JPH0780992B2 - Method for producing epoxy resin - Google Patents
Method for producing epoxy resinInfo
- Publication number
- JPH0780992B2 JPH0780992B2 JP62157372A JP15737287A JPH0780992B2 JP H0780992 B2 JPH0780992 B2 JP H0780992B2 JP 62157372 A JP62157372 A JP 62157372A JP 15737287 A JP15737287 A JP 15737287A JP H0780992 B2 JPH0780992 B2 JP H0780992B2
- Authority
- JP
- Japan
- Prior art keywords
- parts
- ech
- reaction
- epoxy resin
- alkali metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 21
- 229920000647 polyepoxide Polymers 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 32
- 229910052801 chlorine Inorganic materials 0.000 claims description 31
- 239000000460 chlorine Substances 0.000 claims description 30
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 19
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 19
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 36
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 27
- 229920003986 novolac Polymers 0.000 description 20
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 20
- 235000011121 sodium hydroxide Nutrition 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000010533 azeotropic distillation Methods 0.000 description 3
- -1 chlorine ions Chemical class 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- SSZWWUDQMAHNAQ-UHFFFAOYSA-N 3-chloropropane-1,2-diol Chemical compound OCC(O)CCl SSZWWUDQMAHNAQ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000479 mixture part Substances 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
Description
【発明の詳細な説明】 「産業上の利用分野」 本発明は塩素含有量を低下させた一価又は多価フエノー
ルのグリシジルエーテルであるエポキシ樹脂の製造法に
関する。The present invention relates to a method for producing an epoxy resin which is a monovalent or polyvalent phenol glycidyl ether having a reduced chlorine content.
「従来技術」 フエノール類のグリシジルエーテルであるエポキシ樹脂
は硬化剤により架橋させた場合、大きな架橋度を有する
硬化樹脂となり優れた特性を示すものである。特にフエ
ノールノボラツクエポキシは一分子中に2〜10個のフエ
ノール核を持つたフエノールノボラツク樹脂が使用され
ており、理論的には2〜10個のエポキシ基を持つている
ものである。その結果ビスフエノールA型エポキシ樹脂
に比べてより大きな架橋度を有する硬化樹脂となり、優
れた耐薬品性、耐湿性、耐熱性を有するものである。こ
れらの特性により近年電気及び電子産業用の封止剤とし
て多く使用されている。しかし残存塩素分の多いフエノ
ールノボラツクエポキシ樹脂を封止剤に用いた場合、吸
湿により塩素分が加水分解され塩素イオンとして遊離し
てくる。この遊離した塩素イオンが金属を腐蝕し各種の
トラブルを発生することになる。従つて、このようなト
ラブルを発生させないためには塩素含有量の少ないフエ
ノールノボラツクエポキシ樹脂の製造が重要な項目とな
つている。塩素含有量を低減するために、種々の製造方
法が提案されている。"Prior Art" Epoxy resins, which are glycidyl ethers of phenols, when cured with a curing agent, become cured resins having a large degree of crosslinking and exhibit excellent properties. In particular, for phenol novolac epoxy, a phenol novolac resin having 2 to 10 phenol nuclei in one molecule is used, and theoretically it has 2 to 10 epoxy groups. As a result, the cured resin has a greater degree of crosslinking than the bisphenol A type epoxy resin, and has excellent chemical resistance, moisture resistance, and heat resistance. Due to these characteristics, it has been widely used in recent years as a sealant for the electric and electronic industries. However, when a phenol novolac epoxy resin having a large residual chlorine content is used as a sealing agent, the chlorine content is hydrolyzed by moisture absorption and liberated as chlorine ions. The liberated chlorine ions corrode the metal and cause various troubles. Therefore, in order to prevent such troubles, the production of a phenol novolak epoxy resin having a low chlorine content is an important item. Various manufacturing methods have been proposed to reduce the chlorine content.
例えば特開昭54-90400号、特開昭54-13596号には多価フ
エノールのグリシジルエーテルを製造する方法におい
て、多価フエノールとエピクロルヒドリンの溶液にアル
コール類を共存させて反応している。しかし、上記方法
の場合アルコール類とエピクロルヒドリンが反応してア
ルコール類のグリシジルエーテルが副生する。この時ア
ルカリ金属水酸化物を消費するところから、塩素含有量
を本発明で所望する400ppm以下にすることは困難であ
る。For example, in JP-A-54-90400 and JP-A-54-13596, in a method for producing a polyhydric phenol glycidyl ether, alcohols are allowed to coexist in a solution of a polyhydric phenol and epichlorohydrin and reacted. However, in the case of the above method, alcohols and epichlorohydrin react with each other to form glycidyl ethers of alcohols as a by-product. At this time, since the alkali metal hydroxide is consumed, it is difficult to set the chlorine content to 400 ppm or less desired in the present invention.
本発明で問題としている塩素とはアルカリ金属水酸化物
によつて容易に脱塩素化される塩素例えば、 及びアルカリ金属水酸化物では脱塩素化が比較的困難な
塩素例えば、 Rはフエニル基等の芳香族炭化水素残基を示すをいい、
フエノールノボラツクエポキシ樹脂をブチカルビトール
に溶解し、水酸化カリウムのプロピレングリコール溶液
を加え還流状態で10分間加熱した時に脱離する塩素イオ
ンを硝酸銀溶液にて逆滴定で定量し、フエノールノボラ
ツクエポキシ樹脂中の塩素原子をppmで表わしたもので
ある。Chlorine which is a problem in the present invention is chlorine which is easily dechlorinated by an alkali metal hydroxide, for example, And chlorine that is relatively difficult to dechlorinate with alkali metal hydroxides, for example: R means an aromatic hydrocarbon residue such as a phenyl group,
The phenol novolac epoxy resin was dissolved in butycarbitol, and the propylene glycol solution of potassium hydroxide was added, and the chlorine ions desorbed when heated at reflux for 10 minutes were quantitatively determined by back titration with a silver nitrate solution. It is the chlorine atom in the resin expressed in ppm.
「発明が解決しようとする問題点」 本発明は上記従来方法では満足されなかつた低塩素含有
量のエポキシ樹脂の製法を、より容易にしかつ確実にし
ようとするものである。"Problems to be Solved by the Invention" The present invention intends to make the method for producing an epoxy resin having a low chlorine content, which has not been satisfied by the above-mentioned conventional methods, easier and more reliable.
「問題を解決するための手段」 本発明者らは塩素含有量の少ないエポキシ樹脂を得るべ
く鋭意研究した結果、一価又は多価フエノールと過剰の
エピクロルヒドリンとをアルカリ金属水酸化物の存在下
で反応させ、一価又は多価フエノールのグリシジルエー
テルを製造する方法において、全アルカリ金属水酸化物
量の50〜80重量%量を添加するまでは、水をエピクロル
ヒドリンとの共沸により反応系外に取り出し、エピクロ
ルヒドリンのみを反応系に戻し、全アルカリ金属水酸化
物量の50〜80重量%量を添加した時点から過剰のエピク
ロルヒドリンを水と共に回収しながら反応させることを
特徴とする低塩素含有エポキシ樹脂の製造方法を見い出
したものである。"Means for Solving the Problem" The inventors of the present invention have conducted extensive studies to obtain an epoxy resin having a low chlorine content, and as a result, monovalent or polyvalent phenols and an excess of epichlorohydrin in the presence of alkali metal hydroxides have been investigated. In the method for producing a monovalent or polyvalent phenol glycidyl ether by reaction, water is taken out of the reaction system by azeotropy with epichlorohydrin until 50 to 80% by weight of the total alkali metal hydroxide is added. , Production of a low chlorine-containing epoxy resin characterized by returning only epichlorohydrin to the reaction system and reacting while recovering excess epichlorohydrin together with water from the time when 50 to 80% by weight of the total alkali metal hydroxide is added. I found a method.
上記本発明において反応時にメチルエチルケトンの共存
下又はメチルエチルケトンと非プロトン系極性溶媒例え
ばジメチルスルホキシドの共存下に行うことは一層好ま
しいことであり、より確実に塩素含有量を低下させるこ
とができるものである。更に本発明方法の効果を確実に
するには反応を低温例えば50〜70℃に保つことが好まし
い。又過剰に使用したエピクロルヒドリン(以下ECHと
いう)は減圧下できるだけ低い温度例えば60〜200mHg、
60〜70℃なる条件下で回収するのが好ましく、アルカリ
金属水酸化物の添加が終了した段階で全ECH回収量に対
し30〜80重量%量のECHを回収しておくことが、塩素含
有量を低下させるのに有効である。In the present invention, it is more preferable to carry out the reaction in the presence of methyl ethyl ketone or in the presence of methyl ethyl ketone and an aprotic polar solvent such as dimethyl sulfoxide during the reaction, and the chlorine content can be reduced more reliably. Furthermore, in order to ensure the effect of the method of the present invention, it is preferable to keep the reaction at a low temperature, for example, 50 to 70 ° C. Also, epichlorohydrin (hereinafter referred to as ECH) used in excess is at a temperature as low as possible under reduced pressure, for example, 60 to 200 mHg,
It is preferable to collect it under the condition of 60 to 70 ° C. It is recommended to collect 30 to 80% by weight of ECH with respect to the total amount of ECH recovered when the addition of the alkali metal hydroxide is completed. It is effective in reducing the amount.
本発明に使用される一価又は多価フエノールとしてはフ
エノール、オルトクレゾール、メタクレゾール、パラク
レゾール、ジフエノールメタン(ビスフエンノール
F)、ジフエノールプロパン(ビスフエンノールA)、
テトラブロムビスフエノールA、フエノールノボラツ
ク、臭素化フエノールノボラツク、クレゾールノボラツ
ク、臭素化クレゾールノボラツクなどが挙げられるが、
これらに限定されるものではない。Examples of monovalent or polyvalent phenols used in the present invention include phenol, orthocresol, metacresol, paracresol, diphenol methane (bisphenol F), diphenol propane (bisphenol A),
Tetrabromobisphenol A, phenol novolak, brominated phenol novolak, cresol novolak, brominated cresol novolak, and the like,
It is not limited to these.
本発明に使用されるアルカリ金属水酸化物とは、水酸化
ナトリウム、水酸化カリウム、水酸化カルシウムであ
り、アルカリ金属水酸化物の使用量はフエノール生水酸
基1モルに対し0.95〜1.05モルが好ましい。The alkali metal hydroxide used in the present invention is sodium hydroxide, potassium hydroxide or calcium hydroxide, and the amount of the alkali metal hydroxide used is preferably 0.95 to 1.05 mol per mol of the phenol hydroxyl group. .
本発明で使用されるECHの使用量はフエノール性水酸基
1モルに対し3〜20好ましくは4〜10モルである。The amount of ECH used in the present invention is 3 to 20 mol, preferably 4 to 10 mol, per mol of the phenolic hydroxyl group.
本発明による過剰ECHの回収開始は全アルカリ金属水酸
化物量に対し50〜80重量%量好ましくは60〜70重量%量
を添加した時点がよい。50重量%以下の場合は塩素含有
量の低下には大きな効果を示すが、製品のエポキシ当量
及び粘度が高くなり好ましくない。一方80重量%以上で
は塩素含有量の低下が顕著でなくなる。The recovery of excess ECH according to the present invention is started at the time when 50 to 80% by weight, preferably 60 to 70% by weight, of the total amount of alkali metal hydroxide is added. When it is 50% by weight or less, it has a great effect on reducing the chlorine content, but it is not preferable because the epoxy equivalent and the viscosity of the product become high. On the other hand, when it is 80% by weight or more, the chlorine content is not significantly reduced.
また必要に応じて添加されるメチルエチルケトンの添加
量はECH 100重量部当り5〜100重量部であり、非プロト
ン系極性溶媒の添加量はECH 100重量部当り1〜20重量
部である。The amount of methyl ethyl ketone added as required is 5 to 100 parts by weight per 100 parts by weight of ECH, and the amount of the aprotic polar solvent added is 1 to 20 parts by weight per 100 parts by weight of ECH.
「作用」 一価又は多価フエノールとECHの反応は一種の平衡反応
であり、反応を円滑に行うためには反応生成水及びアル
カリ金属水酸化物水溶液中の水を順次系外へ取り除く必
要がある。また反応時に副生した塩化ナトリウムが共存
した系では、アルカリ金属水酸化物が存在しなくなつた
場合、生成したエポキシ基が開環してクロルヒドリンと
なり、塩素含有量を上げる大きな要因となるものであ
る。本発明は反応時の系内水分を下げ、反応末期及び過
剰ECHの回収時においてもアルカリ金属水酸化物の適量
を存在させるに最適な方法であり、結果として塩素含有
量を低下させることになる。"Action" The reaction of monovalent or polyvalent phenol with ECH is a kind of equilibrium reaction, and in order to carry out the reaction smoothly, it is necessary to remove the reaction product water and the water in the alkali metal hydroxide aqueous solution to the outside of the system sequentially. is there. In addition, in the system in which sodium chloride, which is a by-product of the reaction, coexists, when the alkali metal hydroxide is absent, the generated epoxy group is opened to form chlorhydrin, which is a major factor in increasing the chlorine content. is there. INDUSTRIAL APPLICABILITY The present invention is an optimal method for lowering the water content in the system during the reaction and allowing an appropriate amount of alkali metal hydroxide to be present even at the end of the reaction and during the recovery of excess ECH, and as a result, the chlorine content will be reduced. .
反応末期及び過剰ECH回収時にアルカリ金属水酸化物を
存在させる方法として、フエノール性水酸基1モル当り
のアルカリ金属水酸化物モル量を増加させることが考え
られるが、反応時の系内水分濃度の高い状態下ではアル
カリ金属水酸化物が主としてECHに基づく副反応に消費
され、効果を示さないものである。さらにメチルエチル
ケトンや非プロトン性極性溶媒を添加することは一価又
は多価フエノールとECHとの反応を促進させるに効果が
あり、結果として塩素含有量を低下させるものである。It is possible to increase the molar amount of alkali metal hydroxide per 1 mol of phenolic hydroxyl group as a method of allowing alkali metal hydroxide to exist at the end of the reaction and during recovery of excess ECH, but the water content in the system during the reaction is high. Under these conditions, the alkali metal hydroxide is consumed mainly in the side reaction based on ECH, which is ineffective. Furthermore, the addition of methyl ethyl ketone or an aprotic polar solvent is effective in promoting the reaction between the monovalent or polyvalent phenol and ECH, and as a result, lowers the chlorine content.
以下にフエノールノボラツクエポキシ樹脂について本発
明の実施例を記載するが、本発明方法はフエノールノボ
ラツクエポキシ樹脂に限定されるものではなく、ビスフ
エノールA型エポキシ樹脂を始め種々のエポキシ樹脂の
製造に適用されるものである。Examples of the present invention will be described below with respect to the phenol novolak epoxy resin, but the method of the present invention is not limited to the phenol novolak epoxy resin and can be applied to the production of various epoxy resins including bisphenol A type epoxy resin. It is applied.
「実施例及び比較例」 実施例1 オルトクレゾールノボラツク樹脂(フエノール性水酸基
当量119)119部(1モル)をECH555部(6モル)に撹拌
溶解させ、反応系内を150mmHgの圧力に調節したのち、
温度64℃に昇温した。これに48重量%の苛性ソーダ水溶
液82.6部(1モル)を連続的に滴下しながら4時間反応
さす場合において、最初は水のみをECHとの共沸蒸留に
よつて分離除去し、ECHは反応系に戻し、48重量%の苛
性ソーダ水溶液の57.8部(0.7モル)が滴下された時点
(2.8時間経過時)より3.5部/分なる速度で過剰分のEC
H及び水を蒸発回収した。48重量%の苛性ソーダ水溶液
の全量を滴下終了した時の系内の温度は66℃であつた。
反応終了後、残余のECHを80mmHg、70℃の条件になるま
で30分間を所要して蒸発除去し、さらに5mmHgの減圧下
に180℃で蒸発を行つた。生成した樹脂及び塩化ナトリ
ウム混合物にメチルイソブチルケトン400部及び温水250
部を加えて溶解し、下層の塩化ナトリウム水溶液を分液
除去した。樹脂溶液層に温水150部を加えて洗浄し、リ
ン酸で中和し、水層を分離したのち更に温水150部で洗
浄し水層を分離した。樹脂溶液は常圧下に大半のメチル
イソブチルケトンを蒸発して除去したのち、5mmHgの減
圧下に180℃の温度で蒸発乾燥を行い168部のオルトクレ
ゾールノボラツクエポキシ樹脂を得た。このものはエポ
キシ当量204、塩素含有量340ppmであつた。"Examples and Comparative Examples" Example 1 119 parts (1 mol) of orthocresol novolak resin (phenolic hydroxyl equivalent 119) was stirred and dissolved in 555 parts (6 mol) of ECH, and the pressure in the reaction system was adjusted to 150 mmHg. Later,
The temperature was raised to 64 ° C. When 82.6 parts (1 mol) of 48 wt% aqueous sodium hydroxide solution was continuously added dropwise to the reaction mixture for 4 hours, first, only water was separated and removed by azeotropic distillation with ECH, and ECH was the reaction system. The excess EC was added at a rate of 3.5 parts / minute from the point (5 hours, 0.7 mol) of the 48% by weight aqueous sodium hydroxide solution was added dropwise (after 2.8 hours).
H and water were collected by evaporation. The temperature inside the system was 66 ° C. at the end of the dropwise addition of the 48% by weight sodium hydroxide aqueous solution.
After the reaction was completed, the remaining ECH was removed by evaporation for 30 minutes until the conditions of 80 mmHg and 70 ° C were reached, and further evaporation was performed at 180 ° C under a reduced pressure of 5 mmHg. 400 parts of methyl isobutyl ketone and 250 parts of hot water in the resin and sodium chloride mixture
Parts were added and dissolved, and the lower layer aqueous sodium chloride solution was separated and removed. The resin solution layer was washed by adding 150 parts of warm water, neutralized with phosphoric acid, and the water layer was separated, and then further washed with 150 parts of warm water to separate the water layer. After removing most of the methyl isobutyl ketone from the resin solution by evaporation under normal pressure, the resin solution was evaporated to dryness at a temperature of 180 ° C. under a reduced pressure of 5 mmHg to obtain 168 parts of orthocresol novolak epoxy resin. This product had an epoxy equivalent of 204 and a chlorine content of 340 ppm.
実施例2 オルトクレゾールノボラツク樹脂(フエノール性水酸基
当量119)119部を、ECH 555部及びメチルエチルケトン1
11部に撹拌溶解させ、反応系内を150mmHgの圧力に調節
したのち、温度52℃に昇温した。これに48重量%の苛性
ソーダ水溶液82.6部を連続的に滴下しながら4時間反応
さす場合において、最初は水のみをECHとの共沸蒸留に
よつて分離除去し、ECHは反応系に戻し、48重量%の苛
性ソーダ水溶液の49.6部(0.6モル)が滴下された時点
(2.4時間経過時)より4.2部/分なる速度で過剰分のEC
H、メチルエチルケトン及び水を蒸発回収した。48重量
%の苛性ソーダ水溶液の全量を滴下終了した時の系内の
温度は58℃であつた。以下実施例1と同様の処理を行い
オルトクレゾールノボラツクエポキシ樹脂168部を得
た。このものはエポキシ当量200、塩素含有量320ppmで
あつた。Example 2 119 parts of orthocresol novolac resin (phenolic hydroxyl equivalent 119), 555 parts of ECH and 1 part of methyl ethyl ketone
After stirring and dissolving in 11 parts, the pressure in the reaction system was adjusted to 150 mmHg, and then the temperature was raised to 52 ° C. When 82.6 parts of a 48 wt% aqueous solution of sodium hydroxide was continuously added dropwise to the reaction mixture for 4 hours, first, only water was separated and removed by azeotropic distillation with ECH, and ECH was returned to the reaction system. EC of excess amount at a rate of 4.2 parts / minute from the time point (42.4 hours) when 49.6 parts (0.6 mol) of a weight% caustic soda solution was dropped.
H, methyl ethyl ketone and water were collected by evaporation. The temperature in the system was 58 ° C. when the dropping of all the 48 wt% caustic soda aqueous solution was completed. Then, the same treatment as in Example 1 was carried out to obtain 168 parts of ortho-cresol novolak epoxy resin. This product had an epoxy equivalent of 200 and a chlorine content of 320 ppm.
実施例3 反応時にジメチルスルホキシド28部を界在させた他は実
施例2と同じ方法で行いオルトクレゾールノボラツクエ
ポキシ樹脂169部を得た。このものはエポキシ当量199、
塩素含有量320ppmであつた。Example 3 169 parts of ortho-cresol novolak epoxy resin was obtained in the same manner as in Example 2 except that 28 parts of dimethyl sulfoxide was bound during the reaction. This one has an epoxy equivalent of 199,
The chlorine content was 320 ppm.
実施例4 フエノールノボラツクエポキシ樹脂(フエノール性水酸
基当量104)104部をECH 462.5部、メチルエチルケトン9
2.5部及びジメチルスルホキシド23部に撹拌溶解させ、5
2℃に昇温した。これに48重量%の苛性ソーダ水溶液82.
6部を滴下しながら4時間反応さす場合において、最初
は水のみをECHとの共沸蒸留によつて分離除去し、ECHは
反応系に戻し、48重量%の苛性ソーダ水溶液の57.8部が
滴下された時点より4.3部/分なる速度で過剰分のECH、
メチルエチルオケトン、ジメチルスルホキシド及び水を
回収した。以下実施例1と同様の処理を行いフエノール
ノボラツクエポキシ樹脂157部を得た。このものはエポ
キシ当量180、塩素含有量380ppmであつた。Example 4 104 parts of phenol novolac epoxy resin (phenolic hydroxyl equivalent 104) ECH 462.5 parts, methyl ethyl ketone 9
Dissolve with stirring in 2.5 parts and 23 parts of dimethyl sulfoxide.
The temperature was raised to 2 ° C. 48% by weight caustic soda solution 82.
In the case of reacting with 6 parts dropwise for 4 hours, first, only water was separated and removed by azeotropic distillation with ECH, ECH was returned to the reaction system, and 57.8 parts of 48 wt% caustic soda aqueous solution was added dropwise. Excess ECH at a rate of 4.3 parts / minute from the
Methyl ethyl ketone, dimethyl sulfoxide and water were recovered. Then, the same treatment as in Example 1 was carried out to obtain 157 parts of a phenol novolak epoxy resin. This product had an epoxy equivalent of 180 and a chlorine content of 380 ppm.
比較例1 オルトクレゾールノボラツク樹脂(フエノール性水酸基
当量119)119部をECH 555部に撹拌溶解させ、反応系内
を150mmHgの圧力に調節したのち、温度64℃に昇温し
た。これに48重量%の苛性ソーダ水溶液82.6部を連続的
に滴下しながら4時間反応した。この間反応により生成
する水及び苛性ソーダ水溶液の水は水−ECH共沸混合物
の還流により分離し、反応系外へ連続的に除去した。反
応終了後、過剰のECHを100mmHg、110℃の条件になるま
で1時間を所要して蒸発除去し、さらに5mmHgの減圧下
に180℃で蒸発を行つた。以下実施例1と同様の処理を
行い、オルトクレゾールノボラツクエポキシ樹脂165部
を得た。このものはエポキシ当量207、塩素含有量1,560
ppmであつた。Comparative Example 1 119 parts of orthocresol novolak resin (phenolic hydroxyl equivalent 119) was dissolved in 555 parts of ECH with stirring, and the pressure in the reaction system was adjusted to 150 mmHg, and then the temperature was raised to 64 ° C. 82.6 parts of a 48 wt% caustic soda aqueous solution was continuously added dropwise to the reaction for 4 hours. During this time, the water generated by the reaction and the water of the caustic soda solution were separated by the reflux of the water-ECH azeotrope and continuously removed to the outside of the reaction system. After completion of the reaction, excess ECH was removed by evaporation for 1 hour until the conditions of 100 mmHg and 110 ° C. were reached, and evaporation was further performed at 180 ° C. under reduced pressure of 5 mmHg. Then, the same treatment as in Example 1 was performed to obtain 165 parts of ortho-cresol novolak epoxy resin. This one has an epoxy equivalent of 207 and a chlorine content of 1,560.
It was ppm.
比較例2 n−ブタノール111部加えた以外は比較例1と同じ方法
で行い、オルトクレゾールノボラツク樹脂166部を得
た。このものはエポキシ当量201、塩素含有量1,020ppm
であり、n−ブタノールとECHとの反応生成物であるブ
チルグリシジルエーテルが10.2部副生した。Comparative Example 2 The procedure of Comparative Example 1 was repeated except that 111 parts of n-butanol was added to obtain 166 parts of orthocresol novolak resin. This product has an epoxy equivalent of 201 and chlorine content of 1,020ppm.
And 10.2 parts of butyl glycidyl ether, which is a reaction product of n-butanol and ECH, was by-produced.
比較例3 オルトクレゾールノボラツク樹脂(フエノール性水酸基
当量119)119部をECH 555部、メチルエチルケトン111部
及びジメチルスルホキシド28部に撹拌溶解させ、反応系
内を150mmHgの圧力に調節したのち、温度52℃に昇温し
た。これに48重量%の苛性ソーダ水溶液82.6部を連続的
に滴下しながら4時間反応した。以下比較例1と同様の
処理を行いオクトクレゾールノボラツクエポキシ樹脂16
7部を得た。このものはエポキシ当量199、塩素含有量44
0ppmであつた。Comparative Example 3 119 parts of orthocresol novolak resin (phenolic hydroxyl equivalent 119) was dissolved in 555 parts of ECH, 111 parts of methyl ethyl ketone and 28 parts of dimethyl sulfoxide with stirring, and the pressure in the reaction system was adjusted to 150 mmHg, and then the temperature was 52 ° C. The temperature was raised to. 82.6 parts of a 48 wt% caustic soda aqueous solution was continuously added dropwise to the reaction for 4 hours. Thereafter, the same treatment as in Comparative Example 1 was carried out, and octocresol novolak epoxy resin 16
I got 7 copies. This has an epoxy equivalent of 199 and a chlorine content of 44.
It was 0 ppm.
「発明の効果」 本発明はフエノール類とECHをアルカリ金属水酸化物の
存在下において反応させ、エポキシ樹脂を製造する際
に、反応後期において過剰分のECHを回収させながら反
応させることにより、得られたエポキシ樹脂の塩素含有
量を著しく低下させることができるという効果を有する
ものである。"Effect of the invention" The present invention is obtained by reacting phenols and ECH in the presence of an alkali metal hydroxide, and reacting while producing an excess of ECH in the latter stage of the reaction when producing an epoxy resin. This has the effect of significantly reducing the chlorine content of the obtained epoxy resin.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−118577(JP,A) 特開 昭57−133116(JP,A) 特開 昭59−25813(JP,A) 特開 昭63−54417(JP,A) ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP 57-118577 (JP, A) JP 57-133116 (JP, A) JP 59-25813 (JP, A) JP 63- 54417 (JP, A)
Claims (1)
ルヒドリンとをアルカリ金属水酸化物の存在下で反応さ
せ、一価又は多価フエノールのグリシジルエーテルを製
造する方法において、全アルカリ金属水酸化物量の50〜
80重量%量を添加するまでは、水をエピクロルヒドリン
との共沸により反応系外に取り出し、エピクロルヒドリ
ンのみを反応系に戻し、全アルカリ金属水酸化物量の50
〜80重量%量を添加した時点から過剰のエピクロルヒド
リンを水と共に回収しながら反応させることを特徴とす
る低塩素含有エポキシ樹脂の製造方法。1. A method for producing a monovalent or polyvalent glycidyl ether of a monovalent or polyvalent phenol by reacting a monovalent or polyvalent phenol with an excess of epichlorohydrin in the presence of an alkali metal hydroxide. 50 ~
Until 80% by weight was added, water was taken out of the reaction system by azeotroping with epichlorohydrin, and only epichlorohydrin was returned to the reaction system, and the total alkali metal hydroxide content was 50%.
A method for producing a low chlorine-containing epoxy resin, which comprises reacting while collecting excess epichlorohydrin together with water from the time when an amount of -80% by weight is added.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62157372A JPH0780992B2 (en) | 1987-06-24 | 1987-06-24 | Method for producing epoxy resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62157372A JPH0780992B2 (en) | 1987-06-24 | 1987-06-24 | Method for producing epoxy resin |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPS641719A JPS641719A (en) | 1989-01-06 |
| JPH011719A JPH011719A (en) | 1989-01-06 |
| JPH0780992B2 true JPH0780992B2 (en) | 1995-08-30 |
Family
ID=15648218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62157372A Expired - Lifetime JPH0780992B2 (en) | 1987-06-24 | 1987-06-24 | Method for producing epoxy resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0780992B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118577A (en) * | 1981-01-14 | 1982-07-23 | Toto Kasei Kk | Preparation of high-purity liquid epoxy resin |
| JPS57133116A (en) * | 1981-02-12 | 1982-08-17 | Toto Kasei Kk | Preparation of high purity phenolic novolak epoxy resin |
| JPS5925813A (en) * | 1982-08-05 | 1984-02-09 | Toto Kasei Kk | Preparation of high purity phenolic novolak-type epoxy resin |
| JPS6354417A (en) * | 1986-08-22 | 1988-03-08 | Mitsui Petrochem Ind Ltd | Production of high-purity polyphenol polyglycidyl ether |
-
1987
- 1987-06-24 JP JP62157372A patent/JPH0780992B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS641719A (en) | 1989-01-06 |
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