JPH0750729B2 - Film carrier manufacturing method - Google Patents
Film carrier manufacturing methodInfo
- Publication number
- JPH0750729B2 JPH0750729B2 JP3075797A JP7579791A JPH0750729B2 JP H0750729 B2 JPH0750729 B2 JP H0750729B2 JP 3075797 A JP3075797 A JP 3075797A JP 7579791 A JP7579791 A JP 7579791A JP H0750729 B2 JPH0750729 B2 JP H0750729B2
- Authority
- JP
- Japan
- Prior art keywords
- film carrier
- suction
- layer structure
- main body
- structure film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 238000005520 cutting process Methods 0.000 claims description 35
- 239000009719 polyimide resin Substances 0.000 claims description 34
- 229920001721 polyimide Polymers 0.000 claims description 33
- 239000004020 conductor Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 238000001179 sorption measurement Methods 0.000 claims description 15
- 239000010410 layer Substances 0.000 description 83
- 238000000034 method Methods 0.000 description 26
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010329 laser etching Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920006259 thermoplastic polyimide Polymers 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
- Laminated Bodies (AREA)
- Wire Bonding (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、TAB(Tape Automate
d Bonding)法により製造される半導体装置等に用いられ
るフィルムキャリアの製造方法及びその製造に用いられ
る切削加工機に関する。BACKGROUND OF THE INVENTION The present invention relates to a TAB (Tape Automate).
The present invention relates to a method of manufacturing a film carrier used for a semiconductor device or the like manufactured by the d Bonding) method and a cutting machine used for manufacturing the film carrier.
【0002】[0002]
【従来の技術とその問題点】近年、電子機器の高機能
化、軽薄短小化が進められ、それに搭載される半導体装
置も高集積化、高機能化が求められ、その実装方法も軽
薄短小化が必要となっている。こうした要求に適した半
導体装置の実装方法としてフィルムキャリアを用いる上
記TAB法が注目されている。2. Description of the Related Art In recent years, electronic devices have become more functional, lighter, thinner, smaller, and smaller, and the semiconductor devices mounted on them have also been required to have higher integration and higher functionality. Is needed. The TAB method using a film carrier has attracted attention as a method of mounting a semiconductor device suitable for such requirements.
【0003】絶縁層としてポリイミド樹脂を用いるフィ
ルムキャリアには金属導体層とポリイミド樹脂層とを接
着剤を介して貼着した3層構造フィルムキャリアと、金
属導体層とポリイミド樹脂層のみからなる2層構造フィ
ルムキャリアとがある。現在、主として用いられるフィ
ルムキャリアは3層構造フィルムキャリアであるが、介
在する接着剤層にエポキシ系の材料を使用しているた
め、ポリイミド樹脂本来の耐熱性を発揮し得ないといっ
た問題点や、接着剤層に含まれる不純物塩素イオンのた
めに実装された半導体装置の信頼性に欠ける等の問題点
を有している。A film carrier using a polyimide resin as an insulating layer has a three-layer structure film carrier in which a metal conductor layer and a polyimide resin layer are adhered via an adhesive, and a two-layer structure consisting of a metal conductor layer and a polyimide resin layer. There are structural film carriers. Currently, the film carrier mainly used is a three-layer structure film carrier, but since an epoxy-based material is used for the intervening adhesive layer, the problem that the heat resistance inherent in the polyimide resin cannot be exhibited, Due to the impurity chlorine ions contained in the adhesive layer, there is a problem in that the mounted semiconductor device lacks reliability.
【0004】このような問題点を克服するフィルムキャ
リアが金属導体層とポリイミド樹脂層のみからなる2層
構造フィルムキャリアである。2層構造フィルムキャリ
アは金属導体層をエッチング等によりパターニングする
以外に、ポリイミド樹脂層にもデバイスホール等の所定
の開孔部を設ける必要があり、その方法として、ウエッ
トエッチング法、ドライエッチング法、レーザーエッチ
ング法が知られている。A film carrier which overcomes the above problems is a two-layer structure film carrier consisting of a metal conductor layer and a polyimide resin layer. In the two-layer structure film carrier, in addition to patterning the metal conductor layer by etching or the like, it is necessary to provide the polyimide resin layer with a predetermined opening such as a device hole. As a method therefor, a wet etching method, a dry etching method, A laser etching method is known.
【0005】ウエットエッチング法はリソグラフィ技術
を必要とし、工程が長く経済性に劣るといった問題点の
他に、ポリイミド樹脂エッチング速度が極めて小さいた
め、以後の製造工程で作業性が極めて困難となる剛性の
低い、ポリイミド樹脂層の薄いフィルムキャリアのみに
適用が限定されてしまうといった問題点を有している。The wet etching method requires a lithographic technique, requires a long process and is inferior in economic efficiency, and has a very low polyimide resin etching rate. Therefore, workability in a subsequent manufacturing process becomes extremely difficult. There is a problem that the application is limited only to a low film carrier having a thin polyimide resin layer.
【0006】ドライエッチング法としてはスパッタ法や
イオンミリング法が知られているがいずれも高価で大掛
かりな装置を必要とし、しかも連続生産ができないため
に、経済性、生産性、作業性等に問題がある。As a dry etching method, a sputtering method and an ion milling method are known, but all of them require expensive and large-scale equipment, and since continuous production is not possible, there is a problem in economical efficiency, productivity, workability and the like. There is.
【0007】近年、注目されているレーザーエッチング
法は、熱による金属導体層の溶融破損、除去困難なカー
ボンの発生と付着等の問題点を有している。以上の様な
問題点を有さないすぐれた2層構造フィルムキャリアの
製造方法として、切削加工機を用いる方法があげられ
る。この方法は金属導体層とポリイミド樹脂層からなる
2層構造フィルムキャリア本体のポリイミド樹脂層所定
部を、数値制御加工機のような切削加工機を用いてデバ
イスホール等の所定の開孔部を形成するフィルムキャリ
アの製造方法である。In recent years, the laser etching method, which has been attracting attention, has problems such as melting and damage of the metal conductor layer due to heat, generation and adhesion of carbon which is difficult to remove. As a method for producing an excellent two-layer structure film carrier which does not have the above problems, a method using a cutting machine can be mentioned. This method forms a predetermined opening part such as a device hole using a cutting machine such as a numerical control processing machine at a predetermined part of a polyimide resin layer of a two-layer structure film carrier body including a metal conductor layer and a polyimide resin layer. It is a method of manufacturing a film carrier.
【0008】この切削加工機による方法では切削時に切
刃により2層構造フィルムキャリア本体に加えられる1
000kg/mm2 以上にも及ぶ力によって、2層構造
フィルムキャリア本体が位置ずれを生じないように、切
刃による切削加工が行われている間、2層構造フィルム
キャリア本体を加工ステージに固定しておく必要があ
る。フィルムキャリアをステージに固定する方法として
は位置決めピンによる方法や重りによる方法、あるいは
除去可能な接着剤により仮接着する方法等があげられる
が、前記2方法では切刃によって加えられる力に抵抗し
てフィルムキャリアを固定するには不十分であり、接着
剤による方法では本来必要のない接着剤を用いることと
なり、接着剤による汚染といった品質上の問題のみなら
ず、経済性、作業性、生産性の点でも問題がある。In this method using a cutting machine, a cutting edge is applied to the main body of the film carrier having a two-layer structure during cutting.
During the cutting process with the cutting edge, the two-layer structure film carrier body is fixed to the processing stage so that the two-layer structure film carrier body is not displaced by the force of over 000 kg / mm 2. Need to be kept. As a method for fixing the film carrier to the stage, there are a method using a positioning pin, a method using a weight, and a method of temporarily adhering with a removable adhesive. In the above two methods, the force applied by the cutting blade is resisted. It is not enough to fix the film carrier, and the adhesive method will use an adhesive that is not originally necessary, and not only the quality problem such as contamination by the adhesive but also the economical efficiency, workability, and productivity. There are also problems in terms.
【0009】フィルムキャリアをステージに固定する第
4の方法として、フィルムキャリア製造工程の内、パタ
ーニングのためのリソグラフィで用いられる露光機等で
知られている吸着固定治具を用いる方法があげられる。
図4に示すようにこの露光機用フィルムキャリア固定治
具はフィルムキャリアを均等に固定するため、治具上面
に均等に設けられている直径0.1〜1mmφ程度の吸
着孔を通して真空によりフィルムキャリアを吸着固定す
るものである。As a fourth method of fixing the film carrier to the stage, there is a method of using a suction fixing jig known in an exposure machine used in lithography for patterning in the film carrier manufacturing process.
As shown in FIG. 4, since the film carrier fixing jig for the exposure machine fixes the film carrier uniformly, the film carrier is fixed by vacuum through suction holes having a diameter of about 0.1 to 1 mmφ evenly provided on the upper surface of the jig. Is fixed by adsorption.
【0010】この露光機用吸着固定治具を2層構造フィ
ルムキャリア本体の固定治具として使用し、ポリイミド
樹脂層所定部を切削加工機により除去し、デバイスホー
ル等の形成を行うことは、所定開孔部内に対応する部位
に設けられている吸着孔部分に相当する部分の切削開孔
時に、少なくとも被開孔部の残存金属導体層に好ましく
ない凹凸を生じるのみならず、金属導体層を貫通するよ
うな破損に至ってしまうといった問題点を有している。Using this suction fixing jig for an exposure machine as a fixing jig for a main body of a film carrier having a two-layer structure, it is necessary to remove a predetermined portion of a polyimide resin layer by a cutting machine and form a device hole or the like. At the time of cutting and opening the portion corresponding to the adsorption hole portion provided in the corresponding portion in the opening portion, not only undesired unevenness is generated in the residual metal conductor layer at least in the hole portion, but also the metal conductor layer is penetrated. It has a problem that it will be damaged.
【0011】[0011]
【発明が解決しようとする問題点】上記問題点を解決す
るために鋭意検討した結果、吸着固定治具の吸着孔を該
治具上面に均等に設けなくても2層構造フィルムキャリ
ア本体は、平滑な治具にほぼ均等に吸着され、2層構造
フィルムキャリア本体に切削加工機を用いてデバイスホ
ール等を形成するフィルムキャリアの製造上何ら支障の
ないことを知見し、該知見に基い所定開孔部以外の部分
に相当する部分にのみ吸着溝及び/又は吸着孔を設けた
固定治具を用いて2層構造フィルムキャリア本体を吸着
固定することに想到して本発明を完成するに至った。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention As a result of intensive studies to solve the above-mentioned problems, a two-layer structure film carrier main body is required to have a suction fixing jig even if the suction holes are not evenly provided on the upper surface of the jig. It was found that the film carrier, which is almost evenly adsorbed on a smooth jig and uses a cutting machine to form a device hole in the two-layer structure film carrier body, has no hindrance in the manufacture of the film carrier, and based on the knowledge The present invention has been completed by conceiving that the two-layer structure film carrier main body is adsorbed and fixed by using a fixing jig provided with an adsorption groove and / or an adsorption hole only in a portion corresponding to a portion other than the opening portion. It was
【0012】以上の記述から明らかなように本発明は、
金属導体層とポリイミド樹脂層からなる2層構造フィル
ムキャリア本体のポリイミド樹脂層所定部を切削加工機
を用いて除去することによりデバイスホール等の所定開
孔部を形成してフィルムキャリアを製造する方法におい
て、本来必要のない接着剤等を用いることなく、しかも
2層構造フィルムキャリア本体を傷つけることのない、
経済性、作業性、生産性にすぐれた簡便な2層構造フィ
ルムキャリア本体の固定方法を提供することをその目的
とする。As is apparent from the above description, the present invention is
Method for producing a film carrier by forming a predetermined opening portion such as a device hole by removing a predetermined portion of a polyimide resin layer of a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer using a cutting machine In the above, there is no need to use an adhesive agent or the like which is not originally necessary, and further, the film carrier body having a two-layer structure is not damaged.
It is an object of the present invention to provide a simple method for fixing a main body of a two-layer structure film carrier, which is excellent in economy, workability and productivity.
【0013】[0013]
【問題点を解決するための手段】本発明は下記(1)〜
(6)の構成を有する。 (1)金属導体層とポリイミド樹脂層からなる2層構造
フィルムキャリア本体の所定部分の該ポリイミド樹脂層
を切削加工機を用いて除去することによりデバイスホー
ルを形成するフィルムキャリアの製造方法において、該
所定開孔部以外の部分に対応する部位にのみ吸着溝及び
/又は吸着孔を設けた吸着固定治具により該2層構造フ
ィルムキャリア本体を吸着固定して切削加工することを
特徴とするフィルムキャリアの製造方法。 (2)2層構造フィルムキャリア本体吸着固定治具の吸
着溝及び/又は吸着孔を少なくとも所定開孔部を囲む部
分に対応する部位に設けた該2層構造フィルムキャリア
本体吸着固定治具を用いることを特徴とする前記第1項
記載のフィルムキャリアの製造方法。 (3)2層構造フィルムキャリア本体吸着固定治具の吸
着溝が該フィルムキャリア本体の所定開孔部を囲む部分
に対応する部位に、少なくとも該所定開孔部を囲んで閉
回路をなすように設けられた該2層構造フィルムキャリ
ア本体吸着治具を用いることを特徴とする前記第1項及
び第2項のいづれかに記載のフィルムキャリアの製造方
法。 (4)金属導体層とポリイミド樹脂層からなる2層構造
フィルムキャリア本体の所定部分のポリイミド樹脂層を
切削加工機を用いて除去することによりデバイスホール
を形成してフィルムキャリアを製造する切削加工機にお
いて、該2層構造フィルムキャリア本体を吸着固定する
ための該デバイスホール以外の部分に相当する部位にの
み吸着溝及び/又は吸着孔を設けた該2層構造フィルム
キャリア本体の吸着固定治具を備えたことを特徴とする
切削加工機。 (5)2層構造フィルムキャリア本体の吸着固定用の吸
着溝及び/又は吸着孔が所定開孔部を囲む部分に相当す
る部位に設けられた該2層構造フィルムキャリア本体吸
着固定治具を備えたことを特徴とする前記第4項記載の
切削加工機。 (6)2層構造フィルムキャリア本体の吸着固定用の吸
着溝が該フィルムキャリア本体の所定開孔部を囲む部分
に対応する部位に少なくとも該所定開孔部を囲んで閉回
路をなすように設けられた該2層構造フィルムキャリア
本体吸着治具を備えたことを特徴とする前記第4項及び
第5項のいづれかに記載の切削加工機。[Means for Solving the Problems] The present invention includes the following (1) to
It has the configuration of (6). (1) A method for producing a film carrier, wherein a device hole is formed by removing a predetermined portion of the polyimide resin layer of a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer using a cutting machine. A film carrier characterized in that the two-layer structure film carrier main body is suction-fixed and cut by a suction-fixing jig having suction grooves and / or suction holes provided only in a portion corresponding to a portion other than a predetermined opening portion. Manufacturing method. (2) The two-layer structure film carrier main body adsorption / fixing jig in which the suction groove and / or the suction hole of the two-layer structure film carrier main body adsorption / fixing jig is provided in a portion corresponding to at least a portion surrounding a predetermined opening. The method for producing a film carrier according to the above item 1, characterized in that: (3) At least the predetermined opening portion is surrounded by a suction groove of the two-layer film carrier main body suction fixing jig so as to form a closed circuit at a portion corresponding to the portion surrounding the predetermined opening portion of the film carrier main body. 3. The method for producing a film carrier according to any one of the above items 1 and 2, wherein the provided two-layer structure film carrier main body adsorption jig is used. (4) A cutting machine for producing a film carrier by forming a device hole by removing a polyimide resin layer at a predetermined portion of a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer using a cutting machine. In a suction fixing jig for the two-layer structure film carrier main body, wherein a suction groove and / or a suction hole is provided only in a portion other than the device hole for fixing the two-layer structure film carrier main body by suction. A cutting machine characterized by being equipped. (5) An adsorption fixing jig for adsorbing and fixing an adsorbing groove and / or an adsorbing hole for adsorbing and fixing the two-layer structure film carrier main body is provided in a portion corresponding to a portion surrounding a predetermined opening. The cutting machine according to the fourth aspect, characterized in that (6) Adsorption grooves for adsorbing and fixing the two-layer structure film carrier body are provided in a portion corresponding to a portion surrounding the predetermined opening portion of the film carrier body so as to form a closed circuit at least surrounding the predetermined opening portion. The cutting machine according to any one of the above items 4 and 5, characterized in that it is provided with the two-layer structure film carrier main body adsorption jig.
【0014】本発明の構成、作用と効果につき以下に詳
述する。上記2層構造フィルムキャリア本体に使用する
金属導体層の構成材料としては、銅、アルミニウム、
金、銀、鉄、錫、鉛、ないしはこれらの合金またはこれ
らをメッキしているものがあげられる。上記2層構造フ
ィルムキャリア本体は上記材料からなる金属導体層上へ
ポリイミド樹脂溶液あるいはポリイミド前駆体溶液をキ
ャスティングして形成したり、又はポリイミド樹脂層上
に上記金属導体層構成材料を蒸着あるいは電着して形成
したものや、熱可塑性ポリイミド樹脂を上記金属導体層
に対してラミネートしたもの、さらに熱可塑性ポリイミ
ド樹脂を接着剤として用い、金属導体層とポリイミド樹
脂層とを貼着したものがあげられる。The structure, operation and effect of the present invention will be described in detail below. The constituent material of the metal conductor layer used in the two-layer structure film carrier body is copper, aluminum,
Examples thereof include gold, silver, iron, tin, lead, or alloys thereof or those plated with these. The two-layer structure film carrier body is formed by casting a polyimide resin solution or a polyimide precursor solution on a metal conductor layer made of the above material, or by vapor deposition or electrodeposition of the metal conductor layer constituent material on the polyimide resin layer. And a thermoplastic polyimide resin laminated on the metal conductor layer, and a thermoplastic polyimide resin used as an adhesive to bond the metal conductor layer and the polyimide resin layer to each other. .
【0015】上記のような2層構造フィルムキャリア本
体を吸着固定する吸着固定治具は所定開孔部以外の部分
に相当する部位に吸着溝及び/又は吸着孔を設けたもの
であり、図1にその代表例を示す。切削加工機による所
定開孔部のポリイミド樹脂層を切削加工機の切刃により
除去する場合に、切刃のあたる所定開孔部の下のステー
ジ面には吸着溝及び吸着孔が設けられていないので2層
構造フィルムキャリア本体を何ら傷つけることはない。The adsorption fixing jig for adsorbing and fixing the two-layer structure film carrier body as described above is one in which an adsorption groove and / or an adsorption hole is provided at a portion corresponding to a portion other than the predetermined opening portion. A typical example is shown in. When removing the polyimide resin layer of the predetermined opening part by the cutting machine with the cutting edge of the cutting machine, the suction groove and the suction hole are not provided on the stage surface below the predetermined opening part that hits the cutting edge. Therefore, the main body of the two-layer structure film carrier is not damaged.
【0016】吸着溝及び/又は吸着孔は所定開孔部以外
の部分に相当する部位に設けられていれば特に支障はな
いが、生産性を向上させるべく切削加工速度を大きくす
ると位置ずれを生じる場合もあり、図2に示すように、
少なくとも所定開孔部を囲む部分に相当する部位に設け
るのが望ましい。さらに万全を期するためには図3に示
すように所定開孔部を囲む部分に相当する部位に少なく
とも所定開孔部を囲んで閉回路をなすような吸着溝を設
けることが更に望ましい。There is no particular problem if the suction groove and / or the suction hole is provided at a portion corresponding to a portion other than the predetermined opening portion, but if the cutting speed is increased to improve productivity, a positional deviation occurs. In some cases, as shown in FIG.
It is desirable to provide at least a portion corresponding to a portion surrounding the predetermined opening portion. Further, for the sake of completeness, as shown in FIG. 3, it is more desirable to provide a suction groove that surrounds at least the predetermined opening and forms a closed circuit at a portion corresponding to the portion surrounding the predetermined opening.
【0017】[0017]
【作用】本発明は、吸着孔が均等に設けられている通常
の吸着治具ではなく、2層構造フィルムキャリア本体の
所定部以外の部分に相当する部位に吸着溝及び/又は吸
着孔を設けた、特殊な吸着治具を用いることによってポ
リイミド樹脂層所定部を切削加工機を用いることにより
除去するもので、本来必要のない接着剤等を用いること
なく、しかも2層構造フィルムキャリア本体に何ら損傷
を与えることなくデバイスホール等を形成できる。本発
明は、金属導体層とポリイミド樹脂層からなる2層構造
フィルムキャリア本体を上記のような特殊な吸着治具を
用いて固定し、ポリイミド樹脂層所定部を切削加工機を
用いて除去し、デバイスホール等を形成するものであ
る。According to the present invention, the suction groove and / or the suction hole is provided at a portion corresponding to a portion other than the predetermined portion of the two-layer structure film carrier body, instead of the ordinary suction jig having the suction holes provided uniformly. In addition, a predetermined part of the polyimide resin layer is removed by using a cutting machine by using a special suction jig. Device holes and the like can be formed without damaging them. According to the present invention, a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer is fixed using a special suction jig as described above, and a predetermined portion of the polyimide resin layer is removed using a cutting machine, A device hole or the like is formed.
【0018】[0018]
【発明の効果】以上のように本発明は2層構造フィルム
キャリア本体を接着剤等を用いずに平滑な吸着治具上に
隙間なくしっかりと固定されるため切削中に位置ずれを
起こす事なく目的の厚さに凹凸なく開孔出来る。本発明
は、品質、経済性、作業性、生産性にすぐれた方法であ
り、しかも所定開孔部以外の部分に相当する部位に吸着
溝及び/又は吸着孔を設けてあるので2層構造フィルム
キャリア本体を傷つけることがない。それによって、耐
熱性、信頼性にすぐれたフィルムキャリアを容易に製造
できるようになる。As described above, according to the present invention, the main body of the two-layer structure film carrier is firmly fixed on the smooth suction jig without any gaps without using an adhesive or the like, so that the positional deviation does not occur during cutting. The target thickness can be opened without unevenness. INDUSTRIAL APPLICABILITY The present invention is a method having excellent quality, economical efficiency, workability, and productivity, and moreover, since a suction groove and / or a suction hole is provided in a portion corresponding to a portion other than the predetermined opening portion, a two-layer structure film Does not damage the carrier body. This makes it possible to easily manufacture a film carrier having excellent heat resistance and reliability.
【0019】[0019]
図1は、本発明による代表的な吸着固定治具により2層
構造フィルムキャリア本体を吸着固定した場合の断面図
である。図において、aはポリイミド樹脂所定開孔部、
bはポリイミド樹脂層、cは金属導体層でbとcとで2
層構造フィルムキャリアを構成する。更にdは吸着溝又
は吸着孔、eは真空ポンプ接続配管、fはd,e,g
(吸着固定治具空洞部)を包括する吸着固定治具であ
る。図2は、本発明による所定開孔部を囲むような形で
吸着溝及び/又は吸着孔を設けた代表的な吸着固定治具
により2層構造フィルムキャリア本体を吸着固定した場
合の平面図である。図において、aはポリイミド樹脂所
定開孔部、bは2層構造フィルムキャリアである。dは
吸着溝、eは真空ポンプ接続配管、fはd,e,g(吸
着固定治具空洞部)を包括する吸着固定治具でhは吸着
孔である。FIG. 1 is a sectional view when a two-layer structure film carrier body is suction-fixed by a typical suction-fixing jig according to the present invention. In the figure, a is a polyimide resin predetermined opening,
b is a polyimide resin layer, c is a metal conductor layer, and b and c are 2
It constitutes a layered film carrier. Further, d is a suction groove or a suction hole, e is a vacuum pump connecting pipe, and f is d, e, g.
This is a suction-fixing jig that includes the (suction-fixing jig cavity). FIG. 2 is a plan view of a two-layer structure film carrier body which is suction-fixed by a typical suction-fixing jig having suction grooves and / or suction holes formed so as to surround a predetermined opening according to the present invention. is there. In the figure, a is a polyimide resin predetermined opening portion, and b is a two-layer structure film carrier. d is a suction groove, e is a vacuum pump connecting pipe, f is a suction fixing jig including d, e, and g (suction holding jig cavity), and h is a suction hole.
【0020】図3は、本発明による所定開孔部を囲んで
閉回路をなす吸着溝を設けた代表的な吸着固定治具によ
り2層構造フィルムキャリア本体を吸着固定した場合の
平面図である。図において、aはポリイミド樹脂所定開
孔部、bは2層構造フィルムキャリアである。dは閉回
路をなす吸着溝、eは真空ポンプ接続配管、fはd,
e,g(吸着固定治具空洞部)を包括する吸着固定治具
である。図4は従来の露光機等に用いられる吸着固定治
具により2層構造フィルムキャリア本体を吸着固定した
場合の断面図で各記号の意味は図1の場合と同様であ
る。FIG. 3 is a plan view of a two-layer structure film carrier body which is suction-fixed by a typical suction-fixing jig having a suction groove forming a closed circuit surrounding a predetermined opening according to the present invention. . In the figure, a is a polyimide resin predetermined opening portion, and b is a two-layer structure film carrier. d is a suction groove forming a closed circuit, e is a vacuum pump connecting pipe, f is d,
It is a suction fixing jig including e and g (cavity of suction fixing jig). FIG. 4 is a cross-sectional view when a two-layer structure film carrier body is suction-fixed by a suction-fixing jig used in a conventional exposure machine or the like, and the meaning of each symbol is the same as in FIG.
Claims (6)
2層構造フィルムキャリア本体の所定部分の該ポリイミ
ド樹脂層を切削加工機を用いて除去することによりデバ
イスホールを形成するフィルムキャリアの製造方法にお
いて、該所定開孔部以外の部分に対応する部位にのみ吸
着溝及び/又は吸着孔を設けた吸着固定治具により該2
層構造フィルムキャリア本体を吸着固定して切削加工す
ることを特徴とするフィルムキャリアの製造方法。1. A method of manufacturing a film carrier, wherein a device hole is formed by removing a predetermined portion of the polyimide resin layer of a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer using a cutting machine. The suction fixing jig having suction grooves and / or suction holes provided only in a portion corresponding to a portion other than the predetermined opening portion.
A method of manufacturing a film carrier, which comprises adsorbing and fixing a layer structure film carrier body and performing cutting.
治具の吸着溝及び/又は吸着孔を少なくとも所定開孔部
を囲む部分に対応する部位に設けた該2層構造フィルム
キャリア本体吸着固定治具を用いることを特徴とする請
求項第1項記載のフィルムキャリアの製造方法。2. A two-layer structure film carrier main body adsorption / fixing jig in which the suction groove and / or suction hole of the two-layer structure film carrier main body adsorption / fixing jig is provided in a portion corresponding to at least a portion surrounding a predetermined opening portion. The method for producing a film carrier according to claim 1, wherein:
治具の吸着溝が該フィルムキャリア本体の所定開孔部を
囲む部分に対応する部位に、少なくとも該所定開孔部を
囲んで閉回路をなすように設けられた該2層構造フィル
ムキャリア本体吸着治具を用いることを特徴とする請求
項第1項及び第2項のいづれかに記載のフィルムキャリ
アの製造方法。3. A closed circuit is formed by surrounding at least the predetermined opening portion at a portion of the two-layer structure film carrier main body suction fixing jig corresponding to a portion surrounding the predetermined opening portion of the film carrier main body. The method for producing a film carrier according to any one of claims 1 and 2, wherein the jig for adsorbing the main body of the film carrier having the two-layer structure thus provided is used.
2層構造フィルムキャリア本体の所定部分のポリイミド
樹脂層を切削加工機を用いて除去することによりデバイ
スホールを形成してフィルムキャリアを製造する切削加
工機において、該2層構造フィルムキャリア本体を吸着
固定するための該デバイスホール以外の部分に相当する
部位にのみ吸着溝及び/又は吸着孔を設けた該2層構造
フィルムキャリア本体の吸着固定治具を備えたことを特
徴とする切削加工機。4. A cutting for manufacturing a film carrier by forming a device hole by removing a polyimide resin layer at a predetermined portion of a two-layer structure film carrier body composed of a metal conductor layer and a polyimide resin layer by using a cutting machine. In a processing machine, a suction fixing jig of the two-layer structure film carrier main body in which suction grooves and / or suction holes are provided only in a portion other than the device hole for fixing the two-layer structure film carrier main body by suction. A cutting machine equipped with tools.
定用の吸着溝及び/又は吸着孔が所定開孔部を囲む部分
に相当する部位に設けられた該2層構造フィルムキャリ
ア本体吸着固定治具を備えたことを特徴とする請求項第
4項記載の切削加工機。5. A two-layer structure film carrier body suction-fixing jig, wherein a suction groove and / or a suction hole for suction-fixing a two-layer structure film carrier body is provided at a portion corresponding to a portion surrounding a predetermined opening portion. The cutting machine according to claim 4, further comprising:
定用の吸着溝が該フィルムキャリア本体の所定開孔部を
囲む部分に対応する部位に少なくとも該所定開孔部を囲
んで閉回路をなすように設けられた該2層構造フィルム
キャリア本体吸着治具を備えたことを特徴とする請求項
第4項及び第5項のいづれかに記載の切削加工機。6. A closed circuit is formed by surrounding at least a predetermined opening portion of a two-layer structure film carrier main body in a portion corresponding to a portion surrounding the predetermined opening portion of the film carrier main body. The cutting machine according to any one of claims 4 and 5, further comprising: a jig for adsorbing the main body of the film carrier having the two-layer structure provided on the cutting machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075797A JPH0750729B2 (en) | 1991-03-15 | 1991-03-15 | Film carrier manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075797A JPH0750729B2 (en) | 1991-03-15 | 1991-03-15 | Film carrier manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04287336A JPH04287336A (en) | 1992-10-12 |
| JPH0750729B2 true JPH0750729B2 (en) | 1995-05-31 |
Family
ID=13586554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3075797A Expired - Lifetime JPH0750729B2 (en) | 1991-03-15 | 1991-03-15 | Film carrier manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0750729B2 (en) |
-
1991
- 1991-03-15 JP JP3075797A patent/JPH0750729B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04287336A (en) | 1992-10-12 |
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