JPH0751452B2 - Silica glass powder manufacturing equipment - Google Patents
Silica glass powder manufacturing equipmentInfo
- Publication number
- JPH0751452B2 JPH0751452B2 JP1190551A JP19055189A JPH0751452B2 JP H0751452 B2 JPH0751452 B2 JP H0751452B2 JP 1190551 A JP1190551 A JP 1190551A JP 19055189 A JP19055189 A JP 19055189A JP H0751452 B2 JPH0751452 B2 JP H0751452B2
- Authority
- JP
- Japan
- Prior art keywords
- roller
- particle size
- quartz glass
- silica glass
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Description
【発明の詳細な説明】 「産業上の利用分野」 本発明はルツボその他の各種石英ガラス製品を製造する
為に好適なシリカガラス粉粒体の製造装置に係り、特に
100〜500μmの粒径範囲に最大収率を示すシリカガラス
粉粒体を得るのに好適なシリカガラス粉粒体の製造装置
に関する。The present invention relates to an apparatus for producing silica glass powder particles suitable for producing various kinds of quartz glass products such as crucibles, and more particularly to a silica glass powder producing apparatus.
The present invention relates to a silica glass powder production apparatus suitable for obtaining a silica glass powder having a maximum yield in a particle size range of 100 to 500 μm.
「従来の技術」 従来より回転するカーボン製型枠内にシリカガラス粉粒
体を投入しながら、その遠心力を利用して前記型枠内壁
面に所定層厚で保持せしめた後、アーク放電、プラズマ
火炎その他の熱源を利用して前記粉粒体を加熱しながら
溶融せしめルツボその他の各種石英ガラス製品を製造す
る方法は公知である。"Prior Art" While inserting silica glass powder into a rotating carbon mold, the centrifugal force is used to hold the mold inner wall surface at a predetermined layer thickness, and then arc discharge, A method of producing various crucibles and other various kinds of quartz glass products by melting the powdery particles while heating them using a plasma flame or other heat source is known.
かかる製造方法に用いる粉粒体は、その粒度を細粒化し
た場合にも又粗粒化させた場合においても前記遠心力の
作用による均一な層厚形成が困難になるのみならず、加
熱溶融の際に均一組成の安定した石英ガラス製品の製造
が困難になる。特に前記粉粒体の粒径が1000μm以上で
は溶融自体が困難になり又10μm以下に微細粒化した場
合には作業環境汚染の問題が生ずる。The powder and granules used in such a manufacturing method not only make it difficult to form a uniform layer thickness due to the action of the centrifugal force even when the particle size is made fine or coarse, but also heat melting In this case, it becomes difficult to manufacture a stable quartz glass product having a uniform composition. In particular, when the particle size of the powder is 1000 μm or more, melting itself becomes difficult, and when the particle size is 10 μm or less, a problem of work environment pollution occurs.
この為前記製造方法においては、粉粒体の粒度規制を行
い、好ましくは74〜500μmの範囲に粒度分布を有する
シリカガラス粉粒体を用いているが、不純物の混入を避
けつつ、前記粒径範囲に最大収率を示す粉粒体を得るの
は中々困難である。Therefore, in the above-mentioned manufacturing method, the particle size of the powder particles is regulated, and silica glass powder particles having a particle size distribution in the range of 74 to 500 μm are preferably used. It is quite difficult to obtain a granule having a maximum yield in the range.
例えば高純度化を達成しつつ所定粒度範囲の粉粒体を得
る装置として、例えば実開昭61−195350号においてはシ
リカガラスを内壁に内張りしたボールミル装置が、又特
開昭63−296852号においては、ボールミル容器の内壁面
とミルボールの周面に対し夫々SiO2からなるコーティン
グ層を形成した技術が開示されているが、ボールミルの
粉砕によって得られるシリカガラス粉粒体の粒径は0.1
〜10μm前後の範囲であり、かかる粒径範囲ではIC用封
止剤への充填剤としての利用には好適であるが、ルツボ
等の製造には必ずしも好ましい粒度ではない。For example, as a device for obtaining powder particles in a predetermined particle size range while achieving high purification, for example, in Japanese Utility Model Laid-Open No. 61-195350, a ball mill device with an inner wall of silica glass is lined up, and in Japanese Patent Laid-Open No. 63-296852. Discloses a technique in which a coating layer made of SiO 2 is formed on the inner wall surface of the ball mill container and the peripheral surface of the mill ball, respectively, but the particle diameter of the silica glass powder obtained by pulverizing the ball mill is 0.1.
The particle size is in the range of about 10 μm, which is suitable for use as a filler in an IC encapsulant in such a particle size range, but is not necessarily a preferred particle size for the production of crucibles and the like.
一方前記ボールミルの代わりにローラミル装置を用いる
事により、その機械的粉砕により得られる粉粒体の粒径
を粗に設定する事が可能であるが、前記装置にセラミッ
クや金属ローラを用いた場合においては、ローラ側より
の微小破砕物からなる不純物が粉粒体側に混入され、高
純度化を達成し得ないのみならず、セラミック等が石英
ガラスに比較して硬度差が大な為に、石英ガラスからな
る被粉粒体を無用に細粒化してしまい、74〜500μmの
範囲に最大収率を示すシリカガラス粉粒体を得る事が出
来ない。On the other hand, by using a roller mill device instead of the ball mill, it is possible to roughly set the particle size of the powder particles obtained by the mechanical pulverization, but in the case of using a ceramic or metal roller in the device In addition to the fact that impurities consisting of finely crushed materials from the roller side are mixed into the powder and granular material side and high purification cannot be achieved, the hardness difference between ceramics and quartz glass is large. The powdered granules made of glass are unnecessarily made fine, and it is not possible to obtain silica glass powder granules having a maximum yield in the range of 74 to 500 μm.
かかる欠点を解消する為に、前記従来技術と同様にセラ
ミックや金属ローラの表面に石英ガラス層を貼着した
り、SiO2コーティング層を形成する事も検討されるが、
ロールミル装置はボールミル装置と異なり軸方向に長い
側線を有するローラ間に被粉粒体を挟圧させながら圧縮
粉砕する構成を取る為に、被粉粒体との間の部分的な偏
圧縮により、脆性材であり且つ相対的に低硬度の表面石
英ガラス層にクラックや割れが生じ易い。In order to eliminate such a defect, it is also considered to adhere a quartz glass layer to the surface of the ceramic or metal roller or to form a SiO 2 coating layer as in the above-mentioned conventional technique,
Unlike the ball mill device, the roll mill device has a configuration in which the powder material is compressed and crushed while being sandwiched between rollers having long side lines in the axial direction. A brittle material and a relatively low hardness surface quartz glass layer are easily cracked or broken.
かかる欠点を解消する為に前記ローラ自体を石英ガラス
体で形成する事も考えられるが、被粉砕物と同一硬度の
ローラを用いても必ずしも円滑な粉砕を可能となし得な
い。Although it is possible to form the roller itself from a quartz glass body in order to solve such a defect, smooth crushing cannot always be achieved even if a roller having the same hardness as the object to be crushed is used.
本発明はかかる従来技術の欠点に鑑み、高純度で且つ74
〜500μmの粒径範囲において最大収率を得るルツボそ
他の各種石英ガラス製品を製造する為に好適なシリカガ
ラス粉粒体を得る事の出来る製造装置を提供する事を目
的とする。In view of the drawbacks of the prior art, the present invention is of high purity and
An object of the present invention is to provide a production apparatus capable of obtaining silica glass powder particles suitable for producing various kinds of quartz glass products such as crucibles and the like, which can obtain the maximum yield in a particle size range of up to 500 μm.
「課題を解決する為の手段」 本発明に至った経過を順を追って説明する。"Means for Solving the Problem" The process leading to the present invention will be described step by step.
A,先ず前記ボールミル装置の粉砕によって得られる粉粒
体の粒径は0.1〜10μm前後であり、従ってそれ以上の
粒径範囲の粉粒体を得るにはローラミル装置を採用しな
ければならない事は前述した通りである。A. First, the particle size of the powder particles obtained by crushing with the ball mill device is about 0.1 to 10 μm, and therefore a roller mill device must be adopted to obtain powder particles with a particle size range larger than that. As described above.
一方ローラミル装置を採用した場合においても、セラミ
ックや金属ローラを用いて圧縮粉砕を行った場合におい
ては、前記ローラの微粉が不純物として混入され、高純
度の粉砕物を得るのに好ましくない事も前記した通りで
ある。On the other hand, even when a roller mill device is adopted, when compression pulverization is performed using a ceramic or metal roller, fine powder of the roller is mixed as an impurity, which is not preferable for obtaining a high-purity pulverized product. As I did.
かかる欠点を解消する為に前記金属ローラの表面に石英
ガラス製の貼着層やコーティング層を形成した場合にお
いてはクラックや割れが生じ好ましくない事も前記した
通りである。As described above, cracks and breaks are not preferable when a quartz glass adhesive layer or coating layer is formed on the surface of the metal roller in order to eliminate such a drawback.
そこで本発明の第1の特徴は前記一対のローラにセラミ
ックや金属ローラを用いる事なく、又石英ガラス製の貼
着層やコーティング層を形成する事なく、ローラ自体を
石英ガラス体で形成した点を第1の特徴とする。Therefore, the first feature of the present invention is that the rollers themselves are formed of a quartz glass body without using a ceramic or metal roller as the pair of rollers or forming a sticking layer or a coating layer made of quartz glass. Is the first feature.
B,しかしながら前記ローラが結晶質の天然水晶を熔融し
て得た石英ガラスである場合には、純度の不均一性が認
められ、この為圧縮粉砕時にローラ表面にマイクロクラ
ックやひび割れれ等が生じ易くなり、基本的に耐久性の
面で問題が出るのみならず、表面に微小クラック等が生
じた状態で粉砕を行う事は例え粒度調整された原料を用
いても表面の微小凹凸により粉砕粒度にバラツキが生じ
る場合がある。B, However, when the roller is quartz glass obtained by melting crystalline natural quartz, non-uniformity of purity is recognized, and therefore microcracks and cracks are generated on the roller surface during compression pulverization. Not only will it become easier and basically there will be a problem in terms of durability, but crushing in the state where microcracks etc. occur on the surface is because even if a raw material with adjusted particle size is used May vary.
而も、天然石英ガラスの場合は高純度化に限界があり、
その切欠きの一部が粉粒体側に混入されると粉粒体の純
度低下が生じる。Moreover, in the case of natural quartz glass, there is a limit to high purification,
If a part of the notch is mixed into the powder or granular material side, the purity of the powder or granular material is lowered.
そこで本発明の第2の特徴は前記ローラを(非晶質の)
合成石英ガラスで形成した点にある。Therefore, a second feature of the present invention is that the roller is (amorphous).
It is formed of synthetic quartz glass.
即ち合成石英ガラス製のローラにより圧縮粉砕を行った
場合には、前記天然石英ガラスに比較して微小クラック
が生じる恐れが格段に低下するのみならず、合成石英ガ
ラスは極めて高純度である為に、その切欠きの一部が粉
粒体側に混入した場合にも粉粒体の純度低下が生じる余
地がない。That is, when compressed and crushed by a roller made of synthetic quartz glass, compared to the natural quartz glass, not only is the risk of microcracks significantly reduced, but synthetic quartz glass is extremely high in purity. Even if a part of the notch is mixed into the powder or granular material side, there is no room for the purity of the powder or granular material to deteriorate.
C,しかしながら被粉砕物に石英ガラス粗粒を用いた場合
には、ローラと同一硬度である為に、ローラの摩耗が激
しく好ましくない。C. However, when quartz glass coarse particles are used as the object to be crushed, the hardness of the roller is great because the hardness is the same as that of the roller, which is not preferable.
そこで本発明の第3の特徴とする所は、前記被粉砕物と
して前記天然石英ガラス等の粗粒を用いる事なく、特に
ゾルーゲル法で製造した非結晶質の二酸化珪素粗粒を被
粉砕物として用いた点にある。Therefore, a third feature of the present invention is that, without using coarse particles such as the natural quartz glass as the object to be crushed, particularly amorphous silicon dioxide coarse particles produced by the sol-gel method are used as the object to be crushed. It is in the point used.
即ちゾルーゲル法で製造した二酸化珪素粗粒の場合はク
ラックや細孔が多く含有されている為に、例えその圧縮
粉砕を行うローラに非晶質の合成石英ガラスを用いても
容易に破砕が可能である。That is, since the coarse particles of silicon dioxide produced by the sol-gel method contain many cracks and pores, they can be easily crushed even if amorphous synthetic quartz glass is used for the roller for compression crushing. Is.
而もゾルーゲル法の場合はゾル形成時のPH調整によっ
て、粒度が大幅にバラツク事なく1000μm以上の粒度を
有する原料粗粒を容易に得る事が出来、これにより前記
第2及び後記第4の特徴との組み合わせにおいて74〜50
0μmの範囲の最大収率を示すシリカガラス粉粒体の製
造が可能となる。In the case of the sol-gel method, it is possible to easily obtain raw material coarse particles having a particle size of 1000 μm or more by adjusting the pH at the time of forming the sol, and thus the second and fourth characteristics described below can be obtained. 74-50 in combination with
It is possible to produce silica glass powder particles having a maximum yield in the range of 0 μm.
D,即ち前記ローラをセラミックのようにそれ自体に被粉
砕物と材質的に硬度差を有する部材で形成するのではな
く、単に組成密度的に差異を有する合成石英ガラスで形
成する事により、前記二酸化珪素粗粒を直接圧潰して粉
砕する事なく、クラックや細孔が生じている部分より適
宜粒度で砕くものである為に、粉砕された粉粒体が必要
以上に微細化する事なく、ルツボその他の各種石英ガラ
ス製品を製造する為に最も好ましい粒度範囲の粗粒を得
る事が出来る。D, that is, the roller is not formed of a member such as ceramic that has a material hardness difference from that of the object to be ground, but is simply formed of synthetic quartz glass that has a difference in composition density. Without directly crushing and crushing the silicon dioxide coarse particles, since the particles are crushed with an appropriate particle size from the portion where cracks and pores are generated, the crushed powder or granule does not become finer than necessary. Coarse grains in the most preferable grain size range can be obtained for producing crucibles and other various quartz glass products.
この場合において、前記ローラ周面同士を圧接した状態
で回転させた場合においては、やはり前記圧潰作用が生
じ好ましくない。In this case, when the roller peripheral surfaces are rotated while being pressed against each other, the crushing action still occurs, which is not preferable.
そこでクラックや細孔が生じている部分より適宜粒度で
砕くという作用効果を得る為には前記一対のローラ間を
微小空隙間隔で離間させた状態で配設し、前記二酸化珪
素粗粒に圧力を加える程度に狭圧する事により、クラッ
クや細孔が生じている部分より割れが生じ、適宜粒度で
の粉砕が可能となる。Therefore, in order to obtain the function and effect of crushing from a portion where cracks and pores are generated to an appropriate grain size, the pair of rollers are arranged in a state of being separated by a minute gap, and the silicon dioxide coarse particles are pressurized. By narrowing the pressure to such an extent that it is added, cracks are generated from the portions where cracks and fine pores are generated, and it becomes possible to pulverize with an appropriate particle size.
この場合において前記微小空隙間隔は、目的とする粉粒
体の粒度範囲の最大より大にして且つ二酸化珪素粗粒の
粒度分布範囲の最大より小に設定するのが好ましい。In this case, it is preferable that the interval of the minute voids is set to be larger than the maximum of the particle size range of the intended powder or granular material and smaller than the maximum of the particle size distribution range of the silicon dioxide coarse particles.
「実施例」 以下、図面を参図して本発明の好適な実施例を例示的に
詳しく説明する。ただしこの実施例に記載されている構
成部品の寸法、材質、形状、その相対配置などは特に特
定的な記載がない限りは、この発明の範囲をそれのみに
限定する趣旨ではなく、単なる説明例に過ぎない。[Embodiment] A preferred embodiment of the present invention will be exemplarily described in detail below with reference to the drawings. However, unless otherwise specified, the dimensions, materials, shapes, relative positions, etc. of the components described in this embodiment are not intended to limit the scope of the present invention thereto, but merely illustrative examples. Nothing more than.
先ず本発明の実施例に係るシリカガラス粉粒体の製造装
置の全体構成について第2図に基づいて簡単に説明する
に、 1は、ロールミル装置内に該被粉砕物を順次投入するホ
ッパで、被粉砕物として、1000μm以上の粒径範囲に最
大粒度分布を有するゾルーゲル法で製造した非結晶質の
二酸化珪素粗粒を収納する。First, a brief description will be given of the overall configuration of the apparatus for producing silica glass powder particles according to an embodiment of the present invention with reference to FIG. 2. Reference numeral 1 is a hopper that sequentially puts the object to be crushed into a roll mill apparatus. As the material to be crushed, amorphous silicon dioxide coarse particles produced by the sol-gel method having a maximum particle size distribution in a particle size range of 1000 μm or more are stored.
そして前記ホッパ1は、例えば外形をポリプロピレンで
形成し、そしてその内面にシリカガラス板を貼着させて
いる。The outer shape of the hopper 1 is made of polypropylene, for example, and a silica glass plate is attached to the inner surface thereof.
そして前記ホッパ1よりロールミル装置2内に投入され
た粉砕物は、互いに同期回転するローラ対10間で狭圧−
粉砕した後、分級篩器3に導入し所定の粒度に分級させ
る。Then, the pulverized material put into the roll mill device 2 from the hopper 1 is compressed at a narrow pressure between the pair of rollers 10 which rotate in synchronization with each other.
After crushing, it is introduced into the classifying and sieving machine 3 and classified into a predetermined particle size.
第1図はかかる製造装置に用いるローラミル装置を示
す。FIG. 1 shows a roller mill device used in such a manufacturing apparatus.
圧縮粉砕用の一対のローラ10は、OH基含有量50ppmの合
成石英ガラスからなり、その外径200mmで肉厚が50mmの
中空円筒体により形成するとともに、その両端側に取付
けられた金属製の芯出し治具20及び回転軸11を介して軸
受14に回転自在に軸支されている。The pair of rollers 10 for compression and crushing is made of synthetic quartz glass having an OH group content of 50 ppm, and is formed by a hollow cylindrical body having an outer diameter of 200 mm and a wall thickness of 50 mm, and is made of metal attached to both ends thereof. A bearing 14 is rotatably supported by a bearing 14 via a centering jig 20 and a rotating shaft 11.
そして前記一の回転軸11の一端にプーリ12を取付け、こ
れによりモータ13の回転を前記プーリ12で受けて前記一
のローラ10Aが駆動回転すると、該ローラ10Aと軸線方向
に沿って接している他側ローラ10Bが被粉砕物との間の
摩擦力を利用して互いに正逆回転する事が出来る。Then, a pulley 12 is attached to one end of the one rotating shaft 11, whereby the rotation of the motor 13 is received by the pulley 12 and when the one roller 10A is driven to rotate, it is in contact with the roller 10A along the axial direction. The other side roller 10B can rotate forward and backward mutually by utilizing the frictional force between the roller 10B and the object to be crushed.
従って前記ローラ対10の駆動回転は、一のローラ10Aの
みで足りるが、必要に応じて前記各回転軸11夫々に互い
に噛合可能な歯車を取付け、これにより前記両ローラ対
10が互いに同期して駆動回転可能に構成してもよい。Therefore, the roller pair 10 can be driven and rotated by only one roller 10A, but if necessary, gears that can be meshed with each other are attached to the respective rotary shafts 11, so that both roller pairs can be driven.
The 10 may be configured to be driven and rotatable in synchronization with each other.
又前記両ローラ対10同士が水平、言い換えれば各ローラ
軸線を通る仮想平面が水平になるように、前記両ローラ
対10を軸受14を介して基台15上に設置且つその水平度調
整を行っている。Further, both roller pairs 10 are placed on the base 15 via the bearing 14 and the levelness thereof is adjusted so that the two roller pairs 10 are horizontal, in other words, the virtual plane passing through each roller axis is horizontal. ing.
芯出し治具20は、ローラ内周面にきっちり嵌合される円
筒部21と該円筒部21と同心状に形成され、ローラ端面と
離間した状態で対面する円板状鞘状体22からなり、鞘状
体22には120゜づつ回転方向にずらした位置に螺子23を
螺合し、該螺子23の先端をローラ端面に圧接する事によ
り回転軸11とローラ間の固定を行うとともに、該螺子23
同士を進退させる事によりローラの偏心及び芯出し調整
が可能となる。The centering jig 20 is composed of a cylindrical portion 21 that is fitted tightly to the inner peripheral surface of the roller, and a disk-shaped sheath 22 that is concentrically formed with the cylindrical portion 21 and that faces the roller end surface in a state of being spaced apart. A screw 23 is screwed into the sheath-shaped body 22 at a position displaced by 120 ° in the rotational direction, and the tip of the screw 23 is pressed against the roller end face to fix the rotary shaft 11 and the roller together. Screw 23
By moving the rollers back and forth, it is possible to adjust the eccentricity and centering of the rollers.
尚、前記ローラミル装置の基本構成は上記の通りである
が、ローラによる粉砕時には若干の微粉が発生するので
局所排気を使用することが望ましく、又異物、不純物の
混入を防ぐ為、粉砕機の囲りはクリーンな雰囲気にする
ことが必要である。Although the basic configuration of the roller mill device is as described above, it is desirable to use local exhaust because a slight amount of fine powder is generated when crushed by the roller. It is necessary to create a clean atmosphere.
次にかかる製造装置を用いた、100〜500μmの粒径範囲
に最大収率を示すシリカガラス粉粒体の製造手順につい
て説明する。Next, description will be given of a procedure for producing a silica glass powder having a maximum yield in the particle size range of 100 to 500 μm using the production apparatus.
金属アルコキシド若しくは無機珪酸塩を原料としてゾル
ーゲル法で、1000μm以上の粒径範囲に最大粒度分布を
有する非結晶質二酸化珪素粗粒子を得る。Coarse particles of amorphous silicon dioxide having a maximum particle size distribution in a particle size range of 1000 μm or more are obtained by a sol-gel method using a metal alkoxide or an inorganic silicate as a raw material.
このような粗粒子は具体的には例えばテトラエチルオル
ソシリケートと1%酢酸水溶液とを混合し、加水分解及
び縮重合して得たゲル100kgをプラスチック容器に注入
して恒温槽にて60℃の条件で100時間放置する事により
得られる。Such coarse particles are specifically mixed with, for example, tetraethyl orthosilicate and a 1% acetic acid aqueous solution, and 100 kg of the gel obtained by hydrolysis and polycondensation is injected into a plastic container and the temperature is kept at 60 ° C. in a constant temperature bath. It is obtained by leaving it for 100 hours.
そして前記粗粒子をホッパ1内に収納した後、ローラ10
間隔をほぼ500〜800μm程度に設定した状態で、前記ホ
ッパ1よりロールミル装置2内に粗粒子を投入しなが
ら、一のローラ10Aを駆動回転させる事により、前記粗
粒子をローラ対10間で狭圧−粉砕させつつ分級篩器3で
分級させた所、表1に示すような粒度分布を有するシリ
カガラス粉粒体を得た。尚本実施例の比較の為に、天然
石英ガラスを用いて前記実施例と同様に形成したローラ
10を用いて同様に粉砕した結果を比較例1として示す。After the coarse particles are stored in the hopper 1, the roller 10
With the interval set to approximately 500 to 800 μm, the coarse particles are narrowed between the roller pair 10 by driving and rotating one roller 10A while introducing coarse particles from the hopper 1 into the roll mill device 2. When the particles were classified by a classifier 3 while being pressure-crushed, silica glass powder particles having a particle size distribution as shown in Table 1 were obtained. For comparison with this embodiment, a roller formed of natural quartz glass in the same manner as in the above embodiment
Comparative Example 1 shows the result of grinding in the same manner with 10.
次に本発明の効果を確認する為に実開昭61−195350号に
示すボールミル装置を用いて前記粗粒子を粉砕した結果
を比較例2として示す。Next, in order to confirm the effect of the present invention, the result of crushing the coarse particles using a ball mill device shown in Japanese Utility Model Publication No. 61-195350 is shown as Comparative Example 2.
かかる結果より理解される如く実施例1の粉粒体は高純
度であり500〜74μmの粒径範囲に80%と高い収率を示
すシリカガラス粉粒体を得る事が出来たが、比較例2で
は500〜74μmの粒径範囲の粒度分布が僅かに15%であ
った。又比較例1では純度が低下しているのみならず、
500時間使用後のローラの状態を観察したところ、比較
例1の天然石英ガラスのローラの表面には多数のマイク
ロクラックが認められたが、実施例1ではこのようなマ
イクロクラックが認められなかった。As can be understood from the above results, the powder and granules of Example 1 were highly pure, and it was possible to obtain silica glass powder and granules showing a high yield of 80% in the particle size range of 500 to 74 μm. In No. 2, the particle size distribution in the particle size range of 500 to 74 μm was only 15%. Further, in Comparative Example 1, not only the purity is lowered,
When the state of the roller after 500 hours of use was observed, many microcracks were observed on the surface of the natural quartz glass roller of Comparative Example 1, but no such microcracks were observed in Example 1. .
又比較例1で形成されたシリカガラス粉粒体の純度は元
の粗粒子の純度に比較して低下している事が確認された
が、実施例1のものは粗粒子と同様に高純度であった。It was also confirmed that the purity of the silica glass powder particles formed in Comparative Example 1 was lower than the purity of the original coarse particles. Met.
「発明の効果」 以上記載の如く本発明によれば、高純度で且つ74〜500
μmの粒径範囲において最大収率を得るルツボその他の
各種石英ガラス製品を製造する為に好適なシリカガラス
粉粒体を得る事の出来る製造装置の提供が可能となる。 [Advantages of the Invention] As described above, according to the present invention, a high purity and
It becomes possible to provide a manufacturing apparatus capable of obtaining silica glass powder particles suitable for manufacturing various kinds of quartz glass products such as crucibles which obtain the maximum yield in the particle size range of μm.
等の種々の著効を有す。It has various remarkable effects.
第2図は本発明の実施例にかかるシリカガラス粉粒体製
造装置の概略全体図、第1図はかかる製造装置に用いる
ローラミル装置の構造を示した詳細斜視図である。FIG. 2 is a schematic overall view of a silica glass powder particle manufacturing apparatus according to an embodiment of the present invention, and FIG. 1 is a detailed perspective view showing the structure of a roller mill apparatus used in such a manufacturing apparatus.
Claims (2)
する為に好適なシリカガラス粉粒体の製造装置におい
て、ゾルーゲル法で製造した非結晶質の二酸化珪素粗粒
から成る被粉砕物と、微小間隔をもって離間させて配設
した、合成石英ガラス体からなる一対のローラとを有
し、該被粉砕物を前記一対のローラ間で狭圧させながら
粉砕可能に構成した事を特徴とするシリカガラス粉粒体
の製造装置1. A silica glass powder production apparatus suitable for producing crucibles and other various types of quartz glass products, wherein an object to be crushed is composed of amorphous silicon dioxide coarse particles produced by a sol-gel method, and fine particles. A silica glass characterized in that it has a pair of rollers made of a synthetic quartz glass body, which are spaced apart from each other, and is capable of crushing the object to be crushed while narrowing the pressure between the pair of rollers. Granule production equipment
粒度分布範囲の最大より大にして且つ二酸化珪素粗粒の
粒度分布範囲の最大より小に設定した請求項1)記載の
シリカガラス粉粒体の製造装置2. The silica according to claim 1), wherein the interval of the minute voids is set to be larger than the maximum of the particle size distribution range of the intended powder and granules and smaller than the maximum of the particle size distribution range of the silicon dioxide coarse particles. Glass powder manufacturing equipment
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1190551A JPH0751452B2 (en) | 1989-07-25 | 1989-07-25 | Silica glass powder manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1190551A JPH0751452B2 (en) | 1989-07-25 | 1989-07-25 | Silica glass powder manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0360436A JPH0360436A (en) | 1991-03-15 |
| JPH0751452B2 true JPH0751452B2 (en) | 1995-06-05 |
Family
ID=16259961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1190551A Expired - Lifetime JPH0751452B2 (en) | 1989-07-25 | 1989-07-25 | Silica glass powder manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0751452B2 (en) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58145611A (en) * | 1982-02-23 | 1983-08-30 | Shin Etsu Chem Co Ltd | Crushing and sieving of silicon particle |
| JPS5940443U (en) * | 1982-09-08 | 1984-03-15 | 三井造船株式会社 | Suspended scaffolding for building the equatorial ring |
| JPS59164371A (en) * | 1983-03-09 | 1984-09-17 | Denki Kagaku Kogyo Kk | Production of silicic acid powder |
| JPS6011640U (en) * | 1983-06-30 | 1985-01-26 | 三菱電機株式会社 | synchronous machine |
| JPS6021943A (en) * | 1983-07-15 | 1985-02-04 | 日産自動車株式会社 | Plural yarn selecting wefting apparatus of air jet type loom |
| JPS63166730A (en) * | 1986-12-27 | 1988-07-09 | Shinetsu Sekiei Kk | Production of quartz glass |
| JPH0679531B2 (en) * | 1987-07-04 | 1994-10-12 | 多川工業株式会社 | Cutting machine |
| JPH01108110A (en) * | 1987-10-20 | 1989-04-25 | Dowa Mining Co Ltd | Purification of silicon dioxide |
-
1989
- 1989-07-25 JP JP1190551A patent/JPH0751452B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0360436A (en) | 1991-03-15 |
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