JPH077616B2 - Conductive composite material - Google Patents
Conductive composite materialInfo
- Publication number
- JPH077616B2 JPH077616B2 JP61046402A JP4640286A JPH077616B2 JP H077616 B2 JPH077616 B2 JP H077616B2 JP 61046402 A JP61046402 A JP 61046402A JP 4640286 A JP4640286 A JP 4640286A JP H077616 B2 JPH077616 B2 JP H077616B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- film
- conductive
- composite material
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Liquid Crystal (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Organic Insulating Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Non-Insulated Conductors (AREA)
- Insulating Bodies (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は透明導電体や高周波回路基板にとくに好適で用
いられる導電性複合材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a conductive composite material which is particularly preferably used for a transparent conductor and a high frequency circuit board.
高分子のフイルムまたはシートの表面に導電膜を設けた
もののうち、全体が透明なものは透明導電体として有用
である。すなわち透明導電体は、液晶表示素子、エレク
トロルミネツセンス表示素子などの各種表示素子類の透
明電極や、自動車・航空機などの防曇用窓ガラスに用い
る抵抗発熱体等において使用されている。Among the polymer films or sheets provided with a conductive film on the surface thereof, those which are entirely transparent are useful as transparent conductors. That is, the transparent conductors are used in transparent electrodes of various display elements such as liquid crystal display elements and electroluminescence display elements, and resistance heating elements used for antifogging window glasses of automobiles and aircraft.
ところで透明導電体として従来から使用されているもの
の多くは、酸化スズ膜、酸化インジウム膜などの金属酸
化物透明導電膜をガラス基板上に形成したものである。
しかしガラスは大面積化に限界があり、厚みも精々0.3m
m程度迄しか薄くすることができず、重量も重く、脆く
て壊れ易く、打ち抜きや切り抜きなどの加工性も悪く、
連続生産性にも難点がある。By the way, most of the materials conventionally used as transparent conductors are those in which a metal oxide transparent conductive film such as a tin oxide film or an indium oxide film is formed on a glass substrate.
However, there is a limit to the large area of glass, and the thickness is at most 0.3 m.
It can only be thinned up to about m, is heavy, is brittle and easily broken, and has poor workability such as punching and cutting.
There is also a drawback in continuous productivity.
そこで近年になりガラスの代わりに高分子フイルムやシ
ート(以下両者をあわせてフイルムと略称する)を基板
とした透明導電性フイルムが開発され始めている。この
高分子フイルムを基板とする透明導電性フイルムは、薄
くて軽く、割れない、フレキシブルであり、加工性もよ
く、大面積化が可能で連続生産性に優れるといつた透明
導電性ガラスにない種々の特長を持つている。この透明
導電性フイルムの基板として使用されている高分子フイ
ルムとしては、ポリエチレンテレフタレートのようなポ
リエステルフイルムが知られている。しかしポリエステ
ルフイルムは、強酸や強アルカリに容易に侵されるう
え、吸水して加水分解を起こす虞がある。とくに透明導
電性フイルムをデイスプレイ用途に用いる場合には、導
電膜を所定形状にパターニング化する必要があり、従来
よりフオトエツチング方式が利用されているが、レジス
トの剥離液としてアルカリが必要な場合もあるので耐ア
ルカリ性の欠如は重大な欠点である。また、真空蒸着法
やスパツター法などで薄膜形成する際に、ポリエステル
中の水分は、真空度を上げることを困難にして目的の真
空度に上げるまで長時間要し生産性が悪く、また膜の酸
化の程度をコントロールすることを困難にする問題があ
る。Therefore, in recent years, a transparent conductive film using a polymer film or a sheet (hereinafter, both are abbreviated as a film) as a substrate instead of glass has begun to be developed. The transparent conductive film using this polymer film as a substrate is thin, light, does not break, is flexible, has good processability, can be made into a large area, and has excellent continuous productivity. Has various features. A polyester film such as polyethylene terephthalate is known as a polymer film used as a substrate for the transparent conductive film. However, the polyester film is easily attacked by a strong acid or a strong alkali and may absorb water to cause hydrolysis. Especially when the transparent conductive film is used for a display application, it is necessary to pattern the conductive film into a predetermined shape, and a photo-etching method has been conventionally used. As such, the lack of alkali resistance is a serious drawback. Further, when forming a thin film by a vacuum vapor deposition method or a sputter method, it is difficult to raise the degree of vacuum of the moisture in the polyester, and it takes a long time to reach the desired degree of vacuum, resulting in poor productivity. There is a problem that makes it difficult to control the degree of oxidation.
また、高分子フイルムの表面に導電膜を設けた複合材料
の別の用途として電気回路基板があり、とくに高周波用
の電気回路基板に期待がかけられている。すなわち、電
磁波を通信に用いる場合、より高い周波数の波を用いれ
ばより広い周波数帯域がとれ、故により多量の情報を送
ることができる。また周波数が高くなれば波長がそれに
反比例して短くなり、その結果小型で高性能のアンテナ
を作れるようになるという利点もある。Another application of the composite material in which a conductive film is provided on the surface of a polymer film is an electric circuit board, and an electric circuit board for high frequency is particularly expected. That is, when an electromagnetic wave is used for communication, a wider frequency band can be obtained by using a higher frequency wave, and thus a larger amount of information can be transmitted. Further, as the frequency becomes higher, the wavelength becomes shorter in inverse proportion to it, and as a result, there is an advantage that a small size and high performance antenna can be manufactured.
ところで、このような高周波を対象とする電気回路の基
板には、誘電率及び誘電損失が小さく耐熱性のある材質
が求められる。つまり、高周波において電気信号の伝播
速度は回路基板の誘導率が小さい程速くなり、電気信号
の減衰は回路基板の誘電損失が小さい程少なくなる。し
たがつて、誘電率及び誘電損失の小さい材料程、高速
化、高SN化が計れる。また、電気回路の製造過程におい
て、ハンダ浸漬やハンダ付作業では200℃を越える温度
がかかるので、このような温度下でも変形しないだけの
耐熱性が求められる。By the way, for a substrate of such an electric circuit for high frequencies, a material having a small dielectric constant and a small dielectric loss and high heat resistance is required. That is, at high frequencies, the propagation speed of an electric signal becomes faster as the inductivity of the circuit board becomes smaller, and the attenuation of the electric signal becomes smaller as the dielectric loss of the circuit board becomes smaller. Therefore, a material with a smaller dielectric constant and dielectric loss can achieve higher speed and higher SN. Further, in the process of manufacturing an electric circuit, a temperature of more than 200 ° C. is required for solder dipping or soldering work, so heat resistance that does not deform even under such temperature is required.
このような状況下、現在種々の材料を使用した基板が提
案され、たとえばフツ素樹脂、エポキシ樹脂、ポリイミ
ド、ポリプロピレン等で作られた基板が提案されてい
る。しかしフツ素樹脂は導電層となる金属との接着性が
劣つていたり、低剛性であり更に極めて高価格であると
いう問題がある。エポキシ樹脂あるいはポリイミドは低
周波用、中波用の回路基板として従来から使用されてい
るが、高周波用として使用するには誘電率、誘電損失が
大き過ぎて適さない。ポリプロピレンは誘電率、誘電損
失に優れるものの耐熱性が不足し、変形を生じ易い。Under such circumstances, substrates using various materials are currently proposed, for example, substrates made of fluorine resin, epoxy resin, polyimide, polypropylene or the like. However, the fluorine resin has problems that it has poor adhesion to the metal that forms the conductive layer, has low rigidity, and is extremely expensive. Epoxy resin or polyimide has been conventionally used as a circuit board for low frequencies and medium frequencies, but it is not suitable for high frequencies because its dielectric constant and dielectric loss are too large. Polypropylene has excellent dielectric constant and dielectric loss, but lacks heat resistance and is apt to be deformed.
以上の如く、従来から提案されている高周波用電気回路
も一長一短があり、全ての面で優れた性能を示すものは
知られていなかつた。As described above, conventionally proposed high frequency electric circuits have advantages and disadvantages, and none have been known to exhibit excellent performance in all aspects.
そこで本発明者らは機械的性質、光学的性質、電気的性
質、熱的性質、化学的性質に優れた透明導電性フイルム
や高周波用として好適なる電気回路基板を提供せんもの
と検討した結果、特定の重合体を基材に使用すると目的
を達成できることを見い出した。Therefore, the present inventors have studied to provide a transparent conductive film excellent in mechanical properties, optical properties, electrical properties, thermal properties, and chemical properties and an electric circuit board suitable for high frequency, and as a result, It has been found that the use of specific polymers for the substrate can achieve the purpose.
すなわち、本発明はテトラシクロドデセンまたはその誘
導体:50〜100モル%およびノルボルネンまたはその誘導
体:0〜50モル%からなる開環重合体を水添反応させて得
られる重合体の延伸または無延伸のシートまたはフイル
ムの表面に導電性の有機膜または金属膜を設けたことを
特徴とする導電性複合材料である。That is, the present invention is a polymer obtained by hydrogenating a ring-opening polymer consisting of tetracyclododecene or its derivative: 50 to 100 mol% and norbornene or its derivative: 0 to 50 mol%. The conductive composite material is characterized in that a conductive organic film or metal film is provided on the surface of the sheet or film.
本発明の導電性複合材料の基板となるシートあるいはフ
イルム(以下フイルムと略称)を構成する重合体は、テ
トラシクロドデセンまたはその誘導体の単独開環重合体
もしくはテトラシクロドデセン類とノルボルネンまたは
その誘導体との開環共重合体のいずれかの開環重合体を
水添して得られる重合体からなる。したがつて、該重合
体の骨格中には、開環重合に基づく不飽和結合を実質的
に含まず、よつて水添前の重合体に比べて耐薬品性、耐
溶剤性、耐油性および耐熱性、耐候安定性に優れた性質
を示す。The polymer constituting the sheet or film (hereinafter abbreviated as “film”) which is the substrate of the conductive composite material of the present invention is a homocyclic ring-opening polymer of tetracyclododecene or its derivative or tetracyclododecene and norbornene or its A polymer obtained by hydrogenating any ring-opening polymer of the derivative and the ring-opening copolymer. Therefore, the skeleton of the polymer does not substantially contain an unsaturated bond based on ring-opening polymerization, and thus has chemical resistance, solvent resistance, oil resistance and oil resistance higher than those of the polymer before hydrogenation. It has excellent heat resistance and weather resistance.
かかる水添重合体の原料モノマーは市販品を使用しても
よいが、市販品中に含まれる雑モノマーが目的とする重
合体の重合を阻害することもありうるので必要に応じて
精製するのが好ましい。また、とくにテトラシクロドデ
セン類は入手困難な場合もありうるので、その場合は米
国特許第3557072号、特公昭46−14910号、特開昭57−15
4133号などに開示された方法によつて合成すればよい。A commercially available product may be used as the raw material monomer for the hydrogenated polymer, but the miscellaneous monomer contained in the commercially available product may hinder the polymerization of the intended polymer, and thus it may be purified as necessary. Is preferred. Further, in particular, tetracyclododecenes may be difficult to obtain, and in that case, U.S. Pat. No. 3557072, JP-B-46-14910, JP-A-57-15.
It may be synthesized by the method disclosed in 4133 or the like.
テトラシクロドデセン類とノルボルネン類とを重合して
開環重合体を製造する技術は既に知られており、たとえ
ば特公昭46−14910号、特開昭58−127728号に開示され
ている方法を採用することができる。テトラシクロドデ
セン類の開環重合体中における割合は、耐熱性の点から
通常は30モル%以上、好ましくは50モル%以上、とくに
は70モル%以上が好ましい。ノルボルネン類の開環重合
体中における割合は、通常70モル%未満、好ましくは50
モル%未満、とくに30モル%未満である。分子量は、特
開昭58−127728号に示されているようにオレフイン類を
添加して調整されるが、一般に1000〜100万、好ましく
は1万〜50万である。また、流動性の指標であるメルト
フローインデツクスMFR(260℃、2.16kg)は、0.001〜1
000、好ましくは0.05〜200、特に好ましくは0.1〜100g/
10minの範囲である。Techniques for producing a ring-opening polymer by polymerizing tetracyclododecenes and norbornenes are already known. For example, the method disclosed in JP-B-46-14910 and JP-A-58-127728 is used. Can be adopted. From the viewpoint of heat resistance, the proportion of tetracyclododecenes in the ring-opening polymer is usually 30 mol% or more, preferably 50 mol% or more, and particularly preferably 70 mol% or more. The proportion of norbornenes in the ring-opening polymer is usually less than 70 mol%, preferably 50
It is less than 30 mol%, especially less than 30 mol%. The molecular weight is adjusted by adding olefins as described in JP-A-58-127728, but it is generally 100 to 100,000, preferably 10,000 to 500,000. The melt flow index MFR (260 ° C, 2.16 kg), which is an index of fluidity, is 0.001 to 1
000, preferably 0.05 to 200, particularly preferably 0.1 to 100 g /
It is in the range of 10 min.
開環重合体の水添反応は通常の方法により行われ、触媒
の種類により均一系または不均一系で1〜150気圧の水
素圧下、0〜180℃、好ましくは20〜100℃の温度範囲で
行われる。そして水素圧、反応温度、反応時間、触媒濃
度等を変化させることにより、水添率を任意に調整でき
る。The hydrogenation reaction of the ring-opening polymer is carried out by an ordinary method, and depending on the type of catalyst, it is carried out in a homogeneous or heterogeneous system under a hydrogen pressure of 1 to 150 atm in a temperature range of 0 to 180 ° C., preferably 20 to 100 ° C. Done. Then, the hydrogenation rate can be arbitrarily adjusted by changing the hydrogen pressure, the reaction temperature, the reaction time, the catalyst concentration and the like.
水添触媒としては、オレフイン化合物の水添に際し使用
されているものであれば如何なるものでもよく、たとえ
ば不均一系触媒としてニツケル、パラジウム、白金、ま
たはこれらの金属をカーボン、シリカ、ケイソウ土、ア
ルミナ、酸化チタン等の担体に担持させた触媒すなわち
ニツケル/シリカ、ニツケル/ケイソウ土、パラジウム
/カーボン、パラジウム/シリカ、パラジウム/ケイソ
ウ土、パラジウム/アルミナなどを挙げることができ
る。また均一系触媒としては、ナフテン酸ニツケル/ト
リエチルアルミニウム、オクテン酸コバルト/n−ブチル
リチウム、ニツケルアセチルアセトネート/トリエチル
アルミニウムなどのニツケル、コバルト化合物と周期律
表第I〜III属金属の有機金属化合物からなるもの、あ
るいはRh化合物などを挙げることができる。The hydrogenation catalyst may be any as long as it is used in the hydrogenation of an olefin compound, for example, nickel, palladium, platinum, or these metals as a heterogeneous catalyst, carbon, silica, diatomaceous earth, alumina. Examples of the catalyst include nickel / silica, nickel / diatomaceous earth, palladium / carbon, palladium / silica, palladium / diatomaceous earth, and palladium / alumina supported on a carrier such as titanium oxide. Further, as the homogeneous catalyst, nickel such as nickel naphthenate / triethylaluminum, cobalt octenoate / n-butyllithium, nickel acetylacetonate / triethylaluminum, a cobalt compound and an organometallic compound of Group I to III metal of the periodic table And Rh compounds and the like.
開環重合体水添物が前述した優れた諸性質を示すために
は、重合体主鎖中の不飽和結合部分の80%以上、好まし
くは90%以上、とくに95%以上が水添されるべきであ
る。また水添率が80%以上とくに90%以上になると、水
添前の重合体とは異なる溶解度パラメーター(SP値)を
持つようになり、耐有機溶剤性が向上するという効果も
発揮する。さらに、耐湿性の面から水添物は極性基を有
しないことが望ましい。In order for the hydrogenated ring-opening polymer to exhibit the above-mentioned various properties, 80% or more, preferably 90% or more, particularly 95% or more of the unsaturated bond portion in the polymer main chain is hydrogenated. Should be. Further, when the hydrogenation rate is 80% or more, particularly 90% or more, the polymer has a solubility parameter (SP value) different from that of the polymer before hydrogenation, and the effect of improving the organic solvent resistance is also exhibited. Further, from the viewpoint of moisture resistance, it is desirable that the hydrogenated product has no polar group.
基材となるフイルムを製造するには、開環重合体水添物
を押出、射出、圧縮、湿式キヤストなどの公知の種々の
方法によつて成形することができる。この成形の際に
は、必要に応じて通常樹脂に用いられる種々の配合剤を
添加してもよい。また、得られたフイルムには1軸延伸
や同時2軸延伸あるいは逐次2軸延伸といつた延伸処理
を施し、強度などをさらに高めてやつてもよい。To produce a film as a base material, the ring-opened polymer hydrogenated product can be molded by various known methods such as extrusion, injection, compression, and wet cast. At the time of this molding, various compounding agents usually used for resins may be added if necessary. Further, the obtained film may be subjected to a stretching treatment such as uniaxial stretching, simultaneous biaxial stretching or sequential biaxial stretching to further enhance the strength and the like.
前記開環重合体水添物を原料としてフイルムを製造する
と、分解、ゲル化が生じず均一な透明フイルムが得られ
る。これらは通常85%以上の光線透過率、多くは90%以
上の光線透過率を示す。When a film is produced using the hydrogenated product of the ring-opening polymer as a raw material, a uniform transparent film is obtained without decomposition and gelation. These usually show a light transmittance of 85% or more, and often 90% or more.
また、透明性を必要としない高周波用基板用途には、本
重合体に、性質をそこなわない限り、50wt%以下のポリ
オレフイン(ポリエチレン、ポリプロピレン、ポリ−4
−メチルペンテン−1など)をブレンドしておいても良
い。For high frequency substrate applications that do not require transparency, the polymer may be used in an amount of 50 wt% or less (polyethylene, polypropylene, poly-4) unless the properties are impaired.
-Methylpentene-1) may be blended.
これらのフイルムに設ける導電性の膜は、導電性高分子
(ポリアセチレン、ポリピロール、ポリピリジン、ポリ
アニリン等)などからなる有機膜や金属膜(Cu、Al、N
i、Au、Ag等)であり、これらはシート、フイルム、箔
として接着されたり、プラズマ重合、スパツター、蒸
着、メツキ等の手段でフイルム上に積層される。The conductive film provided on these films is an organic film or a metal film (Cu, Al, N) made of a conductive polymer (polyacetylene, polypyrrole, polypyridine, polyaniline, etc.).
i, Au, Ag, etc.), which are adhered as a sheet, a film, a foil, or laminated on the film by means of plasma polymerization, sputtering, vapor deposition, plating or the like.
たとえば高周波回路基板に用いる場合、この導電膜は通
常重合体フイルムの表面のみ、表面と裏面の2層、内部
にも成形された3層以上の複合層の態様を採ることがで
きる。回路の形成は、種々の公知のリソグラフイー法に
より、例えばエツチング法で行うことができる。また、
別の方法として、本発明の重合体又は本発明の重合体の
不飽和カルボン酸変性物を含むポリマー成分と導電性材
料(金属、有機物)とからなる塗料を形成し(導電性塗
料)、スクリーン印刷法などで回路形成することができ
る。もちろん、導電性塗料の回路を形成したうえで、さ
らに無電界メツキなどの方法により、より高導電回路を
形成することもできる。For example, when used for a high-frequency circuit board, this conductive film can take the form of a composite layer of usually only the front surface of the polymer film, two layers of the front surface and the back surface, and three or more layers formed inside. The circuit can be formed by various known lithographic methods, for example, an etching method. Also,
As another method, a paint comprising a polymer component containing the polymer of the present invention or an unsaturated carboxylic acid modified product of the polymer of the present invention and a conductive material (metal, organic substance) is formed (conductive paint), and a screen is formed. A circuit can be formed by a printing method or the like. Of course, it is also possible to form a circuit of conductive paint and then form a higher conductivity circuit by a method such as electroless plating.
更に、重合体層と導電膜(金属、ポリマー、有機物、導
電塗料など)の間に接着層を介在させてもよい。かかる
接着層としては、エポキシ樹脂、ポリイミド、ポリブタ
ジエン、フエノール樹脂、ポリエーテルエーテルケトン
等の耐熱性樹脂を例示することができる。これらの中で
はポリイミド、エポキシ樹脂が耐熱性、高周波での誘電
特性、金属との接着性に優れていて好ましい。このよう
な接着層を介在させる場合、注意すべきことは、重合体
層と接着層の厚み割合によつて回路基板としての誘電特
性が左右されることである。すなわち、(重合体層の厚
さ)<(接着層の厚さ)の場合には、回路基板の誘電特
性は主として接着層の誘電特性に大きく影響され、全体
として悪くなる。勿論、用途によつてたとえば高周波と
してそこそこの周波数を対象にし、誘電特性が厳しい要
望ではなく、むしろ表層の導電膜との接着強度等が要求
されるようなケースでは、接着剤層の厚みを比較的厚く
してもかまわない。しかし、高周波用として良好なる誘
電特性を発現させるには、重合体層の厚み/接着剤層の
厚みの比が2以上、とくに3以上になるように構成する
のが好適である。また、この厚み比は後述する複数の積
層体の場合にも各の層の合計厚みに対して適用できる。Further, an adhesive layer may be interposed between the polymer layer and the conductive film (metal, polymer, organic material, conductive paint, etc.). Examples of the adhesive layer include heat resistant resins such as epoxy resin, polyimide, polybutadiene, phenol resin, and polyether ether ketone. Of these, polyimide and epoxy resins are preferable because they are excellent in heat resistance, dielectric properties at high frequencies, and adhesiveness to metals. When interposing such an adhesive layer, it should be noted that the dielectric properties of the circuit board depend on the thickness ratio of the polymer layer and the adhesive layer. That is, in the case of (thickness of polymer layer) <(thickness of adhesive layer), the dielectric property of the circuit board is largely affected by the dielectric property of the adhesive layer and deteriorates as a whole. Of course, in the case where the frequency is moderately high depending on the application and the dielectric properties are not strictly demanded, but rather the adhesive strength with the conductive film on the surface layer is required, the thickness of the adhesive layer is compared. It does not matter if it is thickened. However, in order to exhibit good dielectric properties for high frequencies, it is preferable that the ratio of the thickness of the polymer layer / the thickness of the adhesive layer is 2 or more, particularly 3 or more. Further, this thickness ratio can be applied to the total thickness of each layer also in the case of a plurality of laminated bodies described later.
また別には、積層層として基板を構成する前記重合体の
高分子量体(〔η〕0.3以上のもの)及び前記重合体に
α,β−不飽和カルボン酸、その無水物、エステル等を
グラフト共重合させたものを使用すると基板の誘電特性
を変化させることがないので好ましい。Alternatively, a high molecular weight polymer of the above-mentioned polymer ([η] 0.3 or more) that constitutes the substrate as a laminated layer and an α, β-unsaturated carboxylic acid, its anhydride, ester or the like are graft-copolymerized to the above-mentioned polymer. It is preferable to use a polymerized product because it does not change the dielectric properties of the substrate.
本発明の別の態様として、重合体層及び/又は接着層に
補強材として耐熱性、絶縁性の繊維状物を混入してもか
まわない。かかる補強繊維状物としては、石英繊維、ガ
ラス繊維、芳香族ポリアミド繊維、高強度高弾性ポリエ
チレン繊維等の短繊維、編織布、不織布等を例示でき
る。As another aspect of the present invention, a heat-resistant and insulating fibrous material may be mixed as a reinforcing material in the polymer layer and / or the adhesive layer. Examples of such reinforcing fibrous materials include quartz fibers, glass fibers, aromatic polyamide fibers, short fibers such as high-strength and high-elasticity polyethylene fibers, knitted fabrics, nonwoven fabrics, and the like.
また別の態様として、重合体層と接着層を複数組合せた
積層体の形で回路基板を形成してもよい。尚この場合、
各層を好ましくは2層以上30層以下に積層すればよい。
また必要に応じ前述の如く繊維状物を各層に又は一部の
層に混入してもよい。As another aspect, the circuit board may be formed in the form of a laminate in which a plurality of polymer layers and adhesive layers are combined. In this case,
Each layer may be preferably laminated in the range of 2 to 30 layers.
If necessary, the fibrous material may be mixed in each layer or a part of the layers as described above.
更に別の態様として、重合体層を架橋剤によつて架橋し
てもかまわない。架橋剤は加熱、放射線照射等によつて
3次元的構造を形成し、重合体層の熱的特性と寸法安定
性を更に改善する。架橋剤としては公知の種々のものが
利用でき、たとえばジビニルベンゼン、ジアリルフタレ
ート、エチレングリコールジメタクリレート、トリメチ
ロールプロパントリメタクリレート、トリアリルイソシ
アヌレート、液状ポリブタジエン等を挙げることができ
る。In still another embodiment, the polymer layer may be crosslinked with a crosslinking agent. The crosslinking agent forms a three-dimensional structure by heating, irradiation with radiation, etc., and further improves the thermal characteristics and dimensional stability of the polymer layer. Various known crosslinking agents can be used, and examples thereof include divinylbenzene, diallyl phthalate, ethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, triallyl isocyanurate, and liquid polybutadiene.
本発明の複合材料を透明導電性シートとして用いる場合
には、導電膜として可視光透過率すなわちJIS K6714に
準拠して測定した値が50%以上、とくに70%以上で、比
抵抗が100Ωcm以下、とくに50Ωcm以下のものを用い
る。より具体的にはAu、Ag、Cu、Pt、Cr、Rhなどの金属
薄膜、In2O3(Sn)、SnO2(Sb)、SnO2(Fe)、CdO、Cd
2O3、CdSnO4、TiO2、ZrO2、CuIなどの半導体及び酸化物
半導体薄膜、TiOx/Ag/TiOx(x≦2)などの多層薄膜、
ポリビニルベンジルトリメチルアンモニウムクロライ
ド、オリゴ(ポリ)スチレンスルホン酸塩などの高分子
電解質薄膜系、ポリアニリン類、ポリチオフエン類、ポ
リピロール類などの導電性高分子等を挙げることができ
る。これらの導電膜は、前述した高周波回路基板と同じ
ように周知の方法でもつて重合体フイルム上に積層され
る。また導電性高分子は、電解重合法又は気相法によつ
てフイルム中内部に形成することもできる。また、TTF
−TCNQ(テトラチオフルバレン−テトラシアノキノジメ
タン)などの錯体を含浸させることによつて導電性を発
現させることもできる。When using the composite material of the present invention as a transparent conductive sheet, the visible light transmittance as a conductive film, that is, the value measured according to JIS K6714 is 50% or more, particularly 70% or more, and the specific resistance is 100 Ωcm or less, In particular, use the one of 50 Ωcm or less. More specifically, metal thin films such as Au, Ag, Cu, Pt, Cr and Rh, In 2 O 3 (Sn), SnO 2 (Sb), SnO 2 (Fe), CdO, Cd
2 O 3 , CdSnO 4 , TiO 2 , ZrO 2 , CuI and other semiconductor and oxide semiconductor thin films, TiOx / Ag / TiOx (x ≦ 2) and other multilayer thin films,
Examples thereof include a polymer electrolyte thin film system such as polyvinylbenzyltrimethylammonium chloride and oligo (poly) styrenesulfonate, and a conductive polymer such as polyaniline, polythiophene, and polypyrrole. These conductive films are laminated on the polymer film by a well-known method like the above-mentioned high frequency circuit board. The conductive polymer can also be formed inside the film by an electrolytic polymerization method or a gas phase method. Also, TTF
It is also possible to express conductivity by impregnating a complex such as -TCNQ (tetrathiofulvalene-tetracyanoquinodimethane).
以上述べてきたように本発明の導電性複合材料は、透
明性に優れる、酸およびアルカリに対して強い抵抗性
を示す、耐溶剤性に優れる、加工性がよく大面積化
が可能である、軽量でフレキシビリテイに富む、薄
膜化ができる、耐熱性に優れる、耐熱老化性、耐光
安定性に優れる、電気特性に優れるといつた種々の特
長を有している。As described above, the conductive composite material of the present invention is excellent in transparency, shows strong resistance to acids and alkalis, is excellent in solvent resistance, has good workability and can be made large in area. It has various features such as light weight, high flexibility, thin film formation, excellent heat resistance, excellent heat aging resistance, light stability, and excellent electrical characteristics.
したがつて高周波用電気回路基板に利用すると、 (i)誘導率が小さいので高周波電気信号の伝播速度が
速くなり、また誘電損失が小さいので電気信号の減衰が
小さくなるので、情報伝達の高速化が実現でき、微弱信
号の高感度受信も実現できる。Therefore, when it is used for a high-frequency electric circuit board, (i) the propagation rate of the high-frequency electric signal is high because the inductivity is small, and the attenuation of the electric signal is small because the dielectric loss is small, so that the speed of information transmission is increased. Can be realized, and highly sensitive reception of weak signals can also be realized.
(ii)耐熱性に富むので、回路基板製造における加熱加
工工程において軟化、溶融が発生せず変形することがな
い。したがつて回路基板の厚みを正確にコントロールす
ることができる。(Ii) Since it has high heat resistance, it is not deformed by being softened or melted in the heat processing step in the production of a circuit board. Therefore, the thickness of the circuit board can be accurately controlled.
(iii)耐ハンダ性に優れている。(Iii) It has excellent solder resistance.
(iv)吸水性が小さく、優れた電気的性質を長期間に亘
り安定して発揮できる。(Iv) The water absorption is small, and excellent electrical properties can be stably exhibited over a long period of time.
(v)寸法安定性に優れる。(V) Excellent dimensional stability.
といつた特長を有している。It has the following features.
したがつて各種回路基板、フラツトアンテナ、筐体一体
型基板、フレキシブル基板などに利用できる。Therefore, it can be used for various circuit boards, flat antennas, housing-integrated boards, flexible boards, and the like.
また透明導電性フイルムは次のような用途に使用でき
る。すなわち導電膜上に必要に応じてポリビニルカルバ
ゾールや硫化カドミウムなどの光導電体や誘導体の薄膜
を形成させて、OHP、第2原図、スライドフイルム、マ
イクロフイルムなどの電子写真記録用途、EL(エレクト
ロルミネツセンス)、液晶、エレクトロクロミツタ、電
気泳動表示などの固体デイスプレイ用途、サーモプラス
チツクレコーデイング、強誘電体メモリーなどの光メモ
リー用途、透明タブレツトなどの端末機器、メーター類
の窓、TVブラウン管、クリーンルームの窓や床、半導体
包装材料、電磁波遮蔽用途、太陽電池の窓、光増幅器な
どの光電変換素子、熱線反射用途、自動車や航空機のデ
フロスタなどの面発熱体用途等に好適である。The transparent conductive film can be used for the following purposes. That is, if necessary, a thin film of a photoconductor or derivative such as polyvinylcarbazole or cadmium sulfide is formed on the conductive film, and electrophotographic recording applications such as OHP, second original drawing, slide film, microfilm, and EL (electroluminescence) are performed. Sensor), liquid crystal, electrochromic display, electrophoretic display and other solid-state display applications, thermoplastic coating, optical memory applications such as ferroelectric memory, terminal equipment such as transparent tablets, meters windows, TV CRTs, clean room It is suitable for windows and floors, semiconductor packaging materials, electromagnetic wave shielding applications, solar cell windows, photoelectric conversion elements such as optical amplifiers, heat ray reflection applications, and surface heating elements such as defrosters for automobiles and aircraft.
参考例1〜6 メチルテトラシクロドデセン およびメチルノルボルネン とを、塩化ルテニウム(RuCl2・3H2O)のn−ブタノー
ル溶液の存在下に、ガラス製アンプル内で100℃で約3
時間反応させた後、生成物をテトラヒドロフランおよび
メタノールを用いて洗浄、乾燥した。Reference Examples 1-6 Methyltetracyclododecene And methyl norbornene And in the presence of a solution of ruthenium chloride (RuCl 2 · 3H 2 O) in n-butanol at about 100 ° C in a glass ampoule at about 3 ° C.
After reacting for a time, the product was washed with tetrahydrofuran and methanol and dried.
次に前記生成重合体をテトラヒドロフランに溶解し、パ
ラジウム/シリカ触媒の存在下、水素圧50kg/cm2・G、
10℃で30分間攪拌後、50℃に昇温しさらに18時間攪拌し
た。得られた沈澱生成物をシクロヘキサンに溶解し、フ
イルターで過後メタノールで再沈させ乾燥した。Next, the produced polymer is dissolved in tetrahydrofuran and hydrogen pressure is 50 kg / cm 2 · G in the presence of a palladium / silica catalyst.
After stirring at 10 ° C for 30 minutes, the temperature was raised to 50 ° C and stirring was continued for 18 hours. The obtained precipitated product was dissolved in cyclohexane, filtered through a filter, reprecipitated with methanol and dried.
得られた重合体の水添率はNMRスペクトルにより、TgはD
SCにより、光透過率はJIS K6717、吸水率はJIS K6911に
より測定した。結果を表1に示す。The hydrogenation rate of the obtained polymer was determined by NMR spectrum and Tg was D
The light transmittance was measured according to JIS K6717 and the water absorption was measured according to JIS K6911 by SC. The results are shown in Table 1.
次にこれらの重合体を用いて種々の導電性複合材料を作
成し、それらを透明導電性フイルムまたは高周波回路基
板として評価した。以下にその例を示す。 Next, various conductive composite materials were prepared using these polymers, and they were evaluated as a transparent conductive film or a high frequency circuit board. An example is shown below.
実施例1 参考例2で得られた重合体を用いて、Tダイにより厚さ
0.1mm、巾20cmの透明フイルムを成形した。Example 1 Using the polymer obtained in Reference Example 2, the thickness was measured by a T-die.
A transparent film having a width of 0.1 cm and a width of 20 cm was formed.
2極マグネトロンスパツター(日電アネルバ)により、
13.56MHzの高周波電源を用い、基板温度50℃、ターゲツ
トはIn2O3/SnO2=90/10(%)合金ターゲツトを用い、
Arガス流入下、スパツター圧力1×10-2Torr、RF出力50
W、スパツター速度250Å/minでITO膜を形成した。フイ
ルム性能は、タイリーステツプ(Taylor Hobson製)に
より測定したITO膜厚3000Å、四探針法により測定した
比抵抗2×10-3Ω・cm、自己分光光度計UV365(島津製
作所)で測定した光透過率(400nm〜750nm)は80%であ
り、良好な導電製フイルムが得られた。またカーボンア
ーク燈で35時間照射した後も変化はなかつた。With a 2-pole magnetron sputter (Nichiden Anelva),
A high-frequency power supply of 13.56MHz is used, the substrate temperature is 50 ° C, the target is an In 2 O 3 / SnO 2 = 90/10 (%) alloy target,
Under Ar gas inflow, sputter pressure 1 × 10 -2 Torr, RF output 50
An ITO film was formed at W and a sputter speed of 250Å / min. The film performance is ITO film thickness 3000 Å measured by Tile step (Taylor Hobson), specific resistance 2 × 10 -3 Ωcm measured by four-point probe method, and light measured by self-spectrophotometer UV365 (Shimadzu Corporation). The transmittance (400 nm to 750 nm) was 80%, and a good conductive film was obtained. Moreover, there was no change even after irradiation with a carbon arc lamp for 35 hours.
実施例2 参考例6で得られた重合体を用いて厚さ0.1mm、巾20cm
のフイルムを成形した。Example 2 Using the polymer obtained in Reference Example 6, the thickness is 0.1 mm and the width is 20 cm.
The film was molded.
ターゲツトはCdO2/SnO2=2/1(重量比)、反応ガスはO
2/Ar=5/95(%)、スパツター圧2×10-2Torr、RF出力
50W、スパツター速度200Å/minでTO膜を形成した。その
結果、導電層膜2500Å、光透過率83%、比抵抗3×10-3
Ωcmの透明導電性フイルムが得られた。またカーボンア
ーク燈で35時間照射した後も変化はなかつた。The target is CdO 2 / SnO 2 = 2/1 (weight ratio), the reaction gas is O
2 / Ar = 5/95 (%), sputter pressure 2 × 10 -2 Torr, RF output
A TO film was formed at 50 W and a sputter speed of 200 Å / min. As a result, conductive layer film 2500Å, light transmittance 83%, resistivity 3 × 10 -3
A transparent conductive film of Ωcm was obtained. Moreover, there was no change even after irradiation with a carbon arc lamp for 35 hours.
実施例3 参考例4に示した重合体を使用して、次の条件で電解重
合を行つた。白金電極(5×5cm)の両面に重合体フイ
ルム(10μm厚さ)を加熱圧着し、この電極を陽極と
し、陰極にも白金板を用いた。電解質液として、ピロー
ル、テトラエチルアンモニウム塩(BF)のアセトニト
リル液を用い、印加電圧2.1Vで1.5分間電解重合を行つ
た。得られた透明導電性フイルムは光透過率60%、比抵
抗35Ωcmであつた。またカーボンアーク燈で35時間照射
した後も変化はなかつた。Example 3 Using the polymer shown in Reference Example 4, electrolytic polymerization was carried out under the following conditions. A polymer film (10 μm thick) was heat-pressed onto both sides of a platinum electrode (5 × 5 cm), and this electrode was used as an anode and a platinum plate was also used as a cathode. As an electrolyte solution, an acetonitrile solution of pyrrole and tetraethylammonium salt (BF) was used, and electrolytic polymerization was performed at an applied voltage of 2.1 V for 1.5 minutes. The transparent conductive film thus obtained had a light transmittance of 60% and a specific resistance of 35 Ωcm. Moreover, there was no change even after irradiation with a carbon arc lamp for 35 hours.
比較例1〜3 参考例1、3、5に示した重合体を使用して、参考例1
の重合体は実施例1、参考例3の重合体は実施例3、参
考例5の重合体は実施例2の条件と同様にして透明導電
性フイルムを作製した。その後カーボンアーク燈で35時
間光を照射した。各透明導電性フイルムは黄色に変色
し、また比抵抗も低下した。Comparative Examples 1 to 3 Using the polymers shown in Reference Examples 1, 3 and 5, Reference Example 1
The polymer of Example 1 was prepared in the same manner as in Example 1, the polymer of Reference Example 3 was prepared in Example 3 and the polymer of Reference Example 5 was prepared in the same manner as in Example 2. Then, it was irradiated with a carbon arc lamp for 35 hours. Each transparent conductive film turned yellow and its specific resistance decreased.
以上の実施例を見ても判るとおり、本発明の透明導電性
フイルムは長期間に亘り安定した性質を示すが、比較例
の如く水素添加前の開環重合体を使用したものは光に長
時間あたると変色等が生じ、長期間の使用に耐えないこ
とが判る。また光の代りに長期間熱を加ええも同様な結
果を示し、故に水素添加前の開環重合体を使用した透明
導電性フイルムは、該フイルムの具体的用途である液晶
表示素子等の透明電極や抵抗発熱体などに実質使用でき
ない。As can be seen from the above examples, the transparent conductive film of the present invention shows stable properties for a long period of time, but the one using the ring-opening polymer before hydrogenation as in Comparative Example is long in light. It can be seen that discoloration occurs over time and it cannot withstand long-term use. The same result was obtained even when heat was applied for a long period of time instead of light. Therefore, the transparent conductive film using the ring-opening polymer before hydrogenation is transparent to liquid crystal display devices, which is a specific application of the film. It cannot be practically used for electrodes or resistance heating elements.
実施例4 参考例2の重合体をサーモプラスチツク製30mmφ、Tダ
イ成形機により厚さ1.5mm、巾20cmのシートを作製し
た。Example 4 The polymer of Reference Example 2 was manufactured into a sheet having a thickness of 1.5 mm and a width of 20 cm by a T-molding machine having a diameter of 30 mm and manufactured by Thermoplastics.
このシート(10cm×10cm)に、三井金属鉱業社製 電解
銅箔(35μm厚さ)を両面にはりつけ、260℃でプレス
成形機より融着させた。両面銅張板での誘電率、誘電損
失は、それぞれ2.2、4.5×10-4であり剥離強度は1.0kg/
cmであつた。この銅張板に、フオトレジスト(富士合成
化学研究所No.200)をコートし、アルカリ現像液及びエ
ツチング処理(塩化第2鉄飽和溶液)で微細パターンを
形成した。その結果、100μ以下の微細パターンが形成
できた。To this sheet (10 cm x 10 cm), electrolytic copper foil (35 μm thick) manufactured by Mitsui Mining & Smelting Co., Ltd. was stuck on both sides and fused at 260 ° C by a press molding machine. The dielectric constant and dielectric loss of the double-sided copper clad plate are 2.2 and 4.5 × 10 -4 , respectively, and the peel strength is 1.0 kg /
It was in cm. This copper clad plate was coated with a photoresist (Fuji Synthetic Chemical Research Laboratory No. 200), and a fine pattern was formed with an alkaline developer and an etching treatment (ferric chloride saturated solution). As a result, a fine pattern of 100 μ or less could be formed.
実施例5 参考例2の重合体に無水マレイン酸をグラフト共重合
し、無水マレイン酸含量1.5wt%の変性物を得た。この
ポリマーを参考例2の重合体に、10wt%混合し、シート
成形して、両面銅箔を融着した。両面銅張板の誘電率は
2.3、誘電正接は6.5×10-4であつた。また、剥離強度は
1.6kg/cmであつた。Example 5 Maleic anhydride was graft-copolymerized with the polymer of Reference Example 2 to obtain a modified product having a maleic anhydride content of 1.5 wt%. This polymer was mixed with the polymer of Reference Example 2 in an amount of 10 wt% and molded into a sheet to fuse a double-sided copper foil. The permittivity of double-sided copper clad board
2.3, the dielectric loss tangent was 6.5 × 10 -4 . The peel strength is
It was 1.6 kg / cm.
実施例6 参考例6の重合体をシクロヘキサンに溶解し、プリント
基板用ガラスクロスに含浸させ、乾燥させた。ポリマー
含浸ガラスクロスを6枚重ね、260℃でプレス圧着し、
厚さ1.5mmでヤング率8×1010dyne/cm2の高剛性体を得
た。その後、実施例5に記載の変性物を裏面に10μ厚さ
コートした銅箔を積層体両面に誘着させた。その結果、
両面銅張板の誘電率は2.8、誘電正接は5.8×10-4、剥離
強度は1.1kg/cmであつた。Example 6 The polymer of Reference Example 6 was dissolved in cyclohexane, impregnated in a glass cloth for printed boards, and dried. Stack 6 sheets of polymer-impregnated glass cloth, press-press at 260 ℃,
A highly rigid body having a thickness of 1.5 mm and a Young's modulus of 8 × 10 10 dyne / cm 2 was obtained. Thereafter, the modified product described in Example 5 was coated on its back surface with a copper foil having a thickness of 10 μm to both sides of the laminate. as a result,
The double-sided copper clad plate had a dielectric constant of 2.8, a dielectric loss tangent of 5.8 × 10 -4 and a peel strength of 1.1 kg / cm.
Claims (4)
0〜100モル%およびノルボルネンまたはその誘導体:0〜
50モル%からなる開環重合体を水添反応させて得られる
重合体の延伸または無延伸のシートまたはフイルムの表
面に導電性の有機膜または金属膜を設けたことを特徴と
する導電性複合材料。1. Tetracyclododecene or its derivative: 5
0-100 mol% and norbornene or its derivatives: 0-
A conductive composite characterized in that a conductive organic film or a metal film is provided on the surface of a stretched or unstretched sheet or film of a polymer obtained by hydrogenating a ring-opening polymer consisting of 50 mol%. material.
0Ωcm以下の比抵抗を有している特許請求の範囲第1項
記載の導電性複合材料。2. A conductive film having a light transmittance of 50% or more and 10 or more.
The conductive composite material according to claim 1, which has a specific resistance of 0 Ωcm or less.
請求の範囲第1項または第2項に記載の導電性複合材
料。3. The conductive composite material according to claim 1, which is used as a transparent conductive film.
の範囲第1項または第2項に記載の導電性複合材料。4. The conductive composite material according to claim 1, which is used as a high-frequency circuit board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61046402A JPH077616B2 (en) | 1986-03-05 | 1986-03-05 | Conductive composite material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61046402A JPH077616B2 (en) | 1986-03-05 | 1986-03-05 | Conductive composite material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62206704A JPS62206704A (en) | 1987-09-11 |
| JPH077616B2 true JPH077616B2 (en) | 1995-01-30 |
Family
ID=12746160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61046402A Expired - Lifetime JPH077616B2 (en) | 1986-03-05 | 1986-03-05 | Conductive composite material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH077616B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3284558B2 (en) * | 1991-03-29 | 2002-05-20 | 日本ゼオン株式会社 | Thermoplastic saturated norbornene-based resin sheet and method for producing the same |
| JPH08142263A (en) * | 1994-11-14 | 1996-06-04 | Mitsui Petrochem Ind Ltd | Metal / cycloolefin resin laminate and method for producing the same |
| JP3952560B2 (en) * | 1997-10-31 | 2007-08-01 | 日本ゼオン株式会社 | Composite film |
| JP2003040985A (en) * | 2001-07-31 | 2003-02-13 | Jsr Corp | Extruded cyclic olefin resin film |
| JP4514392B2 (en) * | 2002-02-26 | 2010-07-28 | 日東電工株式会社 | Method for producing protective film for polarizing plate |
| JP2003300268A (en) * | 2002-04-09 | 2003-10-21 | Jsr Corp | Laminated film |
| JP5213266B2 (en) * | 2009-10-15 | 2013-06-19 | 日東電工株式会社 | Protective film for polarizing plate, method for producing the same, and polarizing plate |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS592771B2 (en) * | 1980-05-30 | 1984-01-20 | 三井造船株式会社 | Gas turbine that utilizes cold energy from liquefied natural gas |
| JPS6026024A (en) * | 1983-07-21 | 1985-02-08 | Nippon Zeon Co Ltd | optical materials |
| JPS60131238A (en) * | 1983-12-20 | 1985-07-12 | 東レ株式会社 | Transparent conductive film |
| JPS60134215A (en) * | 1983-12-23 | 1985-07-17 | Sumitomo Bakelite Co Ltd | Transparent conductive film |
-
1986
- 1986-03-05 JP JP61046402A patent/JPH077616B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62206704A (en) | 1987-09-11 |
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| Date | Code | Title | Description |
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| EXPY | Cancellation because of completion of term |