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JPH075672B2 - Method for producing highly oriented ultra-long conjugated polymer - Google Patents
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JPH075672B2 - Method for producing highly oriented ultra-long conjugated polymer - Google Patents

Method for producing highly oriented ultra-long conjugated polymer

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Publication number
JPH075672B2
JPH075672B2 JP4491090A JP4491090A JPH075672B2 JP H075672 B2 JPH075672 B2 JP H075672B2 JP 4491090 A JP4491090 A JP 4491090A JP 4491090 A JP4491090 A JP 4491090A JP H075672 B2 JPH075672 B2 JP H075672B2
Authority
JP
Japan
Prior art keywords
conjugated polymer
producing
highly oriented
monomolecular film
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4491090A
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Japanese (ja)
Other versions
JPH03702A (en
Inventor
小川  一文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4491090A priority Critical patent/JPH075672B2/en
Publication of JPH03702A publication Critical patent/JPH03702A/en
Publication of JPH075672B2 publication Critical patent/JPH075672B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Polymerisation Methods In General (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は電気材料に関し、更に詳しくは、導電性や非線
形光学効果を示すポリアセチレン結合などの共役結合を
有する高配向性超長共役ポリマーの製造方法に関するも
のである。
TECHNICAL FIELD The present invention relates to an electric material, and more particularly, to a method for producing a highly oriented ultralong conjugated polymer having a conjugated bond such as polyacetylene bond exhibiting electrical conductivity or nonlinear optical effect. It is a thing.

従来の技術 アセチレンやその誘導体などのポリマーは、π電子共役
系を持つ一次元の主鎖を分子内に保有しているために、
導電性や非線形光学効果を持つことから、光、電子機能
材料として広く研究されている。
Conventional technology Since polymers such as acetylene and its derivatives have a one-dimensional main chain with a π-electron conjugated system in the molecule,
Because of its conductivity and nonlinear optical effect, it has been widely studied as an optical and electronic functional material.

また、従来アセチレンやその誘導体などのポリマーの製
造方法としては、チーグラー・ナッタ触媒を用いた白川
らの重合方法がよく知られている。
As a conventional method for producing a polymer such as acetylene or a derivative thereof, a polymerization method of Shirakawa et al. Using a Ziegler-Natta catalyst is well known.

発明が解決しようとする課題 ところが、現在知られているアセチレンやその誘導体の
ポリマーは、酸素を含む雰囲気中では、熱や圧力あるい
は紫外線などに対して不安定であるため、安定化させる
研究が進められている。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention However, currently known polymers of acetylene and its derivatives are unstable with respect to heat, pressure, ultraviolet rays, etc. in an atmosphere containing oxygen. Has been.

しかしながら、未だにアセチレンやその誘導体のポリマ
ーを安定化する方法は見いだされていない。
However, a method for stabilizing a polymer of acetylene or its derivative has not been found yet.

また、アセチレンやその誘導体のポリマーにおいて、そ
の配向性を制御する技術も開発されていない。
Moreover, in the polymer of acetylene or its derivative, the technique of controlling the orientation has not been developed.

本発明は上記問題点に鑑み、安定性が高く、かつ高配向
な超長共役ポリマーの製造方法を提供するものである。
In view of the above problems, the present invention provides a method for producing a highly stable and highly oriented ultralong conjugated polymer.

課題を解決するための手段 本願発明では、上記問題点を解決するために、共役不飽
和結合性不飽和基と、(モノ,ジもしくはトリ)クロル
シラン基とを含むクロルシラン系物質を溶解させた非水
系の有機溶媒中に、少なくとも表面が親水性の基板を浸
漬し、前記基板上に前記物質の単分子膜を形成する単分
子膜形成工程と、前記単分子膜中の前記不飽和基を選択
的に失活させる失活工程と、前記失活工程を経た基板を
不活性ガス中で前記単分子膜中の失活されないで残った
不飽和基を重合させる重合工程とを含む、高配向性超長
共役ポリマーの製造方法をとるものである。
Means for Solving the Problems In the present invention, in order to solve the above-mentioned problems, a chlorosilane-based substance containing a conjugated unsaturated bond-bonded unsaturated group and a (mono-, di-, or tri) chlorosilane group In a water-based organic solvent, at least a hydrophilic substrate is immersed in a monomolecular film forming step of forming a monomolecular film of the substance on the substrate, and the unsaturated group in the monomolecular film is selected. Deactivation step of chemically deactivating, and a polymerization step of polymerizing the unsaturated group remaining in the monomolecular film in the monomolecular film that has not been deactivated in an inert gas, the substrate having a high orientation property. A method for producing an ultralong conjugated polymer is adopted.

作用 一端にクロルシラン基(-SiClx)を持つ直鎖状炭化水素の
誘導体を用いれば、有機溶媒中で化学吸着法により親水
性基板表面に前記誘導体の単分子膜を形成でき、さらに
前記単分子膜を酸素を含むガス中で高エネルギーの放射
線照射して表面を親水性化することにより前記単分子膜
の累積膜を形成できることが知られている。
By using a linear hydrocarbon derivative having a chlorosilane group (-SiCl x ) at one end, a monomolecular film of the derivative can be formed on the surface of the hydrophilic substrate by the chemisorption method in an organic solvent. It is known that a cumulative film of the monomolecular film can be formed by irradiating the film with high-energy radiation in a gas containing oxygen to make the surface hydrophilic.

従って、一端にクロルシラン基を持つ直鎖状炭化水素の
誘導体の一部に共役不飽和結合性不飽和基(例えばアセ
チレン基,ジアセチレン基,チオフェン基,ピロール基
等)を含むような物質を用いて化学吸着法を行なえば、
数十Aオーダーの前記不飽和基誘導体の単分子膜を形成
でき、さらに多層の累積膜も容易に得ることができる。
Therefore, use a substance that contains a conjugated unsaturated bond-unsaturated group (eg, acetylene group, diacetylene group, thiophene group, pyrrole group, etc.) as part of the linear hydrocarbon derivative having a chlorosilane group at one end. If the chemisorption method is performed,
A monomolecular film of the unsaturated group derivative of the order of tens of A can be formed, and a multilayer cumulative film can be easily obtained.

このように基板上に化学吸着した単分子膜中の不飽和基
を特定の方向に選択的に線状に失活させておき、不活性
ガス雰囲気中で前記単分子膜中の残存した共役不飽和結
合性不飽和基の部分を重合させると、配向性が極めて高
く、超高分子量で共役系が非常に長いポリマーが製造で
きる。
In this way, the unsaturated groups in the monomolecular film chemisorbed on the substrate are selectively linearly deactivated in a specific direction, and the remaining conjugated groups in the monomolecular film in the inert gas atmosphere are deactivated. By polymerizing the part of the saturated bond-unsaturated group, a polymer having extremely high orientation, an ultrahigh molecular weight and a very long conjugated system can be produced.

実施例 本発明の共役不飽和結合性不飽和基としては、アセチレ
ン基(−C≡C−)やジアセチレン基(−C≡C−C≡
C−)等の三重結合を有する直鎖状の炭素化合物、チオ
フェン環,ピロール環,フラン環,シクロペンタジエン
等の環状化合物等が挙げられる。
Examples The conjugated unsaturated bond-forming unsaturated group of the present invention includes an acetylene group (-C≡C-) and a diacetylene group (-C≡C-C≡).
Examples include linear carbon compounds having a triple bond such as C-), thiophene rings, pyrrole rings, furan rings, and cyclic compounds such as cyclopentadiene.

しかも本発明の製造方法に依ればポリアセチレン系もし
くはポリジアセチレン系であっても、酸素を含む雰囲気
中でも安定なポリマーが形成されるため、三重結合を有
する直鎖状の炭化水素化合物を有する場合が特に有効で
ある。
Moreover, according to the production method of the present invention, even if it is a polyacetylene-based or polydiacetylene-based, because a stable polymer is formed even in an atmosphere containing oxygen, it may have a linear hydrocarbon compound having a triple bond. Especially effective.

本発明のクロルシラン系物質は、上記共役不飽和結合性
不飽和基とクロルシラン基とを含む。
The chlorosilane-based substance of the present invention contains the above-mentioned conjugated unsaturated bond-unsaturated group and chlorosilane group.

このクロルシラン基には、珪素に塩素原子が一つ結合し
たモノクロルシラン,塩素が二つ結合したジクロルシラ
ンもしくは塩素が三つ結合したトリクロルシランの何れ
であってもよい。
The chlorosilane group may be any of monochlorosilane in which one chlorine atom is bonded to silicon, dichlorosilane in which two chlorine are bonded, or trichlorosilane in which three chlorine are bonded.

このクロルシランは、水等と反応して容易にシロキシ基
を形成し失活するため、クロルシラン系物質を化学吸着
させるときには、非水系の有機溶媒を用いる必要があ
る。
Since this chlorosilane easily reacts with water or the like to form a siloxy group and deactivates, it is necessary to use a non-aqueous organic solvent when chemically adsorbing the chlorosilane-based substance.

またクロルシラン系物質の一端にトリメチルシラン基が
結合した場合には、重合工程後末端のトリメチルシラン
基を高エネルギの放射線を照射して容易に親水化でき、
単分子膜をさらに累積でき3次元構造の超長共役ポリマ
ーが形成できるため好ましい。
When a trimethylsilane group is bound to one end of the chlorosilane-based substance, the terminal trimethylsilane group can be easily hydrophilized by irradiating it with high-energy radiation after the polymerization step,
It is preferable because a monomolecular film can be further accumulated and an ultralong conjugated polymer having a three-dimensional structure can be formed.

不飽和基がアセチレン基である場合には、ω−ノナデシ
ルイノイックトリクロルシランは、化学吸着と重合とが
共にし易く好ましい。さらに1−(トリメチルシリル)
−ω−ノナデシルイノイックトリクロルシランの場合に
は、化学吸着,重合及び累積の観点で好ましい。
When the unsaturated group is an acetylene group, ω-nonadecylinoic trichlorosilane is preferable because both chemisorption and polymerization are easily performed. 1- (trimethylsilyl)
In the case of -ω-nonadecylinoic trichlorosilane, it is preferable from the viewpoint of chemisorption, polymerization and accumulation.

本発明の失活工程には、使用する不飽和基の活性度によ
って異なるが、電子線,X線,γ線等の放射線照射,走査
トンネル顕微鏡での描画,もしくはクロルシラン系物質
が例えばジアセチレン誘導体等高活性の場合には紫外線
照射等が挙げられる。
In the deactivation step of the present invention, it depends on the activity of the unsaturated group to be used, but the irradiation with electron beams, X-rays, γ-rays, etc., irradiation with a scanning tunneling microscope, or a chlorosilane-based substance such as a diacetylene derivative In the case of high activity, UV irradiation and the like can be mentioned.

本発明の重合工程には、上記の失活工程で述べたドライ
プロセスの他、少なくともMoCl5,WCl6,NbCl5,TaCl5等の
ハロゲン化金属触媒、もしくはMo(CO)5,W(CO)6,Nb(C
O)5,Ta(CO)5等の金属カルボニル触媒の何れかを含む有
機溶媒中に浸漬するウエットプロセスである浸漬重合法
も適応できる。
In the polymerization step of the present invention, in addition to the dry process described in the above deactivation step, at least a metal halide catalyst such as MoCl 5 , WCl 6 , NbCl 5 , TaCl 5 , or Mo (CO) 5 , W (CO ) 6 , Nb (C
An immersion polymerization method, which is a wet process of immersing in an organic solvent containing any of metal carbonyl catalysts such as O) 5 and Ta (CO) 5 , is also applicable.

クロルシラン系物質がアセチレン誘導体であり、重合工
程で浸漬法を用いると、配向性が極めて高く、超高分子
量で共役系が非常に長くしかも酸素を含む雰囲気中でも
安定なポリアセチレン誘導体が形成されるため好まし
い。
Chlorosilane-based substance is an acetylene derivative, and when the dipping method is used in the polymerization step, the orientation is extremely high, and the conjugated system is extremely high in molecular weight, and the conjugated system is very long, and a stable polyacetylene derivative is formed even in an atmosphere containing oxygen, which is preferable. .

この浸漬重合法に供される有機溶媒としては、トルエ
ン,ジオキサン,アニソール等が挙げられる。
Toluene, dioxane, anisole, etc. are mentioned as an organic solvent used for this immersion polymerization method.

また浸漬重合法の場合には、これら触媒に有機スズ化合
物もしくは有機ビスマス化合物の共触媒を含有すると、
さらにポリマーの品質が向上し好ましい。
Further, in the case of the immersion polymerization method, when a cocatalyst of an organic tin compound or an organic bismuth compound is contained in these catalysts,
Further, the quality of the polymer is improved, which is preferable.

さらにクロルシラン系物質にアセチレン誘導体を用い、
浸漬重合に用いる有機溶媒に例えばアニソール,ジオキ
サン等のような酸素原子を有する有機溶媒を用い、ハロ
ゲン化金属触媒に五塩化モリブデンを用いると、重合後
のポリマーがシス(cis)型ポリアセチレンが得られ
る。
Furthermore, using an acetylene derivative as a chlorosilane-based substance,
When an organic solvent having an oxygen atom such as anisole or dioxane is used as the organic solvent used for the immersion polymerization and molybdenum pentachloride is used as the metal halide catalyst, a cis-type polyacetylene is obtained as the polymer after the polymerization. .

このようにして重合した単分子膜は、一定の方向性を保
った状態で重合することにより、共役系が連続した直鎖
状で超高分子量のポリマー(超長共役ポリマー)を作
れ、数十Aオーダーの前記誘導体の単分子膜を形成で
き、さらに多層の累積膜も容易に得ることを見いだし
た。
The monomolecular film polymerized in this way can be made into a linear and ultra-high molecular weight polymer (ultra-long conjugated polymer) having a continuous conjugated system by polymerizing in a state of maintaining a certain direction. It has been found that a monomolecular film of the above-mentioned derivative of A order can be formed and a multilayer cumulative film can be easily obtained.

即ち、共役不飽和結合性不飽和基と、クロルシラン基(-
SiClx)とを含むクロルシラン系物質を溶解させた非水系
有機溶媒中に、表面が親水性の基板を浸漬し、化学吸着
法により前記基板上にクロルシラン系物質の単分子膜を
形成してから、前記単分子膜中の不飽和基を選択的に線
状に失活させておいてから重合すると、前記基板上に前
記物質の単分子膜を分子の重合方向がきれいに配向した
状態で線状に保持することができる。
That is, a conjugated unsaturated bond-bonded unsaturated group and a chlorosilane group (-
SiCl x ) and a non-aqueous organic solvent in which a chlorosilane-based substance is dissolved, the substrate having a hydrophilic surface is immersed, and a monomolecular film of the chlorosilane-based substance is formed on the substrate by a chemical adsorption method. When the unsaturated groups in the monolayer are selectively deactivated linearly and then polymerized, the monolayer of the substance is linearly formed on the substrate in a state in which the polymerization direction of the molecules is neatly aligned. Can be held at.

さらに単分子膜形成工程と重合工程との間に、化学吸着
した単分子膜をラビングするラビング工程を導入する
と、単分子膜の配向性がより整うことでより高配向性ポ
リマーが形成されるため好ましい。
Furthermore, if a rubbing step of rubbing the chemisorbed monolayer is introduced between the monolayer forming step and the polymerizing step, a more highly oriented polymer is formed because the orientation of the monolayer is more aligned. preferable.

またクロルシラン系物質がジアセチレン誘導体の場合、
重合工程を経た単分子膜にさらに高エネルギの放射線を
照射すると、重合に供さないで残存してアセチレン基が
重合し、ポリアセン結合が形成されるため好ましい。
When the chlorosilane-based substance is a diacetylene derivative,
When the monomolecular film that has undergone the polymerization process is further irradiated with high-energy radiation, it is preferable because it remains without being polymerized and the acetylene group is polymerized to form a polyacene bond.

以下、実施例を用いて本発明の詳細を説明する。Hereinafter, the details of the present invention will be described using examples.

本実施例で使用した単分子膜を形成させる物質は数々あ
るが、アセチレン誘導体の一種であり末端にアセチレン
基を1個含むω−ノナデシルイノイックトリクロルシラ
ン HC≡C−(CH2)n-SiCl3 (以下NCSと略す。以下述べる実施例では主にnは17で
あるが、14から24の範囲で良好な結果が得られた。)の
場合を用いて説明する。
There are many substances that form a monomolecular film used in this example. One of the acetylene derivatives, ω-nonadecylinoic trichlorosilane HC≡C- (CH 2 ) n-, which contains one acetylene group at the end, is used. Description will be made using the case of SiCl 3 (hereinafter abbreviated as NCS. In the examples described below, n is mainly 17, but good results were obtained in the range of 14 to 24).

実施例1 第1図(a)に示したように、直径3インチで表面にSi
O2膜の形成されたSi基板11上に、クロルシラン系物質と
してシラン系界面活性剤(以下NCSと略す) HC≡C−(CH2)17-SiCl3 を化学吸着させて、基板11の表面に単分子膜12を形成す
る。
Example 1 As shown in FIG. 1 (a), a Si film having a diameter of 3 inches was formed on the surface.
On the Si substrate 11 on which the O 2 film is formed, a silane-based surfactant (hereinafter abbreviated as NCS) HC≡C- (CH 2 ) 17 -SiCl 3 as a chlorosilane-based substance is chemically adsorbed, and the surface of the substrate 11 is A monomolecular film 12 is formed on.

この時、NCSのクロルシラン基(-SiCl3)と、基板11の表
面のSiO2膜の表面に存在する−OH基とが反応して、基板
11の表面に という構造の単分子膜12が形成される。
At this time, the chlorosilane group (--SiCl 3 ) of NCS reacts with the --OH group existing on the surface of the SiO 2 film on the surface of the substrate 11 to form a substrate.
On the surface of 11 The monomolecular film 12 having the structure is formed.

例えば1.0×10-3〜4.0×10-3mol/lの濃度で前記NCSを溶
かした85%n−ヘキサン、8%四塩化炭素、7%クロロ
ホルム溶液中に、室温で8分間、表面にSiO2膜の形成さ
れたSi基板11を浸漬すると、SiO2膜表面で−Si−O−の
結合を形成できる。
For example, in a solution of 85% n-hexane, 8% carbon tetrachloride and 7% chloroform in which the NCS is dissolved at a concentration of 1.0 × 10 −3 to 4.0 × 10 −3 mol / l, room temperature is kept for 8 minutes at room temperature for 8 minutes. When the Si substrate 11 having the two films formed thereon is immersed, —Si—O— bonds can be formed on the surface of the SiO 2 film.

ここで、基板11の表面に という構造の単分子膜12が形成されていることは、FT−
IRにて確認された。
Here, on the surface of the substrate 11 The fact that the monomolecular film 12 having the structure
Confirmed by IR.

なお、このとき単分子膜12の形成は、湿気を含まない窒
素雰囲気中で行った。
At this time, the monomolecular film 12 was formed in a nitrogen atmosphere containing no moisture.

次に、第1図(b)に示したように、前記単分子膜12中
の不飽和基を露光量約5mJ/cm2の条件の電子ビーム露光
で特定の方向に線状に不飽和基に失活(但しこの失活工
程は電子ビーム露光の他、走査トンネル顕微鏡による描
画(即ちライティング)もしくはX線露光でも可能で、
何れも露光量は5mJ/cm2程度でよい)させた後、ヘリウ
ムガス等の不活性ガス雰囲気中で全面に放射線(例えば
X線,電子線,ガンマ線)を5〜10mJ/cm2程度照射する
と、第1図(c)に示すように失活されないで残存して
いたアセチレン基が線状に重合して、trans−ポリアセ
チレン結合13が形成されたことがFT−IRにより明らかと
なった。
Next, as shown in FIG. 1 (b), the unsaturated groups in the monomolecular film 12 were linearly unsaturated in a specific direction by electron beam exposure under an exposure amount of about 5 mJ / cm 2. Deactivation (However, this deactivation process can be performed by electron beam exposure, drawing by scanning tunneling microscope (ie writing) or X-ray exposure,
After making the exposure dose about 5 mJ / cm 2 in either case, irradiating the entire surface with radiation (eg, X-rays, electron beams, gamma rays) at about 5-10 mJ / cm 2 in an inert gas atmosphere such as helium gas. As shown in FIG. 1 (c), it was revealed by FT-IR that the acetylene group which was not deactivated and remained remained was linearly polymerized to form a trans-polyacetylene bond 13.

なお、X線,電子線もしくはガンマ線はエネルギーレベ
ルは異なるが、同様に重合した単分子膜が得られた。
Although the energy levels of X-rays, electron beams and gamma rays were different, similarly polymerized monomolecular films were obtained.

実施例2 第2図(a)に示したように、基板11上にクロルシラン
系物質として1−トリメチルシリル−ω−ノナデシルイ
ノイックトリクロルシラン Me3Si−C≡C−(CH2)n-SiCl3 (以下TMS−NCSと略す。本実施例ではnは17であるが、
14から24の範囲で良好な結果が得られた。)の単分子膜
14を1層形成し、基板11上の単分子膜14中のアセチレン
基を選択的に失活後、不活性ガス雰囲気中で全面に放射
線を照射すると、第2図(b)に示すように、トリメチ
ルシラン基(-SiMe3)を含んだ線状で配向性の高いtrans
−ポリアセチレン結合13が形成された。
Example 2 As shown in FIG. 2 (a), 1-trimethylsilyl-ω-nonadecylinoic trichlorosilane Me 3 Si—C≡C— (CH 2 ) n —SiCl was formed on the substrate 11 as a chlorosilane-based substance. 3 (hereinafter abbreviated as TMS-NCS. In this embodiment, n is 17,
Good results were obtained in the range of 14 to 24. ) Monolayer
After forming one layer of 14 and selectively deactivating the acetylene group in the monomolecular film 14 on the substrate 11, the whole surface is irradiated with radiation in an inert gas atmosphere, as shown in FIG. 2 (b). Linear and highly oriented trans containing trimethylsilane group (-SiMe 3 ).
-A polyacetylene bond 13 was formed.

実施例3 ジアセチレン基を1個もつトリコサジイノイックトリク
ロルシラン HC≡C−C≡C−(CH2)19-SiCl3 を用い、第3図(a)に示したように基板11上に単分子
膜15を形成後、単分子膜15中のジアセチレン基を選択的
に線状に失活させ、不活性ガス中で紫外線(5〜10mJ/c
m2)を用いて重合すると、第3図(b)に示したように
線状のポリジアセチレン結合16(ポリ1,4−ジアセチレ
ン)を有する高配向性超長共役ポリマーが得られた。
Example 3 Tricosadiinoic trichlorosilane having one diacetylene group HC≡C—C≡C— (CH 2 ) 19 —SiCl 3 was used, and as shown in FIG. After the monomolecular film 15 is formed, the diacetylene group in the monomolecular film 15 is selectively inactivated linearly, and ultraviolet rays (5 to 10 mJ / c) are generated in an inert gas.
Polymerization using m 2 ) resulted in a highly oriented ultralong conjugated polymer having linear polydiacetylene bond 16 (poly 1,4-diacetylene) as shown in FIG. 3 (b).

なお、この場合紫外線の代わりにX線,電子線もしくは
ガンマ線照射(5mJ/cm2)を用いれば、第3図(c)の
ごとき線状のポリアセチレン結合17(ランダムポリジア
セチレン)を有する高配向性超長共役ポリマーが得られ
た。
In this case, if X-ray, electron beam or gamma ray irradiation (5 mJ / cm 2 ) is used in place of ultraviolet rays, highly oriented material having linear polyacetylene bond 17 (random polydiacetylene) as shown in Fig. 3 (c). An ultralong conjugated polymer was obtained.

実施例4 実施例1と同様にして単分子膜12を基板11上に吸着し、
単分子膜12中の不飽和基を特定の方向に線状に線状に不
飽和基に失活させた後、触媒として五塩化モリブデン(M
oCl5)を溶かしたトルエン中に、単分子膜12が1層形成
された基板11を浸漬し、30〜70℃程度に溶液を昇温する
と、第4図に示すように失活されないで残存していたア
セチレン基が線状に重合して、trans−ポリアセチレン
結合13が形成されたことが、FT−IRにより明らかとなっ
た。
Example 4 In the same manner as in Example 1, the monomolecular film 12 was adsorbed on the substrate 11,
After linearly deactivating the unsaturated group in the monomolecular film 12 into a specific direction, the molybdenum pentachloride (M
When the substrate 11 on which one monolayer 12 is formed is immersed in toluene in which oCl 5 ) is dissolved and the temperature of the solution is raised to about 30 to 70 ° C, it remains without being deactivated as shown in Fig. 4. It was revealed by FT-IR that the acetylene group that had been formed was linearly polymerized to form a trans-polyacetylene bond 13.

なお触媒としては他に、WCl6,NbCl5,TaCl5等を用いて
も、分子量は異なるが同様の重合反応したtrans−ポリ
アセチレン結合13を有する単分子膜が得られた。
When WCl 6 , NbCl 5 , TaCl 5 or the like was used as the catalyst other than the above, a monomolecular film having a similar trans-polyacetylene bond 13 which was polymerized but had a different molecular weight was obtained.

さらにまたこの浸漬重合工程で、触媒としてMo(CO)6
たはW(CO)6を四塩化炭素に溶かした溶液に基板を浸漬し
紫外線を照射しても、分子量は異なるが赤褐色の重合反
応したtrans−ポリアセチレン結合13を有する単分子膜
が得られた。
Furthermore, in this immersion polymerization step, even when the substrate was immersed in a solution of Mo (CO) 6 or W (CO) 6 dissolved in carbon tetrachloride as a catalyst and irradiated with ultraviolet rays, a reddish brown polymerization reaction occurred although the molecular weight was different. A monolayer having trans-polyacetylene bond 13 was obtained.

実施例5 実施例2と同様にして単分子膜14を基板11上に吸着し、
アセチレン基を選択的に失活後、触媒として六塩化タン
グステン(WCl6)と、共触媒としてテトラブチルスズ(Bu4
Sn)とを1:1で溶かしたトルエン中に浸漬し、30〜70℃程
度に溶液を昇温すると第5図に示すように、トリメチル
シラン基(-SiMe3)を含んだ線状で配向性の高いtrans−
ポリアセチレン結合13が形成された。
Example 5 In the same manner as in Example 2, the monomolecular film 14 was adsorbed on the substrate 11,
After selectively deactivating the acetylene group, tungsten hexachloride (WCl 6 ) as a catalyst and tetrabutyltin (Bu 4
(Sn) is immersed in 1: 1 dissolved in toluene and the temperature of the solution is raised to about 30-70 ° C, as shown in Fig. 5, it is oriented in a linear shape containing trimethylsilane group (-SiMe 3 ). Highly trans-
A polyacetylene bond 13 was formed.

実施例6 実施例2と同様にして単分子膜14を基板11上に形成し、
アセチレン基を選択的に失活後、触媒として五塩化モリ
ブデン(MoCl5)を溶かした分子中に、酸素原子を含有す
る有機溶媒であるアニソール中に浸漬し、30〜70℃程度
に溶液を昇温すると、第6図に示すように線状の配向性
の高いcis−ポリアセチレン結合18が形成された。
Example 6 A monomolecular film 14 is formed on a substrate 11 in the same manner as in Example 2,
After selectively deactivating the acetylene group, it is immersed in anisole, which is an organic solvent containing oxygen atoms, in a molecule in which molybdenum pentachloride (MoCl 5 ) is dissolved as a catalyst, and the solution is heated to about 30 to 70 ° C. Upon heating, a highly linear cis-polyacetylene bond 18 was formed as shown in FIG.

実施例7 実施例2と同様にTMS−NCSを基板11上に化学吸着し、単
分子膜14中のアセチレン基を選択的に失活した後、触媒
として五塩化モリブデン(MoCl5)と、共触媒としてトリ
フェニルビスマス(Ph3Bi)とを1:1の混合比で、分子中に
酸素原子を含有する有機溶媒であるアニソールに溶かし
た溶液中に浸漬し、30〜70℃程度に溶液を昇温すると、
第7図に示すようにトリメチルシラン基(-SiMe3)を含ん
だ高い配向性のcis−ポリアセチレン結合18が形成され
た。
Example 7 TMS-NCS was chemically adsorbed on the substrate 11 in the same manner as in Example 2 to selectively deactivate the acetylene group in the monomolecular film 14, and then co-catalyzed with molybdenum pentachloride (MoCl 5 ) as a catalyst. As a catalyst, triphenylbismuth (Ph 3 Bi) was mixed at a mixing ratio of 1: 1 in a solution prepared by dissolving anisole, which is an organic solvent containing oxygen atoms in the molecule, and the solution was heated to about 30 to 70 ° C. When the temperature rises,
As shown in FIG. 7, a highly oriented cis-polyacetylene bond 18 containing a trimethylsilane group (-SiMe 3 ) was formed.

実施例8 第8図(a)に示したように、実施例3と同様にジアセ
チレン基を1個もつトリコサジイノイックトリクロルシ
ランを用い、単分子膜15を基板11上に作成後、単分子膜
15中のジアセチレン基を選択的に線状に失活させ、実施
例7と同じ触媒を用いて重合すると、第8図(b)に示
したようにtrans−ポリアセチレン結合19(ポリ1,2−ジ
アセチレン)が得られた。
Example 8 As shown in FIG. 8 (a), a monomolecular film 15 was formed on a substrate 11 using tricosadiinoic trichlorosilane having one diacetylene group as in Example 3, and then a monomolecular film 15 was formed. Molecular film
When the diacetylene group in 15 was selectively deactivated linearly and polymerized using the same catalyst as in Example 7, as shown in FIG. 8 (b), trans-polyacetylene bond 19 (poly 1,2 -Diacetylene) was obtained.

更に第8図(c)に示したように、このtrans−ポリア
セチレン結合19を有する単分子膜に、電子線を露光量5m
J/cm2程度照射すると、(電子線の代わりにX線やガン
マ線等の放射線でもよい)、線状のポリアセチレン結合
20を有する高配向性超長共役ポリマーが得られた。
Further, as shown in FIG. 8 (c), the monomolecular film having the trans-polyacetylene bond 19 was exposed to an electron beam at an exposure dose of 5 m.
When irradiated with J / cm 2 (radiation such as X-rays and gamma rays may be used instead of electron beams), linear polyacetylene bond
A highly oriented ultralong conjugated polymer with 20 was obtained.

実施例9 実施例1と同様にして第1図(a)に示したように、基
板11上に実施例1と同じNCSの単分子膜12を一層吸着し
た。
Example 9 As in Example 1, as shown in FIG. 1A, the same NCS monolayer 12 as in Example 1 was further adsorbed on the substrate 11.

次に、第9図に示した基板11の単分子膜12が吸着してい
ない面にローダー21を載せ、ラビングクロス22を用いて
ラピングを行ない、単分子膜12を特定の方向に配向させ
た後、実施例1と同様な手法で単分子膜12中の不飽和基
を失活し、不活性ガス雰囲気(例えばヘリウムガス)中
で放射線(例えばX線を50mJ/cm2)を照射すると、第1
図(c)と構造は同様であるが実施例1よりも配向方向
の揃ったtrans−ポリアセチレン結合13が形成されたこ
とが、FT−IRにより明らかとなった。
Next, the loader 21 was placed on the surface of the substrate 11 shown in FIG. 9 where the monomolecular film 12 was not adsorbed, and the rubbing cloth 22 was used for lapping to orient the monomolecular film 12 in a specific direction. After that, by deactivating the unsaturated group in the monomolecular film 12 by the same method as in Example 1 and irradiating with radiation (for example, X-rays of 50 mJ / cm 2 ) in an inert gas atmosphere (for example, helium gas), First
FT-IR revealed that a trans-polyacetylene bond 13 having the same structure as that in FIG. 3C but having more aligned alignment direction than in Example 1 was formed.

なお、放射線としては、X線以外に電子線やγ線を用い
ても同様の重合した単分子膜が得られた。
It should be noted that the same polymerized monomolecular film was obtained even when an electron beam or γ-ray was used as radiation as well as X-ray.

しかし、紫外線(波長365nm)では重合は全く起こらな
かった。
However, polymerization did not occur at all with ultraviolet rays (wavelength 365 nm).

実施例10 実施例2と同様にして第2図(a)に示したように、TM
S−NCSを基板11上に単分子膜14を1層形成し、これを第
9図と同様のラビングの後、不活性ガス雰囲気(例えば
ヘリウムガス)中で放射線(例えばX線を50mJ/cm2)を
照射すると、第2図(b)と構造は同様であるが実施例
2よりも配向方向の揃った、トリメチルシラン基(-SiMe
3)を含んだtrans−ポリアセチレン結合13が形成され
た。
Example 10 Similar to Example 2, as shown in FIG.
One layer of monomolecular film 14 is formed on the substrate 11 of S-NCS, and after rubbing in the same manner as in FIG. 9, radiation (for example, X-rays of 50 mJ / cm is applied in an inert gas atmosphere (for example, helium gas). 2 ), the structure is the same as in FIG. 2 (b), but the alignment direction is more aligned than in Example 2, and the trimethylsilane group (--SiMe) is aligned.
A trans-polyacetylene bond 13 containing 3 ) was formed.

実施例11 実施例3と同様にジアセチレン基を1個もつトリコサジ
イノイックトリクロルシランを用い、第3図(a)に示
したように単分子膜15を形成し、第9図と同様のラビン
グを行った後、単分子膜15中のジアセチレン基を選択的
に線状に失活させ、紫外線を用いて重合すると、第3図
(b)と構造は同様であるが実施例3よりも配向方向の
揃った、ポリジアセチレン型結合16を有する高配向性超
長共役ポリマーが得られた。
Example 11 Similar to Example 3, tricosadiinoic trichlorosilane having one diacetylene group was used to form a monomolecular film 15 as shown in FIG. After rubbing, the diacetylene group in the monomolecular film 15 was selectively deactivated linearly and polymerized by using ultraviolet rays, but the structure was the same as in FIG. A highly oriented ultra-long conjugated polymer having a polydiacetylene type bond 16 in which the orientation directions were even was obtained.

また、電子線やX線を用いると、第3図(c)と構造は
同様であるが実施例3よりも配向方向の揃った。ポリジ
アセン結合17を有するポリジアセチレン型高配向性超長
共役ポリマーが得られた。
Further, when an electron beam or an X-ray was used, the alignment direction was more aligned than in Example 3, although the structure was the same as in FIG. 3 (c). A polydiacetylene-type highly oriented ultralong conjugated polymer having a polydiacene bond 17 was obtained.

実施例12 実施例1と同じNCSを化学吸着させて、第1図(a)と
同様の単分子膜12が吸着した基板11を得た。
Example 12 The same NCS as in Example 1 was chemically adsorbed to obtain a substrate 11 on which a monomolecular film 12 similar to that shown in FIG. 1 (a) was adsorbed.

次に、第9図に示した方法を用いてラビングを行ない、
単分子膜12を特定の方向に配向させ、単分子膜12中の不
飽和基を実施例1と同様な手法で選択的に失活した後、
触媒として五塩化モリブデン(MoCl5)を溶かしたトルエ
ン中に、単分子膜12が1層形成された基板11を浸漬し、
30〜70℃程度に溶液を昇温すると、第4図と構造は同じ
であるが、実施例4よりも配向方向の揃ったtrans−ポ
リアセチレン結合13が形成されたことが、FT−IRにより
明らかとなった。
Then, rubbing is performed using the method shown in FIG.
After orienting the monomolecular film 12 in a specific direction and selectively deactivating the unsaturated group in the monomolecular film 12 by the same method as in Example 1,
The substrate 11 having one layer of the monomolecular film 12 is immersed in toluene containing molybdenum pentachloride (MoCl 5 ) as a catalyst,
FT-IR reveals that when the temperature of the solution was raised to about 30 to 70 ° C., the structure was the same as that in FIG. 4, but trans-polyacetylene bond 13 with more aligned alignment direction was formed than in Example 4. Became.

なお触媒としては他に、WCl6,NbCl5,TaCl5等を用いて
も、分子量は異なるが同様の重合反応した単分子膜が得
られた。
When WCl 6 , NbCl 5 , TaCl 5 or the like was used as the catalyst other than the above, a similar monomolecular film having a different polymerization but a similar polymerization reaction was obtained.

さらにまた触媒としてMo(CO)6あるいはW(CO)6を四塩化
炭素に溶かした溶液に基板を浸漬し、紫外線を照射して
も、分子量は異なるが赤褐色の重合反応した単分子膜が
得られた。
Furthermore, even if the substrate is immersed in a solution of Mo (CO) 6 or W (CO) 6 in carbon tetrachloride as a catalyst and irradiated with ultraviolet rays, a monomolecular film with a reddish-brown polymerization reaction is obtained, although the molecular weight is different. Was given.

実施例13 実施例2と同じTMS−NCSを用い、第2図(a)と同様に
基板11上に単分子膜14を1層形成し、第9図と同様なラ
ビングし、実施例2と同様な手法で単分子膜14中の不飽
和基を失活した後、触媒として六塩化タングステン(WCl
6)と、共触媒としてテトラブチルスズ(Bu4Sn)とを1:1で
トルエン中に溶かした溶液に浸漬し、30〜70℃程度に溶
液を昇温すると、第5図と構造は同じであるが配向方向
の揃った、トリメチルシラン基(-SiMe3)を含んだtrans
−ポリアセチレン結合13が形成された。
Example 13 Using the same TMS-NCS as in Example 2, one layer of monomolecular film 14 was formed on the substrate 11 in the same manner as in FIG. 2 (a) and rubbed in the same manner as in FIG. After deactivating the unsaturated group in the monomolecular film 14 by a similar method, tungsten hexachloride (WCl) is used as a catalyst.
6 ) and tetrabutyltin (Bu 4 Sn) as a co-catalyst were soaked in a 1: 1 solution in toluene, and the temperature of the solution was raised to about 30 to 70 ° C, the structure was the same as in Fig. 5. However, trans containing a trimethylsilane group (-SiMe 3 ) with a uniform alignment direction
-A polyacetylene bond 13 was formed.

実施例14 実施例9と同様に単分子膜を吸着後ラビングし、実施例
9と同様な手法で単分子膜中の不飽和基を失活させた
後、触媒として五塩化モリブデン(MoCl5)を、分子中に
酸素原子を含有する有機溶媒であるアニソールに溶かし
た溶液中に浸漬し、30〜70℃程度に溶液を昇温すると、
第6図と構造は同じであるが配向方向は実施例6よりも
揃った、cis−ポリアセチレン結合18が形成された。
Example 14 A monolayer was adsorbed and rubbed in the same manner as in Example 9 to deactivate an unsaturated group in the monolayer in the same manner as in Example 9, and then molybdenum pentachloride (MoCl 5 ) was used as a catalyst. Is immersed in a solution dissolved in anisole, which is an organic solvent containing an oxygen atom in the molecule, and the temperature of the solution is raised to about 30 to 70 ° C,
A cis-polyacetylene bond 18 having the same structure as that of FIG. 6 but having a more uniform alignment direction than that of Example 6 was formed.

実施例15 実施例14と同様のTMS−NCSの単分子膜を1層形成後ラビ
ングし、実施例14と同様に失活させた基板を、触媒とし
て五塩化モリブデン(MoCl5)と、共触媒してトリフェニ
ルビスマス(Ph3Bi)とを1:1で、分子中に酸素原子を含有
する有機溶媒であるアニソールに溶かした溶液中に浸漬
し、30〜70℃程度に溶液を昇温すると、第7図と構造は
同じであるが実施例7よりも配向方向が揃った、トリメ
チルシラン基(-SiMe3)を含んだcis−ポリアセチレン結
合18が形成された。
Example 15 A substrate in which a monolayer of TMS-NCS similar to that in Example 14 was formed and then rubbed and then deactivated in the same manner as in Example 14 was prepared by using molybdenum pentachloride (MoCl 5 ) as a catalyst and a cocatalyst. Then, with triphenylbismuth (Ph 3 Bi) at a ratio of 1: 1, soak in a solution dissolved in anisole, which is an organic solvent containing oxygen atoms in the molecule, and raise the temperature of the solution to about 30 to 70 ° C. A cis-polyacetylene bond 18 containing a trimethylsilane group (—SiMe 3 ), which has the same structure as in FIG. 7 but has a more aligned orientation direction than that in Example 7, was formed.

上述の方法で累積されたcis−ポリアセチレン結合18を
有する単分子膜は、アルコールには不溶性であることが
確認された。
It was confirmed that the monolayer having the cis-polyacetylene bond 18 accumulated by the above method was insoluble in alcohol.

実施例16 実施例8と同じジアセチレン基を1個もつトリコサジイ
ノイックトリクロルシランを用い、第8図(a)と同様
な単分子膜15を基板11上に吸着し、ラビングを行い実施
例8と同様に単分子膜15中の不飽和結合基を選択的に失
活した後、実施例15と同じ触媒を用いて重合すると、第
8図(b)と構造は同じであるが実施例8よりも高配向
したtrans−ポリアセチレン結合19を有する単分子膜が
得られた。
Example 16 Using tricosadiinoic trichlorosilane having one diacetylene group as in Example 8, a monomolecular film 15 similar to that in FIG. 8 (a) was adsorbed on the substrate 11 and rubbed. After selectively deactivating the unsaturated bond groups in the monomolecular film 15 as in Example 8, polymerization was carried out using the same catalyst as in Example 15, but the structure was the same as in FIG. A monolayer having trans-polyacetylene bonds 19 oriented higher than 8 was obtained.

このtrans−ポリアセチレン結合19を有する単分子膜
に、さらに電子線(X線やγ線等の放射線でもよい)を
照射すると、第8図(c)と構造は同じであるが実施例
8よりも配向方向の揃ったポリアセン結合20を有する高
配向性超長共役ポリマーが得られた。
When the monomolecular film having the trans-polyacetylene bond 19 is further irradiated with an electron beam (which may be radiation such as X-rays or γ-rays), the structure is the same as that in FIG. A highly-oriented ultralong conjugated polymer having polyacene bonds 20 with uniform orientation was obtained.

なお実施例9〜16では、単分子膜を1層だけ形成し重合
を行う方法について述べたが、単分子膜を多層累積した
後でラビングを行った後、重合を行っても良く、あるい
は単分子膜の形成−ラビング−重合の工程を連続して交
互に行っても、高配向性超長共役ポリマーの多層累積膜
の作製が可能である。
In Examples 9 to 16, the method of forming only one monomolecular film and performing the polymerization was described, but the rubbing may be performed after the monomolecular films are accumulated in multiple layers, and then the polymerization may be performed. Even if the steps of forming a molecular film, rubbing, and polymerizing are continuously and alternately performed, it is possible to produce a multilayer cumulative film of highly oriented ultralong conjugated polymer.

さらに実施例9〜16では、ラビングを行ってから失活工
程を行う場合について述べたが、ラビング工程は失活工
程の後に行っても良いことは勿論である。
Further, in Examples 9 to 16, the case where the deactivating step is performed after the rubbing is described, but it goes without saying that the rubbing step may be performed after the deactivating step.

実施例9〜16で説明したように、本発明の製造方法の単
分子膜吸着工程と重合工程との間に、吸着した単分子膜
をラビングするラビング工程を導入することで、より配
向方向が揃った超長共役ポリマーが製造できる効果があ
る。
As described in Examples 9 to 16, by introducing a rubbing step of rubbing the adsorbed monomolecular film between the monomolecular film adsorbing step and the polymerizing step of the production method of the present invention, the orientation direction is further improved. There is an effect that uniform ultra long conjugated polymers can be produced.

なお上述した実施例で得られた単分子膜を重合した膜
は、すべてアルコールには不溶であった。
All the films obtained by polymerizing the monomolecular films obtained in the above-mentioned examples were insoluble in alcohol.

さらに以上述べたことから明らかなように、本発明の製
造方法によると、構造が規制されたポリマー、即ちtran
s型とcis型のポリアセチレン誘導体を自由に選択できる
効果がある。
Further, as is clear from the above description, according to the production method of the present invention, a structure-regulated polymer, that is, tran
There is an effect that s-type and cis-type polyacetylene derivatives can be freely selected.

なお上記実施例で製造された高配向性超長共役ポリマー
は、何れも従来のチーグラー・ナッタ系触媒法で製造さ
れたものに比べ、酸素を含む雰囲気中でも、熱,圧力あ
るいは紫外線などに対して著しく安定であった。
It should be noted that the highly oriented ultra-long conjugated polymers produced in the above-mentioned examples were compared with those produced by the conventional Ziegler-Natta catalyst method, in an atmosphere containing oxygen, against heat, pressure or ultraviolet rays. It was remarkably stable.

また上述した実施例では、単分子膜を1層だけ形成し重
合を行なう方法について述べたが、単分子膜を多層累積
した後で不飽和基を選択的に線状に失活した後重合を行
っても良く、あるいは単分子膜の形成−線状失活−重合
の各工程を交互に行っても高配向性超長共役ポリマーの
多層累積膜の作成が可能である。
Further, in the above-mentioned Examples, the method of forming only one monolayer and performing the polymerization was described. However, after the monolayers are accumulated in multiple layers, the unsaturated groups are selectively deactivated linearly and then the polymerization is performed. Alternatively, a multilayer cumulative film of highly oriented ultralong conjugated polymer can be prepared by alternately performing the steps of monomolecular film formation-linear deactivation-polymerization.

また上述した実施例では、クロルシラン系物質の共役不
飽和結合性不飽和基が、すべてアセチレン系もしくはジ
アセチレン系であったが、本発明はこのアセチレン系に
限定されるものではなく、チオフェン環,ピロール環,
フラン環等であっても適応される技術であることも勿論
である。ただし上述した環構造を有する基を用いる場合
には、重合工程では高エネルギの放射線等を用いる必要
がある。
Further, in the above-mentioned examples, the conjugated unsaturated bond-unsaturated groups of the chlorosilane-based substance were all acetylene-based or diacetylene-based, but the present invention is not limited to this acetylene-based, thiophene ring, Pyrrole ring,
Needless to say, the technology can be applied even to a franc ring. However, when the above-mentioned group having a ring structure is used, it is necessary to use high-energy radiation or the like in the polymerization step.

以上の実施例で述べた本発明の高配向性超長共役ポリマ
ーは、極微細加工が可能であり、優れた導電性を示すた
め、例えば分子素子等の配線に適応できる可能性があ
る。また非常に長い共役不飽和結合を有するため、非線
形光学特性も大きく、従って例えば微細加工可能な非線
形光学特性を利用したスイッチ素子等にも応用できる。
The highly oriented ultra-long conjugated polymer of the present invention described in the above examples is capable of microfabrication and exhibits excellent conductivity, and thus may be applicable to wiring of, for example, molecular elements. Further, since it has a very long conjugate unsaturated bond, it has a large nonlinear optical characteristic, and therefore, it can be applied to, for example, a switch element utilizing the nonlinear optical characteristic which can be microfabricated.

さらに本発明は単分子膜の形成方法としてクロルシラン
系の化学吸着法であるが、他に例えばLB法等によって単
分子膜を形成し、この単分子膜中に含有される共役不飽
和結合性不飽和基を重合する手法でも、当然本発明と同
様な効果が得られること勿論である。
Further, although the present invention is a chlorosilane-based chemical adsorption method as a method for forming a monomolecular film, other methods such as the LB method may be used to form a monomolecular film, and the conjugated unsaturated bond bond Needless to say, the same effect as that of the present invention can be obtained by the method of polymerizing the saturated group.

即ち本発明は、共役不飽和結合可能な不飽和基を含む単
分子膜を製造し、この単分子膜中の不飽和基を選択的に
線状に反応性を有しない飽和結合に不活性化すること
で、不飽和結合の反応方向を規定し、しかる後重合する
ことにより高配向性の超長共役ポリマーを製造するもの
である。
That is, the present invention produces a monomolecular film containing an unsaturated group capable of forming a conjugated unsaturated bond, and selectively inactivates the unsaturated group in the monomolecular film to a saturated bond having no linear reactivity. By doing so, the reaction direction of the unsaturated bond is defined, and then polymerization is performed to produce a highly oriented ultralong conjugated polymer.

発明の効果 以上述べたように本発明は、共役不飽和結合性不飽和基
を含む物質の単分子膜形成工程と、この単分子膜中の不
飽和結合を非反応性に選択的に失活させる失活工程と、
失活工程で失活されなかった不飽和基を重合する重合工
程とを含む製造方法であるため、導電性や非線形光学効
果が非常に優れ、かつ分子量が数百以上で安定な高配向
性超長共役ポリマーを高能率に製造できる効果がある。
EFFECTS OF THE INVENTION As described above, the present invention provides a process for forming a monomolecular film of a substance containing a conjugated unsaturated bond-containing unsaturated group, and selectively deactivates unsaturated bonds in the monomolecular film in a non-reactive manner. Deactivation process to
Since it is a manufacturing method that includes a polymerization step of polymerizing unsaturated groups that have not been deactivated in the deactivation step, it has excellent conductivity and nonlinear optical effects, and has a highly oriented super stable structure with a molecular weight of several hundreds or more. The long conjugated polymer can be produced with high efficiency.

なお本発明の製造方法によると、連続した共役系が数mm
或は数cm以上の長さを持つ、直鎖状で1本の超高分子量
の高配向性超長共役ポリマーの製造も可能であるため、
非線形光学効果を利用したデバイスの製作には極めて有
効である。
According to the manufacturing method of the present invention, a continuous conjugated system is several mm.
Alternatively, since it is possible to produce a single linear ultra-high molecular weight highly oriented ultra-long conjugated polymer having a length of several cm or more,
It is extremely effective for manufacturing a device using the nonlinear optical effect.

また、今後さらに原料となる共役不飽和結合性モノマー
の種類や製造条件を適正化することにより、共役系が連
続して数十cm或は数m以上の長さを持つ安定で直鎖状で
あり超高分子量の高配向性超長共役ポリマーの製造も可
能になると思われ、この方法で冷却を必要としない有機
超電導物質の製造が可能となるかもしれない。
In addition, by optimizing the type and manufacturing conditions of the conjugated unsaturated bond monomer that will be the raw material in the future, the conjugated system will be stable and linear with a length of several tens of cm or several m or more. It seems that it is possible to produce ultra-high molecular weight highly oriented ultra-long conjugated polymers, and this method may be able to produce organic superconducting materials that do not require cooling.

【図面の簡単な説明】 第1図はNCS単分子膜よりなりtrans−ポリアセチレン結
合を有する高配向性超長共役ポリマーの製造方法を示
し、第1図(a)は単分子膜形成工程後の単分子が吸着
した様子を示す概念図、第1図(b)は電子線露光(EB
照射)を用いて単分子膜中の不飽和基を選択的に線状に
失活させる工程の概念図、第1図(c)は失活工程を経
た後単分子膜中で残存した不飽和結合を放射線により重
合する工程の概念図、第2図(a),(b)はTMS−NCS
単分子膜よりなりtrans−ポリアセチレン結合を有する
高配向性超長共役ポリマーの製造方法を示す工程図、第
2図(a)は単分子膜形成工程後の単分子が吸着した様
子を示す概念図、第2図(b)は失活工程を経た後単分
子膜中で残存した不飽和結合を放射線により重合する工
程の概念図、第3図(a),(b),(c)はポリジア
セチレン結合を有する高配向性超長共役ポリマーの製造
方法を示す工程図、第3図(a)は単分子膜形成工程後
の単分子が吸着した様子を示す概念図、第3図(b)は
失活工程を経た後単分子膜中で残存した不飽和結合を触
媒溶液に浸漬することにより重合する工程の概念図、第
3図(c)は失活工程を経た後単分子膜中で残存した不
飽和結合を放射線により重合する工程の概念図、第4図
はNCS単分子膜よりなり触媒溶液に浸漬することにより
重合したtrans−ポリアセチレン結合を有する高配向性
超長共役ポリマーの製造方法を示す工程図、第5図はTM
S−NCS単分子膜よりなり触媒溶液に浸漬することにより
重合したtrans−ポリアセチレン結合を有する高配向性
超長共役ポリマーの製造方法を示す工程図、第6図はNC
S単分子膜よりなり触媒溶液に浸漬することにより重合
したcis−ポリアセチレン結合を有する高配向性超長共
役ポリマーの製造方法を示す工程図、第7図はTMS−NCS
単分子膜よりなり触媒溶液に浸漬することにより重合し
たcis−ポリアセチレン結合を有する高配向性超長共役
ポリマーの製造方法を示す工程図、第8図(a),
(b),(c)はジアセチレンの他の実施例の高配向性
超長共役ポリマーの製造方法を示す工程図、第8図
(a)は単分子膜形成工程後の単分子が吸着した様子を
示す概念図、第8図(b)は失活工程を経た後単分子膜
中で残存した不飽和結合を触媒溶液に浸漬することによ
り重合する工程の概念図、第8図(c)は重合工程を経
た後電子線照射によりポリアセン結合を有する高配向性
超長共役ポリマーの重合工程を示す概念図、第9図は単
分子膜をラピングする工程の概念図である。 11……基板、12,14,15……単分子膜、13,19……trans−
ポリアセチレン結合、16,17……ポリ路アセチレン結
合、8……cis−ポリアセチレン結合、20……ポリアセ
ン結合
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a method for producing a highly oriented ultra-long conjugated polymer having an NCS monomolecular film and having a trans-polyacetylene bond, and FIG. 1 (a) shows a film after the monomolecular film formation step. Fig. 1 (b) is a conceptual diagram showing how single molecules are adsorbed.
(Irradiation) is used to selectively and linearly deactivate the unsaturated groups in the monolayer, and Fig. 1 (c) shows the unsaturation remaining in the monolayer after the deactivation step. A conceptual diagram of the process of polymerizing bonds by radiation, FIGS. 2 (a) and 2 (b) are TMS-NCS.
FIG. 2A is a conceptual diagram showing a method for producing a highly oriented ultra-long conjugated polymer composed of a monomolecular film and having a trans-polyacetylene bond, FIG. 2A is a conceptual diagram showing a state in which monomolecules are adsorbed after the monomolecular film forming step. 2 (b) is a conceptual diagram of the step of polymerizing by radiation the unsaturated bonds remaining in the monolayer after the deactivation step, and FIGS. 3 (a), (b) and (c) are polydiene FIG. 3 (b) is a process diagram showing a method for producing a highly oriented ultra-long conjugated polymer having an acetylene bond, FIG. 3 (a) is a conceptual diagram showing a state in which a single molecule has been adsorbed after the monomolecular film formation process, and FIG. 3 (b). Is a conceptual diagram of the step of polymerizing the unsaturated bond remaining in the monolayer after the deactivation step by immersing it in a catalyst solution, and FIG. 3 (c) is the monolayer after the deactivation step. Fig. 4 is a conceptual diagram of the process of polymerizing the remaining unsaturated bonds by radiation. Process diagram showing the method of manufacturing the highly-oriented very long conjugated polymer having polymerized trans- polyacetylene bonds by immersion in a catalyst solution, Fig. 5 TM
Fig. 6 is a process chart showing a method for producing a highly oriented ultra-long conjugated polymer having an S-NCS monomolecular film and having a trans-polyacetylene bond polymerized by dipping in a catalyst solution.
Fig. 7 is a process diagram showing a method for producing a highly oriented ultra-long conjugated polymer having a cis-polyacetylene bond, which is composed of an S monolayer and is polymerized by immersing it in a catalyst solution.
FIG. 8 (a) is a process diagram showing a method for producing a highly oriented ultralong conjugated polymer having a cis-polyacetylene bond, which is composed of a monomolecular film and is polymerized by dipping in a catalyst solution.
(B) and (c) are process diagrams showing a method for producing a highly oriented ultra-long conjugated polymer of another example of diacetylene, and FIG. 8 (a) is a monomolecular adsorbed after the monomolecular film forming process. FIG. 8 (b) is a conceptual diagram showing a state, FIG. 8 (b) is a conceptual diagram of a step of polymerizing the unsaturated bond remaining in the monomolecular film after the deactivation step by immersing it in a catalyst solution, FIG. 8 (c). Is a conceptual diagram showing a polymerization process of a highly oriented ultra-long conjugated polymer having a polyacene bond by electron beam irradiation after the polymerization process, and FIG. 9 is a conceptual diagram of a process of lapping a monomolecular film. 11 ... Substrate, 12,14,15 ... Monolayer, 13,19 ... trans-
Polyacetylene bond, 16,17 ... Poly-path acetylene bond, 8 ... cis-polyacetylene bond, 20 ... Polyacene bond

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C08J 5/18 CER 9267−4F H01B 1/12 C 7244−5G Continuation of front page (51) Int.Cl. 6 Identification code Office reference number FI Technical display area C08J 5/18 CER 9267-4F H01B 1/12 C 7244-5G

Claims (16)

【特許請求の範囲】[Claims] 【請求項1】共役不飽和結合性不飽和基と、(モノ,ジ
もしくはトリ)クロルシラン基とを含むクロルシラン系
物質を溶解させた非水系の有機溶媒中に、少なくとも表
面が親水性の基板を浸漬し、前記基板上に前記物質の単
分子膜を形成する単分子膜形成工程と、前記単分子膜中
の前記不飽和基を選択的に失活させる失活工程と、前記
失活工程を経た基板を不活性ガス中で前記単分子膜中の
失活されないで残った不飽和基を重合させる重合工程と
を含むことを特徴とする、高配向性超長共役ポリマーの
製造方法。
1. A non-aqueous organic solvent in which a chlorosilane-based substance containing a conjugated unsaturated bond-containing unsaturated group and a (mono-, di- or tri) chlorosilane group is dissolved, and a substrate having at least a hydrophilic surface is prepared. A monomolecular film forming step of immersing and forming a monomolecular film of the substance on the substrate; a deactivating step of selectively deactivating the unsaturated group in the monomolecular film; and a deactivating step. And a step of polymerizing the unsaturated substrate remaining in the monomolecular film that has not been deactivated in an inert gas, to produce a highly oriented ultralong conjugated polymer.
【請求項2】単分子膜形成工程と重合工程との間に、単
分子膜をラビングするラビング工程を行うことを特徴と
する、請求項1記載の高配向性超長共役ポリマーの製造
方法。
2. The method for producing a highly oriented ultra-long conjugated polymer according to claim 1, wherein a rubbing step of rubbing the monomolecular film is performed between the monomolecular film forming step and the polymerizing step.
【請求項3】クロルシラン系物質に含有される不飽和基
が、アセチレン基もしくはジアセチレン基であることを
特徴とする、請求項1記載の高配向性超長共役ポリマー
の製造方法。
3. The method for producing a highly oriented ultralong conjugated polymer according to claim 1, wherein the unsaturated group contained in the chlorosilane-based substance is an acetylene group or a diacetylene group.
【請求項4】クロルシラン系物質に含有される不飽和基
が、ジアセチレン基であることを特徴とする、請求項3
記載の高配向性超長共役ポリマーの製造方法。
4. The unsaturated group contained in the chlorosilane-based substance is a diacetylene group.
A method for producing the highly oriented ultra-long conjugated polymer described.
【請求項5】クロルシラン系物質が、ω−ノナデシルイ
ノイックトリクロルシランであることを特徴とする、請
求項1,3もしくは4何れかに記載の高配向性超長共役ポ
リマーの製造方法。
5. The method for producing a highly oriented ultra-long conjugated polymer according to claim 1, 3 or 4, wherein the chlorosilane-based substance is ω-nonadecylinoic trichlorosilane.
【請求項6】クロルシラン系物質の一端に、トリメチル
シラン基が結合していることを特徴とする、請求項1,3
もしくは4何れかに記載の高配向性超長共役ポリマーの
製造方法。
6. The trimethylsilane group is bonded to one end of the chlorosilane-based substance, which is characterized in that
Alternatively, the method for producing a highly oriented ultra-long conjugated polymer according to any one of 4 above.
【請求項7】クロルシラン系化合物が、1−(トリメチ
ルシリル)−ω−ノナデシルイノイックトリクロルシラ
ンであることを特徴とする、請求項6記載の高配向性超
長共役ポリマーの製造方法。
7. The method for producing a highly oriented ultra-long conjugated polymer according to claim 6, wherein the chlorosilane compound is 1- (trimethylsilyl) -ω-nonadecylinoic trichlorosilane.
【請求項8】失活工程が、走査トンネル顕微鏡での描
画,電子線露光もしくは放射線露光の何れかであること
を特徴とする、請求項1記載の高配向性超長共役ポリマ
ーの製造方法。
8. The method for producing a highly oriented ultra-long conjugated polymer according to claim 1, wherein the deactivating step is any one of drawing with a scanning tunneling microscope, electron beam exposure and radiation exposure.
【請求項9】重合工程が、電子線照射もしくは放射線照
射の何れかであることを特徴とする、請求項1もしくは
2何れかに記載の高配向性超長共役ポリマーの製造方
法。
9. The method for producing a highly oriented ultralong conjugated polymer according to claim 1, wherein the polymerization step is either electron beam irradiation or radiation irradiation.
【請求項10】重合工程が、少なくともハロゲン化金属
触媒もしくは金属カルボニル触媒の何れかを含む有機溶
媒中に、失活工程を経た基板上の単分子膜を浸漬する浸
漬重合工程であることを特徴とする、請求項1もしくは
2何れかに記載の高配向性超長共役ポリマーの製造方
法。
10. The polymerization step is an immersion polymerization step of immersing the monomolecular film on the substrate subjected to the deactivation step in an organic solvent containing at least a metal halide catalyst or a metal carbonyl catalyst. The method for producing a highly-oriented ultralong conjugated polymer according to claim 1 or 2.
【請求項11】ハロゲン化金属触媒もしくは金属カルボ
ニル触媒の金属が、Mo,W,NbもしくはTaであることを特
徴とする、請求項10記載の高配向性超長共役ポリマーの
製造方法。
11. The method for producing a highly oriented ultra-long conjugated polymer according to claim 10, wherein the metal of the metal halide catalyst or the metal carbonyl catalyst is Mo, W, Nb or Ta.
【請求項12】浸漬重合に使用するハロゲン化金属触媒
もしくは金属カルボニル触媒の少なくとも何れかに加
え、有機スズ化合物もしくは有機ビスマス化合物の少な
くとも何れかを含むことを特徴とする、請求項10もしく
は11何れかに記載の高配向性超長共役ポリマーの製造方
法。
12. The method according to claim 10 or 11, characterized by containing at least one of an organic tin compound and an organic bismuth compound in addition to at least one of a metal halide catalyst and a metal carbonyl catalyst used for immersion polymerization. A method for producing a highly oriented ultra-long conjugated polymer according to item 1.
【請求項13】浸漬重合で使用する有機溶媒が分子中に
酸素原子を含み、かつハロゲン化金属触媒が五塩化モリ
ブデンであることを特徴とする、請求項10〜12何れかに
記載の高配向性超長共役ポリマーの製造方法。
13. The high orientation according to claim 10, wherein the organic solvent used in the immersion polymerization contains an oxygen atom in the molecule, and the metal halide catalyst is molybdenum pentachloride. For producing a super long conjugated polymer.
【請求項14】クロルシラン系物質が少なくともジアセ
チレン基を含有し、失活工程もしくは重合工程の少なく
とも何れかに紫外線を用いることを特徴とする、請求項
1,2もしくは4何れかに記載の高配向性超長共役ポリマ
ーの製造方法。
14. The chlorosilane-based material contains at least a diacetylene group, and ultraviolet rays are used in at least one of the deactivation step and the polymerization step.
5. A method for producing a highly oriented ultra-long conjugated polymer as described in 1, 2 or 4.
【請求項15】クロルシラン系物質が少なくともジアセ
チレン基を含有し、重合工程を経た基板に高エネルギの
放射線を照射することを特徴とする、請求項1,2,9,10も
しくは14何れかに記載の高配向性超長共役ポリマーの製
造方法。
15. The chlorosilane-based substance contains at least a diacetylene group, and the substrate after the polymerization step is irradiated with high-energy radiation, according to any one of claims 1, 2, 9, 10 and 14. A method for producing the highly oriented ultra-long conjugated polymer described.
【請求項16】放射線が、X線,電子線もしくはγ線の
何れかであることを特徴とする、請求項15記載の高配向
性超長共役ポリマーの製造方法。
16. The method for producing a highly oriented ultra-long conjugated polymer according to claim 15, wherein the radiation is any of X-ray, electron beam and γ-ray.
JP4491090A 1989-02-27 1990-02-26 Method for producing highly oriented ultra-long conjugated polymer Expired - Fee Related JPH075672B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4491090A JPH075672B2 (en) 1989-02-27 1990-02-26 Method for producing highly oriented ultra-long conjugated polymer

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP1-45996 1989-02-27
JP1-45993 1989-02-27
JP4599489 1989-02-27
JP4599389 1989-02-27
JP1-45995 1989-02-27
JP4599589 1989-02-27
JP4599689 1989-02-27
JP1-45994 1989-02-27
JP4491090A JPH075672B2 (en) 1989-02-27 1990-02-26 Method for producing highly oriented ultra-long conjugated polymer

Publications (2)

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JPH03702A JPH03702A (en) 1991-01-07
JPH075672B2 true JPH075672B2 (en) 1995-01-25

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