JPH0774906B2 - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPH0774906B2 JPH0774906B2 JP19244187A JP19244187A JPH0774906B2 JP H0774906 B2 JPH0774906 B2 JP H0774906B2 JP 19244187 A JP19244187 A JP 19244187A JP 19244187 A JP19244187 A JP 19244187A JP H0774906 B2 JPH0774906 B2 JP H0774906B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- photopolymerizable composition
- aryl group
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title claims description 26
- 239000003999 initiator Substances 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 150000001639 boron compounds Chemical class 0.000 claims description 10
- 239000000178 monomer Substances 0.000 claims description 8
- 229920000620 organic polymer Polymers 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 125000003107 substituted aryl group Chemical group 0.000 claims description 2
- -1 trichloromethyl compound Chemical class 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 20
- 238000011282 treatment Methods 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 150000003839 salts Chemical class 0.000 description 10
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 6
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 235000010980 cellulose Nutrition 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- RSEHMVDVWGHIAQ-UHFFFAOYSA-N tert-butyl naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)OC(C)(C)C)=CC=CC2=C1 RSEHMVDVWGHIAQ-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-M toluene-4-sulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- YDGFWBUHUUSSRS-UHFFFAOYSA-N 1-(methoxymethyl)-4-phenoxybenzene Chemical compound C1=CC(COC)=CC=C1OC1=CC=CC=C1 YDGFWBUHUUSSRS-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-M 2,4,6-trimethylbenzenesulfonate Chemical compound CC1=CC(C)=C(S([O-])(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-M 0.000 description 1
- QZZJTWAHFMBFSX-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC(C(Cl)(Cl)Cl)=N1 QZZJTWAHFMBFSX-UHFFFAOYSA-N 0.000 description 1
- GUKYYIQMUCVKHI-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GUKYYIQMUCVKHI-UHFFFAOYSA-N 0.000 description 1
- DQMOHZLFVGYNAN-UHFFFAOYSA-N 2-(2-phenylethenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2C=CC=CC=2)=N1 DQMOHZLFVGYNAN-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- JENKIIWNWASCFW-UHFFFAOYSA-N 2-[2-(4-methylphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 JENKIIWNWASCFW-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- BMRVLXHIZWDOOK-UHFFFAOYSA-N 2-butylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCC)=CC=C21 BMRVLXHIZWDOOK-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- FWMKPJYJDJSEHR-UHFFFAOYSA-N 2-propylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCC)=CC=C21 FWMKPJYJDJSEHR-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 1
- JDFDHBSESGTDAL-UHFFFAOYSA-N 3-methoxypropan-1-ol Chemical compound COCCCO JDFDHBSESGTDAL-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- JUQPZRLQQYSMEQ-UHFFFAOYSA-N CI Basic red 9 Chemical compound [Cl-].C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[NH2+])C=C1 JUQPZRLQQYSMEQ-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ORAWFNKFUWGRJG-UHFFFAOYSA-N Docosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCC(N)=O ORAWFNKFUWGRJG-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- WWKGVZASJYXZKN-UHFFFAOYSA-N Methyl violet 2B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[N+](C)C)C=C1 WWKGVZASJYXZKN-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- WVDDGKGOMKODPV-UHFFFAOYSA-N benzyl alcohol Substances OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920001727 cellulose butyrate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 239000000852 hydrogen donor Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- QFVDKARCPMTZCS-UHFFFAOYSA-N methylrosaniline Chemical compound C1=CC(N(C)C)=CC=C1C(O)(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 QFVDKARCPMTZCS-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical compound O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- PGSADBUBUOPOJS-UHFFFAOYSA-N neutral red Chemical compound Cl.C1=C(C)C(N)=CC2=NC3=CC(N(C)C)=CC=C3N=C21 PGSADBUBUOPOJS-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulphite Substances [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は不飽和単量体と光重合開始剤と有機硼素化合物
とを含み、さらに必要により線状有機高分子重合体を含
み光重合性組成物に関し、特に印刷用原版の作製、フォ
トレジスト等に有用な光硬化像を提供しうる光重合性組
成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention comprises an unsaturated monomer, a photopolymerization initiator, and an organic boron compound, and further contains a linear organic high-molecular polymer, if necessary, and is photopolymerizable. The present invention relates to a composition, and more particularly to a photopolymerizable composition capable of providing a photocurable image useful for producing a printing original plate, photoresist and the like.
重合可能なエチレン性不飽和化合物と、光重合開始剤
と、更に必要に応じて適当な皮膜形成能を有する線状有
機高分子重合体、熱重合防止剤等を混和させたものを感
光性組成物として写真的手法によって画像複製を行なう
方法は現在広く知られるところである。すなわち特公昭
35−5093号公報、特公昭35−8495号公報等に記載される
様に該感光性組成物は活性光線の照射により光重合を起
し、不溶化する。従って、感光性組成物を適当な皮膜と
なし、所望の画像の陰画を通して活性光線の照射を行
い、適当な溶媒により未感光部のみを除去する(以下単
に現像とよぶ。)ことにより所望の光重合画像を形成さ
せることができる。このタイプの感光性組成物は印刷板
あるいはフォトレジスト等の感光剤として極めて有用で
あることは論を待たない。A photosensitive composition prepared by mixing a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a linear organic high molecular polymer having a proper film-forming ability as necessary, a thermal polymerization inhibitor, etc. A method of reproducing an image by a photographic method as an object is widely known at present. That is,
As described in JP-A-35-5093, JP-B-35-8495 and the like, the photosensitive composition undergoes photopolymerization upon irradiation with an actinic ray to become insoluble. Therefore, the photosensitive composition is formed into an appropriate film, the active light is irradiated through the negative image of the desired image, and only the unexposed area is removed with an appropriate solvent (hereinafter simply referred to as development). A superimposed image can be formed. It goes without saying that this type of photosensitive composition is extremely useful as a photosensitizer for printing plates or photoresists.
従来より、重合可能なエチレン性不飽和化合物の光重合
開始剤として、ベンジル、ベンゾイン、ベンゾインエチ
ルエーテル、ミヒラーケトン、アンスラキノン、アクリ
ジン、フェナジン、ベンゾフェノン、2−エチルアンス
ラキノン等が代表的なものとして知られている。しかし
ながらこれらの開始剤は、実用上必ずしも充分な光重合
開始能力を示さず、光照射による画像形成には多くの時
間を要した。この欠点を改良するために通常ラジカル発
生剤に光吸収剤を組み合せることが提案されている。た
とえば本発明の一般式(I)で表わされるS−トリアジ
ン化合物のトリクロロメチル化合物に、特公昭59−2832
8号公報に示される芳香族チアゾール化合物、特開昭54
−151024号公報に示されるメロシアニン色素、特開昭58
−40302号公報に示される芳香族チオピリリウム塩や芳
香族ピリリウム塩、その他9−フェニルアクリジン、 等の光吸収剤を組み合せ、更にはこれらの組み合せにN
−フェニルグリシン、2−メルカプトベンゾチアゾー
ル、N′,N′−ジメチルアミノ安息香酸エチル等の水素
供与体等を組み合せることによって、充分な光重合開始
能力を示すことが知られている。しかしこれらのラジカ
ル発生剤は光吸収剤との組合せは平版印刷版の感光層に
用いると、画像露光時に酸素による重合阻外を強く受け
るという欠点があった。Conventionally, benzyl, benzoin, benzoin ethyl ether, Michler's ketone, anthraquinone, acridine, phenazine, benzophenone, 2-ethylanthraquinone, etc. are known as typical ones as photopolymerization initiators for polymerizable ethylenically unsaturated compounds. Has been. However, these initiators do not necessarily show sufficient photopolymerization initiation ability in practical use, and it took a lot of time for image formation by light irradiation. In order to improve this drawback, it has been generally proposed to combine a radical generator with a light absorber. For example, in the trichloromethyl compound of the S-triazine compound represented by the general formula (I) of the present invention, Japanese Patent Publication No.
Aromatic thiazole compounds shown in JP-A-8, JP-A-54
No. 151024, the merocyanine dye disclosed in JP-A-58-58
Aromatic thiopyrylium salt and aromatic pyrylium salt, other 9-phenyl acridine, A light absorber such as
It is known that a sufficient photopolymerization initiation ability is exhibited by combining a hydrogen donor such as -phenylglycine, 2-mercaptobenzothiazole, ethyl N ', N'-dimethylaminobenzoate and the like. However, when these radical generators are used in combination with a light absorber in the photosensitive layer of a lithographic printing plate, they have a drawback that they are strongly blocked by oxygen during image exposure.
本発明は、上記の問題点を解決するためになされたもの
であり、従って画像露光時の酸素の影響を低減できかつ
印刷用原版の作製、フォトレジスト等に有用な光硬化像
を与え得る光重合性組成物を提供することを目的とす
る。The present invention has been made in order to solve the above problems, and therefore the effect of oxygen during image exposure can be reduced and the production of a printing original plate, a light which can give a useful photocured image to a photoresist or the like. It is intended to provide a polymerizable composition.
本発明者らは、上記のような技術の現状に鑑み、鋭意研
究の結果、光重合性組成物において、光重合開始剤とし
てトリアジン系化合物に有機硼素化合物を添加すること
によって画像露光時の酸素の影響を低減することができ
るという知見に基づき、本発明をなすに至った。The present inventors, in view of the current state of the art as described above, as a result of earnest research, in a photopolymerizable composition, by adding an organic boron compound to a triazine-based compound as a photopolymerization initiator, oxygen at the time of image exposure The present invention has been completed based on the finding that the influence of the above can be reduced.
すなわち本発明は、活性光線により光重合が可能な少な
くとも1個のエチレン性不飽和基を有する単量体、一般
式(I)の光重合開始剤: 〔式中Rは、アリール基又はCH=CHnW(ただしWは
アリール基又は複素環基であり、nは1〜3の整数を示
す)である。〕及び、 一般式(II): 〔式中、R1、R2、R3およびR4は同じでも異なっていても
よく、アルキル基、アリール基又は置換アリール基であ
る。ただしR1、R2、R3およびR4のうち少なくとも1つ
は、アルキル基である。X+はアルカリ金属又は で示されるアンモニウムである。ここで、R5、R6、R7及
びR8は同じであっても異なっていてもよく水素、アルキ
ル基、アリール基、アラルキル基、アルカリール基、ア
ルケニル基、アルキニル基、アリサイクリック基及びア
リル基から選ばれる基である。〕で表わされる有機硼素
化合物を含有することを特徴とする光重合性組成物を提
供する。That is, the present invention relates to a monomer having at least one ethylenically unsaturated group capable of undergoing photopolymerization by actinic rays, a photopolymerization initiator of the general formula (I): Wherein R is an aryl group or a CH = CH n W (but W is an aryl group or a heterocyclic group, n represents an integer of 1 to 3) is. ] And the general formula (II): [In the formula, R 1 , R 2 , R 3 and R 4 may be the same or different and each is an alkyl group, an aryl group or a substituted aryl group. However, at least one of R 1 , R 2 , R 3 and R 4 is an alkyl group. X + is an alkali metal or Is ammonium represented by. Here, R 5 , R 6 , R 7 and R 8 may be the same or different, hydrogen, an alkyl group, an aryl group, an aralkyl group, an alkaryl group, an alkenyl group, an alkynyl group and an alicyclic group. And an allyl group. ] The photopolymerizable composition characterized by containing the organic boron compound represented by these.
本発明に使用される「活性光線により光重合が可能な少
なくとも1個のエチレン性不飽和基を有する単量体」
は、常圧で沸点100℃以上の、少なくとも1分子中に1
個、より好ましくは2個以上の付加重合可能なエチレン
性不飽和基を有する分子量10,000以下のモノマー又はオ
リゴマーである。このようなモノマー又はオリゴマーと
しては、ポリエチレングリコールモノ(メタ)アクリレ
ート、ポリプロピレングリコールモノ(メタ)アクリレ
ート、フェノキシエチル(メタ)アクリレート等の単官
能のアクリレートやメタクリレート;ポリエチレングリ
コールジ(メタ)アクリレート、ポリプロピレンジ(メ
タ)アクリレート、トリメチロールエタントリ(メタ)
アクリレート、ネオペンチルグリコールジ(メタ)アク
リレート、ペントエリスリトールトリ(メタ)アクリレ
ート、ペンタエリスリトールテトラ(メタ)アクリレー
ト、ジペンタエリスリトールヘキサ(メタ)アクリレー
ト、ヘキサンジオールジ(メタ)アクリレート、トリ
(アクリロイロキシエチル)イソシアヌレート、グリセ
リンやトリメチロールエタン等の多価アルコールにエチ
レンオキサイドやプロピレンオキサイドを付加させた後
(メタ)アクリレート化したもの、特公昭48−41708
号、特公昭50−6034号、特開昭51−37193号各公報に記
載されているようなウレタンアクリレート類、特開昭48
−64183号、特公昭49−43191号、特公昭52−30490号各
公報に記載されているポリエステルアクリレート類、エ
ポキシ樹脂と(メタ)アクリル酸を反応させたエポキシ
アクリレート類等の多官能のアクリレートやメタクリレ
ートをあげることができる。さらに日本接着協会誌Vol.
20、No.7、300〜308ページに光硬化性モノマー及びオリ
ゴマーとして紹介されているものも使用することができ
る。"A monomer having at least one ethylenically unsaturated group capable of being photopolymerized by actinic rays" used in the present invention
Is 1 in at least one molecule with a boiling point of 100 ° C or higher at atmospheric pressure.
It is a monomer or oligomer having a molecular weight of 10,000 or less and having at least one ethylenically unsaturated group capable of addition polymerization. Examples of such monomers or oligomers include monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene diester. (Meth) acrylate, trimethylolethane tri (meth)
Acrylate, neopentyl glycol di (meth) acrylate, pentoerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol di (meth) acrylate, tri (acryloyloxyethyl) ) Isocyanurate, glycerin, trimethylolethane, and other polyhydric alcohols added with ethylene oxide or propylene oxide and then (meth) acrylated, JP-B-48-41708
Urethane acrylates as described in JP-B No. 50-6034, JP-A-51-37193, JP-A-48,
-64183, JP-B-49-43191, JP-B-52-30490, and other polyfunctional acrylates such as polyester acrylates, epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid, Methacrylate can be given. Furthermore, the Japan Adhesive Association magazine Vol.
The materials introduced as photocurable monomers and oligomers on pages 20, No. 7, pages 300 to 308 can also be used.
本発明で用いる光重合開始剤は上記一般式〔I〕で表わ
される化合物である。式〔I〕中、アリール基としては
炭素数6〜14、複素環基としてはフラン、ベンゾフラ
ン、チオフェン、ピロール及びベンゾオキサゾールなど
が好ましい。尚、アリール基、複素環基は置換基を有し
ていてもよい。これらのトリアジン系化合物としては、
若林ら著、Bull.Chem.Soc.Japan,42、2924(1969)記載
の化合物、たとえば、2−フェニル−4,6−ビス(トリ
クロルメチル)−S−トリアジン、2−(p−クロルフ
ェニル)−4,6−ビス(トリクロルメチル)−S−トリ
アジン、2−(p−トリル)−4,6−ビス(トリクロル
メチル)−S−トリアジン、2−(p−メトキシフェニ
ル)−4,6−ビス(トリクロルメチル)−S−トリアジ
ン、2−(2′,4′−ジクロルフェニル)−4,6−ビス
(トリクロルメチル)−S−トリアジン等が挙げられ
る。その他、英国特許1388492号明細書記載の化合物、
たとえば、2−スチリル−4,6−ビス(トリクロルメチ
ル)−S−トリアジン、2−(p−メチルスチリル)−
4,6−ビス(トリクロルメチル)−S−トリアジン、2
−(p−メトキシスチリル)−4,6−ビス(トリクロル
メチル)−S−トリアジン等、特開昭53−133428号明細
書記載の化合物、たとえば、2−(4−メトキシ−ナフ
ト−1−イル)−4,6−ビス−トリクロルメチル−S−
トリアジン、2−(4−エトキシ−ナフト−1−イル)
−4,6−ビス−トリクロルメチル−S−トリアジン、2
−〔4−(2−エトキシエチル)−ナフト−1−イル〕
−4,6−ビス−トリクロルメチル−S−トリアジン、2
−(4,7−ジメトキシ−ナフト−1−イル〕−4,6−ビス
−トリクロルメチル−S−トリアジン、2−(アセナフ
ト−5−イル)−4,6−ビス−トリクロメチル−S−ト
リアジン等、特公昭59−1281号明細書記載の化合物、た
とえば 独国特許3337024号明細書記載の化合物たとえば、 等 特願昭60−198868号明細書記載の化合物、たとえば 等や、 特願昭61−186238号明細書記載の化合物、たとえば 等を挙げることができる。The photopolymerization initiator used in the present invention is a compound represented by the above general formula [I]. In formula [I], the aryl group preferably has 6 to 14 carbon atoms, and the heterocyclic group preferably includes furan, benzofuran, thiophene, pyrrole, benzoxazole and the like. The aryl group and the heterocyclic group may have a substituent. As these triazine compounds,
Wakabayashi et al., Bull. Chem. Soc. Japan, 42 , 2924 (1969), compounds such as 2-phenyl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-chlorophenyl). -4,6-bis (trichloromethyl) -S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6- Examples thereof include bis (trichloromethyl) -S-triazine and 2- (2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine. In addition, compounds described in British Patent No. 1388492,
For example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl)-
4,6-bis (trichloromethyl) -S-triazine, 2
-(P-Methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine and the like, compounds described in JP-A-53-133428, such as 2- (4-methoxy-naphth-1-yl). ) -4,6-Bis-trichloromethyl-S-
Triazine, 2- (4-ethoxy-naphth-1-yl)
-4,6-bis-trichloromethyl-S-triazine, 2
-[4- (2-Ethoxyethyl) -naphth-1-yl]
-4,6-bis-trichloromethyl-S-triazine, 2
-(4,7-Dimethoxy-naphth-1-yl] -4,6-bis-trichloromethyl-S-triazine, 2- (acenaphtho-5-yl) -4,6-bis-triclomethyl-S-triazine Etc., compounds described in Japanese Patent Publication No. 59-1281, for example, Compounds described in German Patent No. 3337024, for example, Compounds described in Japanese Patent Application No. 60-198868, such as Etc., compounds described in Japanese Patent Application No. 61-186238, such as Etc. can be mentioned.
本発明で用いられる有機硼素化合物は、上記一般式(I
I)で表される化合物である。式中、R1〜R4としては炭
素数1〜18のものが好ましく、又、上述したアルキル
基、アリール基などの誘導体でもよい。このうちR1〜R4
としては炭素数1〜6のアルキル基、フェニル基及び置
換フェニル基が好ましい。一方、R5〜R8としては、炭素
数1〜18のものが好ましく、上述したアルキル基などの
誘導体も使用できる。このうち炭素数1〜6のアルキル
基が好ましい。The organic boron compound used in the present invention has the general formula (I
It is a compound represented by I). In the formula, R 1 to R 4 are preferably those having 1 to 18 carbon atoms, and may be derivatives such as the above-mentioned alkyl groups and aryl groups. Of these, R 1 to R 4
Are preferably an alkyl group having 1 to 6 carbon atoms, a phenyl group and a substituted phenyl group. On the other hand, R 5 to R 8 are preferably those having 1 to 18 carbon atoms, and the above-mentioned derivatives such as alkyl groups can also be used. Of these, an alkyl group having 1 to 6 carbon atoms is preferable.
式中Xのアルカリ金属としてナトリウム、カリウムが例
示される。Examples of the alkali metal represented by X in the formula include sodium and potassium.
一般式〔II〕で表わされる化合物として、具体的には、 等を挙げることができる。As the compound represented by the general formula [II], specifically, Etc. can be mentioned.
光重合開始剤の本発明の組成物中への含有濃度は通常わ
ずかなものであり、また不適当に多い場合には有効光線
の遮蔽等好ましくない結果を生じる。本発明における一
般式(I)で表わされる光重合開始剤と一般式(II)で
表わされる有機硼素化合物の合計が光重合可能なエチレ
ン性不飽和化合物と必要により添加される線状有機高分
子重合体との合計に対して0.01重量%から20重量%の範
囲で充分であり、更に好ましくは1重量%から10重量%
で良好なる結果を得る。また一般式(II)で表わされる
有機硼素化合物と一般式(I)の光重合開始剤の割合
は、それぞれ80〜20重量%、20〜80重量%であることが
望ましい。The content concentration of the photopolymerization initiator in the composition of the present invention is usually small, and when it is unsuitably high, unfavorable results such as shielding of effective rays are produced. A linear organic polymer in which the total of the photopolymerization initiator represented by the general formula (I) and the organic boron compound represented by the general formula (II) in the present invention is a photopolymerizable ethylenically unsaturated compound and optionally added The range of 0.01 to 20% by weight is sufficient with respect to the total amount of the polymer, and more preferably 1 to 10% by weight.
With good results. The proportions of the organic boron compound represented by the general formula (II) and the photopolymerization initiator of the general formula (I) are preferably 80 to 20% by weight and 20 to 80% by weight, respectively.
更に本発明で用いる光重合開示剤に必要に応じてN−フ
ェニルグリシン、2−メルカプトベンゾチアゾール、N,
N−ジアルキル安息香酸アルキルエステル等の水素供与
性化合物を与えることによって更に光重合開始能力を高
めることができる。Further, the photopolymerization disclosing agent used in the present invention may optionally contain N-phenylglycine, 2-mercaptobenzothiazole, N,
The photopolymerization initiation ability can be further enhanced by providing a hydrogen-donating compound such as an N-dialkylbenzoic acid alkyl ester.
本発明において必要に応じて添加する「線状有機高分子
重合体」としては当然光重合可能なエチレン性不飽和化
合物と相溶性を有しているものを選択しなければならな
い。光重合可能なエチレン性不飽和化合物と相溶性のあ
る線状有機高分子重合体である限り、どれを使用しても
構わないが、望ましくは水現像あるいは弱アルカリ水現
像を可能とする様な線状有機高分子重合体を選択すべき
である。線状有機高分子重合体は、該組成物の皮膜形成
剤としてだけではなく、水、弱アルカリ水あるいは有機
溶剤現像剤としての用途に応じて使用される。たとえば
水可溶性有機高分子重合体を用いると水現像が可能とな
る。この様な線状有機高分子重合体としては、側鎖にカ
ルボン酸を有する付加重合体、たとえばメタクリル酸共
重合体、アクリル酸共重合体、イタコン酸共重合体、ク
ロトン酸共重合体、マレイン酸共重合体、部分エステル
化マレイン酸共重合体等があり、また同様に側鎖にカル
ボン酸を有する酸性セルロース誘導体がある。この他水
酸基を有する付加重合体に環状酸無水物を付加させたも
の等が有用である。この他に水溶性線状有機高分子重合
体としてポリビニルピロリドンやポリエチレンオキサイ
ド等が有用である。また硬化皮膜の強度をあげるために
アルコール可溶性ナイロンや2,2−ビス−(4−ヒドロ
キシフェニル)−プロパンとエピクロロヒドリンのポリ
エーテル遠も有用である。これらの線状有機高分子重合
体は全組成中に任意な量、例えば光重合可能なエチレン
性不飽和基を有する単量体100重量部当り、100〜900重
量部の割合で混和させることができるが、90重量%を超
えることは形成される画像強度等の点で好ましい結果を
与えない。In the present invention, as the "linear organic high molecular polymer" to be added as necessary, it is of course necessary to select one having compatibility with the photopolymerizable ethylenically unsaturated compound. Any linear organic polymer that is compatible with the photopolymerizable ethylenically unsaturated compound may be used, but it is preferable that it be capable of developing with water or weak alkaline water. A linear organic high molecular polymer should be selected. The linear organic high molecular polymer is used not only as a film forming agent for the composition but also as a developer for water, weak alkaline water or an organic solvent. For example, water development becomes possible by using a water-soluble organic high molecular polymer. Examples of such linear organic polymer include addition polymers having carboxylic acid in the side chain, such as methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, and maleic acid. There are acid copolymers, partially esterified maleic acid copolymers and the like, and similarly, there are acidic cellulose derivatives having a carboxylic acid in the side chain. In addition to these, those obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group are useful. In addition, polyvinylpyrrolidone, polyethylene oxide and the like are useful as the water-soluble linear organic polymer. In addition, alcohol-soluble nylon or a polyether ether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin is also useful for increasing the strength of the cured film. These linear organic high molecular weight polymers may be mixed in an arbitrary amount in the entire composition, for example, 100 to 900 parts by weight based on 100 parts by weight of a monomer having a photopolymerizable ethylenically unsaturated group. However, if it exceeds 90% by weight, favorable results are not obtained in terms of the strength of the formed image.
さらに本発明においては以上の基本成分の他に光重合性
組成物の製造中あるいは保存中において重合可能なエチ
レン性不飽和化合物の不要な熱重合を阻止するために少
量の熱重合防止剤を添加することが望ましい。適当な熱
重合防止剤としてはハイドロキノン、p−メトキシフェ
ノール、ジーt−ブチル−p−クレゾール、ピロガロー
ル、t−ブチルカテコール、ベンゾキノン、4,4′−チ
オピス(3−メチル−6−t−ブチルフェノール)、2,
2′−メチレンビス(4−メチル−6−t−ブチルフェ
ノール)、2−メニカプトベンゾイミダゾール、N−ニ
トロソフェニルヒドロキシアミン第一セリウム塩等があ
げられる。また、場合によっては、硬化皮膜の物性を改
良する目的として無機充てん剤を加えてもよい。Further, in the present invention, in addition to the above basic components, a small amount of a thermal polymerization inhibitor is added to prevent unnecessary thermal polymerization of the polymerizable ethylenically unsaturated compound during the production or storage of the photopolymerizable composition. It is desirable to do. Suitable thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiopis (3-methyl-6-t-butylphenol). , 2,
Examples thereof include 2'-methylenebis (4-methyl-6-t-butylphenol), 2-menicaptobenzimidazole, N-nitrosophenylhydroxyamine primary cerium salt and the like. In some cases, an inorganic filler may be added for the purpose of improving the physical properties of the cured film.
本発明の光重合性組成物は、例えば、2−メトキシエタ
ノール、2−メトキシエチルアセテート、プロピレング
リコールモノメチルエーテル、3−メトキシプロパノー
ル、3−メトキシプロピルアセテート、メチルエチルケ
トン、エチレンジクロライドなどの適当な溶剤の単独ま
たはこれらを適当に組合せた混合溶媒に溶解して支持体
上に設けることができる。その被覆量は乾燥後の重量で
約0.1g/m2〜約10g/m2の範囲が適当であり、より好まし
くは0.5〜5g/m2である。The photopolymerizable composition of the present invention comprises, for example, a single solvent such as 2-methoxyethanol, 2-methoxyethyl acetate, propylene glycol monomethyl ether, 3-methoxypropanol, 3-methoxypropyl acetate, methyl ethyl ketone and ethylene dichloride. Alternatively, these may be dissolved in a mixed solvent appropriately combined and provided on the support. The coating amount in the range of about 0.1 g / m 2 ~ about 10 g / m 2 in weight after drying are suitable, more preferably from 0.5 to 5 g / m 2.
本発明では、さらにジアゾ樹脂を加えてもよい。感光性
ジアゾ樹脂は芳香族ジアゾニウム塩と活性カルボニル基
含有化合物、例えばホルムアルデヒドとの縮合物で代表
されるジアゾ樹脂である。In the present invention, a diazo resin may be further added. The photosensitive diazo resin is a diazo resin represented by a condensation product of an aromatic diazonium salt and an active carbonyl group-containing compound such as formaldehyde.
上記ジアゾ樹脂としては、例えば、p−ジアゾジフェニ
ルアミンとホルムアルデヒドまたはアセトアルデヒドと
の縮合物とヘキサフルオロ燐酸塩またはテトラフルオロ
硼酸塩との反応生成物である有機溶媒可溶性ジアゾ樹脂
無機塩や、特公昭47−1167号公報に記載されているよう
な前記縮合物とスルホン酸塩類、例えばp−トルエンス
ルホン酸またはその塩、プロピルナフタレンスルホン酸
またはその塩、ブチルナフタレンスルホン酸またはその
塩、ドデシルベンゼンスルホン酸またはその塩、2−ヒ
ドロキシ−4−メトキシベンゾフエノン−5−スルホン
酸またはその塩との反応生成物である有機溶媒可溶性ジ
アゾ樹脂有機塩が挙げられる。Examples of the diazo resin include organic solvent-soluble diazo resin inorganic salts, which are reaction products of a condensate of p-diazodiphenylamine and formaldehyde or acetaldehyde, and hexafluorophosphate or tetrafluoroborate, and JP-B-47- 1167 and the sulfonates such as p-toluenesulfonic acid or a salt thereof, propylnaphthalenesulfonic acid or a salt thereof, butylnaphthalenesulfonic acid or a salt thereof, dodecylbenzenesulfonic acid or a salt thereof. An organic solvent-soluble diazo resin organic salt which is a reaction product of a salt, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid or a salt thereof can be mentioned.
また特開昭58−27141号に示されているような3−メト
キシ−4−ジアゾ−ジフェニルアミンを4,4′−ビス−
メトキシ−メチル−ジフェニルエーテルで縮合させメシ
チレンスルホン酸塩としたものなども適当である。Further, 3-methoxy-4-diazo-diphenylamine as disclosed in JP-A-58-27141 is used as 4,4'-bis-
Those obtained by condensing with methoxy-methyl-diphenyl ether to give mesitylene sulfonate are also suitable.
上記ジアゾ樹脂の添加量は任意であるが、0.5〜20重量
%添加するのがよい。The amount of the above-mentioned diazo resin added is arbitrary, but 0.5 to 20% by weight is preferably added.
さらに、染料として塩形成能のある染料を光重合性組成
物に含有させることができる、そしてこれにより、露光
した時の焼出し画像の形成と現像後の画像の着色とを実
現することも知られている(例えば、特開昭50−138905
号、同56−121031号、同59−222842号、特願昭61−2744
33)。このような染料としては、クリスタルバイオレッ
ト(CI42555)、メチルバイオレット2B(CI42535)、マ
ラカイトグリーン(CI42000)、フクシン(CI42510)、
クリスタルバイオレット−カルビノールベース(CI4255
5:1)、パラフクシン(CI42500)、ローダミンB(CI45
170)、ビクトリアブルーB(CI44045)、ビクトリアピ
ュアブルーBOH(CI42595)、ブリリアントグリーン(CI
42040)、ナイトブルーBX(CI51185)、ニュートラルレ
ッド(CI50040)、ロージュリンピュアブルー3G(CI510
04)、オリエントオイルブルー#603、ビクトリアピュ
アブルーBOHのパラトルエンスルホン酸塩、又はナフタ
レンスルホン酸塩又はt−ブチルナフタレンスルホン酸
塩、クリスタルバイオレットのパラトルエンスルホン酸
塩等をあげることが出来る。染料の含有量は任意である
が、0.1〜5重量%とするのがよい。Further, it is also known that a dye capable of forming a salt as a dye can be contained in the photopolymerizable composition, and by this, formation of a print-out image upon exposure and coloring of the image after development are realized. (For example, JP-A-50-138905).
No. 56-121031, No. 59-222842, No. 61-2744
33). Such dyes include crystal violet (CI42555), methyl violet 2B (CI42535), malachite green (CI42000), fuchsin (CI42510),
Crystal Violet-Carbinol Base (CI4255
5: 1), parafuchsin (CI42500), rhodamine B (CI45
170), Victoria Blue B (CI44045), Victoria Pure Blue BOH (CI42595), Brilliant Green (CI)
42040), Night Blue BX (CI51185), Neutral Red (CI50040), Rogerin Pure Blue 3G (CI510)
04), Orient Oil Blue # 603, Victoria Pure Blue BOH paratoluenesulfonate, naphthalenesulfonate or t-butylnaphthalenesulfonate, and crystal violet paratoluenesulfonate. The content of the dye is arbitrary, but it is preferably 0.1 to 5% by weight.
さらにまた、本発明の光重合性組成物が、所期の目的を
達成するための公知の他の添加剤(例えば、焼出し剤
等)を含み得ることは論をまたない。Furthermore, it goes without saying that the photopolymerizable composition of the present invention may contain other known additives for achieving the intended purpose (for example, a baking-out agent and the like).
上記支持体としては、寸度的に安定な板状物が用いられ
る。このような寸度的に安定な板状物としては、従来印
刷版の支持体として使用されたものが含まれ、それらを
好適に使用することができる。かかる支持体としては、
紙、プラスチック(例えばポリエチレン、ポリプロピレ
ン、ポリスチレンなど)がラミネートされた紙、例えば
アルミニウム(アルミニウム合金も含む。)、亜鉛、銅
などのような金属の板、例えば二酢酸セルロース、三作
戦セルロース、プロピオン酸セルロース、酪酸セルロー
ス、酢酸酪酸セルロース、硝酸セルロース、ポリエチレ
ンテレフタレート、ポリエチレン、ポリスチレン、ポリ
プロピレン、ポリカーボネート、ポリビニルアセタール
などのようなプラスチックのフィルム、上記の如き金属
がラミネートもしくは蒸着された紙もしくはプラスチッ
クフィルムなどが含まれる。これらの支持体のうち、ア
ルミニウム板は寸度的に著しく安定であり、しかも安価
であるので特に好ましい。更に、特公昭48−18327号公
報に記されているようなポリエチレンテレフタレートフ
ィルム上にアルミニウムシートが結合された複合体シー
トも好ましい。As the above support, a dimensionally stable plate-like material is used. Such dimensionally stable plate-like materials include those conventionally used as a support for printing plates, and they can be preferably used. As such a support,
Paper, paper laminated with plastic (eg polyethylene, polypropylene, polystyrene, etc.), metal plate such as aluminum (including aluminum alloy), zinc, copper, etc., eg cellulose diacetate, cellulose triacetate, propionic acid Includes plastic films such as cellulose, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, and paper or plastic films laminated or vapor-deposited with the above metals. Be done. Among these supports, the aluminum plate is particularly preferable because it is dimensionally remarkably stable and inexpensive. Further, a composite sheet in which an aluminum sheet is bonded on a polyethylene terephthalate film as described in JP-B-48-18327 is also preferable.
また金属、特にアルミニウムの表面を有する支持体の場
合には、砂目立て処理、珪酸ソーダ、弗化ジルコニウム
酸カリウム、燐酸塩等の水溶液への浸漬処理、あるいは
陽極酸化処理などの表面処理がなされていることが好ま
しい。また、来国特許第2,714,066号明細書に記載され
ている如く、砂目立てしたのちに珪酸ナトリウム水溶液
に浸漬処理されたアルミニウム板、特公昭47−5125号公
報に記載されているようにアルミニウム板を陽極酸化処
理したのちに、アルカリ金属珪酸塩の水溶液に浸漬処理
したものも好適に使用される。上記陽極酸化処理は、例
えば、燐酸、クロム酸、硫酸、硼酸等の無機酸、若しく
は蓚酸、スルファミン酸等の有機酸まはこれらの塩の水
溶液又は非水溶液の単独又は二種以上を組み合わせた電
解液中でアルミニウム板を陽極として電流を流すことに
より実施される。Further, in the case of a support having a surface of metal, especially aluminum, it is subjected to surface treatment such as graining treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, etc., or anodization treatment. Is preferred. Further, as described in the Japanese Patent No. 2,714,066, an aluminum plate that has been grained and then subjected to an immersion treatment in an aqueous solution of sodium silicate, an aluminum plate as described in Japanese Patent Publication No. 47-5125. It is also suitable to use an anodizing treatment followed by immersion treatment in an aqueous solution of an alkali metal silicate. The above-mentioned anodizing treatment is carried out, for example, by electrolysis of an inorganic acid such as phosphoric acid, chromic acid, sulfuric acid, boric acid or the like, an organic acid such as oxalic acid, sulfamic acid or the like, or an aqueous solution or a non-aqueous solution of these salts, or a combination of two or more kinds. It is carried out by passing an electric current in a liquid using an aluminum plate as an anode.
また、米国特許第3,658,662号明細書に記載されている
ようなシリケート電着も有効である。Further, silicate electrodeposition as described in US Pat. No. 3,658,662 is also effective.
更には特公昭46−27481号公報、特開昭52−58602号公
報、特開昭52−30503号公報に開示されているような電
解グレインを施した支持体と、上記陽極酸化処理及び珪
酸ソーダ処理を組合せた表面処理も有用である。Further, a support subjected to electrolytic graining as disclosed in JP-B-46-27481, JP-A-52-58602 and JP-A-52-30503, and the anodizing treatment and sodium silicate Surface treatments that combine treatments are also useful.
更には、特開昭56−28893号公報に開示されているよう
な、ブラシグレイン、電解グレイン、陽極酸化処理さら
に珪酸ソーダ処理を順に行ったものも好適である。Further, as disclosed in JP-A-56-28893, a brush grain, an electrolytic grain, an anodic oxidation treatment, and a sodium silicate treatment which are sequentially performed are also preferable.
更にこれらの処理を行った後に、水溶性の樹脂、たとえ
ばポリビニルフォスホン酸、スルホン酸基を側鎖に有す
る重合体及び共重合体、ポリアクリル酸等を下塗りした
ものも好適である。Furthermore, after these treatments, a water-soluble resin such as polyvinyl phosphonic acid, a polymer or copolymer having a sulfonic acid group in its side chain, or a polyacrylic acid undercoat is also suitable.
これらの親水化処理は、支持体の表面を親水性とするた
めに施される以外る、その上に設けられる公重合性組成
物の有害な反応を防ぐため、更には感光層の密着性の向
上等のために施されるものである。These hydrophilization treatments are performed to make the surface of the support hydrophilic, in order to prevent harmful reactions of the publicly polymerizable composition provided thereon, and further to improve the adhesion of the photosensitive layer. It is provided for improvement.
支持体上に設けられた光重合性組成物の層の上には、空
気中の酸素による重合禁止作用を完全に防止するため、
例えばポリビニルアルコール、特にケン化度99%以上の
ポリビニルアルコール、酸性セルロース類などのような
酸素遮断性に優れたポリマーよりなる保護層を設けても
よい。この様な保護層の塗布方法については、例えば米
国特許第3,458,311号、特公昭55−49729号明細書に詳し
く記載されている。On the layer of the photopolymerizable composition provided on the support, in order to completely prevent the polymerization inhibiting action by oxygen in the air,
For example, a protective layer made of a polymer having excellent oxygen barrier properties, such as polyvinyl alcohol, particularly polyvinyl alcohol having a saponification degree of 99% or more and acidic celluloses may be provided. The coating method of such a protective layer is described in detail, for example, in U.S. Pat. No. 3,458,311 and JP-B-55-49729.
本発明の光重合性組成物を支持体上に設けた感光性プレ
ートをメタルハライドランプ、高圧水銀灯などのような
紫外線に富んだ光源を用いて画像露光し、現像液で処理
して感光層の未露光部を除去し、最後にガム液を塗布す
ることにより印刷板とする。上記現像液として好ましい
ものは、ベンジルアルコール、2−フェノキシエタノー
ル、2−ブトキシエタノールのような有機溶媒を少量含
むアルカリ水溶液であり、例えば米国特許第3,475,171
号及び同3,615,480号に記載されているものを挙げるこ
とができる。The photosensitive plate provided with the photopolymerizable composition of the present invention on a support is imagewise exposed using a light source rich in ultraviolet rays such as a metal halide lamp, a high pressure mercury lamp, etc. The exposed portion is removed, and the gum solution is finally applied to obtain a printing plate. Preferred as the developing solution is an alkaline aqueous solution containing a small amount of an organic solvent such as benzyl alcohol, 2-phenoxyethanol, and 2-butoxyethanol. For example, U.S. Pat. No. 3,475,171.
And those described in No. 3,615,480.
更に、特開昭50−26601号、特公昭56−39464号、同56−
42860号の各公報に記載されている現像液も上記感光性
印刷版の現像液として優れている。Furthermore, JP-A-50-26601, JP-B-56-39464 and JP-A-56-39464
The developers described in the respective publications of 42860 are also excellent as developers for the above-mentioned photosensitive printing plate.
以下実施例をもって本発明を説明するが本発明はこれに
限定されるものではない。The present invention is described below with reference to examples, but the present invention is not limited thereto.
実施例1 特開昭56−28893号公報に開示された方法により基板を
得た。すなわち、厚さ0.30mmのアルミニウム板をナイロ
ンブラシと400メッシュのパミストンの水懸濁液とを用
いその表面を砂目立てした後、よく水で洗浄した。10%
水酸化ナトリウムに70℃で60秒間浸漬してエッチングし
た後、流水で水洗後20%HNO3で中和洗浄し、次いで水洗
した。これをVA=12.7Vの条件下で正弦波の交番波形電
流を用いて1%硝酸水溶液中で160クローン/dm2の陽極
時電気量で電解阻面化処理を行った。その表面粗さを測
定したところ、0.6μ(Ra表示)であった。ひきつづい
て30%のH2SO4水溶液中に浸漬し50℃で2分間デスマッ
トした後、20%H2SO4水溶液中、電流密度2A/dm2におい
て厚さが2.7g/m2になるように2分間陽極酸化処理し
た。その後70℃のケイ酸ソーダ2.5%水溶液に1分間浸
漬水洗乾燥させた。Example 1 A substrate was obtained by the method disclosed in JP-A-56-28893. That is, an aluminum plate having a thickness of 0.30 mm was grained on its surface using a nylon brush and an aqueous suspension of 400 mesh pumice, and then washed thoroughly with water. Ten%
It was immersed in sodium hydroxide at 70 ° C. for 60 seconds for etching, washed with running water, neutralized with 20% HNO 3 and then washed with water. This was subjected to electrolytic surface-blocking treatment in an aqueous 1% nitric acid solution under the condition of V A = 12.7 V in an aqueous 1% nitric acid solution at an anode charge of 160 clones / dm 2 . When the surface roughness was measured, it was 0.6 μ ( Ra display). Next, after soaking in 30% H 2 SO 4 aqueous solution and desmutting at 50 ° C for 2 minutes, the thickness becomes 2.7 g / m 2 in 20% H 2 SO 4 aqueous solution at current density 2 A / dm 2 . Then, it was anodized for 2 minutes. Then, it was immersed in a 2.5% aqueous solution of sodium silicate at 70 ° C. for 1 minute, washed with water and dried.
このように処理されたアルミニウム板上に、下記組成の
光重合性組成物からなる感光液を乾燥塗布重量が2g/m2
となるように塗布し、100℃で2分間乾燥させ感光性プ
レートを得た。尚、使用した光重合開始剤及びその感光
液中の使用量はそれぞれ第1表に示す。On the aluminum plate thus treated, a dry coating weight of 2 g / m 2 of a photosensitive solution comprising a photopolymerizable composition having the following composition was applied.
To obtain a photosensitive plate. The photopolymerization initiator used and the amount used in the photosensitive solution are shown in Table 1.
・トリメチロールプロパントリアクリレート 1 g ・アリルメタクリレート/メタクリル酸の共重合体(共
重合モル比85/15) 5 g ・光重合開始剤(第1表に表示) X g ・有機硼素化合物(第1表に表示) Y g ・p−ジアゾジフェニルアミンとホルムアルデヒドの縮
合物のドデシルベンゼンスルホン酸塩 0.3 g ・ビクトリアピュアブル−BOHのナフタレンセルホン酸
塩 0.2 g ・ベヘン酸 0.1 g ・ベヘン酸アミド 0.1 g ・F−177(大日本インキ(株)製、フッ素系界面活性
剤) 0.05g ・エチレングリコールモノメチルエーテル 50g ・メタノール 15g ・メチルエチルケトン 30g ・純水 5g こうして得られた感光性平板印刷板の感光層上に富士写
真フィルム(株)製の富士PSステップガイド(ΔD=0.
15で不連続に透過濃度が変化するグレースケール)を密
着させ、米国ヌアーク社製プリンターFT26V2UPNS(光
源:2KWメタルハライドランプ)で距離1mから100カウン
ト行なった。このときサンプルの酸素の影響を比較する
ために、プリンターの焼枠の真空度を調整した。-Trimethylolpropane triacrylate 1 g-Copolymer of allyl methacrylate / methacrylic acid (copolymerization molar ratio 85/15) 5 g-Photoinitiator (shown in Table 1) X g-Organic boron compound (first (Shown in the table) Y g ・ Dodecylbenzene sulfonate of condensate of p-diazodiphenylamine and formaldehyde 0.3 g ・ Victoria Pure-BOH naphthalene sulfonate 0.2 g ・ Behenic acid 0.1 g ・ Behenamide 0.1 g ・ F -177 (Dainippon Ink and Co., Ltd., fluorinated surfactant) 0.05 g-Ethylene glycol monomethyl ether 50 g-Methanol 15 g-Methyl ethyl ketone 30 g-Pure water 5 g Fuji was placed on the photosensitive layer of the photosensitive lithographic printing plate thus obtained. Fuji PS Step Guide (ΔD = 0.
A gray scale whose transmission density changes discontinuously at 15) was brought into close contact, and 100 counts were performed from a distance of 1 m using a printer FT26V2UPNS (light source: 2KW metal halide lamp) manufactured by Nuark, USA. At this time, in order to compare the effect of oxygen of the sample, the degree of vacuum of the printer frame was adjusted.
次に下記組成の現像液: ・亜硫酸ナトリウム 3g ・ベンジルアルコール 30g ・トリエタノールアミン 20g ・モノエタノールアミン 5g ・ペレックスNBL(t−ブチルナフタレンスルホン酸ナ
トリウム、花王アトラス(株)製) 30g ・水 1000g で処理し未露光部を除去した。Next, a developer having the following composition: -sodium sulfite 3g-benzyl alcohol 30g-triethanolamine 20g-monoethanolamine 5g-Perex NBL (sodium t-butylnaphthalenesulfonate, manufactured by Kao Atlas Co., Ltd.) 30g-water 1000g It was processed to remove the unexposed part.
光重合開始剤と有機硼素化合物の組み合せを変え、露光
機の真空度0 Torrと真空度600 Torrにおいて感度を測定
しその結果を第1表に示す。The sensitivity was measured at different vacuum levels of 0 Torr and 600 Torr of the exposure machine by changing the combination of the photopolymerization initiator and the organic boron compound, and the results are shown in Table 1.
表1の本発明品に示すように特定の光重合開始剤と有機
硼素化合物を組合せると単独より高感度になりかつ酸素
の影響が受けにくくなっていることがわかった。 As shown in the products of the present invention in Table 1, it was found that when a specific photopolymerization initiator and an organic boron compound were combined, the sensitivity was higher than that of a single compound and the influence of oxygen was less likely to occur.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−19737(JP,A) 特開 昭59−95534(JP,A) 特開 昭59−107350(JP,A) 特開 昭62−143043(JP,A) 特開 昭60−60104(JP,A) 特開 昭58−29803(JP,A) 特開 昭54−151024(JP,A) ─────────────────────────────────────────────────── --Continued from the front page (56) Reference JP-A-57-19737 (JP, A) JP-A-59-95534 (JP, A) JP-A-59-107350 (JP, A) JP-A 62- 143043 (JP, A) JP 60-60104 (JP, A) JP 58-29803 (JP, A) JP 54-151024 (JP, A)
Claims (2)
1個のエチレン性不飽和基を有する単量体、一般式
(I)の光重合開始剤: 〔式中Rは、アリール基又はCH=CHnW(ただしWは
アリール基又は複素環基であり、nは1〜3の整数を示
す)である。〕及び、 一般式(II): 〔式中、R1、R2、R3およびR4は同じでも異なっていても
よく、アルキル基、アリール基又は置換アリール基であ
る。ただしR1、R2、R3およびR4のうち少なくとも1つ
は、アルキル基である。X+はアルカリ金属又は で示されるアンモニウムである。 ここで、R5、R6、R7及びR8は同じであっても異なってい
てもよく水素、アルキル基、アリール基、アラルキル
基、アルカリール基、アルケニル基、アルキニル基、ア
リサイクリック基及びアリル基から選ばれる基であ
る。〕で表わされる有機硼素化合物を含有することを特
徴とする光重合性組成物。1. A monomer having at least one ethylenically unsaturated group photopolymerizable by actinic rays, a photopolymerization initiator of the general formula (I): Wherein R is an aryl group or a CH = CH n W (but W is an aryl group or a heterocyclic group, n represents an integer of 1 to 3) is. ] And the general formula (II): [In the formula, R 1 , R 2 , R 3 and R 4 may be the same or different and each is an alkyl group, an aryl group or a substituted aryl group. However, at least one of R 1 , R 2 , R 3 and R 4 is an alkyl group. X + is an alkali metal or Is ammonium represented by. Here, R 5 , R 6 , R 7 and R 8 may be the same or different, hydrogen, an alkyl group, an aryl group, an aralkyl group, an alkaryl group, an alkenyl group, an alkynyl group and an alicyclic group. And an allyl group. ] The photopolymerizable composition characterized by containing the organic boron compound represented by these.
の範囲第(1)項記載の光重合性組成物。2. The photopolymerizable composition according to claim 1, which contains a linear organic polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19244187A JPH0774906B2 (en) | 1987-07-31 | 1987-07-31 | Photopolymerizable composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19244187A JPH0774906B2 (en) | 1987-07-31 | 1987-07-31 | Photopolymerizable composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6435548A JPS6435548A (en) | 1989-02-06 |
| JPH0774906B2 true JPH0774906B2 (en) | 1995-08-09 |
Family
ID=16291357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19244187A Expired - Lifetime JPH0774906B2 (en) | 1987-07-31 | 1987-07-31 | Photopolymerizable composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0774906B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH087437B2 (en) * | 1988-08-19 | 1996-01-29 | 富士写真フイルム株式会社 | Photopolymerizable composition |
| US5153100A (en) * | 1990-08-27 | 1992-10-06 | E. I. Du Pont De Nemours And Company | Borate coinitiators for photopolymerizable compositions |
| JP2769589B2 (en) * | 1992-06-03 | 1998-06-25 | 日本合成化学工業株式会社 | Photosensitive resin composition |
| US6033829A (en) * | 1997-06-30 | 2000-03-07 | Showa Denko K.K. | Photopolymerizable composition and dry film resist |
| JP2005300908A (en) | 2004-04-12 | 2005-10-27 | Konica Minolta Medical & Graphic Inc | Photosensitive composition and photosensitive lithographic printing plate material |
-
1987
- 1987-07-31 JP JP19244187A patent/JPH0774906B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6435548A (en) | 1989-02-06 |
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