JPH0759744B2 - Blade surface treatment method - Google Patents
Blade surface treatment methodInfo
- Publication number
- JPH0759744B2 JPH0759744B2 JP63320840A JP32084088A JPH0759744B2 JP H0759744 B2 JPH0759744 B2 JP H0759744B2 JP 63320840 A JP63320840 A JP 63320840A JP 32084088 A JP32084088 A JP 32084088A JP H0759744 B2 JPH0759744 B2 JP H0759744B2
- Authority
- JP
- Japan
- Prior art keywords
- blade
- film
- ion beam
- titanium
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000004381 surface treatment Methods 0.000 title claims description 6
- 238000010884 ion-beam technique Methods 0.000 claims description 27
- 239000010936 titanium Substances 0.000 claims description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 17
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- 239000004215 Carbon black (E152) Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 13
- 229930195733 hydrocarbon Natural products 0.000 claims description 13
- 150000002430 hydrocarbons Chemical class 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 11
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 7
- 238000005566 electron beam evaporation Methods 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- -1 hydrocarbon ions Chemical class 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は刃の表面処理方法、特に電気カミソリ等の刃の
表面に硬質被膜を形成する場合の表面処理方法に関す
る。Description: TECHNICAL FIELD The present invention relates to a surface treatment method for a blade, and particularly to a surface treatment method for forming a hard coating on the surface of a blade such as an electric razor.
（従来の技術） 真空中において母材の表面に金属あるいはセラミックス
等の被膜を形成する手段として、例えば物理蒸着法（以
下「PVD法」という）が知られている。とりわけ、母材
の表面に金属の炭化物や窒化物の膜を形成するPVD法と
して、イオンプレーティング・スパッタリングが一般的
である。(Prior Art) As a means for forming a coating film of metal or ceramics on the surface of a base material in vacuum, for example, a physical vapor deposition method (hereinafter referred to as “PVD method”) is known. In particular, ion plating sputtering is generally used as a PVD method for forming a metal carbide or nitride film on the surface of a base material.
従来、このようなPVD法により母材の表面にTiCN膜を形
成する場合、例えば特開昭60−92465号公報に記載され
ているように、メタン等の炭化水素ガス及び窒素ガスを
槽内に導入させたプラズマ雰囲気中にてチタンを蒸着あ
るいはスパッタリングを行うことにより被膜が形成され
ていた。Conventionally, when forming a TiCN film on the surface of the base material by such a PVD method, as described in, for example, JP-A-60-92465, a hydrocarbon gas such as methane and a nitrogen gas are placed in a tank. The film was formed by vapor-depositing or sputtering titanium in the introduced plasma atmosphere.
（発明が解決しようとする課題） しかしながら、前述した従来の方法によって母材の表面
にTiCN膜を形成する場合、工業レベルにて膜組成や膜構
造を制御するのは必ずしも容易なことではなく、このた
め品質にバラツキが生じるという問題があった。(Problems to be solved by the invention) However, when forming a TiCN film on the surface of the base material by the conventional method described above, it is not always easy to control the film composition and film structure at the industrial level, Therefore, there is a problem in that the quality varies.
また、従来の方法をカミソリ刃等に応用した場合、その
耐食性が問題となる場合があり、水分や塩分等の存在す
る腐食雰囲気下にて長時間使用するとサビが発生し易い
という問題があった。Further, when the conventional method is applied to a razor blade or the like, its corrosion resistance may be a problem, and there is a problem that rust easily occurs when used for a long time in a corrosive atmosphere where water, salt, etc. exist. .
これは、通常のPVD法により被膜を形成した場合、第２
図に示されるように、刃１の表面に形成されたTiCN膜２
の内部にはボイドやピンホール等が多数発生し、これの
欠陥が核となって腐食反応が促進されサビ３が発生する
ためと考えられている。This is the second case when the film is formed by the normal PVD method.
As shown in the figure, the TiCN film 2 formed on the surface of the blade 1
It is considered that a large number of voids, pinholes, and the like are generated inside the steel, and the defects thereof serve as nuclei to promote the corrosion reaction and generate rust 3.
従って、従来の手段によりTiCN膜処理を行ったカミソリ
刃等が使用されるときは、人間の体質や雰囲気によって
問題が発生する場合もあり、これを解決する必要があっ
た。Therefore, when a razor blade or the like treated with a TiCN film by the conventional means is used, a problem may occur depending on the constitution and atmosphere of a person, and it is necessary to solve this.
この発明は斯る課題を解決するためになされたもので、
その目的とするところは、母材となる刃の表面に耐食性
に優れたTiCN膜を形成することのできる刃の表面処理方
法を提供することにある。The present invention has been made to solve the above problems,
It is an object of the invention to provide a blade surface treatment method capable of forming a TiCN film having excellent corrosion resistance on the surface of a blade serving as a base material.
（課題を解決するための手段） 前記目的を達成するために、本発明方法においては、表
面に被膜を形成すべき刃を真空槽内に配置し、この刃に
対し炭化水素ガスおよび窒素ガスのイオンビームをそれ
ぞれ照射すると共に、このイオンビーム照射と同時に蒸
発源からチタンを電子ビーム蒸発させ、チタンの形成速
度に対する各イオンビーム密度を制御しながら刃の表面
にTiCN膜を形成するようにしたことを特徴とする。(Means for Solving the Problems) In order to achieve the above object, in the method of the present invention, a blade for forming a coating on the surface is placed in a vacuum tank, and a hydrocarbon gas and a nitrogen gas are applied to the blade. Irradiation of each ion beam was performed, and at the same time as this ion beam irradiation, titanium was electron beam evaporated from the evaporation source, and a TiCN film was formed on the surface of the blade while controlling each ion beam density with respect to the titanium formation rate. Is characterized by.
（作用） 前記構成により、本発明方法は、いわゆるイオンビーム
アシスト蒸着手段により刃の表面にTiCN膜を形成するも
のであるが、チタンの形成速度に対して炭化水素ガスと
窒素ガスのイオンビーム密度とを制御することにより、
所定の膜組成構造を備えた被膜を得ることができる。(Operation) With the above-described structure, the method of the present invention forms a TiCN film on the surface of the blade by a so-called ion beam assisted vapor deposition means, but the ion beam density of hydrocarbon gas and nitrogen gas with respect to the titanium formation rate. By controlling and
A film having a predetermined film composition structure can be obtained.
このとき、前記炭化水素ガスと窒素ガスとのイオンビー
ム比を制御することで、工業レベルにて膜組成や膜構造
を容易に制御することができ、このため、耐食性に優
れ、かつバラツキの少ない均質なTiCN膜を形成すること
が可能となる。At this time, by controlling the ion beam ratio of the hydrocarbon gas and the nitrogen gas, it is possible to easily control the film composition and the film structure at an industrial level, and therefore, the corrosion resistance is excellent and the variation is small. It is possible to form a uniform TiCN film.
（実施例） 以下、図面に基づき本発明の実施例を説明する。(Examples) Examples of the present invention will be described below with reference to the drawings.
第１図は本発明方法を使用するための装置の概略構成が
示されている。FIG. 1 shows a schematic configuration of an apparatus for using the method of the present invention.
ここで本発明の特徴的なことは、表面に被膜を形成すべ
き刃を真空槽内に配置し、この刃に対し炭化水素ガスお
よび窒素ガスのイオンビームをそれぞれ照射すると共
に、このイオンビーム照射と同時に蒸発源からチタンを
電子ビーム蒸発させ、チタンの形成速度に対する各イオ
ンビーム密度を制御しながら刃の表面にTiCN膜を形成す
るようにしたことである。Here, a characteristic of the present invention is that a blade for forming a film on the surface is arranged in a vacuum chamber, and the blade is irradiated with ion beams of hydrocarbon gas and nitrogen gas, respectively, and the ion beam irradiation is performed. At the same time, electron beam evaporation of titanium from the evaporation source was performed, and the TiCN film was formed on the surface of the blade while controlling each ion beam density with respect to the titanium formation rate.
すなわち、本発明はイオンビームアシスト蒸着手段によ
り刃の表面処理を行うものであり、本実施例において、
表面に被膜を形成すべき刃９が真空チャンバ10内の上方
に配置されている。また、この真空チャンバ10内の下方
には、電子ビーム等の蒸発源４およびその周囲に２台の
イオン銃5,6が設けられている。That is, the present invention is to perform the surface treatment of the blade by the ion beam assisted vapor deposition means, in the present embodiment,
A blade 9 whose surface is to be coated is arranged above the vacuum chamber 10. Further, below the inside of the vacuum chamber 10, an evaporation source 4 such as an electron beam and two ion guns 5 and 6 are provided around the evaporation source 4.
これらのイオン銃5,6のうち、一方のイオン銃５は窒素
ガスボンベ７に接続され、他方のイオン銃６はメタンや
アセチレン等の炭化水素ガスボンベ８に接続されてい
る。Of these ion guns 5 and 6, one ion gun 5 is connected to a nitrogen gas cylinder 7 and the other ion gun 6 is connected to a hydrocarbon gas cylinder 8 such as methane or acetylene.
更に、前記刃９の近傍かつ側方でイオンビームの照射さ
れない領域には、チタン（Ti）の形成速度を検出するた
めの水晶センサ11が設けられており、この水晶センサ11
の前面には、イオンビームが水晶センサに照射されるの
を防ぐための中空円筒状のカバー12が設けられている。Further, a crystal sensor 11 for detecting a titanium (Ti) formation rate is provided in a region near and lateral to the blade 9 where the ion beam is not irradiated.
A hollow cylindrical cover 12 is provided on the front surface of the to prevent the quartz sensor from being irradiated with the ion beam.
前記電子ビーム蒸発源４および膜の形成速度を検出する
ための水晶センサ11は、膜形成速度制御部13に接続され
ている。The electron beam evaporation source 4 and the crystal sensor 11 for detecting the film formation speed are connected to the film formation speed controller 13.
次に本実施例の作用を説明する。まず、真空チャンバ10
内の上方の所定位置に刃９が設定された後、チャンバ10
内が２×10-3Pa以下に真空排気され、続いて１台又は２
台のイオン銃5,6が動作されてクリーニングが行われ
る。このとき、アルゴン又は窒素等のイオンビームが刃
９の表面に照射され、加速電圧として500〜2000V、かつ
２〜数10μA/cm2程度のイオンビームが数分間照射され
る。Next, the operation of this embodiment will be described. First, the vacuum chamber 10
After the blade 9 is set at a predetermined position inside the chamber, the chamber 10
The inside is evacuated to 2 × 10 -3 Pa or less, followed by 1 or 2
The ion guns 5 and 6 of the stand are operated to perform cleaning. At this time, the surface of the blade 9 is irradiated with an ion beam of argon or nitrogen, and an ion beam having an acceleration voltage of 500 to 2000 V and about 2 to several tens μA / cm 2 is irradiated for several minutes.
このようにしてクリーニング作業が行われた後、２台の
イオン銃5,6が動作され、炭化水素ガス及び窒素ガスの
イオンビームがそれぞれ刃９の表面に向け照射される。
また、これらのイオンビーム照射と同時に、蒸発源４か
らチタン（Ti）が刃９の表面に向け電子ビーム蒸発され
る。この結果、炭化水素イオン，窒素イオン，チタンが
刃９の表面にて反応しTiCN膜が形成される。After the cleaning work is performed in this manner, the two ion guns 5 and 6 are operated, and the ion beams of the hydrocarbon gas and the nitrogen gas are irradiated toward the surface of the blade 9, respectively.
Simultaneously with the irradiation of these ion beams, titanium (Ti) from the evaporation source 4 is evaporated by the electron beam toward the surface of the blade 9. As a result, hydrocarbon ions, nitrogen ions and titanium react on the surface of the blade 9 to form a TiCN film.
本実施例において、刃９の表面位置における炭化水素及
び窒素イオンビーム密度は10〜500μA/cm2の範囲で行わ
れ、又チタン（ti）の形成速度は、水晶センサ11を介し
て膜形成速度制御部13により１〜20Å/sの範囲で制御さ
れる。この場合、所定のチタン形成速度に対して、窒素
イオンビーム密度が増加すると赤味がかった膜が形成さ
れ、反対に、炭化水素ガスイオンビーム密度が増加する
と黒味がかった膜が形成されることが判明した。In this embodiment, the hydrocarbon and nitrogen ion beam densities at the surface position of the blade 9 are in the range of 10 to 500 μA / cm 2 , and the titanium (ti) formation rate is the film formation rate via the quartz sensor 11. It is controlled by the control unit 13 in the range of 1 to 20 Å / s. In this case, for a given titanium formation rate, a reddish film is formed when the nitrogen ion beam density is increased, and conversely, a blackish film is formed when the hydrocarbon gas ion beam density is increased. There was found.
このように、チタン（Ti）の形成速度に対する炭化水素
ガスと窒素ガスとのイオンビーム比を制御することで、
所定の膜組成構造を備えたTiCN膜が再現性良く得られ
た。In this way, by controlling the ion beam ratio of hydrocarbon gas and nitrogen gas with respect to the formation rate of titanium (Ti),
A TiCN film having a predetermined film composition structure was obtained with good reproducibility.
以上の条件にてTiCN膜をカミソリ刃の表面に形成させた
ところ、ビッカース硬度1500〜3000HV程度の高硬度膜が
得られ、刃の寿命改善を図ることができた。又、膜の色
が黒色〜赤紫色〜銅色〜金色の領域における色調の制御
も容易に行うことができた。更に、刃の表面に形成され
たTiCN膜の耐食性を塩水噴霧テストによって評価したと
ころ、下表−１で明らかなように、従来のイオンプレー
ティングあるいはスパッタリングによる膜サンプルによ
れば、２〜３サイクル終了後に多量のサビが発生したの
に対し、本実施例のイオンビームアシスト蒸着手段によ
れば、膜サンプルにはサビがほとんど発生しないことが
確認された。When a TiCN film was formed on the surface of a razor blade under the above conditions, a high hardness film with a Vickers hardness of 1500 to 3000 HV was obtained, and the life of the blade could be improved. In addition, it was possible to easily control the color tone in the region where the color of the film was black to magenta to copper to gold. Furthermore, when the corrosion resistance of the TiCN film formed on the surface of the blade was evaluated by a salt spray test, as shown in Table 1 below, according to a film sample by conventional ion plating or sputtering, 2-3 cycles While a large amount of rust was generated after the end, it was confirmed that the film sample was hardly rusted by the ion beam assisted vapor deposition means of this example.
（発明の効果） 以上説明した通り、本発明は、表面に皮膜を形成すべき
刃を真空槽内に配置し、この刃に対し炭化水素ガスおよ
び窒素ガスのイオンビームをそれぞれ照射すると共に、
このイオンビーム照射と同時に蒸発源からチタンを電子
ビーム蒸発させ、チタンの形成速度に対する各イオンビ
ーム密度および比を制御しながら刃の表面にTiCN膜を形
成するようにしたことにより、 工業レベルにて膜組成や膜構造を容易に制御することが
でき、所定の膜組織構造を備えたバラツキの少ない均質
で耐食性に優れた硬質皮膜を形成することができる。 (Effect of the invention) As described above, the present invention arranges a blade to form a film on the surface in a vacuum chamber, and irradiates the blade with ion beams of hydrocarbon gas and nitrogen gas, respectively.
At the same time as this ion beam irradiation, titanium was electron beam evaporated from the evaporation source, and the TiCN film was formed on the blade surface while controlling the density and ratio of each ion beam to the titanium formation rate. It is possible to easily control the film composition and the film structure, and to form a uniform hard film having a predetermined film structure structure with little variation and excellent in corrosion resistance.
第１図は本発明方法を使用するための装置の概略構成を
示す図、第２図は従来の方法により刃の表面に被膜を形
成した場合の拡大断面図である。 ４……電子ビーム蒸発源、5,6……イオン銃 ９……刃、10……真空チャンバ 11……水晶センサ、13……膜形成速度制御部FIG. 1 is a diagram showing a schematic configuration of an apparatus for using the method of the present invention, and FIG. 2 is an enlarged sectional view when a coating is formed on the surface of a blade by a conventional method. 4 ... Electron beam evaporation source, 5, 6 ... Ion gun 9 ... Blade, 10 ... Vacuum chamber 11 ... Crystal sensor, 13 ... Film formation speed control unit
Claims (1)
置し、この刃に対し炭化水素ガスおよび窒素ガスのイオ
ンビームをそれぞれ照射すると共に、このイオンビーム
照射と同時に蒸発源からチタンを電子ビーム蒸発させ、
チタンの形成速度に対する各イオンビーム密度および比
を制御しながら刃の表面にTiCN膜を形成するようにした
ことを特徴とする刃の表面処理方法。1. A blade for forming a film on its surface is arranged in a vacuum chamber, and the blade is irradiated with ion beams of hydrocarbon gas and nitrogen gas, respectively, and at the same time when the ion beam is irradiated, titanium is evaporated from an evaporation source. Electron beam evaporation,
A surface treatment method for a blade, characterized in that a TiCN film is formed on the surface of the blade while controlling the density and ratio of each ion beam to the formation rate of titanium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63320840A JPH0759744B2 (en) | 1988-12-20 | 1988-12-20 | Blade surface treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63320840A JPH0759744B2 (en) | 1988-12-20 | 1988-12-20 | Blade surface treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02166270A JPH02166270A (en) | 1990-06-26 |
| JPH0759744B2 true JPH0759744B2 (en) | 1995-06-28 |
Family
ID=18125828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63320840A Expired - Lifetime JPH0759744B2 (en) | 1988-12-20 | 1988-12-20 | Blade surface treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0759744B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3642427B1 (en) | 2004-03-16 | 2005-04-27 | セイコーエプソン株式会社 | Ornaments and watches |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62146255A (en) * | 1985-12-20 | 1987-06-30 | Citizen Watch Co Ltd | Ion planted black film |
| JPS63251129A (en) * | 1987-04-01 | 1988-10-18 | Daijietsuto Kogyo Kk | Coated cutting edge for cutting tools |
| JPH08972B2 (en) * | 1987-04-06 | 1996-01-10 | 株式会社日立製作所 | Ion mixing method and apparatus |
-
1988
- 1988-12-20 JP JP63320840A patent/JPH0759744B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02166270A (en) | 1990-06-26 |
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