JPH0749150B2 - Substrate heating device - Google Patents
Substrate heating deviceInfo
- Publication number
- JPH0749150B2 JPH0749150B2 JP62114141A JP11414187A JPH0749150B2 JP H0749150 B2 JPH0749150 B2 JP H0749150B2 JP 62114141 A JP62114141 A JP 62114141A JP 11414187 A JP11414187 A JP 11414187A JP H0749150 B2 JPH0749150 B2 JP H0749150B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heating
- preheating
- furnace body
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Tunnel Furnaces (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、熱容量が部分的に異なる基板上の温度分布を
制御する加熱装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heating device for controlling a temperature distribution on a substrate having partially different heat capacities.
従来の技術 家電製品に代表される様に、プリント基板(以下「基
板」と略記する。)上への電子部品の高密度実装の技術
動向において、リフロー炉を用いた素子の半田付工法が
採用されつつある。ここでは、このリフロー炉による半
田付工法を例に、本加熱方法について説明する。Conventional technology In the technology trend of high-density mounting of electronic parts on a printed circuit board (hereinafter abbreviated as “board”) as represented by home appliances, the soldering method of elements using a reflow furnace is adopted. Is being done. Here, the heating method will be described by taking the soldering method using the reflow furnace as an example.
リフロー工法は、これまでの溶融ハンダ槽に素子の載っ
た基板をディップするフロー工法と異なり、半田の微細
粒子とペーストから成るクリーム状半田を基板の所定位
置に塗布した後に素子を置き、赤外線により加熱溶融さ
せて、半田付けするというものである。The reflow method is different from the conventional flow method in which the board on which the element is mounted is dipped in the molten solder bath, and the element is placed after applying cream solder consisting of fine solder particles and paste to the board at a predetermined position, and then infrared rays are applied. This is done by heating, melting and soldering.
一般的なリフロー炉を、第3図に示す。一定速度vで動
くコンベア1上で、素子を載せた基板2は、一定の熱量
を発生し続ける発熱体3により加熱される。炉の前半部
Aは予熱部で、通常150℃前後に基板2を暖める。次い
で後半部Bの加熱部で約250℃の温度を発生させ半田付
けを行い、その後ファン送風等で冷却して取出される。A general reflow furnace is shown in FIG. On the conveyor 1 which moves at a constant speed v, the substrate 2 on which the elements are mounted is heated by the heating element 3 which continues to generate a constant amount of heat. The first half A of the furnace is a preheating section, which normally heats the substrate 2 to around 150 ° C. Then, a temperature of about 250 ° C. is generated in the heating part of the latter half B to perform soldering, and then the product is cooled by fan blowing or the like and taken out.
発明が解決しようとする問題点 しかるに、従来の加熱炉においては、予熱部の炉長が長
大であり、実際の半田付けを行う加熱部の実質炉長に対
し、概ね5〜8倍を要している(基板上の代表点に熱電
対を付けて従来例の炉中の温度変化過程を実測した結果
を第4図に示す。)。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention However, in the conventional heating furnace, the furnace length of the preheating section is long, and it takes about 5 to 8 times the actual furnace length of the heating section for actual soldering. (A thermocouple is attached to a representative point on the substrate to measure the temperature change process in the conventional furnace, and the results are shown in FIG. 4.)
更に、基板の種類や大きさを変更すると、基板の温度上
昇特性が変化し、半田付け性に大きな差を生ずるため、
基板毎に炉の条件を変化させる必要がある。また一定空
間の炉の中を一枚ずつの基板を流す方式では、炉として
の与熱効率は極めて悪い。Furthermore, if the type or size of the board is changed, the temperature rise characteristics of the board will change, resulting in a large difference in solderability.
It is necessary to change the furnace conditions for each substrate. In addition, the heating efficiency of the furnace is extremely poor in a system in which one substrate is flown through the furnace in a fixed space.
本発明は上記問題点に鑑み、炉のスペースを大幅縮少し
て面積生産性を上げ、多種混合同時加熱を図り、基板の
与熱効率を大幅に向させることで、半田付効率の向上と
素子を含む基板の品質安定を実現する基板加熱装置を提
供するものである。In view of the above problems, the present invention significantly reduces the space of the furnace to increase the area productivity, simultaneously heats multiple types, and significantly improves the heating efficiency of the substrate, thereby improving the soldering efficiency and the element. The present invention provides a substrate heating device that realizes stable quality of a substrate including the substrate.
問題点を解決するための手段 上記問題点を解決するために、本発明の基板加熱装置
は、入口を有する予熱部と出口を有する加熱部とが部分
的に連通された炉本体と、予熱部に内蔵されて複数個の
基板を保持する予熱部基板保持装置と、加熱装置と加熱
部基板保持装置とをそれぞれ備えて前記加熱部を形成す
る複数個の加熱ブロックと炉本体に近接し、入口の略開
口方向に移動可能な基板搬入装置と、炉本体に近接し、
出口の略開口方向に配された基板取出装置と、前記炉本
体と前記基板取出装置に近接した基板搬送装置と、前記
予熱部と流体的に導通すると共に前記予熱部への流体移
送機構を有する予熱熱源と、前記予熱熱源と前記予熱部
とを流体的に連通せしめるダクトとを備えた構成を有し
ている。Means for Solving the Problems In order to solve the above problems, a substrate heating apparatus of the present invention is a furnace main body in which a preheating part having an inlet and a heating part having an outlet are partially communicated, and a preheating part. A preheating unit substrate holding device for holding a plurality of substrates which is built in the heating unit, a plurality of heating blocks each including a heating device and a heating unit substrate holding device to form the heating unit, and a furnace main body, and an inlet Substrate carry-in device that can move in the substantially opening direction of, and close to the furnace body,
It has a substrate unloading device arranged substantially in the opening direction of the outlet, a substrate transfer device in the vicinity of the furnace body and the substrate unloading device, and a fluid transfer mechanism to be in fluid communication with the preheating part and to the preheating part. It has a structure provided with a preheating heat source and a duct which fluidly connects the preheating heat source and the preheating section.
作 用 本発明は上記した様成によって、複数個の基板を省スペ
ースで同時に予熱するとともに、複数個の加熱ブロック
で基板の種類に応じた基板加熱を同時に行い、量産性の
大幅向上と熱容量の異なる異種の基板の同時加熱処理を
高効率高精度に行うものである。Operation The present invention, by virtue of the above-described configuration, simultaneously preheats a plurality of substrates in a space-saving manner, and simultaneously performs substrate heating according to the type of substrate by a plurality of heating blocks, thereby greatly improving mass productivity and improving heat capacity. Simultaneous heat treatment of different kinds of substrates is performed with high efficiency and accuracy.
実 施 例 以下本発明の一実施例について、図面を参照しながら説
明する。第1図は、本発明の実施例における基板加熱装
置を示すものであり、11は基板、12は基板チャック部12
aを有する基板搬入装置、13は炉本体、14は、炉本体の
予熱部にあり、基板11を複数個同時に保持する予熱部基
板保持装置、22は炉本体13の加熱部にあり、加熱装置15
と加熱部基板保持装置16とを有する加熱ブロック、17は
基板取出装置、18は基板搬送装置である。また、19は予
熱熱源、20は予熱熱源19と予熱部とを流体的に結合する
ダクトである。Example An example of the present invention will be described below with reference to the drawings. FIG. 1 shows a substrate heating apparatus according to an embodiment of the present invention, in which 11 is a substrate and 12 is a substrate chuck section 12.
A substrate loading device having a, 13 is a furnace body, 14 is a preheating part of the furnace body, a preheating part substrate holding device for holding a plurality of substrates 11 at the same time, 22 is a heating part of the furnace body 13, and a heating device 15
A heating block having a heating unit substrate holding device 16 and 17, a substrate take-out device, and a substrate transfer device 18. Further, 19 is a preheating heat source, and 20 is a duct which fluidly connects the preheating heat source 19 and the preheating section.
以上の様に構成された基板加熱装置について、以下にそ
の動作を詳しく説明する。第1図に示す通り、基板11
は、チャック部2aを有し自身が移動可能な基板搬入装置
12によって、炉本体13の入口21を通して予熱部に入れら
れる。予熱部に、予熱熱源19で発生した熱風を、送風機
能を有するダクト20を介して送入することにより、予熱
部基板搬送装置14にて一定時間、予熱部内に保持される
基板1の温度を上昇させる。The operation of the substrate heating apparatus configured as described above will be described in detail below. As shown in FIG. 1, the substrate 11
Is a substrate loading device having a chuck portion 2a and capable of moving itself.
By means of 12 it is introduced into the preheating part through the inlet 21 of the furnace body 13. By feeding hot air generated by the preheating source 19 into the preheating unit through the duct 20 having a blowing function, the temperature of the substrate 1 held in the preheating unit for a certain period of time by the preheating unit substrate transfer device 14 is maintained. To raise.
所定の時間、予熱部に帯留した基板11は、基板取出装置
17のA方向ストロークにより、炉本体13の加熱部に搬送
される。加熱部では、リフロー半田付けをはじめとす
る、本来の基板加熱が図られる。The substrate 11 retained in the preheating portion for a predetermined time is a substrate unloading device.
It is conveyed to the heating part of the furnace body 13 by the A-direction stroke of 17. In the heating part, original heating of the substrate including reflow soldering is achieved.
加熱部には赤外線ランプ等に代表される加熱装置15が上
下に配された加熱部ブロック22が設けられている。この
加熱ブロック22は、第1図の如く高さ方向、あるいは幅
方向に複数個設けられており、基板取出装置17のB方向
ストロークまたはC方向ストロークにより、基板11を高
さ方向または幅方向に移動させて任意の加熱ブロック22
にセットし、加熱せしめる。基板11を加熱する際加熱装
置15の加熱強度を種々に部分的に変えて設定しておくこ
とにより、各々の加熱ブロック22の熱特性が変化でき、
従って異種の熱容量を有する基板の加熱を同時に達成で
きる。The heating unit is provided with a heating unit block 22 in which a heating device 15 represented by an infrared lamp or the like is vertically arranged. A plurality of heating blocks 22 are provided in the height direction or the width direction as shown in FIG. 1, and the substrate 11 is moved in the height direction or the width direction by the B direction stroke or the C direction stroke of the substrate takeout device 17. Move any heating block 22
Set to and heat. When the substrate 11 is heated, the heating intensity of the heating device 15 is partially changed to various settings so that the thermal characteristics of each heating block 22 can be changed.
Therefore, heating of substrates having different heat capacities can be achieved simultaneously.
加熱部での加熱が終了した基板11は、同じく基板取出装
置17によって出口25を通して炉外へ出され、基板搬送装
置18により搬出される。The substrate 11 that has been heated in the heating section is similarly taken out of the furnace through the outlet 25 by the substrate take-out device 17 and taken out by the substrate carrying device 18.
以下、本発明の第2の実施例について、図面を参照しな
がら説明する。第2図は、炉本体13の加熱部における、
加熱ブロック22の構成を拡大して示したものであり、第
1の実施例と異なる点は、基板11と加熱装置15との間に
挿入されたマスク23を有する点である。Hereinafter, a second embodiment of the present invention will be described with reference to the drawings. FIG. 2 shows the heating section of the furnace body 13.
This is an enlarged view of the structure of the heating block 22. The difference from the first embodiment is that a mask 23 is inserted between the substrate 11 and the heating device 15.
マスク23には適当な位置に複数個の孔24を設けており、
加熱装置15で発生する輻射熱成分を、孔24の部分では完
全に基板11に伝熱せしめる一方、孔24の無い部分では削
減させ、基板11上の電子部品マウント等における局所的
熱容量の変化を見越した適正かつ効率的加熱を達成する
働きを有する。上記マスク23は、一般に金属板等に適当
な孔24を設ける方法が考えられる他、熱を反射させる目
的において、熱反射の光沢塗料を透明シート,耐熱ガラ
ス又はアクリル板等に印刷したものを用いても良い。The mask 23 is provided with a plurality of holes 24 at appropriate positions,
The radiant heat component generated in the heating device 15 is completely transferred to the substrate 11 in the hole 24 portion, while it is reduced in the portion without the hole 24, in consideration of the local heat capacity change in the electronic component mount on the substrate 11 etc. It has the function of achieving proper and efficient heating. As the mask 23, generally, a method of providing an appropriate hole 24 in a metal plate or the like can be considered, and for the purpose of reflecting heat, a transparent sheet, heat-resistant glass, an acrylic plate, or the like having a heat-reflecting glossy paint printed thereon is used. May be.
本発明において、基板搬入装置,加熱装置,予熱部また
は加熱部の基板保持装置,基板取出装置,基板搬送装
置,予熱熱源は各々の本来の機能を満足すれば、本実施
例に示す以外の構成、機構を持っても良い。また、予熱
部保持装置は必ずしも予熱中の移動を必要としない場合
は、その機能を削除しても良く、予熱効率を向上させる
ために、N2ガス等空気以外の流体を用いても良いことは
言うまでもない。In the present invention, the substrate loading device, the heating device, the substrate holding device of the preheating part or the heating part, the substrate unloading device, the substrate transfer device, and the preheating heat source have configurations other than those shown in this embodiment as long as they fulfill their original functions. , You may have a mechanism. Further, the preheating unit holding device may remove the function when it does not necessarily need to move during preheating, and may use a fluid other than air such as N 2 gas to improve preheating efficiency. Needless to say.
発明の効果 以上の様に本発明は、炉としての省スペース化に大きく
貢献することができると共に、熱容量の異なる多種類の
基板を短時間高精度にコントロールして加熱することが
でき、また従来に比較して予熱効率を大幅に向上させる
ことができる。EFFECTS OF THE INVENTION As described above, the present invention can greatly contribute to space saving as a furnace, and can heat various types of substrates with different heat capacities by controlling them with high precision for a short time. The preheating efficiency can be greatly improved as compared with.
第1図は本発明の第一の実施例における基板加熱装置の
斜視図、第2図は本発明の第二の実施例の斜視図、第3
図は従来例における基板加熱装置の断面図、第4図は従
来例の基板温度加熱特性の実測値曲線を示した図であ
る。 11……基板、12……基板搬入装置、13……炉本体、14…
…予熱部基板保持装置、15……加熱装置、16……加熱部
基板保持装置、17……基板取出装置、18……基板搬送装
置、19……予熱熱源、20……ダクト、21……入口、22…
…加熱ブロック、23……マスク、25……出口。1 is a perspective view of a substrate heating apparatus according to the first embodiment of the present invention, FIG. 2 is a perspective view of a second embodiment of the present invention, and FIG.
FIG. 4 is a cross-sectional view of the substrate heating apparatus in the conventional example, and FIG. 4 is a diagram showing an actually measured curve of substrate temperature heating characteristics in the conventional example. 11 …… Substrate, 12 …… Substrate loading device, 13 …… Furnace body, 14…
… Preheating part substrate holding device, 15 …… Heating device, 16 …… Heating part substrate holding device, 17 …… Substrate unloading device, 18 …… Substrate transfer device, 19 …… Preheating source, 20 …… Duct, 21 …… Entrance, 22 ...
… Heating block, 23 …… Mask, 25 …… Exit.
Claims (2)
とが部分的に連通された炉本体と、予熱部に内蔵されて
複数個の基板を保持する予熱部基板保持装置と、加熱装
置と加熱部基板保持装置とをそれぞれ備えて前記加熱部
を形成する複数個の加熱ブロックと、炉本体に近接し、
入口の略開口方向に移動可能な基板搬入装置と、炉本体
に近接し、出口の略開口方向に配された基板取出装置
と、前記炉本体と前記基板取出装置に近接した基板搬送
装置と、前記予熱部と流体的に導通すると共に前記予熱
部への流体移送機構を有する予熱熱源と、前記予熱源と
前記予熱部とを流体的に連通せしめるダクトとを備えた
ことを特徴とする基板加熱装置。1. A furnace body in which a preheating section having an inlet and a heating section having an outlet are partially communicated with each other, a preheating section substrate holding device which is built in the preheating section and holds a plurality of substrates, and a heating device. And a plurality of heating blocks that respectively include a heating unit substrate holding device to form the heating unit, and are close to the furnace body,
A substrate loading device that is movable in the substantially opening direction of the inlet, a substrate unloading device that is disposed near the furnace body and that is substantially in the opening direction of the outlet, and a substrate transfer device that is near the furnace body and the substrate unloading device. Substrate heating, comprising: a preheating source fluidly connected to the preheating unit and having a fluid transfer mechanism to the preheating unit; and a duct that fluidly connects the preheating source and the preheating unit. apparatus.
基板と略同一平行平面内に配されたマスクを有する特許
請求の範囲第1項記載の基板加熱装置。2. In the heating section, between the substrate and the heating device,
The substrate heating apparatus according to claim 1, further comprising a mask arranged in substantially the same plane as the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62114141A JPH0749150B2 (en) | 1987-05-11 | 1987-05-11 | Substrate heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62114141A JPH0749150B2 (en) | 1987-05-11 | 1987-05-11 | Substrate heating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63278667A JPS63278667A (en) | 1988-11-16 |
| JPH0749150B2 true JPH0749150B2 (en) | 1995-05-31 |
Family
ID=14630168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62114141A Expired - Fee Related JPH0749150B2 (en) | 1987-05-11 | 1987-05-11 | Substrate heating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0749150B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011208842A (en) * | 2010-03-29 | 2011-10-20 | Finesinter Co Ltd | Continuous sintering furnace |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2682085B2 (en) * | 1988-11-17 | 1997-11-26 | 松下電器産業株式会社 | Reflow soldering equipment |
| JP2777433B2 (en) * | 1989-11-17 | 1998-07-16 | 三洋電機株式会社 | Soldering method |
| JP5454935B2 (en) * | 2010-10-01 | 2014-03-26 | 株式会社日本製鋼所 | Continuous heat treatment furnace |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59174272A (en) * | 1983-03-23 | 1984-10-02 | Rohm Co Ltd | Reflow furnace |
-
1987
- 1987-05-11 JP JP62114141A patent/JPH0749150B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011208842A (en) * | 2010-03-29 | 2011-10-20 | Finesinter Co Ltd | Continuous sintering furnace |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63278667A (en) | 1988-11-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |