JPH0757472B2 - Polishing tool coated with carbon film and method for producing the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION "Field of Use of the Invention" The present invention is to coat carbon or a carbon-based coating having an optical bandwidth of 1.0 eV or more, particularly 1.5 to 5.5 eV on a coating-forming surface of a polishing tool. By doing so, the present invention relates to a composite for which a reinforcing material for these polishing tools and an abrasion resistant material against mechanical stress are obtained.

"Prior Art" Regarding the coating of carbon film, a patent application "a plurality of bodies having a carbon coating and a method for producing the same" (Japanese Patent Application No. 56-146930, filed on September 17, 1981) filed by the present inventor is known. Has been. However, these are formed only on metal or inorganic material, the formation temperature is 150 ℃ or less,
Preferably, it is substantially cooled to +100 to −100 ° C., and
An example in which the surface to be formed is on a tape-shaped substrate whose main component is an organic resin having heat resistance even at these temperatures, or on a composite body in which an inorganic material is applied and fixed in advance is completely mentioned. Absent.

"Conventional problem" In the conventional example, it is said that the carbon film can be obtained only at a high temperature of 200 to 1000 ° C, and depending on the condition, the carbon film is at room temperature (the surface is heated up to about 150 ° C by plasma). Alternatively, there is no description that a sufficient hardness can be obtained even by a manufacturing method at a temperature lower than that.

"Means for Solving the Problem" The present invention is to coat carbon or a film containing carbon as a main component on the base of a polishing tool to reinforce mechanical strength such as abrasion resistance on the surface. In particular, by introducing a hydrocarbon gas such as ethylene or methane into an atmosphere in which a plasma is generated by a direct current or a high frequency, in particular, a high frequency electric field in which a positive direct current bias is added to the substrate side, and causing decomposition, a C--C bond is formed. As a result, rather than making non-translucent conductive or poorly conductive carbon such as graphite, the optical energy bandwidth (Eg) required by the manufacturing conditions is 1.0 eV or more, preferably 1.5 It is characterized by the formation of insulating carbon similar to diamond with ~ 5.5 eV. Further, the carbon of the present invention has a Vickers hardness of 2000 Kg / mm ² or more, preferably 4500 Kg / mm ² or more, and ideally 6500 Kg / mm ²
Amorphous (amorphous) having a hardness similar to that of diamond or carbon having a semi-amorphous (semi-amorphous) structure having a microcrystallinity of 5 to 200Å or hydrogen or halogen element in this carbon is 25 Carbon containing mainly so-called carbon (hereinafter, simply referred to as carbon in the present invention) added with atomic% or less or III- or V-valent impurities of 5 atomic% or less, and nitrogen added to a concentration of N / C ≦ 0.05. The composite provided on the substrate is not provided.

The present invention further forms a tape-shaped polishing tool on which this carbon is formed, and forms it at a temperature of 150 ° C or lower, preferably -100 to 100 ° C, which is 500 to 1500 ° C lower than that of the conventionally known CVD method. At the very least, another feature is that the coating was possible experimentally on an organic resin film having no heat resistance.

According to the present invention, boron, which is a trivalent impurity, is added to the carbon at a concentration of 0.1 to 5 atomic% to provide P-type carbon.
Another feature is that V-valent impurities such as phosphorus and nitrogen are similarly added at a concentration of 0.1 to 5 atomic% and N-type carbon is provided to make carbon on the upper surface of the substrate conductive.

Further, the present invention is a substrate, particularly an organic resin substrate such as PET (polyethylene terephthalate), PES, Teflon, epoxy, polyimide, etc.
The roll is hereinafter referred to as RTR) and is formed on the tape-shaped organic resin.

In the present invention, coating particles of alumina, carborundum, etc. on a tape are mixed and fixed with an organic resin medium, the surface is made uneven, and carbon or carbon is used as a main component on the uneven surface to cover all of them. The film is coated to form a polishing tool. Then, a product having a polishing function equivalent to that of a lapping paper, that is, a polishing material in which diamond grains are scattered is produced.

The method for producing the composite used in the present invention will be described below with reference to the drawings.

Example 1 FIG. 1 shows an outline of an RTR type plasma CVD apparatus for forming carbon or a coating film containing carbon as a main component of the present invention.

In the drawing, in the doping system (10), hydrogen as a carrier gas is supplied from (11), a hydrocarbon gas as a reactive gas such as methane or ethylene is supplied from (12), and diborane (hydrogen dilution) as a valence III impurity (13) is used. ), V or V-impurity ammonia or foshin is introduced into the reaction system (30) from the nozzle (25) through the valve (28) and the flow meter (29) from the (14). Before reaching this nozzle, it is effective to apply microwave energy at (26) for the activation of the reactive gas and preactivate it.

In the reaction system (30), it moves from the first roll (4) to the second roll (5) via the auxiliary rolls (6) and (7).

The auxiliary roll (7) is provided with a spring (27) so as to apply a constant tension so that the tape constituting the polishing tool does not sag. First between the auxiliary rolls
Electrode (2), tape (1) having a surface to be formed, second
The electrode (3) is provided, and electric energy is applied between the pair of electrodes (2) and (3) from the high frequency electrode (15), the matching transformer (16) and the DC bias power supply (17), and the plasma (40 ) Occurs. The exhaust system (20) exhausts unnecessary gas through the pressure control valve (25), the turbo molecular pump (22), and the rotary pump (23).

These reactive gases are 0.01 to 0.3 torr in the reaction space (40).
r 0.1 torr, for example, due to electromagnetic energy due to high frequency
Energy of 0.1-5KW can be added. DC bias is −
Add 200 to 600V (essentially -400 to + 400V). Because self-bias is -200V when DC bias is zero.
This is because it has (with the second electrode as a ground level). The reactive gas was, for example, methane: hydrogen = 1: 1. The first electrode has a cooling means (9), and the cooling liquid is introduced from (8) and discharged to (8 ') to keep the temperature on the surface to be formed at 150 to -100 ° C. Thus, the carbon having an amorphous structure or a microcrystalline structure having a Vickers hardness of 2000 kg / mm ² or more on the surface to be formed by plasma and having a large number of C—C bonds having a thermal conductivity of 2.5 W / cm deg or more is formed. Was generated. Furthermore, this electromagnetic energy supplies 50W ~ 1KW, 0.03 ~ 3W per unit area
Plasma energy of / cm ² was applied. When the plasma density was high, or when the reactive gas was previously excited by microwaves, it was possible to generate semi-amorphous carbon having a microcrystalline size of 5 to 200 Å. The film deposition rate is 100-1000A / min, especially when the surface temperature is -50-150 ℃ and DC bias is + 100-300V, the film deposition rate is 100-200A / min (microwave using methane , 500 to 1000 A / min (when methane was used in the microwave or ethylene was used in the microwave). All of these are acceptable only under the condition that the Vickers hardness is 2000 Kg / mm ² or more.
Of course, if graphite is the main component, it is extremely soft and black, which is completely different from the present invention.

The reaction product is formed as a film on the upper surface of the substrate (1) cooled by the cooling medium (9). The impurities after the reaction are exhausted from the exhaust system (20) through a turbo molecular pump and a rotary pump. The reaction system is maintained at 0.001 to 10 torr, typically 0.01 to 0.5 torr, and the microwave (2
6), the plasma state (40) is generated in the reaction system by the high frequency energy (15). In particular, when the excitation source has a frequency of 1 GHz or more, for example 2.45 GHz, hydrogen is separated from the C-H bond, and when the frequency source has a frequency of 0.1 to 50 MHz, for example 13.56 MHz, a C-C bond, C = C bond is decomposed, C
A -C bond or a -C-C- bond may be formed, and unpaired carbon bonds of carbon atoms may collide with each other to form a covalent bond, resulting in a structure having a stable diamond structure locally.

Thus, 25 mol% of hydrogen is contained in the carbon, especially in the carbon, on the organic resin substrate or the tape on which the ceramics are provided.
It was possible to form a coating film containing as a main component carbon contained below or carbon having a P, I or N type conductivity.

Example 2 FIG. 2 (A) is an example of a composite body which constitutes the polishing tool of the present invention manufactured by using the manufacturing apparatus of FIG. FIG. 2 (A) shows a mixture of an organic resin medium such as polyimide or PET diluted with an organic solvent of an organic resin substrate and coated particles (42) (particle size 200 to 8000) such as alumina or carbon lantam. Then, these were applied once or several times to the substrate (41) to an average thickness of 3 to 100 μm, dried and solidified. Then, the organic solvent is vaporized and the volume of the organic resin medium is contracted, so that the coated particles (42) have a convex portion and are fixed onto the substrate (41) by the medium (43). Further, at this time, since the organic medium slightly remains on the upper surface of the convex portion, this portion may be lightly removed to expose the surface of the coated particles to the convex portion. These are installed in the RTR type device of Fig. 1, and carbon (50)
Was formed. This thickness was 0.1 to 5 μm.

When 4000-8000 is used as the coating particles (42), a carbon film having a thickness of 0.3-0.1 μm is formed, and when 800-2000, a carbon film (50) having a thickness of 2.0-0.5 μm is formed. Formed. Furthermore, 3 μm for large-diameter coated particles with particle numbers below this
The carbon film was coated to the above thickness. They may be formed thick so that the convex portions are not substantially flattened by the carbon coating.

Thus, the polishing tool for polishing the carbon wrapping paper was completed.

"Effect" The paper of the present invention has a carbon film coated on the entire polishing surface, so that it was possible to prevent the alumina and carborundum found in conventionally known lapping paper from being mixed into the object to be polished. . Further, the chemical polishing, that is, the polishing using a chemical such as an alkaline solution was effective because the carbon film has chemical resistance.

This can be applied not only for polishing the surface of a magnetic head or the like or the surface of other precision electrical members but also in many fields.

As is apparent from the above description, the present invention is one in which glass, a magnetic material, metal or ceramic is formed on an organic resin or the organic resin, and carbon or a film containing carbon as a main component is coated on the surface thereof. The application of this composite is immeasurable as seen in many other examples. In particular, while this carbon can be formed at a low temperature of 150 ° C or lower, its hardness and adhesion to a substrate are extremely excellent. The feature is that

As the ceramic in the present invention, oxide superconducting materials known as alumina, zirconia, carborundum, YBCO, etc. are effective. Further, the magnetic substance may be a rare earth magnet such as samarium or cobalt, an amorphous magnetic substance, iron oxide or an anisotropically shaped magnetic substance obtained by coating nickel oxide, chromium or the like.

[Brief description of drawings]

FIG. 1 shows an outline of a roll-to-roll type manufacturing apparatus for forming carbon or a coating film containing carbon as a main component on the surface to be formed of the present invention. FIG. 2 shows an embodiment of the polishing tool of the present invention.

Claims (3)

[Claims] 1. A carbon-based film having an amorphous structure having amorphous or fine crystals, or a film containing carbon as a main component, is formed on a surface of a base having an uneven surface in which powder is fixed by an organic resin medium. Polishing tool coated with carbon film. 2. A polishing tool coated with a carbon film according to claim 1, wherein the base has a tape shape. 3. A step of forming a surface having an uneven surface by mixing and applying a powder and an organic resin medium on a substrate, and a carbon film having an amorphous structure having amorphous or microcrystals on the upper surface thereof. A method for producing a polishing tool, comprising forming the coated surface while maintaining the temperature at 150 ° C. or lower.