JPH0750062B2 - Sensor for measuring silicon concentration in molten metal − - Google Patents
Sensor for measuring silicon concentration in molten metal −Info
- Publication number
- JPH0750062B2 JPH0750062B2 JP62185140A JP18514087A JPH0750062B2 JP H0750062 B2 JPH0750062 B2 JP H0750062B2 JP 62185140 A JP62185140 A JP 62185140A JP 18514087 A JP18514087 A JP 18514087A JP H0750062 B2 JPH0750062 B2 JP H0750062B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon concentration
- sensor
- tube
- electrode
- potential difference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 71
- 239000002184 metal Substances 0.000 title claims description 71
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 61
- 229910052710 silicon Inorganic materials 0.000 title claims description 61
- 239000010703 silicon Substances 0.000 title claims description 61
- 239000007784 solid electrolyte Substances 0.000 claims description 35
- 238000005259 measurement Methods 0.000 claims description 28
- 239000004568 cement Substances 0.000 claims description 16
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910006501 ZrSiO Inorganic materials 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- -1 oxygen ions Chemical class 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000007772 electrode material Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000003723 Smelting Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000805 Pig iron Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000009628 steelmaking Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910006249 ZrSi Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Measuring Oxygen Concentration In Cells (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は,溶融金属中のシリコン濃度を迅速にかつ精度
よく測定することが可能なシリコン濃度測定用センサー
に関する。特に,本発明は,特開昭61-260156号公報に
記載された溶融金属中のシリコン濃度測定用センサーの
改良に関する。TECHNICAL FIELD The present invention relates to a sensor for measuring silicon concentration, which can measure the silicon concentration in a molten metal quickly and accurately. In particular, the present invention relates to an improvement of the sensor for measuring silicon concentration in molten metal described in JP-A-61-260156.
金属の溶融製錬においてその溶融金属中のシリコン濃度
を迅速に測定する必要がしばしばある。例えば,鉄鋼製
錬においては,溶融銑鉄(以下,溶銑と呼ぶ)中のシリ
コン濃度を迅速に測定することが必要な場合が多い。近
年,転炉前処理において,溶銑の脱燐および脱硫を行う
所謂溶銑予備処理が盛んに行われているが,この溶銑予
備処理においては,溶銑中のシリコン濃度によって反応
効率が大きく異なるので,処理剤の投入量を溶銑中のシ
リコン濃度に応じて変化させる必要があり,処理前およ
び/または処理中における溶銑中のシリコン濃度の把握
が不可欠となっている。従来,このシリコン濃度の検出
に当業界で広く採用されていた機器分析法は,溶銑サン
ブルの採取から分析結果を得るまでに長時間を要し,工
程時間に遅延を来す問題があった。In the melting and smelting of metals, it is often necessary to rapidly measure the concentration of silicon in the molten metal. For example, in iron and steel smelting, it is often necessary to quickly measure the silicon concentration in molten pig iron (hereinafter referred to as molten pig iron). In recent years, so-called hot metal pretreatment for dephosphorization and desulfurization of hot metal has been actively performed in the converter pretreatment. However, in this hot metal pretreatment, the reaction efficiency greatly varies depending on the silicon concentration in the hot metal. It is necessary to change the amount of the agent input according to the silicon concentration in the hot metal, and it is essential to understand the silicon concentration in the hot metal before and / or during the treatment. Conventionally, the instrumental analysis method widely used in the industry for detecting the silicon concentration has a problem that it takes a long time from the collection of the hot metal sample to the acquisition of the analysis result, which causes a delay in the process time.
この問題の解決として,特開昭61-260156号公報は,酸
素イオンを伝達し得る固体電解質からなる一端が耐火セ
メントによって固定され他端が閉管されたチューブと,
前記チューブ内に充填した測定温度において一定の酸素
ポテンシャルを与える基準極と,そして前記チューブの
外表面上に分布被覆したシリカを含む固体の副電極とか
らなるセンサーを,電位差測定装置と組み合わせた溶融
金属中のシリコン濃度測定装置および測定法を開示す
る。As a solution to this problem, Japanese Patent Laid-Open No. 61-260156 discloses a tube having a solid electrolyte capable of transmitting oxygen ions, one end of which is fixed by refractory cement and the other end of which is closed.
Melting in combination with a potentiometer with a sensor consisting of a reference electrode that gives a constant oxygen potential at the measured temperature filled in the tube, and a solid auxiliary electrode containing silica distributed and coated on the outer surface of the tube An apparatus and method for measuring silicon concentration in metal are disclosed.
前記特開昭61-260156号公報に記載の方法および装置に
よれば,対象とする溶融金属中のシリコン濃度が瞬間的
に測定可能である。しかし,短時間とはいえ,高温の溶
融金属中にセンサーを浸漬して電位差を測定するという
測定環境では,様々な外乱が発生し易く,そのため,溶
融金属と基準極との間の真の電位差を検知しにくい不都
合があった。例えば,溶銑中のシリコン濃度を測定する
場合,得られる電位差測定値には,溶銑と基準極との間
の真の電位差に,センサーを固定する耐火セメントの高
温下での反応に起因するガス発生および/または反応熱
の影響によるノイズが加わってハンチング現象が発生す
る不都合があった。また,固体電解質チューブの外表面
への副電極の分布被覆の態様によっては,副電極の本来
の役割であるところの,SiO2の活量が一定となる準化学
平衡帯域が形成されず,その結果,得られる電位差測定
値が溶融金属中のシリコン濃度との対応から離れて変動
する欠点があった。このような状況下で得られる電位差
測定値から求められるシリコン濃度は,真のシリコン濃
度との誤差が大きく,必要とされる測定精度が満たされ
ないことが多い。According to the method and apparatus described in JP-A-61-260156, the silicon concentration in the target molten metal can be instantaneously measured. However, even in a short time, various disturbances are likely to occur in the measurement environment in which the sensor is immersed in high temperature molten metal to measure the potential difference, and therefore the true potential difference between the molten metal and the reference electrode is generated. There was an inconvenience that it was difficult to detect. For example, when measuring the silicon concentration in the hot metal, the obtained potential difference measurement values include the true potential difference between the hot metal and the reference electrode, and the gas evolution due to the reaction of the refractory cement fixing the sensor at high temperature. And / or there is a disadvantage that a hunting phenomenon occurs due to noise added by the influence of reaction heat. In addition, depending on the manner of distribution coating of the sub-electrode on the outer surface of the solid electrolyte tube, the quasi-chemical equilibrium zone where the SiO 2 activity is constant, which is the original role of the sub-electrode, is not formed. As a result, there was a drawback that the measured potential difference value fluctuated away from the correspondence with the silicon concentration in the molten metal. The silicon concentration obtained from the potential difference measurement value obtained under such a condition has a large error from the true silicon concentration, and thus the required measurement accuracy is often not satisfied.
また,SiO2を含む副電極が適切な材料で構成されないと
溶銑中に浸漬した場合にこれが剥離脱落することもあ
る。In addition, if the sub-electrode containing SiO 2 is not composed of an appropriate material, it may peel off when immersed in hot metal.
本発明は,このような問題を解決しようとするもので,
溶融金属中のシリコン濃度を迅速にかつ精度よく測定す
ることが可能なシリコン濃度測定用センサーの提供を目
的とする。The present invention is intended to solve such problems,
An object of the present invention is to provide a silicon concentration measuring sensor capable of measuring the silicon concentration in molten metal quickly and accurately.
本発明は,原理的には,溶融金属の母相がいかなる金属
であれ,シリコン濃度の測定に適用できるが,特に,鉄
鋼製錬において溶銑中のシリコンの迅速測定のニーズが
高く,本発明を適用することにより,多大の効果が期待
される。そこで,以下の記載では,溶銑中のシリコン濃
度の測定を例にとり,本発明を説明する。In principle, the present invention can be applied to the measurement of the silicon concentration regardless of the metal phase of the molten metal. However, the need for rapid measurement of silicon in the hot metal in steel smelting is particularly high, and the present invention By applying it, a great effect is expected. Therefore, in the following description, the present invention will be described by taking the measurement of the silicon concentration in the hot metal as an example.
本発明者らは,前記特開昭61-260156号公報に記載の型
のシリコンセンサーを用いて溶銑中のシリコン濃度の測
定を数多く実施してきたが,前述の基準極と溶銑との間
の電位差にハンチングが生ずる原因は,センサーを固定
している(センサーは,固体電解質チューブの一端を固
定することにより固定される)耐火セメントが高温の溶
銑中で反応して生じたガスおよび反応熱にあると判断さ
れた。そして,この望ましくない電位差のハンチング現
象を回避するためには,基準極を,耐火セメントによる
固定端から10mm以上,好ましくは15mm以上離して固体電
解質チューブ内に充填することが肝要であることがわか
った。耐火セメントによる固定端と基準極との間の距離
が10mmよりも実質的に短いと,電位差測定値のバラツキ
が顕著に生ずる。The inventors of the present invention have conducted many measurements of the silicon concentration in the hot metal using the silicon sensor of the type described in JP-A-61-260156, but the potential difference between the reference electrode and the hot metal described above has been measured. The cause of hunting occurs in the gas and reaction heat generated by the reaction of the refractory cement that fixes the sensor (the sensor is fixed by fixing one end of the solid electrolyte tube) in the hot metal. Was judged. Then, in order to avoid the hunting phenomenon of the undesired potential difference, it was found that it is important to fill the solid electrolyte tube with the reference electrode at a distance of 10 mm or more, preferably 15 mm or more from the fixed end made of refractory cement. It was If the distance between the fixed end of the refractory cement and the reference electrode is substantially shorter than 10 mm, the difference in the measured potential difference will be significant.
前記特開昭61-260156号公報に記載の型のシリコンセン
サーを,シリコンを含む溶銑中に浸漬すると,同公開公
報に記載の如く,副電極の極く近傍の溶銑中には,Si+O
2=SiO2で一般に表される化学平衡が形成され,その化
学平衡が形成成される帯域がSiO2を含む固体の副電極に
接触していることから,同帯域におけるSiO2の活量は一
定である。かようなSiO2の活量が一定である溶銑帯域を
特開昭61-260156号公報では,準化学平衡帯域と呼んで
いる。溶銑と,固体電解質を介して溶銑に接触する基準
極との間の電位差の測定値が溶銑中のシリコン濃度によ
く対応するためには,SiO2の活量が一定となる前記の準
化学平衡帯域が安定に形成されねばならない。本発明者
らによれば,この目的のためには,副電極の合計周囲長
を大きくすることが有効であることがわかった。具体的
には,副電極の周囲長の合計と固体電解質の有効外表面
積との比を1.0以上とすれば,電位差が短時間で平衡値
に達し,しかも,得られた測定値が溶銑中のシリコン濃
度と精度よく対応することがわかった。When the silicon sensor of the type described in JP-A-61-260156 is dipped in hot metal containing silicon, Si + O is contained in the hot metal in the immediate vicinity of the sub-electrode as described in the publication.
2 = chemical equilibrium generally represented by SiO 2 is formed, since the band that chemical equilibrium is achieved formation is in contact with the secondary electrode of the solid containing SiO 2, activity of the SiO 2 in the same band It is constant. Such a hot metal zone in which the activity of SiO 2 is constant is called a quasi-chemical equilibrium zone in JP-A-61-260156. In order for the measured value of the potential difference between the hot metal and the reference electrode in contact with the hot metal via the solid electrolyte to correspond well to the silicon concentration in the hot metal, the above-mentioned quasi-chemical equilibrium at which the SiO 2 activity is constant is established. The band must be formed stably. According to the present inventors, it has been found effective to increase the total perimeter of the auxiliary electrode for this purpose. Specifically, if the ratio of the total peripheral length of the sub-electrode to the effective outer surface area of the solid electrolyte is 1.0 or more, the potential difference reaches the equilibrium value in a short time, and the obtained measurement value is It was found that it corresponds to the silicon concentration with high accuracy.
かくして,本発明による溶融金属中のシリコン濃度測定
用センサーは,酸素イオンを伝達し得る固体電解質から
なる一端が耐火セメントによって固定され他端が閉管さ
れたチューブと,前記チューブ内に充填した測定温度に
おいて一定の酸素ポテンシャルを与える基準極と,そし
て前記チューブの外表面上に分布被覆したシリカを含む
固体の副電極とからなる溶融金属中のシリコン濃度測定
用センサーにおいて,前記基準極を前記チューブの固定
端から10mm以上離して前記チューブの閉管端側に充填
し,かつ前記副電極の周囲長の合計と前記固体電解質の
有効外表面積との比を1.0以上としたことを特徴とす
る。Thus, the sensor for measuring silicon concentration in molten metal according to the present invention comprises a tube made of solid electrolyte capable of transmitting oxygen ions, one end of which is fixed by refractory cement and the other end of which is closed, and a measurement temperature filled in the tube. In a sensor for measuring silicon concentration in molten metal, which comprises a reference electrode which gives a constant oxygen potential in the tube, and a solid auxiliary electrode containing silica distributed and coated on the outer surface of the tube, It is characterized in that the tube is filled in the closed end side of the tube at a distance of 10 mm or more from the fixed end, and the ratio of the total peripheral length of the auxiliary electrode to the effective outer surface area of the solid electrolyte is 1.0 or more.
ここで,SiO2を含む副電極の材料としては,その組成が
ZrSiO4:10〜90重量%,Na2O:1〜8重量%,残部がZrO2
および不可避的不純物からなるものが好ましい。この材
料によると高温の溶銑中においても外チューブとの密着
性が良好に保たれて剥離や脱落が防止できると共に得ら
れる電位差測定値は溶銑中のシリコン濃度と精度良く対
応させることができる。Here, as the material of the sub-electrode containing SiO 2 , its composition is
ZrSiO 4 : 10 to 90% by weight, Na 2 O: 1 to 8% by weight, balance ZrO 2
And unavoidable impurities are preferred. According to this material, the adhesiveness to the outer tube is kept good even in hot metal at high temperature, peeling and dropping can be prevented, and the obtained potential difference measurement value can correspond to the silicon concentration in hot metal with high accuracy.
以下,添付図面を参照にしながら,本発明によるシリコ
ン濃度測定用センサーを具体的に説明する。Hereinafter, the silicon concentration measuring sensor according to the present invention will be described in detail with reference to the accompanying drawings.
第1図は,センサー本体と,その周辺の主要付属部材を
示す縦断面図であり,参照数字1は副電極,2は固体電解
質からなるチューブ,3は基準極,4は固体電解質チューブ
内に充填された基準極をシールするためのシール部材,5
は溶融金属側の電極(モリブデン金属からなる),そし
て6は熱電対を表す。溶融金属中のシリコン濃度を知る
ための電位差は,基準極からのリード線7と溶融金属側
の電極からのリード線8との間に電位差計をセットし,
計測する。センサー,熱電対および溶融金属側の電極
は,耐火セメント9によって固定されており,その回り
をさらにハウジング10および耐火筒11で固定保護してい
る。FIG. 1 is a vertical cross-sectional view showing the main body of the sensor and its surrounding main attachments. Reference numeral 1 is a sub-electrode, 2 is a tube made of solid electrolyte, 3 is a reference electrode, and 4 is a solid electrolyte tube. Sealing member for sealing the filled reference electrode, 5
Is an electrode (made of molybdenum metal) on the molten metal side, and 6 is a thermocouple. For the potential difference for knowing the silicon concentration in the molten metal, set a potentiometer between the lead wire 7 from the reference electrode and the lead wire 8 from the electrode on the molten metal side.
measure. The sensor, thermocouple, and electrodes on the molten metal side are fixed by refractory cement 9, and the surroundings are further fixed and protected by a housing 10 and a fireproof cylinder 11.
以下,溶融金属が溶銑である場合を例にとり説明する。
副電極1は,溶銑中にSiO2の活量が一定である局部的な
準化学平衡帯域を形成するための部材であって,SiO2ま
たはこれを含む固体酸化物からなる。なお,本明細書で
いう固体とは,測定温度において固体であるという意味
である。好ましい副電極材は,ZrSiO4の粉体とSiO2の粉
体とを混合しそして焼成して得られるZrSiO4とSiO2との
二相混合物である。さらに好ましい副電極材は,ZrSi
O4:10〜90重量%,Na2O:1〜8重量%,残部がZrO2およ
び不可避的不純物からなる焼成材である。Hereinafter, the case where the molten metal is hot metal will be described as an example.
The sub-electrode 1 is a member for forming a local quasi-chemical equilibrium zone in which the activity of SiO 2 is constant in the hot metal, and is made of SiO 2 or a solid oxide containing this. The term "solid" as used in this specification means that it is a solid at the measurement temperature. A preferred auxiliary electrode material is a two-phase mixture of ZrSiO 4 and SiO 2 obtained by mixing ZrSiO 4 powder and SiO 2 powder and firing. A more preferable auxiliary electrode material is ZrSi
O 4: 10 to 90 wt%, Na 2 O: 1 to 8 wt%, a sintered material balance being ZrO 2 and inevitable impurities.
酸素イオンを伝達し得る固体電解質2を構成する材料お
よび測定温度において一定の酸素ポテンシャルを与える
基準極3を構成する材料としては従来の酸素センサーに
おいて使用されていた材料を使用できる。好ましい固体
電解質材としては,少なくとも部分的に安定化された二
酸化ジルコニゥムがある。安定化剤としてはNgOやCaOが
知られている。最も好ましい固体電解質材は,約7〜9
モル%のMgOで部分的に安定化した二酸化ジルコニゥム
である。また,適切な基準極材としてはMo粉末とMoO2粉
末との混合体およびCr粉末とCr2O3粉末との混合体があ
る。As the material forming the solid electrolyte 2 capable of transmitting oxygen ions and the material forming the reference electrode 3 that gives a constant oxygen potential at the measurement temperature, the materials used in the conventional oxygen sensor can be used. A preferred solid electrolyte material is at least partially stabilized zirconium dioxide. NgO and CaO are known as stabilizers. The most preferred solid electrolyte material is about 7-9
Zirconium dioxide partially stabilized with mol% MgO. Suitable reference electrode materials include a mixture of Mo powder and MoO 2 powder and a mixture of Cr powder and Cr 2 O 3 powder.
準化学平衡帯域においては,溶銑側の電極5と基準極3
との間の酸素ポテンシャルの差により生ずる電位差が,
溶銑中のシリコン濃度に対応するわけであるから,この
電位差を正確に検出することがシリコン濃度を精度よく
測定することにつながる。本発明者らは,第2図に示
す,耐火セメントによる固体電解質チューブの固定端
(耐火セメントの最低レベル)と固体電解質チューブ内
への基準極の充填領域(充填された基準極の最高レベ
ル)との間の間隔(Dmm)だけをいろいろに変えたセン
サーを多数試作し,電位差測定に供した。結果を第3図
に示す。同図の比較例からわかるように,固体電解質チ
ューブ内への基準極の充填領域と耐火セメントによる固
体電解質チューブの固定端との距離Dが10mmよりも実質
的に小さいとハンチング現象が顕著に現われ,正確な電
位差測定が困難になる。これに対し,第3図の本発明例
からわかるように,固定端からの基準極の距離Dを大き
くとるにつれ,ハンチング現象は著しく減少し,D≧10mm
では,ハンチングは殆ど認められなかった。溶銑中のシ
リコン濃度の測定精度に関しては,D=10mmで充分満足で
きる精度レベルが得られたが,D≧15mmとすれば一層測定
精度を向上することができる。In the quasi-chemical equilibrium band, the hot metal electrode 5 and the reference electrode 3
The potential difference caused by the difference in oxygen potential between
Since it corresponds to the silicon concentration in the hot metal, accurate detection of this potential difference leads to accurate measurement of the silicon concentration. The present inventors have shown in FIG. 2 that the fixed end of the solid electrolyte tube made of refractory cement (minimum level of refractory cement) and the filling area of the reference electrode in the solid electrolyte tube (highest level of filled reference electrode). We made a number of prototypes of sensors with different distances (Dmm) between and, and used them for potentiometric measurements. Results are shown in FIG. As can be seen from the comparative example in the figure, when the distance D between the filling area of the reference electrode in the solid electrolyte tube and the fixed end of the solid electrolyte tube made of refractory cement is substantially smaller than 10 mm, the hunting phenomenon appears prominently. , It becomes difficult to measure the potential difference accurately. On the other hand, as can be seen from the example of the present invention in FIG. 3, as the distance D of the reference pole from the fixed end is increased, the hunting phenomenon is significantly reduced and D ≧ 10 mm.
Then, hunting was hardly recognized. Regarding the measurement accuracy of the silicon concentration in the hot metal, a satisfactory level of accuracy was obtained at D = 10 mm, but if D ≧ 15 mm, the measurement accuracy can be further improved.
固体電解質チューブ2の外表面に分布比覆する副電極1
について,第4図および第5図を参照しながら説明す
る。第4図および第5図は,副電極1を固体電解質チュ
ーブ2の外表面上に斑点状に分布被覆した例を示す。副
電極1の被覆形態は,副電極1の周囲に形成される準化
学平衡帯域に固体電解質チューブ2の外表面を有利に存
在させることができる限り,斑点状に限らず,横縞状,
縦縞状,格子状またはその他の形態であることができ
る。副電極1は,固体電解質チューブ2内に充填される
基準極3の最高レベルに対応するレベルまで,固体電解
質チューブ2の外表面に分布被覆されるのが普通であ
る。Sub-electrode 1 covering the outer surface of the solid electrolyte tube 2 with a distribution ratio
This will be described with reference to FIGS. 4 and 5. 4 and 5 show an example in which the sub-electrode 1 is distributed and coated on the outer surface of the solid electrolyte tube 2 in spots. The coating form of the sub-electrode 1 is not limited to spots, but horizontal stripes as long as the outer surface of the solid electrolyte tube 2 can be advantageously present in the quasi-chemical equilibrium zone formed around the sub-electrode 1.
It can be vertical stripes, grids or other forms. The sub-electrode 1 is usually distributedly coated on the outer surface of the solid electrolyte tube 2 to a level corresponding to the maximum level of the reference electrode 3 filled in the solid electrolyte tube 2.
副電極の分布被覆の態様を表す指標として,周長比なる
パラメーターを導入する。周長比とは,副電極の周囲長
の合計(mm)と固体電解質の有効外表面積(mm2)との
比(mm-1)をいい,固体電解質の有効外表面積とは,副
電極が被覆されたレベルよりも下方の,すなわち基準極
が充填された領域の固体電解質チューブの外表面積(副
電極がしめる面積を除く)を言う。この周長比は,第4
図のように,固体電解質の外表面を小面積の多数の副電
極で覆ったセンサーでは大きく,そして第5図のよう
に,固体電解質の外表面を大面積の少数の副電極で覆っ
たセンサーでは小さい。第6図に周長比だけをいろいろ
に変えたセンサーによる電位差波形の安定性および代表
的な電位差波形を示す。同図によれば,周長比を本発明
に従って1.0(mm-1)以上とするなら,電位差波形は短
時間に平衡値に達し,それ以降は非常に安定しているこ
とがわかる。一方,周長比が1.0に満たない比較例で
は,電位差は平衡値に達しにくく,長時間の測定によっ
ても検出値は正確性に欠けることがわかる。A parameter, which is the circumference ratio, is introduced as an index showing the mode of distributed coating of the sub-electrode. The circumference ratio is the ratio (mm -1 ) of the total perimeter (mm) of the sub-electrode to the effective external surface area (mm 2 ) of the solid electrolyte. The effective external surface area of the solid electrolyte is It is the outer surface area (excluding the area occupied by the sub-electrode) of the solid electrolyte tube below the coated level, that is, in the area filled with the reference electrode. This circumference ratio is
As shown in the figure, the sensor in which the outer surface of the solid electrolyte is covered with a large number of small-sized sub-electrodes is large, and as shown in Fig. 5, the sensor in which the outer surface of the solid electrolyte is covered with a small number of large-sized sub-electrodes. Then it's small. FIG. 6 shows the stability of the potential difference waveform and a typical potential difference waveform by the sensor in which only the circumference ratio is variously changed. According to the figure, when the circumference ratio is set to 1.0 (mm −1 ) or more according to the present invention, the potential difference waveform reaches the equilibrium value in a short time and is very stable thereafter. On the other hand, in the comparative example in which the circumference ratio is less than 1.0, the potential difference hardly reaches the equilibrium value, and it can be seen that the detected value lacks accuracy even after long-time measurement.
第7図は,第6図のNo.1〜3の本発明例のセンサーおよ
び第6図のNo.4〜7の比較例のセンサーにより検出した
電位差(EMF)と溶銑中のシリコン濃度との相関を示
す。同図によれば,周長比を1.0に満たない比較例のセ
ンサーでは電位差と周長比濃度との相関は弱いが,周長
比を1.0以上とした本発明例のセンサーでは電位差測定
値が溶銑のシリコン濃度に精度よく対応することがわか
る。FIG. 7 shows the potential difference (EMF) and the silicon concentration in the hot metal detected by the sensors of the invention examples No. 1 to 3 of FIG. 6 and the sensors of the comparative examples No. 4 to 7 of FIG. Show correlation. According to the figure, in the sensor of the comparative example whose circumference ratio is less than 1.0, the correlation between the potential difference and the circumference ratio concentration is weak, but in the sensor of the example of the present invention in which the circumference ratio is 1.0 or more, the measured potential difference is It can be seen that it accurately corresponds to the silicon concentration of the hot metal.
例1 MgOを9モル%含有する部分安定化された二酸化ジルコ
ニゥムからなる固体電解質の,外径4.5mm,内径3.0mm,長
さ30mmの一端閉管チューブの外表面に,副電極として,
重量比で3:2に混合したZrSiO4粉末とZrO2粉末とを水で
よく練ったものを斑点状(直径約1mm,周長比1.1mm-1)
に塗布し,100℃で乾燥し,そして1400℃の温度で約10時
間焼成した。次いで,その固体電解質チューブの内部
に,基準極として,重量比で4:1に混合したMo粉末とMoO
2粉末との混合物をチューブ固定端から15mmの間隔とな
るように充填し,リード線として0.8mmのMo線を挿入
し,Al2O3セメントでシール固定した。このようにして
作成したセンサーを熱電対およびMoからなる溶銑側の電
極とともに耐火セメントで固定し,さらに耐火筒で保護
した。Example 1 A solid electrolyte consisting of partially stabilized zirconium dioxide containing 9 mol% of MgO was used as a sub-electrode on the outer surface of a closed tube with an outer diameter of 4.5 mm, an inner diameter of 3.0 mm and a length of 30 mm.
A mixture of ZrSiO 4 powder and ZrO 2 powder mixed in a weight ratio of 3: 2, well kneaded with water, and spotted (diameter about 1 mm, circumference ratio 1.1 mm -1 ).
The composition was applied to a substrate, dried at 100 ° C, and baked at a temperature of 1400 ° C for about 10 hours. Then, inside the solid electrolyte tube, Mo powder and MoO mixed at a weight ratio of 4: 1 were used as reference electrodes.
The mixture with the two powders was filled at a distance of 15 mm from the fixed end of the tube, 0.8 mm Mo wire was inserted as a lead wire, and sealed and fixed with Al 2 O 3 cement. The sensor thus prepared was fixed with refractory cement together with the thermocouple and the electrode on the hot metal side made of Mo, and was further protected by a refractory tube.
このようにして作成したアセンブリーをC濃度が4.3重
量%である1380℃の溶銑中に約40秒浸漬し,電位差を計
測するとともに,溶銑のサンプルを採取して機器分析に
より溶銑中のシリコン濃度を分析した。The assembly thus created is immersed in hot metal at 1380 ° C with a C concentration of 4.3% by weight for about 40 seconds, the potential difference is measured, and a sample of the hot metal is taken to determine the silicon concentration in the hot metal by instrumental analysis. analyzed.
得られた電位差とシリコン濃度との関係を第8図に示
す。同図は,本実施例のセンサーを用いた場合,電位差
がシリコン濃度の変化に敏感に対応しており,溶銑中の
シリコン濃度と電位差との間の相関が非常に強いことを
示している。シリコン濃度の測定誤差は,0.02%以内に
とどまり,このレベルは,製鉄現場でのシリコン濃度の
迅速測定において要求される測定精度を充分に満たすも
のである。The relationship between the obtained potential difference and the silicon concentration is shown in FIG. This figure shows that when the sensor of this example is used, the potential difference sensitively corresponds to the change in the silicon concentration, and the correlation between the silicon concentration in the hot metal and the potential difference is very strong. The measurement error of the silicon concentration remains within 0.02%, and this level sufficiently satisfies the measurement accuracy required for the rapid measurement of the silicon concentration at the steelmaking site.
例2 副電極材として第1表に示す各組成のものを使用した以
外は,例1を繰り返した。各副電極材からなるセンサー
を溶銑に浸漬したときに,副電極の斑点部分の一部でも
剥離したものと全く剥離しなかったものを調べ,その結
果を第1表に併記した。また,第9図に各センサーによ
って得られた電位差とシリコン濃度との関係を示した。Example 2 Example 1 was repeated except that each of the compositions shown in Table 1 was used as the auxiliary electrode material. When a sensor made of each sub-electrode material was immersed in hot metal, some spots of the sub-electrode were peeled off and those were not peeled off at all, and the results are also shown in Table 1. Also, FIG. 9 shows the relationship between the potential difference obtained by each sensor and the silicon concentration.
第1表の結果から,副電極材として,ZrSiO4が10〜90重
量%でNa2Oが1〜8重量%の組成のものを使用した場合
には,副電極の剥離は全く生じなかったことがわかる。
これに対し,副電極中のZrSiO4が10重量%未満或いは90
重量%を超える場合,または副電極中のNa2Oが1重量%
未満或いは8重量%を超える場合には剥離が生じてい
る。 From the results shown in Table 1, when a ZrSiO 4 composition of 10 to 90% by weight and Na 2 O composition of 1 to 8% by weight was used as the auxiliary electrode material, peeling of the auxiliary electrode did not occur at all. I understand.
On the other hand, ZrSiO 4 in the auxiliary electrode is less than 10% by weight or 90% by weight.
If it exceeds 1% by weight, or Na 2 O in the auxiliary electrode is 1% by weight
If the amount is less than 8% or more than 8% by weight, peeling occurs.
また,第9図より,副電極の剥離を生じた比較例のセン
サーでは電位差と溶銑中のシリコン濃度との相関は弱い
が,剥離の全く生じなかったセンサーでは電位差測定値
が溶銑中のシリコン濃度に精度よく対応していることが
わかる。Further, from FIG. 9, the correlation between the potential difference and the silicon concentration in the hot metal is weak in the sensor of the comparative example in which peeling of the sub-electrode occurred, but in the sensor in which peeling did not occur at all, the measured potential difference was the silicon concentration in the hot metal. It can be seen that it corresponds to.
例3 MgOを9モル%含有する部分安定化されたZrO2からなる
固体電解質チューブ(外径4.5mm,内径3.0mm,長さ30mm)
の外表面に,ZrSiO4:50重量%,Na2O:5重量%,ZrO2:45
重量%からなる混合粉末を水でよく練ったうえ,これを
斑点状(直径約1mm,周長比1.0mm-1)に塗布し,100℃で
乾燥し,そして1400℃の温度で約10時間焼成して副電極
を形成させた。。次いで,その固体電解質チューブの内
部に,基準極として,重量比で4:1に混合したMo粉末とM
oO2粉末との混合物をチューブ固定端から15mmの間隔と
なるように充填し,リード線として0.8mmのMo線を挿入
し,Al2O3セメントでシール固定した。このようにして
作成したセンサーを熱電対およびMoからなる溶銑側の電
極とともに耐火セメントで固定し,さらに耐火筒で保護
した。Example 3 Solid electrolyte tube made of partially stabilized ZrO 2 containing 9 mol% MgO (outer diameter 4.5 mm, inner diameter 3.0 mm, length 30 mm)
On the outer surface of ZrSiO 4 : 50 wt%, Na 2 O: 5 wt%, ZrO 2 : 45
After mixing the mixed powder consisting of wt% well with water, apply it in spots (diameter about 1mm, circumference ratio 1.0mm -1 ), dry at 100 ℃, and at temperature of 1400 ℃ for about 10 hours. It was fired to form a sub electrode. . Then, inside the solid electrolyte tube, Mo powder and M mixed in a weight ratio of 4: 1 were used as a reference electrode.
A mixture with oO 2 powder was filled at a distance of 15 mm from the fixed end of the tube, a 0.8 mm Mo wire was inserted as a lead wire, and sealed and fixed with Al 2 O 3 cement. The sensor thus prepared was fixed with refractory cement together with the thermocouple and the electrode on the hot metal side made of Mo, and was further protected by a refractory tube.
このようにして作成したアンセンブリーをC濃度が4.2
重量%である1400℃の溶銑中に約30秒浸漬し,電位差を
計測するとともに,溶銑のサンプルを採取して機器分析
により溶銑中のシリコン濃度を分析した。The C concentration of the assembly thus created is 4.2
The sample was dipped in hot metal at 1400 ℃ for 30 seconds, and the potential difference was measured, and a sample of hot metal was sampled to analyze the silicon concentration in the hot metal by instrumental analysis.
得られた電位差とシリコン濃度との関係を第10図に示し
た。第10図の結果から,本例のセンサーを用いた場合,
電位差がシリコン濃度の変化に敏感に対応しており,溶
銑中のシリコン濃度と電位差との間の相関が非常に強く
あらわれ,シリコン濃度の測定誤差は極めて小さいこと
がわかる。The relationship between the obtained potential difference and the silicon concentration is shown in FIG. From the results of FIG. 10, when the sensor of this example is used,
The potential difference sensitively responds to changes in the silicon concentration, and the correlation between the silicon concentration in the hot metal and the potential difference appears very strongly, indicating that the measurement error of the silicon concentration is extremely small.
本発明によるシリコン濃度測定用センサーを用いて溶融
金属中のシリコン濃度を測定すると,シリコン濃度を導
き出すための電位差は短時間に安定した平衡値が得ら
れ,その電位差測定値より求めた溶融金属中のシリコン
濃度は極めて精度のよいものとなる。また,適切な副電
極組成に調整すると高温の溶銑中に浸漬した場合にも副
電極が固体電解質表面から剥離脱落することもなく高精
度の測定が可能となる。かくして,電位差測定時に生ず
ることがあるハンチング現象や,平衡値の得られない不
安定波形といった不良発生を防止でき安定した測定がで
き,その結果導き出される溶融金属中のシリコン濃度は
極めて信頼性が高く,製鉄現場で要求される測定精度を
充分に満足する。When the silicon concentration in the molten metal is measured using the silicon concentration measuring sensor according to the present invention, a stable equilibrium value is obtained for the potential difference for deriving the silicon concentration in the molten metal in the short time, and the potential difference in the molten metal obtained from the measured potential difference is obtained. The silicon concentration is extremely accurate. In addition, if the composition of the sub-electrode is adjusted to an appropriate value, high-precision measurement is possible without the sub-electrode peeling off from the surface of the solid electrolyte even when immersed in high temperature hot metal. Thus, it is possible to prevent hunting phenomenon that may occur at the time of measuring the potential difference and the occurrence of defects such as an unstable waveform in which the equilibrium value cannot be obtained, and to perform stable measurement. ∙ Satisfy the measurement accuracy required at steelmaking sites.
第1図は本発明によるセンサーとその周辺の主要付属部
材の縦断面図,第2図は本発明によるセンサーの縦断面
図,第3図は本発明例および比較例のセンサーによる電
位差波形図,第4図は本発明例のセンサーにおける副電
極の被覆形態の一例を示す斜視図,第5図は比較例のセ
ンサーにおける副電極の被覆形態の一例を示す斜視図,
第6図は本発明例および比較例のセンサーの周長比と電
位差波形との関係図,第7図は本発明例および比較例の
センサーによる電位差測定値とシリコン濃度との相関の
強弱を示すグラフ,第8図は本発明実施例記載のセンサ
ーによる電位差測定値とシリコン濃度との相関を示すグ
ラフ,第9図は本発明の他の例および比較例のセンサー
による電位差測定値とシリコン濃度との相関の強弱を示
すグラフ,第10図は本発明の他の例および比較例のセン
サーによる電位差測定値とシリコン濃度との相関を示す
グラフである。 1……副電極,2……固体電解質,3……基準極,4……シー
ル部材,5……溶融金属側の電極,6……熱電対,7……基準
極のリード線,8……溶融金属側の電極のリード線,9……
耐火セメント,10……ハウジング,11……耐火筒.FIG. 1 is a longitudinal sectional view of a sensor according to the present invention and a main attachment member around the sensor, FIG. 2 is a longitudinal sectional view of a sensor according to the present invention, and FIG. 3 is a potential difference waveform diagram by the sensors of the present invention example and a comparative example. FIG. 4 is a perspective view showing an example of the covering form of the sub-electrode in the sensor of the present invention, and FIG. 5 is a perspective view showing an example of the covering form of the sub-electrode in the sensor of the comparative example.
FIG. 6 is a diagram showing the relationship between the circumferential length ratio and the potential difference waveform of the sensors of the present invention and comparative examples, and FIG. 7 shows the strength of the correlation between the measured potential difference and the silicon concentration by the sensors of the present invention and comparative examples. FIG. 8 is a graph showing the correlation between the potential difference measurement value by the sensor described in the embodiment of the present invention and the silicon concentration, and FIG. 9 is the potential difference measurement value by the sensor of another example of the present invention and the silicon concentration. FIG. 10 is a graph showing the strength of the correlation of the above, and FIG. 10 is a graph showing the correlation between the measured value of the potential difference by the sensors of other examples of the present invention and the comparative example and the silicon concentration. 1 ... Sub-electrode, 2 ... Solid electrolyte, 3 ... Reference electrode, 4 ... Seal member, 5 ... Molten metal side electrode, 6 ... Thermocouple, 7 ... Reference electrode lead wire, 8 ... … Leads of electrodes on the molten metal side, 9 ……
Refractory cement, 10 …… Housing, 11 …… Fireproof cylinder.
Claims (2)
り且つその一端が耐火セメントによって固定され他端が
閉管されたチューブと,前記チューブ内に充填され且つ
測定温度において一定の酸素ポテンシャルを与える基準
極と,そして,前記チューブの外表面上に分布被覆され
た,シリカを含む固体の副電極と,からなる溶融金属中
のシリコン濃度測定用センサーにおいて, 前記基準極を前記チューブの固定端から10mm以上離して
前記チューブの閉管端側に充填し,かつ前記副電極の周
囲長の合計と前記固体電解質の有効外表面積との比を1.
0以上としたことを特徴とする溶融金属中のシリコン濃
度測定用センサー。1. A tube comprising a solid electrolyte capable of transmitting oxygen ions, one end of which is fixed by refractory cement and the other end of which is closed, and a reference which is filled in the tube and gives a constant oxygen potential at a measurement temperature. In a sensor for measuring silicon concentration in molten metal, comprising a pole and a solid sub-electrode containing silica, which is distributedly coated on the outer surface of the tube, the reference electrode is 10 mm from the fixed end of the tube. Filling the closed tube end side of the tube apart from each other, and the ratio of the total peripheral length of the auxiliary electrode to the effective outer surface area of the solid electrolyte is 1.
A sensor for measuring silicon concentration in a molten metal, which is set to 0 or more.
〜8重量%,残部がZrO2および不可避的不純物からなる
特許請求の範囲第1項記載のセンサー。2. A sub-electrodes, ZrSiO 4: 10 to 90 wt%, Na 2 O: 1
The sensor according to claim 1, wherein the sensor comprises ˜8% by weight, the balance being ZrO 2 and inevitable impurities.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62185140A JPH0750062B2 (en) | 1987-02-09 | 1987-07-24 | Sensor for measuring silicon concentration in molten metal − |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2769887 | 1987-02-09 | ||
| JP62-27698 | 1987-02-09 | ||
| JP62185140A JPH0750062B2 (en) | 1987-02-09 | 1987-07-24 | Sensor for measuring silicon concentration in molten metal − |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH01459A JPH01459A (en) | 1989-01-05 |
| JPS64459A JPS64459A (en) | 1989-01-05 |
| JPH0750062B2 true JPH0750062B2 (en) | 1995-05-31 |
Family
ID=26365655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62185140A Expired - Lifetime JPH0750062B2 (en) | 1987-02-09 | 1987-07-24 | Sensor for measuring silicon concentration in molten metal − |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0750062B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2808217B2 (en) * | 1992-08-25 | 1998-10-08 | 株式会社三井ハイテック | Heat treatment method for thin strips for lead frames |
-
1987
- 1987-07-24 JP JP62185140A patent/JPH0750062B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS64459A (en) | 1989-01-05 |
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