JPH0754574B2 - Perpendicular magnetic recording medium - Google Patents
Perpendicular magnetic recording mediumInfo
- Publication number
- JPH0754574B2 JPH0754574B2 JP60259857A JP25985785A JPH0754574B2 JP H0754574 B2 JPH0754574 B2 JP H0754574B2 JP 60259857 A JP60259857 A JP 60259857A JP 25985785 A JP25985785 A JP 25985785A JP H0754574 B2 JPH0754574 B2 JP H0754574B2
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- film
- soft magnetic
- layer
- magnetic layer
- recording medium
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Description
【発明の詳細な説明】 [技術分野] 本発明は高密度磁気記録ができるCoCr/パーマロイ積層
膜の如く垂直記録層と軟磁性層とを有する二層膜構造の
垂直磁気記録媒体に関する。TECHNICAL FIELD The present invention relates to a perpendicular magnetic recording medium having a two-layer film structure having a perpendicular recording layer and a soft magnetic layer such as a CoCr / permalloy laminated film capable of high density magnetic recording.
[従来技術] 近年、高密度記録特性の優れた磁気記録方式として、垂
直磁気記録方式が提案されている。この方式は、特公昭
58-91号公報,特公昭58-10764号公報等で公知の如く、
磁化容易軸が膜面に対して垂直な方向を有する記録媒体
を用い、残留磁化が膜面に対して垂直に向くように記録
するもので、信号が高密度になるほど媒体内反磁界は減
少し、優れた記録及び再生を行なうことができる。この
方式に適する記録媒体としてCo系合金薄膜(特にCoCr合
金薄膜)が公知である。特に、特公昭58-91号公報に提
案されているCo系合金薄膜の下地にパーマロイ合金のよ
うな軟磁性層を設けた垂直磁気記録媒体は、記録効率が
向上できるとともに、大きな再生出力が得られる点から
注目されている。[Prior Art] In recent years, a perpendicular magnetic recording system has been proposed as a magnetic recording system having excellent high-density recording characteristics. This method is
As known in Japanese Patent Publication No. 58-91, Japanese Patent Publication No. 58-10764, etc.,
The recording medium is such that the easy axis of magnetization is perpendicular to the film surface and the remanent magnetization is oriented perpendicular to the film surface. The higher the signal density, the smaller the demagnetizing field inside the medium. Excellent recording and reproduction can be performed. A Co-based alloy thin film (especially CoCr alloy thin film) is known as a recording medium suitable for this system. In particular, a perpendicular magnetic recording medium provided with a soft magnetic layer such as a permalloy alloy as an underlayer of a Co-based alloy thin film proposed in JP-B-58-91 can improve recording efficiency and obtain a large reproduction output. It is attracting attention because it is used.
しかしながら軟磁性層を設けたことにより新たに発生し
た問題点もいくつか報告されている。例えば特開昭60-3
8718号公報には軟磁性層の磁気特性に由来し、一つの媒
体において磁気ヘッドの走行方向で再生出力が異なると
いう現象が述べられており、その解決法として軟磁性層
の面内磁気異方性を小さくすべきことが開示されてい
る。また、電子通信学会技術研究報告MR84-6(vol.84,N
o.61,1984)には、信号の再生時に発生するパルス状ノ
イズが軟磁性層に起因していることが述べられ、その解
決法として軟磁性層のHcを5エルステッド(Oe)より大
きくすればよいことが述べられている。However, some problems that have newly occurred due to the provision of the soft magnetic layer have been reported. For example, JP-A-60-3
Japanese Patent No. 8718 describes a phenomenon in which the reproduction output differs depending on the running direction of the magnetic head in one medium due to the magnetic characteristics of the soft magnetic layer. It is disclosed that the sex should be reduced. In addition, IEICE technical report MR84-6 (vol.84, N
o.61, 1984), it is stated that pulse-like noise generated during signal reproduction is caused by the soft magnetic layer, and as a solution to this problem, Hc of the soft magnetic layer can be set larger than 5 Oersted (Oe). It is stated that it is good.
以上の如く、軟磁性層と記録層との二層膜構造の垂直磁
気記録媒体(以下、二層膜媒体と称す)は再生出力が大
きいというすぐれた特徴を有し、実用化が一番期待され
ているものであるが、軟磁性層の不安定さに由来する種
々の課題を有しており、これら課題の解決が待望されて
いる。As described above, a perpendicular magnetic recording medium having a double-layer film structure of a soft magnetic layer and a recording layer (hereinafter referred to as a double-layer film medium) has an excellent feature that the reproduction output is large, and is most expected to be put into practical use. However, there are various problems resulting from the instability of the soft magnetic layer, and there is a long-awaited solution to these problems.
[本発明の目的] 本発明は記録層と軟磁性層とを有する二層膜構造の垂直
磁気記録媒体において、すぐれた再生出力の安定性、す
なわち出力エンベロープの滑らかさを有する垂直磁気記
録媒体を提案するものである。[Object of the Invention] The present invention provides a perpendicular magnetic recording medium having a double-layered film structure having a recording layer and a soft magnetic layer, which has excellent reproduction output stability, that is, smooth output envelope. It is a proposal.
[本発明の構成および作用効果] 本発明者らは50μm程度の厚さを有する有機高分子フイ
ルムを支持体とする二層膜媒体を研究する過程で、ある
種の軟磁性層を有する二層膜媒体において再生出力に波
打ちが生じる、又は/及び再生出力エンベロープに突起
状の凸部が発生することを見い出した。その例を第5
図,第6図に示した。本発明者らはかかる不都合な現象
は軟磁性層の磁歪に関与し、記録,再生時にヘッドが摺
動することにより部分的に軟磁性層の磁気特性が変化す
ることに起因するのであろうと考え、研究を重ねること
により本発明に至った。[Structure and Effect of the Present Invention] In the process of studying a two-layer film medium using an organic polymer film having a thickness of about 50 μm as a support, the present inventors have prepared a two-layer film having a soft magnetic layer. It has been found that the reproduction output of the film medium is wavy or / and the reproduction output envelope has protrusions. Example 5
It is shown in Fig. 6 and Fig. 6. The inventors believe that such an inconvenient phenomenon is related to the magnetostriction of the soft magnetic layer and partially caused by the sliding of the head at the time of recording / reproducing to partially change the magnetic characteristics of the soft magnetic layer. The present invention has been achieved through repeated research.
すなわち、本発明は記録層と軟磁性層を有する垂直磁気
記録媒体において、軟磁性層が膜面内で測定される磁歪
定数(λ)が−1×10-6より大きく1×106以下であ
り、かつ保磁力(Hc)が30エルステッド(Oe)以下の軟
磁性層(但し、磁化容易軸が膜面にほぼ垂直を向いてい
るかあるいは面内でもリング状磁気ヘッドで記録・再生
する時に軟磁性層を流れる磁力線に対しほぼ直角方向を
向いている軟磁性層を除く)であることを特徴とする垂
直磁気記録媒体である。That is, according to the present invention, in a perpendicular magnetic recording medium having a recording layer and a soft magnetic layer, the magnetostriction constant (λ) measured in the film surface of the soft magnetic layer is larger than -1 × 10 -6 and 1 × 10 6 or less. A soft magnetic layer with a coercive force (Hc) of 30 Oersted (Oe) or less (however, the easy axis of magnetization is almost perpendicular to the film surface, or even if in-plane, a soft magnetic layer is used when recording / reproducing with a ring-shaped magnetic head. The perpendicular magnetic recording medium is characterized in that it is a soft magnetic layer that is oriented almost at right angles to the magnetic force lines flowing through the magnetic layer).
以下、本発明の詳細を説明する。Hereinafter, the details of the present invention will be described.
第1図に本発明の好ましい垂直磁気記録媒体の構成を示
した。図においてFは支持材であり、非磁性の金属,非
金属のシートが通常は使用される。磁気テープ,フロッ
ピーディスク,スチル電子カメラ,画像ファイル等の用
途には、ポリエチレンテレフタレート,ポリエチレン−
2,6−ナフタレンジカルボキシレート,ポリイミド等の
4μm〜120μm程度の厚さの有機高分子フイルムが好
ましく用いられる。特に磁気ヘッドとの摺動により発生
する歪の大きい,軟質の有機高分子フイルムを支持体と
する場合に本発明の効果は大きい。FIG. 1 shows the constitution of a preferable perpendicular magnetic recording medium of the present invention. In the figure, F is a support material, and a non-magnetic metal or non-metal sheet is usually used. For applications such as magnetic tapes, floppy disks, still electronic cameras, and image files, polyethylene terephthalate, polyethylene-
An organic polymer film having a thickness of about 4 μm to 120 μm such as 2,6-naphthalene dicarboxylate or polyimide is preferably used. In particular, the effect of the present invention is great when a soft organic polymer film having a large strain generated by sliding with the magnetic head is used as the support.
図のSは本発明の特徴をなす軟磁性層であり、詳細は後
述する。50Oe程度以下のHcを有する厚さ0.1μm〜0.7μ
m程度のものが通常は用いられる。材質は種々のものが
適用可能であり、CoZr系のアモルファス合金膜やNiFe系
合金(パーマロイ)薄膜等を例示できる。特に原材料コ
ストが安く、材料入手が容易で、かつ適当な磁気特性を
有することよりパーマロイが好ましい。パーマロイには
NiFe合金のみでなくMoパーマロイ,CuMoパーマロイ,耐
食性パーマロイ,高硬度パーマロイ等の種々のものがあ
り、いずれも適用可能である。作製法は真空蒸着,スパ
ッタリング,イオンプレーティング,メッキ等が例示で
きるが、軟磁気特性と膜強度,膜付着強度が良好であ
り、合金の組成のコントロールが容易なスパッタリング
法が最も好ましく本発明に適用される。S in the drawing is a soft magnetic layer which is a feature of the present invention, and the details will be described later. Thickness Hc of about 50 Oe or less 0.1 μm to 0.7 μm
Those of about m are usually used. Various materials can be applied, and examples thereof include CoZr-based amorphous alloy film and NiFe-based alloy (permalloy) thin film. Particularly, permalloy is preferable because the raw material cost is low, the material is easily available, and it has suitable magnetic properties. For Permalloy
Not only NiFe alloys but also various types such as Mo permalloy, CuMo permalloy, corrosion resistant permalloy, and high hardness permalloy, all of which are applicable. Examples of the production method include vacuum vapor deposition, sputtering, ion plating, plating, etc., but the sputtering method is most preferable because it has good soft magnetic properties, film strength, and film adhesion strength, and the composition of the alloy can be easily controlled. Applied.
図のRは記録層であり、飽和磁化(Ms)が200〜900emu/
cc程度のCoとCrの合金薄膜が好ましく使用される。他に
CoとCrにさらに数wt%のRe,W,Mo,Ta等の第3元素を添加
したものや、CoV合金薄膜,FeCr合金薄膜や、さらにはCo
-CoO蒸着膜であってもよい。要は適度のMsと数百OeのHc
と垂直磁気異方性を有する厚さ0.1μm〜0.5μm程度の
薄膜が使用される。R in the figure is the recording layer, and the saturation magnetization (Ms) is 200 to 900 emu /
An alloy thin film of Co and Cr of about cc is preferably used. other
Co and Cr to which several wt% of third elements such as Re, W, Mo and Ta are added, CoV alloy thin film, FeCr alloy thin film, and further Co
It may be a CoO vapor deposition film. The point is a moderate Ms and Hc of several hundred Oe.
A thin film having perpendicular magnetic anisotropy and a thickness of about 0.1 μm to 0.5 μm is used.
図のPは必要に応じて設けられる耐久性等を目的とした
保護層である。例えば耐久性を保証するためにSiO2,硬
質カーボン,SiN等の厚さ0.01μm〜0.03μm程度の薄膜
が設けられる。P in the figure is a protective layer provided for the purpose of durability and the like provided as necessary. For example, a thin film of SiO 2 , hard carbon, SiN or the like having a thickness of about 0.01 μm to 0.03 μm is provided to ensure durability.
さらに、各層F,S,R,P間に他の中間層,下地層,接着層
等を有してもよい。またフロッピーディスク等のディス
ク状媒体では支持体Fの両面に同じ構成の各層が形成さ
れるのが普通である。Further, other intermediate layers, base layers, adhesive layers, etc. may be provided between the layers F, S, R, P. Further, in a disk-shaped medium such as a floppy disk, it is usual that each layer of the same structure is formed on both surfaces of the support F.
以下に本発明の特徴である軟磁性層を説明する。The soft magnetic layer which is a feature of the present invention will be described below.
本発明においては、再生出力を安定ならしめるために、
膜面内で測定されるλを−1×10-6以上で1×10-6以下
の範囲とする。すなわち、絶対値が1×10-6より小さい
λの軟磁性膜を用いる。ただし該軟磁性膜のHcが30Oeよ
り大なる時は軟磁気特性(例えばHcや透磁率)の外乱に
対して安定でありλを規定する意味はない。In the present invention, in order to stabilize the reproduction output,
The λ measured in the film plane is in the range of -1 × 10 -6 or more and 1 × 10 -6 or less. That is, a soft magnetic film of λ whose absolute value is smaller than 1 × 10 −6 is used. However, when Hc of the soft magnetic film is larger than 30 Oe, the soft magnetic film is stable against the disturbance of the soft magnetic characteristics (for example, Hc and magnetic permeability), and it is meaningless to define λ.
膜のλの絶対値が1×10-6より大きい時は、膜の軟磁気
特性は不安定であり、磁気ヘッドが媒体を摺動する時に
軟磁気特性が変化し、再生出力エンベロープに波打ちや
凸部や突起が発生することが判明した。When the absolute value of λ of the film is larger than 1 × 10 -6 , the soft magnetic property of the film is unstable, and when the magnetic head slides on the medium, the soft magnetic property changes, causing waviness in the reproduction output envelope. It was found that convex parts and protrusions were generated.
記録,再生感度をより一層向上せしめるには軟磁性層の
Hcは15Oe程度以下が必要であり、さらに前述の様にノイ
ズを小さくするために、又はディスク状媒体におけるモ
ジュレーション(JIS C 6291参照)を小さくするために
は軟磁性層の面内磁気異方性を小さくする必要がある
が、かかる目的のためにはHcは3Oe程度以上が必要であ
る。このようなHcを有する軟磁性膜ではそのλは−7×
10-7以上で7×10-7以下の範囲、すなわちHcが小さいこ
とは軟磁気特性が不安定てあることを意味し、かかる場
合は、より絶対値が小さいλが要求されることが判明し
た。To further improve the recording and reproducing sensitivity, the soft magnetic layer
Hc needs to be about 15 Oe or less, and in order to reduce noise as described above or to reduce modulation (see JIS C 6291) in the disk-shaped medium, the in-plane magnetic anisotropy of the soft magnetic layer is required. However, Hc needs to be about 3 Oe or more for this purpose. In a soft magnetic film having such Hc, its λ is −7 ×
A range of 10 -7 or more and 7 × 10 -7 or less, that is, a small Hc means that the soft magnetic characteristics are unstable. In such a case, it was found that λ with a smaller absolute value is required. did.
第2図〜第6図に種々のHcとλを有する軟磁性膜持つCo
Cr/パーマロイからなる二層膜媒体の一定長の間の再生
出力エンベロープを示した。図で縦軸は出力,横軸は時
間換言すればサンプル位置である。媒体の作製条件と電
磁変換特性の測定方法は後述の実施例に述べる。2 to 6 show Co having a soft magnetic film having various Hc and λ.
The reproduction output envelope for a fixed length of a bilayer film medium composed of Cr / Permalloy is shown. In the figure, the vertical axis is the output, and the horizontal axis is the time, in other words, the sample position. The manufacturing conditions of the medium and the method of measuring the electromagnetic conversion characteristics will be described in Examples below.
第7図は後述の実施例,比較例と同様にして磁歪定数
(λ)と保磁力(Hc)とが異なる種々のパーマロイ膜を
軟磁性層とし、その上にCoCr合金膜からなる記録層を設
けた二層媒体の再生出力を評価した結果を示したもの
で、Hcとλの絶対値に対して再生出力エンベロープの良
否を◎印〜×印の4段階評価で示した。第2図の様なノ
イズがなく平坦な良好なエンベロープ波形を示した時を
◎印で示し、これに近いものは○印,第3図と第4図の
様な明確に小さな突起や凸部が観察される時を△印,第
5図と第6図の様な凸部や突起も大きく長周期の波も観
察される時を×印で示した。△印の場合は記録再生シス
テムやヘッド搭載方法によっては良好な形状のエンベロ
ープを得る可能性があるものである。第7図より安定し
た均一な再生出力を得るためには|λ|≦1×10-6,好
ましくは|λ|≦7×10-7が必要なことが理解される。FIG. 7 shows various Permalloy films having different magnetostriction constants (λ) and coercive forces (Hc) as soft magnetic layers, and recording layers made of CoCr alloy films formed thereon, as in Examples and Comparative Examples described later. The result of evaluation of the reproduction output of the provided two-layer medium is shown, and the quality of the reproduction output envelope with respect to the absolute values of Hc and λ is shown by four grades from ⊚ to ×. When a good envelope waveform with no noise as shown in Fig. 2 is shown, it is indicated by ⊚. Is indicated by a triangle, and the time when a long-period wave with large convex portions and protrusions as shown in FIGS. 5 and 6 is also observed is indicated by a cross. In the case of Δ, an envelope with a good shape may be obtained depending on the recording / reproducing system and the method of mounting the head. From FIG. 7, it is understood that | λ | ≦ 1 × 10 −6 , preferably | λ | ≦ 7 × 10 −7 is required to obtain a stable and uniform reproduction output.
次に磁歪定数(λ)の測定方法を支持体フイルムFの片
面にλが正の一つの軟磁性層(S)を有する場合を例と
して、第8図〜第12図を用いて説明する。本発明に言う
膜面内で測定される磁歪定数(λ)とは、下記の手法で
求められる値である。Next, a method of measuring the magnetostriction constant (λ) will be described with reference to FIGS. 8 to 12 by taking as an example the case where one side of the support film F has one soft magnetic layer (S) with positive λ. The magnetostriction constant (λ) measured in the film plane according to the present invention is a value obtained by the following method.
(1)軟磁性膜(S)が磁化容易(easy)軸と磁化困難
(hard)軸を有するときは、第8図のようにeasy軸を長
さ方向としmの幅に試料を切り出す。そして、図示の如
くm×mの正方形に軟磁性膜(S)を残し、他の部分を
除去する。mは磁化特性の測定機の感度により適当に選
べばよいが、本発明ではm=7mmとした。このような形
状にするのは後述のように張力fを膜(S)に加えなが
ら飽和磁化特性(M−H曲線)を測定するのに都合がよ
いからである。(1) When the soft magnetic film (S) has an easy axis (easy) and a hard axis (hard), a sample is cut into a width of m with the easy axis as the longitudinal direction as shown in FIG. Then, as shown in the drawing, the soft magnetic film (S) is left in the m × m square, and the other portions are removed. Although m may be appropriately selected depending on the sensitivity of the measuring device for the magnetization characteristics, m = 7 mm in the present invention. Such a shape is convenient for measuring the saturation magnetization characteristic (MH curve) while applying the tension f to the film (S) as described later.
(2)第9図のようにフイルムFに張力fを加えながら
M−H曲線を測定する。第9図は公知の交流M−Hトレ
ーサーの概略構成図であり、張力を加えながら測定でき
る様に試料ホルダーは工夫してある。(2) The MH curve is measured while applying the tension f to the film F as shown in FIG. FIG. 9 is a schematic configuration diagram of a known AC MH tracer, and the sample holder is devised so that measurement can be performed while applying tension.
図の1はヘルムホルツコイル,2は検出コイル,3はフリー
ロール,Sは軟磁性膜である。チャック4によりフイルム
Fの一端を固定し、他端に張力fを加えるようになって
いる。本図は張力fを加えた方向のM−H曲線を測定す
るようになっているが、λ>0の場合は張力を加えた方
向に直角な方向(試料の巾方向)のM−H曲線を測定す
るのが好ましい。In the figure, 1 is a Helmholtz coil, 2 is a detection coil, 3 is a free roll, and S is a soft magnetic film. The chuck 4 fixes one end of the film F and applies tension f to the other end. This figure is designed to measure the MH curve in the direction in which the tension f is applied. However, in the case of λ> 0, the MH curve in the direction perpendicular to the direction in which the tension is applied (width direction of the sample). Is preferably measured.
(3)第10図は張力f=0.4kgfを加えながら測定したha
rd軸方向のM−H曲線である。原点より増磁曲線に接線
を引き、飽和磁化(Ms)のラインとの交点を求め、交点
の示す磁場をHkとする。(3) Fig. 10 shows ha measured with tension f = 0.4 kgf.
It is an MH curve in the direction of the rd axis. A tangent line is drawn from the origin to the magnetization curve to find the intersection with the saturation magnetization (Ms) line, and the magnetic field indicated by the intersection is Hk.
第11図は張力f=1kgfを加えた時のhard軸方向のM−H
軸線である。張力を大きくした時に、張力を加えた方向
に直角な方向をhard軸とする磁気異方性(Hk)が増大す
る場合がλ>0である。Figure 11 shows MH in the hard axis direction when tension f = 1kgf is applied.
It is an axis. When the tension is increased, λ> 0 when the magnetic anisotropy (Hk) having the hard axis in the direction perpendicular to the direction in which the tension is applied increases.
(4)第12図は、上記第10図と第11図に示した手法によ
り測定したHkの値を張力fに対してプロットしたもので
ある。(4) FIG. 12 is a plot of the value of Hk measured by the method shown in FIGS. 10 and 11 above against the tension f.
第12図よりHkとfとの関係の勾配(b/a)が求まり、単
位張力当りのHkの変化巾を求めることができる。Hkの変
化巾(ΔHkと以下に記す)はλの大小に関与し、後述の
第(6)項に示すλの計算式に用いる。From FIG. 12, the gradient (b / a) of the relationship between Hk and f can be found, and the change width of Hk per unit tension can be found. The width of change in Hk (hereinafter referred to as ΔHk) is related to the magnitude of λ, and is used in the formula for calculating λ shown in item (6) below.
上記第(1)項ではeasy軸方向を長さ方向としてサンプ
リングするとしたが、λ<0の場合はhard軸方向よりサ
ンプリングし、第9図の構成でhard軸方向を測定するの
がよい。また無張力下で異方性(Hk)が非常に大きい場
合は張力を加えることによるHkの減少分を求めてもよ
い。また、面内で等方的な磁気特性を有する時は任意の
方向で測定してもよい。In the above item (1), the easy axis direction is used as the length direction for sampling, but when λ <0, it is preferable to sample from the hard axis direction and measure the hard axis direction with the configuration of FIG. Further, when the anisotropy (Hk) is very large under no tension, the reduction amount of Hk by applying tension may be calculated. Moreover, when it has an isotropic magnetic property in the plane, it may be measured in any direction.
以下にλの計算式を示す。The calculation formula of λ is shown below.
(5)第8図において、フイルムFの厚さをDf,ヤング
率をEfとし、軟磁性膜(S)の厚さをDs,ヤング率をEs
とする。fの張力が加わることによる膜(S)に働く応
力(σ)は下記式となる。(5) In FIG. 8, the thickness of the film F is Df, the Young's modulus is Ef, the thickness of the soft magnetic film (S) is Ds, and the Young's modulus is Es.
And The stress (σ) acting on the film (S) due to the tension of f is given by the following formula.
応力(σ)=(f・Es)/(Es・Df・m+Ef・Df・m) 以上は膜(S)に働く応力(σ)を求める一例を示した
ものであり、歪ゲージ等を用いて応力(σ)を求めても
よい。Stress (σ) = (f · Es) / (Es · Df · m + Ef · Df · m) The above is an example of finding the stress (σ) acting on the film (S), using a strain gauge or the like. The stress (σ) may be obtained.
(6)下記式により磁歪定数(λ)を求めるものとす
る。(6) The magnetostriction constant (λ) is calculated by the following equation.
磁歪定数(λ)=(Is/3)×(ΔHk/σ′) ただし、Isは飽和磁化[wb/m2],σ′は単位張力当り
の膜(S)に加わる応力[(N/m2)/kgf],ΔHkは上述
の単位張力当りのHkの変化分[(A/m)/kgf]である。Magnetostriction constant (λ) = (Is / 3) × (ΔHk / σ ′) where Is is saturation magnetization [wb / m 2 ] and σ ′ is stress applied to the film (S) per unit tension [(N / m 2 ) / kgf], ΔHk is the change in Hk per unit tension [(A / m) / kgf].
以上述べた手法は軟質の支持材、すなわち有機高分子フ
イルムに好適である。硬質の支持材では上記の手法に開
示されている原理に従ってλを求めることができる。ま
た、記録層が積層された状態のものでも上記(5)項に
示されている原理に従い、記録層のヤング率がわかれば
求めることができる。軟磁性層(S)と記録層(R)の
ヤング率は、λに与える誤差は小さいのでおおよその値
が判ればよい。The method described above is suitable for a soft support material, that is, an organic polymer film. For a rigid support, λ can be determined according to the principles disclosed in the above method. Further, even in the state where the recording layers are laminated, it can be obtained by knowing the Young's modulus of the recording layers according to the principle described in the above item (5). The Young's modulus of the soft magnetic layer (S) and the recording layer (R) has a small error given to λ, and therefore an approximate value can be known.
磁歪定数(λ)が絶対値で1×10-6より小さい軟磁性層
を得るには、まず軟磁性層の構成元素の組成を選べばよ
い。しかし、公知のようにλは結晶軸の方向により異る
のが普通であり、軟磁性膜の結晶格子構造と、該膜の結
晶配向性の影響等も受ける。To obtain a soft magnetic layer whose magnetostriction constant (λ) is smaller than 1 × 10 −6 in absolute value, first, the composition of the constituent elements of the soft magnetic layer may be selected. However, as is known, λ usually differs depending on the direction of the crystal axis, and is affected by the crystal lattice structure of the soft magnetic film and the crystal orientation of the film.
よって、軟磁性膜の作製方法と作製条件に由来する膜の
微細構造を考慮しつつ組成を選択する必要がある。第13
図にMoを5wt%含有するNiFeMo(Moパーマロイ)におけ
るNi含有量と磁歪定数(λ)との関係を示した。第13図
は、スパッタリング法で作製した面心立方結晶構造を有
し<111>軸が弱く垂直配向した約0.25μm〜0.50μm
のMoパーマロイ薄膜の一例であり、本特許を何ら制限す
るものではない。Therefore, it is necessary to select the composition in consideration of the method of manufacturing the soft magnetic film and the film microstructure derived from the manufacturing conditions. Thirteenth
The figure shows the relationship between the Ni content and the magnetostriction constant (λ) in NiFeMo (Mo permalloy) containing 5 wt% of Mo. FIG. 13 shows a 0.25 μm to 0.50 μm vertically oriented with weak <111> axis having a face-centered cubic crystal structure produced by sputtering.
This is an example of the Mo permalloy thin film, and does not limit this patent in any way.
以下に実施例を示す。Examples will be shown below.
[実施例] 50μmの厚さの二軸配向ポリエチレンテレフタレートの
フイルムを支持体Fとし、該支持体上に、直流二極マグ
ネトロンスパッタ装置を用い下記の条件下でパーマロイ
薄膜SとCoCr合金薄膜Rを順次積層した。Example A film of biaxially oriented polyethylene terephthalate having a thickness of 50 μm was used as a support F, and a permalloy thin film S and a CoCr alloy thin film R were formed on the support F under the following conditions using a DC bipolar magnetron sputtering device. The layers were sequentially laminated.
(1)装置 日電アネルバ(株)製,型式SPF-430Hを用いた。4イン
チのターゲット3個を有し、真空中で3つの層の積層が
可能である。(1) Device A model SPF-430H manufactured by Nichiden Anelva Co., Ltd. was used. It has three 4-inch targets and is capable of stacking three layers in vacuum.
また、強力な永久磁石を配し、4mm厚さの強磁性体ター
ゲットのスパッタが可能な様に改造した。さらに、基板
取付部は、下記の条件が可能な様に改造した。In addition, a powerful permanent magnet was placed and modified to enable sputtering of a ferromagnetic target with a thickness of 4 mm. Furthermore, the board mounting part was modified so that the following conditions were possible.
(2)基板 上記フイルムを16cm直径の円型金枠に展張し取り付け、
膜堆積中は18rpmで回転させた。また外部より直流電位
(Vb;バイアス電圧)を印加できるようになっている
(バイアススパッタ法は、例えば、特開昭57-34324号の
第4図参照)。(2) Substrate The film is stretched and attached to a circular metal frame with a diameter of 16 cm,
It was rotated at 18 rpm during film deposition. A direct current potential (Vb; bias voltage) can be applied from the outside (for the bias sputtering method, see, for example, FIG. 4 of JP-A-57-34324).
(3)スパッタ条件 (3−1)パーマロイ薄膜S; Mo5.0wt%,Mn0.02wt%,Fe16.1wt%,残部Ni(99.9%純
度)の組成を有するパーマロイターゲットを使用し、基
板とターゲットとの間隔55.5mm,アルゴンガス圧0.8Pa,
投入電力300wattで10分37秒間、基板に−100voltのVb電
圧を印加しながらスパッタした。(3) Sputtering conditions (3-1) Permalloy thin film S; Mo5.0wt%, Mn0.02wt%, Fe16.1wt%, balance Ni (99.9% purity) was used as the substrate and the target. Interval 55.5mm, argon gas pressure 0.8Pa,
Sputtering was performed with an applied power of 300 watt for 10 minutes and 37 seconds while applying a Vb voltage of −100 volt to the substrate.
なお、このスパッタ条件で得られるパーマロイ薄膜のλ
は5.2×10-7であった。The λ of the permalloy thin film obtained under these sputtering conditions
Was 5.2 × 10 −7 .
(3−2)CoCr合金薄膜R; Cr20wt%,残部Co(99.9%純度)より成るCoCr合金ター
ゲットを使用し、基板とターゲットとの間隔55.5mm,ア
ルゴンガス圧0.4Pa,投入電力500wattで2分17秒間のス
パッタを行った。スパッタ時に−70voltの電圧(Vb)を
印加した。(3-2) CoCr alloy thin film R: Using a CoCr alloy target consisting of Cr 20 wt% and the balance Co (99.9% purity), the distance between the substrate and the target is 55.5 mm, the argon gas pressure is 0.4 Pa, and the input power is 500 watt for 2 minutes. Sputtering was performed for 17 seconds. A voltage of -70 volt (Vb) was applied during sputtering.
(4)評価結果 得られたCoCr/パーマロイ二層膜媒体の中心より半径45m
mの所の静特性は下記であった。(4) Evaluation result Radius 45m from the center of the obtained CoCr / permalloy bilayer film medium
The static characteristics at m were as follows.
CoCr膜: 膜厚…0.20μm 垂直方向保磁力(Hcv)…680Oe 実効的異方性磁界(Hk)…(4.3±0.1)kOeパーマロイ
膜: 膜厚…0.53μm 保磁力…(9±1)Oe(CoCr膜とパーマロイ膜の積層状
態で、M−Hトレーサーを用い評価した。) 半径45mmの所を中心とし、半径方向と円周方向の2方向
より0.5インチ巾,60mm長の長方形の試料をサンプリング
し、市販の0.5インチ巾のVTRテープにつなぎ込み下記表
−1の条件で電磁変換特性を測定した。測定結果を表−
2に示した。CoCr film: 0.20 μm Coercive force in the vertical direction (Hcv)… 680 Oe Effective anisotropic magnetic field (Hk)… (4.3 ± 0.1) kOe Permalloy film: Film thickness… 0.53 μm Coercive force… (9 ± 1) Oe (A CoCr film and a permalloy film were laminated and evaluated using an MH tracer.) A rectangular sample centered at a radius of 45 mm and having a width of 0.5 inch and a length of 60 mm from two directions, the radial direction and the circumferential direction, was used. Sampling was performed, the tape was connected to a commercially available VTR tape having a width of 0.5 inch, and the electromagnetic conversion characteristics were measured under the conditions shown in Table 1 below. Table of measurement results
Shown in 2.
前述の第2図は本実施例の半径方向の2KBPIKの記録密度
における再生出力エンベロープを示したものである。な
お、第2図〜第6図はすべて各サンプルの2KBPIにおけ
るエンベロープの測定長約40mmの部分である。 FIG. 2 described above shows the reproduction output envelope at the recording density of 2 KBPIK in the radial direction of this embodiment. It should be noted that FIGS. 2 to 6 are all the portions of each sample at a measurement length of about 40 mm of the envelope at 2 KBPI.
[比較例] 実施例と同様に、ただし、パーマロイ・ターゲットとし
て、Cu4.51wt%,Mo3.82wt%,Mn0.52wt%,Fe13.64wt%,
残部NiよりなるCuMoパーマロイを用い、二層膜媒体を作
製した。このCuMoパーマロイ薄膜のλは1.2×10-6であ
り、Hcは4.5±3OeであったCoCr膜の特性は実施例と略同
じであった。[Comparative Example] Similar to the example, except that Cu4.51 wt%, Mo3.82 wt%, Mn0.52 wt%, Fe13.64 wt%, as a permalloy target,
A CuMo permalloy consisting of the balance Ni was used to fabricate a two-layer film medium. The λ of this CuMo permalloy thin film was 1.2 × 10 −6 , and the Hc was 4.5 ± 3 Oe. The characteristics of the CoCr film were almost the same as those of the example.
実施例と同様に評価した電磁変換特性の結果を表−3に
示す。Table 3 shows the results of electromagnetic conversion characteristics evaluated in the same manner as in the example.
以上のように本発明になる軟磁性層を有する二層膜媒体
はすぐれた再生出力の安定性を示した。 As described above, the two-layer film medium having the soft magnetic layer according to the present invention has excellent reproduction output stability.
第1図は本発明の垂直磁気記録媒体の代表的な構成を示
した断面図であり、Fは支持体,Sは軟磁性層,Rは記録
層,Pは保護層である。 第2図〜第6図は再生出力エンベロープの代表的な形を
示したもので、第2図が良好な場合、第5図と第6図が
不良なものであり、第3図と第4図が両者の中間的なも
のである。 第7図は種々の軟磁性層の保磁力Hcと磁歪定数の絶対値
|λ|に対して、該軟磁性層を有する二層膜媒体の再生
出力エンベロープの良否を示したものである。 第8図〜第11図は磁歪定数λを求める方法の説明図であ
り、第8図は測定サンプルの形状,第9図はM−Hトレ
ーサーにサンプルをセットした状態,第10図と第11図は
張力を加えながら測定された磁化困難軸方向のM−Hル
ープとHk値の求め方を示したものである。第12図は張力
fによるHkの変化をプロットしたものである。 第13図はMoパーマロイにおいて、Ni含有量に対し磁歪定
数λを示したものである。FIG. 1 is a cross-sectional view showing a typical constitution of the perpendicular magnetic recording medium of the present invention. F is a support, S is a soft magnetic layer, R is a recording layer, and P is a protective layer. 2 to 6 show typical shapes of the reproduction output envelope. When FIG. 2 is good, FIG. 5 and FIG. 6 are bad, and FIG. 3 and FIG. The figure is something in between. FIG. 7 shows the quality of the reproduction output envelope of the two-layer film medium having the soft magnetic layer with respect to the coercive force Hc and the absolute value | λ | of the magnetostriction constant of various soft magnetic layers. 8 to 11 are explanatory views of the method for obtaining the magnetostriction constant λ, FIG. 8 is the shape of the measurement sample, FIG. 9 is the state in which the sample is set on the MH tracer, FIG. 10 and FIG. The figure shows how to obtain the MH loop and the Hk value in the hard axis direction measured while applying tension. FIG. 12 is a plot of the change in Hk with tension f. FIG. 13 shows the magnetostriction constant λ with respect to the Ni content in Mo permalloy.
Claims (3)
層膜構造の垂直磁気記録媒体において、前記軟磁性層を
膜面内で測定される磁歪定数(λ)が−1×10-6以上1
×10-6以下であり、かつ保磁力(Hc)が30エルステッド
(Oe)以下の軟磁性層(但し、磁化容易軸が膜面にほぼ
垂直を向いているかあるいは面内でもリング状磁気ヘッ
ドで記録・再生する時に軟磁性層を流れる磁力線に対し
ほぼ直角方向を向いている軟磁性層を除く)としたこと
を特徴とする垂直磁気記録媒体。1. In a perpendicular magnetic recording medium having a two-layer film structure having a soft magnetic layer and a recording layer on a support, a magnetostriction constant (λ) measured in the film plane of the soft magnetic layer is -1 ×. 10 -6 or more 1
× 10 -6 or less and a coercive force (Hc) of 30 Oersted (Oe) or less in the soft magnetic layer (however, if the easy axis of magnetization is almost perpendicular to the film surface or in-plane, the ring-shaped magnetic head A perpendicular magnetic recording medium characterized in that the soft magnetic layer is oriented in a direction substantially perpendicular to the magnetic field lines flowing through the soft magnetic layer when recording / reproducing).
あり、かつ磁歪定数(λ)が−7×10-7以上7×10-7以
下である特許請求の範囲第(1)項記載の垂直磁気記録
媒体。2. A soft magnetic layer having a coercive force (Hc) of 15 Oe or less and a magnetostriction constant (λ) of −7 × 10 −7 or more and 7 × 10 −7 or less. ) The perpendicular magnetic recording medium according to the item.
の範囲第(1)項、若しくは第(2)項記載の垂直磁気
記録媒体。3. The perpendicular magnetic recording medium according to claim 1, wherein the soft magnetic layer is permalloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60259857A JPH0754574B2 (en) | 1985-11-21 | 1985-11-21 | Perpendicular magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60259857A JPH0754574B2 (en) | 1985-11-21 | 1985-11-21 | Perpendicular magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62121924A JPS62121924A (en) | 1987-06-03 |
| JPH0754574B2 true JPH0754574B2 (en) | 1995-06-07 |
Family
ID=17339935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60259857A Expired - Lifetime JPH0754574B2 (en) | 1985-11-21 | 1985-11-21 | Perpendicular magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0754574B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4207140B2 (en) | 2000-04-06 | 2009-01-14 | 富士電機デバイステクノロジー株式会社 | Perpendicular magnetic recording medium and manufacturing method thereof |
| JP4539282B2 (en) * | 2004-04-16 | 2010-09-08 | 富士電機デバイステクノロジー株式会社 | Disk substrate for perpendicular magnetic recording medium and perpendicular magnetic recording medium using the same |
| JP5737676B2 (en) * | 2011-03-23 | 2015-06-17 | 昭和電工株式会社 | Magnetic recording medium and magnetic recording / reproducing apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5868226A (en) * | 1981-10-16 | 1983-04-23 | Hitachi Ltd | magnetic recording medium |
-
1985
- 1985-11-21 JP JP60259857A patent/JPH0754574B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62121924A (en) | 1987-06-03 |
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