JPH0787900B2 - UV treatment device - Google Patents
UV treatment deviceInfo
- Publication number
- JPH0787900B2 JPH0787900B2 JP2163407A JP16340790A JPH0787900B2 JP H0787900 B2 JPH0787900 B2 JP H0787900B2 JP 2163407 A JP2163407 A JP 2163407A JP 16340790 A JP16340790 A JP 16340790A JP H0787900 B2 JPH0787900 B2 JP H0787900B2
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- chamber
- ozone
- stage
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/141—Feedstock
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Coating Apparatus (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は紫外線と紫外線により発生するオゾンとによ
り、ガラス，金属，プラスチック等の固体表面を処理す
る紫外線処理装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet treatment apparatus for treating a solid surface such as glass, metal or plastic with ultraviolet rays and ozone generated by the ultraviolet rays.
従来の技術とその課題 近年、紫外線ランプを用いて有機汚染物を分解・除去す
る光洗浄や、ガラス・樹脂表面に紫外線を照射して、そ
の表面を改質してコーティングの際のぬれ性改善や、蒸
着膜の密着改善ができる技術が実用化されてきた。この
紫外線を利用した表面処理は洗浄効果が高いことから、
半導体や液晶表示装置の製造分野で有効な利用が期待さ
れている。Conventional technology and its problems In recent years, optical cleaning that decomposes and removes organic contaminants using an ultraviolet lamp, and irradiation of ultraviolet rays on the glass / resin surface to modify the surface to improve wettability during coating In addition, a technique that can improve the adhesion of the deposited film has been put into practical use. Since this surface treatment using ultraviolet rays has a high cleaning effect,
It is expected to be effectively used in the field of manufacturing semiconductors and liquid crystal display devices.
これらに用いられるランプは185nmと254nmを主とした波
長の紫外線を放射し、この185nm紫外線は空気中の酸素
をオゾンに変化させるため、多量のオゾンが発生する。
この185nm,254nmの紫外線とオゾンが被照射体表面に作
用して光洗浄や表面改質の効果をもたらすものである。The lamps used for these emit ultraviolet rays having wavelengths mainly at 185 nm and 254 nm, and the 185 nm ultraviolet rays change oxygen in the air into ozone, so a large amount of ozone is generated.
The 185 nm and 254 nm ultraviolet rays and ozone act on the surface of the irradiated object to bring about the effects of photocleaning and surface modification.
すなわち、185nmと紫外線が有機物の化学結合を切断
し、254nmの紫外線はオゾンに作用して活性化の酸素原
子を作り、切断された有機物と化学反応し、ガス状物質
に変化させたり、新規な表面層を形成したりするといわ
れている。That is, 185 nm and ultraviolet rays break the chemical bonds of organic substances, and 254 nm ultraviolet rays act on ozone to create activating oxygen atoms, which chemically react with the cut organic substances and change into gaseous substances, It is said to form a surface layer.
紫外線を利用した表面処理は、紫外線照射により発生す
るオゾンも利用する。しかもオゾンは濃度が高い方が処
理効率が上がる傾向にある。The surface treatment using ultraviolet rays also uses ozone generated by irradiation with ultraviolet rays. Moreover, the higher the ozone concentration, the higher the treatment efficiency.
しかしオゾンは人体に対して有害であり、労働安全衛生
基準では作業環境雰囲気としてのオゾン濃度を一定以下
にするように規定している。However, ozone is harmful to the human body, and the occupational safety and health standards stipulate that the ozone concentration in the work environment atmosphere be kept below a certain level.
照射室の紫外線ランプはオゾンを発生させるが、照射室
は高い濃度のオゾンを保持して同時に、外部に漏れない
ようにすることが重要である。The ultraviolet lamp in the irradiation chamber generates ozone, but it is important that the irradiation chamber holds a high concentration of ozone and at the same time prevents it from leaking to the outside.
ところが、照射室には被処理物を搬出入させるための出
入口を設ける必要があり、ここからオゾンが漏れやすい
構造となる。本発明は、これら相反する問題を解決すべ
く工夫されたものである。However, it is necessary to provide an entrance / exit for loading and unloading the object to be processed in the irradiation chamber, and the structure is such that ozone easily leaks from here. The present invention has been devised to solve these conflicting problems.
課題を解決するための手段 本発明の紫外線処理装置は、照射室とステージ室とから
構成され、照射室とステージ室との間に第１のシャッタ
を設け、ステージ室と装置外部との出入口に第２のシャ
ッタを設け、該第１のシャッタが開の時は該第２のシャ
ッタが閉で、該第１のシャッタが閉の時は該第２のシャ
ッタが開となるように制御され、各室はオゾンガス分解
フィルタを通して排気されていて、各室の圧力の大きさ
が照射室＜ステージ室く大気圧となるように設定されて
いることを特徴とする。Means for Solving the Problems An ultraviolet treatment apparatus of the present invention is composed of an irradiation chamber and a stage chamber, and a first shutter is provided between the irradiation chamber and the stage chamber, and is provided at the entrance of the stage chamber and the outside of the apparatus. A second shutter is provided, and when the first shutter is open, the second shutter is closed, and when the first shutter is closed, the second shutter is open. Each chamber is exhausted through an ozone gas decomposition filter, and the pressure of each chamber is set so that the irradiation chamber is smaller than the stage chamber and atmospheric pressure.
作用 紫外線処理装置は照射室とステージ室とから構成され、
被処理物がステージ室を経由して照射室へ出入りする２
重構造になっている。Action The UV treatment device consists of an irradiation chamber and a stage chamber.
The object to be processed enters and leaves the irradiation room via the stage room 2
It has a heavy structure.
また、照射室とステージ室との間に第１のシャッタを設
け、ステージ室と外部との間に第２のシャッタを設け、
第１のシャッタが（開）の時は該第２のシャッタが
（閉）で、第１のシャッタが（閉）の時は第２のシャッ
タが（開）となるように制御され、各室はオゾン分解フ
ィルタを通してブロワで排気され、照射室のガス圧力は
ステージ室より低くなるように調整される。Further, a first shutter is provided between the irradiation chamber and the stage chamber, and a second shutter is provided between the stage chamber and the outside.
When the first shutter is (open), the second shutter is (closed), and when the first shutter is (closed), the second shutter is (open). Is exhausted by a blower through an ozone decomposition filter, and the gas pressure in the irradiation chamber is adjusted to be lower than that in the stage chamber.
これによって、通常は第１のシャッタを閉じて密閉式に
して被処理物の出入口からガスが漏れないようにしてあ
り、被処理物が出入りするとき第１のシャッタを開ける
必要があるが、照射室で発生するオゾンは制御されたガ
ス圧力差により、ステージ室へ流れにくくなっており、
もし濃度拡散により若干漏れても第２のシャッタが閉じ
ているために、ステージ室のガスは外部へ漏れず、オゾ
ンに対する安全性が確保される。As a result, the first shutter is normally closed so that gas does not leak from the inlet / outlet of the object to be processed, and it is necessary to open the first shutter when the object to be processed enters and leaves. Ozone generated in the chamber is difficult to flow to the stage chamber due to the controlled gas pressure difference,
Even if the gas slightly leaks due to the concentration diffusion, the gas in the stage chamber does not leak to the outside because the second shutter is closed, and the safety against ozone is secured.
実施例 以下、本発明を好適な実施例を用いて説明する。Examples Hereinafter, the present invention will be described using preferred examples.
第１図および第２図は本発明による紫外線処理装置の平
面図と横断面図である。1 and 2 are a plan view and a cross-sectional view of an ultraviolet processing apparatus according to the present invention.
処理装置は照射室Ａとステージ室Ｂから構成され、照射
室には主として波長が185nmと254nmの紫外線を放射する
合成石英製の低圧水銀ランプ１と処理台９が配置されて
いる。ステージ室には被処理物２を把んで移動させるア
ーム３を有する搬送ロボット４と、未処理物の入ったカ
セット５と、処理済み品の入ったカセット８と、被処理
物を冷却するために一時的に置くステージ台6,7が設け
られている。The processing apparatus is composed of an irradiation chamber A and a stage chamber B. In the irradiation chamber, a low-pressure mercury lamp 1 made of synthetic quartz, which mainly emits ultraviolet rays having wavelengths of 185 nm and 254 nm, and a processing table 9 are arranged. In the stage chamber, a transfer robot 4 having an arm 3 for grasping and moving the object 2 to be processed, a cassette 5 containing an unprocessed material, a cassette 8 containing a processed material, and a cooling object to be processed. Stage stands 6 and 7 for temporary placement are provided.
照射室とステージ室との間には第１のシャッタ10を有す
る被処理物の出入口があり、ステージ室と外部との間に
は第２のシャッタ11,12を有する被処理物の出入口があ
る。被処理物は搬送ロボット４に付属するアーム３によ
ってシャッタ11のある入口を通って、カセット５から取
出され、次に第１のシャッタ10のある出入口を通って照
射室内の処理台９に移動させ、一定時間照射されて処理
される。処理された被処理物２は搬送ロボット3,4によ
ってステージ台６または７に放置され冷却される。一定
時間冷却した被処理物２はシャッタ12を有する出口を通
ってカセット８に収納される。There is an entrance / exit of the object to be processed having the first shutter 10 between the irradiation chamber and the stage chamber, and an entrance / exit of the object to be processed having the second shutters 11 and 12 between the stage chamber and the outside. . The object to be processed is taken out from the cassette 5 through the entrance having the shutter 11 by the arm 3 attached to the transfer robot 4, and then moved to the processing table 9 in the irradiation room through the entrance having the first shutter 10. , Is irradiated for a certain period of time and processed. The processed object 2 is left on the stage table 6 or 7 and cooled by the transfer robots 3 and 4. The workpiece 2 cooled for a certain period of time is stored in the cassette 8 through an outlet having a shutter 12.
シャッタ10,11,12は閉じると密閉状態となり、被処理物
２が出入するときのみ開状態となる。シャッタの動作は
第１のシャッタ10が開状態のとき第２のシャッタ11,12
は閉じておく。また第２のシャッタ11又は12が開状態の
ときは、第１のシャッタ10は閉じるようにしておく。こ
れによりオゾンの装置外部への漏れを防止することがで
きる。When the shutters 10, 11 and 12 are closed, they are in a hermetically closed state, and are opened only when the object 2 to be processed enters and leaves. The operation of the shutters is such that when the first shutter 10 is in the open state, the second shutters 11 and 12 are
Keep it closed. When the second shutter 11 or 12 is open, the first shutter 10 is closed. This makes it possible to prevent ozone from leaking outside the device.
なお、照射室Ａには給気口13と排気口14が設けられ、ス
テージ室Ｂには排気口15が設けられている。給気口は外
部から各種ガスを給気するためのものであり、排気口1
4,15はオゾンガス分解フィルタを通して外部へ排気する
ためのものである。The irradiation chamber A is provided with an air supply port 13 and an exhaust port 14, and the stage chamber B is provided with an exhaust port 15. The air supply port is for supplying various gases from the outside, and the exhaust port 1
4,15 are for exhausting to the outside through the ozone gas decomposition filter.
照射室内の圧力はステージ室内より低く、ステージ室内
の圧力は外部の大気圧より低くなるように各室の給気量
および排気量を調節する。これによってオゾンの外部へ
の漏れを防止することができる。The pressure in the irradiation chamber is lower than that in the stage chamber, and the supply air amount and the exhaust amount in each chamber are adjusted so that the pressure in the stage chamber is lower than the external atmospheric pressure. This can prevent ozone from leaking to the outside.
発明の効果 以上説明したように、本発明の紫外線処理装置は照射室
で高濃度のオゾンを維持して処理効率を高めるととも
に、被処理物の出入時により外部へオゾンおよび紫外線
が漏れないようにして人体に対する安全性を高める効果
を有するものである。Effects of the Invention As described above, the ultraviolet treatment apparatus of the present invention maintains high concentration ozone in the irradiation chamber to improve the treatment efficiency, and prevents ozone and ultraviolet rays from leaking to the outside when the object to be treated enters and leaves. It has the effect of increasing the safety to the human body.
第１図は本発明装置の実施例を示す平面図であり、第２
図は同装置の横断面図である。 Ａ……照射室,B……ステージ室 １……ランプ,2……被処理物 10……第１のシャッタ 11及び12……第２のシャッタFIG. 1 is a plan view showing an embodiment of the device of the present invention.
The figure is a cross-sectional view of the apparatus. A ... Irradiation room, B ... Stage room 1 ... Lamp, 2 ... Object to be processed 10 ... First shutter 11 and 12 ... Second shutter
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ２３Ｇ 5/00 9352−4Ｋ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location C23G 5/00 9352-4K
Claims (1)
装置において、 照射室とステージ室との間に位置する被処理物の出入口
には第１のシャッタを設け、 ステージ室と装置外部との間に位置する被処理物の出入
口には第２のシャッタを設け、 該第１のシャッタが開の時は該第２のシャッタが閉で、
該第１のシャッタが閉の時は該第２のシャッタが開とな
るように制御され、 各室はオゾンガス分解フィルタを通して排気され、各室
の圧力の大きさが照射室＜ステージ室＜大気圧となるよ
うに設定されていることを特徴とする紫外線処理装置。1. An ultraviolet processing apparatus having an irradiation chamber and a stage chamber, wherein a first shutter is provided at an entrance / exit of an object to be processed, which is located between the irradiation chamber and the stage chamber. A second shutter is provided at the entrance / exit of the object to be processed located between the two, and when the first shutter is opened, the second shutter is closed,
The second shutter is controlled to be opened when the first shutter is closed, each chamber is exhausted through an ozone gas decomposition filter, and the pressure of each chamber is such that the irradiation chamber <stage chamber <atmospheric pressure. The ultraviolet processing apparatus is characterized by being set so that
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2163407A JPH0787900B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2163407A JPH0787900B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0459042A JPH0459042A (en) | 1992-02-25 |
| JPH0787900B2 true JPH0787900B2 (en) | 1995-09-27 |
Family
ID=15773309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2163407A Expired - Lifetime JPH0787900B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0787900B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4934002B2 (en) * | 2007-10-22 | 2012-05-16 | 株式会社荏原製作所 | Plating method |
-
1990
- 1990-06-21 JP JP2163407A patent/JPH0787900B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0459042A (en) | 1992-02-25 |
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