JPH0763687B2 - Article cleaning method and device - Google Patents
Article cleaning method and deviceInfo
- Publication number
- JPH0763687B2 JPH0763687B2 JP13523986A JP13523986A JPH0763687B2 JP H0763687 B2 JPH0763687 B2 JP H0763687B2 JP 13523986 A JP13523986 A JP 13523986A JP 13523986 A JP13523986 A JP 13523986A JP H0763687 B2 JPH0763687 B2 JP H0763687B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- mixing
- mixing device
- tank
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 83
- 238000000034 method Methods 0.000 title claims description 10
- 239000007788 liquid Substances 0.000 claims description 44
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 30
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 15
- 239000001569 carbon dioxide Substances 0.000 claims description 15
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 9
- 238000011144 upstream manufacturing Methods 0.000 claims description 9
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は物品の洗浄方法及び装置に関し、特にIC基盤の
ような微細な隙間や孔を有する物品の洗浄に適した洗浄
方法及び装置に関する。Description: TECHNICAL FIELD The present invention relates to a method and apparatus for cleaning articles, and more particularly to a method and apparatus for cleaning articles having fine gaps and holes such as IC substrates.
微細な隙間や凹部を有する基盤などの精密加工品の洗浄
には一般に超音波洗浄が行われている。Ultrasonic cleaning is generally used for cleaning precision processed products such as substrates having fine gaps or recesses.
超音波洗浄は物品の平滑面に付着している汚れは比較的
容易に除去できるが微細な隙間や小孔の中に付着してい
る汚れは軟着状になるものの完全離脱までにいたらな
い。このため製品としての歩留まりが悪く、また払拭・
除去などの機械的後処理に手数がかかるという問題があ
った。さらに、発振子を用いた従来の超音波装置の発生
周波数はせいぜい28kHzであり、それ自体、性能的に不
充分であった。Ultrasonic cleaning can remove stains adhering to the smooth surface of an article relatively easily, but stains adhering to fine gaps or small holes become soft-fitting, but are not completely removed. Therefore, the yield of the product is poor, and
There is a problem in that mechanical post-processing such as removal is troublesome. Further, the frequency of the conventional ultrasonic device using the oscillator is 28 kHz at most, which is insufficient in itself.
本発明は、この問題を解消するためになされたもので、
その目的は基盤の隙間や小孔内の汚れを洗浄槽内で簡単
且つ完全に除去できる新規な洗浄方法及びこの方法を実
施する装置を提供することにある。The present invention has been made to solve this problem,
It is an object of the present invention to provide a novel cleaning method capable of easily and completely removing dirt in a gap or a small hole of a substrate in a cleaning tank, and an apparatus for carrying out this method.
上記目的を達成するために本発明は、被洗浄物を収納し
た洗浄槽の洗浄液を所定流圧で循環させると同時に循環
系の洗浄液を空気に導入しながら混合装置で気‐液混合
することにより、洗浄槽内に、微細気泡を含む噴出流と
超音波とを生させ、これにより槽内の被洗浄物に超音波
洗浄と摩擦洗浄による第1次洗浄を施こし、次いで、洗
浄槽を密閉して循環系の上記混合装置を通して洗浄液に
二酸化炭素を圧入混合しながら溶解させ、しかる後、洗
浄槽を減圧して洗浄液中の混合気体を液中から沸騰状に
発散離脱させることにより槽内の被洗浄物に離脱時の振
動及び波動による第2次の洗浄を施こすようにしたもの
である。In order to achieve the above object, the present invention is to circulate a cleaning liquid in a cleaning tank containing an object to be cleaned at a predetermined flow pressure and at the same time, introduce a cleaning liquid in a circulation system into air to perform gas-liquid mixing by a mixing device. , A jet flow containing fine bubbles and ultrasonic waves are generated in the cleaning tank, whereby the object to be cleaned in the tank is subjected to primary cleaning by ultrasonic cleaning and friction cleaning, and then the cleaning tank is closed. Then, carbon dioxide is dissolved in the cleaning liquid while being pressed and mixed into the cleaning liquid through the mixing device of the circulation system, and then the cleaning tank is depressurized to cause the mixed gas in the cleaning liquid to diverge in a boiling state from the liquid to separate the gas in the tank. The object to be cleaned is subjected to the secondary cleaning by the vibration and the wave at the time of separation.
本発明の実施例を添付の図面に基づいて説明する。 Embodiments of the present invention will be described with reference to the accompanying drawings.
図において1は内部の洗浄液中に被洗浄物を投入して洗
浄を行う洗浄槽である。この洗浄槽1は密閉、開放自在
の蓋2を有する耐圧容器からなり、蓋2に減圧弁3が設
けられている。In the figure, reference numeral 1 denotes a cleaning tank in which an object to be cleaned is put into a cleaning liquid inside for cleaning. The cleaning tank 1 is composed of a pressure-resistant container having a lid 2 that can be closed and opened, and a lid 2 is provided with a pressure reducing valve 3.
ここで洗浄液とは水あるいは水と洗剤を溶解したいわゆ
る洗浄用水一般を指称するものとする。Here, the washing liquid refers to water or so-called general washing water in which water and a detergent are dissolved.
洗浄槽1にはポンプ4を介して槽内の洗浄液を所定の圧
力で循環させる流路5が設けられているとともに、この
循環流路5のポンプ吐出側配管5a、好ましくは洗浄槽1
への接続部に、後述する混合装置6が配設されている。The cleaning tank 1 is provided with a channel 5 for circulating the cleaning liquid in the tank via the pump 4 at a predetermined pressure, and the pump discharge side pipe 5a of the circulation channel 5, preferably the cleaning tank 1
A mixing device 6, which will be described later, is arranged at the connection part to the.
上記循環流路5には外部から流路内の洗浄液に空気ある
いは必要に応じて空気とともに洗剤を導入する空気供給
手段7が接続されている。An air supply means 7 is connected to the circulation flow path 5 from the outside to introduce air or a detergent together with air into the cleaning liquid in the flow path from the outside.
空気供給手段7は供給パイプ7aにパイプ内の空気流量を
制御するエゼクタバルブ7bを設けパイプ7aを循環流路5
の混合装置6またはその上流側に接続してなるものであ
る。図の実施例では混合装置6として第4図に示すよう
な自給式混合装置を使用しているため供給パイプ7aを混
合装置6の軸芯に合流させてあるが、空気の導入位置は
図の構造に限定されるものではなく、例えば循環流路5
のポンプ4と混合装置6の間の配管5aに供給パイプ7aを
接続し、エアコンプレッサー等を用いて流路5内の洗浄
液に空気を圧入する構造でもよく、また、キャビテーシ
ョンの発生などで長期的に好ましくないが、循環流路5
のポンプ吸込側配管5bに空気供給パイプ7aを接続し、流
路内に空気を吸引させる構造にしてもよい。The air supply means 7 is provided with an ejector valve 7b for controlling the flow rate of air in the supply pipe 7a, and the pipe 7a is connected to the circulation passage 5
The mixing device 6 or the upstream side thereof is connected. In the illustrated embodiment, since the self-contained mixing device as shown in FIG. 4 is used as the mixing device 6, the supply pipe 7a is joined to the axis of the mixing device 6, but the air introduction position is shown in FIG. The structure is not limited to, for example, the circulation channel 5
The structure may be such that the supply pipe 7a is connected to the pipe 5a between the pump 4 and the mixing device 6 and air is press-fitted into the cleaning liquid in the flow path 5 by using an air compressor or the like, and cavitation occurs for a long time. Circulation flow path 5
An air supply pipe 7a may be connected to the pump suction side pipe 5b to suck air into the flow path.
さらに、循環流路5のポンプ4と混合装置6の間の配管
5a(ポンプ吐出側配管)には外部から流路内の洗浄液に
二酸化炭素CO2を圧入する二酸化炭素供給装置8が接続
されている。このCO2供給装置8はCO2ボンベ8aの供給パ
イプ8bを洗浄液循環流路5のポンプ4と混合装置6の間
の配管5a(ポンプ吐出側配管)あるいは混合装置6に連
通させてあるとともに、レギュレータ機構8cにより予め
放出圧力を調整できるようになっている。Furthermore, the pipe between the pump 4 and the mixing device 6 in the circulation channel 5
A carbon dioxide supply device 8 that pressurizes carbon dioxide CO 2 into the cleaning liquid in the flow channel from the outside is connected to 5a (pump discharge side pipe). In this CO 2 supply device 8, the supply pipe 8b of the CO 2 cylinder 8a is connected to the pipe 5a (pump discharge side pipe) between the pump 4 and the mixing device 6 of the cleaning liquid circulation flow path 5 or the mixing device 6. The regulator mechanism 8c can adjust the discharge pressure in advance.
図の実施例では、CO2供給パイプ8bをポンプ4と混合装
置6の間の配管5aに接続してあるが、これに代えてパイ
プ8bを空気供給パイプ7aに切替えバルブを介して接続
し、二酸化炭素が自給式混合装置6の軸芯に導入される
ようにしてもよい。In the illustrated embodiment, the CO 2 supply pipe 8b is connected to the pipe 5a between the pump 4 and the mixing device 6, but instead, the pipe 8b is connected to the air supply pipe 7a via a switching valve, Carbon dioxide may be introduced into the shaft core of the self-contained mixing device 6.
尚、二酸化炭素の圧力はポンプ4の正味揚程(全揚程か
ら配管、混合装置の圧力損失を差引いたもの)と略々等
しくなるようにするもが望ましい。例えばCO2供給圧力
を4kg/cm2とした場合はポンプ4の揚程は(4+ΔP1+
ΔP2)kgf/cm2(ΔP1は配管の圧力損失、ΔP2は混合装
置6の圧力損失)にする。このようにするとCO2供給装
置8の送入圧力ポンプの実質揚程と等しくなった時点で
二酸化炭素の供給が自動的に停止するという利点が得ら
れる。これはまた洗浄液中のCO2が設計温度、圧力下に
おいて飽和値まで溶解した時点でCO2の供給が自動停止
することを意味するので管理上きわめて好都合である。It is desirable that the pressure of carbon dioxide is substantially equal to the net head of the pump 4 (total head minus pressure loss of piping and mixing device). For example, if the CO 2 supply pressure is 4 kg / cm 2 , the pump 4 head is (4 + ΔP 1 +
ΔP 2 ) kgf / cm 2 (ΔP 1 is the pressure loss of the pipe, ΔP 2 is the pressure loss of the mixing device 6). This has the advantage that the supply of carbon dioxide is automatically stopped at the time when the pump head of the CO 2 supply device 8 becomes substantially equal to the pump head. This also means that the supply of CO 2 automatically stops when the CO 2 in the cleaning liquid dissolves to the saturation value under the design temperature and pressure, which is extremely convenient for management.
尚、CO2供給装置8から供給される二酸化炭素CO2は気
体、液体または固体のいずれでもよい。The carbon dioxide CO 2 supplied from the CO 2 supply device 8 may be gas, liquid or solid.
次に第2図及び第3図は本発明の実施に好適な混合装置
6の具体例を示すもので、図の混合装置6は基本的には
第2図に示すように、円筒状の混合管61の上流側内周壁
に、内部流体を、中心部に負圧部分を有する加速された
同心回形状の多層状旋回流に生成する変流ガイドベーン
62が設けられているとともに、その下流側内周壁に多数
の衝体63が固設され、多層状旋回流がこの衝突体63に衝
突して激しく撹乱されるようになっている。Next, FIGS. 2 and 3 show specific examples of the mixing device 6 suitable for carrying out the present invention. The mixing device 6 shown in the drawing basically has a cylindrical mixing shape as shown in FIG. On the inner peripheral wall of the upstream side of the pipe 61, a current-changing guide vane for generating an internal fluid into an accelerated concentric-circle-shaped multilayer swirling flow having a negative pressure portion in the central portion.
62 is provided, and a large number of impact bodies 63 are fixedly mounted on the inner peripheral wall of the downstream side thereof, so that the multilayer swirling flow collides with the impact body 63 and is violently disturbed.
このため変流ガイドベーン62は一対の割楕円盤64,64の
弦側側縁65,65を交差させ、交差部上流側の弦側側縁間
を、混合管1内を軸方向に二分する三角形の仕切板66で
閉塞した構成になり、一対の割楕円盤64,64の円弧側側
縁67,67を混合管61の内壁に接合するようにして混合管6
1内に配設されている。For this reason, the current-changing guide vane 62 intersects the chord side edges 65, 65 of the pair of split elliptical discs 64, 64, and bisects the chord side edges on the upstream side of the intersection in the mixing pipe 1 in the axial direction. The mixing pipe 6 is closed by a triangular partition plate 66, and the arc side edges 67, 67 of the pair of split ellipses 64, 64 are joined to the inner wall of the mixing pipe 61.
It is located inside 1.
また、衝突体63は好ましくは第3図のように先端に半球
部63aを有する逆載頭錐台部63bを有し、混合管内を流下
する多層状旋回流がこの衝突体63に衝突するような位置
関係で混合管61の軸芯に向けて配置されている。Further, the collision body 63 preferably has an inverted frustum frustum portion 63b having a hemispherical portion 63a at the tip as shown in FIG. 3, so that the multilayer swirling flow flowing down in the mixing pipe collides with the collision body 63. Are arranged toward the axis of the mixing tube 61 in various positional relationships.
第2図の基本形混合装置をそのまま本発明の洗浄液循環
回路5に取り付け、混合装置6の上流側から空気を導入
することはもちろん可能であるが、好ましくは第1図及
び第4図に示すように空気供給手段7の供給パイプ7aの
先端を前記変流ガイドベーン66に貫通させて自給式混合
装置として使用する。すなわち、このように構成した場
合は変流ガイドベーン66の下流に形成される多層状旋回
流の中心負圧部に空気供給パイプ7aの先端開口が臨むの
で空気供給手段7の空気は特別な給送手段を要すること
なく、洗浄液の旋回流内に自吸式に吸引されることにな
る。次に本発明の洗浄方法及び装置の作用を説明する。It is of course possible to attach the basic mixing apparatus of FIG. 2 to the cleaning liquid circulation circuit 5 of the present invention as it is and introduce air from the upstream side of the mixing apparatus 6, but preferably, as shown in FIGS. 1 and 4. Further, the tip of the supply pipe 7a of the air supply means 7 is penetrated through the current-changing guide vane 66 to be used as a self-contained mixing device. That is, in the case of such a configuration, since the tip end opening of the air supply pipe 7a faces the central negative pressure portion of the multilayer swirl flow formed downstream of the current-flow guide vane 66, the air of the air supply means 7 is supplied with a special supply. The cleaning liquid is sucked into the swirling flow of the cleaning liquid in a self-priming manner without requiring any feeding means. Next, the operation of the cleaning method and apparatus of the present invention will be described.
先ず、洗浄槽1にIC基盤などの被洗浄物品と洗浄液を入
れる。First, an article to be cleaned such as an IC substrate and a cleaning liquid are put in the cleaning tank 1.
当初は、CO2供給装置8の供給パイプ8bを閉にして循環
回路5のポンプ4を作動させることにより槽1内の洗浄
液を循環流路5の混合装置6に所定流速で循環させると
ともに、空気供給手段7のエゼクタバルブ7bを操作して
混合装置6を通る洗浄液流に空気を導入する。(必要に
より洗剤を添加)。この段階では洗浄槽1の減圧弁3あ
るいは蓋2は閉じてあっても開いてあってもよい。Initially, by closing the supply pipe 8b of the CO 2 supply device 8 and operating the pump 4 of the circulation circuit 5, the cleaning liquid in the tank 1 is circulated through the mixing device 6 in the circulation flow path 5 at a predetermined flow rate, and The ejector valve 7b of the supply means 7 is operated to introduce air into the cleaning liquid flow through the mixing device 6. (Add detergent if necessary). At this stage, the pressure reducing valve 3 or the lid 2 of the cleaning tank 1 may be closed or open.
ポンプ4で圧送された循環回路5の洗浄液は混合装置6
の変流ガイドベーン62で密度の異なる加速された同心円
構造の多層状旋回流と化すと同時に旋回渦流の中心負圧
部に吸引した空気供給装置7からの空気を伴って高速旋
回しながら混合管を流下し、流下の過程で突起63に衝突
することにより振盪、撹拌される。その結果、洗浄液に
超音波が発生するとともに洗浄液中に導入された空気は
微細気泡化して洗浄液と共に槽1に噴出され、この超音
波と噴出流により槽1内で超音波洗浄と摩擦洗浄が行わ
れる。The cleaning liquid in the circulation circuit 5 pumped by the pump 4 is mixed by the mixing device 6
The variable flow guide vanes 62 form a multi-layered swirling flow with accelerated concentric structures of different densities, and at the same time, swirling the swirling vortex with the air from the air supply device 7 sucked into the central negative pressure part of the swirling vortex And is shaken and agitated by colliding with the protrusion 63 in the process of flowing. As a result, ultrasonic waves are generated in the cleaning liquid, and the air introduced into the cleaning liquid is made into fine bubbles and jetted into the tank 1 together with the cleaning liquid. The ultrasonic waves and the jet flow perform ultrasonic cleaning and friction cleaning in the tank 1. Be seen.
特に本発明の混合装置はその下流側中芯軸付近に低圧部
分を形成するので圧力勾配の作用による剪断力によって
流体の飽和蒸気圧を下げる効果があり、このため気液混
合が急速に行われる。In particular, since the mixing device of the present invention forms a low-pressure portion near the central shaft on the downstream side, it has the effect of lowering the saturated vapor pressure of the fluid by the shearing force due to the action of the pressure gradient, so that gas-liquid mixing is performed rapidly. .
混合装置6の変流ガイドベーン上流側から空気を導入し
た場合も同様である。The same applies when air is introduced from the upstream side of the flow guide vanes of the mixing device 6.
空気供給装置6のエゼクタバルブ7bを「開」から「閉」
の間で調整することにより、導入空気量、発生気泡量、
気泡粒径ならびに発生超音波の周波数を制御することが
できる。ちなみに、洗浄流量およびエゼクタバルブの調
整によって本発明から得られる超音波の周波数及びその
調整範囲はおおよそ16〜40kHzである。Open the ejector valve 7b of the air supply device 6 from "open" to "close"
The amount of introduced air, the amount of generated bubbles,
The bubble particle size as well as the frequency of the generated ultrasonic waves can be controlled. By the way, the frequency of the ultrasonic wave obtained from the present invention by adjusting the cleaning flow rate and the ejector valve and its adjustment range are approximately 16 to 40 kHz.
超音波洗浄と摩擦洗浄による第1次洗浄処理の後、空気
供給装置7のエゼクタバルブ7bを閉じ、洗浄槽1の減圧
弁3を閉じて密閉して後、CO2供給装置8の弁8cを開
き、流路5内の洗浄液に二酸化炭素CO2を圧入する。After the primary cleaning process by ultrasonic cleaning and friction cleaning, the ejector valve 7b of the air supply device 7 is closed, the decompression valve 3 of the cleaning tank 1 is closed and sealed, and then the valve 8c of the CO 2 supply device 8 is closed. Open and press-fit carbon dioxide CO 2 into the cleaning liquid in the flow path 5.
循環流路5内に送入された炭酸ガスは洗浄液とともに混
合装置6を通過する過程で混合装置6の上記作用で強引
に撹拌、混合され、微細気泡となって液中に均一に分散
し、かつ、その時の温度、圧力におけるほぼ飽和値まで
溶解する。従って、被洗浄物品の微小間隙や小孔内の液
体中にはほぼ飽和値の炭酸ガスが溶解されている。The carbon dioxide gas sent into the circulation channel 5 is forcibly stirred and mixed by the above-mentioned action of the mixing device 6 in the process of passing through the mixing device 6 together with the cleaning liquid, and becomes fine bubbles to be uniformly dispersed in the liquid, And, it dissolves up to almost the saturated value at the temperature and pressure at that time. Therefore, carbon dioxide having a substantially saturated value is dissolved in the liquid in the minute gaps or small holes of the article to be cleaned.
尚、CO2供給装置8は予めその放出圧力が循環ポンプの
正味揚程とほぼ等しくなるようにレギュレーター機構8c
によって調整されているので、洗浄槽1内の圧力がCO2
供給装置の調整圧力付近まで上昇した時点でCO2の供給
が自動的に停止する。The CO 2 supply device 8 has a regulator mechanism 8c in advance so that the discharge pressure thereof is substantially equal to the net head of the circulation pump.
Since the pressure in the cleaning tank 1 is adjusted to CO 2
The supply of CO 2 is automatically stopped when the pressure rises to around the regulated pressure of the supply device.
次いで、洗浄槽1の上部蓋2に設けられている減圧弁3
を開く。すると、大きい溶解度で洗浄液中に高圧封入さ
れていた二酸化炭素CO2は、槽外部の圧力(例えば大気
圧)における溶解度と平衡になるべく、圧力減少に伴っ
て急速に気化し、大量の小気泡となって洗浄槽1内のあ
らゆる領域の液中からいわば沸騰状に激しく沸き上りな
がら発散し、離脱する。かくして、液中からの炭酸ガス
離脱時に生ずる気・液の振動と摩擦力により被洗浄物品
の微細隙間及び小孔内の軟着付着物、すなわち、超音波
洗浄で除去できなかった付着物がきれいに取り除かれ
る。Next, the pressure reducing valve 3 provided on the upper lid 2 of the cleaning tank 1
open. Then, the carbon dioxide CO 2 that was high-pressure encapsulated in the cleaning liquid with a large solubility rapidly vaporized as the pressure decreased to equilibrate with the solubility at the pressure outside the tank (for example, atmospheric pressure), and a large amount of small bubbles were formed. As a result, the liquid in every region of the cleaning tank 1 is boiled violently in a boiling state, and is diverged and separated. Thus, due to the vibration and frictional force of the gas and liquid generated when carbon dioxide gas is removed from the liquid, the soft deposits in the fine gaps and small holes of the article to be cleaned, that is, the deposits that could not be removed by ultrasonic cleaning, can be removed cleanly. Be done.
以上のように、本発明は超音波洗浄及び摩擦洗浄で第1
次洗浄を行うとともに、これら第1次洗浄で除去しきれ
ない微細間隙内の軟着付着物を炭酸ガス発散時の振動、
波動及び摩擦力で第2次洗浄するので洗浄効果が著しく
向上し、且つ後処理が不要となる。しかもこれら第1
次、第2次洗浄を同一洗浄槽内で連続的に行うので、操
作、管理が容易である。As described above, the present invention can be applied to the ultrasonic cleaning and the friction cleaning.
While performing the second cleaning, the soft-adhesion deposits in the fine gaps that cannot be completely removed by the first cleaning are vibrated when carbon dioxide gas is emitted.
Since the secondary cleaning is performed by the wave and frictional force, the cleaning effect is remarkably improved, and the post-treatment is unnecessary. Moreover, these first
Since the second and second cleanings are continuously performed in the same cleaning tank, the operation and management are easy.
また、本発明では40kHzの高い周波数を得ることができ
るので超音波洗浄それ自体を飛躍的に改善できるほか、
バルブを操作するだけで16〜40kHzの広範囲の調整が可
能である。さらに本発明に使用される場合装置は超音波
発生装置として優れているだけでなく、気液の均一混
合、撹拌が容易であり、ガス吸収効果が高いので第1次
及び第2次洗浄の双方に貢献でき、洗浄作用を相乗的に
向上させ得るものである。Further, in the present invention, since a high frequency of 40 kHz can be obtained, the ultrasonic cleaning itself can be dramatically improved,
A wide range of adjustment from 16 to 40kHz is possible just by operating the valve. Further, when used in the present invention, the device is not only excellent as an ultrasonic generator, but it is easy to uniformly mix and agitate gas and liquid, and has a high gas absorption effect, so that it can be used for both primary and secondary cleaning. And the cleaning action can be synergistically improved.
第1図は本発明装置のフローチャート、第2図は本発明
に用られる混合装置の一部切欠き透視図、第3図は混合
装置の衝突体拡大側面図、第4図は第1図の実施例にお
ける混合装置の縦断面図である。 1……洗浄槽、3……減圧弁、4……ポンプ、5……循
環流路、6……混合装置、7……空気供給装置、8……
CO2供給装置、62……変流ガイドベーン、63……衝突
体。FIG. 1 is a flow chart of the device of the present invention, FIG. 2 is a partially cutaway perspective view of the mixing device used in the present invention, FIG. 3 is an enlarged side view of a collision body of the mixing device, and FIG. 4 is of FIG. It is a longitudinal section of a mixing device in an example. 1 ... Washing tank, 3 ... Pressure reducing valve, 4 ... Pump, 5 ... Circulating flow path, 6 ... Mixing device, 7 ... Air supply device, 8 ...
CO 2 supply device, 62 …… Current transformation guide vane, 63 …… Collision body.
フロントページの続き (56)参考文献 特開 昭57−65370(JP,A) 特開 昭62−191090(JP,A) 特開 昭61−278800(JP,A) 特開 昭61−8184(JP,A) 特開 昭61−78482(JP,A) 特開 昭60−125283(JP,A) 特開 昭54−155655(JP,A) 特開 昭60−125283(JP,A) 特開 昭54−147557(JP,A) 特開 昭49−31154(JP,A) 実開 昭60−74099(JP,U) 実開 昭59−36852(JP,U) 実開 昭51−20367(JP,U) 特公 昭61−9600(JP,B2) 特公 平4−43712(JP,B2) 実公 昭49−16195(JP,Y1) 実公 昭46−32633(JP,Y1) 実公 昭56−27991(JP,Y2) 実公 昭58−23383(JP,Y2)Continuation of front page (56) Reference JP-A-57-65370 (JP, A) JP-A-62-191090 (JP, A) JP-A-61-278800 (JP, A) JP-A-61-8184 (JP , A) JP 61-78482 (JP, A) JP 60-125283 (JP, A) JP 54-155655 (JP, A) JP 60-125283 (JP, A) JP 54-147557 (JP, A) JP 49-31154 (JP, A) Actual 60-74099 (JP, U) Actual 59-36852 (JP, U) Actual 51-20367 (JP, A) U) Special public Sho 61-9600 (JP, B2) Special public 4-43712 (JP, B2) Actual public 49-16195 (JP, Y1) Actual public 46-32633 (JP, Y1) Actual public Sho 56 -27991 (JP, Y2) Showa 58-23383 (JP, Y2)
Claims (4)
流圧で循環させると同時に循環系の洗浄液に空気を導入
しながら混合装置で気−液混合することにより、洗浄槽
内に、微細気泡を含む噴出流と超音波とを発生させ、こ
れにより槽内の被洗浄物に超音波洗浄と摩擦洗浄による
第1次洗浄を施こし、次いで、洗浄槽を密閉して循環系
の前記混合装置を通して洗浄液に二酸化炭素CO2を圧入
混合しながら溶解させ、しかる後、洗浄槽を減圧して洗
浄液中の混合気体を液中から沸騰状に発泡離脱させるこ
とにより槽内の被洗浄物に離脱時の振動及び波動による
第2次の洗浄を施こすことを特徴とする物品の洗浄方
法。1. A cleaning tank containing an object to be cleaned is circulated at a predetermined flow pressure, and at the same time, air is introduced into the cleaning solution in the circulation system to perform gas-liquid mixing by a mixing device, whereby A jet flow containing fine bubbles and ultrasonic waves are generated, whereby the object to be cleaned in the tank is subjected to the primary cleaning by ultrasonic cleaning and friction cleaning, and then the cleaning tank is closed to close the circulation system. Carbon dioxide CO 2 is dissolved by pressurizing and mixing it into the cleaning liquid through the mixing device, and then the cleaning tank is depressurized to cause the mixed gas in the cleaning liquid to boil off from the liquid to the cleaning object in the tank. A method for cleaning an article, characterized in that a secondary cleaning is performed by vibration and waves at the time of separation.
と、洗浄槽1内の洗浄液をポンプ4を介して循環する洗
浄液循環流路5と、 循環流路5のポンプ吐出側配管5aに配設された混合装置
6と、 循環流路の混合装置6もしくはその上流側に接続され、
流路5内の洗浄液に空気を導入する空気供給手段7と、 循環流路5の混合装置6もしくはその上流側に接続さ
れ、流路5内の洗浄液に二酸化炭素を導入するCO2供給
装置8とを含むことを特徴とする物品洗浄装置。2. A pressure-resistant cleaning tank 1 having a pressure reducing valve 3 and capable of being closed.
A cleaning liquid circulation flow path 5 for circulating the cleaning liquid in the cleaning tank 1 via a pump 4, a mixing device 6 arranged in a pump discharge side pipe 5a of the circulation flow path 5, and a mixing device 6 for the circulation flow path. Or connected to its upstream side,
An air supply means 7 for introducing air into the cleaning liquid in the flow path 5 and a CO 2 supply device 8 connected to the mixing device 6 of the circulation flow path 5 or the upstream side thereof and introducing carbon dioxide into the cleaning liquid in the flow path 5. An article cleaning apparatus comprising:
対の割楕円盤64,64の弦側側縁を交差させ且つ交差部上
流側の弦側側縁間を、混合管61を軸方向に二分する三角
形の仕切板66で閉塞した変流ガイドベーン62を具備し、
該ガイドベーン62のの下流側の混合管内周壁に多数の衝
突体63を突設してなることを特徴とする特許請求の範囲
第2項記載の物品洗浄装置。3. The mixing device (6) has a mixing pipe (61) which intersects the chord side edges of a pair of split ellipses (64, 64) on the upstream side of the cylindrical mixing pipe (61) and between the chord side edges on the upstream side of the intersection. Is equipped with a current guide vane 62 closed by a triangular partition plate 66 that divides the
The article cleaning apparatus according to claim 2, wherein a large number of collision bodies 63 are provided on the inner peripheral wall of the mixing pipe on the downstream side of the guide vanes 62.
置6の変流ガイドベーン62の軸芯に貫設したことをさら
に特徴とする特許請求の範囲第3項記載の物品洗浄装
置。4. An article cleaning apparatus according to claim 3, further comprising a supply pipe 7a of the air supply apparatus 7 which is provided through the axis of the current-changing guide vane 62 of the mixing apparatus 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13523986A JPH0763687B2 (en) | 1986-06-11 | 1986-06-11 | Article cleaning method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13523986A JPH0763687B2 (en) | 1986-06-11 | 1986-06-11 | Article cleaning method and device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62294475A JPS62294475A (en) | 1987-12-21 |
| JPH0763687B2 true JPH0763687B2 (en) | 1995-07-12 |
Family
ID=15147063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13523986A Expired - Lifetime JPH0763687B2 (en) | 1986-06-11 | 1986-06-11 | Article cleaning method and device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0763687B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0821564B2 (en) * | 1988-07-12 | 1996-03-04 | 三菱電機株式会社 | Cleaning equipment |
| EP0711864B1 (en) * | 1994-11-08 | 2001-06-13 | Raytheon Company | Dry-cleaning of garments using gas-jet agitation |
| JP4255478B2 (en) * | 2005-03-31 | 2009-04-15 | 株式会社カイジョー | Cleaning device and cleaning method |
| JP2008091576A (en) * | 2006-09-29 | 2008-04-17 | Kaijo Corp | Drying method |
| JP5989338B2 (en) * | 2011-12-28 | 2016-09-07 | 芝浦メカトロニクス株式会社 | Processing liquid generating apparatus, processing liquid generating method, substrate processing apparatus, and substrate processing method |
| JP7011976B2 (en) * | 2018-05-17 | 2022-02-10 | エムケー精工株式会社 | Cleaning equipment |
| CN116338218A (en) * | 2022-06-13 | 2023-06-27 | 深圳市帝迈生物技术有限公司 | Sample analyzer and control method for sample analyzer |
| CN118558664A (en) * | 2024-07-21 | 2024-08-30 | 青岛融合光电科技有限公司 | A novel device for stirring and heating carrier glass cleaning agent |
-
1986
- 1986-06-11 JP JP13523986A patent/JPH0763687B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62294475A (en) | 1987-12-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2003117365A (en) | Micro-bubble producing apparatus | |
| JP2002085949A (en) | Device for generating superfine air bubble | |
| US20210138410A1 (en) | Microbubble generation device and microbubble generation method, and shower apparatus and oil-water separation apparatus having said microbubble generation device | |
| JP2006503227A (en) | Jet pump | |
| WO2007136030A1 (en) | Fine bubble generating apparatus | |
| JPH0763687B2 (en) | Article cleaning method and device | |
| JP6449531B2 (en) | Microbubble generator | |
| JP2009028579A (en) | Bubble generating apparatus | |
| JP4094633B2 (en) | Ultra-fine bubble generator | |
| TW201900270A (en) | Multifunctional fine bubble generating device and method thereof dissolving a solid foaming agent in water in a gas-liquid mixed liquid supply unit and supplying various warm bath effect components to the impeller pump or the diaphragm pump | |
| KR101944684B1 (en) | Nano-bubble generating apparatus | |
| JPH1066850A (en) | Solubility control method for continuous flowing gas dissolving apparatus and continuous flowing gas dissolving apparatus for implementing the method | |
| JP2017136513A (en) | Fine bubble generator, fine bubble generation method, shower device and oil / water separator having the fine bubble generator | |
| KR20030063776A (en) | minute an air bubble generation device | |
| JP5291312B2 (en) | Pickling apparatus and method | |
| JP3320018B2 (en) | Mist generator | |
| JP2000176266A (en) | Fluid mixing device | |
| JPH10230150A (en) | Aerator | |
| US20030199595A1 (en) | Device and method of creating hydrodynamic cavitation in fluids | |
| KR20190102811A (en) | Nano bubble generator | |
| JPH07270097A (en) | Method and apparatus for generating cavitation | |
| JP7614131B2 (en) | Gas swirling shear device and microbubble generator | |
| JPS63198942A (en) | Method for washing granule such as rice grain and apparatus therefor | |
| KR200497820Y1 (en) | A nano bubble generator | |
| RU2172107C1 (en) | Liquid product pasteurizing and homogenizing method and apparatus |