JPH0775826B2 - Flat polishing machine with processing pressure compensation mechanism - Google Patents
Flat polishing machine with processing pressure compensation mechanismInfo
- Publication number
- JPH0775826B2 JPH0775826B2 JP61018863A JP1886386A JPH0775826B2 JP H0775826 B2 JPH0775826 B2 JP H0775826B2 JP 61018863 A JP61018863 A JP 61018863A JP 1886386 A JP1886386 A JP 1886386A JP H0775826 B2 JPH0775826 B2 JP H0775826B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- surface plate
- processing pressure
- cylinder
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、上定盤による加工圧をその摩耗に応じて補正
することのできる加工圧補正機構付き平面研磨装置に関
するものである。Description: TECHNICAL FIELD The present invention relates to a surface polishing apparatus with a working pressure correction mechanism capable of correcting the working pressure applied by an upper surface plate according to its wear.
[従来の技術] 第4図に示すように、上下の定盤1,2と太陽歯車、及び
内歯歯車4を備え、両歯車3,4で遊星歯車状に駆動され
るキャリヤ5に保持させたワーク6を上下の定盤1,2で
研磨するようにした平面研磨装置は公知である。[Prior Art] As shown in FIG. 4, upper and lower surface plates 1 and 2, a sun gear, and an internal gear 4 are provided and are held by a carrier 5 driven by both gears 3 and 4 in a planetary gear shape. A flat surface polishing apparatus is known in which the work 6 is polished by the upper and lower surface plates 1 and 2.
かかる平面研磨装置においては、上定盤1を、図示しな
い機枠に吊設されたシリンダ7で昇降自在に支持させ、
ワーク6の加工時には、このシリンダ7に供給されるエ
ア等の流体圧力によって上定盤1をワーク6に押し付け
ている。即ち、シリンダ7のロッド室7bに流体圧力を供
給し、ピストン7cに上定盤1の重量Wより僅かに大きい
作用力を常時上向きに作用させておき、その状態でヘッ
ド室7a側の流体圧力を給排することにより、上定盤1を
昇降させると共に、上記加工圧を作用させるようにして
いる。In such a flat surface polishing apparatus, the upper surface plate 1 is supported by a cylinder 7 suspended in a machine frame (not shown) so as to be lifted and lowered.
At the time of processing the work 6, the upper surface plate 1 is pressed against the work 6 by the fluid pressure such as air supplied to the cylinder 7. That is, the fluid pressure is supplied to the rod chamber 7b of the cylinder 7, and an acting force slightly larger than the weight W of the upper surface plate 1 is always applied upward to the piston 7c. By supplying / discharging, the upper surface plate 1 is moved up and down, and the working pressure is applied.
ところが、定盤1は加工により徐々に摩耗していき、そ
の重量が変化するため、上記加工圧も次第に変化し、加
工精度を低下させることになる。従って、加工精度を維
持するためには、定盤の摩耗に応じて加工圧を補正する
必要がある。特に、近年では、半導体ウエハなどの研磨
において非常に高い精度が要求されるようになってお
り、その要求に答える意味からも上記加工圧の補正は極
めて重要である。However, since the surface plate 1 gradually wears due to processing and its weight changes, the processing pressure also gradually changes, and the processing accuracy is reduced. Therefore, in order to maintain the processing accuracy, it is necessary to correct the processing pressure according to the wear of the surface plate. In particular, in recent years, extremely high precision has been required for polishing semiconductor wafers and the like, and the correction of the processing pressure is extremely important from the viewpoint of meeting the demand.
[発明が解決しようとする問題点] 本発明の課題は、上定盤の摩耗に応じて加工圧を補正す
ることのできる平面研磨装置を提供することにある。[Problems to be Solved by the Invention] An object of the present invention is to provide a surface polishing apparatus capable of correcting a processing pressure according to wear of an upper surface plate.
[問題点を解決するための手段] 上記課題を解決するため、本発明の平面研磨装置は、上
定盤をシリンダにより昇降自在に支持させ、該シリンダ
に供給される流体圧力によって上定盤による加工圧を設
定するようにした平面研磨装置に、上定盤の摩耗による
重量変化分について加工圧を補正することにより該加工
圧を設定圧に保つ加工圧補正機構を付設してなり、上記
加工圧補正機構が、上定盤の重量を測定するセンサと、
該センサによる測定値を予め入力された基準値と比較
し、それらの差に応じた制御信号を出力する制御回路
と、該制御回路からの制御信号により駆動され、上記シ
リンダに供給される流体圧力を制御する圧力制御弁とか
らなることを特徴とするものである。[Means for Solving the Problems] In order to solve the above-mentioned problems, in the surface polishing apparatus of the present invention, the upper platen is supported by a cylinder so as to be vertically movable, and the upper platen is formed by the fluid pressure supplied to the cylinder. The flattening device for setting the working pressure is additionally provided with a working pressure correction mechanism for keeping the working pressure at the set pressure by correcting the working pressure for the weight change due to the wear of the upper surface plate. A pressure correction mechanism, a sensor that measures the weight of the upper surface plate,
A control circuit that compares a measured value by the sensor with a reference value input in advance and outputs a control signal corresponding to the difference between them, and a fluid pressure that is driven by the control signal from the control circuit and is supplied to the cylinder. And a pressure control valve for controlling.
[作 用] センサにおいて上定盤の重量が測定されると、その測定
値は制御回路に入力され、ここで予め入力されている基
準値と比較される。そして、それらの差に応じた制御信
号が圧力制御弁に出力されてシリンダへ供給される流体
圧力が制御され、上定盤の摩耗分だけその加工圧が補正
される。[Operation] When the weight of the upper surface plate is measured by the sensor, the measured value is input to the control circuit and compared with the reference value input in advance here. Then, a control signal corresponding to the difference between them is output to the pressure control valve to control the fluid pressure supplied to the cylinder, and the working pressure is corrected by the wear of the upper surface plate.
[実施例] 以下、本発明の実施例を図面を参照しながら詳述する。Embodiments Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図に示す平面研磨装置は、基本的には第4図に示す
公知のものと同様の構成を有している。即ち、上下の定
盤11,12と太陽歯車13、及び内歯車14を備え、両歯車13,
14で遊星歯車状に駆動されるキャリヤ15に保持させたワ
ーク16を上下の定盤11,12で研磨するように構成してい
る。The flat-surface polishing apparatus shown in FIG. 1 has basically the same structure as the known one shown in FIG. That is, the upper and lower surface plates 11 and 12, the sun gear 13, and the internal gear 14, both gears 13,
A work 16 held by a carrier 15 driven in a planetary gear shape at 14 is configured to be polished by upper and lower surface plates 11 and 12.
上記上定盤11を昇降自在に支持するシリンダ17は、図示
しない機枠や該機枠に取付けた他のシリンダのロッドな
どに吊設されており、第2図に具体的に示すような構成
を有している。即ち、このシリンダ17は、第1及び第2
の2つのピストン18,19と、上定盤11に連結されたピス
トンロッド20とを備え、第1ピストン18はピストンロッ
ド20に固定され、第2ピストン19は、一定範囲内でピス
トンロッド20の軸線方向に移動自在に嵌着されている。
そして、該第2ピストン19における第1ピストン18との
対向面上には、上定盤11の重量を測定するためのストレ
ンゲージ等からなるセンサ21が取付けられている。この
センサ21は、流体圧力により第2ピストン19が第1ピス
トン18側へ移動した状態において該第1ピストン18に当
接し、該第1ピストン18を介して上定盤11の重量を測定
するものであり、その際、上定盤11による衝撃荷重等が
該センサ21に作用するのを防ぐため、第2ピストン19が
測定に必要な距離以上に第1ピストン18側に近づくのを
ストッパ部22により規制している。A cylinder 17 that supports the upper surface plate 11 so as to be able to move up and down is suspended from a machine frame (not shown) or a rod of another cylinder attached to the machine frame, and has a configuration specifically shown in FIG. have. That is, the cylinder 17 has the first and second
Two pistons 18 and 19 and a piston rod 20 connected to the upper surface plate 11, the first piston 18 is fixed to the piston rod 20, and the second piston 19 is fixed within a certain range. It is fitted so as to be movable in the axial direction.
A sensor 21 such as a strain gauge for measuring the weight of the upper surface plate 11 is mounted on the surface of the second piston 19 facing the first piston 18. The sensor 21 is in contact with the first piston 18 in a state where the second piston 19 moves toward the first piston 18 side due to fluid pressure, and measures the weight of the upper surface plate 11 via the first piston 18. At this time, in order to prevent the impact load or the like from the upper surface plate 11 from acting on the sensor 21, it is necessary to prevent the second piston 19 from approaching the first piston 18 side more than the distance required for measurement. It is regulated by.
上記シリンダ17のヘッド室17a側の流路24には、電気入
力信号に応じて流体圧力を制御する圧力制御弁25が設け
られ、該圧力制御弁25と上記センサ21との間に制御回路
26が接続されている。A pressure control valve 25 for controlling fluid pressure according to an electric input signal is provided in the flow path 24 of the cylinder 17 on the side of the head chamber 17a, and a control circuit is provided between the pressure control valve 25 and the sensor 21.
26 is connected.
上記制御回路26は、センサ21による測定値を予め入力さ
れている重量の基準値と比較し、それらの差に応じて上
記圧力制御弁25を制御するもので、例えば第3図に示す
ように構成することができる。即ち、この制御回路26
は、センサ21からの測定信号を一定時間保持するサンプ
ルホールド回路と、ホールドされたアナログ信号をディ
ジタル信号に変換するA/D変換器と、変換された信号を
予め入力されている基準値と比較演算し、それらの差を
求める演算回路と、演算回路からの信号をアナログ信号
に変換して出力するD/A変換器とで構成されており、こ
の制御回路26から出力される電気信号が上記圧力制御弁
25に入力され、この圧力制御弁25によってシリンダ17の
ヘッド室17aに供給される流体圧力が制御されるように
なっている。また、上記演算回路には、ブラウン管やネ
オン管などによる表示器が接続され、測定された定盤の
重量や摩耗量などが表示されるようになっている。The control circuit 26 compares the value measured by the sensor 21 with a reference value of weight inputted in advance, and controls the pressure control valve 25 according to the difference between them. For example, as shown in FIG. Can be configured. That is, this control circuit 26
Is a sample and hold circuit that holds the measurement signal from the sensor 21 for a certain period of time, an A / D converter that converts the held analog signal into a digital signal, and compares the converted signal with a pre-input reference value. Computation is performed, and an arithmetic circuit for obtaining the difference between the arithmetic circuit and the D / A converter that converts the signal from the arithmetic circuit to an analog signal and outputs the analog signal is output. Pressure control valve
The fluid pressure input to the head chamber 17a of the cylinder 17 is controlled by the pressure control valve 25. Further, a display device such as a cathode ray tube or a neon tube is connected to the arithmetic circuit so that the measured weight and wear amount of the surface plate are displayed.
上記構成を有する平面研磨装置において、ワーク16の加
工は上下の定盤11,12により公知の研磨装置と同様にし
て行われる。このとき、シリンダ17のヘッド室17a及び
ロッド室17bには、それぞれP1及びP2なる流体圧力が供
給されており、従って、上定盤11は、 F=S1P1+W−S2P2 ……(1) S1:第1ピストンの受圧面積 S2:第2ピストンの受圧面積 W:上定盤の重量 なる力でワーク16に押しつけられている。In the flat surface polishing apparatus having the above configuration, the work 16 is processed by the upper and lower surface plates 11 and 12 in the same manner as a known polishing apparatus. At this time, the fluid pressures P 1 and P 2 are supplied to the head chamber 17a and the rod chamber 17b of the cylinder 17, respectively. Therefore, the upper platen 11 is F = S 1 P 1 + W−S 2 P 2 (1) S 1 : Pressure receiving area of the first piston S 2 : Pressure receiving area of the second piston W: The pressure of the upper platen is pressed against the work 16.
加工が終了すると、ヘッド室17a内の流体圧力が排出さ
れ、上定盤11は第2ピストン19に作用するS2P2なる作用
力で上昇する。この作用力S2P2は、上定盤11の重量Wよ
り僅かに大きくなるように設定されており、従って上定
盤11は緩速で上昇することになり、この上昇時に上記セ
ンサ21により上定盤11の重量Wが測定される。When the processing is completed, the fluid pressure in the head chamber 17a is discharged, and the upper surface plate 11 is raised by the acting force of S 2 P 2 acting on the second piston 19. This acting force S 2 P 2 is set so as to be slightly larger than the weight W of the upper surface plate 11, so that the upper surface plate 11 rises at a slow speed. The weight W of the upper surface plate 11 is measured.
センサ21からの測定信号は、制御回路26に入力され、所
定の信号処理が施されるなどして予め入力されている基
準値と比較され、上定盤11の摩耗分がそれらの差として
求められる。The measurement signal from the sensor 21 is input to the control circuit 26 and compared with a reference value that is input in advance such as by performing predetermined signal processing, and the wear amount of the upper surface plate 11 is obtained as the difference between them. To be
そして、上記制御回路26からは、上記差に応じた制御信
号が圧力制御弁25に出力され、次加工時にシリンダ17の
ヘッド室17aに供給される流体圧力が増大せしめられ
る。従って、上記(1)式において、上定盤11の重量W
が減少した分流体圧力P1が増大し、加工圧Fは一定に保
持されることになる。Then, the control circuit 26 outputs a control signal corresponding to the difference to the pressure control valve 25, and the fluid pressure supplied to the head chamber 17a of the cylinder 17 at the time of the next processing is increased. Therefore, in the above formula (1), the weight W of the upper surface plate 11
There was increased and decreased correspondingly fluid pressure P 1, the processing pressure F will be kept constant.
一方、測定された定盤の重量や摩耗量などは、表示器に
表示される。On the other hand, the measured weight and wear amount of the surface plate are displayed on the display.
[発明の効果] このように本発明によれば、センサにより上定盤の重量
を測定し、その摩耗分だけシリンダへ供給される流体圧
力を調整するようにしたので、上定盤の摩耗に拘らず常
に加工圧を一定に保持することが可能になり、ワークの
加工精度を高めることができる。As described above, according to the present invention, the weight of the upper platen is measured by the sensor, and the fluid pressure supplied to the cylinder is adjusted by the amount of wear of the upper platen. Regardless of this, the processing pressure can always be kept constant, and the processing accuracy of the work can be improved.
第1図は本発明の一実施例を示す要部断面図、第2図は
その部分拡大図、第3図は制御回路の構成例を示すブロ
ック図、第4図は従来例を概略的に示す部分構成図であ
る。 11……上定盤、17……シリンダ、 21……センサ、25……圧力制御弁、 26……制御回路。FIG. 1 is a sectional view showing an essential part of an embodiment of the present invention, FIG. 2 is a partially enlarged view thereof, FIG. 3 is a block diagram showing a configuration example of a control circuit, and FIG. It is a partial block diagram which shows. 11 …… Upper surface plate, 17 …… Cylinder, 21 …… Sensor, 25 …… Pressure control valve, 26 …… Control circuit.
Claims (1)
せ、該シリンダに供給される流体圧力によって上定盤に
よる加工圧を設定するようにした平面研磨装置に、上定
盤の摩耗による重量変化分について加工圧を補正するこ
とにより該加工圧を設定圧に保つ加工圧補正機構を付設
してなり、 上記加工圧補正機構が、上定盤の重量を測定するセンサ
と、該センサによる測定値を予め入力された基準値と比
較し、それらの差に応じた制御信号を出力する制御回路
と、該制御回路からの制御信号により駆動され、上記シ
リンダに供給される流体圧力を制御する圧力制御弁とか
らなることを特徴とする加工圧補正機構付き平面研磨装
置。1. A flat surface polishing apparatus in which an upper surface plate is supported by a cylinder so as to be able to move up and down, and a processing pressure by the upper surface plate is set by a fluid pressure supplied to the cylinder. A processing pressure correction mechanism is attached to correct the processing pressure with respect to the amount of change so as to maintain the processing pressure at a set pressure. The processing pressure correction mechanism includes a sensor for measuring the weight of the upper surface plate and a measurement by the sensor. A control circuit that compares the value with a reference value that is input in advance and outputs a control signal corresponding to the difference between them, and a pressure that is driven by the control signal from the control circuit and that controls the fluid pressure supplied to the cylinder. A flat polishing device with a processing pressure correction mechanism, which comprises a control valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61018863A JPH0775826B2 (en) | 1986-01-30 | 1986-01-30 | Flat polishing machine with processing pressure compensation mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61018863A JPH0775826B2 (en) | 1986-01-30 | 1986-01-30 | Flat polishing machine with processing pressure compensation mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62176753A JPS62176753A (en) | 1987-08-03 |
| JPH0775826B2 true JPH0775826B2 (en) | 1995-08-16 |
Family
ID=11983374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61018863A Expired - Lifetime JPH0775826B2 (en) | 1986-01-30 | 1986-01-30 | Flat polishing machine with processing pressure compensation mechanism |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0775826B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002154049A (en) * | 2000-11-15 | 2002-05-28 | Fujikoshi Mach Corp | Polishing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5919672A (en) * | 1982-07-19 | 1984-02-01 | Toshiba Corp | Working pressure control device for polishing apparatus |
-
1986
- 1986-01-30 JP JP61018863A patent/JPH0775826B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62176753A (en) | 1987-08-03 |
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