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JPH0765159B2 - Vacuum deposition equipment - Google Patents
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JPH0765159B2 - Vacuum deposition equipment - Google Patents

Vacuum deposition equipment

Info

Publication number
JPH0765159B2
JPH0765159B2 JP63090858A JP9085888A JPH0765159B2 JP H0765159 B2 JPH0765159 B2 JP H0765159B2 JP 63090858 A JP63090858 A JP 63090858A JP 9085888 A JP9085888 A JP 9085888A JP H0765159 B2 JPH0765159 B2 JP H0765159B2
Authority
JP
Japan
Prior art keywords
mounting
film
evaporation source
forming thin
adjacent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63090858A
Other languages
Japanese (ja)
Other versions
JPH01263266A (en
Inventor
恭治 木ノ切
昌之 稲葉
Original Assignee
株式会社芝浦製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社芝浦製作所 filed Critical 株式会社芝浦製作所
Priority to JP63090858A priority Critical patent/JPH0765159B2/en
Publication of JPH01263266A publication Critical patent/JPH01263266A/en
Publication of JPH0765159B2 publication Critical patent/JPH0765159B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は真空蒸着装置に係り、特に光学式ビデオディス
クや光学式オーディオディスク等の光ディスクの素材に
Al等の薄膜を成膜するのに好適な真空蒸着装置に関す
る。
Description: TECHNICAL FIELD The present invention relates to a vacuum vapor deposition apparatus, and in particular to a material for optical discs such as optical video discs and optical audio discs.
The present invention relates to a vacuum vapor deposition apparatus suitable for forming a thin film of Al or the like.

[従来の技術] 第5図は従来の光ディスク用真空蒸着装置を示したもの
で、真空チャンバ1内の固定円板2には一対の棒状蒸着
電極3、4が固設され、これらの蒸発電極3、4の間に
は所定間隔毎にアルミニウム蒸発源5が接続取付けされ
ている。蒸発電極3、4を取囲むリング状の回転テーブ
ル6はコロ7を介して回転可能な固定円板2に支持さ
れ、この回転テーブル6には複数本のホルダ軸8が回転
可能に支持されている。これらのホルダ軸8にはホルダ
板9が固着され、これらのホルダ板9の両面にはプラス
チック製の光ディスク素材10が複数枚取付けられてい
る。回転テーブル6を貫通したホルダ軸8の下端には自
転ギヤ11が取付けられ、これらの自転ギヤ11は円板2の
外歯と係合し、また回転テーブル6の外歯はモータ12に
連結された駆動ギヤ13に係合している。
[Prior Art] FIG. 5 shows a conventional vacuum vapor deposition apparatus for an optical disk, in which a pair of rod-shaped vapor deposition electrodes 3 and 4 are fixedly mounted on a fixed disk 2 in a vacuum chamber 1, and these evaporation electrodes are provided. An aluminum evaporation source 5 is connected and attached between 3 and 4 at predetermined intervals. A ring-shaped rotary table 6 that surrounds the evaporation electrodes 3 and 4 is supported by a rotatable fixed disk 2 via rollers 7, and a plurality of holder shafts 8 are rotatably supported on the rotary table 6. There is. Holder plates 9 are fixed to the holder shafts 8, and a plurality of plastic optical disk materials 10 are attached to both surfaces of the holder plates 9. Rotating gears 11 are attached to the lower end of the holder shaft 8 penetrating the rotary table 6, and these rotary gears 11 engage with the outer teeth of the disc 2, and the outer teeth of the rotary table 6 are connected to the motor 12. Is engaged with the drive gear 13.

モータ12の駆動より駆動ギヤ13を介して回転テーブル6
が回転されると、自転ギヤ11も円板2の回りを回りなが
ら自転する。こうしてホルダ板9上の光ディスク素材10
は第6図に示されたように蒸発電極3、4を回りを公転
しながら自転する。この状態で、通電加熱された蒸発源
5からのアルミ蒸気は自転公転されている光ディスク素
材10にムラなく均一に蒸着される。
The rotary table 6 is driven by the motor 12 via the drive gear 13.
When is rotated, the rotation gear 11 also rotates while rotating around the disc 2. Thus, the optical disc material 10 on the holder plate 9
Rotates around the evaporation electrodes 3 and 4 as shown in FIG. In this state, the aluminum vapor from the evaporation source 5 which is electrically heated is uniformly and evenly deposited on the optical disk material 10 which is revolving around its axis.

[発明が解決しようとする課題] ところが、上述の光ディスク用真空蒸着装置は、光ディ
スク素材10をホルダ板9上に取付ける構成であるために
一度に蒸着することができる枚数が少なく(例えば直径
300mmのディスクの場合76枚)、効率がよくないという
問題があった。
[Problems to be Solved by the Invention] However, in the above-described vacuum vapor deposition apparatus for optical discs, since the optical disc material 10 is mounted on the holder plate 9, the number of vapors that can be deposited at one time is small (for example, diameter
There was a problem that the efficiency was not good in the case of a 300 mm disc (76 discs).

そこで、本発明の目的は一度に大量の被成膜薄板を蒸着
処理することのできる真空蒸着装置を提供することにあ
る。
Therefore, an object of the present invention is to provide a vacuum vapor deposition apparatus capable of vapor-depositing a large number of film-forming thin plates at one time.

[課題を解決するための手段] この目的を達成するために、本発明は、互いに離間した
一対の棒状電極からなり複数の蒸発源を取付ける蒸発源
取付体と;この蒸発源取付体とほぼ平行に延び、この蒸
発源取付体の回りを公転しかつ自転する複数の取付軸
と;これらの取付軸の各々にその軸方向に沿って所定間
隔において軸線に対して直角に保持された多数の被成膜
薄板とを具備することを特徴とするものである。
[Means for Solving the Problems] In order to achieve this object, the present invention provides an evaporation source mounting body, which is composed of a pair of rod-shaped electrodes spaced apart from each other, for mounting a plurality of evaporation sources; and is substantially parallel to the evaporation source mounting body. A plurality of mounting shafts that extend around the evaporation source mounting body and revolve around the evaporation source mounting body; and a plurality of mounted shafts that are respectively held at right angles to the axis line at predetermined intervals along the axial direction of the mounting shafts. A thin film-forming plate is provided.

[作 用] 取付軸に互いに離間して取付けられた各被成膜薄板は、
蒸発源取付体の回りを公転しかつ自転しながら蒸着され
る。蒸発源からの蒸気は、各被成膜薄板の間の間隙を通
って被成膜薄板の表面に達するので、ムラなく均一に付
着することができる。
[Operation] Each thin film-forming plate attached to the mounting shaft with a distance from each other
Deposition is performed while revolving around the evaporation source mounting body and rotating. Since the vapor from the evaporation source reaches the surface of the film-forming thin plate through the gap between the film-forming thin plates, the vapor can be evenly and uniformly attached.

被成膜薄板は保持部によって取付軸に対して直角に取付
けられるので、一度に多数枚の被成膜薄板に蒸着するこ
とができる。
Since the deposition target thin plates are mounted at right angles to the mounting axis by the holding portion, it is possible to vapor-deposit a large number of deposition target thin plates at one time.

蒸発源の取付ピッチが各被成膜薄板の間隔とほぼ同等が
それ以下であると、蒸着を一層均一に行うことができ
る。
If the attachment pitch of the evaporation source is substantially equal to or less than the distance between the thin film-forming layers, the vapor deposition can be performed more uniformly.

保持部により二枚の被成膜薄板を互いに重ね合せた状態
で保持すると、取付軸への被成膜薄板の取付け枚数を大
幅に増大することができる。
If the holding unit holds the two film-forming thin plates in a state of being superposed on each other, the number of the film-forming thin plates attached to the mounting shaft can be significantly increased.

同様に、隣接する取付軸の被成膜薄板が互い違いに一部
重なり合うようにすることにより、更に多くの被成膜薄
板を一度に蒸着することができる。
Similarly, by making the film-forming thin plates of the adjacent mounting shafts alternately overlap each other, more film-forming thin plates can be vapor-deposited at one time.

[実施例] 以下に本発明による真空蒸着装置の実施例を第5図及び
第6図と同部分には同一符号を付して示した第1図乃至
第4図を参照して説明する。
[Embodiment] An embodiment of the vacuum vapor deposition apparatus according to the present invention will be described below with reference to FIGS. 1 to 4 in which the same parts as those in FIGS. 5 and 6 are designated by the same reference numerals.

第1図において、リング状回転テーブル6に回転可能に
支持された複数本の取付軸14は、棒状蒸発電極3、4に
平行に延び、蒸発電極3、4を取囲むようにほぼ等間隔
に配置されている。取付軸14は、下端が回転テーブル6
を貫通し自転ギヤ11に固定されており、モータ12の回転
駆動によって自転しながら電極3、4の回りを公転する 各取付軸14にはその軸方向に沿って多数のプラスチック
製光ディスク素材10が軸方向に垂直に保持されている。
この光ディスク素材10の保持は第2図に詳細に示された
ように裏面同士を重ね合せた2枚の光ディスク素材10を
所定間隔D毎に保持具15によって取付軸14に固定するこ
とによって行われる。
In FIG. 1, a plurality of mounting shafts 14 rotatably supported on the ring-shaped rotary table 6 extend parallel to the rod-shaped evaporation electrodes 3 and 4 and are arranged at substantially equal intervals so as to surround the evaporation electrodes 3 and 4. It is arranged. The lower end of the mounting shaft 14 is the rotary table 6
A plurality of optical disc materials 10 made of plastic along the axial direction of each mounting shaft 14 that passes through the shaft and is fixed to the rotation gear 11, and revolves around the electrodes 3 and 4 while rotating by the rotational drive of the motor 12. It is held perpendicular to the axial direction.
The holding of the optical disk material 10 is performed by fixing two optical disk materials 10 whose back surfaces are superposed on each other at predetermined intervals D to the mounting shaft 14 by a holder 15 as shown in detail in FIG. .

光ディスク素材10の所定間隔Dとアルミニウム蒸発源5
のピッチPとの関係は、光ディスク素材10と蒸発源5と
の距離が依存するが、一般にはピッチPが所定間隔Dの
ほぼ同等がそれ以下となるように定めることが望まし
く、これにより、蒸着の均一性が確保される。その他の
構成は第5図と同一である。
Predetermined distance D of optical disc material 10 and aluminum evaporation source 5
The relationship between the pitch P and the pitch P depends on the distance between the optical disk material 10 and the evaporation source 5, but it is generally desirable to set the pitch P so that the pitch P is approximately equal to or less than the predetermined distance D, and thus the vapor deposition is performed. Uniformity is ensured. Other configurations are the same as those in FIG.

次にこの実施例の作用を説明する。Next, the operation of this embodiment will be described.

モータ12が回転駆動すると、駆動ギヤ13を介してリング
状回転テーブル6が蒸発源5を中心として回転し、これ
によって、固定円板2の外歯と係合している自転ギヤ11
が回転し、光ディスク素材10が自転しながら蒸発源5の
回りを公転する。
When the motor 12 is rotationally driven, the ring-shaped rotary table 6 rotates about the evaporation source 5 via the drive gear 13, whereby the rotation gear 11 engaged with the outer teeth of the fixed disc 2 is rotated.
Rotates, and the optical disk material 10 revolves around the evaporation source 5 while rotating.

蒸発源5は、電極3、4への通電により発熱し、第3図
に模式的に示されたように自公転してる光ディスク素材
10の間隔Dを通って光ディスク素材10の表面に蒸着しア
ルミニウム膜16(第2図)を形成する。
The evaporation source 5 generates heat when electricity is applied to the electrodes 3 and 4, and is an optical disk material that revolves around its own axis as schematically shown in FIG.
An aluminum film 16 (FIG. 2) is formed by vapor deposition on the surface of the optical disk material 10 through the interval D of 10.

このように蒸発材料が光ディスク素材10の間隙Dに充分
に入込んで光ディスク素材10の表面に付着するために
は、例えば直径300mmの光ディスク素材の場合に間隔D
は100mm程度必要である。
As described above, in order for the evaporation material to sufficiently enter the gap D of the optical disc material 10 and adhere to the surface of the optical disc material 10, for example, in the case of an optical disc material having a diameter of 300 mm, the gap D
Requires about 100 mm.

このようにして成膜されたアルミニウム膜16は第5図に
示した従来の真空蒸着装置により成膜されたものと特性
上実質的に同一であった。これは、蒸発源5からの蒸気
が光ディスク素材10の表面に付着する方向が本発明の場
合も従来装置の場合もほぼ同一、即ち共に斜め方向であ
るためである。詳述すると、従来の真空蒸着装置では、
第6図に示されたように光ディスク素材10は位置Aの時
に一時的に蒸発源5からの蒸気に垂直になるが、それ以
外では位置Bのように傾斜している。本発明では第3図
に示されたように光ディスク素材10の表面は常に蒸発源
5からの蒸気に対して傾斜いている。
The aluminum film 16 thus formed was substantially the same in characteristics as that formed by the conventional vacuum deposition apparatus shown in FIG. This is because the vapor from the evaporation source 5 adheres to the surface of the optical disk material 10 in substantially the same direction in both the present invention and the conventional apparatus, that is, both are oblique directions. More specifically, in the conventional vacuum deposition apparatus,
As shown in FIG. 6, the optical disk material 10 is temporarily perpendicular to the vapor from the evaporation source 5 at the position A, but is inclined like the position B at other positions. In the present invention, as shown in FIG. 3, the surface of the optical disc material 10 is always inclined with respect to the vapor from the evaporation source 5.

以上のように光ディスク素材10を取付軸14に互いに所定
間隔Dだけ離間して積重ねることによって、160枚の光
ディスク素材(これは上述した従来の真空蒸着装置での
取付け数76枚の約2倍である。)を一度に取付けること
ができた。
By stacking the optical disc materials 10 on the mounting shaft 14 with a predetermined distance D from each other as described above, 160 optical disc materials (this is about twice as many as the number of 76 discs mounted in the conventional vacuum deposition apparatus described above). Was able to be installed at once.

第4図(a)及び(b)は、光ディスク素材10の取付枚
数を更に増大するための取付軸14の構成例を示したもの
で、隣接する一対の取付軸14、14の一方に取付けられた
光ディスク素材10と他方に取付けられた光ディスク素材
10とは軸方向に互い違いにらなるように取付けられ、両
隣接取付軸14、14の距離Lはその隣接取付軸の一方の光
ディスク素材10と他方の光ディスク素材10とが軸方向に
互いに一部重なり合うように定められている。
FIGS. 4 (a) and 4 (b) show an example of the structure of the mounting shaft 14 for further increasing the number of mounted optical disc materials 10, which are mounted on one of a pair of adjacent mounting shafts 14,14. Optical disc material 10 and optical disc material attached to the other
10 is mounted so as to be staggered in the axial direction, and the distance L between the adjacent mounting shafts 14 and 14 is such that one optical disk material 10 and the other optical disk material 10 of the adjacent mounting shafts are part of each other in the axial direction. It is designed to overlap.

以上の実施例では、取付け枚数を増加するために裏面同
士を重ね合せた2枚の光ディスク素材10、10を1組をし
て取付軸14に取付けたが、本発明はこれに限らず1枚ず
つ離間して取付けてもよい。
In the above embodiment, one set of two optical disk materials 10, 10 having their back surfaces overlapped with each other was mounted on the mounting shaft 14 in order to increase the number of mounted disks, but the present invention is not limited to this. They may be installed separately from each other.

また、上述の例では被成膜薄板として光ディスク素材を
用いたが、その他の薄板を使用することもできる。
Further, in the above-mentioned example, the optical disk material is used as the film-forming thin plate, but other thin plates can be used.

[発明の効果] 以上の説明から明らかなように、本発明によれば、被成
膜薄板は保持部によって取付軸に対して直角にかつ軸方
向に所定間隔離間して取付けられるので、一度に多数枚
の被成膜薄板にムラなく均一に蒸着することができる。
[Effects of the Invention] As is clear from the above description, according to the present invention, the thin film-forming sheet is mounted by the holding portion at a right angle to the mounting axis and at a predetermined distance in the axial direction. It is possible to vapor-deposit evenly and uniformly on a large number of thin film-forming sheets.

蒸発源の取付ピッチを各被成膜薄板の間隔とほぼ同等か
それ以下にするならば、蒸着を一層均一に行うことがで
きる。
If the attachment pitch of the evaporation source is set to be substantially equal to or less than the interval between the thin films to be deposited, vapor deposition can be performed more uniformly.

更に、保持部により二枚の被成膜薄板を互いに重ね合せ
た状態で保持するならば、取付軸への被成膜薄板の取付
け枚数を大幅に増大することができる。
Further, if the holding portion holds the two film-forming thin plates in a state of being superposed on each other, the number of the film-forming thin plates attached to the mounting shaft can be significantly increased.

同様に、隣接する取付軸の被成膜薄板が互い違いに一部
重なり合うようにするならば、更に多くの被成膜薄板に
一度に蒸着することができる。
Similarly, if the deposition target thin plates of the adjacent mounting shafts are alternately and partially overlapped with each other, vapor deposition can be performed on more deposition target thin plates at one time.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明による真空蒸着装置の実施例を示した断
面図、第2図は第1図の取付軸を詳細に示した拡大図、
第3図は蒸発源からの蒸発材料が光ディスク素材に蒸着
する状態を示した説明図、第4図(a)及び(b)は上
記実施例の変形例を示した平面図と正面図、第5図は従
来の真空蒸着装置を示した断面図、第6図は第5図の真
空蒸着装置による蒸着法を示した説明図である。 3、4……棒状蒸発電極(蒸発源取付体)、5……蒸発
源、10……被成膜薄板、14……取付軸、15……固定部。
FIG. 1 is a sectional view showing an embodiment of a vacuum vapor deposition device according to the present invention, and FIG. 2 is an enlarged view showing in detail the mounting shaft of FIG.
FIG. 3 is an explanatory view showing a state in which the evaporation material from the evaporation source is vapor-deposited on the optical disk material, and FIGS. 4 (a) and 4 (b) are a plan view and a front view showing a modified example of the above embodiment, FIG. 5 is a sectional view showing a conventional vacuum vapor deposition apparatus, and FIG. 6 is an explanatory view showing a vapor deposition method by the vacuum vapor deposition apparatus of FIG. 3, 4 ... Rod-shaped evaporation electrode (evaporation source mounting body), 5 ... Evaporation source, 10 ... Thin plate to be deposited, 14 ... Mounting shaft, 15 ... Fixed part.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】互いに離間した一対の棒状電極からなり複
数の蒸発源を取付ける蒸発源取付体と;この蒸発源取付
体とほぼ平行に延び、この蒸発取付体の回りを公転しか
つ自転する複数の取付軸と;これらの取付軸の各々にそ
の軸方向に沿って所定間隔において軸線に対して直角に
保持された多数の被成膜薄板とを具備することを特徴と
する真空蒸着装置。
1. An evaporation source mounting body for mounting a plurality of evaporation sources, which comprises a pair of rod-shaped electrodes separated from each other; a plurality of evaporation source mounting bodies extending substantially parallel to each other and revolving and rotating around the evaporation mounting body. And a plurality of film-forming thin plates held at right angles to the axis at predetermined intervals along the axial direction of each of these mounting axes.
【請求項2】上記蒸発源は上記一対の棒状電極上にほぼ
一定ピッチで取付けられ、このピッチは上記被成まく薄
板の間隔とほぼ同等かそれ以下であることを特徴とする
特許請求の範囲第1項記載の真空蒸着装置。
2. The evaporation source is mounted on the pair of rod-shaped electrodes at a substantially constant pitch, and the pitch is substantially equal to or less than the distance between the coated thin plates. The vacuum vapor deposition device according to item 1.
【請求項3】互いに隣接した一対の上記取付軸の間隔
は、その一方の隣接取付軸に取付けられた上記被成膜薄
板と他方の隣接取付軸に取付けられた上記被成膜薄板と
が互いに上記軸方向に一部重なり合うように定められ、
上記一方の隣接する取付軸上の上記被成膜薄板と上記他
方の隣接する取付軸上の上記被成膜薄板とが互いに軸方
向に互い違いに位置するように定められていることを特
徴とする特許請求の範囲第1項記載の真空蒸着装置。
3. The distance between a pair of the mounting shafts adjacent to each other is such that the film-forming thin plate mounted on one of the adjacent mounting shafts and the film-forming thin plate mounted on the other adjacent mounting shaft are mutually adjacent. Determined to partially overlap in the axial direction,
It is characterized in that the film-forming thin plate on the one adjacent mounting shaft and the film-forming thin plate on the other adjacent mounting shaft are determined so as to be axially staggered with respect to each other. The vacuum vapor deposition device according to claim 1.
JP63090858A 1988-04-13 1988-04-13 Vacuum deposition equipment Expired - Fee Related JPH0765159B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63090858A JPH0765159B2 (en) 1988-04-13 1988-04-13 Vacuum deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63090858A JPH0765159B2 (en) 1988-04-13 1988-04-13 Vacuum deposition equipment

Publications (2)

Publication Number Publication Date
JPH01263266A JPH01263266A (en) 1989-10-19
JPH0765159B2 true JPH0765159B2 (en) 1995-07-12

Family

ID=14010257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63090858A Expired - Fee Related JPH0765159B2 (en) 1988-04-13 1988-04-13 Vacuum deposition equipment

Country Status (1)

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JP (1) JPH0765159B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101336055B1 (en) * 2012-08-24 2013-12-04 우창산업 주식회사 Coated matter keeper of vacuum evaporator and coated matter by it
KR102517747B1 (en) * 2022-12-19 2023-04-03 백정훈 Rotating Thermal Evaporation Diffusion Deposition System for PCB

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US20110117289A1 (en) * 2007-12-28 2011-05-19 Ulvac, Inc. Deposition Apparatus and Deposition Method
DE102010032591A1 (en) * 2010-07-23 2012-01-26 Leybold Optics Gmbh Apparatus and method for vacuum coating

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Publication number Priority date Publication date Assignee Title
JPS55145336A (en) * 1979-05-01 1980-11-12 Yoichi Murayama High frequency ion-plating device
JPS6163935A (en) * 1984-09-06 1986-04-02 Fujitsu Ltd Optical pickup

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101336055B1 (en) * 2012-08-24 2013-12-04 우창산업 주식회사 Coated matter keeper of vacuum evaporator and coated matter by it
KR102517747B1 (en) * 2022-12-19 2023-04-03 백정훈 Rotating Thermal Evaporation Diffusion Deposition System for PCB

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JPH01263266A (en) 1989-10-19

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