and 31b are formed so as to protrude toward the 29a.29b side. The protrusions 31a, 31b are fixed to the substantially central portion in the longitudinal direction of the bimorph type piezoelectric elements 29a.29b, and the protrusions 31a, 31b displace the bimorph type piezoelectric elements 29a.29b in the Y direction. And a fourth displacement amount transmission arm for transmitting the signal to the stage 12 side. A fourth stage displacement mechanism 32 for moving the stage 12 in the Y direction is formed by the bimorph type piezoelectric elements 29a and 29b, the fourth frame body 16 and the protrusions 31a and 31b. In this case, the displacement amount of the fourth stage displacement mechanism 32 in the Y direction is transmitted to the stage 12 side while being added to the displacement amount of the third stage displacement mechanism 28 in the Y direction. The displacement amount enlarging mechanism B of the Y direction minute displacement mechanism for positioning the stage 12 by slightly displacing the stage 12 in the Y direction by the third stage displacement mechanism 28 and the fourth stage displacement mechanism 32.
Are formed.

Next, the operation of the above configuration will be described. First, each bimorph type piezoelectric element 18a, 18b, 21a, 21b, 25a, 25b, 29a, 29b
In a non-operating state in which no voltage is applied to each of the bimorph type piezoelectric elements 18a, 18b, 21a, 21b, 25a, 25b, 29a, 29b are held in a substantially linear normal state, the driven body is kept in this state. The mounting stage 12 is also held in a predetermined inoperative position.

When a predetermined voltage V ₁ is applied to each of the bimorph type piezoelectric elements 18a, 18b of the first stage displacement mechanism 20, these bimorph type piezoelectric elements are indicated by phantom lines in FIGS. 3 and 4. One piezoelectric element 1 side forming 18a, 18b contracts in the length direction, and the other piezoelectric element 2 side deforms in a state of extending. Therefore, the bimorph type piezoelectric element 18a,
Since 18b is deformed into a substantially arc shape in a state in which the central portion in the longitudinal direction is displaced by x ₁ along the X direction of the stage 12 with respect to the fixed portions at both ends, the bimorph piezoelectric elements 18a and 18b are deformed at the same time as the first portion. Each component inside the frame 13 is a first frame
Each translation only x ₁ along the X-direction of the stage 12 with respect to 13.

Further, in this state, the bimorph type piezoelectric elements 21a and 21b of the second stage displacement mechanism 24 are continuously supplied with a predetermined voltage V ₂ respectively.
Is applied, the bimorph type piezoelectric elements 21a and 21b are deformed into a substantially arc shape in a state where the longitudinal center portion is displaced by x ₂ along the X direction of the stage 12 with respect to the fixed portions at both ends.
Therefore, at the same time when the bimorph type piezoelectric elements 21a and 21b are deformed, the respective constituent members inside the second frame body 14 move in parallel by x ₂ along the X direction of the stage 12 with respect to the second frame body 14. . Therefore, each of the components inside the second frame body 14 is separated from the first frame body 13 by x ₁ along the X direction of the stage 12.
It translates by + x ₂ .

Further, in this state, when a predetermined voltage V ₃ is continuously applied to each bimorph type piezoelectric element 25a, 25b of the third stage displacement mechanism 28, the bimorph type piezoelectric element 25a, 25b is moved in the longitudinal direction with respect to the fixed portions at both ends. The center portion is deformed into a substantially arc shape while being displaced by y ₁ along the Y direction of the stage 12. Therefore, at the same time as the bimorph type piezoelectric elements 25a and 25b are deformed, the respective constituent members inside the third frame body 15 are moved in parallel with the third frame body 15 by y ₁ along the Y direction of the stage 12. .

Further, when a predetermined voltage V ₄ is continuously applied to each bimorph type piezoelectric element 29a.29b of the fourth stage displacement mechanism 32, the bimorph type piezoelectric element 29a.29b moves the central portion in the longitudinal direction with respect to the fixed portions at both ends. Y ₂ along the Y direction of stage 12
It deforms into a substantially arc shape while being displaced. for that reason,
Simultaneously with the deformation of the bimorph type piezoelectric elements 29a and 29b, the stage 12 inside the fourth frame body 16 moves in parallel with the fourth frame body 16 by y ₂ along the Y direction of the stage 12. Therefore, the stage 12 inside the fourth frame body 16 is adapted to move parallel to the third frame body 15 by y ₁ + y ₂ along the Y direction of the stage 12. With respect to the first frame 13, the stage 12 is translated by x ₁ + x ₂ along the X direction and further by y ₁ + y ₂ along the Y direction.

Therefore, the following effects are obtained with the above-mentioned configuration.
That is, when the stage 12 is moved in the X direction, by applying a predetermined voltage to each of the bimorph type piezoelectric elements 18a, 18b, 21a, 21b of each stage of the displacement amount magnifying mechanism A of the X direction minute displacement mechanism, Stepped Bimorph Piezoelectric Elements 18a, 18
b, 21a, 21b, the movable portion between the both fixed portions is deformed into a substantially arc shape, at this time the bimorph type piezoelectric element 18a of each stage,
The displacement operation of the movable parts of 18b, 21a, and 21b is performed by projecting parts of each stage of the first stage displacement mechanism 20 and the second stage displacement mechanism 24.
19a. 19b, 23a, and 23b are sequentially applied to increase the amount of displacement, and the stage 12 is displaced and positioned in the X direction. Therefore, when the stage 12 is moved in the X direction, the stage 12 is moved more than before. The displacement amount can be increased.

Similarly, when moving the stage 12 in the Y direction orthogonal to the X direction, a predetermined voltage is applied to the bimorph type piezoelectric elements 25a, 25b, 29a, 29b of the respective stages of the displacement amount increasing mechanism B of the Y direction minute displacement mechanism. By applying, by applying a deformed piezoelectric element 25a, 25b, 29a, 29b in each stage the movable portion between the fixed portions at both ends is deformed into a substantially arc shape, at this time the bimorph piezoelectric element 25a, 25b, 29a of each stage , 29b of the movable part is sequentially added through the protrusions 27a, 27b, 31a, 31b of the respective stages of the third stage displacement mechanism 28 and the fourth stage displacement mechanism 32 to increase the displacement amount. Since the stage 12 is displaced in the Y direction and positioned, the displacement amount of the stage 12 can be increased compared to the conventional case even when the stage 12 moves in the Y direction.

Further, the bimorph type piezoelectric elements 18a, 18b, 21a, 21b of the respective stages of the displacement amount enlarging mechanism A of the X-direction micro displacement mechanism and the bimorph type piezoelectric elements 25a of the respective stages of the displacement amount enlarging mechanism B of the Y direction micro displacement mechanism. Since the displacement operation of the movable part of 25b, 29a, 29b is proportional to the magnitude of the applied voltage, the applied voltage of the bimorph type piezoelectric elements 18a, 18b, 21a, 21b, 25a, 25b, 29a, 29b of each stage should be properly adjusted. By controlling, the X direction and the Y direction of the stage 12 can be controlled.
The displacement in each direction can be positioned with high accuracy.

Further, both end portions of the bimorph type piezoelectric elements 18a, 18b are provided at both end portions of the openings 17a, 17b of the first frame body 13, and both end portions of the bimorph type piezoelectric elements 21a, 21b are provided as support projections of the second frame body 14. twenty two,
22 both end portions, both end portions of the bimorph type piezoelectric elements 25a, 25b are both end portions of the support protrusions 26, 26 of the third frame body 15, and both end portions of the bimorph type piezoelectric elements 29a. 29b are the fourth frame body 16 respectively. Since the support protrusions 30 and 30 are fixed to both end portions, respectively, the natural frequency (rigidity) of the driven body mounting stage 12 can be increased. Therefore, the mechanical strength of the entire positioning device main body 11 can be increased as compared to the case where the bimorph type piezoelectric element is used as a cantilever, and the operation of the entire positioning device main body 11 can be stabilized.

Further, the first to fourth frame bodies 13, 14, 15, 16 each having a substantially rectangular frame shape and stacked in four stages surrounding the stage 12 are provided, and the bimorph type piezoelectric elements 18a, 18b at each stage are provided. , 21a, 21b, 25
The a, 25b, 29a, 29b are fixed to the frame bodies 13, 14, 15, 16 with both ends fixed, and the bimorph type piezoelectric elements 18 of the first stage displacement mechanism 20 and the second stage displacement mechanism 24 are fixed.
Displacement movement of a, 18b, 21a, and 21b in the X direction is performed by the protruding portion 19a of each step.
19b, 23a, and 23b, 23b, and 23b, and the displacement amount is expanded and transmitted to the stage 12 side. Further, the bimorph type piezoelectric elements 25a and 25b of the third stage displacement mechanism 28 and the fourth stage displacement mechanism 32 are transmitted. , 29a.29b in the Y direction are sequentially applied via the protrusions 27a, 27b, 31a, 31b of the respective stages, and the displacement amount is enlarged and transmitted to the stage 12 side. The bimorph type piezoelectric elements 18a, 18 of the respective stages of the displacement increasing mechanism A of the X direction minute displacement mechanism
The bimorph type piezoelectric elements 25a, 25b, 29a, 29b of the stages b, 21a, 21b and the displacement amount enlargement mechanism B of the Y direction minute displacement mechanism can be compactly incorporated. Therefore, the positioning device main body 11 as a whole can be downsized, so that a minute displacement of the stage 12 on which a sample such as an electron microscope is mounted, such as a fine adjustment mechanism such as an electron microscope, can be increased in two directions of XY orthogonal to each other. When this device is used as an actuator that controls with high accuracy, this device can be efficiently incorporated into the main body side of an electron microscope or the like.

The present invention is not limited to the above embodiment.

For example, the displacement characteristics of the bimorph type piezoelectric elements 18a, 18b, 21a, 21b, 25a, 25b, 29a.29b of each stage displacement mechanism 20, 24, 28, 32 may be different, and each bimorph type piezoelectric element. The applied voltages to the elements 18a, 18b, 21a, 21b, 25a, 25b, 29a, 29b may be different from each other. In this case, for example, each bimorph type piezoelectric element 18a, 18b, 21a, 21b,
25a, 25b, x ₁ the displacement of the _{29a.29b, x 2, x 3,} x 4, y 5, y 6, y 7, y 8
When set to each, the stage 12 is the first frame 13
Respectively in the X direction _{(x 3 + x 4) /} 2 + (x 3 + x 4) / 2, also in the Y-direction _{(y 5 + y 6) /} 2 + (y 7 + y 8) / 2 only so displaced relative ing.

Further, in the above embodiment, each bimorph type piezoelectric element 18a, 18
b, 21a, 21b, 25a, 25b, 29a.29b piezoelectric elements 1, 2 constituting
Although a structure in which a single electrode is provided on the outer surface of each of the bimorph type piezoelectric elements 18a,
Piezoelectric elements 1, 18b, 21a, 21b, 25a, 25b, 29a.29b
A plurality of electrodes 41a, 42a, 43a, 44a, 41b, 42 respectively on the outer surface of 2.
An electrode structure in which b, 43b, 44b are arranged in parallel may be used.

Further, in the above embodiment, each stage displacement mechanism 2 in the X and Y directions is used.
A two-stage displacement amount enlargement mechanism A in which 0, 24, 28, 32 are stacked in two layers and the displacement amounts of the two stage displacement mechanisms 20, 24, 28, 32 are sequentially added and transmitted to the stage 12 side. Although the case where B and B are provided has been described, a configuration in which a plurality of stages of stage displacement mechanisms each having three or more stages are laminated in two orthogonal directions may be adopted.

Further, the number of stacked stages of each stage displacement mechanism in the X direction and the number of stacked stages of each stage displacement mechanism in the Y direction may be changed.

Further, in the above-mentioned embodiment, a frame body having a substantially rectangular frame shape, which is laminated in four layers around the stage 12 at a predetermined distance from each other.
Bimorph type piezoelectric elements 18a, 18b, 21a, 21b in which 13, 14, 15, 16 are respectively arranged and are arranged in two stages in a state of being opposed to each other along the X direction of the stage 12 by the outer frame bodies 13, 14 And both ends of the bimorph type piezoelectric elements 25a, 25b, 29a.29b which are arranged in two stages by the inner frame bodies 15 and 16 in the state of being spaced apart and facing each other along the Y direction of the stage 12, respectively. Then, the displacement amount in the X direction by the two stages of bimorph type piezoelectric elements 18a, 18b, 21a, 21b along the X direction of the stage 12 and the two stages of bimorph type piezoelectric elements 25a, 25b, 29a along the Y direction of the stage 12. Although the displacement amount in the Y direction by 29b is transmitted to the stage 12 side in a continuously laminated state, it is shown in FIG. The frame bodies 51,52,53,54,55,56 each having a substantially rectangular frame shape laminated in six layers Both ends of the bimorph type piezoelectric elements 61a, 61b, 62a, 62b, 63a, 63b, which are arranged and arranged in three stages with the frames 52, 54, 56 spaced apart and facing each other along the X direction of the stage 12, respectively. Hold the stage 12 in the same way with the frames 51, 53, 55.
Of the bimorph type piezoelectric elements 71a, 71b, 72a, 72b, 73a, 73b arranged in three stages in a spaced-apart and opposed state along the Y direction of FIG. The amount of displacement in the Y direction by the piezoelectric elements 71a, 71b, 72a, 72b, 73a, 73b and the X by the bimorph type piezoelectric elements 61a, 61b, 62a, 62b, 63a, 63b of the stages along the X direction of the stage 12.
The displacement amount in the direction may be transmitted to the stage 12 side while being alternately stacked.

In this case, the shape of the frame bodies 51, 52, 53, 54, 55, 56 can be simplified as compared with the case of FIGS. 1 and 2, facilitating manufacture and positioning device main body 11 as a whole. Can be miniaturized. Therefore, the positioning device body 11
Since the overall weight can be reduced, the mechanical resonance frequency can be increased, and the stability of the entire positioning device body 11 can be increased. In addition, the positioning device body
11 Bimorph type piezoelectric elements 61a, 61 due to overall weight reduction
Since the load on b, 62a, 62b, 63a, 63b, 71a, 71b, 72a, 72b, 73a, 73b can be reduced, the load on the stage 12 can be increased.

Further, it goes without saying that various modifications can be made without departing from the scope of the present invention.

[Effects of the Invention] According to the present invention, the XY that intersects the driven body mounting stage at right angles
In a positioning device equipped with an X-direction micro-displacement mechanism and a Y-direction micro-displacement mechanism that perform micro-displacement in each of two directions, the actuators of the X-direction micro-displacement mechanism and the Y-direction micro-displacement mechanism are parallel to both sides of the stage, respectively. A rectangular frame-shaped support frame is formed by a plurality of bimorph type piezoelectric elements in the X and Y directions, which are spaced apart and opposed to each other, and is stacked in a plurality of stages on the same plane so as to surround the periphery of the stage. An X-direction actuator support frame in which an opening for mounting the actuator is formed at the central portion of a pair of frame walls in the direction of
And a Y-direction actuator support frame in which an opening for mounting the actuator is formed in the center of a pair of frame walls in the Y-direction, and the opening is formed at both ends of the opening for mounting the actuator in the X-direction actuator support frame. Both ends of the bimorph-type piezoelectric element of the X-direction actuator are fixed, and both ends of the bimorph-type piezoelectric element of the Y-direction actuator are fixed to both ends of the mounting opening of the actuator in the Y-direction actuator support frame, respectively. Outer X direction and Y
In the X direction and the Y direction connecting the central portion of the movable portion between the fixed portions of both ends of the bimorph type piezoelectric element and the both end sides of the opening for mounting the bimorph type piezoelectric element of the support frame in the inner stage. A displacement amount transmission arm is provided, and the displacement operation of the movable portion between the fixed portions at both ends of the bimorph type piezoelectric element at each stage in the X direction is sequentially applied via the X direction displacement amount transmission arm to increase the displacement amount. The X-direction displacement magnifying mechanism for transmitting to the stage side and the displacement operation of the movable portion between the fixed portions at both ends of the bimorph type piezoelectric element at each stage in the Y direction are sequentially added via the Y-direction displacement amount transmitting arm. Since the Y-direction displacement amount enlargement mechanism that transmits the displacement amount to the stage side while increasing the displacement amount is provided, a large displacement amount can be accurately adjusted when the stage is moved in each of the two XY directions orthogonal to each other. It is Rukoto, high mechanical strength, it is possible to stabilize the operation, and it is possible to compact the entire device.

[Brief description of drawings]

1 to 4 show an embodiment of the present invention.
1 is a plan view of the entire positioning device, FIG. 2 is a perspective view of the same, FIG. 3 is a plan view showing a mounting state of a bimorph type piezoelectric element, and FIG. 4 is a partially enlarged view of FIG. FIG. 5 is a plan view of an essential part shown in FIG. 5, FIG. 5 is a plan view of an essential part showing another embodiment,
FIG. 6 is a plan view of the entire positioning device showing still another embodiment. 12 …… Stage, 13,14,15,16,51,52,53,54,55,56 ……
Frame (supporting frame), 18a, 18b, 21a, 21b, 25a, 25b, 29a.
29b, 61a, 61b, 62a, 62b, 63a, 63b, 71a, 71b, 72a, 72b, 73a, 73
b ... Bimorph type piezoelectric element, 19a.19b, 23a, 23b, 27a, 27
b, 31a, 31b ... Protrusion (displacement transmission arm), 20 ... first stage displacement mechanism, 24 ... second stage displacement mechanism, 28 ... third stage displacement mechanism, 32 ... third 4 stage displacement mechanism, A, B ... Displacement amount expansion mechanism.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Masakazu Hayashi Inventor Masakazu Hayashi 8 Shinsita-cho, Isogo-ku, Yokohama-shi, Kanagawa Incorporated Research Institute of Industrial Technology, Toshiba Corporation (72) Junzo Uchida 336 Tatehara, Fuji-shi, Shizuoka Toshiba Corporation Fuji Factory (72) Inventor Fumihiko Ishida 8 Shinsita-cho, Isogo-ku, Yokohama-shi, Kanagawa Examiner, Yasuyoshi Oikawa, Corporate Engineering Research Laboratories, Toshiba Corporation

Claims (1)

[Claims] 1. A positioning device comprising an X-direction micro-displacement mechanism and a Y-direction micro-displacement mechanism for micro-displacement and positioning a stage for mounting a driven body in two directions of XY orthogonal to each other. And actuators of the Y-direction micro-displacement mechanism are formed by a plurality of bimorph-type piezoelectric elements in the X-direction and the Y-direction, which are arranged parallel to each other on both sides of the stage and are opposed to each other, and are in the same plane in a state of surrounding the periphery of the stage. A rectangular frame-shaped support frame stacked in a plurality of stages is provided on the X-direction actuator support frame in which an opening for mounting the actuator is formed at a central portion of a pair of X-direction frame walls, and a pair of Y-direction frame. It is formed by a Y-direction actuator support frame in which an opening for mounting the actuator is formed in the center of the wall. At both ends of the actuator mounting opening in the X-direction actuator support frame, and both ends of the bimorph type piezoelectric element of the X-direction actuator, and both ends of the actuator mounting opening in the Y-direction actuator support frame. Y in the section
Both ends of the bimorph type piezoelectric element of the directional actuator are fixed respectively, and further, the central portion of the movable part between the both end fixed portions of the bimorph type piezoelectric element in the outer stage in the X direction and the Y direction and the support frame of the inner stage. An X-direction and Y-direction displacement amount transmission arm that connects both ends of the opening for mounting the bimorph-type piezoelectric element is provided, and the movable portion between the both-end fixed portions of the bimorph-type piezoelectric element at each stage in the X-direction is provided. Displacement operation is sequentially applied via the X-direction displacement amount transmission arm to transmit the displacement amount to the stage side while enlarging the displacement amount and fixation of both ends of the bimorph type piezoelectric element at each stage in the Y direction. A Y-direction displacement amount enlarging mechanism that sequentially applies displacement movement of a movable part between the parts via the Y-direction displacement amount transmission arm to transmit the displacement amount to the stage side while enlarging the displacement amount. Positioning device characterized in that each is provided.