JPH0768206B2 - O-diisocyanobenzenes and method for producing the same - Google Patents
O-diisocyanobenzenes and method for producing the sameInfo
- Publication number
- JPH0768206B2 JPH0768206B2 JP30430187A JP30430187A JPH0768206B2 JP H0768206 B2 JPH0768206 B2 JP H0768206B2 JP 30430187 A JP30430187 A JP 30430187A JP 30430187 A JP30430187 A JP 30430187A JP H0768206 B2 JPH0768206 B2 JP H0768206B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- diisocyanobenzenes
- formula
- general formula
- diformamide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- 239000012024 dehydrating agents Substances 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001624 naphthyl group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 17
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- -1 di-substituted-O-phenylenediamine Chemical class 0.000 description 11
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920001940 conductive polymer Polymers 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 150000003948 formamides Chemical class 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- AIDQCFHFXWPAFG-UHFFFAOYSA-N n-formylformamide Chemical compound O=CNC=O AIDQCFHFXWPAFG-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- FKHIFSZMMVMEQY-UHFFFAOYSA-N talc Chemical compound [Mg+2].[O-][Si]([O-])=O FKHIFSZMMVMEQY-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- GPJJMYBWKARXPX-UHFFFAOYSA-N 1,2-diisocyano-4,5-dimethylbenzene Chemical compound CC1=CC([N+]#[C-])=C([N+]#[C-])C=C1C GPJJMYBWKARXPX-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- XTBLDMQMUSHDEN-UHFFFAOYSA-N naphthalene-2,3-diamine Chemical compound C1=CC=C2C=C(N)C(N)=CC2=C1 XTBLDMQMUSHDEN-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- SYQIIBRVOSBWME-UHFFFAOYSA-N trichloromethyl formate Chemical compound ClC(Cl)(Cl)OC=O SYQIIBRVOSBWME-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】 本発明は、一般式(I) (式中、R1およびR2は水素原子、ハロゲン原子、低級ア
ルキル基、低級アルコキシル基、低級アルコキシカルボ
ニル基を示す。但し、R1およびR2がともに水素原子であ
ることはない。また、R1とR2が結合してナフタレン環を
形成することもある) で示されるO−ジイソシアノベンゼン類およびその製造
法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention has the general formula (I) (In the formula, R 1 and R 2 represent a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxyl group, and a lower alkoxycarbonyl group. However, both R 1 and R 2 are not hydrogen atoms. R 1 and R 2 may combine to form a naphthalene ring) and an O-diisocyanobenzenes and a method for producing the same.
上記一般式(I)で示されるO−ジイソシアノベンゼン
類は文献に全く記載されず、本発明者が初めて合成した
新規化合物であって、該化合物は導電性ポリマーの製造
原料として有利に使用することができる。The O-diisocyanobenzenes represented by the above general formula (I) are not described in the literature at all, and are novel compounds synthesized by the present inventors for the first time, and these compounds are advantageously used as a raw material for producing a conductive polymer. can do.
上記一般式(I)で示されるO−ジイソシアノベンゼン
類と製造上類似の化合物として、該一般式(I)におけ
る置換基R1およびR2がともに水素原子であるO−ジイソ
シアノベンゼンはC.A.,61,8243eに記載されて公知であ
る。As a compound similar in production to the O-diisocyanobenzenes represented by the general formula (I), O-diisocyanobenzene in which the substituents R 1 and R 2 in the general formula (I) are both hydrogen atoms Are known and are described in CA, 61 , 8243e.
しかし、かかるO−ジイソシアノベンゼンは熱的に非常
に不安定であって、室温程度ですでに重合し、タール化
を起こすために実用上利用し得ないものであった。However, such O-diisocyanobenzene is extremely unstable thermally and has already been polymerized at about room temperature to cause tar formation, which is not practically applicable.
しかるに、本願の目的化合物である一般式(I)で示さ
れるO−ジイソシアノベンゼン類は室温においても安定
であり、そのため各種ポリマー原料としても有利に使用
し得るが、とりわけO−ジイソシアノベンゼン類を重合
してなるポリマーはすぐれた導電性を有し、導電性ポリ
マーとしての幅広い用途が期待されている。However, the O-diisocyanobenzenes represented by the general formula (I), which are the target compounds of the present application, are stable even at room temperature and therefore can be advantageously used as various polymer raw materials. Polymers obtained by polymerizing benzenes have excellent conductivity and are expected to find wide application as conductive polymers.
かかる一般式(I)で示されるO−ジイソシアノベンゼ
ン類は、一般式(II) (式中、R1およびR2は上記と同じ意味を有する) で示されるホルムアミド類を、塩基性アミンの存在下に
脱水剤と反応させることにより製造することができる。The O-diisocyanobenzenes represented by the general formula (I) are represented by the general formula (II) (Wherein R 1 and R 2 have the same meanings as described above) and can be produced by reacting with a dehydrating agent in the presence of a basic amine.
ここで、本反応の原料となるホルムアミド類はモノまた
はジ置換−O−フェニレンジアミンあるいは2,3−ナフ
チレンジアミンを原料としてJ.Org.Chem.,86,3238(197
1)に記載の方法に準じてアミノ基をホルミル化するこ
とにより容易に製造することができ、その具体例とし
て、N,N′−(4−メチル−O−フェニレン)ジホルム
アミド、N,N′−(4−ブチル−O−フェニレン)ジホ
ルムアミド、N,N′−(4.5−ジメチル−O−フェニレ
ン)ジホルムアミド、N,N′−(4−クロロ−O−フェ
ニレン)ジホルムアミド、N,N′−(4−メトキシ−O
−フェニレン)ジホルムアミド、N,N′−(4−プロポ
キシ−O−フェニレン)ジホルムアミド、N,N′−(4.5
−ジメトキシ−O−フェニレン)ジホルムアミド、N,
N′−(4−メトキシカルボニル−O−フェニレン)ジ
ホルムアミド、N,N′−(2,3−ナフチレン)ホルムアミ
ドなどが挙げられる。Here, the formamides used as the starting material for this reaction are prepared from J-Org. Chem., 86 , 3238 (197) using mono- or di-substituted-O-phenylenediamine or 2,3-naphthylenediamine as the starting material.
It can be easily produced by formylating an amino group according to the method described in 1), and specific examples thereof include N, N '-(4-methyl-O-phenylene) diformamide and N, N. ′-(4-Butyl-O-phenylene) diformamide, N, N ′-(4.5-dimethyl-O-phenylene) diformamide, N, N ′-(4-chloro-O-phenylene) diformamide, N, N '-(4-methoxy-O
-Phenylene) diformamide, N, N '-(4-propoxy-O-phenylene) diformamide, N, N'-(4.5
-Dimethoxy-O-phenylene) diformamide, N,
Examples thereof include N '-(4-methoxycarbonyl-O-phenylene) diformamide and N, N'-(2,3-naphthylene) formamide.
本発明の方法において、脱水剤としてはホスゲン、ホス
ゲン発生化剤(たとえばホスゲン二量体、トリクロロメ
チルフォルメート)、塩化チオニル、オキシ塩化リン等
が使用されるが、好ましくはホスゲンまたはホスゲン発
生化剤であり、とりわけ取扱い上の安全性等の点からホ
スゲン発生化剤が好ましく使用される。In the method of the present invention, phosgene, a phosgene generator (for example, phosgene dimer, trichloromethyl formate), thionyl chloride, phosphorus oxychloride, etc. are used as the dehydrating agent, and preferably phosgene or a phosgene generator. In particular, a phosgene generator is preferably used from the viewpoint of safety in handling.
かかる脱水剤の使用量は原料O−ジイソシアノベンゼン
類のホルムアミド基に対して等当量以上、好ましくは1.
1倍当量以上であり、上限については特に制限されない
が、一般的には5倍当量、好ましくは3倍当量である。The amount of the dehydrating agent used is equivalent to or more than the formamide group of the raw material O-diisocyanobenzenes, preferably 1.
It is 1 times equivalent or more, and the upper limit is not particularly limited, but it is generally 5 times equivalent, preferably 3 times equivalent.
この反応において、塩基性アミンは反応により副生する
酸成分の中和剤として使用され、また、この反応は通常
有機溶媒中で実施されるため、塩基性アミンとしてはか
かる有機溶媒に対して相溶性のあることが好ましく、例
えばトリメチルアミン、トリエチルアミン、ピリジンな
どの有機第3級アミンが挙げられる。かかる塩基性アミ
ンの使用量は該反応により副生する酸成分を捕捉するに
足る理論量以上使用され、その上限は特に制限されない
が、一般的には原料O−ジイソシルアノベンゼン類に対
して10モル倍である。In this reaction, the basic amine is used as a neutralizing agent for the acid component produced as a by-product of the reaction, and since this reaction is usually carried out in an organic solvent, the basic amine is compatible with the organic solvent. It is preferably soluble, and examples thereof include organic tertiary amines such as trimethylamine, triethylamine, and pyridine. The amount of the basic amine used is at least a theoretical amount sufficient to capture the acid component produced as a by-product of the reaction, and the upper limit thereof is not particularly limited, but it is generally based on the raw material O-diisosylanobenzenes. 10 mol times.
溶媒は反応に不活性であれば特に制限なく使用すること
ができ、たとえばn−ヘキサン、n−オクタン等の脂肪
族炭化水素、ベンゼン、トルエン、キシレン等の芳香族
炭化水素、メチレンクロライド、クロロホルム、クロル
ベンゼン等のハロゲン化炭化水素、メチルエーテル、エ
チルエーテル等のエーテル類が例示されるが、ハロゲン
化炭化水素とりわけハロゲン化脂肪族炭化水素が好まし
く使用される。The solvent can be used without particular limitation as long as it is inert to the reaction. For example, aliphatic hydrocarbons such as n-hexane and n-octane, aromatic hydrocarbons such as benzene, toluene and xylene, methylene chloride, chloroform, Examples thereof include halogenated hydrocarbons such as chlorobenzene and ethers such as methyl ether and ethyl ether, but halogenated hydrocarbons, especially halogenated aliphatic hydrocarbons are preferably used.
反応は一般には40℃以下で行われるが、収率等の点から
好ましくは20℃以下、より好ましくは0℃以下で行われ
る。反応温度の下限は特に制限されないが、実用的には
−80℃程度である。The reaction is generally carried out at 40 ° C. or lower, preferably 20 ° C. or lower, more preferably 0 ° C. or lower in view of yield and the like. The lower limit of the reaction temperature is not particularly limited, but is practically about -80 ° C.
尚、反応を低温で行う場合、使用溶媒の融点について十
分に留意しなければならないのは当然である。When the reaction is carried out at a low temperature, it is natural that the melting point of the solvent used must be carefully considered.
反応終了後、反応液からの目的化合物の取出しは、たと
えば反応液を炭酸ソーダ水溶液等のアルカリ性水溶液で
処理したのち分液し、分液油層については必要に応じて
更に炭酸ソーダ水溶液等による洗浄を行ったのちこれを
濃縮することにより行われ、必要あれば更にこれをカラ
ムクロマト法などで精製することができる。After completion of the reaction, the target compound can be taken out from the reaction solution by, for example, treating the reaction solution with an alkaline aqueous solution such as a sodium carbonate aqueous solution and then separating the solution, and further separating the separated oil layer with a sodium carbonate aqueous solution or the like. It is carried out by concentrating this after carrying out, and if necessary, it can be further purified by column chromatography or the like.
かくして、本発明の方法により新規化合物である前記一
般式(I)で示されるO−ジイソシアノベンゼン類が好
収率で得られ、このものは導電性ポリマーの原料として
使用することができるが、かかるポリマー原料として使
用するためには、次式に示すように、置換基R1が4−位
に置換していることが好ましい。Thus, according to the method of the present invention, O-diisocyanobenzenes represented by the general formula (I), which are novel compounds, can be obtained in a good yield and can be used as a raw material of a conductive polymer. For use as such a polymer raw material, it is preferable that the substituent R 1 is substituted at the 4-position as shown in the following formula.
以下、実施例により本発明を説明する。 Hereinafter, the present invention will be described with reference to examples.
実施例1 N,N′−(4−メチル−O−フェニレン)ジホルムアミ
ド1.62g(9.1ミリモル)、トリエチルアミン5.2g(51.7
ミリモル)およびメチレンクロライド7.2mlを窒素雰囲
気下、−78℃に冷却し、攪拌を行う。これにホスゲン二
量体2.75g(13.9ミリモル)とメチレンクロライド25.2m
lからなる溶液を30分を要して滴下した。滴下終了後、
メチレンクロライド5mlで器壁を洗浄した。−78℃→0
℃で12時間攪拌を行ったのち、ゆっくりと室温まで温度
で上げた。反応終了後、反応液に10%Na2CO3水溶液を加
えてクエンチし、分液後同じく10%Na2CO3水溶液で3回
洗浄を繰り返した。有機層を無水硫酸マグネシウムで乾
燥後、濃縮し、フロリジル・ショートカラムを用いて精
製した。Example 1 N, N '-(4-methyl-O-phenylene) diformamide 1.62 g (9.1 mmol), triethylamine 5.2 g (51.7)
(Mmol) and 7.2 ml of methylene chloride are cooled to -78 ° C under a nitrogen atmosphere and stirred. 2.75 g (13.9 mmol) of phosgene dimer and 25.2 m of methylene chloride were added.
The solution consisting of 1 was added dropwise over 30 minutes. After the dropping is completed,
The vessel wall was washed with 5 ml of methylene chloride. -78 ℃ → 0
After stirring at ℃ for 12 hours, the temperature was slowly raised to room temperature. After completion of the reaction, 10% Na 2 CO 3 aqueous solution was added to the reaction solution to quench the reaction, and after separation, washing with the 10% Na 2 CO 3 aqueous solution was repeated 3 times. The organic layer was dried over anhydrous magnesium sulfate, concentrated, and purified using a Florisil short column.
このとき、フロリジル(60〜100メッシュ)を30g使用
し、展開溶媒としてヘキサン:塩化メチレンの1:1混合
溶媒を300ml使用した。展開液を濃縮し、生成結晶をヘ
キサンで洗浄して3.4−ジイソシアノトルエン0.66g(収
率50.7%)を得た。At this time, 30 g of florisil (60 to 100 mesh) was used, and 300 ml of a 1: 1 mixed solvent of hexane: methylene chloride was used as a developing solvent. The developing solution was concentrated, and the produced crystals were washed with hexane to obtain 0.66 g (yield 50.7%) of 3.4-diisocyanotoluene.
融点78〜80℃(黒く分解を伴う) NMR(CDCl3) δ2.42(3H singlet) 7.16〜7.50(3H multiplet) Mass(G.C.) M+=142 m/e=115:M+−HC 元素分析値 C9H6M2 理論値 C(%)76.04 H(%)4.25 N(%)19.71 実験値 C(%)76.10 H(%)4.15 N(%)19.76 実施例2 N,N′−(4−メチル−O−フェニレン)ジホルムアミ
ドに代えてN,N′−(4.5−ジメチル−O−フェニレン)
ジホルムアミド1.76g(9.2ミリモル)を使用する以外は
実施例1と同様に、反応、後処理を行って、1,2−ジイ
ソシアノ−4,5−ジメチルベンゼン1.26g(収率87.8%)
を得た。Melting point 78-80 ° C (with black decomposition) NMR (CDCl 3 ) δ2.42 (3H singlet) 7.16-7.50 (3H multiplet) Mass (GC) M + = 142 m / e = 115: M + -HC Elemental analysis value C 9 H 6 M 2 Theoretical value C (%) 76.04 H (%) 4.25 N (%) 19.71 Experimental value C (%) 76.10 H (%) 4.15 N (%) 19.76 Example 2 N, N '-(4.5-Dimethyl-O-phenylene) in place of N, N'-(4-methyl-O-phenylene) diformamide
Reaction and post-treatment were carried out in the same manner as in Example 1 except that 1.76 g (9.2 mmol) of diformamide was used, and 1.26 g of 1,2-diisocyano-4,5-dimethylbenzene (yield 87.8%).
Got
融点112〜113℃(黒く分解を伴う) NMR(CDCl3) δ2.30(6H singlet) 7.56(2H singlet) 元素分析値 C10H8N2 理論値 C(%)76.90 H(%)5.16 N(%)17.94 実験値 C(%)76.99 H(%)5.01 N(%)17.70 実施例3〜6 N,N′−(4−メチル−O−フェニレン)ジホルムアミ
ドに代えて表−1記載のホルムアミド類を使用する以外
は実施例1に準じて反応、後処理を行って、表−1に示
す結果を得た。Melting point 112-113 ° C (with black decomposition) NMR (CDCl 3 ) δ 2.30 (6H singlet) 7.56 (2H singlet) Elemental analysis value C 10 H 8 N 2 theoretical value C (%) 76.90 H (%) 5.16 N (%) 17.94 experimental value C (%) 76.99 H (%) 5.01 N (%) 17.70 Examples 3 to 6 N, The reaction and post-treatment were carried out in the same manner as in Example 1 except that the formamides shown in Table 1 were used instead of N '-(4-methyl-O-phenylene) diformamide, and the results shown in Table 1 were obtained. Obtained.
Claims (2)
ルキル基、低級アルコキシル基、低級アルコキシカルボ
ニル基を示す。但し、R1およびR2がともに水素原子であ
ることはない。また、R1とR2が結合してナフタレン環を
形成することもある) で示されるO−ジイソシアノベンゼン類。1. A general formula (In the formula, R 1 and R 2 represent a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxyl group, and a lower alkoxycarbonyl group. However, both R 1 and R 2 are not hydrogen atoms. R 1 and R 2 may combine to form a naphthalene ring).
ルキル基、低級アルコキシル基、低級アルコキシカルボ
ニル基を示す。但し、R1およびR2がともに水素原子であ
ることはない。また、R1とR2が結合してナフタレン環を
形成することもある) で示されるホルムアミド類を、塩基性アミンの存在下に
脱水剤と反応させることを特徴とする一般式 (式中、R1およびR2は前記と同じ意味を有する) で示されるO−ジイソシアノベンゼン類の製造法。2. General formula (In the formula, R 1 and R 2 represent a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxyl group, and a lower alkoxycarbonyl group. However, both R 1 and R 2 are not hydrogen atoms. R 1 and R 2 may combine to form a naphthalene ring.) A general formula characterized by reacting a formamide represented by the formula (1) with a dehydrating agent in the presence of a basic amine. (In the formula, R 1 and R 2 have the same meanings as described above.) A method for producing O-diisocyanobenzenes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30430187A JPH0768206B2 (en) | 1987-11-30 | 1987-11-30 | O-diisocyanobenzenes and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30430187A JPH0768206B2 (en) | 1987-11-30 | 1987-11-30 | O-diisocyanobenzenes and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01143850A JPH01143850A (en) | 1989-06-06 |
| JPH0768206B2 true JPH0768206B2 (en) | 1995-07-26 |
Family
ID=17931387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30430187A Expired - Fee Related JPH0768206B2 (en) | 1987-11-30 | 1987-11-30 | O-diisocyanobenzenes and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0768206B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5212945B2 (en) * | 2009-03-12 | 2013-06-19 | 国立大学法人東京農工大学 | Method for producing isocyanide compound |
-
1987
- 1987-11-30 JP JP30430187A patent/JPH0768206B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01143850A (en) | 1989-06-06 |
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