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JPH077503B2 - Magnetic recording medium and manufacturing method thereof - Google Patents
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JPH077503B2 - Magnetic recording medium and manufacturing method thereof - Google Patents

Magnetic recording medium and manufacturing method thereof

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Publication number
JPH077503B2
JPH077503B2 JP60236415A JP23641585A JPH077503B2 JP H077503 B2 JPH077503 B2 JP H077503B2 JP 60236415 A JP60236415 A JP 60236415A JP 23641585 A JP23641585 A JP 23641585A JP H077503 B2 JPH077503 B2 JP H077503B2
Authority
JP
Japan
Prior art keywords
thin film
magnetic
recording medium
magnetic recording
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60236415A
Other languages
Japanese (ja)
Other versions
JPS6297127A (en
Inventor
城一朗 江崎
治幸 森田
泰史 宇野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP60236415A priority Critical patent/JPH077503B2/en
Publication of JPS6297127A publication Critical patent/JPS6297127A/en
Publication of JPH077503B2 publication Critical patent/JPH077503B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、非磁性支持体上に磁性薄膜を設けてなる磁気
記録媒体に関し、特に耐摩耗性に優れた高信頼性の磁気
記録媒体に関する。
TECHNICAL FIELD The present invention relates to a magnetic recording medium having a magnetic thin film provided on a non-magnetic support, and more particularly to a highly reliable magnetic recording medium having excellent wear resistance. .

〔従来の技術〕[Conventional technology]

磁気記録装置の大容量化に伴い、それに使用される磁気
記録媒体には増々高記録密度特性と高信頼性が要求され
ている。γ−Fe2O3等の磁性粉を樹脂バインダーに分散
させたものを非磁性支持体上に塗布してなる塗布型磁気
記録媒体が従来一般的に使用されてきたが、近年の高記
録密度化に対応して、蒸着法、めつき法、スパツタ法等
によつて磁性薄膜を非磁性基体上に形成した薄膜型磁気
記録媒体が注目されている。
With the increase in capacity of magnetic recording devices, magnetic recording media used therein are required to have higher recording density characteristics and higher reliability. A coating type magnetic recording medium prepared by coating a non-magnetic support with magnetic powder such as γ-Fe 2 O 3 dispersed in a resin binder has been generally used in the past, but in recent years, high recording density has been achieved. In response to this trend, a thin film magnetic recording medium in which a magnetic thin film is formed on a non-magnetic substrate by a vapor deposition method, a plating method, a sputtering method or the like has been receiving attention.

この薄膜型磁気記録媒体では、磁性層を薄膜化すること
が可能であり、また磁性層中に非磁性である樹脂バイン
ダーを含まないため高磁束密度化が可能となり、その結
果高記録密度が可能となる。しかし、この種の磁気記録
媒体においては、磁気記録媒体と磁気ヘッドとの摺動接
触により磁性層が破壊されるという問題が塗布型磁気記
録媒体に比べて生じ易く、磁気ヘッドの摺動接触に対し
て充分な耐摩耗性を持たせるために磁性層表面に処理を
施すことが重要な課題となつている。例えば、磁気デイ
スク装置においては磁気デイスク媒体の回転開始時と停
止時に磁気ヘッドと媒体が摺動接触する、いわゆるコン
タクト・スタート・ストップ(以下CSSと記す)方式が
採用されるようになつており、これに耐えるに充分な耐
摩耗性が要求されるようになつている。
In this thin film magnetic recording medium, the magnetic layer can be made thin, and since the magnetic layer does not contain a non-magnetic resin binder, high magnetic flux density can be achieved, resulting in high recording density. Becomes However, in this type of magnetic recording medium, the problem that the magnetic layer is destroyed due to the sliding contact between the magnetic recording medium and the magnetic head is more likely to occur than in the coating type magnetic recording medium, and the sliding contact of the magnetic head may occur. On the other hand, it is important to treat the surface of the magnetic layer in order to provide sufficient wear resistance. For example, in a magnetic disk device, a so-called contact start stop (hereinafter referred to as CSS) method in which a magnetic head and a medium are in sliding contact at the time of starting and stopping the rotation of a magnetic disk medium has been adopted. Sufficient wear resistance is required to withstand this.

このような磁気記録媒体の耐摩耗性を確保するため、従
来、Al2O3、SiO2、TiO2、Si3N4、WC、TiC、SiC、B4C等
の硬度の高い物質で成る保護膜を磁性層の上に形成する
方法が提案されている。(特公昭55-39047、特開昭53-2
1901、特開昭53-21902、特開昭58-185029、特開昭59-18
8835) 〔従来技術の問題点〕 上述した保護膜は、通常、磁気薄膜上にスパツタ法によ
り形成される。しかしこれらの保護膜は、磁性薄膜との
密着性が充分でない場合が多く、磁気ヘツドとの摺動接
触により保護膜が剥離し、この剥離したものが磁気ヘツ
ドと保護膜の間にはさまり、保護膜の他の部分を削りと
り、更には磁性薄膜をも破壊してしまうということが生
じた。
In order to secure the wear resistance of such a magnetic recording medium, conventionally, it is made of a material having a high hardness such as Al 2 O 3 , SiO 2 , TiO 2 , Si 3 N 4 , WC, TiC, SiC and B 4 C. A method of forming a protective film on a magnetic layer has been proposed. (JP-B-55-39047, JP-A-53-2
1901, JP53-21902, JP58-185029, JP59-18
8835) [Problems of Prior Art] The above-mentioned protective film is usually formed on the magnetic thin film by a sputtering method. However, these protective films often do not have sufficient adhesion to the magnetic thin film, and the protective film is peeled off due to sliding contact with the magnetic head, and the peeled substance is sandwiched between the magnetic head and the protective film to protect it. The other part of the film was scraped off and the magnetic thin film was destroyed.

また、磁性薄膜がγ−Fe2O3を主成分とする薄膜であ
り、この薄膜上にスパツタ法により保護膜を形成しよう
とする場合、一旦α−Fe2O3またはFe3O4を主成分とする
膜をスパツタ法により形成し、これをスパツタ室より取
出して雰囲気炉中に配置し、還元、酸化等の熱処理を行
なつてγ−Fe2O3を主成分とする薄膜とし、更に再度、
これをスパツタ室に配置し保護膜をスパツタ形成する方
法がとられる。しかしこの方法はスパツタ室より出した
り、入れたりしなければならず工程が複雑となり、量産
上の問題となる。
In addition, when the magnetic thin film is a thin film containing γ-Fe 2 O 3 as a main component, and a protective film is to be formed on this thin film by the sputtering method, α-Fe 2 O 3 or Fe 3 O 4 is mainly used. A film as a component is formed by the spatter method, is taken out from the spatter chamber and placed in an atmosphere furnace, and is subjected to heat treatment such as reduction and oxidation to form a thin film containing γ-Fe 2 O 3 as the main component. again,
A method of arranging this in a spatter chamber and forming a spatter on the protective film is adopted. However, this method complicates the process because it has to be taken in and out of the sputter chamber, which is a problem in mass production.

〔発明の目的〕[Object of the Invention]

本発明の目的は、磁性薄膜上に保護膜が密着性よく形成
され、それにより優れた耐摩耗性を持ち、高信頼性の磁
気記録媒体を提供することである。
An object of the present invention is to provide a highly reliable magnetic recording medium in which a protective film is formed on a magnetic thin film with good adhesiveness, thereby having excellent wear resistance.

また、他の目的は、磁性酸化物化よりなる薄膜上に簡便
なる方法で酸化物よりなる保護膜を密着性よく形成し
た、優れた耐摩耗性を持ち、高信頼性の磁気記録媒体を
提供することである。
Another object is to provide a highly reliable magnetic recording medium having excellent wear resistance, in which a protective film made of an oxide is formed on a thin film made of a magnetic oxide by a simple method with good adhesion. That is.

〔発明の構成〕[Structure of Invention]

本発明の磁気記録媒体は、非磁性支持体の上に磁性薄膜
を形成し、さらにその上に耐摩耗性保護膜を形成して成
り、前記磁性薄膜と耐摩耗性保護膜との間にこれら両膜
の固溶した領域を形成したことを特徴とする。この磁気
記録媒体によれば、固溶領域の形成により磁性薄膜と保
護膜との間の結合力及び密着性が格段に高まり、後述の
CSS(コンタクト・スタート・ストップ)試験から分る
ように耐摩耗性が増大して保護膜の剥離が無くなり、高
信頼性で寿命の長い磁気記録媒体が提供できる。
The magnetic recording medium of the present invention is formed by forming a magnetic thin film on a non-magnetic support, and further forming an abrasion-resistant protective film on the magnetic thin film, and between the magnetic thin film and the abrasion-resistant protective film. It is characterized in that a solid solution region of both films is formed. According to this magnetic recording medium, the solid solution region is formed, so that the bonding force and the adhesiveness between the magnetic thin film and the protective film are significantly increased.
As can be seen from the CSS (contact start stop) test, abrasion resistance increases and peeling of the protective film is eliminated, and a highly reliable magnetic recording medium with a long life can be provided.

本発明の磁気記録媒体の製造方法は、非磁性支持体の上
に目的とする磁性薄膜、その前駆磁性薄膜または前駆物
質の薄膜を形成し、その上に耐摩耗性膜またはその前駆
物質の薄膜を形成し、所定の温度で熱処理することによ
り、上記の膜をそれぞれ目的とする磁性薄膜及び耐摩耗
性保護膜にすると共に、これらの膜の間に拡散を生じさ
せて両者の界面に固溶領域を形成することより成る。
The method for producing a magnetic recording medium of the present invention comprises forming a target magnetic thin film, a precursor magnetic thin film thereof or a precursor thin film on a non-magnetic support, and an abrasion resistant film or a precursor thin film thereof thereon. Is formed and heat-treated at a predetermined temperature to form the above-mentioned films as the target magnetic thin film and wear-resistant protective film, respectively, and cause diffusion between these films to form a solid solution at the interface between them. Forming a region.

この方法によれば、熱処理により磁性薄膜と保護膜の間
に拡散が生じ、両者の密着性を高めることにより、上記
のすぐれた磁気記録媒体を提供することができる。ま
た、本発明の方法によると、目的とする磁性薄膜、その
前駆磁性薄膜または前駆物質薄膜と保護膜またはその前
駆物質膜とは、順次成膜した上熱処理すれば良いから、
例えばスパツタ法等の真空成膜を行う際に、従来の方法
のように磁性薄膜の前駆酸化物膜をスパツタ成膜し、真
空リークをして熱処理炉に移し、所定の磁性薄膜を形成
した後、再びスパツタ装置へ装入して保護膜をスパツタ
成膜を行うという面倒な手順が簡略化する。すなわち、
本発明の方法ではスパツタ成膜は真空リークしないで引
続いて行い、次いで熱処理炉で処理すれば良く能率が良
い。それにも拘らず、上記のように本発明の方法で得ら
れる磁気記録媒体の特性は従来のものよりも優れてい
る。
According to this method, diffusion occurs between the magnetic thin film and the protective film due to the heat treatment, and the adhesiveness between the two is enhanced, so that the excellent magnetic recording medium described above can be provided. Further, according to the method of the present invention, the target magnetic thin film, its precursor magnetic thin film or precursor thin film and the protective film or its precursor film may be sequentially formed and heat-treated,
For example, when performing vacuum deposition such as the sputtering method, the precursor oxide film of the magnetic thin film is deposited as in the conventional method, vacuum leak is performed, and the film is transferred to a heat treatment furnace to form a predetermined magnetic thin film. The troublesome procedure of loading the protective film into the sputtering device again and depositing the protective film is simplified. That is,
According to the method of the present invention, the sputtering film formation can be carried out successively without vacuum leak, and then in a heat treatment furnace, which is efficient. Nevertheless, the characteristics of the magnetic recording medium obtained by the method of the present invention as described above are superior to those of the conventional one.

本発明が意図した密着性及び耐摩耗性を十分向上させる
には、固溶領域の厚さを100Å以上、好ましくは200Å以
上にする。これにより耐CSS特性が十分に向上する。固
溶領域の厚さは熱処理温度及び時間により制御される。
熱処理の温度が高い程、また熱処理の時間が長い程固溶
した領域の厚さは大きくなる。通常熱処理の温度は100
℃以上で行われる。これ以下だと、所定厚の固溶した領
域を形成するのに時間がかかり過ぎる。
In order to sufficiently improve the adhesion and wear resistance intended by the present invention, the thickness of the solid solution region is 100 Å or more, preferably 200 Å or more. As a result, the CSS resistance is sufficiently improved. The thickness of the solid solution region is controlled by the heat treatment temperature and time.
The higher the heat treatment temperature and the longer the heat treatment time, the greater the thickness of the solid solution region. Normal heat treatment temperature is 100
It is performed above ℃. If it is less than this, it takes too much time to form a solid solution region having a predetermined thickness.

磁性薄膜を形成する磁性酸化物の代表的な例はγ−Fe2O
3またはこれを主体とする酸化物である。このような薄
膜は、例えばα−Fe2O3薄膜をスパツタ法により形成
し、これを還元性雰囲気の炉中で還元してFe3O4薄膜と
し、更に酸化性雰囲気の炉中で酸化してγ−Fe2O3薄膜
とすることにより行なわれる。また他の方法は、Fe3O4
薄膜をスパツタ法により形成し、これを酸化性雰囲気の
炉中で酸化してγ−Fe2O3薄膜とすることにより行なわ
れる。また、他の例では磁性薄膜としてはCo、Co−P、
Co-Ni、Co-Cr、Co-Ni−P等の金属を用いることができ
る。
A typical example of a magnetic oxide forming a magnetic thin film is γ-Fe 2 O.
3 or an oxide mainly containing this. Such a thin film is formed by, for example, forming an α-Fe 2 O 3 thin film by a sputtering method, reducing the Fe 3 O 4 thin film in a furnace in a reducing atmosphere, and further oxidizing it in a furnace in an oxidizing atmosphere. By forming a γ-Fe 2 O 3 thin film. Another method is Fe 3 O 4
The thin film is formed by the sputtering method and is oxidized in a furnace in an oxidizing atmosphere to form a γ-Fe 2 O 3 thin film. In another example, the magnetic thin film is Co, Co-P,
Metals such as Co-Ni, Co-Cr, and Co-Ni-P can be used.

本発明の1つの態様における上記のγ−Fe2O3薄膜への
変換は、α−Fe2O3やFe3O4薄膜の表面に保護膜またはそ
の前駆物質の薄膜を形成した後に行われる。熱処理によ
つてα−Fe2O3やFe3O4がγ−Fe2O3磁性薄膜に変換する
間に、保護膜またはその前駆物質が保護膜に変換し、し
かも両膜の間に両者の固溶層が形成されることになる。
The conversion into the γ-Fe 2 O 3 thin film in one embodiment of the present invention is performed after forming a protective film or a precursor thin film thereof on the surface of the α-Fe 2 O 3 or Fe 3 O 4 thin film. . During the conversion of α-Fe 2 O 3 or Fe 3 O 4 into the γ-Fe 2 O 3 magnetic thin film by heat treatment, the protective film or its precursor is converted into the protective film, and both films are Will form a solid solution layer.

保護膜またはその前駆物質としては、Al2O3、TiO2、SiO
2、Al、Ti、Si等が使用でき、これらが熱処理の間にAl2
O3、TiO2、SiO2等の耐摩耗性保護膜に変換される。保護
膜は十分に耐摩耗性であるだけでなく磁性薄膜との間で
拡散による固溶領域を形成しうるものでなければならな
い。
As the protective film or its precursor, Al 2 O 3 , TiO 2 , SiO
2 , Al, Ti, Si, etc. can be used, and these are Al 2
It is converted to a wear-resistant protective film such as O 3 , TiO 2 , and SiO 2 . The protective film must be not only sufficiently wear-resistant, but also capable of forming a solid solution region by diffusion with the magnetic thin film.

本発明の方法は、代表的にはスパツタ法により実行でき
る。本発明では同じ真空チヤンバ内にFe、α−Fe2O3、F
e3O4等のターゲツトと、Al、Al2O3等のターゲツトを設
置し、これらを非磁性支持体上にスパツタさせて成膜す
る。次いで、熱処理炉中で還元や酸化を行つて各層を所
定の磁性薄膜及び耐摩耗性酸化物に変化させ、またそれ
らの界面を固溶領域にする。この方法が、従来の方法に
比してすぐれていることは先きに述べた通りである。大
3図はこの点を示す。同図(a)は本発明の方法を、
(b)は従来法を示す。図のように従来法のうち2重枠
で示した工程は本発明の方法よりも多い。このように本
発明では工程が簡略化されるため、磁気記録体の製造時
間が短縮される。
The method of the present invention can typically be carried out by the sputter method. In the present invention, Fe, α-Fe 2 O 3 , and F are contained in the same vacuum chamber.
A target such as e 3 O 4 and a target such as Al or Al 2 O 3 are provided, and these are sputtered on a non-magnetic support to form a film. Then, reduction or oxidation is performed in a heat treatment furnace to change each layer into a predetermined magnetic thin film and wear-resistant oxide, and the interface between them is made into a solid solution region. As described above, this method is superior to the conventional method. Large three figures show this point. FIG. 3A shows the method of the present invention,
(B) shows a conventional method. As shown in the figure, the number of steps indicated by double frames in the conventional method is larger than that in the method of the present invention. As described above, according to the present invention, the process is simplified, so that the manufacturing time of the magnetic recording body is shortened.

磁性薄膜としては前駆物質を用いないでCo、Cr、Co−
P、Co-Ni−P、Co-Ni、Co-Cr等の磁性金属薄膜を用い
ることができる。この場合には磁性薄膜とAl2O3等の保
護用の薄膜を相ついでスパツタ形成し、次いで熱処理炉
に入れて非酸化性雰囲気中で加熱処理を行う。これによ
り保護膜と磁性金属との間に固溶領域を形成することが
できる。
Co, Cr, Co-
Magnetic metal thin films such as P, Co-Ni-P, Co-Ni, and Co-Cr can be used. In this case, a magnetic thin film and a protective thin film such as Al 2 O 3 are sputtered to form a spatter, which is then placed in a heat treatment furnace for heat treatment in a non-oxidizing atmosphere. As a result, a solid solution region can be formed between the protective film and the magnetic metal.

なお、固溶した領域の厚みは、ESCA分析、オージエ分
析、RBS分析等によつて測定できる。例えば、オージエ
分析では保護膜と磁性薄膜を構成する原子について厚み
方向でプロフイールを観察することにより行なわれる。
Co-Ni薄膜上にAl2O3保護膜を形成した場合の例を第1図
に示す。AlとCoの分布が重なつた部分の半値幅dを固溶
した領域と考えることができるが、固溶した領域が無い
場合でもオージエ分析装置の分解能のためにdはゼロで
はなく20〜100Å(各装置によつて異なる)の値を持
つ。従つて実際の固溶した領域の厚さはdからこの値を
引いた値、すなわち、本発明者らが使用しているオージ
エ分析装置では固溶した領域が無い場合の半値幅が約60
Åであるので実際の固溶した領域の厚さはd−60で定義
する。
The thickness of the solid solution region can be measured by ESCA analysis, Auger analysis, RBS analysis, or the like. For example, the Auger analysis is performed by observing the profile in the thickness direction of the atoms forming the protective film and the magnetic thin film.
An example of forming an Al 2 O 3 protective film on a Co-Ni thin film is shown in FIG. The full width at half maximum d of the overlapping Al and Co distribution can be considered as the solid solution region, but even if there is no solid solution region, d is not zero but 20 to 100 Å because of the resolution of the Auzier analyzer. It has a value (different for each device). Therefore, the actual thickness of the solid-dissolved region is the value obtained by subtracting this value from d, that is, the half-width when there is no solid-solved region in the Aussie analyzer used by the present inventors is about 60.
Since it is Å, the actual thickness of the solid solution region is defined by d-60.

〔実施例1〕 基板としてアルミ合金上に50μmのNi−Pめつき層を形
成し、この表面を研磨したものを用いた。形状は外径13
0mm、内径40mm、厚さ1.9mmのデイスク円板状である。
[Example 1] As a substrate, a 50 µm Ni-P plating layer was formed on an aluminum alloy and the surface was polished. The outer diameter is 13
It is a disk with a diameter of 0 mm, an inner diameter of 40 mm, and a thickness of 1.9 mm.

この基板上にCr薄膜をスパツタ法により3000Å形成し、
この上にCo-20wt%Ni薄膜をスパツタ法により500Å形成
した。更にAl2O3の保護膜を300Å形成した。これを窒素
雰囲気中、各温度で1時間熱処理して磁気デイスクを完
成させた。
A Cr thin film is formed on this substrate by a sputtering method with 3000 Å,
A Co-20 wt% Ni thin film was formed on this by 500 Å by the sputtering method. Further, a 300 Å protective film of Al 2 O 3 was formed. This was heat-treated in a nitrogen atmosphere at each temperature for 1 hour to complete a magnetic disk.

完成した磁気デイスクについて、オージエ分析により固
溶した領域の厚さ(d−60)の測定、およびCSS試験を
行ない結果を表1に示す。CSS試験は次のようにして行
なつた。
Table 1 shows the measurement results of the thickness (d-60) of the solid solution region and the CSS test of the completed magnetic disk by Auger analysis. The CSS test was done as follows.

CSS試験 ウインチエスタータイプのMn-Znフエライトヘツド(荷
重9.5g)を使用してCSS試験を行なつた。CSSは第2図に
示したサイクルの繰返しにより行なつた。CSS回数は、
記録再生出力が初期の半分以下になるまでの回数で、最
大40,000回まで行なつた。
CSS test A CSS test was performed using a winch ester type Mn-Zn ferrite head (load: 9.5 g). CSS was performed by repeating the cycle shown in FIG. CSS times,
The number of times until the recording / reproducing output became less than half of the initial value was performed up to 40,000 times.

表1の結果を見ると、固溶した領域を形成することによ
りCSS特性が改善され、固溶した領域の厚さを100Å以上
にすると格段に改善され、200Å以上にすると更に良く
なることがわかる。
Looking at the results in Table 1, it can be seen that the CSS characteristics are improved by forming the solid solution region, it is markedly improved when the thickness of the solid solution region is 100 Å or more, and it is further improved when it is 200 Å or more. .

〔実施例2〕 基板として陽極酸化によりアルマイト層を2μm形成し
たアルミ合金基板を使用した。形状は外径130mm、内径4
0mm、厚さ1.9mmのデイスク円板状である。この基板上に
鉄をターゲツトとし、Ar+O2雰囲気(混合比50%、真空
度5×10-3Torr)でスパツタすることによりα−Fe2O3
膜を2000Å形成した。更にこの上にAl2O3保護膜をスパ
ツタ法により形成した。
Example 2 An aluminum alloy substrate having an alumite layer of 2 μm formed by anodic oxidation was used as the substrate. Shape is outer diameter 130 mm, inner diameter 4
It has a disk shape of 0 mm and a thickness of 1.9 mm. By using iron as a target on this substrate and sputtering in an Ar + O 2 atmosphere (mixing ratio 50%, vacuum degree 5 × 10 -3 Torr), α-Fe 2 O 3
A film of 2000 Å was formed. Further, an Al 2 O 3 protective film was formed thereon by the sputtering method.

次に水素雰囲気炉中で2時間還元しα−Fe2O3膜をFe3O4
膜とした。このときAl2O3膜も一部還元されてAlを含ん
だ膜となる。還元の温度については表2に示す。更に空
気中で310℃、1時間酸化してFe3O4膜をγ−Fe2O3膜と
し、保護膜はAl2O3膜とした。
Next, the α-Fe 2 O 3 film was reduced in a hydrogen atmosphere furnace for 2 hours to form an Fe 3 O 4 film.
It was a film. At this time, the Al 2 O 3 film is also partially reduced and becomes a film containing Al. The reduction temperature is shown in Table 2. Further, it was oxidized in air at 310 ° C. for 1 hour to form the Fe 3 O 4 film as a γ-Fe 2 O 3 film and the protective film as an Al 2 O 3 film.

以上の工程をフローチヤートにしてまとめると第3図
(a)のようになる。これに対して従来の方法では第3
図(b)のようになり、二重の四角で囲んだ工程が本発
明では省略され磁気記録媒体の製造時間が短縮されるこ
とがわかる。
The above steps are summarized as a flow chart as shown in FIG. On the other hand, in the conventional method, the third method is used.
As shown in FIG. 6B, it can be seen that the process surrounded by double squares is omitted in the present invention, and the manufacturing time of the magnetic recording medium is shortened.

完成した磁気デイスクについてオージエ分析により固溶
した領域の厚さ(d−60)の測定、およびCSS試験を行
ない、結果を表2に示す。一方、従来の方法(第3図
(b))で形成した磁気デイスクについても同様の試験
を行なつたところd−60=0、CSS=14,000回であつ
た。これに対して本発明の優位性は表2より明らかであ
る。
The thickness (d-60) of the solid solution region of the completed magnetic disk was measured by Auger analysis, and the CSS test was conducted. The results are shown in Table 2. On the other hand, when the same test was performed on the magnetic disk formed by the conventional method (FIG. 3 (b)), d-60 = 0 and CSS = 14,000 times. On the other hand, the superiority of the present invention is clear from Table 2.

【図面の簡単な説明】[Brief description of drawings]

第1図は固溶した領域の厚さを測定する方法を示す図、
第2図はCSS試験の方法を示す図、及び第3図は実施例
2の方法と従来法の工程比較図である。
FIG. 1 is a diagram showing a method for measuring the thickness of a solid solution region,
FIG. 2 is a diagram showing a CSS test method, and FIG. 3 is a process comparison diagram of the method of Example 2 and the conventional method.

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】非磁性支持体上に磁性薄膜を形成し更に保
護膜を形成してなる磁気記録媒体において、磁性薄膜と
保護膜の間に磁性薄膜と保護膜が固溶した領域が存在す
ることを特徴とする磁気記録媒体。
1. A magnetic recording medium comprising a magnetic thin film formed on a non-magnetic support and a protective film formed on the non-magnetic support, and a region where the magnetic thin film and the protective film are solid-solved exists between the magnetic thin film and the protective film. A magnetic recording medium characterized by the above.
【請求項2】固溶した領域の厚さが100Å以上であるこ
とを特徴とする特許請求の範囲第1項記載の磁気記録媒
体。
2. The magnetic recording medium according to claim 1, wherein the thickness of the solid solution region is 100 Å or more.
【請求項3】固溶した領域が200Å以上であることを特
徴とする特許請求の範囲第1項記載の磁気記録媒体。
3. The magnetic recording medium according to claim 1, wherein the solid solution area is 200 liters or more.
【請求項4】保護膜がAl2O3、TiO2およびSiO2の少なく
とも1つを主成分とすることを特徴とする特許請求の範
囲第1項、第2項および第3項のいずれかに記載の磁気
記録媒体。
4. A protective film is Al 2 O 3, TiO 2 and claims the first term of which is characterized in that a main component at least one of SiO 2, any one of the second and third terms The magnetic recording medium according to 1.
【請求項5】非磁性支持体上に磁性薄膜(B)、その前
駆磁性薄膜(A)、または磁性薄膜(B)の前駆物質よ
りなる第1の薄膜を形成し、この第1の薄膜上に耐摩耗
性酸化物またはその前駆物質よりなる第2の薄膜を形成
し、熱処理を施すことにより第1の薄膜を前記磁性薄膜
(B)とし、第2の薄膜を耐摩耗性酸化物膜にすること
を特徴とする磁気記録媒体の製造方法。
5. A first thin film comprising a magnetic thin film (B), its precursor magnetic thin film (A), or a precursor of the magnetic thin film (B) is formed on a non-magnetic support, and on this first thin film. A second thin film made of wear-resistant oxide or its precursor is formed on and heat-treated to form the first thin film as the magnetic thin film (B), and the second thin film is changed to the wear-resistant oxide film. A method of manufacturing a magnetic recording medium, comprising:
【請求項6】第1の薄膜はα−Fe2O3またはFe3O4のいず
れかを主成分とする薄膜であり、第2の薄膜はAl、Al2O
3、Ti、TiO2、SiおよびSiO2よりなる群から選ばれた少
なくとも1つを主成分とすることを特徴とする特許請求
の範囲第5項記載の磁気記録媒体の製造方法。
6. The first thin film is a thin film containing α-Fe 2 O 3 or Fe 3 O 4 as a main component, and the second thin film is Al or Al 2 O.
6. The method for producing a magnetic recording medium according to claim 5, wherein the main component is at least one selected from the group consisting of 3 , Ti, TiO 2 , Si and SiO 2 .
【請求項7】磁性薄膜(B)はγ−Fe2O3を主成分と
し、耐摩耗性酸化物膜はAl2O3、TiO2およびSiO2の少な
くとも1つを主成分とすることを特徴とする特許請求の
範囲第5項または第6項記載の磁気記録媒体の製造方
法。
7. The magnetic thin film (B) contains γ-Fe 2 O 3 as a main component, and the wear-resistant oxide film contains at least one of Al 2 O 3 , TiO 2 and SiO 2 as a main component. The method of manufacturing a magnetic recording medium according to claim 5 or 6, characterized in that.
【請求項8】磁性薄膜(B)と耐摩耗性酸化物膜の界面
に固溶領域が存在することを特徴とする特許請求の範囲
第5項、第6項および第7項のいずれかに記載の磁気記
録媒体の製造方法。
8. A solid solution region is present at the interface between the magnetic thin film (B) and the wear resistant oxide film, according to any one of claims 5, 6 and 7. A method for manufacturing the magnetic recording medium described.
【請求項9】固溶領域の厚さが100Å以上であることを
特徴とする特許請求の範囲第8項記載の磁気記録媒体の
製造方法。
9. The method for manufacturing a magnetic recording medium according to claim 8, wherein the thickness of the solid solution region is 100 Å or more.
【請求項10】固溶領域の厚さが200Å以上であること
を特徴とする特許請求の範囲第8項記載の磁気記録媒体
の製造方法。
10. The method for producing a magnetic recording medium according to claim 8, wherein the thickness of the solid solution region is 200 Å or more.
JP60236415A 1985-10-24 1985-10-24 Magnetic recording medium and manufacturing method thereof Expired - Fee Related JPH077503B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60236415A JPH077503B2 (en) 1985-10-24 1985-10-24 Magnetic recording medium and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60236415A JPH077503B2 (en) 1985-10-24 1985-10-24 Magnetic recording medium and manufacturing method thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP34196497A Division JP2857136B2 (en) 1997-11-28 1997-11-28 Magnetic recording medium and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPS6297127A JPS6297127A (en) 1987-05-06
JPH077503B2 true JPH077503B2 (en) 1995-01-30

Family

ID=17000415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60236415A Expired - Fee Related JPH077503B2 (en) 1985-10-24 1985-10-24 Magnetic recording medium and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH077503B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58172A (en) * 1981-06-25 1983-01-05 Oki Electric Ind Co Ltd Method for manufacturing semiconductor integrated circuit device
JPS586528A (en) * 1981-07-02 1983-01-14 Nec Corp Flexible magnetic recording medium
JPS60187425A (en) * 1984-12-28 1985-09-24 Hitachi Cable Ltd Processing equipment for metal tubes with internal grooves

Also Published As

Publication number Publication date
JPS6297127A (en) 1987-05-06

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