JPH0760522B2 - Method of manufacturing perpendicular magnetic recording medium - Google Patents
Method of manufacturing perpendicular magnetic recording mediumInfo
- Publication number
- JPH0760522B2 JPH0760522B2 JP61012100A JP1210086A JPH0760522B2 JP H0760522 B2 JPH0760522 B2 JP H0760522B2 JP 61012100 A JP61012100 A JP 61012100A JP 1210086 A JP1210086 A JP 1210086A JP H0760522 B2 JPH0760522 B2 JP H0760522B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- recording medium
- magnetic
- perpendicular magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000010410 layer Substances 0.000 claims description 31
- 238000004544 sputter deposition Methods 0.000 claims description 18
- 239000011241 protective layer Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 239000010408 film Substances 0.000 description 35
- 230000005415 magnetization Effects 0.000 description 13
- 238000011282 treatment Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000004804 winding Methods 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229910000599 Cr alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910000889 permalloy Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 101100069231 Caenorhabditis elegans gkow-1 gene Proteins 0.000 description 1
- 229910020647 Co-O Inorganic materials 0.000 description 1
- 229910020704 Co—O Inorganic materials 0.000 description 1
- 229910020517 Co—Ti Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910002593 Fe-Ti Inorganic materials 0.000 description 1
- 229910017116 Fe—Mo Inorganic materials 0.000 description 1
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- 229910003192 Nb–Ta Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910008423 Si—B Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は垂直磁気記録体の製造方法、特に走行耐久性が
改良された垂直磁気記録媒体の製造方法に関する。The present invention relates to a method for manufacturing a perpendicular magnetic recording medium, and more particularly to a method for manufacturing a perpendicular magnetic recording medium with improved running durability.
近年、記録媒体の膜面に対して垂直な方向に磁化容易軸
を有する磁気記録媒体を用いる垂直磁化記録方式が提案
されている。この垂直磁化記録方式では、記録密度が高
まるほど記録媒体中の反磁界が減少するため、優れた再
生出力が得られ本質低級に高密度記録に適した方式とい
える。In recent years, a perpendicular magnetization recording method using a magnetic recording medium having an easy axis of magnetization in a direction perpendicular to the film surface of the recording medium has been proposed. In this perpendicular magnetization recording method, the demagnetizing field in the recording medium decreases as the recording density increases, so that excellent reproduction output can be obtained, and it can be said that this method is suitable for high density recording at an essentially lower level.
かかる垂直磁化記録方式の磁気記録を行なうには、記録
媒体の膜面に対して垂直な方向に磁化容易軸を有する磁
気記録媒体を必要とする。このような垂直磁気記録媒体
としては、高分子材料或いは非磁性金属等の非磁性材料
から成る基板又は支持体上に、Co-Cr合金等をスパツタ
リング法等で形成したものが知られている。In order to perform the magnetic recording of the perpendicular magnetization recording system, a magnetic recording medium having an easy axis of magnetization in a direction perpendicular to the film surface of the recording medium is required. As such a perpendicular magnetic recording medium, there is known one in which a Co—Cr alloy or the like is formed by a sputtering method or the like on a substrate or a support made of a polymer material or a nonmagnetic material such as a nonmagnetic metal.
また、垂直磁化記録再生時の記録再生効率の改善を図る
ため、前記のCo-Cr合金膜より成る垂直磁気記録層の下
に下地層として軟磁性材料より成る高透磁率層、例え
ば、パーマロイ(Ni-Fe系合金)膜を設けた、いわゆる
二層膜型の垂直磁気記録媒体が知られている。Further, in order to improve the recording / reproducing efficiency at the time of perpendicular magnetic recording / reproducing, a high magnetic permeability layer made of a soft magnetic material as an underlayer under the perpendicular magnetic recording layer made of the Co—Cr alloy film, for example, Permalloy ( A so-called double-layer film type perpendicular magnetic recording medium provided with a Ni-Fe alloy film is known.
また、前記垂直磁化記録方式を用いたフレキシブルデイ
スク等においては、支持体の両面に前記の二層型垂直磁
気記録媒体を形成した、いわゆる両面二層型垂直磁気記
録媒体の方が記録容量が大で且つカールの改善がやり易
い等のため優れている。Further, in a flexible disk or the like using the perpendicular magnetization recording system, a so-called double-sided double-layered perpendicular magnetic recording medium in which the double-layered perpendicular magnetic recording medium is formed on both surfaces of a support has a larger recording capacity. It is excellent because it is easy to improve curl.
上記何れのタイプの垂直磁気媒体も、上記材料をスパツ
タリング装置を用いて連続的又は非連続的に支持体に設
けることによつて製造している。Both types of perpendicular magnetic media are produced by applying the material to a support either continuously or discontinuously using a sputtering device.
このような垂直磁気媒体は高密度記録に適した記録媒体
として磁気テープや磁気デイスクに期待されているが、
一つの大きな問題として一般に走行耐久性が極めて悪
く、例えばCo-Cr合金膜を設けた垂直磁気記録デイスク
の場合100回程度の走行パスで表面の合金層の削れ等が
生じて走行不能になることが多い。Such a perpendicular magnetic medium is expected to be a magnetic tape or a magnetic disk as a recording medium suitable for high density recording.
One of the major problems is that the running durability is generally extremely poor, and for example, in the case of a perpendicular magnetic recording disk provided with a Co-Cr alloy film, the alloy layer on the surface is scraped after about 100 running passes, making it impossible to run. There are many.
このような問題を解決するために、カーボン、SiO2、BN
(特開昭58-133627号公報)、SiC(特開昭58-130437号
公報)等を保護層として磁性層表面にスパツタリング等
によつて設けることが提案されている。In order to solve such problems, carbon, SiO 2 , BN
(JP-A-58-133627), SiC (JP-A-58-130437) and the like have been proposed to be provided as a protective layer on the surface of the magnetic layer by sputtering or the like.
しかしながら、これらの処理としてもなお走行耐久性の
改良は不十分であり、特に同じ製造工程にあつても製品
の再現性が悪く、耐久性の良いものや耐久性が極めて悪
いものが得られ一定して耐久性の良いものが得られない
という問題があつた。However, even with these treatments, the improvement of running durability is still insufficient, and even in the same manufacturing process, the reproducibility of the product is poor, and good durability and extremely poor durability are obtained. Then, there was a problem that a durable product could not be obtained.
従つて、本発明は再現性良く走行耐久性が著しく改良さ
れた垂直磁気記録媒体及びその製造方法を提供すること
にある。Accordingly, the present invention is to provide a perpendicular magnetic recording medium having good reproducibility and significantly improved running durability, and a method for manufacturing the same.
本発明は前記問題を解決すべく鋭意研究を重ねた結果、
磁性層の表面に酸化層または窒化層を形成した後に保護
層を設けることにより、耐久性の著しく改良された垂直
磁気記録媒体を再現性よく得ることができることを見出
し、本発明を達成した。The present invention, as a result of repeated studies to solve the above problems,
The inventors have found that a perpendicular magnetic recording medium having remarkably improved durability can be obtained with good reproducibility by providing a protective layer after forming an oxide layer or a nitride layer on the surface of the magnetic layer, and accomplished the present invention.
すなわち、本発明は、非磁性基板の少なくとも1面にス
パッタリングにより垂直磁気異方性を有する磁性層と保
護層を設けることによる垂直磁気記録媒体の製造方法に
おいて、磁性層を設けた後、円筒キャンをターゲットに
対して(−)マイナスの極性にしてスパッタリング(逆
スパッタリング)を行って、該磁性層の表面を酸化また
は窒化処理し、次いで保護層を設けることを特徴とする
垂直磁気記録媒体の製造方法である。That is, the present invention provides a method for manufacturing a perpendicular magnetic recording medium in which a magnetic layer having perpendicular magnetic anisotropy and a protective layer are provided on at least one surface of a non-magnetic substrate by sputtering, after the magnetic layer is provided, a cylindrical can is formed. Of the target is subjected to sputtering (reverse sputtering) with a negative polarity of (-) to oxidize or nitrid the surface of the magnetic layer and then to provide a protective layer. Is the way.
以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
本発明においてはまず非磁性基板上に片面又は両面に膜
面に垂直な方向に磁化容易軸を有する垂直磁化膜、例え
ばCo-Cr膜をスパツタリング、真空蒸着、イオンプレー
テイング等のいわゆる薄膜形成方式で形成する。この場
合、垂直磁化膜を形成する前に低抗磁力または高透磁率
の軟磁性膜、例えばパーマロイ膜を同様にスパツタリン
グ等によつて設けてもよい。また上記垂直磁化膜等は単
層であつても複数の層から構成されていてもよい。また
基板と垂直磁化層との間に非磁性下地層を設けても良い
し、軟磁性層と垂直磁化層との間に非磁性中間層を設け
てもよい。従つて本発明で言う磁性層は、上記の如き垂
直磁化膜のみの場合や軟磁性膜と垂直磁化膜が設けられ
た場合とを包含する。In the present invention, first, a so-called thin film forming method such as sputtering, vacuum deposition, ion plating, or the like on a non-magnetic substrate is provided with a perpendicularly magnetized film having an easy axis of magnetization in a direction perpendicular to the film surface on one or both sides, for example, Co-Cr film To form. In this case, a soft magnetic film having a low coercive force or a high magnetic permeability, for example, a permalloy film may be similarly provided by sputtering or the like before forming the perpendicular magnetization film. Further, the perpendicularly magnetized film or the like may be a single layer or a plurality of layers. A nonmagnetic underlayer may be provided between the substrate and the perpendicular magnetic layer, or a nonmagnetic intermediate layer may be provided between the soft magnetic layer and the perpendicular magnetic layer. Therefore, the magnetic layer referred to in the present invention includes the case where only the perpendicular magnetic film as described above is provided and the case where the soft magnetic film and the perpendicular magnetic film are provided.
本発明における非磁性基体としては、ポリエチレンテレ
フタレート(PET)、ポリイミド、ポリアミド等のフイ
ルム状高分子材料に対して特に顕著な効果を有するが、
金属材料、ガラス等の非金属材料等にも適用される。As the non-magnetic substrate in the present invention, polyethylene terephthalate (PET), polyimide, has a particularly remarkable effect on film-like polymer materials such as polyamide,
It is also applicable to metallic materials, non-metallic materials such as glass, and the like.
軟磁性膜の材料としては、Ni-Fe、Ni-Fe-Mo、Ni-Fe-Mo-
Cu等のパーマロイ合金に限らず、Fe、Fe-Al-Si、Fe-Ni-
O、Fe-Ti、Ni-Fe-Cu-Cr-Mn、Fe-Si-B、Fe-B-C、Fe-Al、
Co-V-Fe、Co-Ta、Co-Zr、Co-Nb-Zr、Co-Ti、Co-Nb-Ta、
Co-Ni-Zr、Fe-Ni-P、Fe-Co-Zr,Co-Mo-Zr等のいわゆる軟
磁性合金材料も適用できる。Materials for the soft magnetic film include Ni-Fe, Ni-Fe-Mo, Ni-Fe-Mo-
Not limited to permalloy alloys such as Cu, Fe, Fe-Al-Si, Fe-Ni-
O, Fe-Ti, Ni-Fe-Cu-Cr-Mn, Fe-Si-B, Fe-BC, Fe-Al,
Co-V-Fe, Co-Ta, Co-Zr, Co-Nb-Zr, Co-Ti, Co-Nb-Ta,
So-called soft magnetic alloy materials such as Co-Ni-Zr, Fe-Ni-P, Fe-Co-Zr, Co-Mo-Zr are also applicable.
膜厚としては0.03〜5ミクロン、特に0.1〜1ミクロン
程度が好ましい。The film thickness is preferably 0.03 to 5 μm, particularly preferably 0.1 to 1 μm.
垂直磁化膜としては、磁化容易軸が支持体表面に対して
ほぼ垂直の方向に向いていることが必要であり、垂直磁
化膜の材料として知られているCoとCrを主成分とする合
金材料が望ましい。The perpendicular magnetization film needs to have the easy axis of magnetization in a direction substantially perpendicular to the surface of the support, and is an alloy material containing Co and Cr as main components, which is known as a material for the perpendicular magnetization film. Is desirable.
膜厚としては、0.03〜5ミクロン程度に選ばれるが、0.
05〜1ミクロン程度が特に望ましい。The film thickness is selected to be about 0.03 to 5 microns, but
05 to 1 micron is especially desirable.
膜形成手段としては、蒸着、スパツター等が用いられる
が後記の実施例でのべるような複数個の円筒状キヤンの
周囲に配置された複数個の高速スパツター源を有するい
わゆる連続スパツター法が望ましい。As the film forming means, vapor deposition, sputter, etc. are used, but a so-called continuous sputter method having a plurality of high speed sputter sources arranged around a plurality of cylindrical cans as described in the examples below is preferable.
スパツター源としては、例えばCo-Cr合金の場合Co-Cr合
金をターゲツトに用いてもよく、CoとCrを別々なターゲ
ツトとして用いてもよい。As the sputter source, for example, in the case of a Co—Cr alloy, a Co—Cr alloy may be used as a target, or Co and Cr may be used as different targets.
円筒状キヤンの温度としては、パーマロイ膜等の硬磁性
膜形成時は軟磁性膜の面内での磁気異方性が生じるのを
防ぐため30℃以上が望ましい。または上記パーマロイ膜
を多層構成とし、その一部を室温以下で形成し、残部を
100〜150℃で形成してもよい。一方、キヤン温度を余り
高くすると支持体からのガス放出や、オリゴマーの析出
等が生ずるため90℃以下が望ましい。The temperature of the cylindrical can is preferably 30 ° C. or higher in order to prevent magnetic anisotropy in the plane of the soft magnetic film when forming a hard magnetic film such as a permalloy film. Alternatively, the above-mentioned permalloy film has a multi-layered structure, a part of which is formed at room temperature or below, and the remaining part is formed.
You may form at 100-150 degreeC. On the other hand, if the Kyan temperature is too high, gas will be released from the support and oligomers will be precipitated.
一方、Co-Cr膜の形成時には、所望のHc(垂直)を得る
ために円筒状キヤンの温度を90℃以上に加熱することが
望ましく、またHc(垂直)の垂直磁化膜を得るために
は、120℃以上が特に望ましい。On the other hand, at the time of forming the Co-Cr film, it is desirable to heat the temperature of the cylindrical can to 90 ° C. or more in order to obtain the desired Hc (perpendicular), and to obtain the Hc (perpendicular) perpendicular magnetization film, 120 ° C or higher is particularly desirable.
本発明においては、上記のようにして形成した磁性層表
面に酸化処理または窒化処理を施こし次いで保護層を設
けることを特徴としている。The present invention is characterized in that the surface of the magnetic layer formed as described above is subjected to an oxidation treatment or a nitriding treatment and then a protective layer is provided.
酸化処理または窒化処理は、酸素又は窒素の存在下にグ
ロー放電処理(O2又はN210-1〜10-4Torr中500V程度)す
るか、酸素又は窒素の存在下に逆スパツタリングを行な
つてもよいし、また酸素イオン又は窒素イオンを磁性層
表面にイオンガンを用いて打ちこんでもよい。スパツタ
リングの場合、磁性層を(ターゲツトを−)スパツタリ
ングによつて設け、この極性を逆にし、酸素又は窒素の
10-1〜10-4Torrの雰囲気中で電圧を印加して逆スパツタ
リングを行えばよい。The oxidation treatment or the nitriding treatment is performed by glow discharge treatment (about 500 V in O 2 or N 2 10 -1 to 10 -4 Torr) in the presence of oxygen or nitrogen, or reverse sputtering in the presence of oxygen or nitrogen. Alternatively, oxygen ions or nitrogen ions may be implanted into the surface of the magnetic layer using an ion gun. In the case of sputtering, a magnetic layer (target-) is provided by sputtering, the polarity is reversed, and oxygen or nitrogen is added.
Reverse sputtering may be performed by applying a voltage in an atmosphere of 10 -1 to 10 -4 Torr.
このようにして表面に酸化層または窒化層が形成された
磁性層表面に次いで保護層をスパツタリング等によつて
設ける。In this way, a protective layer is provided next to the surface of the magnetic layer having the oxide layer or the nitride layer formed thereon by sputtering or the like.
保護層としては、カーボン、MoS2、SiO、SiO2、Co−O
−Cr、Cr−O等が用いられる。これらのうち特にカーボ
ンが好ましい。As the protective layer, carbon, MoS 2, SiO, SiO 2 , Co-O
-Cr, Cr-O, etc. are used. Of these, carbon is particularly preferable.
保護層の膜厚としては0.002μm〜0.1μm、特に0.005
〜0.05が好ましい。The thickness of the protective layer is 0.002 μm to 0.1 μm, especially 0.005 μm.
~ 0.05 is preferred.
本発明によるときは走行耐久性が著しく改良された垂直
磁気記録媒体を再現性良く得ることができる。According to the present invention, a perpendicular magnetic recording medium having remarkably improved running durability can be obtained with good reproducibility.
第1図は本発明の垂直磁気記録媒体を作成するのに用い
られるスパツター装置の一例を示す概略図である。FIG. 1 is a schematic view showing an example of a sputter device used for producing the perpendicular magnetic recording medium of the present invention.
第1図に図示される両面連続スパツター装置を用いて両
面二層型垂直磁化媒体を作成した。50ミクロン厚のロー
ル状のポリイミドフイルム41を送出軸42にセツトし、中
間ローラ及び円筒状キヤン43,44を経て巻取軸45に巻取
られるようにした。真空槽は送出室46、スパツター室4
7、巻取室48の3つに大別し、各室は隔壁49,50で仕切
り、各室はそれぞれ排気系51,52及び53,54により排気し
た。スパツター室にはカーボンを有するDCプレーナマグ
ネトロン方式のスパツターカソード55,57、及びCo-Crタ
ーゲツト(Co82-Cr18重量%)を有するRFプレーナマグ
ネトロン方式のスパツターカソード56,58を設けた。A double-sided double-layered perpendicular magnetization medium was prepared by using the double-sided continuous sputter device shown in FIG. A 50-micron-thick roll-shaped polyimide film 41 was set on a delivery shaft 42, and was wound around a winding shaft 45 via an intermediate roller and cylindrical cans 43 and 44. The vacuum chamber has a delivery chamber 46 and a sputter chamber 4
7. The winding chamber 48 is roughly divided into three, each chamber is partitioned by partition walls 49, 50, and each chamber is exhausted by exhaust systems 51, 52 and 53, 54, respectively. The DC planar magnetron type sputter cathodes 55, 57 having carbon and the RF planar magnetron type sputter cathodes 56, 58 having Co-Cr targets (Co82-Cr 18 wt%) were provided in the sputter chamber.
かかるスパツター装置のスパツター室内47を1×10-6to
rr以下の圧力までキヤンを150℃に加熱保持し、ガス導
入系59よりArガスを導入し、約5×10-3torrに維持し
た。送出軸42より20cm/minの搬送速度で送出されたポリ
イミドフイルム41上に、まずキヤン43の位置でスパツタ
ーカソード56により片面の面(O面)に約3,000ÅのCo-
Cr膜を形成した。続いてキヤン44の位置でスパツターカ
ソード58によりもう一方の面(I面)に約3,000ÅのCo-
Cr膜を形成し、巻取軸45で巻取つた。The sputter chamber 47 of the sputter device is set to 1 × 10 -6 to
The can was heated and maintained at 150 ° C. up to a pressure of rr or less, Ar gas was introduced from the gas introduction system 59, and maintained at about 5 × 10 −3 torr. On the polyimide film 41 delivered from the delivery shaft 42 at a transport speed of 20 cm / min, first, at a position of the can 43, a sputter cathode 56 is provided on one surface (O surface) of about 3,000Å of Co-.
A Cr film was formed. Next, at the position of the key 44, the sputter cathode 58 is used to deposit Co- of approximately 3,000Å on the other surface (I surface).
A Cr film was formed and wound on the winding shaft 45.
このようにして両面にCo-Cr膜を形成したポリイミドフ
イルムを再び逆転して巻取軸45から搬送し、再度1×10
-6Torr以下に排気した後Arガス噴出を止め酸素ガスを約
5×10-3Torrに維持し、スパツタの極性を切り換え、キ
ヤン43及び44の位置で酸素雰囲気中で逆スパツタリング
を行い、両表面に酸化処理を施した後巻軸42に巻取つ
た。In this way, the polyimide film having the Co-Cr film formed on both sides is reversed again and conveyed from the winding shaft 45, and 1 × 10 6 again.
After exhausting to -6 Torr or less, stop the Ar gas ejection and maintain the oxygen gas at about 5 × 10 -3 Torr, switch the polarity of the spatula, and perform reverse spattering in the oxygen atmosphere at the positions of 43 and 44. After the surface was oxidized, it was wound on the winding shaft 42.
次いで、酸素雰囲気をAr雰囲気となしスパツタの極性を
もとにもどし、巻軸42から再度送転し、キヤン43及び44
の位置でカーボンカソード55,57よりカーボンの保護層
を厚さ200Åで形成し、巻軸45に巻き取つた。Then, the oxygen atmosphere is changed to the Ar atmosphere and the polarity of the spatter is returned to the original state, and the film is re-transferred from the winding shaft 42, and the cans 43 and 44 are transferred.
A carbon protective layer having a thickness of 200Å was formed from the carbon cathodes 55 and 57 at the position of and was wound around the winding shaft 45.
このようにして作成した垂直磁気媒体を直径3.5インチ
のデイスクにカツトし、市販のデイスクジヤケツトに組
み込んだ。The perpendicular magnetic medium thus prepared was cut into a disk having a diameter of 3.5 inches and incorporated into a commercially available disk jacket.
市販3.5フロツピデイスクドライブにより記録を行つた
後、600r.p.mで回転させ、再生信号をモニターしながら
走行させ走行が止まるまでのパス数を測定した。(最大
1000万パスでテストを中止した。) 比較のため上記作成で酸化処理(酸素雰囲気での逆スパ
ツタリング処理)を行わなかつたもの、及びCo-Cr層の
みを設けたものを作り同様なテストを行つた。After recording with a commercially available 3.5 floppy disk drive, it was rotated at 600 rpm and the number of passes until the driving stopped while running while monitoring the playback signal was measured. (maximum
The test was stopped after 10 million passes. ) For comparison, the same test was carried out by making one that was not subjected to the oxidation treatment (reverse sputtering process in an oxygen atmosphere) and one that was provided with only the Co-Cr layer in the above preparation.
各々10コの試料を作つてテストした。Ten samples were prepared and tested.
得られた結果を第2図に示した。The obtained results are shown in FIG.
第2図の結果からも明らかなように、Co-Cr膜のみを設
けた試料は約100パス以上で走行不能になり、酸化処理
を行わずにカーボン保護層を設けたものは、1万パスか
ら1000万パスまで走行耐久性にばらつきがあり、再現性
が悪かつた。これに対して本発明による場合は何れも約
走行パスが1000万パスに近い著しく耐久性のすぐれた垂
直磁気媒体を再現性良く製造することができた。As is clear from the results shown in Fig. 2, the sample provided with only the Co-Cr film became unable to run after about 100 passes, and the sample provided with the carbon protective layer without oxidation treatment had 10,000 passes. From 10 to 10 million passes, there was variation in running durability, and reproducibility was poor. On the other hand, according to the present invention, it was possible to manufacture the perpendicular magnetic medium with remarkably excellent durability in which the running path was close to 10 million paths.
上記実施例は逆スパツタリングにより酸化処理を行う場
合を示したが、グロー処理によつて酸化処理することが
できる。また酸素の代りに窒素を用いてほぼ同様の結果
が得られた。Although the above embodiment shows the case where the oxidation treatment is performed by the reverse sputtering, the oxidation treatment can be performed by the glow treatment. Also, almost the same result was obtained by using nitrogen instead of oxygen.
また、Co-Cr膜のみでなく、前記した如き軟磁性層を設
けた上にCo-Cr膜を設けてもよい。Further, not only the Co—Cr film but also the Co—Cr film may be provided on the soft magnetic layer as described above.
第1図は本発明の垂直磁気媒体を製造する装置の一例を
示す概略図、第2図は実施例における走行パステストの
結果を示す図である。 43,44……キヤン、55,57……カーボンカソード、56,58
……Co-Crカソード。FIG. 1 is a schematic view showing an example of an apparatus for producing a perpendicular magnetic medium of the present invention, and FIG. 2 is a view showing results of a traveling path test in the embodiment. 43,44 …… Kyan, 55,57 …… Carbon cathode, 56,58
...... Co-Cr cathode.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 名原 明 神奈川県小田原市扇町2丁目12番1号 富 士写真フイルム株式会社内 (56)参考文献 特開 昭60−57535(JP,A) 特開 昭61−117728(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Nahara 2-12-1, Ogimachi, Odawara-shi, Kanagawa Fuji Photo Film Co., Ltd. (56) Reference JP-A-60-57535 (JP, A) Kai 61-117728 (JP, A)
Claims (2)
ングにより垂直磁気異方性を有する磁性層と保護層を設
けることによる垂直磁気記録媒体の製造方法において、
磁性層を設けた後、円筒キャンをターゲットに対して−
(マイナス)の極性にしてスパッタリング(逆スパッタ
リング)を行って、該磁性層の表面を酸化または窒化処
理し、次いで保護層を設けることを特徴とする垂直磁気
記録媒体の製造方法。1. A method of manufacturing a perpendicular magnetic recording medium, comprising providing a magnetic layer having perpendicular magnetic anisotropy and a protective layer on at least one surface of a non-magnetic substrate by sputtering.
After providing the magnetic layer, place the cylindrical can on the target.
A method of manufacturing a perpendicular magnetic recording medium, characterized in that sputtering (reverse sputtering) is performed with a (minus) polarity to oxidize or nitrid the surface of the magnetic layer, and then a protective layer is provided.
成を同一真空槽中で行うことを特徴とする特許請求の範
囲第(1)項に記載の垂直磁気記録媒体の製造方法。2. The method of manufacturing a perpendicular magnetic recording medium according to claim 1, wherein the nonmagnetic layer and the oxide layer or the nitride layer are formed in the same vacuum chamber.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012100A JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
| US07/506,493 US4994321A (en) | 1986-01-24 | 1990-04-05 | Perpendicular magnetic recording medium and the method for preparing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012100A JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62175925A JPS62175925A (en) | 1987-08-01 |
| JPH0760522B2 true JPH0760522B2 (en) | 1995-06-28 |
Family
ID=11796146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61012100A Expired - Fee Related JPH0760522B2 (en) | 1986-01-24 | 1986-01-24 | Method of manufacturing perpendicular magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0760522B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0695363B2 (en) * | 1987-08-27 | 1994-11-24 | ティーディーケイ株式会社 | Magnetic recording / reproducing device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6057535A (en) * | 1983-09-08 | 1985-04-03 | Hitachi Maxell Ltd | magnetic recording medium |
| JPS61117728A (en) * | 1984-11-13 | 1986-06-05 | Anelva Corp | Magnetic recording medium |
-
1986
- 1986-01-24 JP JP61012100A patent/JPH0760522B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62175925A (en) | 1987-08-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0840293B1 (en) | Magnetic recording medium, method of fabricating magnetic recording medium, and magnetic storage | |
| US4994321A (en) | Perpendicular magnetic recording medium and the method for preparing the same | |
| US4869797A (en) | Method for preparing a magnetic recording medium | |
| US4865878A (en) | Method of manufacturing vertical magnetization type recording medium | |
| US5796533A (en) | System for magnetic contact duplication | |
| JPH0760522B2 (en) | Method of manufacturing perpendicular magnetic recording medium | |
| JPH0221046B2 (en) | ||
| JPS62175926A (en) | Vertical magnetic recording medium and its production | |
| US4526131A (en) | Magnetic recording medium manufacturing apparatus | |
| JPH0215418A (en) | Magnetic recording medium and magnetic recording and reproducing method | |
| JPS62298917A (en) | Magnetic recording medium | |
| JPS63845B2 (en) | ||
| JPS61187122A (en) | Magnetic recording medium | |
| JPH0381202B2 (en) | ||
| JPS61284826A (en) | Magnetic recording medium | |
| JPS62162222A (en) | Vertical magnetic recording medium and its production | |
| JPS6043915B2 (en) | Vacuum deposition method | |
| JPH08129741A (en) | Magnetic recording media | |
| JPS61284829A (en) | magnetic recording medium | |
| JPH097172A (en) | Magnetic recording medium and method of manufacturing the same | |
| JPH0548530B2 (en) | ||
| JPS61180921A (en) | Vertically magnetized recording medium and its production | |
| JPH0142046B2 (en) | ||
| JPS63217529A (en) | Production of magnetic recording medium | |
| JPH0833989B2 (en) | Method of manufacturing magnetic recording medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |