JPH076811B2 - Displacement measuring device - Google Patents
Displacement measuring deviceInfo
- Publication number
- JPH076811B2 JPH076811B2 JP63180022A JP18002288A JPH076811B2 JP H076811 B2 JPH076811 B2 JP H076811B2 JP 63180022 A JP63180022 A JP 63180022A JP 18002288 A JP18002288 A JP 18002288A JP H076811 B2 JPH076811 B2 JP H076811B2
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- Prior art keywords
- light
- diffraction grating
- laser
- receiving element
- light receiving
- Prior art date
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Description
【発明の詳細な説明】 〔技術分野〕 本発明は、光学式リニアエンコーダや光学式ロータリー
エンコーダ等の、変位測定装置に関するものである。Description: TECHNICAL FIELD The present invention relates to a displacement measuring device such as an optical linear encoder or an optical rotary encoder.
従来、例えばU.S.Pat.No.4,629,886やU.S.Pat.No.4,67
6,645に示される様に、リニアスケールにレーザ光を照
射し、リニアスケールからの光を光検出器で検出するこ
とにより、リニアスケールが取付けられた被検物体の変
位を測定する装置が知られている。Conventionally, for example, US Pat.No.4,629,886 or US Pat.No.4,67
As shown in 6,645, there is known a device that measures the displacement of an object to be inspected with a linear scale by irradiating the linear scale with laser light and detecting the light from the linear scale with a photodetector. There is.
上記のU.S.Patentsが示す変位測定装置は、スケールを
回折格子で形成し、レーザ光の照射によりスケールから
射出する回折光で干渉縞を形成し、この干渉縞を光電変
換して得られる信号に基づいて被検物体若しくはスケー
ルの変位を測定するものであり、極めて分解能の高い測
定が可能である。しかしながら、被検物体の移動に伴な
いリニアスケールが有効長以上移動してしまったり、或
いは、リニアスケールが変位の方向に対してある程度以
上傾いていたり、変位方向と直交する方向にずれている
場合、読み取りヘッドと可動基板の位置関係を調整する
必要があった。The displacement measuring device indicated by the above US Patents forms a scale with a diffraction grating, forms interference fringes with diffracted light emitted from the scale by irradiation of laser light, and based on a signal obtained by photoelectrically converting this interference fringe. It measures the displacement of the object to be inspected or the scale, and can perform measurement with extremely high resolution. However, when the linear scale moves more than the effective length due to the movement of the object to be inspected, or the linear scale is tilted to some extent or more with respect to the displacement direction, or is displaced in the direction orthogonal to the displacement direction. , It was necessary to adjust the positional relationship between the reading head and the movable substrate.
本発明は上記従来の問題点に鑑みてなされたものであ
り、読み取りヘッドと可動基板を容易に精度良く最適位
置に追い込むことが可能な変位測定装置を提供すること
を目的とする。The present invention has been made in view of the above-mentioned conventional problems, and an object of the present invention is to provide a displacement measuring apparatus capable of easily and accurately moving a read head and a movable substrate to an optimum position.
上記目的を達成する為に、本発明の変位測定装置は、光
学式スケールを形成した可動基板にレーザ光を照射し、
前記光学式スケールからの回折光の干渉光を光検出器で
検出することにより前記可動基板の変位を測定する変位
測定装置において、前記レーザ光の前記可動基板への入
射位置近傍に前記レーザ光より光束径の大きい光を入射
させる発光素子と該発光素子からの光が前記可動基板で
反射した光を受光する第1の受光素子と、前記光検出器
に入射する回折光の一部を受光する第2の受光素子とを
有し、前記レーザ光と前記可動基板の位置調整の為に前
記第1の受光素子の出力信号に基づいて粗調整を行い前
記第2の受光素子の出力信号に基づいて微調整を行うこ
とを特徴としている。In order to achieve the above object, the displacement measuring device of the present invention irradiates a movable substrate on which an optical scale is formed with a laser beam,
In a displacement measuring device that measures the displacement of the movable substrate by detecting interference light of diffracted light from the optical scale with a photodetector, in the vicinity of the incident position of the laser light on the movable substrate, A light-emitting element that inputs light having a large luminous flux diameter, a first light-receiving element that receives the light reflected from the movable substrate from the light-emitting element, and a part of the diffracted light that enters the photodetector. A second light receiving element, and performs coarse adjustment based on an output signal of the first light receiving element for position adjustment of the laser beam and the movable substrate, and based on an output signal of the second light receiving element It is characterized by fine adjustment.
本発明の更なる特徴と具体的な形態は後述する実施例に
記載されている。Further features and specific forms of the present invention will be described in the embodiments described later.
第1図は本発明の変位測定装置の一実施例を示す光学系
概略図を示す。FIG. 1 is a schematic view of an optical system showing an embodiment of the displacement measuring device of the present invention.
第1図において、半導体レーザ1から可干渉性を有する
レーザ光をコリメーターレンズ2によって略平行光束と
し、偏光ビームスプリツター9に入射させ、偏光ビーム
スプリツター9で互いに偏光方向が直交するP偏光の透
過光束とS偏光の反射光束の2つの光束に分割してい
る。このときレーザー1の出射光束の偏光方向が偏光ビ
ームスプリツター9の偏光面の偏光方位に対して45度と
なるようにレーザー1の取付位置を調整している。これ
により偏光ビームスプリツター9からの透過光束と反射
光束の強度比が略1:1となるようにしている。In FIG. 1, a laser beam having coherence from a semiconductor laser 1 is converted into a substantially parallel light flux by a collimator lens 2 and is incident on a polarization beam splitter 9, and the polarization beam splitter 9 causes P-polarized light beams whose polarization directions are orthogonal to each other. Is divided into two light beams, a transmitted light beam of S and a reflected light beam of S-polarized light. At this time, the mounting position of the laser 1 is adjusted so that the polarization direction of the emitted light beam of the laser 1 becomes 45 degrees with respect to the polarization direction of the polarization plane of the polarization beam splitter 9. As a result, the intensity ratio of the transmitted light flux and the reflected light flux from the polarized beam splitter 9 is set to be approximately 1: 1.
そして偏光ビームスプリツター9からの反射光束と透過
光束を夫々1/4波長板51,52を介して円偏光とし、又、
反射鏡101,102で反射させて、光学式スケールを成す回
折格子3に入射させた時、対象とする回折格子3からの
m次回折光が回折格子3から略垂直に反射するように入
射させている。Then, the reflected light beam and the transmitted light beam from the polarized beam splitter 9 are circularly polarized through the 1/4 wavelength plates 5 1 and 5 2 , respectively, and
When reflected by the reflecting mirrors 10 1 and 10 2 and incident on the diffraction grating 3 forming an optical scale, the m-th order diffracted light from the target diffraction grating 3 is incident so as to be reflected substantially vertically from the diffraction grating 3. I am letting you.
即ち、回折格子3の格子ピツチをP、可干渉性光束の波
長をλ、mを整数とし、可干渉性光束の回折格子3への
入射角度をθmとしたとき θm sin-1(mλ/P) ……(1) となるように入射させている。That is, when the grating pitch of the diffraction grating 3 is P, the wavelength of the coherent light beam is λ, m is an integer, and the incident angle of the coherent light beam to the diffraction grating 3 is θ m , θ m sin −1 (mλ / P) ... It is incident so that it becomes (1).
回折格子3は本測定装置の光学式スケールとなる部材で
あり、又、回折格子3は振幅型又は位相型の格子として
可動基板100上に形成されている。そして、基板100がX
方向に移動することにより回折格子3もX方向に変位す
る。The diffraction grating 3 is a member that serves as an optical scale of the measurement apparatus, and the diffraction grating 3 is formed on the movable substrate 100 as an amplitude type or phase type grating. And the substrate 100 is X
The diffraction grating 3 is also displaced in the X direction by moving in the X direction.
回折格子3から略垂直に射出した2つのm次回折光は光
学部材11に入射する。光学部材11の焦点面近傍には反射
膜12が施されているので、入射した光束は、反射膜12で
反射した後、元の光路を戻り光学部材11から射出し、再
度回折格子3に入射する。The two m-th order diffracted lights emitted from the diffraction grating 3 substantially vertically enter the optical member 11. Since the reflection film 12 is provided in the vicinity of the focal plane of the optical member 11, the incident light flux returns from the original optical path after being reflected by the reflection film 12 and exits from the optical member 11 to enter the diffraction grating 3 again. To do.
そして回折格子3で再度回折されたm次の反射回折光は
元の光路を戻り、反射鏡101,102で反射し、1/4波長板5
1,52を透過し偏光ビームスプリツター9に再入射す
る。Then, the m-th order diffracted diffracted light diffracted again by the diffraction grating 3 returns to the original optical path, is reflected by the reflecting mirrors 10 1 and 10 2 , and is reflected by the quarter wavelength plate 5
The light passes through 1 , 5 2 and is re-incident on the polarized beam splitter 9.
このとき再回折光は1/4波長板51,52を往復している
為、偏光ビームスプリツター9で最初反射した光束は再
入射するときは偏光ビームスプリツター9に対して偏光
方位が90度異なり、偏光ビームスプリツター9を透過す
るようになる。逆に偏光ビームスプリツター9で最初透
過した光束は偏光ビームスプリツター9に再入射したと
き反射されるようになる。At this time, since the re-diffracted light reciprocates through the quarter-wave plates 5 1 and 5 2 , when the light beam first reflected by the polarization beam splitter 9 is re-incident, the polarization direction with respect to the polarization beam splitter 9 is changed. It is different by 90 degrees and is transmitted through the polarized beam splitter 9. On the contrary, the light beam first transmitted by the polarized beam splitter 9 is reflected when it re-enters the polarized beam splitter 9.
こうして偏光ビームスプリツター9で2つの回折光を重
なり合わせビームスプリツター31と1/4波長板53を介し
た後、円偏光とし、ビームスプリツター6で2つの光束
に分割し、各々偏光板71,72を介した後、直線偏光とし
受光素子81,82に各々入射させている。Thus after passing through the polarizing beam splitter -9 in beam splitter over 31 not overlapping the two diffracted light and the quarter-wave plate 5 3, and a circularly polarized light, is divided into two beams by beam splitter -6, each polarizer After passing through 7 1 and 7 2 , linearly polarized light is made incident on the light receiving elements 8 1 and 8 2 , respectively.
尚、(1)式の角度θmは回折光が集光系20に入射し、
再度回折格子3に入射出来る程度の範囲内であれば良い
ことを示している。In addition, at the angle θ m in the equation (1), the diffracted light enters the focusing system 20,
It is shown that it may be within a range in which it can be incident on the diffraction grating 3 again.
本実施例においてm次の回折光の位相は回折格子が1ピ
ツチ移動すると2mπだけ変化する。従って受光素子81,
82からは正と負のm次の回折を2回ずつ受けた光束の干
渉を受光している為、回折格子が格子の1ピツチ分移動
すると4m個の正弦波信号が得られる。In this embodiment, the phase of the m-th order diffracted light changes by 2 mπ when the diffraction grating moves by one pitch. Therefore, the light receiving element 8 1 ,
Since 8 2 receives the interference of the light flux that has received positive and negative m-th order diffraction twice, 4 m sine wave signals can be obtained when the diffraction grating moves by one pitch of the grating.
例えば回折格子3のピツチ3.2μm、回折光として1次
(m=1)を利用したとすれば回折格子3が3.2μm移
動したとき受光素子81,82からは4個の正弦波信号が得
られる。即ち正弦波1個当りの分解能として回折格子3
のピツチの1/4、即ち3.2/4=0.8μmが得られる。For example, if the pitch of the diffraction grating 3 is 3.2 μm and the first order (m = 1) is used as the diffracted light, when the diffraction grating 3 moves 3.2 μm, four sine wave signals are output from the light receiving elements 8 1 and 8 2. can get. That is, the diffraction grating 3 is used as the resolution per sine wave.
That is, 1/4 of the pitch of 3.2, that is, 3.2 / 4 = 0.8 μm is obtained.
又、1/4波長板51,52,53及び偏光板71,72の組み合わ
せによって受光素子81,82からの出力信号間に90度の位
相差をつけ、回折格子3の移動方向も判別出来るように
している。尚、単に移動量のみを測定するのであれば受
光素子は1つでも良く、又、1/4波長板53、ビームスプ
リツター6は不要である。Further, a 90 degree phase difference is provided between the output signals from the light receiving elements 8 1 and 8 2 by the combination of the 1/4 wavelength plates 5 1 , 5 2 and 5 3 and the polarizing plates 7 1 and 7 2 , and the diffraction grating 3 It is also possible to determine the moving direction of. If only the amount of movement is measured, the number of light receiving elements may be one, and the 1/4 wavelength plate 5 3 and the beam splitter 6 are unnecessary.
尚、第1図において、回折格子3の変位を測定する為の
読取りヘツドを符号Rで示している。In FIG. 1, the read head for measuring the displacement of the diffraction grating 3 is indicated by the symbol R.
本実施例において、基板100上には回折格子3と共に所
定の反射部が形成されている。この様子を第2図に示
す。In this embodiment, a predetermined reflecting portion is formed on the substrate 100 together with the diffraction grating 3. This is shown in FIG.
第2図中、符番35で示す部分が反射部であり、回折格子
3の格子配列方向(X方向)に長く延びた線状パターン
が回折格子3に隣接して形成されている。この反射部35
は、レーザ光の基板100に対する入射位置と回折格子3
との位置関係を検出する為に設けられており、第1図に
示す発光素子33と受光素子34の組から成る反射部検出系
Mと協力して、レーザ光が回折格子3に入射する位置に
基板100があるか否かをモニターする。In FIG. 2, a portion indicated by reference numeral 35 is a reflection portion, and a linear pattern elongated in the grating arrangement direction (X direction) of the diffraction grating 3 is formed adjacent to the diffraction grating 3. This reflector 35
Is the incident position of the laser light on the substrate 100 and the diffraction grating 3
The position where the laser light is incident on the diffraction grating 3 is provided in order to detect the positional relationship between the laser beam and the diffraction grating 3 in cooperation with the reflection part detection system M including the set of the light emitting element 33 and the light receiving element 34 shown in FIG. Monitor for board 100 in the.
第1図の発光素子33は、レーザとは異なり、人体に影響
のない光を放射する素子であり、本実施例ではLEDを使
用している。発光素子33からの光は反射部35を照射し
て、反射部35からの反射光が受光素子34で受光される。Unlike the laser, the light emitting element 33 in FIG. 1 is an element that emits light that does not affect the human body, and an LED is used in this embodiment. The light from the light emitting element 33 illuminates the reflecting portion 35, and the reflected light from the reflecting portion 35 is received by the light receiving element 34.
又、発光素子33と受光素子34とから成る反射部検出系M
と前述の第1図で示す変位測定用光学系とは同一の読取
りヘツドRに格納されている。In addition, a reflector detection system M including a light emitting element 33 and a light receiving element 34
And the displacement measuring optical system shown in FIG. 1 are stored in the same reading head R.
ここでは、レーザ光の照射位置が回折格子3からはずれ
る場合に若しくはずれる手前で受光素子34で受光される
反射光の強度が所定のしきい値以下になる様、レーザ光
の照射位置と発光素子33からの光の照射位置及び回折格
子3と反射部35の配置を決めている。Here, the irradiation position of the laser light and the light emitting element are set so that the intensity of the reflected light received by the light receiving element 34 becomes a predetermined threshold value or less when the irradiation position of the laser light deviates from the diffraction grating 3 or before the deviation. The irradiation position of the light from 33 and the arrangement of the diffraction grating 3 and the reflecting portion 35 are determined.
従って、レーザ光が回折格子3を照射しているか否か
が、発光素子33と受光素子34の組から成る検出系の出力
信号、即ち、受光素子34による光電変換信号に基づいて
検出できる。この為、受光素子34からの信号の強度変化
をモニターし、この強度がしきい値以下となった場合、
例えばレーザ1の駆動を停止することにより、読取りヘ
ツドから外部へレーザ光が漏れるのを防ぐことができ
る。Therefore, whether or not the laser beam irradiates the diffraction grating 3 can be detected based on the output signal of the detection system including the set of the light emitting element 33 and the light receiving element 34, that is, the photoelectric conversion signal by the light receiving element 34. Therefore, the intensity change of the signal from the light receiving element 34 is monitored, and when this intensity becomes equal to or less than the threshold value,
For example, by stopping the driving of the laser 1, it is possible to prevent the laser light from leaking from the reading head to the outside.
第1図に戻り、ビームスプリツター31は偏光ビームスプ
リツター9からの光束の一部を反射し、この一部の光を
受光素子32に向ける。偏光ビームスプリツター9からの
光束は、互いに偏光方向が直交する回折光が重なり合っ
た光である為、回折格子3が移動しても強度の変化は生
じない。従って、受光素子32は回折格子3の移動に関係
なく、単に回折光の強度をモニターすることが可能であ
り、レーザ1の出力変動や、回折格子3と入射レーザ光
の相対的位置関係に依存する回折光の強度変化が検出で
きる。Returning to FIG. 1, the beam splitter 31 reflects a part of the light beam from the polarized beam splitter 9 and directs this part of the light to the light receiving element 32. Since the light beam from the polarized beam splitter 9 is light in which diffracted lights whose polarization directions are orthogonal to each other are overlapped with each other, the intensity does not change even if the diffraction grating 3 moves. Therefore, the light receiving element 32 can simply monitor the intensity of the diffracted light regardless of the movement of the diffraction grating 3, and depends on the output fluctuation of the laser 1 and the relative positional relationship between the diffraction grating 3 and the incident laser light. The change in the intensity of the diffracted light can be detected.
この受光素子32と前述の受光素子34からの出力信号は、
例えば第3図に示す回路により処理される。第3図にお
いて、41と42は増幅器、43と44は比較器、45と46と49と
50は抵抗、47と48は基準電圧電源、51と52はLEDなどか
ら成る表示用発光素子を示す。又、53,54は比較器43,44
からの“HIGH"又は“LOW"の信号を後段の制御回路(不
図示)へ入力する為の端子であり、例えば図示する様
に、比較器44からの信号は、レーザ1の駆動回路を制御
する為に使用される。The output signals from the light receiving element 32 and the light receiving element 34 described above are
For example, it is processed by the circuit shown in FIG. In FIG. 3, 41 and 42 are amplifiers, 43 and 44 are comparators, 45, 46 and 49.
Reference numeral 50 is a resistor, 47 and 48 are reference voltage power supplies, and 51 and 52 are display light emitting elements such as LEDs. Also, 53 and 54 are comparators 43 and 44.
Is a terminal for inputting a "HIGH" or "LOW" signal from the control circuit (not shown) in the subsequent stage. For example, as shown in the figure, the signal from the comparator 44 controls the drive circuit of the laser 1. Used to do.
受光素子32,34で発生する光強度に応じた電流は、増幅
器41,42および抵抗45,46により光強度に応じた電圧に変
換される。これを各々所定の基準電圧(しきい値)47,4
8と比較器43,44で比較し、強度が所定の値より大きいと
き出力端子53,54をLOW電圧とし、LED51,52を点灯させ
る。強度が所定の値より小さいときは出力端子53,54はH
IGH電圧となりLEDは消灯する。これにより、各受光素子
32,34が受光した光の強度を知ることができる。発光素
子33からの光束は径が大きく、しかも指向性がないの
で、受光素子34に入射する光の強度の変化は基板100が
本来の位置に対し多少Y方向に変位しても小さくなる。
これに対し、受光素子32に入射するレーザ光の強度は、
ビーム径が小さいこと,ほぼ平行光であること,光路が
長いことなどから、基板100のY方向の変位に対して大
きく変化するので基板100へのレーザ光入射位置の最適
な範囲がせまくなる。従って、まず、受光素子34に入射
する光の強度をモニタしながら、基板100即ち回折格子
3の位置の粗調整を行い、次に受光素子32に入射する光
の強度をモニタしながら回折格子3の位置の微調整を行
うようにすれば、調整が非常に行いやすく、容易に最適
位置に基板100、即ち回折格子3を追い込み、レーザ光
を回折格子3に入射させることができる。The current corresponding to the light intensity generated in the light receiving elements 32 and 34 is converted into a voltage according to the light intensity by the amplifiers 41 and 42 and the resistors 45 and 46. This is the specified reference voltage (threshold) 47,4
8 is compared with the comparators 43 and 44, and when the intensity is larger than a predetermined value, the output terminals 53 and 54 are set to LOW voltage and the LEDs 51 and 52 are turned on. When the intensity is less than the specified value, the output terminals 53 and 54 are H
It becomes the IGH voltage and the LED goes off. As a result, each light receiving element
The intensity of the light received by 32 and 34 can be known. Since the luminous flux from the light emitting element 33 has a large diameter and has no directivity, the change in the intensity of the light incident on the light receiving element 34 is small even if the substrate 100 is displaced in the Y direction from the original position to some extent.
On the other hand, the intensity of the laser light incident on the light receiving element 32 is
Since the beam diameter is small, the light is substantially parallel, and the optical path is long, it largely changes with respect to the displacement of the substrate 100 in the Y direction, so that the optimum range of the laser light incident position on the substrate 100 becomes narrow. Therefore, first, the position of the substrate 100, that is, the diffraction grating 3 is roughly adjusted while monitoring the intensity of light incident on the light receiving element 34, and then the diffraction grating 3 is monitored while monitoring the intensity of light incident on the light receiving element 32. If the position is finely adjusted, the adjustment can be performed very easily, and the substrate 100, that is, the diffraction grating 3 can be easily driven to the optimum position and the laser light can be incident on the diffraction grating 3.
また、先に述べた様に受光素子34に入射する光の強度が
ある所定の値に達しないときはレーザ1の動作を停止さ
せ、ある所定の値に達したときにレーザ1を駆動するよ
うにしておけば、回折格子3がレーザ光の入射位置にな
い状態のまま不用意に電源を投入したり、或いは変位測
定中に回折格子3がその有効長以上移動したりしてもレ
ーザー光が射出されない。従って、安全である。As described above, the operation of the laser 1 is stopped when the intensity of the light incident on the light receiving element 34 does not reach a predetermined value, and the laser 1 is driven when the intensity reaches a predetermined value. If this is done, even if the diffraction grating 3 is inadvertently turned on while the laser beam is not at the incident position, or if the diffraction grating 3 moves for more than its effective length during displacement measurement, the laser beam will not be emitted. Not ejected. Therefore, it is safe.
この制御は端子54の出力をレーザ1の駆動回路に作用さ
せ、端子54の出力がHIGH電圧のときレーザ1の発光を停
止させ、端子54の出力がLOW電圧のときレーザ1を駆動
するようにする。これにより、回折格子3がレーザ光の
入射位置にないときに、不用意に、レーザ1からレーザ
ー光が発せられることがなくなる。This control causes the output of the terminal 54 to act on the drive circuit of the laser 1, the emission of the laser 1 is stopped when the output of the terminal 54 is HIGH voltage, and the laser 1 is driven when the output of the terminal 54 is LOW voltage. To do. This prevents the laser beam from being accidentally emitted from the laser 1 when the diffraction grating 3 is not at the laser beam incident position.
又、各光強度の変化は増幅器41,42の出力電圧を直接モ
ニタしてもよいことはいうまでもない。Further, it goes without saying that the output voltage of the amplifiers 41 and 42 may be directly monitored for the change of each light intensity.
以上説明した動作をまとめると、次の表1の様になる。The operations described above are summarized in Table 1 below.
発光素子33から基板100の反射部35へ照射する光束の入
射角度は特に限定されず、第4図(A)の様にほぼ垂直
方向から入射させてもよい。又、検出系は、第4図
(B)に示す様に発光・受光各素子がペアでパツケージ
に入れられたものでもよい。また、発光素子33は、LED
以外にも、安全性の高いものであれば何でもよいし、受
光素子34もフオトダイオード,フオトトランジスタ等特
に限定されない。 The incident angle of the light flux emitted from the light emitting element 33 to the reflecting portion 35 of the substrate 100 is not particularly limited, and may be incident from a substantially vertical direction as shown in FIG. 4 (A). Further, the detection system may be one in which light emitting and light receiving elements are paired in a package as shown in FIG. 4 (B). The light emitting element 33 is an LED.
In addition to this, any device having high safety may be used, and the light receiving element 34 is not particularly limited to a photo diode, a photo transistor, or the like.
また、第3図で示した回路で得られる2つの信号の表示
は、エンコーダの読取りヘツドで表示させたり、読取り
ヘツドから得られる信号を処理するインターフエイスユ
ニツト内に表示されたりすることができるが、どこで表
示しても本発明の趣旨から外れるものではない。Also, the display of the two signals obtained with the circuit shown in FIG. 3 can be displayed at the read head of the encoder or in the interface unit which processes the signal obtained from the read head. However, no matter where it is displayed, it does not deviate from the gist of the present invention.
また、第1図において、ビームスプリツタ31の配置はこ
の位置に限定されず、たとえば1/4波長板53とビームス
プリツタ6との間にあってもよい。Further, in FIG. 1, the arrangement of the beam splitter 31 is not limited to this position, for example may be between the 1/4 wavelength plate 5 3 and beam splitter 6.
以上、本発明によれば、レーザ光の可動基板への入射位
置近傍に前記レーザ光より光束径の大きい光を入射させ
る発光素子と該発光素子からの光が前記可動基板で反射
した光を受光する第1の受光素子と、前記光検出器に入
射する回折光の一部を受光する第2の受光素子とを設
け、前記レーザ光と前記可動基板の位置調整の為に前記
第1の受光素子の出力信号に基づいて微調整を行い前記
第2の受光素子の出力信号に基づいて微調整を行うこと
により、読み取りヘッドと可動基板を容易に精度良く最
適位置に追い込むことが可能な変位測定装置とすること
ができる。As described above, according to the present invention, a light-emitting element that causes light having a larger luminous flux diameter than the laser light to enter near the incident position of the laser light on the movable substrate, and light that is reflected from the movable substrate by the light from the light-emitting element is received. And a second light receiving element for receiving a part of the diffracted light incident on the photodetector, and the first light receiving element for adjusting the positions of the laser beam and the movable substrate. Displacement measurement that allows the read head and the movable substrate to be easily and accurately driven to the optimum position by performing fine adjustment based on the output signal of the element and fine adjustment based on the output signal of the second light receiving element. It can be a device.
第1図は、本発明の変位測定装置の一実施例を示す光学
系概略図。 第2図は基板上の回折格子と反射部を示す上面図。 第3図は2つの受光素子からの出力信号を処理する処理
回路を示す回路図。 第4図(A),(B)は反射部検出系の変形例を示す
図。 R……読取りヘツド M……反射部検出系 1……半導体レーザ 3……回折格子 32,34……受光素子 43,44……比較器 51,52……表示用発光素子 100……可動基板FIG. 1 is a schematic view of an optical system showing an embodiment of the displacement measuring device of the present invention. FIG. 2 is a top view showing the diffraction grating and the reflection portion on the substrate. FIG. 3 is a circuit diagram showing a processing circuit for processing output signals from two light receiving elements. 4 (A) and 4 (B) are views showing a modified example of the reflection part detection system. R …… Reading head M …… Reflector detection system 1 …… Semiconductor laser 3 …… Diffraction grating 32,34 …… Light receiving element 43,44 …… Comparator 51,52 …… Light emitting element for display 100 …… Movable substrate
フロントページの続き (72)発明者 石塚 公 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 窪田 洋一 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (56)参考文献 特開 昭61−59632(JP,A) 特開 昭61−262597(JP,A)Front Page Continuation (72) Inventor Ko Ishizuka 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Yoichi Kubota 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (56) References JP 61-59632 (JP, A) JP 61-262597 (JP, A)
Claims (1)
ザ光を照射し、前記光学式スケールからの回折光の干渉
光を光検出器で検出することにより前記可動基板の変位
を測定する変位測定装置において、 前記レーザ光の前記可動基板への入射位置近傍に前記レ
ーザ光より光束径の大きい光を入射させる発光素子と該
発光素子からの光が前記可動基板で反射した光を受光す
る第1の受光素子と、前記光検出器に入射する回折光の
一部を受光する第2の受光素子とを有し、前記レーザ光
と前記可動基板の位置調整の為に前記第1の受光素子の
出力信号に基づいて粗調整を行い前記第2の受光素子の
出力信号に基づいて微調整を行うことを特徴とする変位
測定装置。1. Displacement measurement for measuring the displacement of the movable substrate by irradiating a movable substrate on which an optical scale is formed with laser light and detecting interference light of diffracted light from the optical scale with a photodetector. In the device, a light-emitting element that allows light having a larger light flux diameter than the laser light to enter near the incident position of the laser light on the movable substrate, and light that is emitted from the light-emitting element and reflected by the movable substrate is received. Of the first light receiving element for adjusting the positions of the laser light and the movable substrate. A displacement measuring device characterized in that rough adjustment is performed based on an output signal and fine adjustment is performed based on an output signal of the second light receiving element.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63180022A JPH076811B2 (en) | 1988-07-18 | 1988-07-18 | Displacement measuring device |
| US07/347,397 US5066130A (en) | 1988-05-10 | 1989-05-04 | Displacement measuring apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63180022A JPH076811B2 (en) | 1988-07-18 | 1988-07-18 | Displacement measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0228518A JPH0228518A (en) | 1990-01-30 |
| JPH076811B2 true JPH076811B2 (en) | 1995-01-30 |
Family
ID=16076095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63180022A Expired - Fee Related JPH076811B2 (en) | 1988-05-10 | 1988-07-18 | Displacement measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH076811B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011047867A (en) * | 2009-08-28 | 2011-03-10 | Nikon Corp | Scale, position detecting device, stage apparatus, and exposure apparatus |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4576013B2 (en) * | 1999-12-21 | 2010-11-04 | オリンパス株式会社 | Optical encoder |
| JP5968233B2 (en) * | 2013-01-11 | 2016-08-10 | Dmg森精機株式会社 | Position detection device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6159632A (en) * | 1984-08-30 | 1986-03-27 | Sony Corp | Optical pickup device |
| JPH08154B2 (en) * | 1985-05-15 | 1996-01-10 | 株式会社タイトー | Laser gun game device equipped with safety device |
-
1988
- 1988-07-18 JP JP63180022A patent/JPH076811B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011047867A (en) * | 2009-08-28 | 2011-03-10 | Nikon Corp | Scale, position detecting device, stage apparatus, and exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0228518A (en) | 1990-01-30 |
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