JPH0755953B2 - Manufacturing method of diaminopropyldisiloxane - Google Patents
Manufacturing method of diaminopropyldisiloxaneInfo
- Publication number
- JPH0755953B2 JPH0755953B2 JP62108175A JP10817587A JPH0755953B2 JP H0755953 B2 JPH0755953 B2 JP H0755953B2 JP 62108175 A JP62108175 A JP 62108175A JP 10817587 A JP10817587 A JP 10817587A JP H0755953 B2 JPH0755953 B2 JP H0755953B2
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- represented
- formula
- reaction
- diaminopropyldisiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
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- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】 〔従来の技術〕 IC、トランジスター等の電子部品の製造に用いられるプ
ラスチックモールデイングコンパウンドとしては、一般
に、エポキシ樹脂が用いられている。ICの集積度が高く
なるにつれ、このエポキシ樹脂にも可とう性が強く要求
されるため、分子内にソフトセグメントを組み入れるな
どしてエポキシ樹脂に可とう性を付与する試みがなされ
ている。オルガノシロキサンは、分子容積が大きく、シ
ロキサン結合の結合距離が長く、しかも分子回転の自由
度が大きいなどの特徴を有しているので、このようなソ
フトセグメントとして大いに期待されている。このオル
ガノシロキサン構造を前記ソフトセグメントとしてエポ
キシ樹脂に導入するのに有用な化合物として、1,3−ジ
(γ−アミノプロピル)テトラメチルジシロキサンが挙
げられる。DETAILED DESCRIPTION OF THE INVENTION [Prior Art] An epoxy resin is generally used as a plastic molding compound used in the manufacture of electronic parts such as ICs and transistors. Since the flexibility of this epoxy resin is strongly required as the degree of integration of ICs increases, attempts have been made to impart flexibility to the epoxy resin by incorporating a soft segment into the molecule. Organosiloxane has features such as a large molecular volume, a long bonding distance of siloxane bonds, and a large degree of freedom of molecular rotation, and thus is highly expected as such a soft segment. A compound useful for introducing this organosiloxane structure into the epoxy resin as the soft segment is 1,3-di (γ-aminopropyl) tetramethyldisiloxane.
従来、1,3−ジ(γ−アミノプロピル)テトラメチルジ
シロキサンの製造方法としては、ベンジリデンアリルア
ミンと触媒量の白金との混合物を170℃〜180℃に加熱し
た後、1,1,3,3−テトラメチルジシロキサンを滴下して
反応させ、式: で表わされるビス(ベンジリデンイミノプロピル)テト
ラメチルジシロキサンを合成し、次に該化合物を塩酸で
加水分解してアミン塩酸塩とし、さらに水酸化ナトリウ
ムで中和して遊離のアミンを得るという方法が発表され
ている。Conventionally, as a method for producing 1,3-di (γ-aminopropyl) tetramethyldisiloxane, after heating a mixture of benzylideneallylamine and a catalytic amount of platinum to 170 ° C to 180 ° C, 1,1,3, 3-Tetramethyldisiloxane was added dropwise to react and the formula: A bis (benzylideneiminopropyl) tetramethyldisiloxane represented by the following formula is synthesized, and then the compound is hydrolyzed with hydrochloric acid to form an amine hydrochloride and further neutralized with sodium hydroxide to obtain a free amine. Has been announced.
(Die Macromolekulare Chemie,57,150(1962))。(Die Macromolekulare Chemie, 57 , 150 (1962)).
しかし、上記の方法は、本発明者が試みたところ、ベン
ジリデンアリルアミンと白金との混合物を170〜180℃に
加熱すると重合反応が起き、5時間後には、生成物のほ
とんどがポリマー化してしまい、数%の収率でしか目的
の化合物を得ることができないという問題を有するもの
であった。However, the above method was attempted by the present inventor, and when a mixture of benzylideneallylamine and platinum was heated to 170 to 180 ° C., a polymerization reaction occurred, and after 5 hours, most of the product was polymerized, The problem is that the target compound can be obtained only in a yield of several%.
そこで、本発明の目的は、前記の中間体であるビス(ベ
ンジリデンイミノプロピル)テトラメチルジシロキサン
を高収率で合成でき、よって1,3−ジ(アミノプロピ
ル)ジシロキサンを高収率で得ることのできる製造方法
を提供することにある。Therefore, an object of the present invention is to synthesize the above-mentioned intermediate, bis (benzylideneiminopropyl) tetramethyldisiloxane, in high yield, and thus to obtain 1,3-di (aminopropyl) disiloxane in high yield. The object is to provide a manufacturing method capable of
本発明は、前記問題点を解決するものとして、 一般式(I): 〔式中、R1は同一でも異なってもよく、メチル、エチ
ル、プロピル等のアルキル基、フェニル、トリル等のア
ルキル基又はベンジル等のアラルキル基である〕 で表わされるジアミノプロピルジシロキサン製法であっ
て、 一般式(II): 〔式中、R1は前記のとおり〕 で表わされジシロキサン、白金系触媒及び非極性溶媒を
含む混合物を90〜150℃に保ちながら、 一般式(III): 〔式中、R2は一価炭化水素基であり、R3は水素原子又は
一価炭化水素である〕 で表せされるシッフ塩基を滴下させて、 一般式(IV): 〔式中、R1、R2およびR3は前記のとおり〕 で表わされる有機ケイ素化合物を合成し、 次に、該有機ケイ素化合物を酸性下で加水分解後反応混
合物を中和する、 ことからなるジアミノプロピルジシロキサンの製法を提
供するものである。MEANS TO SOLVE THE PROBLEM this invention solves said problem, General formula (I): [Wherein R 1 may be the same or different and is an alkyl group such as methyl, ethyl or propyl, an alkyl group such as phenyl or tolyl, or an aralkyl group such as benzyl]. General formula (II): [Wherein R 1 is as described above], while maintaining the mixture containing the disiloxane, the platinum-based catalyst and the nonpolar solvent at 90 to 150 ° C., the compound represented by the general formula (III): [Wherein, R 2 is a monovalent hydrocarbon group and R 3 is a hydrogen atom or a monovalent hydrocarbon], and a Schiff base represented by the following formula is added dropwise to give a compound represented by the general formula (IV): [Wherein R 1 , R 2 and R 3 are as described above] is synthesized, and then the organic silicon compound is hydrolyzed under acidic conditions to neutralize the reaction mixture. The present invention provides a method for producing diaminopropyldisiloxane.
本発明の方法に原料として用いられる一般式(II)のジ
シロキサンは公知の方法により容易に製造し得るもので
ある。The disiloxane of the general formula (II) used as a raw material in the method of the present invention can be easily produced by a known method.
また、一般式(III)のシッフ塩基において、R2又はR3
が表し得る一価炭化水素基としては、メチル、エチル、
プロピル等のアルキル基、シクロヘキシル、メチルシク
ロヘキシル、シクロヘプチル等のシクロアルキル基、フ
ェニル、トリル等のアリール基等が挙げられ、好ましく
は、メチル基、エチル基、フェニル基等である。Further, in the Schiff base of the general formula (III), R 2 or R 3
Examples of the monovalent hydrocarbon group represented by are methyl, ethyl,
Examples thereof include an alkyl group such as propyl, a cycloalkyl group such as cyclohexyl, methylcyclohexyl and cycloheptyl, an aryl group such as phenyl and tolyl, and a methyl group, an ethyl group, a phenyl group and the like are preferable.
かかる一般式(III)のシッフ塩基の代表的な例として
は、 C6H5−CH=NCH2CH=CH2, (CH3)2C=NCH2CH=CH2, などが挙げられ、中でも安全性が良好である点から C6H5−CH=NCH2CH=CH2 が好ましい。この一般式(III)のシッフ塩基は、一般
式(II)のジシロキサンに対しほぼ当量で使用し反応さ
せることが好ましい。Representative examples of the Schiff base takes the general formula (III), C 6 H 5 -CH = NCH 2 CH = CH 2, (CH 3) 2 C = NCH 2 CH = CH 2, Among them, C 6 H 5 —CH═NCH 2 CH═CH 2 is preferable from the viewpoint of good safety. It is preferable that the Schiff base of the general formula (III) is used in an approximately equivalent amount to the disiloxane of the general formula (II) and reacted.
本発明の方法に用いられる白金系触媒としては、例え
ば、塩化白金酸、塩化白金酸−アルコール溶液、白金
黒、白金−オレフィンコンプレックス等公知のものを使
用することができ、一般式(II)のジシロキサン100重
量部当り、通常0.0001〜0.005重量部程度用いればよ
い。Examples of the platinum-based catalyst used in the method of the present invention include chloroplatinic acid, chloroplatinic acid-alcohol solution, platinum black, platinum-olefin complex, and other known ones. Usually, 0.0001 to 0.005 parts by weight may be used per 100 parts by weight of disiloxane.
本発明の方法に用いられる非極性溶媒としては、例え
ば、キシレン、メトキシトルエン、エトキシトルエン、
エチルトルエン、t−ブチルトルエン等が挙げられる
が、通常はジシロキサンのSi-Hのシッフ塩基への付加反
応が円滑に進行し価格が安いキシレンが用いられる。Examples of the non-polar solvent used in the method of the present invention include xylene, methoxytoluene, ethoxytoluene,
Examples thereof include ethyltoluene and t-butyltoluene. Usually, xylene is used because the addition reaction of disiloxane to Si—H progresses smoothly and the price is low.
一般式(II)のシジロキサンと一般式(III)のシッフ
塩基との反応は、90〜150℃の温度で行なう必要があ
り、好ましくは100〜120℃である。反応温度が90℃未満
では前記の付加反応が極端に遅くなり、150℃を超える
と生成物のポリマー化が進行し目的とするジアミノアル
キルジシロキサンの収率が低下する。この反応を行なう
際の圧力は特に限定されないが、通常、常圧下で十分で
あり、その場合反応混合物の沸点が90〜150℃となるよ
うに溶媒の種類及び使用量を選択し、還流下で反応させ
ることが望ましい。このような実施態様に適する溶媒と
しても、前記の例示の非極性溶媒を挙げることができ
る。The reaction between the sidiroxane of the general formula (II) and the Schiff base of the general formula (III) needs to be carried out at a temperature of 90 to 150 ° C, preferably 100 to 120 ° C. If the reaction temperature is lower than 90 ° C, the above-mentioned addition reaction becomes extremely slow, and if it exceeds 150 ° C, the product is polymerized to lower the yield of the desired diaminoalkyldisiloxane. The pressure for carrying out this reaction is not particularly limited, but is usually sufficient under normal pressure, in which case the type and amount of the solvent used are selected so that the boiling point of the reaction mixture is 90 to 150 ° C., and the mixture is refluxed. It is desirable to react. As the solvent suitable for such an embodiment, the above-exemplified non-polar solvent can be mentioned.
本発明の方法では、まず、一般式(II)のジシロキサ
ン、非極性溶媒及び白金系触媒を反応容器に入れ、所要
の反応温度に加熱し、保ちながら、一般式(III)のシ
ッフ塩基を滴下することにより行なうことができる。In the method of the present invention, first, the disiloxane of the general formula (II), the non-polar solvent and the platinum-based catalyst are placed in a reaction vessel, heated to a required reaction temperature and kept, while the Schiff base of the general formula (III) is added. It can be performed by dropping.
次に、上記の反応により得られた前記一般式(IV)の有
機ケイ素化合物を酸性下で加水分解後中和する。この酸
性下の加水分解は、例えば、前記の反応で得られた反応
混合物に酸水溶液を添加すればよく、使用される酸とし
ては、例えば、塩酸等が挙げられる。このとき使用する
酸の量は、一般式(IV)の有機ケイ素化合物に対し当量
以上であることが必要で、この酸による加水分解で、ジ
アミノプロピルジシロキサン酸付加塩が生成する。次
に、該酸付加塩を含む溶液を、例えば水酸化ナトリウ
ム、水酸化カリウム、水酸化カルシウム、炭酸ナトリウ
ム等で中和することにより、目的とするジアミノプロピ
ルジシロキサンが遊離の状態で得られる。Next, the organosilicon compound represented by the general formula (IV) obtained by the above reaction is hydrolyzed and neutralized under acidic conditions. For the hydrolysis under acidic condition, for example, an aqueous acid solution may be added to the reaction mixture obtained in the above reaction, and examples of the acid used include hydrochloric acid and the like. The amount of the acid used at this time must be at least equivalent to the organosilicon compound of the general formula (IV), and hydrolysis with this acid produces a diaminopropyldisiloxane acid addition salt. Then, the solution containing the acid addition salt is neutralized with, for example, sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate or the like to obtain the desired diaminopropyldisiloxane in a free state.
次に、本発明を実施例により具体的に説明する。 Next, the present invention will be specifically described with reference to examples.
実施例1 温度計、攪拌装置、還流装置を備えた2lの反応フラスコ
に、1,1,3,3−テトラメチルジシロキサン300g、キシレ
ン600gを入れ、さらに、塩化白金酸のイソプロパノール
溶液(白金分2wt%)を0.6g加え100℃に加熱した。次
に、ベンジリデンアリルアミン690gを2時間かけて滴下
して反応させ、滴下終了後さらに150℃で3時間反応さ
せた。反応終了後室温まで冷却し、17%塩酸を1100g加
えて加水分解した。二層に分離し、水層に等量のトルエ
ンを加えて洗浄し、さらに水層にNaOH190g、水550gを加
えた。さらにトルエン1000gを加えて有機層を抽出し、N
a2SO4で乾燥後蒸留すると、沸点120〜125℃/7mmHgの無
色透明な液体が390g得られた。収率は70.4%であった。Example 1 300 g of 1,1,3,3-tetramethyldisiloxane and 600 g of xylene were placed in a 2 liter reaction flask equipped with a thermometer, a stirrer and a reflux device, and a solution of chloroplatinic acid in isopropanol (platinum content 2 wt%) and heated to 100 ° C. Next, 690 g of benzylideneallylamine was added dropwise over 2 hours for reaction, and after completion of the addition, the reaction was continued at 150 ° C. for 3 hours. After completion of the reaction, the mixture was cooled to room temperature and hydrolyzed by adding 1100 g of 17% hydrochloric acid. The two layers were separated, an equal amount of toluene was added to the aqueous layer for washing, and 190 g of NaOH and 550 g of water were further added to the aqueous layer. Further, 1000 g of toluene was added to extract the organic layer, and N
After drying with a 2 SO 4 and distillation, 390 g of a colorless transparent liquid having a boiling point of 120 to 125 ° C./7 mmHg was obtained. The yield was 70.4%.
得られた化合物は下記の分析結果から式 で表わされる1,3−ジ(γ−アミノプロピル)テトラメ
チルジシロキサンであることが確認された。The obtained compound is represented by the formula below. Was confirmed to be 1,3-di (γ-aminopropyl) tetramethyldisiloxane.
・NMRスペクトル:図1に示す。NMR spectrum: shown in FIG.
・IRスペクトル:図2に示す。IR spectrum: shown in FIG.
・元素分析値 理論値(%) 実測値(%) C:48.33 48.52 H:11.36 11.42 Si:22.61 22.59 比較例1 温度計、攪拌装置、還流装置を備えた2lの反応フラスコ
に、ベンジリデンアリルアミン690g、塩化白金酸のイソ
プロパノール溶液(白金分2wt%)0.6gを仕込み170〜18
0℃に加熱し、1,1,3,3−テトラメチルジシロキサンを2
時間かけて滴下して反応させ、滴下終了後さらに170〜1
80℃で3時間反応させた。この反応の終了後、17%塩酸
による加水分解以降の操作は実施例1と同様にして行な
った。目的とする1,3−ジ(γ−アミノプロピル)テト
ラメチルジシロキサンが50g得られ、収率9%であっ
た。Elemental analysis value Theoretical value (%) Actual value (%) C: 48.33 48.52 H: 11.36 11.42 Si: 22.61 22.59 Comparative Example 1 In a 2 l reaction flask equipped with a thermometer, a stirrer and a reflux device, 690 g of benzylideneallylamine, Charge 170 g of chloroplatinic acid in isopropanol (platinum content 2 wt%) 0.6 g
Heat to 0 ° C to remove 1,1,3,3-tetramethyldisiloxane
Drop it over a period of time to react, and after finishing the dropping, add 170-1
The reaction was carried out at 80 ° C for 3 hours. After the completion of this reaction, the procedure after the hydrolysis with 17% hydrochloric acid was carried out in the same manner as in Example 1. 50 g of the target 1,3-di (γ-aminopropyl) tetramethyldisiloxane was obtained, and the yield was 9%.
比較例2 1,1,3,3−テトラメチルジシロキサンの仕込みの際にキ
シレン600gを使用しない以外は、実施例1と全く同様の
操作を繰返したが、1,3−ジ(γ−アミノプロピル)テ
トラメチルジシロキサンは得られなかった。Comparative Example 2 The same operation as in Example 1 was repeated except that 600 g of xylene was not used when charging 1,1,3,3-tetramethyldisiloxane, but 1,3-di (γ-amino) was used. No propyl) tetramethyldisiloxane was obtained.
比較例3 ベンジリデンアリルアミンを滴下する際の加熱温度100
℃を60℃に変え、滴下終了後の反応温度も60℃とした以
外は、実施例1と全く同様の操作を繰返したが、1,3−
ジ(γ−アミノプロピル)テトラメチルジシロキサンは
得られなかった。Comparative Example 3 Heating temperature 100 when benzylideneallylamine was added dropwise
The same operation as in Example 1 was repeated except that the temperature was changed to 60 ° C. and the reaction temperature after the dropping was also changed to 60 ° C.
Di (γ-aminopropyl) tetramethyldisiloxane could not be obtained.
本発明の方法により、70〜80%の高収率でジアミノジシ
ロキサンを得ることができる。また、このジアミノジシ
ロキサンは、ポリイミド樹脂、エポキシ樹脂の改質に用
いられるアミノ変性シリコーンの基本原料として有用で
ある。According to the method of the present invention, diaminodisiloxane can be obtained in a high yield of 70 to 80%. Further, this diaminodisiloxane is useful as a basic raw material for amino-modified silicone used for modifying polyimide resins and epoxy resins.
第1図は、実施例1で得られた1,3−ジ(γ−アミノプ
ロピル)テトラメチルジシロキサンのNMRスペクトルを
示す。 第2図は、実施例1で得られた1,3−ジ(γ−アミノプ
ロピル)テトラメチルジシロキサンのIRスペクトルを示
す。FIG. 1 shows the NMR spectrum of 1,3-di (γ-aminopropyl) tetramethyldisiloxane obtained in Example 1. FIG. 2 shows an IR spectrum of 1,3-di (γ-aminopropyl) tetramethyldisiloxane obtained in Example 1.
Claims (1)
リール基又はアラルキル基である。〕で表されるジアミ
ノプロピルジシロキサンの製法であって、 一般式(II): 〔式中、R1は前記のとおり〕 で表されるジシロキサン、白金系触媒及び非極性溶媒を
含む混合物を90〜150℃に保ちながら、 一般式(III): 〔式中、R2は一価炭化水素基であり、R3は水素原子又は
一価炭化水素基である〕 で表されるシッフ塩基を滴下させて、 一般式(IV): 〔式中、R1、R2及びR3は前記のとおり〕 で表わされる有機ケイ素化合物を合成し、 次に、該有機ケイ素化合物を酸性下で加水分解後反応混
合物を中和する、 ことからなるジアミノプロピルジシロキサンの製法。1. General formula (I): [In the formula, R 1 may be the same or different and is an alkyl group, an aryl group or an aralkyl group. ] A method for producing diaminopropyldisiloxane represented by the following general formula (II): [Wherein R 1 is as described above] while maintaining the mixture containing the disiloxane represented by the formula, the platinum-based catalyst, and the nonpolar solvent at 90 to 150 ° C. [Wherein, R 2 is a monovalent hydrocarbon group and R 3 is a hydrogen atom or a monovalent hydrocarbon group], and a Schiff base represented by the following formula is added dropwise to give a compound represented by the general formula (IV): [Wherein R 1 , R 2 and R 3 are as described above] is synthesized, and then the organic silicon compound is hydrolyzed under acidic conditions to neutralize the reaction mixture. A method for producing diaminopropyldisiloxane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62108175A JPH0755953B2 (en) | 1987-05-01 | 1987-05-01 | Manufacturing method of diaminopropyldisiloxane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62108175A JPH0755953B2 (en) | 1987-05-01 | 1987-05-01 | Manufacturing method of diaminopropyldisiloxane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63275591A JPS63275591A (en) | 1988-11-14 |
| JPH0755953B2 true JPH0755953B2 (en) | 1995-06-14 |
Family
ID=14477889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62108175A Expired - Fee Related JPH0755953B2 (en) | 1987-05-01 | 1987-05-01 | Manufacturing method of diaminopropyldisiloxane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0755953B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009001758A1 (en) * | 2009-03-23 | 2010-09-30 | Wacker Chemie Ag | Process for the synthesis of 1,3-bis (aminoalkyl) disiloxanes |
| CN113698575B (en) * | 2021-09-02 | 2022-04-26 | 四川大学 | A kind of high impact-resistant remodelable flame-retardant epoxy resin based on siloxane Schiff base structure and preparation method |
-
1987
- 1987-05-01 JP JP62108175A patent/JPH0755953B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63275591A (en) | 1988-11-14 |
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