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JPH0787262B2 - Method for forming resistor in hybrid integrated circuit - Google Patents
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JPH0787262B2 - Method for forming resistor in hybrid integrated circuit - Google Patents

Method for forming resistor in hybrid integrated circuit

Info

Publication number
JPH0787262B2
JPH0787262B2 JP63217997A JP21799788A JPH0787262B2 JP H0787262 B2 JPH0787262 B2 JP H0787262B2 JP 63217997 A JP63217997 A JP 63217997A JP 21799788 A JP21799788 A JP 21799788A JP H0787262 B2 JPH0787262 B2 JP H0787262B2
Authority
JP
Japan
Prior art keywords
thick film
substrate
heat treatment
resistor
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63217997A
Other languages
Japanese (ja)
Other versions
JPH0266990A (en
Inventor
光博 星井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP63217997A priority Critical patent/JPH0787262B2/en
Publication of JPH0266990A publication Critical patent/JPH0266990A/en
Publication of JPH0787262B2 publication Critical patent/JPH0787262B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Parts Printed On Printed Circuit Boards (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ハイブリッド集積回路の抵抗体形成方法に係
り、具体的には厚膜抵抗体の抵抗値の高温放置特性を改
善するための技術に関する。
Description: TECHNICAL FIELD The present invention relates to a method for forming a resistor in a hybrid integrated circuit, and more specifically, a technique for improving the high temperature storage characteristic of the resistance value of a thick film resistor. Regarding

〔背景技術〕[Background technology]

従来にあっては、Ag電極間において樹脂基板の上にカー
ボン抵抗ペースト等の抵抗ペーストを印刷し、乾燥させ
る工程を繰り返した後、各抵抗ペーストを硬化させて厚
膜抵抗体を形成していた。そして、配線基板の製造後、
この配線基板の上に部品を実装し、半田ディップ等の方
法によって半田付けを行い、部品を配線基板に搭載して
ハイブリッド集積回路を製造していた。
Conventionally, a thick film resistor was formed by printing a resistance paste such as a carbon resistance paste between Ag electrodes on a resin substrate and repeating the step of drying and then curing each resistance paste. . Then, after manufacturing the wiring board,
A component is mounted on this wiring board, soldering is performed by a method such as solder dipping, and the component is mounted on the wiring board to manufacture a hybrid integrated circuit.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

上記のように部品は半田ディップ等によって配線基板に
搭載されているが、この部品搭載時の半田ディップ等に
よる急激な熱ストレスのため、厚膜抵抗体の硬化後特性
として厚膜抵抗体中に内部応力及び内部歪みが発生す
る。そのため、高温放置における厚膜抵抗体の抵抗変化
率は、半田ディップを行わない場合と比較してかなり劣
化する。
As described above, the components are mounted on the wiring board by solder dip, etc., but due to the rapid thermal stress due to the solder dip etc. when mounting this component, the thick film resistor has the following characteristics as a characteristic after hardening. Internal stress and strain occur. Therefore, the resistance change rate of the thick film resistor when left at high temperature is considerably deteriorated as compared with the case where the solder dip is not performed.

この対策としては、半田ディップを行った後、熱エージ
ングによって厚膜抵抗体の内部応力を緩和するという方
法がある。しかし、この方法によると、150℃,3時間と
いうようなかなりの高温かつ長時間の処理を必要とし、
樹脂基板の耐熱性を考えると、一般の樹脂基板ではこ
の処理によって劣化を生じる恐れがあり、また、部品
搭載後に行われる処理であるため、耐熱温度の低い部品
(例えば、電解コンデンサの耐熱温度は、通常で85℃で
ある。)が搭載されている場合、この方法を用いること
ができないという欠点があった。
As a countermeasure for this, there is a method of relaxing the internal stress of the thick film resistor by thermal aging after solder dipping. However, this method requires treatment at 150 ° C for 3 hours at a fairly high temperature and for a long time,
Considering the heat resistance of the resin substrate, this process may cause deterioration in general resin substrates, and since it is a process performed after component mounting, components with low heat resistance (for example, the heat resistant temperature of an electrolytic capacitor is , Usually 85 ° C.), This method cannot be used.

しかして、本発明は、上記のような欠点のない厚膜抵抗
体の高温放置特性の改善方法を提供することを目的とし
てなされたものである。
Therefore, the present invention has been made for the purpose of providing a method for improving the high temperature storage characteristics of a thick film resistor without the above-mentioned drawbacks.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明のハイブリッド集積回路の抵抗体形成方法は、基
板の表面に抵抗ペーストを印刷して乾燥させる工程を繰
り返して複数層に形成した後、熱履歴の異なる複数層の
各抵抗体の初期状態を揃えるための短時間の低温熱処理
を施し、その直後に当該抵抗体を硬化させることを特徴
としている。
A method for forming a resistor of a hybrid integrated circuit according to the present invention includes a step of printing a resistor paste on a surface of a substrate and drying the paste to form a plurality of layers, and then forming an initial state of each resistor of a plurality of layers having different thermal histories. It is characterized in that a low-temperature heat treatment for a short time is performed for alignment, and immediately after that, the resistors are cured.

〔作用〕[Action]

基板に抵抗ペーストを印刷し、乾燥させた後、従来にあ
っては直ちに抵抗ペーストを硬化させて厚膜抵抗体を形
成していたのに対し、本発明にあっては、抵抗ペースト
の硬化直前に、熱履歴の異なる複数層の各抵抗体の初期
状態を揃えるための短時間の低温熱処理(乾燥温度以
上)を加えることにより厚膜抵抗体の抵抗値の高温放置
特性を改善することができた。すなわち、抵抗ペースト
の硬化過程の直前に熱処理を加えることにより抵抗ペー
ストの初期状態を揃えることができ、これにより均一で
安定した特性の厚膜抵抗体を形成し、その抵抗値の経時
的な変化を小さくすることができるのである。
Immediately before curing the resistance paste, in the present invention, the resistance paste was printed on the substrate and dried, and then, in the conventional method, the resistance paste was immediately cured to form a thick film resistor. In addition, by applying a short-time low-temperature heat treatment (drying temperature or more) to align the initial state of each resistor of multiple layers with different thermal history, it is possible to improve the high temperature storage characteristics of the resistance value of the thick film resistor. It was That is, the initial state of the resistance paste can be made uniform by applying heat treatment immediately before the curing process of the resistance paste, thereby forming a thick film resistor having uniform and stable characteristics and changing its resistance value with time. Can be reduced.

また、この方法における熱処理は、厚膜抵抗体の硬化前
の処理、すなわち部品搭載前の処理であるので、搭載部
品に影響を与えることが無く、使用部品の種類に制限さ
れることなく実施することができる。さらに、この方法
における熱処理は短時間(数分〜数10分)で済むので、
ハイブリッド集積回路の総工程時間に大きな影響を与え
ず、製造効率をほとんど低下させない。
Further, since the heat treatment in this method is a treatment before hardening of the thick film resistor, that is, a treatment before mounting the components, it is carried out without affecting the mounted components and without being restricted by the type of components used. be able to. Furthermore, since the heat treatment in this method can be completed in a short time (several minutes to several tens of minutes),
It does not significantly affect the total process time of the hybrid integrated circuit, and the manufacturing efficiency is hardly reduced.

また、この方法における熱処理は、乾燥温度に近い温度
(低い温度のほうが効果が高い。)で短時間に行うこと
ができるので、基板が樹脂基板の場合にも熱で基板を劣
化させる恐れがない。
Further, since the heat treatment in this method can be performed at a temperature close to the drying temperature (a lower temperature is more effective) in a short time, even if the substrate is a resin substrate, there is no fear of heat deteriorating the substrate. .

〔実施例〕〔Example〕

以下、本発明の実施例を添付図に基づいて詳述する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

基板の表面に厚膜抵抗体を有する第2図のようなハイブ
リッド集積回路の製造工程を第1図に示してあるので、
以下第1図の流れに沿って説明する。
Since the manufacturing process of the hybrid integrated circuit as shown in FIG. 2 having the thick film resistor on the surface of the substrate is shown in FIG.
A description will be given below along the flow of FIG.

基板1は、実施例においては、エポキシ樹脂系基板やフ
ェノール系樹脂基板等の樹脂基板を示してある。この基
板1の表面には所定の配線パターンのAg電極3が形成さ
れ、この後基板1の上にスクリーン印刷等の手法でカー
ボン抵抗ペースト等の抵抗ペースト2a,2b,…が印刷さ
れ、乾燥させられる。抵抗ペースト2a,2b,…は、シート
抵抗値の異なる毎に繰り返して基板1の上の所定箇所に
印刷され、乾燥させられる。こうしてシート抵抗値の異
なる数種の抵抗ペースト2a,2b,…の印刷及び乾燥が終了
した後、基板1は熱処理工程へ送られ、抵抗ペースト2
a,2b,…に短時間の熱処理が施される。ここで、熱処理
の条件としては、乾燥温度より高い温度(>60℃)で行
われるが、温度は小さいほうが高温放置特性の改善に効
果がある。また、熱処理時間は、数分〜数10分である
が、10〜20分くらいが適当である。熱処理が完了する
と、直ちに抵抗ペースト2a,2b,…は硬化させられ、基板
1表面にカーボン抵抗等の厚膜抵抗体4が形成される。
さらに、基板1には所要の加工が施されて配線基板が製
造される。こうして、製造された配線基板には搭載部品
が実装され、半田ディップ等の方法で半田付けされる。
In the embodiment, the substrate 1 is a resin substrate such as an epoxy resin substrate or a phenol resin substrate. An Ag electrode 3 having a predetermined wiring pattern is formed on the surface of the substrate 1, and thereafter, a resistance paste 2a, 2b, ... Such as a carbon resistance paste is printed on the substrate 1 by a method such as screen printing and dried. To be The resistance pastes 2a, 2b, ... Are repeatedly printed at predetermined positions on the substrate 1 each time the sheet resistance value differs, and dried. After the printing and drying of several types of resistance pastes 2a, 2b, ... Having different sheet resistance values are completed in this way, the substrate 1 is sent to the heat treatment step, and the resistance paste 2
Short heat treatment is applied to a, 2b, .... Here, the heat treatment is performed at a temperature higher than the drying temperature (> 60 ° C.), but a lower temperature is effective in improving the high temperature storage property. Further, the heat treatment time is several minutes to several tens minutes, but 10 to 20 minutes is suitable. Immediately after the heat treatment is completed, the resistance pastes 2a, 2b, ... Are hardened to form thick film resistors 4 such as carbon resistors on the surface of the substrate 1.
Further, the substrate 1 is subjected to required processing to manufacture a wiring substrate. In this way, mounting components are mounted on the manufactured wiring board and soldered by a method such as solder dipping.

上記の熱処理は、厚膜抵抗体の硬化の過程の直前に熱処
理を施すことにより、硬化後に厚膜抵抗体同志の間に特
性差が生じないよう初期状態を揃えるために行われるも
のであり、特に抵抗ペーストの乾燥回数によって特性差
が生じないように初期状態を揃えられる。したがって、
硬化の過程において、均一で安定した特性の厚膜抵抗体
が形成されると共に、半田ディップの工程においても、
内部応力や内部歪みの発生を抑えることができるのであ
る。このため、厚膜抵抗体を高温で放置した場合の抵抗
値の経時的変化も小さくなり、高温放置特性が改善され
るのである。
The above heat treatment is performed in order to align the initial state so that no characteristic difference occurs between the thick film resistors after curing by performing the heat treatment immediately before the process of curing the thick film resistor, Especially, the initial state can be made uniform so that the characteristic difference does not occur depending on the number of times the resistance paste is dried. Therefore,
A thick film resistor with uniform and stable characteristics is formed during the curing process, and also during the solder dipping process.
The generation of internal stress and internal strain can be suppressed. For this reason, when the thick film resistor is left at high temperature, the change in resistance value over time becomes small, and the high temperature storage property is improved.

(測定結果) 第3図に示すものは、70℃、100℃及び170℃の各温度で
20分間の熱処理を施された厚膜抵抗体について、85℃の
環境温度で72時間放置された後の抵抗値の変化率を測定
した結果であり、縦軸に変化率(%)を示してある(横
軸には特に意味はない。)。このグラフより、熱処理温
度が低いほど高温放置特性の改善度合いの高いことが読
み取られるので、抵抗ペーストの乾燥が可能な最低温度
付近で熱処理を行うことにより高温放置特性を良好に改
善できることが明らかである。
(Measurement results) The values shown in Fig. 3 are at 70 ℃, 100 ℃ and 170 ℃.
This is the result of measuring the rate of change of resistance value after leaving the thick film resistor that has been heat-treated for 20 minutes at the ambient temperature of 85 ° C for 72 hours, and the rate of change (%) is shown on the vertical axis. There is no particular meaning on the horizontal axis. It can be seen from this graph that the lower the heat treatment temperature, the higher the degree of improvement in the high temperature storage characteristics, so it is clear that the high temperature storage characteristics can be improved satisfactorily by performing the heat treatment near the lowest temperature at which the resistance paste can be dried. is there.

〔発明の効果〕〔The invention's effect〕

本発明によれば、硬化前の短時間の低温熱処理で厚膜抵
抗体の高温放置特性を改善することができ、高温におけ
る厚膜抵抗体の抵抗値の経時的変化の小さい、安定した
厚膜抵抗体を得ることができる。しかも、部品搭載前に
熱処理を施しているので、耐熱温度の低い搭載部品に劣
化をもたらすことがなく、搭載部品の種類に制限される
ことなく広い範囲にわたって実施することができる。さ
らに、短時間の熱処理で足りるので、ハイブリッド集積
回路の総工程時間にも大きな影響を与えない。また、比
較的低い温度で短時間の熱処理で足りるので、樹脂基板
の場合にも基板の劣化を招くこともない。
ADVANTAGE OF THE INVENTION According to this invention, the high temperature standing characteristic of a thick film resistor can be improved by the low temperature heat treatment for a short time before hardening, and the stable thick film with little change with time of the resistance value of a thick film resistor at high temperature. A resistor can be obtained. Moreover, since the heat treatment is performed before mounting the components, the mounted components having a low heat resistant temperature are not deteriorated, and the components can be applied over a wide range without being limited by the type of the mounted components. Furthermore, since heat treatment for a short time is sufficient, it does not significantly affect the total process time of the hybrid integrated circuit. Further, since heat treatment at a relatively low temperature for a short time is sufficient, deterioration of the substrate does not occur even in the case of a resin substrate.

【図面の簡単な説明】 第1図は本発明の一実施例を示す工程図、第2図は同上
の基板の上に形成された厚膜抵抗体を示す平面図、第3
図は厚膜抵抗体の抵抗値の変化率の高温放置特性を示す
グラフである。 1…基板 2a,2b…抵抗ペースト
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a process drawing showing an embodiment of the present invention, FIG. 2 is a plan view showing a thick film resistor formed on a substrate of the same, and FIG.
The figure is a graph showing the high temperature storage characteristics of the change rate of the resistance value of the thick film resistor. 1 ... Substrate 2a, 2b ... Resistor paste

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】基板の表面に抵抗ペーストを印刷して乾燥
させる工程を繰り返して複数層に形成した後、熱履歴の
異なる複数層の各抵抗体の初期状態を揃えるための短時
間の低温熱処理を施し、その直後に当該抵抗体を硬化さ
せることを特徴とするハイブリッド集積回路の抵抗体形
成方法。
1. A low-temperature heat treatment for a short time for aligning the initial state of each resistor of a plurality of layers having different thermal histories after repeating a step of printing a resistance paste on a surface of a substrate and drying it to form a plurality of layers. The method for forming a resistor in a hybrid integrated circuit, comprising:
JP63217997A 1988-08-31 1988-08-31 Method for forming resistor in hybrid integrated circuit Expired - Fee Related JPH0787262B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63217997A JPH0787262B2 (en) 1988-08-31 1988-08-31 Method for forming resistor in hybrid integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63217997A JPH0787262B2 (en) 1988-08-31 1988-08-31 Method for forming resistor in hybrid integrated circuit

Publications (2)

Publication Number Publication Date
JPH0266990A JPH0266990A (en) 1990-03-07
JPH0787262B2 true JPH0787262B2 (en) 1995-09-20

Family

ID=16713008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63217997A Expired - Fee Related JPH0787262B2 (en) 1988-08-31 1988-08-31 Method for forming resistor in hybrid integrated circuit

Country Status (1)

Country Link
JP (1) JPH0787262B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10343808B2 (en) 2014-05-15 2019-07-09 P.E. Labellers S.P.A. Labeling machine

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796589A (en) * 1980-12-08 1982-06-15 Sony Corp Method of producing thick film resistance circuit board
JPS62162312A (en) * 1985-12-23 1987-07-18 東京コスモス電機株式会社 Manufacturing method of printed resistor circuit board
JPS62179703A (en) * 1986-02-03 1987-08-06 松下電器産業株式会社 How to form printed resistors

Also Published As

Publication number Publication date
JPH0266990A (en) 1990-03-07

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