JPH0778601B2 - Method for producing silver halide photographic light-sensitive material - Google Patents
Method for producing silver halide photographic light-sensitive materialInfo
- Publication number
- JPH0778601B2 JPH0778601B2 JP63245818A JP24581888A JPH0778601B2 JP H0778601 B2 JPH0778601 B2 JP H0778601B2 JP 63245818 A JP63245818 A JP 63245818A JP 24581888 A JP24581888 A JP 24581888A JP H0778601 B2 JPH0778601 B2 JP H0778601B2
- Authority
- JP
- Japan
- Prior art keywords
- silver halide
- light
- sensitive material
- drying
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 silver halide Chemical class 0.000 title claims description 57
- 239000000463 material Substances 0.000 title claims description 47
- 229910052709 silver Inorganic materials 0.000 title claims description 42
- 239000004332 silver Substances 0.000 title claims description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000001035 drying Methods 0.000 claims description 50
- 239000000839 emulsion Substances 0.000 claims description 45
- 229920000642 polymer Polymers 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 238000001704 evaporation Methods 0.000 claims description 19
- 230000008020 evaporation Effects 0.000 claims description 19
- 229920002307 Dextran Polymers 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 125000005647 linker group Chemical group 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 46
- 238000000034 method Methods 0.000 description 40
- 108010010803 Gelatin Proteins 0.000 description 21
- 239000008273 gelatin Substances 0.000 description 21
- 229920000159 gelatin Polymers 0.000 description 21
- 235000019322 gelatine Nutrition 0.000 description 21
- 235000011852 gelatine desserts Nutrition 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 19
- 239000000243 solution Substances 0.000 description 18
- 239000000975 dye Substances 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 12
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 12
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 206010070834 Sensitisation Diseases 0.000 description 10
- 239000000084 colloidal system Substances 0.000 description 10
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 10
- 230000008313 sensitization Effects 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 7
- 230000009467 reduction Effects 0.000 description 6
- 229910001961 silver nitrate Inorganic materials 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000011593 sulfur Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000003945 anionic surfactant Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000004816 latex Substances 0.000 description 4
- 229920000126 latex Polymers 0.000 description 4
- 239000002736 nonionic surfactant Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 230000005070 ripening Effects 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 3
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical class [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical class [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- QKUGKZFASYQCGO-SREVYHEPSA-N (z)-4-oxo-4-phenylmethoxybut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCC1=CC=CC=C1 QKUGKZFASYQCGO-SREVYHEPSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- FPQUEAOPHRFJGH-UHFFFAOYSA-M 1-(3-phenylprop-1-enyl)pyridin-1-ium;chloride Chemical compound [Cl-].C=1C=CC=CC=1CC=C[N+]1=CC=CC=C1 FPQUEAOPHRFJGH-UHFFFAOYSA-M 0.000 description 1
- FYBFGAFWCBMEDG-UHFFFAOYSA-N 1-[3,5-di(prop-2-enoyl)-1,3,5-triazinan-1-yl]prop-2-en-1-one Chemical compound C=CC(=O)N1CN(C(=O)C=C)CN(C(=O)C=C)C1 FYBFGAFWCBMEDG-UHFFFAOYSA-N 0.000 description 1
- GKQHIYSTBXDYNQ-UHFFFAOYSA-M 1-dodecylpyridin-1-ium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+]1=CC=CC=C1 GKQHIYSTBXDYNQ-UHFFFAOYSA-M 0.000 description 1
- BDHGFCVQWMDIQX-UHFFFAOYSA-N 1-ethenyl-2-methylimidazole Chemical compound CC1=NC=CN1C=C BDHGFCVQWMDIQX-UHFFFAOYSA-N 0.000 description 1
- ZBHBIODEONVIMN-UHFFFAOYSA-N 1-phenyl-2h-tetrazole-5-thione;silver Chemical compound [Ag].S=C1N=NNN1C1=CC=CC=C1 ZBHBIODEONVIMN-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- OPOJRMTZHYUKLY-UHFFFAOYSA-N 1h-1,3,5-triazin-2-one Chemical compound O=C1N=CN=CN1 OPOJRMTZHYUKLY-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
- YKUDHBLDJYZZQS-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one Chemical compound OC1=NC(Cl)=NC(Cl)=N1 YKUDHBLDJYZZQS-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- DZLJLBZTQLMSJZ-UHFFFAOYSA-N 2-(trimethylazaniumyl)hexanoate Chemical compound CCCCC(C([O-])=O)[N+](C)(C)C DZLJLBZTQLMSJZ-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- GPOGMJLHWQHEGF-UHFFFAOYSA-N 2-chloroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCl GPOGMJLHWQHEGF-UHFFFAOYSA-N 0.000 description 1
- AEPWOCLBLLCOGZ-UHFFFAOYSA-N 2-cyanoethyl prop-2-enoate Chemical compound C=CC(=O)OCCC#N AEPWOCLBLLCOGZ-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- IXPWKHNDQICVPZ-UHFFFAOYSA-N 2-methylhex-1-en-3-yne Chemical compound CCC#CC(C)=C IXPWKHNDQICVPZ-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- VAPQAGMSICPBKJ-UHFFFAOYSA-N 2-nitroacridine Chemical compound C1=CC=CC2=CC3=CC([N+](=O)[O-])=CC=C3N=C21 VAPQAGMSICPBKJ-UHFFFAOYSA-N 0.000 description 1
- GYXGAEAOIFNGAE-UHFFFAOYSA-N 2-propan-2-ylidenebutanedioic acid Chemical compound CC(C)=C(C(O)=O)CC(O)=O GYXGAEAOIFNGAE-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- PHBQDVOLZRHPOJ-UHFFFAOYSA-N 3-ethenylsulfonyl-n-[(3-ethenylsulfonylpropanoylamino)methyl]propanamide Chemical compound C=CS(=O)(=O)CCC(=O)NCNC(=O)CCS(=O)(=O)C=C PHBQDVOLZRHPOJ-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- NYYSPVRERVXMLJ-UHFFFAOYSA-N 4,4-difluorocyclohexan-1-one Chemical compound FC1(F)CCC(=O)CC1 NYYSPVRERVXMLJ-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- LUHCBWDNSKIADE-UHFFFAOYSA-M 4-methylbenzenesulfonate;triethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.CC[N+](CC)(CC)CCOC(=O)C(C)=C LUHCBWDNSKIADE-UHFFFAOYSA-M 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101710095468 Cyclase Proteins 0.000 description 1
- 229920002085 Dialdehyde starch Polymers 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 1
- 235000002595 Solanum tuberosum Nutrition 0.000 description 1
- 244000061456 Solanum tuberosum Species 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- SRNKZYRMFBGSGE-UHFFFAOYSA-N [1,2,4]triazolo[1,5-a]pyrimidine Chemical compound N1=CC=CN2N=CN=C21 SRNKZYRMFBGSGE-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000007718 adhesive strength test Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910001963 alkali metal nitrate Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- FWZUNOYOVVKUNF-UHFFFAOYSA-N allyl acetate Chemical group CC(=O)OCC=C FWZUNOYOVVKUNF-UHFFFAOYSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- OIDPCXKPHYRNKH-UHFFFAOYSA-J chrome alum Chemical compound [K]OS(=O)(=O)O[Cr]1OS(=O)(=O)O1 OIDPCXKPHYRNKH-UHFFFAOYSA-J 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- OOCCDEMITAIZTP-UHFFFAOYSA-N cinnamyl alcohol Chemical compound OCC=CC1=CC=CC=C1 OOCCDEMITAIZTP-UHFFFAOYSA-N 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 235000019646 color tone Nutrition 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZSKAXRGRRXCFGC-UHFFFAOYSA-M diethyl-methyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.CC[N+](C)(CC)CCOC(=O)C(C)=C ZSKAXRGRRXCFGC-UHFFFAOYSA-M 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- SAIGUZYNPDJAHY-UHFFFAOYSA-N ethane;2-ethenylsulfonylacetamide Chemical compound CC.NC(=O)CS(=O)(=O)C=C SAIGUZYNPDJAHY-UHFFFAOYSA-N 0.000 description 1
- PWHMFVALYNYYMZ-UHFFFAOYSA-N ethenyl phenylmethanesulfonate;sodium Chemical compound [Na].C=COS(=O)(=O)CC1=CC=CC=C1 PWHMFVALYNYYMZ-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000004693 imidazolium salts Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical class [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002545 isoxazoles Chemical class 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- RODAXCQJQDMNSH-UHFFFAOYSA-N n-[4-(diethylamino)-6-(hydroxyamino)-1,3,5-triazin-2-yl]hydroxylamine Chemical compound CCN(CC)C1=NC(NO)=NC(NO)=N1 RODAXCQJQDMNSH-UHFFFAOYSA-N 0.000 description 1
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000004957 nitroimidazoles Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- IZWPGJFSBABFGL-GMFCBQQYSA-M sodium;2-[methyl-[(z)-octadec-9-enoyl]amino]ethanesulfonate Chemical compound [Na+].CCCCCCCC\C=C/CCCCCCCC(=O)N(C)CCS([O-])(=O)=O IZWPGJFSBABFGL-GMFCBQQYSA-M 0.000 description 1
- XESUCHPMWXMNRV-UHFFFAOYSA-M sodium;2-ethenylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1C=C XESUCHPMWXMNRV-UHFFFAOYSA-M 0.000 description 1
- SONHXMAHPHADTF-UHFFFAOYSA-M sodium;2-methylprop-2-enoate Chemical compound [Na+].CC(=C)C([O-])=O SONHXMAHPHADTF-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- BZHOWMPPNDKQSQ-UHFFFAOYSA-M sodium;sulfidosulfonylbenzene Chemical compound [Na+].[O-]S(=O)(=S)C1=CC=CC=C1 BZHOWMPPNDKQSQ-UHFFFAOYSA-M 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 230000003637 steroidlike Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
- G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、ハロゲン化銀写真感光材料の製造方法に関す
るものであり、特にアクリルアミド系重合体及び/又は
デキストランがバインダー中に添加された系で支持体と
の接着力が改良された写真感光材料の製造方法に関する
ものである。TECHNICAL FIELD The present invention relates to a method for producing a silver halide photographic light-sensitive material, particularly in a system in which an acrylamide polymer and / or dextran is added to a binder. The present invention relates to a method for producing a photographic light-sensitive material having improved adhesion to a support.
(従来技術) ハロゲン化銀写真感光材料は、ゼラチン等のバインダー
中にハロゲン化銀粒子が分散されており、さらにさまざ
まな目的で各種化合物が添加、混合されている。従来
は、写真性能を向上させるためにハロゲン化銀粒子を改
良したり、新しい有用な化合物を添加することが多く行
なわれた。最近さらにバインダーの性質をかえる化合物
を添加して性能を向上させる技術がいくつか見られるよ
うになつた。例えば、特開昭61-69061に示されるように
銀を減らし高感度を得る方法、特開昭63-68837に示され
るように迅速現像処理を可能にする方法、また、特願昭
63-90908にあるような乾燥ムラ改良等が上げられよう。(Prior Art) In a silver halide photographic light-sensitive material, silver halide grains are dispersed in a binder such as gelatin, and various compounds are added and mixed for various purposes. Heretofore, silver halide grains have often been improved or new useful compounds have been added to improve photographic performance. Recently, some techniques for improving the performance by adding a compound that changes the properties of the binder have been found. For example, as disclosed in JP-A-61-69061, a method of reducing silver to obtain high sensitivity, a method of enabling rapid development processing as disclosed in JP-A-63-68837, and Japanese Patent Application No.
Improvements in drying unevenness such as those in 63-90908 could be raised.
このように乳剤層などの親水性コロイド層に重合体を添
加することには、さまざまな有効な性質があることがわ
かつているが、これら化合物を添加することによるデメ
リツトもある。そのひとつが、支持体と親水性コロイド
層との接着が悪くなるというデメリツトがあり、添加量
を少く設定し問題とならないようにしていたというのが
実状である。It has been known that the addition of the polymer to the hydrophilic colloid layer such as the emulsion layer has various effective properties as described above, but there is a demerit due to the addition of these compounds. One of them is the demerit that the adhesion between the support and the hydrophilic colloid layer is poor, and the fact is that the addition amount was set small so as not to cause a problem.
(本発明の目的) 本発明の目的は、ポリアクリルアミドに代表される重合
体または/およびデキストランをゼラチンバインダー中
に添加した場合に問題となる支持体との接着力が実質的
に問題とならないハロゲン化銀感光材料の製造方法を提
供することである。(Object of the present invention) An object of the present invention is to provide a halogen in which adhesion to a support, which is a problem when a polymer typified by polyacrylamide or / and dextran is added to a gelatin binder, is not substantially a problem. It is an object of the present invention to provide a method for producing a silver halide photosensitive material.
(本発明の構成) 本発明者は、支持体上に少なくとも1層のハロゲン化銀
乳剤層を有するハロゲン化銀感光材料において、該ハロ
ゲン化銀乳剤層もしくはその近傍の非感光性層に下記一
般式(I)であらわされる繰り返し単位を含む重合体お
よび/またはデキストランを含有する写真感光材料の製
造方法において、これらの層の塗布乾燥工程の恒率乾燥
期間において、蒸発成分の平均減少速度(蒸発速度)が
この期間全体で35g/m2・分以上となるように高速乾燥を
することで目的が達せられることを見い出した。(Structure of the present invention) The present inventor has found that in a silver halide light-sensitive material having at least one silver halide emulsion layer on a support, the silver halide emulsion layer or a non-light-sensitive layer in the vicinity of In a method for producing a photographic light-sensitive material containing a polymer containing a repeating unit represented by the formula (I) and / or dextran, the average reduction rate of evaporation components (evaporation) during the constant rate drying period in the coating / drying step of these layers. It was found that the purpose can be achieved by performing high speed drying so that the speed) is 35 g / m 2 · min or more over this period.
一般式(I) 式中R1は水素原子又は炭素数1〜6個のアルキル基を、
R2、R3はそれぞれ水素原子、炭素数10個以下の置換又は
無置換のアルキル基、アリール基またはアラルキル基を
表わし、同じであつても異なつてもよい。また、R2、R3
が互に結合し、窒素原子と共に含窒素複素環を形成して
も良い。Lは2価の連結基である。nは0または1であ
り、mは1または2である。General formula (I) In the formula, R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
R 2 and R 3 each represent a hydrogen atom, a substituted or unsubstituted alkyl group having 10 or less carbon atoms, an aryl group or an aralkyl group, and may be the same or different. Also, R 2 , R 3
May be bonded to each other to form a nitrogen-containing heterocycle with the nitrogen atom. L is a divalent linking group. n is 0 or 1, and m is 1 or 2.
一般式(I)においてR1は水素原子又は炭素数1〜6個
のアルキル基を表わし、水素原子、メチル基が好まし
い。In formula (I), R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom or a methyl group.
R2、R3はそれぞれ水素原子、炭素数10個以下の置換又は
無置換のアルキル基、アリール基またはアラルキル基を
表わし、同じであつても異なつてもよい。置換基として
は、水酸基、低級アルコキシ基、ハロゲン原子、アミド
基、シアノ基、スルホン酸基、カルボン酸基、などを挙
げることができる。R2、R3は水素原子、メチル基、エチ
ル基及びフエニル基が好ましく、そのうち水素原子が最
も好ましい。R 2 and R 3 each represent a hydrogen atom, a substituted or unsubstituted alkyl group having 10 or less carbon atoms, an aryl group or an aralkyl group, and may be the same or different. Examples of the substituent include a hydroxyl group, a lower alkoxy group, a halogen atom, an amide group, a cyano group, a sulfonic acid group, a carboxylic acid group and the like. R 2 and R 3 are preferably a hydrogen atom, a methyl group, an ethyl group or a phenyl group, of which a hydrogen atom is most preferred.
Lは2価の連結基を表わし、その例として炭素数1〜10
個のアルキレン基、アリーレン基あるいはそれらとエー
テル結合、エステル結合、アミド結合などを組みあわせ
て得られる2価基があげられる。L represents a divalent linking group, for example, having 1 to 10 carbon atoms.
Examples thereof include an alkylene group, an arylene group, and a divalent group obtained by combining them with an ether bond, an ester bond, an amide bond or the like.
nは0または1を表わし、0が好ましい。n represents 0 or 1, and 0 is preferable.
mは1または2を表わし、1が好ましい。m represents 1 or 2, and 1 is preferable.
一般式(I)で表わされる繰り返し単位を構成するエチ
レン性不飽和モノマーのうち、好ましいものの具体例を
下に挙げる。Among the ethylenically unsaturated monomers constituting the repeating unit represented by the general formula (I), specific examples of preferable ones are shown below.
一般式(I)で表わされる繰り返し単位は重合体として
複合機能を発揮させるために二種類以上のモノマー単位
を含んでいても良い。 The repeating unit represented by the general formula (I) may contain two or more kinds of monomer units in order to exhibit a composite function as a polymer.
本発明における高分子重合体は一般式(I)で表わされ
るモノマーをポリマー構成単位として70モル%以上好ま
しくは80モル%以上さらに好ましくは90モル%以上含む
下記一般式(II)で表わされる化合物である。The high molecular weight polymer in the present invention is a compound represented by the following general formula (II) containing a monomer represented by the general formula (I) as a polymer constitutional unit in an amount of 70 mol% or more, preferably 80 mol% or more, more preferably 90 mol% or more. Is.
式中xはモル百分率を表わし、xは70ないし100が好ま
しい。 In the formula, x represents a mole percentage, and x is preferably 70 to 100.
式中Aは共重合可能なエチレン性不飽和モノマーを共重
合したモノマー単位を表わす。In the formula, A represents a monomer unit obtained by copolymerizing a copolymerizable ethylenically unsaturated monomer.
本発明の好ましい重合体におけるエチレン性不飽和モノ
マーの例は、エチレン、プロピレン、1−ブテン、イソ
ブテン、スチレン、クロロメチルスチレン、ヒドロキシ
メチルスチレン、ビニルベンゼンスルホン酸ソーダ、ビ
ニルベンジルスルホン酸ソーダ、N,N,N,−トリメチル−
N−ビニルベンジルアンモニウムクロライド、N,N−ジ
メチル−N−ベンジル−N−ビニルベンジルアンモニウ
ムクロライド、α−メチルスチレン、ビニルトルエン、
4−ビニルピリジン、2−ビニルピリジン、ベンジルビ
ニルピリジニウムクロライド、N−ビニルアセトアミ
ド、N−ビニルピロリドン、1−ビニル−2−メチルイ
ミダゾール、脂肪族酸のモノエチレン性不飽和エステル
(例えば酢酸ビニル、酢酸アリル)、エチレン性不飽和
のモノカルボン酸もしくはジカルボン酸およびその塩
(例えばアクリル酸、メタクリル酸、イタコン酸、マレ
イン酸、アクリル酸ソーダ、アクリル酸カリウム、メタ
クリル酸ソーダ)、無水マレイン酸、エチレン性不飽和
のモノカルボン酸もしくはジカルボン酸のエステル(例
えばn−ブチルアクリレート、n−ヘキシルアクリレー
ト、ヒドロキシエチルアクリレート、シアノエチルアク
リレート、N,N−ジエチルアミノエチルアクリレート、
メチルメタクリレート、n−ブチルメタクリレート、ベ
ンジルメタクリレート、ヒドロキシエチルメタクリレー
ト、クロロエチルメタクリレート、メトキシエチルメタ
クリレート、N,N−ジエチルアミノエチルメタクリレー
ト、N,N,N−トリエチル−N−メタクリロイルオキシエ
チルアンモニウムp−トルエンスルホナート、N,N−ジ
エチル−N−メチル−N−メタクリロイルオキシエチル
アンモニウムp−トルエンスルホナート、イタコン酸ジ
メチル、マレイン酸モノベンジルエステル)、などの他
に、特開昭56-151937、特開昭57-104927、特開昭56-142
524などに開示されているゼラチン反応性のモノマーな
どがある。また本発明の重合体は、複合機能を発揮させ
るために、Aとして二種以上のモノマー単位を含んでい
てもよい。Examples of the ethylenically unsaturated monomer in the preferred polymer of the present invention include ethylene, propylene, 1-butene, isobutene, styrene, chloromethylstyrene, hydroxymethylstyrene, sodium vinylbenzenesulfonate, sodium vinylbenzylsulfonate, N, N, N, -trimethyl-
N-vinylbenzylammonium chloride, N, N-dimethyl-N-benzyl-N-vinylbenzylammonium chloride, α-methylstyrene, vinyltoluene,
4-vinylpyridine, 2-vinylpyridine, benzylvinylpyridinium chloride, N-vinylacetamide, N-vinylpyrrolidone, 1-vinyl-2-methylimidazole, monoethylenically unsaturated ester of aliphatic acid (eg vinyl acetate, acetic acid Allyl), ethylenically unsaturated monocarboxylic acid or dicarboxylic acid and salts thereof (eg acrylic acid, methacrylic acid, itaconic acid, maleic acid, sodium acrylate, potassium acrylate, sodium methacrylate), maleic anhydride, ethylenic Unsaturated esters of monocarboxylic or dicarboxylic acids (eg n-butyl acrylate, n-hexyl acrylate, hydroxyethyl acrylate, cyanoethyl acrylate, N, N-diethylaminoethyl acrylate,
Methyl methacrylate, n-butyl methacrylate, benzyl methacrylate, hydroxyethyl methacrylate, chloroethyl methacrylate, methoxyethyl methacrylate, N, N-diethylaminoethyl methacrylate, N, N, N-triethyl-N-methacryloyloxyethylammonium p-toluenesulfonate , N, N-diethyl-N-methyl-N-methacryloyloxyethylammonium p-toluenesulfonate, dimethyl itaconic acid, maleic acid monobenzyl ester), and the like, and JP-A-56-151937 and JP-A-57157937. -104927, JP-A-56-142
Examples include gelatin-reactive monomers disclosed in 524 and the like. Further, the polymer of the present invention may contain two or more kinds of monomer units as A in order to exert a composite function.
本発明における重合体の好ましい化合物例としては以下
のものが挙げられる。(重合度の数字はモル百分率をあ
らわす。) 本発明において写真乳剤層に添加する一般式(I)で表
わされる繰り返し単位を有する重合体は重量平均分子量
(w)が5,000から200,000好ましくは7,000から100,0
00、更に好ましくは15,000から70,000のものが良い。Examples of preferable compounds of the polymer in the invention include the following. (The number of degree of polymerization represents the mole percentage.) In the present invention, the polymer having a repeating unit represented by the general formula (I) added to the photographic emulsion layer has a weight average molecular weight (w) of 5,000 to 200,000, preferably 7,000 to 100,0.
00, and more preferably 15,000 to 70,000.
かかる重合体の添加量は任意の量を選ぶことが出来る。The addition amount of such a polymer can be selected arbitrarily.
本発明において写真乳剤層に添加するデキストランは、
ロイコノストツク、メゼンテロイデス等のデキストラン
生産菌、またはこれらの菌の培養液より分離したデキス
トランシユクラーゼを蔗糖液に作用して得られるネイテ
イブデキストランを酸、アルカリ、酵素による部分分解
重合法によつて分子量を低下させたものである。本発明
に用いるデキストランの重量平均分子量は5,000から30
0,000、好ましくは10,000から100,000、更に好ましくは
20,000から70,000である。Dextran added to the photographic emulsion layer in the present invention is
Leuconostok, dextran-producing bacteria such as Mesenteroides, or native dextran obtained by acting dextran cyclase isolated from the culture solution of these bacteria on the sucrose solution is treated with acid, alkali or enzyme to determine the molecular weight. It has been lowered. The weight average molecular weight of dextran used in the present invention is 5,000 to 30.
0,000, preferably 10,000 to 100,000, more preferably
20,000 to 70,000.
本発明に用いる一般式(I)で表わされる繰り返し単位
を有する重合体および/またはデキストランは写真乳剤
中の全バインダーの3〜50重量%とりわけ、5〜30重量
%になるように添加するのが好ましい。The polymer having a repeating unit represented by the general formula (I) and / or dextran used in the present invention is added in an amount of 3 to 50% by weight, particularly 5 to 30% by weight, based on the total binder in the photographic emulsion. preferable.
本発明において用いる重合体を含有せしめる写真乳剤は
どの層でも良い。The photographic emulsion containing the polymer used in the present invention may be in any layer.
もちろん写真乳剤層に隣接する非光光性ゼラチン層にも
本発明の重合体を含有せしめても良い。Of course, the non-light-sensitive gelatin layer adjacent to the photographic emulsion layer may also contain the polymer of the present invention.
本発明の重合体を写真材料の各層に添加する場合には隣
接する層との重合体/添加層のバインダー比率が著しく
かけ離れない様にすることが好ましい。When the polymer of the present invention is added to each layer of the photographic material, it is preferable that the binder ratio of the polymer / addition layer with respect to the adjacent layer is not significantly different.
本発明の重合体を非感光性ゼラチン最外層に添加しても
よく、その場合には、該最外層の重合体密度(本発明に
おいて用いる重合体の重量/重合体を添加した層のバイ
ンダー重量)は他の写真材料のどの層よりも小さいこと
が好ましい。The polymer of the present invention may be added to the outermost non-photosensitive gelatin layer, in which case the polymer density of the outermost layer (weight of the polymer used in the present invention / binder weight of the layer to which the polymer is added is ) Is preferably smaller than any other layer of photographic material.
該重合体を乳剤に加える時期はいつでも良いが、第2熟
成後塗布前に加えるのが適当である。The polymer may be added to the emulsion at any time, but it is suitable to add it after the second ripening and before coating.
該重合体は粉末として加えても良いが、5〜20%水溶液
として用いるのが便利である。The polymer may be added as a powder, but it is convenient to use it as a 5-20% aqueous solution.
本発明に使用するバインダーとしては通常使用されるゼ
ラチンをあげることができる。例えば、石灰処理ゼラチ
ン、酸処理ゼラチンあるいは酵素処理ゼラチンを用いて
もよく、またゼラチン加水分解物を用いてもよい。Examples of the binder used in the present invention include commonly used gelatin. For example, lime-processed gelatin, acid-processed gelatin or enzyme-processed gelatin may be used, or a gelatin hydrolyzate may be used.
本発明に用いられる感光性ハロゲン化銀乳剤のハロゲン
化銀としては塩臭化銀、臭化銀、沃臭化銀、塩沃臭化銀
を用いることができるが好ましくは沃臭化銀が用いられ
る。ここで沃化銀の含量は好ましくは30モル%以下、特
に10モル%以下の範囲であることが好ましい。沃臭化銀
粒子中の沃素の分布は均一でもよく又、内部と表面とで
異なつていてもよい。平均粒子サイズは0.2μm以上で
あることが好ましい。特に0.4〜2.0であることが好まし
い。粒子サイズ分布は狭くても広くてもいずれでもよ
い。As the silver halide of the photosensitive silver halide emulsion used in the present invention, silver chlorobromide, silver bromide, silver iodobromide and silver chloroiodobromide can be used, but silver iodobromide is preferably used. To be Here, the content of silver iodide is preferably 30 mol% or less, and particularly preferably 10 mol% or less. The distribution of iodine in the silver iodobromide grains may be uniform, or may be different between the inside and the surface. The average particle size is preferably 0.2 μm or more. It is particularly preferably 0.4 to 2.0. The particle size distribution may be narrow or wide.
乳剤中のハロゲン化銀粒子は立方体、8面体、14面体、
菱12面体のような規則的(regular)な結晶形を有する
ものでもよく、また球状、板状、じやがいも状などのよ
うな変則的(irregular)な結晶形を有するものでも或
いはこれらの結晶形の複合形を有するものでもよい、種
々の結晶形の粒子の混合から成つてもよい。また粒子径
が粒子厚みの5倍以上の平板粒子は、本発明に対し好ま
しく用いられる(詳しくは、RESEARCH DISCLOSURE 225
巻 Item 22534P.20〜P.58、1月号、1983年、及び特開
昭58-127921号、同58-113926号公報に記されている)。The silver halide grains in the emulsion are cubic, octahedral, tetrahedral,
It may have a regular crystal form such as a rhombodecahedron, or may have an irregular crystal form such as a sphere, a plate, a string or a potato, or the like. It may consist of a mixture of grains of different crystalline forms, which may have a composite form of crystalline forms. Further, tabular grains having a grain size of 5 times the grain thickness or more are preferably used in the present invention (specifically, RESEARCH DISCLOSURE 225
Volume Item 22534 P.20 to P.58, January issue, 1983, and JP-A-58-127921 and 58-113926).
本発明において、感光性ハロゲン化銀乳剤は、2種類以
上のハロゲン化銀乳剤を混合して用いてもよい。混合す
る乳剤の粒子サイズ・ハロゲン組成・感度・等が異なっ
ていてもよい。感光性乳剤に実質的に非感光性の乳剤
(表面あるいは内部がかぶつていてもよいし、いなくて
もよい)を混合して用いてもよいし、別の層に分けても
よい(詳しくは米国特許2,996,382号、同3,397,987号な
どに記載されている)。例えば、球状もしくはじやがい
も状の感光性乳剤と粒子径が粒子厚みの5倍以上の平板
粒子からなる感光性ハロゲン化銀乳剤と同一層もしくは
特開昭58-127921号公報に記載の如く異なつた層に用い
てもよい。異なつた層に用いる時、平板粒子からなる感
光性ハロゲン化銀乳剤は支持体に近い側にあつてもよい
し、逆に遠い側にあつてもよい。In the present invention, the photosensitive silver halide emulsion may be a mixture of two or more kinds of silver halide emulsions. The emulsions to be mixed may differ in grain size, halogen composition, sensitivity, etc. The light-sensitive emulsion may be used as a mixture of a substantially non-light-sensitive emulsion (the surface or inside may or may not be fogged), or it may be divided into different layers ( Details are described in US Pat. Nos. 2,996,382 and 3,397,987). For example, in the same layer as a light-sensitive silver halide emulsion comprising a spherical or jelly-shaped light-sensitive emulsion and tabular grains having a grain size of 5 times or more the grain thickness, or as described in JP-A-58-127921. It may be used for different layers. When used in different layers, the light-sensitive silver halide emulsion consisting of tabular grains may be on the side closer to the support or conversely on the side farther from the support.
本発明に用いられる写真乳剤はP.Glafkides著Chimie et
Phisique Photographique(Paul Montel社刊、1967
年)、G.F.Duffin著Photographic Emulsion Chemistry
(The Focal Press刊、1966年)、V.L.Zelikman et al
著Making and Coting Photographic Emulsion(The Foc
al Press刊、1964年)、特開昭58-127921号及び同58-11
3926号公報などに記載された方法を用いて調整すること
ができる。すなわち、酸性法、中性法、アンモニア法等
のいずれでもよく、また可溶性銀塩と可溶性ハロゲン塩
を反応させる形式としては片側混合法、同時混合法、そ
れらの組合せなどのいずれを用いてもよい。The photographic emulsion used in the present invention is described by P. Glafkides, Chimie et.
Phisique Photographique (published by Paul Montel, 1967
), GF Duffin Photographic Emulsion Chemistry
(The Focal Press, 1966), VLZelikman et al
By Making and Coting Photographic Emulsion (The Foc
al Press, 1964), JP-A-58-127921 and 58-11.
It can be adjusted using the method described in Japanese Patent No. 3926 or the like. That is, any of an acidic method, a neutral method, an ammonia method and the like may be used, and as a method of reacting a soluble silver salt and a soluble halogen salt, any of a one-sided mixing method, a simultaneous mixing method and a combination thereof may be used. .
ハロゲン化銀粒子を銀イオン過剰の下において形成させ
る方法(いわゆる逆混合法)を用いることもできる。同
時混合法の一つの形式としてハロゲン化銀の生成される
液相中のpAgを一定に保つ方法、すなわちいわゆるコン
トロールド・ダブルジエツト法を用いることもできる。
この方法によると、結晶形が規則的で粒子サイズが均一
に近いハロゲン化銀粒子よりなるハロゲン化銀乳剤がえ
られる。It is also possible to use a method of forming silver halide grains in the presence of excess silver ions (so-called reverse mixing method). As one form of the double jet method, a method of keeping pAg constant in a liquid phase in which silver halide is produced, that is, a so-called controlled double jet method can be used.
According to this method, a silver halide emulsion comprising silver halide grains having a regular crystal form and a substantially uniform grain size can be obtained.
ハロゲン化銀粒子の結晶構造は内部まで一様なものであ
つても、また内部と外部が異質の層状構造をしたもの
や、英国特許635,841号、米国特許3,622,318号に記載さ
れているような、いわゆるコンバージヨン型のものであ
つてもよい。又エピタキシヤル接合によつて組成の異な
るハロゲン化銀が接合されていてもよく、また例えばロ
ダン銀、酸化銀以外の化合物と接合されていてもよい。
又表面潜像型であつても内部潜像型であつてもどちらで
もよい。ハロゲン化銀製造時のハロゲン化銀粒子形成ま
たは物理熟成の過程において、カドミウム塩、亜鉛塩、
鉛塩、タリウム塩、イリジウム塩またはその錯塩、ロジ
ウム塩またはその錯塩、鉄塩または鉄錯塩などを共存さ
せてもよい。Even if the crystal structure of the silver halide grains is uniform to the inside, it also has a layered structure in which the inside and the outside are heterogeneous, as described in British Patent 635,841 and U.S. Patent 3,622,318, It may be a so-called conversion type. Further, silver halides having different compositions may be bonded by epitaxial bonding, or may be bonded with a compound other than silver rhodanide and silver oxide, for example.
Further, it may be either a surface latent image type or an internal latent image type. In the process of silver halide grain formation or physical ripening during the production of silver halide, cadmium salt, zinc salt,
A lead salt, a thallium salt, an iridium salt or a complex salt thereof, a rhodium salt or a complex salt thereof, an iron salt, an iron complex salt or the like may coexist.
また、粒子形成時にはアンモニア、チオエーテル化合
物、チアゾリジン−2−チオン、四置換チオ尿素、ロダ
ンカリ、ロダンアンモン、アミン化合物の如きいわゆる
ハロゲン化銀溶剤を存在せしめ粒子成長をコントロール
してもよい。During grain formation, so-called silver halide solvents such as ammonia, thioether compounds, thiazolidine-2-thione, tetra-substituted thioureas, rhodancali, rhodammone and amine compounds may be present to control grain growth.
本発明に用いられるハロゲン化銀乳剤は化学増感されて
いても、されていなくてもよい。化学増感の方法として
は硫黄増感法、還元増感法、金増感法などの知られてい
る方法を用いることができ、単独または組合せで用いら
れる。The silver halide emulsion used in the present invention may or may not be chemically sensitized. As the chemical sensitization method, known methods such as a sulfur sensitization method, a reduction sensitization method and a gold sensitization method can be used, and they can be used alone or in combination.
貴金属増感法のうち金増感法はその代表的なもので金化
合物、主として金錯塩を用いる。金以外の貴金属、たと
えば白金、パラジウム、イリジウム等の錯塩を含有して
も差支えない。その具体例は米国特許2,448,060号、英
国特許618,061号などに記載されている。Among the noble metal sensitizing methods, the gold sensitizing method is a typical one, which uses a gold compound, mainly a gold complex salt. Noble metals other than gold, for example, complex salts of platinum, palladium, iridium, etc. may be contained. Specific examples thereof are described in US Pat. No. 2,448,060 and British Patent 618,061.
硫黄増感剤としては、ゼラチン中に含まれる硫黄化合物
のほか、種々の硫黄化合物、たとえばチオ硫酸塩、チオ
尿素類、チアゾール類、ローダニン類等を用いることが
できる。As the sulfur sensitizer, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanins and the like can be used in addition to the sulfur compounds contained in gelatin.
還元増感剤としては第一すず塩、アミン類、ホルムアミ
ジンスルフイン酸、シラン化合物などを用いることがで
きる。As the reduction sensitizer, a primary tin salt, amines, formamidine sulfinic acid, a silane compound or the like can be used.
本発明に用いられる写真乳剤には、感光材料の製造工
程、保存中あるいは写真処理中のカブリ防止し、あるい
は写真性能を安定化させる目的で、種々の化合物を含有
させることができる。すなわちアゾール類{例えばベン
ゾチアゾリウム塩、ニトロイミダゾール類、ニトロベン
ズイミダゾール類、クロロベンズイミダゾール類、ブロ
モベンズイミダゾール類、ニトロインダゾール類、ベン
ゾトリアゾール類、アミノトリアゾール類など};メル
カプト化合物類{例えばメルカプトトチアゾール類、メ
ルカプトベンゾチアゾール類、メルカプトベンズイミダ
ゾール類、メルカプトチアジアゾール類、メルカプトテ
トラゾール類(特に1−フエニル−5−メルカプトテト
ラゾール)、メルカプトピリミジン類、メルカプトトリ
アジン類など};例えばオキサドリンチオンのようなチ
オケト化合物;アザインデン類{例えばトリアザインデ
ン類、テトラアザインデン類(特に4−ヒドロキシ置換
(1,3,3a,7)テトラアザインデン類)、ペンタアザイン
デン類など};ベンゼンチオスルホン酸、ベンゼンスル
フイン酸、ベンゼンスルホン酸アミド等のようなカブリ
防止剤または安定剤として知られた、多くの化合物を加
えることができる。The photographic emulsion used in the present invention may contain various compounds for the purpose of preventing fog during the production process of the light-sensitive material, during storage or during photographic processing, or stabilizing photographic performance. That is, azoles {eg benzothiazolium salts, nitroimidazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, nitroindazoles, benzotriazoles, aminotriazoles, etc.); mercapto compounds {eg mercapto Tothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, mercaptotetrazoles (particularly 1-phenyl-5-mercaptotetrazole), mercaptopyrimidines, mercaptotriazines, etc.}; for example, oxadrinethione Thioketo compounds; azaindenes (eg triazaindenes, tetraazaindenes (particularly 4-hydroxy-substituted (1,3,3a, 7) tetraazaindenes), Such Taazainden such}; benzenethiosulfonate benzenesulfonic fins acid, known as antifoggants or stabilizers such as benzenesulfonic acid amide, can be added to many compounds.
具体的にはRESERCH DISCLOSURE Item17643VI項(1978年
12月号P.24〜P.25)に記載もしくは引用された文献に記
載されている。Specifically, RESERCH DISCLOSURE Item 17643 VI (1978
December issue, P.24 to P.25).
特に特開昭60-76743号、同60-87322号公報に記載のニト
ロン及びその誘導体、特開昭60-80839号公報に記載のメ
ルカプト化合物、特開昭57-164735号公報に記載のヘテ
ロ環化合物、及びヘテロ環化合物と銀の錯塩(例えば1
−フエニル−5−メルカプトテトラゾール銀)などを好
ましく用いることができる。Particularly, nitrones and their derivatives described in JP-A-60-76743 and JP-A-60-87322, mercapto compounds described in JP-A-60-80839, and heterocycles described in JP-A-57-164735. Compounds, and complex salts of silver with a heterocyclic compound (for example, 1
-Phenyl-5-mercaptotetrazole silver) and the like can be preferably used.
本発明の感光性ハロゲン化銀乳剤は、増感色素によつて
比較的長波長の青色光、緑色光、赤色光または赤外光に
分光増感されてもよい。増感色素として、シアニン色
素、メロシアニン色素、コンプレツクスシアニン色素、
コンプレツクスメロシアニン色素、ホロホーラーシアニ
ン色素、スチリル色素、ヘミシアニン色素、オキソノー
ル色素、ヘミオキソノール色素等を用いることができ
る。The photosensitive silver halide emulsion of the present invention may be spectrally sensitized by a sensitizing dye to blue light, green light, red light or infrared light having a relatively long wavelength. As sensitizing dyes, cyanine dyes, merocyanine dyes, complex cyanine dyes,
Complex merocyanine dyes, holoholer cyanine dyes, styryl dyes, hemicyanine dyes, oxonol dyes, hemioxonol dyes and the like can be used.
本発明に使用される有用な増感色素は例えばRESERCH DI
SCLOSURE Item17643IV-A項(1978年12月P.23)、同Item
18431X項(1979年8月P.437)に記載もしくは引用され
た文献に記載されている。Useful sensitizing dyes used in the present invention are, for example, RESERCH DI
SCLOSURE Item 17643IV-A Item (P.23, December 1978), Item
18431X (P.437, August 1979) or cited.
ここで増感色素は写真乳剤の製造工程のいかなる工程に
存在させて用いることもできるし、製造後塗布直前まで
のいかなる段階に存在させることもできる。前者の例と
しては、ハロゲン化銀粒子形成工程、物理熟成工程、化
学熟成工程などである。Here, the sensitizing dye can be used by being present in any step of the production process of the photographic emulsion, or can be present in any stage after production until immediately before coating. Examples of the former include a silver halide grain forming step, a physical ripening step and a chemical ripening step.
本発明の感光材料の写真乳剤層または他の親水性コロイ
ド層には塗布助剤、帯電防止、スベリ性改良、乳化分
散、接着防止及び写真特性改良(例えば、現像促進、硬
調化、増感)等種々の目的で、種々の界面活性剤を含ん
でもよい。For the photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention, a coating aid, antistatic, slip property improvement, emulsion dispersion, adhesion prevention and photographic property improvement (for example, development acceleration, contrast enhancement, sensitization). Various surfactants may be included for various purposes such as.
例えばサポニン(ステロイド系)、糖のアルキルエステ
ル類などの非イオン性界面活性剤;アルキルスルフオン
酸塩、アルキルベンゼンスルフオン酸塩、アルキルナフ
タレンスルフオン酸塩、アルキル硫酸エステル類、N−
アシル−N−アルキルタウリン類、スルホコハク酸エス
テル類、スルホアルキルポリオキシエチレンアルキルフ
エニルエーテル類などのアニオン界面活性剤;アルキル
ベタイン類、アルキルスルホベタイン類などの両性界面
活性剤;脂肪族あるいは芳香族第4級アンモニウム塩
類、ピリジニウム塩類、イミダゾリウム塩類などのカチ
オン界面活性剤を用いることができる。この内、サポニ
ン、ドデシルベンゼンスルホン酸Na塩、ジ・2・エチル
ヘキシルα−スルホコハク酸Na塩、p−オクチルフエノ
キシエトキシエトキシエタンスルホン酸Na塩、ドデシル
硫酸Na塩、トリイソプロピルナフタレンスルホン酸Na
塩、N−メチル−オレオイルタウリンNa塩、等のアニオ
ン、ドデシルトリメチルアンモニウムクロライド、N−
オレオイル−N′,N′,N′−トリメチルアンモニオジア
ミノプロパンブロマイド、ドデシルピリジウムクロライ
ドなどのカチオン、N−ドデシル−N,N−ジメチルカル
ボキシベタイン、N−オレオイル−N,N−ジメチルスル
ホブチルベタインなどのベタインを特に好ましく用いる
ことができる。For example, saponin (steroidal), nonionic surfactants such as alkyl esters of sugars; alkyl sulfonates, alkyl benzene sulfonates, alkyl naphthalene sulfonates, alkyl sulfates, N-
Anionic surfactants such as acyl-N-alkyl taurines, sulfosuccinates, sulfoalkyl polyoxyethylene alkylphenyl ethers; amphoteric surfactants such as alkyl betaines, alkyl sulfobetaines; aliphatic or aromatic Cationic surfactants such as quaternary ammonium salts, pyridinium salts and imidazolium salts can be used. Of these, saponin, sodium dodecylbenzene sulfonate, di-2-ethylhexyl α-sulfosuccinic acid Na salt, p-octylphenoxyethoxyethoxyethaneethanesulfonic acid Na salt, dodecyl sulfate Na salt, triisopropylnaphthalene sulfonic acid Na
Salt, anion such as N-methyl-oleoyl taurine Na salt, dodecyltrimethylammonium chloride, N-
Oleoyl-N ', N', N'-trimethylammoniodiaminopropane bromide, cations such as dodecylpyridinium chloride, N-dodecyl-N, N-dimethylcarboxybetaine, N-oleoyl-N, N-dimethylsulfone Betaine such as butyl betaine can be particularly preferably used.
帯電防止剤としては、パーフルオロオクタンスルホン酸
K塩、N−プロピル−N−パーフルオロオクタンスルホ
ニルグリシンNa塩、N−プロピル−N−パーフルオロオ
クタンスルホニルアミノエチルオキシポリ(n=3)オ
キシエチレンブタンスルホン酸Na塩、N−パーフルオロ
オクタンスルホニル−N′,N′,N′−トリメチルアンモ
ニオジアミノプロパンクロライド、N−パーフルオロデ
カノイルアミノプロピルN′,N′ジメチル−N′−カル
ボキシベタインの如き含フツ素界面活性剤、アルカリ金
属の硝酸塩、導電性酸化スズ、酸化亜鉛、五酸化バナジ
ウム又はこれらにアンチモン等をドープした複合酸化物
を好ましく用いることができる。As the antistatic agent, perfluorooctanesulfonic acid K salt, N-propyl-N-perfluorooctanesulfonylglycine Na salt, N-propyl-N-perfluorooctanesulfonylaminoethyloxypoly (n = 3) oxyethylenebutane Such as sulfonic acid Na salt, N-perfluorooctanesulfonyl-N ', N', N'-trimethylammoniodiaminopropane chloride, N-perfluorodecanoylaminopropyl N ', N'dimethyl-N'-carboxybetaine. Fluorine-containing surfactants, alkali metal nitrates, conductive tin oxides, zinc oxides, vanadium pentoxides, or complex oxides obtained by doping these with antimony or the like can be preferably used.
本発明に於てはマツト剤としてポリメチルメタクリレー
トのホモポノマー又はメチルメタクリレートとメタクリ
ル酸とのポリマー、デンプンなどの有機化合物、シリ
カ、二酸化チタン、硫酸、ストロンチウム、バリウム等
の無機化合物の微粒子を用いることができる。粒子サイ
ズとしては1.0〜10μm、特に2〜5μmであることが
好ましい。In the present invention, as a matting agent, a homoponomer of polymethylmethacrylate or a polymer of methylmethacrylate and methacrylic acid, an organic compound such as starch, and fine particles of an inorganic compound such as silica, titanium dioxide, sulfuric acid, strontium, and barium can be used. it can. The particle size is preferably 1.0 to 10 μm, particularly preferably 2 to 5 μm.
本発明の写真感光材料の表面層には滑り剤シリコーン化
合物、特公昭56-23139号公報に記載のコロイダルシリカ
の他に、パラフインワツクス、高級脂肪酸エステル、デ
ンプン誘導体等を用いることができる。In the surface layer of the photographic light-sensitive material of the present invention, a paraffin wax, a higher fatty acid ester, a starch derivative and the like can be used in addition to the lubricant silicone compound and the colloidal silica described in JP-B-56-23139.
本発明の写真感光材料の親水性コロイド層には、トリメ
チロールプロパン、ペンタンジオール、ブタンジオー
ル、エチレングリコール、グリセリン等のポリオール類
を可塑剤として用いることができる。さらに、本発明の
写真感光材料の親水性コロイド層には、耐圧力性改良の
目的でポリマーラテツクスを含有せしめることが好まし
い。ポリマーとしてはアクリル酸のアルキルエステルの
ホモポリマー又はアクリル酸とのコポリマー、スチレン
−ブタジエンコポリマー、活性メチレン基を有するモノ
マーからなるポリマー又はコポリマーを好ましく用いる
ことができる。Polyols such as trimethylolpropane, pentanediol, butanediol, ethylene glycol and glycerin can be used as a plasticizer in the hydrophilic colloid layer of the photographic light-sensitive material of the present invention. Furthermore, the hydrophilic colloid layer of the photographic light-sensitive material of the present invention preferably contains a polymer latex for the purpose of improving pressure resistance. As the polymer, a homopolymer of an alkyl ester of acrylic acid, a copolymer with acrylic acid, a styrene-butadiene copolymer, or a polymer or copolymer comprising a monomer having an active methylene group can be preferably used.
本発明の写真乳剤層および/又は他の親水性コロイド層
には特願昭62-335570に記載された複合ラテツクスを含
有してもよい。The photographic emulsion layer and / or the other hydrophilic colloid layer of the present invention may contain the composite latex described in Japanese Patent Application No. 62-335570.
本発明の写真乳剤及び非感光性の親水性コロイドには無
機または有機の硬膜剤を含有してよい。例えばクロム塩
(クロム明ばん)、アルデヒド類(ホルムアルデヒド、
グリタールアルデヒドなど)、N−メチロール化合物
(ジメチロール尿素、など)、ジオキサン誘導体(2,3
−ジヒドロキシジオキサンなど)、活性ビニル化合物
(1,3,5−トリアクリロイル−ヘキサヒドロ−s−トリ
アジン、ビス(ビニルスルホニル)メチルエーテル、N,
N′−メチレンビス−〔β−(ビニルスルホニル)プロ
ピオンアミド〕など)、活性ハロゲン化合物(2,4−ジ
クロル−6−ヒドロキシ−s−トリアジンなど)、ムコ
ハロゲン酸類(ムコクロル酸、など)イソオキサゾール
類、ジアルデヒドでん粉、2−クロル−6−ヒドロキシ
トリアジニル化ゼラチンなどを単独または組合せて用い
ることができる。なかでも、特開昭53-41220、同53-572
57、同59-162546、同60-80846に記載の活性ビニル化合
物および米国特許3,325,287号に記載の活性ハロゲン化
物が好ましい。The photographic emulsion and the non-photosensitive hydrophilic colloid of the present invention may contain an inorganic or organic hardener. For example, chromium salt (chrome alum), aldehydes (formaldehyde,
Glutaraldehyde, etc.), N-methylol compounds (dimethylolurea, etc.), dioxane derivatives (2,3
-Dihydroxydioxane, etc.), active vinyl compounds (1,3,5-triacryloyl-hexahydro-s-triazine, bis (vinylsulfonyl) methyl ether, N,
N'-methylenebis- [β- (vinylsulfonyl) propionamide] etc.), active halogen compounds (2,4-dichloro-6-hydroxy-s-triazine etc.), mucohalogen acids (mucochloric acid, etc.) isoxazoles , Dialdehyde starch, 2-chloro-6-hydroxytriazinylated gelatin and the like can be used alone or in combination. Among them, JP-A-53-41220 and JP-A-53-572
57, 59-162546 and 60-80846, and the active halides described in US Pat. No. 3,325,287 are preferred.
これらの硬膜剤により親水性コロイド層の硬膜は水中で
の膨潤率が280%以下になるように硬膜されているのが
好ましい。The hardener of the hydrophilic colloid layer is preferably hardened by these hardeners so that the swelling rate in water is 280% or less.
本発明の写真感光材料はハロゲン化銀乳剤層が2層以上
でもよく、この場合、2層以上のハロゲン化銀乳剤層の
感度、階調等は異つていてもよい。又、支持体の両側に
1層又は2層以上のハロゲン化銀乳剤層や非感光性層を
有していてもよい。The photographic light-sensitive material of the present invention may have two or more silver halide emulsion layers. In this case, the two or more silver halide emulsion layers may differ in sensitivity, gradation and the like. Further, it may have one or more silver halide emulsion layers or a non-photosensitive layer on both sides of the support.
一般感材用の支持体としては三酢酸セルロースフイルム
が好ましく、アンチハレーシヨン用に着色されていても
着色されていなくてもどちらでもよい。A cellulose triacetate film is preferable as a support for a general light-sensitive material, and either may be colored or may not be colored for antihalation.
X線撮影感材用支持体としてはポリエチレンテレフタレ
ートフイルムまたは三酢酸セルロースフイルムが好まし
く、特に青色に着色されていることが好ましい。A polyethylene terephthalate film or a cellulose triacetate film is preferable as the support for the X-ray photographic light-sensitive material, and particularly preferably colored blue.
支持体は本発明以外に親水性コロイド層との接着力をさ
らに向上せしめるために、その表面をコロナ放電処理、
あるいはクロー放電処理あるいは紫外線照射処理する方
法が好ましくあるいは、スチレンブタジエン系ラテツク
ス、塩化ビニリデン系ラテツクス等からなる下塗層を設
けてもよくまた、その上層にゼラチン層を更に設けても
よい。またポリエステル膨潤剤とゼラチンを含む有機溶
剤を用いた下塗層を設けてもよい。これ等の下塗層は表
面処理を加えることで更に親水性コロイド層との接着力
を向上することもできる。In addition to the present invention, the support has a corona discharge treatment on its surface in order to further improve the adhesive force with the hydrophilic colloid layer,
Alternatively, a method of claw discharge treatment or ultraviolet irradiation treatment is preferable, or an undercoat layer made of styrene-butadiene type latex, vinylidene chloride type latex or the like may be provided, or a gelatin layer may be further provided on the undercoat layer. An undercoat layer using an organic solvent containing a polyester swelling agent and gelatin may be provided. By applying a surface treatment to these undercoat layers, the adhesion with the hydrophilic colloid layer can be further improved.
前記のように調製した塗布液が前記支持体上に、均一に
塗布された後乾燥されハロゲン化銀感光材料が完成す
る。原崎勇次著「コーテイング工学」(昭和46年、朝倉
書店)278-281頁に記載されているように、この乾燥の
過程は、材料予熱期間、単位時間あたりの溶媒の蒸発量
すなわち溶媒の蒸発速度が一定である乾燥プロセスの恒
率乾燥期間、その後に溶媒の蒸発速度が徐々に低下して
蒸発がほとんどなくなるまでの乾燥プロセスの減率乾燥
期間、および調湿期間に分けられる。The coating solution prepared as described above is uniformly coated on the support and then dried to complete a silver halide photographic material. As described in Yuji Harazaki, "Coating Engineering" (1965, Asakura Shoten), pages 278-281, this drying process is based on the preheating period of the material, the evaporation amount of the solvent per unit time, that is, the evaporation rate of the solvent. Is a constant rate drying period of the drying process, and thereafter, a rate-decreasing drying period of the drying process until the evaporation rate of the solvent is gradually reduced to almost no evaporation, and a humidity conditioning period.
本発明の恒率乾燥工程は、ある定められた乾燥条件下で
乾燥したときに一定の蒸発速度で溶剤が蒸発する期間で
ある。またこの期間の特徴は感材の膜表面の温度が溶剤
がほとんど水の場合は、その乾燥条件の湿球温度とほぼ
同じになることである。The constant rate drying step of the present invention is a period during which the solvent evaporates at a constant evaporation rate when dried under certain defined drying conditions. The characteristic of this period is that the temperature of the film surface of the photosensitive material is almost the same as the wet-bulb temperature under the drying condition when the solvent is almost water.
一方、写真業界で写真感光材料の乾燥をする場合にはじ
めから終わりまで一定の乾燥条件で行なうということは
ほとんど行なわれず、膜質、帯電、カブリなどさまざま
な特性を良化させられるために、何故か乾燥条件の異な
るゾーンを次々に通して乾燥するのが一般的である。こ
ういつた乾燥方法をとる場合の乾燥期間の恒率乾燥と減
率乾燥期の分離は、その蒸発速度では求められなくな
る。そこで写真業界一般の溶剤がほとんど水であるた
め、その膜面温度を測定して湿球温度と同じ間恒率期間
と考え、それ以後の膜面温度が乾球温度と同じになるま
での間が減率乾燥期間である。On the other hand, when drying photographic light-sensitive materials in the photographic industry, it is rare that drying is performed under constant drying conditions from the beginning to the end, and various characteristics such as film quality, charging, and fog are improved, so drying is not possible for some reason. It is common to pass through zones having different conditions one after another to dry. When such a drying method is adopted, the constant rate drying in the drying period and the separation in the decreasing rate drying period cannot be determined by the evaporation rate. Therefore, since most solvents in the photographic industry are mostly water, the film surface temperature is measured and considered as the constant rate period for the same period as the wet bulb temperature, and after that, until the film surface temperature becomes the same as the dry bulb temperature. Is the rate-reduction dry period.
これらの乾燥プロセスの条件すなわち乾燥温度、湿度、
速度等によつて塗膜の物理性が著るしく影響を受けるこ
とはよく知られている。その例としてこの減率乾燥期間
の乾燥条件が、著るしく膜物性をかえる点に着目した例
として特開昭53-70426があげられよう。The conditions of these drying processes: drying temperature, humidity,
It is well known that the physical properties of the coating film are significantly affected by the speed and the like. As an example thereof, JP-A-53-70426 can be cited as an example focusing on the point that the drying conditions during this rate-decreasing drying period significantly change the physical properties of the film.
しかし本発明者は、該特許とは全く反対に、恒率乾燥を
急速に行なうことによつて、支持体とゼラチン層の接着
が著るしく良化できることを見い出した。本目的は、恒
率乾燥期間の溶媒の蒸発速度が恒率期間全体の平均とし
て35g/m2・分以上であるときに満足された。したがつて
塗布量が多い塗布物は時間は長くかかり、塗布量が少い
ものは短時間に恒率乾燥を終えることになるが本目的を
達成できるのは、恒率乾燥時間ではなく、むしろ、蒸発
速度で決まつていることがわかつた。恒率乾燥期間の溶
媒の蒸発速度は35g/m2・分以上で効果があるが、好まし
くは39g/m2・分であり、特に好ましくは44g/m2・分以上
である。本蒸発速度の上限は、むしろ乾燥工程の方法お
よび機構的構造で制限されており、好ましい領域ははつ
きりしていないが、異常な条件ではないという観点から
200g/m2・分以下がよい。However, contrary to the patent, the present inventor has found that the adhesion between the support and the gelatin layer can be remarkably improved by performing the constant rate drying rapidly. This object was satisfied when the evaporation rate of the solvent during the constant rate drying period was 35 g / m 2 · min or more on average over the constant rate period. Therefore, a coating material with a large coating amount takes a long time, and a coating material with a small coating amount finishes constant rate drying in a short time, but it is not the constant rate drying time that can achieve this object, but rather , I knew that it was decided by the evaporation rate. The evaporation rate of the solvent during the constant rate drying period is effective at 35 g / m 2 · min or more, but is preferably 39 g / m 2 · min, particularly preferably 44 g / m 2 · min or more. The upper limit of this evaporation rate is rather limited by the method and mechanical structure of the drying process, and although the preferable region is not attached, it is not an abnormal condition.
200g / m 2 · min or less is recommended.
本発明に示された恒率乾燥につづいて、減率乾燥期間、
および調湿期間があるが、これらは、通常知られた条件
であればどの条件でもよく、例えば、それぞれ湿球温度
5℃〜25℃、相対湿度30〜80%の減率乾燥、乾球温度20
〜40℃、相対湿度50〜70%の調湿などが良い。Following the constant rate drying shown in the present invention, the rate reduction period,
And there is a humidity control period, but these may be any conditions as long as they are generally known, for example, wet-bulb temperature of 5 ° C to 25 ° C, relative humidity of 30 to 80%, reduced rate drying, dry-bulb temperature. 20
It is good to adjust the humidity at -40 ℃ and relative humidity of 50-70%.
このような乾燥は従来より慣行されている空気を吹きつ
ける方法によつて行なわれる。乾燥工程中での写真感材
の搬送方法は、ストレート方式、アーチ方式、空気搬送
方式等いずれの方法も用いることができる。Such drying is performed by a conventional method of blowing air. As a method of conveying the photographic light-sensitive material in the drying step, any of a straight method, an arch method, an air conveying method and the like can be used.
本発明のように製造された写真感光材料は、通常の現像
処理をする写真感光材料であればどのようなものにも用
いることができる。例えば、X線用写真感光材料、リス
型写真感光材料、黒白ネガ写真感光材料、カラーネガ感
光材料、カラーリバーサル感光材料、カラーペーパー感
光材料、黒白ペーパー感光材料などに用いられる。The photographic light-sensitive material produced according to the present invention can be used in any photographic light-sensitive material which is subjected to ordinary development processing. For example, it is used for X-ray photographic light-sensitive materials, lith type photographic light-sensitive materials, black and white negative photographic light-sensitive materials, color negative light-sensitive materials, color reversal light-sensitive materials, color paper light-sensitive materials, black-and-white paper light-sensitive materials.
ここで、X線用写真感光材料として用いる場合には、RE
SEARCH DISCLOSURE Item18431(1979年8月P.433〜P.44
1)安定剤、カブリ防止剤およびクニツク防止剤に関す
る技術(P.433〜P.436)、に記載された保護層に関する
技術(P.436,IV項)、クロスオーバーコントロール技術
(P.436V項)等を用いることが好ましい。When used as a photographic material for X-rays, RE
SEARCH DISCLOSURE Item18431 (August 1979 P.433 ~ P.44
1) Technology related to stabilizers, antifoggants and anti-knitting agents (P.433 to P.436), technology related to protective layer (P.436, IV), crossover control technology (P.436V) ) And the like are preferably used.
X線写真像を得るためには、露光は通常の方法を用いて
行なえばよい。すなわち、直接X線を照射するかまたは
両側に感光層のある感光材料を2枚の鉛はく増感紙また
は螢光増感紙でサンドイツチしてX線露光する方法であ
る。To obtain an X-ray photographic image, the exposure may be carried out by using a usual method. That is, it is a method of directly irradiating X-rays or exposing a light-sensitive material having a light-sensitive layer on both sides to X-rays by using two lead foil intensifying screens or fluorescent intensifying screens.
または片側に感光層のある感光材料の場合はX線を螢光
増感紙に照射し、発光した光を感光材料に記録する方法
を用いる。勿論感光材料と螢光増感紙をコンタクトさせ
てX線照射してもよい。Alternatively, in the case of a photosensitive material having a photosensitive layer on one side, a method of irradiating a fluorescent intensifying screen with X-rays and recording the emitted light on the photosensitive material is used. Of course, the photosensitive material may be brought into contact with the fluorescent intensifying screen to perform X-ray irradiation.
ここで螢光体としては青発光のタングステン酸カルシウ
ム、硫酸バリウムなどの螢光体、緑発光の希土類螢光体
が用いられる。また、X線露光したものを螢光体に蓄積
した後、陰極線管フライングスポツト、発行ダイオー
ド、レーザー光(例えばガスレーザー、YAGレーザー、
色素レーザー、半導体レーザーなど)など赤外光を含む
種々の光源で露光することもできる。Here, as the phosphor, a blue-emitting calcium tungstate, a barium sulfate or other fluorescent material, and a green-emitting rare earth fluorescent material are used. After the X-ray exposure is accumulated in the fluorescent material, the cathode ray tube flying spot, the emitting diode, the laser light (for example, gas laser, YAG laser,
It is also possible to expose with various light sources including infrared light such as a dye laser and a semiconductor laser).
またX線写真以外の用途に使用する場合は、それぞれ通
常の露光方法が使用できる。When used for purposes other than X-ray photography, ordinary exposure methods can be used.
また本発明の感材は光波長変換素子を用いての露光でも
よい。The light-sensitive material of the present invention may be exposed using a light wavelength conversion element.
本発明の感光材料の写真処理には、例えばリサーチ・デ
イスクロージヤー(RESEARCH DISCLOSURE)176号第28〜
30頁(RD-17643)に記載されているような、公知の方法
及び公知の処理液のいずれをも適用することができる。Photographic processing of the light-sensitive material of the present invention includes, for example, RESEARCH DISCLOSURE No. 176-28.
Any known method and known processing solution as described on page 30 (RD-17643) can be applied.
処理温度は普通18℃から50℃の間に選ばれるが、18℃よ
り低い温度または50℃を越える温度としてもよい。The treatment temperature is usually selected between 18 ° C and 50 ° C, but it may be lower than 18 ° C or higher than 50 ° C.
例えば、黒白写真処理する現像液は、知られている現像
主薬を含むことができる。現像主薬としては、ジヒドロ
キシベンゼン類(たとえばハイドロキノン)、3−ピラ
ゾリドン類(たとえば1−フエニル−3−ピラゾリド
ン)、アミノフエノール類(たとえばN−メチル−p−
アミノフエノール)などを、単独もしくは組合せてもち
いることができる。本発明の感光材料の写真処理には、
特開昭57-78535号に記載のハロゲン化銀溶剤としてイミ
ダゾール類を含む現像液にて処理することもできる。ま
た、特開昭58-37643号に記載のハロゲン化銀溶剤とイン
ダゾールもしくはトリアゾールなどの添加剤とを含む現
像液にて処理することができる。現像液には一般にこの
他公知の保恒剤、アルカリ剤、pH緩衝剤、カブリ防止剤
などを含み、さらに必要に応じ溶解助剤、色調剤、現像
促進剤、界面活性剤、消泡剤、硬水軟化剤、硬膜剤(例
えばグルタルアルデヒド)、粘性付与剤などを含んでも
よい。For example, a black and white photographic processing developer can include known developing agents. Examples of developing agents include dihydroxybenzenes (eg hydroquinone), 3-pyrazolidones (eg 1-phenyl-3-pyrazolidone), aminophenols (eg N-methyl-p-).
Aminophenol) and the like can be used alone or in combination. For photographic processing of the light-sensitive material of the present invention,
Processing with a developing solution containing imidazoles as a silver halide solvent described in JP-A-57-78535 can also be used. Further, it can be processed with a developer containing a silver halide solvent described in JP-A-58-37643 and an additive such as indazole or triazole. The developer generally contains other known preservatives, alkali agents, pH buffers, antifoggants, and the like, and if necessary, dissolution aids, color tones, development accelerators, surfactants, defoamers, A water softener, a hardener (eg, glutaraldehyde), a viscosity imparting agent, etc. may be included.
定着液としては一般に用いられる組成のものを用いるこ
とができる。定着剤としてはチオ硫酸塩、チオシアン酸
塩のほか、定着剤としての効果が知られている有機硫黄
化合物を用いることができる。定着液には硬膜剤として
水溶性アルミニウム塩を含んでもよい。As the fixer, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as a fixing agent can be used. The fixing solution may contain a water-soluble aluminum salt as a hardening agent.
以下実施例を挙げて本発明をさらに説明する。The present invention will be further described with reference to examples.
(実施例1) コントロールダブルジエツト法で、0.35μのほぼ立方体
の沃臭化銀を調整した。(Example 1) 0.35 µ of nearly cubic silver iodobromide was prepared by the control double jet method.
この乳剤に1−フエニル−5−メルカプト−テトラゾー
ルを加え、金・イオウ増感を併用した化学増感をほどこ
し、安定剤として4−ヒドロキシ−6−メチル−1,3,3
a,7−テトラザインデンを加え、本特許化合物を表1に
示すように加え、さらに硬膜剤として2,4−ジクロル−
6−ヒドロキシ−s−トリアジンを添加して乳剤塗布液
を調製した。1-phenyl-5-mercapto-tetrazole was added to this emulsion for chemical sensitization using gold / sulfur sensitization in combination, and 4-hydroxy-6-methyl-1,3,3 as a stabilizer.
a, 7-Tetrazaindene was added, and the compounds of the present patent application were added as shown in Table 1, and 2,4-dichloro- was added as a hardening agent.
An emulsion coating solution was prepared by adding 6-hydroxy-s-triazine.
またゼラチンを結合剤とし、マツト剤、アニオン界面活
性剤、含フツ素化合物オルガノポリシロキサンおよびポ
リエチレンオキサイド系ノニオン界面活性剤を含む表面
保護層用塗布液も別に調製した。Further, a coating solution for a surface protective layer containing gelatin as a binder, a matting agent, an anionic surfactant, a fluorine-containing compound organopolysiloxane and a polyethylene oxide nonionic surfactant was prepared separately.
これら塗布液を同時に塗布し、乾燥風が吹きつける乾燥
ゾーンを通して乾燥を実施した。なお塗布物の塗布水分
(微量の他有機溶媒を含む)は、117g/m2であつた。ま
た乾燥ゾーンでの温度、湿度、風量を加えて、恒率乾燥
期間の時間が表1になるようにした。これらサンプルは
その後は同じ条件(温度27℃ 湿度60%)で減率乾燥か
ら調湿を実施した。こうして試料(1)〜(10)を作成
した。These coating solutions were applied at the same time and dried through a drying zone blown by dry air. The coating water content (including trace amounts of other organic solvents) was 117 g / m 2 . Further, the temperature, humidity and air flow in the drying zone were added so that the time of the constant rate drying period was as shown in Table 1. After that, these samples were subjected to the same conditions (temperature: 27 ° C, humidity: 60%), and then reduced rate drying and humidity conditioning. Thus, samples (1) to (10) were prepared.
これらサンプルを次に示すような接着力試験を実施し、
その結果も表1に示した。These samples were tested for adhesion as shown below,
The results are also shown in Table 1.
接着力、試験方法 試料を次に示す現像処理とする 5mm径の球状のゴムに500gの荷重をかけてぬれたま
まの試料の端から中央にむかつて約3mmこすり、これを
5回くりかえす。Adhesive strength, test method The sample is developed as shown below. Apply a load of 500 g to a spherical rubber having a diameter of 5 mm, and rub it about 3 mm from the edge of the wet sample to the center, and repeat this 5 times.
の作業によつてはがれた乳剤層の長さを測り、こ
れを接着力の良悪の尺度とする。表1にはこのはがれた
長さを示した。The length of the emulsion layer peeled off by the work of 1. is measured, and this is taken as a measure of the goodness of adhesion. Table 1 shows the peeled length.
もちろん値が小さい方がよい。Of course, the smaller the value, the better.
表1からわかることは次の点である。 The following points can be seen from Table 1.
(1)化合物(1)やデキストランが添加された系は、
接着が悪いが恒率乾燥を急乾にするとそれが良化する。(1) The system to which the compound (1) or dextran is added is
Poor adhesion, but if constant rate drying is quickly dried, it will improve.
(2)良化が見られるのは、蒸発速度が35CC/m2・分以
上のところである。(2) The improvement is seen at the evaporation rate of 35 CC / m 2 · min or more.
(実施例2) 硝酸銀水溶液と臭化カリウム水溶液をゼラチン水溶液に
添加して平均粒径0.55μの臭化銀粒子をつくつた。この
乳剤にさらに硝酸銀水溶液と臭化カリウムと沃化カリウ
ムの水溶液を添加して、沃化銀を2モル%含む沃臭化銀
を前の粒子の外側に形成した。(Example 2) A silver nitrate aqueous solution and a potassium bromide aqueous solution were added to a gelatin aqueous solution to prepare silver bromide particles having an average particle diameter of 0.55 µm. An aqueous silver nitrate solution and an aqueous solution of potassium bromide and potassium iodide were further added to this emulsion to form silver iodobromide containing 2 mol% of silver iodide on the outside of the previous grains.
この乳剤を通常の方法で脱銀した後、ゼラチン添添加
し、1−フエニル−5−メルカプト−テトラゾールを添
加して、金・イオウ増感をほどこした。各乳剤は、それ
ぞれの最適時間化学後熟した後、4−ヒドロキシ−6−
メチル−1,3,3a,7−テトラザインデンおよび3−(5−
メルカプトテトラゾリル)−ベンゼンスルフオン酸ナト
リウムを加え安定化させた。さらに、表2に示すような
化合物、レゾルシノールを加え、さらに現像膨潤率が約
230%(膨潤時全膜厚/乾膜厚)になるように硬膜剤を
加えポリエチレンテレフタレート支持体上に塗布した。
このとき同時に表2に示すようなマツト剤、無機塩、含
フツ素化合物、アニオン界面活性剤、オルガノポリシロ
キサン、特願昭62-335570に記載されたDV-759、および
ポリエチレンオキサイド系ノニオン界面活性剤を含む表
面保護層を塗布した。After desilvering this emulsion by a usual method, gelatin was added and 1-phenyl-5-mercapto-tetrazole was added for gold / sulfur sensitization. Each emulsion was chemically ripened for its optimum time and then 4-hydroxy-6-
Methyl-1,3,3a, 7-tetrazaindene and 3- (5-
It was stabilized by adding sodium mercaptotetrazolyl) -benzenesulfonate. Furthermore, a compound as shown in Table 2 and resorcinol were added, and the development swelling ratio was about
A hardening agent was added so that the thickness would be 230% (total film thickness when swollen / dry film thickness), and the mixture was coated on a polyethylene terephthalate support.
At this time, at the same time, the matting agent, inorganic salt, fluorine-containing compound, anionic surfactant, organopolysiloxane, DV-759 described in Japanese Patent Application No. 62-335570, and polyethylene oxide nonionic surfactant as shown in Table 2 A surface protection layer containing the agent was applied.
なお、これらの液は加水量をかえて表2にあるような塗
布水分量となるように設定した。The amounts of these solutions were changed so that the amount of coating water was as shown in Table 2.
上記のように塗布した後、恒率乾燥時間が表2のように
なるように乾燥条件を設定し、続く、減率乾燥〜調湿は
実施例1と同様に一定条件で行ない試料11〜19を作製
し、前記実施例1と同じ接着力テストを行なつた。これ
らの結果を表2に示す。After coating as described above, the drying conditions were set so that the constant rate drying time was as shown in Table 2, and the subsequent rate-reducing drying to humidity control was performed under the same constant conditions as in Example 1 to obtain Samples 11 to 19. Was prepared and the same adhesive strength test as in Example 1 was performed. The results are shown in Table 2.
表2からわかるように接着の良悪は、恒率乾燥の時間や
塗布水分量ではなく、その蒸発速度で一義的に決まつて
おり、本特許の示すように35g/m2・分より速い乾燥をす
れば効果があることがわかる。 As can be seen from Table 2, the quality of adhesion is uniquely determined by the evaporation rate, not by the time of constant rate drying or the amount of applied water, and as shown in this patent, it is faster than 35 g / m 2 · min. It turns out that it is effective if dried.
(実施例3) 水1中にゼラチン30g、臭化カリ5g、沃化カリ0.05gを
加え75℃に保つた容器中に攪拌しながら硝酸銀水溶液
(硝酸銀として5g)と沃化カリ0.73gを含む臭化カリ水
溶液を1分間かけてダブルジエツト法で添加した。さら
に硝酸銀水溶液(硝酸銀として145g)と臭化カリ水溶液
をダブルジエツト法で添加した。この時の添加流速は、
添加終了時の流速が、添加開始時の8倍となるよう流量
加速をおこなつた。このあと、沃化カリ水溶液を0.37g
添加した。(Example 3) 30 g of gelatin, 5 g of potassium bromide and 0.05 g of potassium iodide were added to 1 water, and an aqueous solution of silver nitrate (5 g as silver nitrate) and 0.73 g of potassium iodide were added to a container kept at 75 ° C with stirring. The aqueous potassium bromide solution was added by the double jet method over 1 minute. Further, an aqueous silver nitrate solution (145 g as silver nitrate) and an aqueous potassium bromide solution were added by the double jet method. The addition flow rate at this time is
The flow rate was accelerated so that the flow rate at the end of the addition was 8 times that at the start of the addition. After this, 0.37 g of potassium iodide aqueous solution
Was added.
添加終了後、沈降法により35℃にて可溶性塩類を除去し
たのち40℃に昇温してゼラチン等を60g追添し、pHを6.5
に調整した。56℃に再び昇温して、増感色素アンヒドロ
−5,5′−ジ−クロロ−9−エチル−3,3′−ジ(3−ス
ルフオプロピル)オキサカルボシアニンハイドロオキサ
イドナトリウム塩650mgを添加したのち金、イオウ増感
を併用した化学増感をほどこした。得られた乳剤は六角
平板状で投影面積直径が0.85μm平均の厚みが0.158μ
mであつた。After the addition was completed, the soluble salts were removed at 35 ° C by the precipitation method, the temperature was raised to 40 ° C, and 60 g of gelatin etc. was added to adjust the pH to 6.5.
Adjusted to. The temperature is raised again to 56 ° C., and 650 mg of sensitizing dye anhydro-5,5′-di-chloro-9-ethyl-3,3′-di (3-sulfopropyl) oxacarbocyanine hydroxide sodium salt is added. After that, chemical sensitization using gold and sulfur sensitization was applied. The resulting emulsion has a hexagonal tabular shape with a projected area diameter of 0.85 μm and an average thickness of 0.158 μm.
It was m.
この乳剤に安定剤として4−ヒドロキシ−6−メチル−
1,3,3a,7−テトラザインデンと2,6−ビス(ヒドロキシ
アミノ)−4−ジエチルアミノ−1,3,5−トリアジン、
乾燥カブリ防止剤としてトリメチロールプロパン、そし
て表3にあるような化合物を添加して塗布液とした。4-Hydroxy-6-methyl- was added to this emulsion as a stabilizer.
1,3,3a, 7-tetrazaindene and 2,6-bis (hydroxyamino) -4-diethylamino-1,3,5-triazine,
Trimethylolpropane as a dry antifoggant and a compound as shown in Table 3 were added to prepare a coating solution.
表面保護層として、ゼラチンの他にポリメチルメタクリ
レート微粒子、含フツ素化合物、ポリアクリル酸ナトリ
ウム、アニオン界面活性剤、ポリエチレンオキサイド系
ノニオン界面活性剤、および表3に示す化合物を含有す
るゼラチン水溶液を準備した。As a surface protective layer, in addition to gelatin, prepare an aqueous gelatin solution containing polymethylmethacrylate fine particles, a fluorine-containing compound, sodium polyacrylate, an anionic surfactant, a polyethylene oxide nonionic surfactant, and the compound shown in Table 3. did.
この表面保護層液と前記乳剤塗布液とに硬膜剤として1,
2−ビス(ビニルスルホニルアセトアミド)エタンを添
加してブルー着色したPET支持体上に同時に塗布し、そ
の後表3に示すような蒸発速度となるような恒率乾燥と
減率乾燥を実施した。その後すべての試料を25℃65%で
3分間調湿し、巻きとり試料20〜25とした。As a hardener in the surface protective layer solution and the emulsion coating solution 1,
2-Bis (vinylsulfonylacetamide) ethane was added and simultaneously coated on a blue-colored PET support, and then constant rate drying and rate reduction drying were carried out so that the evaporation rates shown in Table 3 were obtained. After that, all the samples were conditioned at 25 ° C. and 65% for 3 minutes and wound into samples 20 to 25.
これら試料についての接着力テストの結果を表3に示
す。The results of the adhesion test for these samples are shown in Table 3.
表3からわかることは、恒率乾燥の蒸発速度が速ければ
接着が良いが、減率乾燥での蒸発速度では大きな影響が
ないことである。 It can be seen from Table 3 that if the evaporation rate in constant rate drying is high, the adhesion is good, but the evaporation rate in reduced rate drying has no significant effect.
むしろ減率乾燥では逆に蒸発速度がおそい方が良いよう
に見える。On the contrary, it seems that the evaporation rate should be slower in the reduction rate drying.
これは従来知られていた結果とは反対の新しい発見であ
つた。This was a new finding that was the opposite of the previously known result.
Claims (1)
乳剤層を有するハロゲン化銀写真感光材料において、該
ハロゲン化銀乳剤層もしくはその近傍の非感光性層中に
下記一般式(I)であらわされる繰り返し単位を含む重
合体および/またはデキストランを含有する写真感光材
料の製造方法において、塗布、乾燥工程のうち恒率乾燥
工程における平均蒸発速度が35g/m2・分以上であること
を特徴とするハロゲン化銀写真感光材料の製造方法。 一般式(I) 式中、R1は水素原子又は炭素数1〜6個のアルキル基
を、R2、R3はそれぞれ水素原子、炭素数10個以下の置換
又は無置換アルキル基、アリール基またはアラルキル基
を表わし、同じであつても異なつてもよい。またR2、R3
が互いに結合し、窒素原子と共に含窒素複素環を形成し
てもよい。Lは2価の連結基である。nは0又は1であ
り、mは1または2である。1. A silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support, wherein the silver halide emulsion layer or a non-light-sensitive layer in the vicinity thereof has the following general formula (I). In the method for producing a photographic light-sensitive material containing a polymer and / or dextran containing repeating units represented by the formula, the average evaporation rate in the constant rate drying step of the coating and drying steps is 35 g / m 2 · min or more. A method for producing a characteristic silver halide photographic light-sensitive material. General formula (I) In the formula, R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R 2 and R 3 each represent a hydrogen atom, a substituted or unsubstituted alkyl group having 10 or less carbon atoms, an aryl group or an aralkyl group. , The same or different. Also R 2 , R 3
May be bonded to each other to form a nitrogen-containing heterocycle with the nitrogen atom. L is a divalent linking group. n is 0 or 1, and m is 1 or 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63245818A JPH0778601B2 (en) | 1988-09-29 | 1988-09-29 | Method for producing silver halide photographic light-sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63245818A JPH0778601B2 (en) | 1988-09-29 | 1988-09-29 | Method for producing silver halide photographic light-sensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0293453A JPH0293453A (en) | 1990-04-04 |
| JPH0778601B2 true JPH0778601B2 (en) | 1995-08-23 |
Family
ID=17139308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63245818A Expired - Lifetime JPH0778601B2 (en) | 1988-09-29 | 1988-09-29 | Method for producing silver halide photographic light-sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0778601B2 (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5310691B2 (en) * | 1973-06-22 | 1978-04-15 | ||
| DE2625026A1 (en) * | 1976-06-03 | 1977-12-22 | Agfa Gevaert Ag | PROCESS FOR CURING PHOTOGRAPHIC GELATIN-CONTAINING LAYERS |
| DE2946465A1 (en) * | 1979-11-17 | 1981-06-11 | Agfa-Gevaert Ag, 5090 Leverkusen | NEW POLYMERS, METHOD FOR THEIR PRODUCTION AND THEIR USE FOR THE PRODUCTION OF PHOTOGRAPHIC EMULSIONS AND PHOTOGRAPHIC MATERIALS |
| JPS6017101B2 (en) * | 1980-05-07 | 1985-05-01 | 富士写真フイルム株式会社 | Method for manufacturing silver halide photographic materials |
| IT1147083B (en) * | 1980-05-26 | 1986-11-19 | Minnesota Mining & Mfg | PHOTOGRAPHIC ELEMENTS WITH IMPROVED SURFACE CHARACTERISTICS LAYER COMPOSITION AND PROCEDURE TO OBTAIN THESE ELEMENTS |
| JPS5953530A (en) * | 1982-09-22 | 1984-03-28 | Toyobo Co Ltd | Manufacture of polyester |
| JPS6169061A (en) * | 1984-09-12 | 1986-04-09 | Fuji Photo Film Co Ltd | Silver halide photosensitive material |
-
1988
- 1988-09-29 JP JP63245818A patent/JPH0778601B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0293453A (en) | 1990-04-04 |
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