JPH0762249B2 - Optical disk manufacturing equipment - Google Patents
Optical disk manufacturing equipmentInfo
- Publication number
- JPH0762249B2 JPH0762249B2 JP61136599A JP13659986A JPH0762249B2 JP H0762249 B2 JPH0762249 B2 JP H0762249B2 JP 61136599 A JP61136599 A JP 61136599A JP 13659986 A JP13659986 A JP 13659986A JP H0762249 B2 JPH0762249 B2 JP H0762249B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- main vacuum
- film
- substrate
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims description 20
- 238000007740 vapor deposition Methods 0.000 claims description 9
- 238000001771 vacuum deposition Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 description 35
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明はビデオディスク、ディジタルオーディオディス
ク（例えばコンパクトディスク）、静止画、文書ファイ
ルなどのディジタル信号を記録、再生または消去可能な
光ディスクの製造装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disc manufacturing apparatus capable of recording, reproducing or erasing digital signals such as video discs, digital audio discs (eg compact discs), still images and document files. Is.
従来の技術 一般に光ディスクはその情報密度が極めて大きいこと
や、S/N比も大きく、ノイズが少ないことなどから情報
媒体として有望視され、ビデオディスクやディジタルオ
ーディオディスクとして商品化され、ディジタル信号を
記録、再生する光ディスクとしても近年研究開発が行わ
れている。Conventional technology Generally, optical discs are promising as information media due to their extremely high information density, large S / N ratio, and low noise, and they have been commercialized as video discs and digital audio discs to record digital signals. In recent years, research and development have also been carried out as an optical disc for reproduction.
第４図に従来の一般的なディジタルオーディオディスク
であるコンパクトディスクの概要を示す。これはPCM変
換されたディジタル信号が樹脂基板にピット列状に記録
され半導体レーザにより再生されるものである。FIG. 4 shows an outline of a compact disc which is a conventional general digital audio disc. This is a method in which a PCM-converted digital signal is recorded on a resin substrate in the form of pit rows and reproduced by a semiconductor laser.
第４図において、１はディスク、２は樹脂基板、３は樹
脂基板２に刻まれたピット列状のディジタル信号部、４
はその表面に形成された反射膜、５は反射膜４にコーテ
ィングされた保護膜、６は保護膜５に設けられたレーベ
ル印刷膜、７は再生用の半導体レーザ光である。In FIG. 4, 1 is a disc, 2 is a resin substrate, 3 is a digital signal portion in the form of pits carved in the resin substrate 2, 4
Is a reflective film formed on the surface thereof, 5 is a protective film coated on the reflective film 4, 6 is a label printing film provided on the protective film 5, and 7 is a semiconductor laser beam for reproduction.
反射膜４はディジタル信号を再生するため、保護膜５は
反射膜を保護するため、レーベル印刷膜６はディスクを
識別するため各々必要なものである。The reflective film 4 is necessary for reproducing a digital signal, the protective film 5 is necessary for protecting the reflective film, and the label print film 6 is necessary for disc identification.
従来の反射膜または記録膜を形成する光ディスク製造装
置についてのべる。第２図に基板上に反射膜または記録
膜を形成する従来の薄膜形成装置の断面図を示す。８は
薄膜形成装置の真空室であり、９はその真空排気装置で
ある。蒸着源10がヒータ11の加熱により真空蒸着され、
基板２に反射膜または記録膜が形成される。A conventional optical disk manufacturing apparatus for forming a reflective film or a recording film will be described. FIG. 2 shows a sectional view of a conventional thin film forming apparatus for forming a reflective film or a recording film on a substrate. Reference numeral 8 is a vacuum chamber of the thin film forming apparatus, and 9 is its vacuum exhaust apparatus. The evaporation source 10 is vacuum-deposited by heating the heater 11,
A reflective film or a recording film is formed on the substrate 2.
次に、別の種類の従来の反射膜または記録膜を形成する
光ディスク製造装置についてのべる。第３図にこの装置
の断面図を示す。２つの予備真空室12と１つの主真空蒸
着室13より構成され、各々の真空室には独立した真空排
気装置14が設けられている。予備真空室12にて真空排気
され、主真空蒸着室13にて蒸着源10がヒータ11の加熱に
より真空蒸着され、基板２に反射膜または記録膜が形成
される。Next, an optical disk manufacturing apparatus for forming another type of conventional reflection film or recording film will be described. FIG. 3 shows a sectional view of this device. It is composed of two preliminary vacuum chambers 12 and one main vacuum deposition chamber 13, and each vacuum chamber is provided with an independent vacuum exhaust device 14. The preliminary vacuum chamber 12 is evacuated to vacuum, and the main vacuum deposition chamber 13 vacuum-deposits the vapor deposition source 10 by heating the heater 11 to form a reflective film or a recording film on the substrate 2.
発明が解決しようとする問題点 しかしながら上記のような構成では、ディスク基板は一
般的にポリカーボネート（PC）やアクリル（PMMA）など
の樹脂であるため、基板表面に水分（H2O）や酸素
（O2）などが吸着される。これが主真空室に入ることに
より、主真空室内でのH2OやO2濃度が高くなり、クライ
オポンプなどで構成された真空排気装置は短期間でダメ
ージを受け排気能力が低下し正常な真空装置として動作
しないなどの問題点を有していた。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention However, in the above configuration, since the disk substrate is generally a resin such as polycarbonate (PC) or acrylic (PMMA), moisture (H 2 O) or oxygen ( O 2 ) etc. are adsorbed. By entering this into the main vacuum chamber, the H 2 O and O 2 concentrations in the main vacuum chamber increase, and the vacuum exhaust device composed of a cryopump, etc. is damaged in a short period of time and its exhaust capacity decreases and normal vacuum is generated. There was a problem that it did not work as a device.
本発明は上記問題点に鑑み、光ディスクを量産性よく安
価に製造することのできる光ディスクの製造装置を提供
するものである。In view of the above problems, the present invention provides an optical disc manufacturing apparatus capable of mass-producing optical discs with good mass productivity.
問題点を解決するための手段 上記問題点を解決するために本発明の光ディスク製造装
置は同等能力の切替え可能な主真空排気装置を２基以上
もった主真空蒸着室と、各々独立した予備真空排気装置
をもった２室以上の前記主真空蒸着室に接続された予備
真空室とを備え、前記主真空蒸着室内にて基板上に反射
膜または記録膜を形成するようにしたものである。Means for Solving the Problems In order to solve the above problems, the optical disk manufacturing apparatus of the present invention has a main vacuum deposition chamber having two or more main vacuum evacuation devices of the same capability and capable of switching, and an independent preliminary vacuum. A preliminary vacuum chamber connected to two or more main vacuum vapor deposition chambers having an exhaust device is provided, and a reflective film or a recording film is formed on a substrate in the main vacuum vapor deposition chamber.
作用 本発明は上記した構成によって、予備真空室にて基板上
に付着したH2O，O2などの不純物を排気し、主真空室に
て蒸着を行なう。しかも、主真空室において基板からの
H2O，O2などの影響を受けても正常な膜形成が可能なよ
うに同等能力の切替え可能な主真空排気装置を２基以上
設けている。これにより一方の主真空排気装置がダメー
ジを被っても、他方の主真空排気装置において正常な膜
形成が行える。膜形成後、次の予備真空室を通じて基板
が大気に取出され、基板上に反射膜または記録膜を連続
的に安定して形成することができる。Operation According to the present invention, impurities such as H 2 O and O 2 adhering to the substrate are exhausted in the preliminary vacuum chamber and vapor deposition is performed in the main vacuum chamber according to the above configuration. Moreover, in the main vacuum chamber,
Two or more main vacuum evacuation devices that have the same capability and can be switched are provided so that normal film formation can be performed even when affected by H 2 O and O 2 . As a result, even if one of the main vacuum exhaust devices is damaged, normal film formation can be performed in the other main vacuum exhaust device. After the film is formed, the substrate is taken out to the atmosphere through the next preliminary vacuum chamber, and the reflective film or the recording film can be continuously and stably formed on the substrate.
実施例 以下本発明の一実施例の光ディスク製造装置について、
図面を参照しながら説明する。Example An optical disc manufacturing apparatus according to an example of the present invention will be described below.
A description will be given with reference to the drawings.
第１図は本発明の光ディスク製造装置15の断面図を示す
ものである。第１図において16は予備真空室（１）、17
は予備真空室（１）16用の真空排気装置（１）、18は予
備真空室（２）、19は予備真空室（２）18用の真空排気
装置（２）、20は主真空蒸着室、21は主真空蒸着室20用
の主真空排気装置（１）、22は同主真空排気装置（２）
で主真空排気装置（１）と同等の能力をもち、切替え可
能である。23はスパッター用ターゲットである。FIG. 1 shows a sectional view of an optical disk manufacturing apparatus 15 of the present invention. In FIG. 1, 16 is a preliminary vacuum chamber (1), 17
Is a vacuum evacuation device (1) for the preliminary vacuum chamber (1) 16, 18 is a preliminary vacuum chamber (2), 19 is a vacuum evacuation device (2) for the preliminary vacuum chamber (2) 18, and 20 is a main vacuum deposition chamber , 21 are main vacuum exhaust devices (1) for the main vacuum deposition chamber 20, and 22 are main vacuum exhaust devices (2) of the same.
It has the same capacity as the main vacuum exhaust device (1) and can be switched. Reference numeral 23 is a sputtering target.
基板２が、予備真空室（１）16に入り、真空排気装置
（１）17により排気されたのち、主真空蒸着室20に入れ
られる。ここで通常は主真空排気装置（１）21により真
空に排気されたのち、ターゲット23により基板２上に基
板２上にアルミニウム（Al）反射膜が形成される。次
に、反射膜の形成された基板は予備真空室（２）18に入
り、大気に取出される。その後、予備真空室（２）18は
真空排気装置（２）19により真空に排気される。この工
程により順次基板上にAl反射膜が形成される。The substrate 2 enters the preliminary vacuum chamber (1) 16, is evacuated by the vacuum evacuation device (1) 17, and then is placed in the main vacuum deposition chamber 20. Here, normally, after being evacuated to a vacuum by the main vacuum exhaust device (1) 21, an aluminum (Al) reflective film is formed on the substrate 2 by the target 23. Next, the substrate on which the reflective film is formed enters the preliminary vacuum chamber (2) 18 and is taken out to the atmosphere. After that, the preliminary vacuum chamber (2) 18 is evacuated to a vacuum by the vacuum evacuation device (2) 19. By this step, the Al reflection film is sequentially formed on the substrate.
しかしながら、基板は一般的にはポリカーボネート（P
C）やアクリル（PMMA）などの樹脂製であるため、その
表面に水分（H2O）、酸素（O2）などの不純物が大量に
付着している。また、近年高排気速度を得るためにクラ
イオポンプが一般的に主真空排気装置として使用されて
いるが、これは前述のH2OやO2などには極めてダメージ
を受け易く大量のH2O，O2などによりその排気能力が低
下し寿命に到る。この場合に、主真空排気装置（２）22
に切り替えれば時間のロスなく本製造装置は正常に動作
することができる。この間に主真空排気装置（１）の排
気能力再生を行えば、次に主真空排気装置（２）に寿命
が来ても、主真空排気装置（１）で正常動作が可能とな
る。このように本発明の光ディスク製造装置によれば、
安定して連続的に反射膜または記録膜の形成ができる。However, the substrate is typically polycarbonate (P
Since it is made of resin such as C) or acrylic (PMMA), a large amount of impurities such as water (H 2 O) and oxygen (O 2 ) adhere to the surface. Further, in recent years, a cryopump is generally used as a main vacuum exhaust device to obtain a high exhaust speed, but this is extremely susceptible to damage to the above-mentioned H 2 O and O 2, and a large amount of H 2 O. , O 2 etc. reduce the exhaust capacity and reach the end of life. In this case, the main vacuum exhaust device (2) 22
By switching to, the manufacturing apparatus can operate normally without loss of time. If the exhaust capacity of the main vacuum exhaust device (1) is regenerated during this period, the main vacuum exhaust device (1) can operate normally even when the life of the main vacuum exhaust device (2) is reached next. Thus, according to the optical disc manufacturing apparatus of the present invention,
A reflective film or a recording film can be stably and continuously formed.
発明の効果 以上のように本発明は、同等能力の切替え可能な主真空
排気装置を２基以上もった主真空蒸着室と、各々独立し
た予備真空排気装置をもった２室以上の前記主真空蒸着
室に接続された予備真空室とを備え、前記主真空蒸着室
内にて基板上に反射膜または記録膜を形成するようにし
たものであり、一方の主真空排気装置が基板より持込み
の不純物によりダメージを受けても、他方の主真空排気
装置に切替えることにより正常動作が可能となる。この
ように、本光ディスク製造装置は時間のロスなく安定し
て連続的に、反射膜または記録膜を形成することができ
るので、安価に大量に光ディスクを提供することができ
る。EFFECTS OF THE INVENTION As described above, according to the present invention, a main vacuum vapor deposition chamber having two or more main vacuum evacuation devices capable of switching the same capacity and two or more main vacuum chambers each having an independent preliminary vacuum evacuation device are provided. An auxiliary vacuum chamber connected to the vapor deposition chamber is provided, and a reflection film or a recording film is formed on the substrate in the main vacuum vapor deposition chamber, and one main vacuum exhaust device carries impurities introduced from the substrate. Even if it is damaged by, normal operation becomes possible by switching to the other main vacuum exhaust device. In this way, the present optical disc manufacturing apparatus can stably and continuously form the reflection film or the recording film without loss of time, so that a large number of optical discs can be provided at low cost.
第１図は本発明の一実施例における光ディスク製造装置
の断面図、第２図は従来の光ディスクの薄膜形成装置の
断面図、第３図は他の従来の光ディスクの薄膜形成装置
の断面図、第４図（ａ），（ｂ），（ｃ）は光ディスク
の一種であるディジタルオーディオディスクの各々平面
図、断面図、および要部拡大図である。 １……ディスク、２……基板、15……光ディスク製造装
置、16……予備真空室（１）、17……真空排気装置
（１）、18……予備真空室（２）、19……真空排気装置
（２）、20……主真空蒸着室、21……主真空排気装置
（１）、22……主真空排気装置（２）、23……ターゲッ
ト。FIG. 1 is a sectional view of an optical disk manufacturing apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view of a conventional optical disk thin film forming apparatus, and FIG. 3 is a sectional view of another conventional optical disk thin film forming apparatus. 4 (a), (b), and (c) are a plan view, a sectional view, and an enlarged view of a main part of a digital audio disc, which is a type of optical disc. 1 ... Disc, 2 ... Substrate, 15 ... Optical disc manufacturing device, 16 ... Preliminary vacuum chamber (1), 17 ... Vacuum exhaust device (1), 18 ... Preliminary vacuum chamber (2), 19 ... Vacuum exhaust system (2), 20 ... Main vacuum deposition chamber, 21 ... Main vacuum exhaust system (1), 22 ... Main vacuum exhaust system (2), 23 ... Target.
Claims (1)
２基以上もった主真空蒸着室と、各々独立した予備真空
排気装置をもった２室以上の前記主真空蒸着室に接続さ
れた予備真空室とを備え、前記主真空蒸着室内にて基板
上に反射膜または記録膜を形成するようにした光ディス
ク製造装置。1. A main vacuum vapor deposition chamber having two or more main vacuum evacuation devices capable of switching the same capacity, and two or more main vacuum vapor deposition chambers each having an independent preliminary vacuum evacuation device. An optical disk manufacturing apparatus comprising a preliminary vacuum chamber, wherein a reflection film or a recording film is formed on a substrate in the main vacuum deposition chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136599A JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136599A JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62294174A JPS62294174A (en) | 1987-12-21 |
| JPH0762249B2 true JPH0762249B2 (en) | 1995-07-05 |
Family
ID=15179065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61136599A Expired - Fee Related JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762249B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0426762A (en) * | 1990-05-17 | 1992-01-29 | Rohm Co Ltd | Rotary introducing mechanism in vacuum vessel |
| DE19617155B4 (en) * | 1995-06-28 | 2007-07-26 | Oc Oerlikon Balzers Ag | Sputter coating station, method for producing sputter-coated workpieces and use of the station or the method for coating disc-shaped substrates |
| JP2011106000A (en) * | 2009-11-19 | 2011-06-02 | Showa Denko Kk | Inline-type vacuum film-forming apparatus and method for producing magnetic recording medium |
| JP5930791B2 (en) | 2011-04-28 | 2016-06-08 | 日東電工株式会社 | Vacuum film-forming method and laminate obtained by the method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS438448Y1 (en) * | 1964-07-27 | 1968-04-15 | ||
| JPS5814337A (en) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | Continuous metallizing device for material to be treated such as disc |
-
1986
- 1986-06-12 JP JP61136599A patent/JPH0762249B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62294174A (en) | 1987-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |