JPH0758767B2 - Perfect contact image sensor - Google Patents
Perfect contact image sensorInfo
- Publication number
- JPH0758767B2 JPH0758767B2 JP26102288A JP26102288A JPH0758767B2 JP H0758767 B2 JPH0758767 B2 JP H0758767B2 JP 26102288 A JP26102288 A JP 26102288A JP 26102288 A JP26102288 A JP 26102288A JP H0758767 B2 JPH0758767 B2 JP H0758767B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- receiving element
- light emitting
- image sensor
- emitting element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000011572 manganese Substances 0.000 description 5
- 229910052984 zinc sulfide Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 239000013585 weight reducing agent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、画像を原寸大で読取る完全密着型イメージセ
ンサ、特に結像用のロッドレンズを省略して光源と受光
素子とを一体化した完全密着型イメージセンサに関する
ものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention relates to a perfect contact image sensor for reading an image at an actual size, in particular, a rod lens for image formation is omitted to integrate a light source and a light receiving element. The present invention relates to a perfect contact image sensor.
(従来の技術) 従来、このような分野の技術としては、日経メニカル
(1986−12−1)日経マグロウヒル社「光路が短い密着
型イメージセンサOA機器小型化の切り札に」P.71−78に
記載されるものがあった。以下、その構成を図を用いて
説明する。(Prior Art) Conventionally, as a technology of such a field, Nikkei Menical (1986-12-1) Nikkei McGraw-Hill, Inc. "For trump card of miniaturization of contact type image sensor OA equipment with short optical path" P.71-78 Some were mentioned. The configuration will be described below with reference to the drawings.
第2図は従来の密着型イメージセンサの一構成例を示す
図である。FIG. 2 is a diagram showing a configuration example of a conventional contact image sensor.
この密着型イメージセンサは、原稿1を照射するための
発光ダイオード(以下、LEDという)アレイ2、結像用
のロッドレンズアレイ3、及び光/電気変換用の受光素
子4より構成されているる。そして、LEDアレイ2から
の出射光で原稿1を照射すると、その原稿1の画像がロ
ッドレンズアレイ3を通して受光素子4に結像され、そ
の受光素子4で電気信号に変換されて読み出される。This contact image sensor is composed of a light emitting diode (hereinafter referred to as LED) array 2 for irradiating a document 1, a rod lens array 3 for image formation, and a light receiving element 4 for optical / electrical conversion. . When the document 1 is irradiated with the light emitted from the LED array 2, the image of the document 1 is formed on the light receiving element 4 through the rod lens array 3, converted into an electric signal by the light receiving element 4, and read.
この種の密着型イメージセンサでは、ロッドレンズアレ
イ3を用いて原稿1の画像を原寸大で読取るので、縮小
光学系を用いたイメージセンサと比べて、光路が大幅に
短くなり、複写機やファクシミリ等の画像読取装置を小
型化できる。In this type of contact image sensor, since the image of the original 1 is read at the original size using the rod lens array 3, the optical path is significantly shortened as compared with an image sensor using a reduction optical system, and a copier or facsimile machine is used. It is possible to reduce the size of the image reading device such as.
ところが、ロッドレンズアレイ3を用いているので、小
型、軽量化の点で充分満足できるものではなかった。そ
こで、ロッドレンズアレイ3を省略した完全密着型イメ
ージセンサが提案されている。However, since the rod lens array 3 is used, it is not sufficiently satisfactory in terms of size and weight reduction. Therefore, a perfect contact type image sensor without the rod lens array 3 has been proposed.
第3図は従来の完全密着型イメージセンサの一構成例を
示す図である。FIG. 3 is a diagram showing a configuration example of a conventional perfect contact image sensor.
この完全密着型イメージセンサは、LEDアレイ10及びセ
ンサ本体20より構成されている。センサ本体20は、ガラ
ス基板21を有し、そのガラス基板21の底面に、電極22、
アモルファスシリコン(以下、a−Siという)からなる
受光素子23、透明電極24、及び電極25が積層状態に形成
されている。受光素子23等の中央には光通過用の窓26が
設けられ、さらにそれらの受光素子23等が透明保護層27
で覆われている。この透明保護層27の下には、原稿28が
置かれる。そして、LEDアレイ10により、ガラス基板2
1、窓26及び透明保護層27を通して原稿28を照射する
と、その原稿28の画像が透明保護層27を通して受光素子
23で電気信号に変換される。The perfect contact type image sensor includes an LED array 10 and a sensor body 20. The sensor body 20 has a glass substrate 21, the electrode 22, on the bottom surface of the glass substrate 21,
A light receiving element 23 made of amorphous silicon (hereinafter referred to as a-Si), a transparent electrode 24, and an electrode 25 are formed in a laminated state. A window 26 for passing light is provided in the center of the light receiving elements 23 and the like, and these light receiving elements 23 and the like are covered by a transparent protective layer 27.
Is covered with. An original 28 is placed under the transparent protective layer 27. Then, by the LED array 10, the glass substrate 2
1. When a document 28 is illuminated through the window 26 and the transparent protective layer 27, the image of the document 28 passes through the transparent protective layer 27 and the light receiving element.
It is converted into an electric signal at 23.
この完全密着型のイメージセンサでは、ロッドレンズア
レイを省略したので、小型、軽量化が図れると共に、ロ
ッドレンズアレイ内での光量損失がないので、受光素子
23の出力も大きくなり、信号対雑音比(S/N比)が向上
する。In this perfect contact type image sensor, since the rod lens array is omitted, the size and weight can be reduced, and there is no light amount loss in the rod lens array.
The output of 23 also becomes large and the signal-to-noise ratio (S / N ratio) improves.
(発明が解決しようとする課題) しかしながら、第3図の完全密着型イメージセンサで
は、光源であるLEDアレイ10と、受光素子23側のセンサ
本体20とが、個別に構成されているため、小型、軽量化
に限界があった。その上、ユニットとしてイメージセン
サを組立てる場合、LEDアレイ10とセンサ本体20との取
付け位置の調整を行わなければならず、その調整が煩雑
であり、しかも調整不十分なときには、受光素子23への
入射光量が少なくなって読取り精度が低下し、それらを
解決することが困難であった。(Problems to be solved by the invention) However, in the perfect contact type image sensor of FIG. 3, since the LED array 10 as a light source and the sensor body 20 on the light receiving element 23 side are individually configured, the size is small. However, there was a limit to weight reduction. Moreover, when assembling the image sensor as a unit, it is necessary to adjust the mounting positions of the LED array 10 and the sensor body 20, and the adjustment is complicated, and if the adjustment is insufficient, Since the amount of incident light is reduced and the reading accuracy is lowered, it is difficult to solve them.
本発明は、前記従来技術が持っていた課題として、小
型、軽量化に限界がある点、及び光源とセンサ本体との
取付け位置の調整の煩雑さの点について解決した完全密
着型イメージセンサを提供するものである。The present invention provides a complete contact type image sensor that solves the problems of the above-mentioned conventional technology in that there is a limit to the reduction in size and weight and the complexity of adjusting the mounting position between the light source and the sensor body. To do.
(課題を解決するための手段) 本発明は前記課題を解決するために、光を照射して画像
を原寸大で電気的に読取る完全密着型イメージセンサに
おいて、このイメージセンサを少なくとも、素子搭載用
の基板と、前記基板上に形成された受光素子と、前記受
光素子内の所定領域に形成された穴と、前記穴内に形成
された発光素子と、前記受光素子及び発光素子上に被着
された透光性の保護膜とで、構成したものである。(Means for Solving the Problems) In order to solve the above problems, the present invention provides a perfect contact type image sensor which irradiates light to electrically read an image at a full scale, in which at least the image sensor is mounted on an element. Substrate, a light-receiving element formed on the substrate, a hole formed in a predetermined region in the light-receiving element, a light-emitting element formed in the hole, and the light-receiving element and the light-emitting element deposited on the substrate. And a translucent protective film.
(作用) 本発明によれば、以上のように完全密着型イメージセン
サを構成したので、同一基板上に形成された発光素子及
び受光素子は、一体化による小型、軽量化を向上させる
働きをする。さらに、発光素子が形成される穴は、その
発光素子と受光素子間における配置関係を製造プロセス
の段階において高精度に設定可能にさせ、組立て作業時
における位置調整を不要にさせる働きをする。従って、
前記課題を除去できるのである。(Operation) According to the present invention, since the complete contact type image sensor is configured as described above, the light emitting element and the light receiving element formed on the same substrate serve to improve the size and weight reduction by integration. . Further, the hole in which the light emitting element is formed serves to enable the positional relationship between the light emitting element and the light receiving element to be set with high precision in the stage of the manufacturing process, and to eliminate the need for position adjustment during assembly work. Therefore,
The above problems can be eliminated.
(実施例) 第1図(1),(2)は本発明の一実施例を示すもの
で、同図(1)は完全密着型イメージセンサの1ドット
分の概略平面図、及び同図(2)はそのA−A線断面図
である。(Embodiment) FIGS. 1 (1) and 1 (2) show an embodiment of the present invention. FIG. 1 (1) is a schematic plan view of one dot of a perfect contact image sensor, and FIG. 2) is a sectional view taken along the line AA.
この完全密着型イメージセンサは、ガラス板、樹脂板、
絶縁被覆された金属板等の絶縁性の基板30を有し、その
基板30上には、クロム等からなる共通電極31が形成され
ている。この共通電極31は、基板30が透光性の材料で作
られている場合には、非透光性の遮光材料で形成され
る。共通電極31上には、光を電気に変換するための水素
化アモルファスシリコン(a−Si:H)等からなる膜状の
受光素子32がプラズマCVD(化学的気相成長)、エレク
トロン・サイクロトロン・レゾナンス(ECR)CVD、光CV
D、スパッタ等で形成されている。受光素子32上には、
酸化インジウムスズ(ITO)等からなる透光性の受光素
子用個別電極33がスパッタ等で形成されている。これら
の共通電極(金属)31/受光素子(半導体)32/個別電極
(金属)33という積層構造により、受光素子機能が発揮
される。This perfect contact image sensor is a glass plate, resin plate,
There is an insulative substrate 30 such as a metal plate that is insulation-coated, and a common electrode 31 made of chromium or the like is formed on the substrate 30. When the substrate 30 is made of a translucent material, the common electrode 31 is made of a non-translucent light shielding material. On the common electrode 31, a film-shaped light receiving element 32 made of hydrogenated amorphous silicon (a-Si: H) for converting light into electricity is formed by plasma CVD (chemical vapor deposition), electron cyclotron, or the like. Resonance (ECR) CVD, optical CV
D, sputter, etc. On the light receiving element 32,
A light-transmitting light-receiving element individual electrode 33 made of indium tin oxide (ITO) or the like is formed by sputtering or the like. The laminated structure of these common electrode (metal) 31 / light receiving element (semiconductor) 32 / individual electrode (metal) 33 exhibits a light receiving element function.
受光素子32の例えば中央に位置する箇所の個別電極33及
び受光素子32には、発光素子形成用の穴34がエッチング
等で形成されている。受光素子32及び別個電極33上に
は、ポリイミド樹脂等からなる透光性の絶縁膜34がプラ
ズマCVD、スパッタ等により被着され、その絶縁膜34を
介して穴34内に発光素子35が形成されている。発光素子
35は、電気を光に変換するためのもので、ジンクサルフ
ァイド・マンガン(ZnS:Mn)等からなり、蒸着、スパッ
タ等で形成され、その上に、絶縁膜36が選択的に被着さ
れている。これらの絶縁膜33,36で発光素子35をはさん
だ構造により、発光素子としての機能を発揮する。発光
材料として例えばZnS:Mnを用いた場合、そのZnS:Mnの発
光する光における発光ピークの波長が可視領域なので、
受光素子32を形成する例えばa−Si:Hの感度が可視光領
域でピークを持つのと適合する。なお、絶縁膜34は、受
光素子32と発光素子35とを電気的に絶縁する機能を有す
ると共に、発光素子材料としてZnS:Mn系を用いた時には
発光素子(即ち、エレクトロルミネセンス(EL)素子)
自体の絶縁膜として機能する。A hole 34 for forming a light emitting element is formed by etching or the like in the individual electrode 33 and the light receiving element 32 at a location located at the center of the light receiving element 32, for example. A translucent insulating film 34 made of polyimide resin or the like is deposited on the light receiving element 32 and the separate electrode 33 by plasma CVD, sputtering or the like, and a light emitting element 35 is formed in the hole 34 through the insulating film 34. Has been done. Light emitting element
The numeral 35 is for converting electricity into light, and is made of zinc sulfide / manganese (ZnS: Mn) or the like, and is formed by vapor deposition, sputtering, or the like, on which an insulating film 36 is selectively deposited. There is. With the structure in which the light emitting element 35 is sandwiched by these insulating films 33 and 36, the function as a light emitting element is exhibited. For example, when ZnS: Mn is used as the light emitting material, since the wavelength of the emission peak in the light emitted by ZnS: Mn is in the visible region,
It is suitable that the sensitivity of, for example, a-Si: H forming the light receiving element 32 has a peak in the visible light region. The insulating film 34 has a function of electrically insulating the light receiving element 32 and the light emitting element 35 from each other, and when a ZnS: Mn system is used as the light emitting element material, the light emitting element (that is, an electroluminescence (EL) element). )
It functions as an insulating film of itself.
絶縁膜34,36上には、ITO等からなる透光性の発光素子用
個別電極37が蒸着、スパッタ等で形成されている。発光
素子32、発光素子35、及び個別電極37等の上には、それ
らを保護するためのポリイミド樹脂等からなる透光性の
絶縁性保護膜38が被着され、その保護膜38と対向して原
稿39がセットされる。On the insulating films 34 and 36, a light-transmissive individual electrode 37 for a light emitting element made of ITO or the like is formed by vapor deposition, sputtering or the like. On the light emitting element 32, the light emitting element 35, the individual electrode 37, etc., a translucent insulating protective film 38 made of a polyimide resin or the like for protecting them is adhered and faces the protective film 38. Document 39 is set.
次に、動作を説明する。Next, the operation will be described.
先ず、共通電極31は受光素子32と発光素子35に対して兼
用に使うためにグラウンドに接続し、受光素子用個別電
極33に負の電圧を、発光素子用個別電極37に正の電圧を
それぞれ印加する。すると、発光素子35が発光し、その
出射光が第1図(2)の矢印で示すように、絶縁膜36、
個別電極37及び保護膜38を通して原稿39を照射する。原
稿39の画像は、保護膜38、個別電極37及び絶縁膜34を通
して受光素子32で電気信号に変換され、読み出される。First, the common electrode 31 is connected to the ground so as to be used for both the light receiving element 32 and the light emitting element 35, and a negative voltage is applied to the light receiving element individual electrode 33 and a positive voltage is applied to the light emitting element individual electrode 37. Apply. Then, the light emitting element 35 emits light, and the emitted light is the insulating film 36, as shown by the arrow in FIG.
The original 39 is irradiated through the individual electrode 37 and the protective film 38. The image of the original 39 is converted into an electric signal by the light receiving element 32 through the protective film 38, the individual electrode 37 and the insulating film 34, and is read.
本実施例では、次のような利点を有している。The present embodiment has the following advantages.
(a) 基板30上に受光素子32を形成し、その受光素子
32の穴34内に発光素子36を形成してそれらを一体化して
いるので、センサユニット全体の小型、軽量化を著しく
向上できる。(A) A light receiving element 32 is formed on the substrate 30 and the light receiving element is formed.
Since the light emitting elements 36 are formed in the holes 34 of 32 and they are integrated, the size and weight of the entire sensor unit can be remarkably improved.
(b) 受光素子32と発光素子35とが同一基板30上に形
成されているため、製造プロセス時において受光素子32
と発光素子36を的確な配置位置で精度良く形成できる。
従って、従来のような光源と受光素子との組立て作業時
における位置調整という煩雑な作業が省略でき、製造工
程を簡素化できると共に、光軸合致精度の向上により、
信頼性を高めることができる。(B) Since the light receiving element 32 and the light emitting element 35 are formed on the same substrate 30, the light receiving element 32 is formed during the manufacturing process.
Thus, the light emitting element 36 can be accurately formed at an accurate arrangement position.
Therefore, it is possible to omit the complicated work of position adjustment at the time of assembling work of the light source and the light receiving element as in the prior art, simplify the manufacturing process, and improve the optical axis matching accuracy.
The reliability can be increased.
(c) 発光素子35と原稿39との距離が短くなるので、
原稿39への入射光が強くなり、S/N比が著しく向上す
る。その上、受光素子32の穴34内に絶縁膜34を介して発
光素子35が形成されているため、光量損失が少なくて光
の出射効率が高く、低消費電力化も期待できる。(C) Since the distance between the light emitting element 35 and the document 39 becomes short,
Incident light on the original 39 becomes stronger and the S / N ratio is significantly improved. In addition, since the light emitting element 35 is formed in the hole 34 of the light receiving element 32 via the insulating film 34, the light quantity loss is small, the light emission efficiency is high, and the low power consumption can be expected.
(d) 共通電極31は、受光素子32及び発光素子35に兼
用されているため、電極本数を削減できる。(D) Since the common electrode 31 is also used as the light receiving element 32 and the light emitting element 35, the number of electrodes can be reduced.
なお、本発明は図示の実施例に限定されず、種々の変形
が可能である。その変形例としては、例えば次のような
ものがある。The present invention is not limited to the illustrated embodiment, and various modifications can be made. The following are examples of such modifications.
(i) 受光素子32及び発光素子35は、図示以外の種々
の材料で形成できる。(I) The light receiving element 32 and the light emitting element 35 can be formed of various materials other than those shown in the drawings.
例えば、第4図では第1図(2)における発光素子箇所
の断面図であるが、この図に示すように、発光素子35A
をアモルファス・シリコン・カーバイド(a−Sic)か
らなる3層のp−i−n接合、あるいはn−i−p接合
で構成してもよい。この場合、絶縁膜34を形成した後、
穴34の低部の絶縁膜34をエッチングして共通電極31の一
部を露出させ、その上に発光素子35AをプラズマCVD、ス
パッタ等により形成し、さらにその上に個別電極37を形
成すればよい。なお、a−Sicは、発光する光における
発光ピークの波長が可視領域なので、受光材料として例
えばa−Si:Hの感度が可視光領域でピークを持つのと適
合する。For example, FIG. 4 is a sectional view of the light emitting element portion in FIG. 1 (2). As shown in FIG.
May be formed by a three-layer pin junction made of amorphous silicon carbide (a-Sic) or an nip junction. In this case, after forming the insulating film 34,
If the insulating film 34 in the lower part of the hole 34 is etched to expose a part of the common electrode 31, the light emitting element 35A is formed thereon by plasma CVD, sputtering, etc., and further the individual electrode 37 is formed thereon. Good. Since a-Sic has a light emission peak wavelength in the visible light region, it is suitable that the sensitivity of a-Si: H as a light receiving material has a peak in the visible light region.
(ii) 共通電極31及び個別電極33,37は、受光素子32
及び発光素子35の配置状態や形状等の変化に応じて、種
々の配置や形状に変形できる。(Ii) The common electrode 31 and the individual electrodes 33 and 37 are the light receiving elements 32.
Also, the light emitting element 35 can be deformed into various arrangements and shapes according to changes in the arrangement state, shape, and the like.
(発明の効果) 以上詳細に説明したように、本発明によれば、基板上に
受光素子を形成し、その受光素子の穴内部に発光素子を
形成した一体構造であるため、全体の小型、軽量化を著
しく向上できると共に、発光素子と受光素子を的確な配
置位置で精度良く形成でき、それによって製造工程の簡
素化と信頼性の向上が図れる。発光素子と原稿との距離
が短くなるので、S/N比が著しく向上し、その上、受光
素子の穴内に発光素子が形成されているため、出射効率
が高く、低消費電力化も期待できる。さらに、共通電極
は発光素子及び受光素子に兼用されているため、電極本
数の削減という効果も期待できる。(Effects of the Invention) As described in detail above, according to the present invention, the light receiving element is formed on the substrate, and the light emitting element is formed inside the hole of the light receiving element. The weight saving can be remarkably improved, and the light emitting element and the light receiving element can be accurately formed at appropriate arrangement positions, thereby simplifying the manufacturing process and improving reliability. Since the distance between the light emitting element and the original is shortened, the S / N ratio is remarkably improved. Moreover, since the light emitting element is formed in the hole of the light receiving element, high emission efficiency and low power consumption can be expected. . Furthermore, since the common electrode is also used as the light emitting element and the light receiving element, the effect of reducing the number of electrodes can be expected.
第1図(1),(2)は本発明の実施例を示すもので、
同図(1)は完全密着型イメージセンサの概略の平面
図、及び同図(2)は同図(1)のA−A線断面図、第
2図は従来の密着型イメージセンサの構成図、第3図は
従来の完全密着型スメージセンサの構成図、第4図は第
1図(2)の発光素子箇所の断面図である。 30……基板、31……共通電極、32……受光素子、33,37
……個別電極、34……穴、35,35A……発光素子、38……
保護膜、39……原稿。1 (1) and 1 (2) show an embodiment of the present invention.
FIG. 1A is a schematic plan view of the perfect contact image sensor, FIG. 2B is a sectional view taken along the line AA of FIG. 1A, and FIG. 2 is a configuration diagram of a conventional contact image sensor. FIG. 3 is a configuration diagram of a conventional perfect contact type image sensor, and FIG. 4 is a cross-sectional view of the light emitting element portion of FIG. 1 (2). 30: substrate, 31: common electrode, 32: light receiving element, 33, 37
...... Individual electrodes, 34 …… Hole, 35,35A …… Light emitting element, 38 ……
Protective film, 39 ... manuscript.
Claims (1)
る完全密着型イメージセンサにおいて、 素子搭載用の基板と、前記基板上に形成された光/電気
変換用の受光素子と、 前記受光素子内の所定領域に形成された穴と、 前記穴内に形成された電気/光変換用の発光素子と、 前記受光素子及び発光素子上に被着された透光性の保護
膜とを、 備えたことを特徴とする完全密着型イメージセンサ。1. A perfect contact image sensor for irradiating light to electrically read an image at a full scale, in which a substrate for mounting an element and a light-receiving element for optical / electrical conversion formed on the substrate, A hole formed in a predetermined region in the light receiving element, a light emitting element for electrical / optical conversion formed in the hole, and a light transmitting protective film deposited on the light receiving element and the light emitting element. , A complete contact image sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26102288A JPH0758767B2 (en) | 1988-10-17 | 1988-10-17 | Perfect contact image sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26102288A JPH0758767B2 (en) | 1988-10-17 | 1988-10-17 | Perfect contact image sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02106981A JPH02106981A (en) | 1990-04-19 |
| JPH0758767B2 true JPH0758767B2 (en) | 1995-06-21 |
Family
ID=17355960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26102288A Expired - Lifetime JPH0758767B2 (en) | 1988-10-17 | 1988-10-17 | Perfect contact image sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0758767B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101360294B1 (en) * | 2008-05-21 | 2014-02-11 | 광주과학기술원 | A reflection type optics sensor device |
-
1988
- 1988-10-17 JP JP26102288A patent/JPH0758767B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02106981A (en) | 1990-04-19 |
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