JPH0788224B2 - Method of manufacturing gradient index lens - Google Patents
Method of manufacturing gradient index lensInfo
- Publication number
- JPH0788224B2 JPH0788224B2 JP61180719A JP18071986A JPH0788224B2 JP H0788224 B2 JPH0788224 B2 JP H0788224B2 JP 61180719 A JP61180719 A JP 61180719A JP 18071986 A JP18071986 A JP 18071986A JP H0788224 B2 JPH0788224 B2 JP H0788224B2
- Authority
- JP
- Japan
- Prior art keywords
- gel
- dopant
- solution
- sol
- sintered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000499 gel Substances 0.000 claims description 50
- 239000002019 doping agent Substances 0.000 claims description 33
- 238000009826 distribution Methods 0.000 claims description 31
- -1 alkyl silicate Chemical compound 0.000 claims description 17
- 238000005245 sintering Methods 0.000 claims description 17
- 239000011148 porous material Substances 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 11
- 230000003301 hydrolyzing effect Effects 0.000 claims description 8
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 239000011240 wet gel Substances 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 4
- 238000004017 vitrification Methods 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 239000000243 solution Substances 0.000 description 24
- 230000003287 optical effect Effects 0.000 description 20
- 239000011521 glass Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000003980 solgel method Methods 0.000 description 6
- 239000004743 Polypropylene Substances 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 229910052716 thallium Inorganic materials 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 238000001354 calcination Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 3
- 229910002020 Aerosil® OX 50 Inorganic materials 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WXYNMTGBLWPTNQ-UHFFFAOYSA-N tetrabutoxygermane Chemical compound CCCCO[Ge](OCCCC)(OCCCC)OCCCC WXYNMTGBLWPTNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は屈折率分布型レンズの製造方法に関する。The present invention relates to a method of manufacturing a gradient index lens.
本発明は、アルキルシリケートを酸性触媒下で加水分解
して得られる溶液とアルキルシリケートを塩基性触媒下
で加水分解して得られる溶液を混合してゾルを製造し、
ゾルを円筒状容器に注入し、前記円筒状容器の中でゲル
化してウェットゲルを製造し、ウェットゲルを乾燥して
ドライゲルを製造し、ドライゲルを焼結して、連続した
細孔を有する焼結ゲル(I)を製造し、焼結ゲル(I)
をドーパントを含む溶液に浸漬し、このドーパントが前
記細孔の内部に沈積した焼結ゲル(II)を製造し、焼結
ゲル(II)をドーパント可溶液に浸漬して、部分的にド
ーパントを溶出させ、内部にドーパントの濃度分布を有
する焼結ゲル(III)を製造し、焼結ゲル(III)を焼結
して透明ガラス化することにより、屈折率分布を生じさ
せる屈折率分布型レンズの製造方法である。The present invention, a solution obtained by hydrolyzing an alkyl silicate under an acidic catalyst and a solution obtained by hydrolyzing an alkyl silicate under a basic catalyst are mixed to produce a sol,
Injecting sol into a cylindrical container, gelling in the cylindrical container to produce a wet gel, drying the wet gel to produce a dry gel, sintering the dry gel, baking with continuous pores Sintered gel (I) is produced by producing a binding gel (I).
Is immersed in a solution containing a dopant to produce a sintered gel (II) in which the dopant is deposited inside the pores, and the sintered gel (II) is immersed in a solution of a dopant to partially disperse the dopant. A gradient index lens that produces a refractive index distribution by eluting it to produce a sintered gel (III) having a dopant concentration distribution therein, and sintering the sintered gel (III) into a transparent glass. Is a manufacturing method.
従来、屈折率分布型レンズとしてよく知られているもの
にSELFOC (日本板硝子商標)レンズがある。これは、
予め電子分極率の大きいタリウムなどのイオンを均一に
ガラスロッドに含ませておき、これをカリウムなどの電
子分極率の小さいイオンを含む高温の溶融塩浴中でイオ
ン交換反応を起こさせ、タリウムイオンの濃度分布、す
なわち屈折率分布を形成する(イオン交換法)。 Conventionally well known as gradient index lens
To SELFOC There is a (Nippon Sheet Glass trademark) lens. this is,
Ionize ions such as thallium, which has a large electronic polarizability, in advance.
Keep it in the glass rod and charge it with potassium.
Ions in a high temperature molten salt bath containing ions with a small polarizability.
Ion exchange reaction to cause thallium ion concentration distribution,
That is, a refractive index distribution is formed (ion exchange method).
また、最近“分子スタッフィング法”という新しい方法
が考案されている(特開昭51−126207,特公昭60−2405
7)これは、ガラスの分相現象を利用した多孔質体、あ
るいは火炎加水分解法等により得られるシリカ微粉末焼
成多孔質体などの細孔中に、屈折率調整剤(ドーパン
ト)を沈積させ、ドーパントの温度による溶解度差など
を利用してドーパントを部分的に溶出させ、ドーパント
濃度分布、すなわち屈折率分布を形成する方法である。Also, recently, a new method called "molecular stuffing method" has been devised (JP-A-51-126207, JP-B-60-2405).
7) This is because a refractive index adjusting agent (dopant) is deposited in the pores of a porous body using the phase separation phenomenon of glass, or a silica fine powder calcined porous body obtained by a flame hydrolysis method or the like. A method of forming a dopant concentration distribution, that is, a refractive index distribution by partially eluting the dopant by utilizing the difference in solubility of the dopant depending on the temperature.
上記発明のうち、イオン交換法は反応速度論的に見ても
製造上非常に長時間を要する。例えば数ミリの外径のも
ので1週間以上の日数と高温状態を必要とする。また分
子スタッフィング法について、ガラスの分相現象を利用
した多孔質体を前駆体として用いた場合、不純物の影響
を考えなくてはならない。本発明の如き屈折率分布型レ
ンズは当然の事ながら光部品として用いられるため、光
損失につながる不純物はできるだけ少ないことが望まし
い。特に通信用への応用を考えた場合、不純物はppmの
オーダーで残存しているも不適当である。その意味から
も、前駆体である多孔質体の選択により光部品としての
用途が制限されてしまうことになる。一方、前駆体とし
て火炎加水分解法による多孔質シリカを用いることも考
えられているが反応収率の低さや、装置が複雑であるな
ど、コスト的な面から問題を有している。Among the above-mentioned inventions, the ion exchange method requires a very long time for production even in view of reaction kinetics. For example, an outer diameter of several millimeters requires days for one week or more and high temperature. Further, regarding the molecular stuffing method, when a porous body using the phase separation phenomenon of glass is used as a precursor, the influence of impurities must be considered. Since the gradient index lens according to the present invention is used as an optical component as a matter of course, it is desirable that impurities that cause optical loss be as small as possible. In particular, considering the application for communication, it is inappropriate that impurities remain in the order of ppm. From that point of view, the use as an optical component is limited by the selection of the precursor porous body. On the other hand, it has been considered to use porous silica obtained by a flame hydrolysis method as a precursor, but it has a problem in terms of cost such as a low reaction yield and a complicated apparatus.
そこで本発明の目的は、ゾル−ゲル法を利用することに
より、純度の高い大型の屈折率分布型レンズを低コスト
で提供することにある。Therefore, an object of the present invention is to provide a large-sized gradient index lens of high purity at low cost by utilizing the sol-gel method.
本発明の屈折率分布型レンズの製造方法は、ゾル−ゲル
法により得られる多孔質体を屈折率調整剤(以下ドーパ
ント)を含む溶液に浸漬し、ドーパントを細孔内部に沈
積(スタッフィング)した後、該多孔質体をさらにドー
パント可溶液に浸漬することにより部分的にドーパント
を溶出させ(アンスタッフィング)、該多孔質体内部に
ドーパント濃度分布、すなわち屈折率分布を生じせし
め、これを乾燥,焼結することを特徴とする。In the method for producing a gradient index lens of the present invention, the porous body obtained by the sol-gel method is immersed in a solution containing a refractive index adjusting agent (hereinafter referred to as a dopant), and the dopant is deposited inside the pores (stuffing). Then, the dopant is partially eluted by further immersing the porous body in a dopant soluble solution (unstuffing) to generate a dopant concentration distribution inside the porous body, that is, a refractive index distribution, which is dried, Characterized by sintering.
本発明によれば、ゾル−ゲル法のメリットのひとつでも
ある高純度の多孔質体が得られる。また大きさに関して
は、従来ゾル−ゲル法では大きいバルク体を製造するの
は困難であったが、最近になって、金属アルコキシドの
酸性触媒による加水分解液に微粒子を分散させることに
より大型のバルクが製造できる方法が考案された(特願
昭58−23757,特願昭60−26001)。この発明は石英ガラ
スの製造に係るものであるが、その概要を説明すると、
まずアルキルシリケートの酸性触媒加水分解液を調整
し、これにアルキルシリケートの塩基性触媒加水分解に
よるシリカ微粒子を混合し原料ゾルとする。このような
原料ゾルから得られるゲルは、比較的大きい細孔を有し
つつも結合力の強いもので、大きいバルクを得るために
画期的な方法と言える。According to the present invention, a highly pure porous body, which is one of the merits of the sol-gel method, can be obtained. Regarding the size, it has been difficult to produce a large bulk body by the conventional sol-gel method, but recently, a large bulk body has been obtained by dispersing fine particles in a hydrolyzed solution of a metal alkoxide with an acidic catalyst. Was devised (Japanese Patent Application Nos. 58-23757 and 60-26001). This invention relates to the production of quartz glass, and the outline thereof is as follows.
First, an acidic catalyst hydrolysis solution of an alkyl silicate is prepared, and silica fine particles obtained by the basic catalyst hydrolysis of an alkyl silicate are mixed with this to obtain a raw material sol. A gel obtained from such a raw material sol has a strong binding force even though it has relatively large pores, and can be said to be an epoch-making method for obtaining a large bulk.
さて、このように大きいゲルが得られるゾル−ゲル法
と、分子スタッフィング法を組み合わせることによっ
て、短時間で大型の屈折率分布型レンズが得られること
になる。またゾル−ゲル法は原料収率も高いことから低
コスト化という見地からも有用な方法である。By combining the sol-gel method for obtaining such a large gel and the molecular stuffing method, a large-sized gradient index lens can be obtained in a short time. In addition, the sol-gel method is also a useful method from the viewpoint of cost reduction since the raw material yield is high.
ところで、ゾル原料に関しては、目的用途によって自由
度がある。例えば、大型化がさほど要求されない場合
は、シリカ微粒子を混合しなくともある程度の大きさの
多孔質体は得られる。また、純度的に許容範囲の広いも
のについては使用するシリカ微粒子は市販の粉体(例え
ば、アエロジルOX−50:deggusa社製)でもかまわない。By the way, regarding the sol raw material, there is a degree of freedom depending on the intended use. For example, when the size is not so required, a porous body having a certain size can be obtained without mixing silica fine particles. In addition, silica fine particles to be used may be commercially available powders (for example, Aerosil OX-50: manufactured by deggusa) for those having a wide range of purity.
スタッフィンゲに用いる多孔質体は上記方法により得ら
れたゲルであるが、ゾルをゲル化させ乾燥させたいわゆ
るドライゲルのままでは強度的に弱いため、ある程度の
熱処理を加え、ゲルの強度を向上させる(仮焼)。この
時の熱処理は、基本的には、ゲルの細孔が平行化しない
程度のものであるが、細孔が小さくなりすぎると、後の
ドーパント溶液の拡散速度が遅くなるため、適当な条件
を選ばなくてはならない。The porous body used for the stuffing is a gel obtained by the above method, but the so-called dry gel obtained by gelating and drying the sol is weak in strength, so some heat treatment is added to improve the strength of the gel. (Calcination). The heat treatment at this time is basically such that the pores of the gel do not become parallel, but if the pores become too small, the diffusion rate of the dopant solution afterwards becomes slow, so appropriate conditions should be adopted. You have to choose.
ドーパントの種類は、分子スタッフィング法の原理から
酸化され、ガラス中で屈折率を高める作用をするもので
スタッフィングする際の溶液条件から、温度や溶媒によ
って溶解度が著しく変わる化合物として存在しているも
のがよい。CsNO3,Pb(NO3)2,TlNO3,Tl2SO4などが代表
的なものとなろう。The type of dopant is oxidized by the principle of the molecular stuffing method and has the function of increasing the refractive index in glass.Therefore, there are compounds that exist as compounds whose solubility changes significantly depending on the temperature and solvent depending on the solution conditions during stuffing. Good. CsNO 3, Pb (NO 3) 2, TlNO 3, such as Tl 2 SO 4 will become representative.
上記のようなドーパントを水あるいは適当な溶媒に溶か
し、高温状態でゲル中に均一に拡散させる。これを冷却
することにより高度差から生じる溶解度差分だけドーパ
ントがゲル細孔中に沈積されることになる。The dopant as described above is dissolved in water or a suitable solvent and uniformly dispersed in the gel at a high temperature. By cooling this, the dopant is deposited in the gel pores by the difference in solubility caused by the difference in height.
次に、アンスタッフィング工程として、上記ゲルを、あ
る程度ドーパントが溶けるような溶液中に浸漬する。こ
れによりゲルの外周部より部分的にドーパントが溶出さ
れ、液−液拡散の原理に基づいたドーパント濃度分布が
ゲル中に形成されることとなる。ただし、この時も、浸
漬液の温度,種類,浸漬時間などにより、ドーパント濃
度分布も大きく変化するため、所望の濃度分布になるよ
う厳密にコントロールしなくてはならない。Next, as an unstuffing step, the gel is immersed in a solution in which the dopant is dissolved to some extent. As a result, the dopant is partially eluted from the outer peripheral portion of the gel, and a dopant concentration distribution based on the liquid-liquid diffusion principle is formed in the gel. However, at this time as well, the dopant concentration distribution changes greatly depending on the temperature, type, immersion time, etc. of the immersion liquid, and therefore it is necessary to strictly control the concentration distribution so as to obtain a desired concentration distribution.
このようにして、内部にドーパント濃度分布を有したゲ
ルを作つた後、これを乾燥,焼結するわけであるが、焼
結工程においては、ゲルがガラスへ転移した後の結晶化
という問題を含んでいるため、焼結温度には注意を払わ
ねばならない。またガラ中に気泡が存在することは光部
品としての性能を著しく低下させてしまうことから、そ
の対策として、焼結をヘリウム雰囲気下で行なったり、
減圧状態で行なうことが有効である。In this way, after forming a gel having a dopant concentration distribution inside, it is dried and sintered, but in the sintering process, the problem of crystallization after the gel has been transformed into glass Care must be taken with respect to the sintering temperature as it contains. Also, the presence of air bubbles in the glass significantly reduces the performance as an optical component, so as a countermeasure, sintering in a helium atmosphere,
It is effective to carry out under reduced pressure.
以下実施例により本発明を詳しく説明する。The present invention is described in detail below with reference to examples.
〔実施例1〕 I ゲル作製 アンモニア合成シリカ(アンモジル)製造 蒸留したエチルシリケート(Si(OEt)4)206gエタノ
ール347g、アンモニア水(29%)9.5g、水72gを混合、
2時間撹拌し、5日間静置した。これをロータリーエバ
ポレーターを用いて、シリカ濃度が0.40g/ccになるまで
濃縮した。[Example 1] Preparation of I gel Preparation of ammonia-synthesized silica (ammozil) 206 g of distilled ethyl silicate (Si (OEt) 4 ) 347 g of ethanol, 9.5 g of ammonia water (29%), 72 g of water were mixed,
The mixture was stirred for 2 hours and left standing for 5 days. This was concentrated using a rotary evaporator until the silica concentration became 0.40 g / cc.
バインダー調製 蒸留したエチルシリケート165g、テトラブトキシゲルマ
ニウム72gとエタノール146gの混合溶液に0.2規定の塩酸
71gを滴下し加水分解を行なった。Binder preparation Distilled ethyl silicate 165g, tetrabutoxy germanium 72g and ethanol 146g mixed solution 0.2N hydrochloric acid
71 g was added dropwise for hydrolysis.
混合.ゲル化 上記で合成したアンモジル溶液を2規定のアンモニア
水を用いてPHを4.00に調整した後、上記で調製したバ
インダーと混合したところ、溶液のPHは3.80になった。
この溶液をさらに0.2規定のアンモニア水でPHを4.50に
調整し、ポリプロピレン製円筒容器(内径10mm×長さ20
0mm)に流し入れた。2時間後にゲル化したが、密閉状
態で30℃の恒温室内で3日間熟成した。mixture. Gelation When the pH of the ammozil solution synthesized above was adjusted to 4.00 with 2N aqueous ammonia and then mixed with the binder prepared above, the pH of the solution became 3.80.
The pH of this solution was further adjusted to 4.50 with 0.2N ammonia water, and a polypropylene cylindrical container (inner diameter 10 mm x length 20
0 mm). Although it gelled after 2 hours, it was aged in a thermostatic chamber at 30 ° C. for 3 days in a sealed state.
乾燥 上記、ウェットゲルを3%の開口率を有するポリプロピ
レン製の箱型容器(200mm×300mm×100mm)に移し替え
て60℃の恒温室内で乾燥させた。10日後に室温中でも割
れない安定なドライゲル(外径6mm×長さ120mm)が得ら
れた。Drying The above wet gel was transferred to a polypropylene box container (200 mm × 300 mm × 100 mm) having an opening ratio of 3% and dried in a thermostatic chamber at 60 ° C. After 10 days, a stable dry gel (outer diameter 6 mm x length 120 mm) that did not crack even at room temperature was obtained.
仮焼 上記、ドライゲルを室温から30℃/時の昇温速度で1000
℃まで昇温し、5時間保持した。この時、ゲル中の有機
物等を除去するため酸素雰囲気下で仮焼を行なった。Calcination The above dry gel was heated from room temperature to 30 ° C / hour at a heating rate of 1000
The temperature was raised to ℃ and kept for 5 hours. At this time, calcination was performed in an oxygen atmosphere to remove organic substances and the like in the gel.
上記工程により、屈折率分布型レジスタガラスの前駆体
となるシリカ多孔質体が得られた。Through the above steps, a silica porous body as a precursor of the gradient index resistor glass was obtained.
II スタッフィング CsNO3の100℃における飽和水溶液を調製した。前記、仮
焼後のゲルをこの溶液に3時間浸漬した。この時、浸漬
前は白いゲル体が溶液が細孔内に均一に拡散されたこと
により、半透明の状態になった。II A saturated aqueous solution of stuffing CsNO 3 at 100 ° C was prepared. The calcinated gel was immersed in this solution for 3 hours. At this time, the white gel body was in a semitransparent state before the immersion because the solution was uniformly dispersed in the pores.
III アンスタッフィング 上記、スタッフィング後のゲルを、70℃のエタノール50
vol%水溶液に浸漬した。30分後、ゲルをとり出し、0
℃の水中に5分間浸した。III Unstuffing The above-mentioned stuffed gel is treated with ethanol at 70 ℃.
It was immersed in a vol% aqueous solution. After 30 minutes, take out the gel and
It was immersed in water at 0 ° C for 5 minutes.
IV 焼結 上記、アンスタッフィング後のゲルを60℃の恒温室内で
一昼夜乾燥させた後、以下のプログラムに従い拡散炉内
で焼結を行なった。IV Sintering The above-mentioned gel after unstuffing was dried in a constant temperature room at 60 ° C for one day and then sintered in a diffusion furnace according to the following program.
まず、室温から700℃まで60℃/時で昇温しこの温度で1
0時間保持した。つづいて、ヘリウムガスを0.5/分流
しながら1100℃まで30℃/時で昇温しこの温度で10時間
保持し、さらに1200℃まで30℃/時で昇温しこの温度で
10時間保持して焼結を終了した。First, raise the temperature from room temperature to 700 ° C at 60 ° C / hour and
Hold for 0 hours. Subsequently, while flowing helium gas at 0.5 / minute, the temperature was raised to 1100 ° C at 30 ° C / hour and kept at this temperature for 10 hours, and further raised to 1200 ° C at 30 ° C / hour and kept at this temperature.
It was held for 10 hours to complete the sintering.
以上の焼結により、外径5mm長さ100mmの透明ガラスロッ
ドが得られた。By the above sintering, a transparent glass rod having an outer diameter of 5 mm and a length of 100 mm was obtained.
V 分析 上記、ガラスロッドの一部を切り出し、径方向における
セシウムの濃度分布を測定した。図1にその分布図を示
すが、外周部付近は2乗分布からのかい離が見られるが
中心部はほぼ2乗分布に近いものであった。V analysis A part of the glass rod was cut out and the concentration distribution of cesium in the radial direction was measured. The distribution chart is shown in FIG. 1. The deviation from the square distribution was observed in the vicinity of the outer peripheral portion, but it was close to the square distribution in the central portion.
VI 光学測定 通常の光学測定の手法を用いて、上記ロッドレンズの光
学特性を測定したところ、比屈折率差△n=0.01、開口
数NA=0.20、集束定数g=0.09mm-1であった。VI Optical measurement The optical characteristics of the rod lens were measured using the ordinary optical measurement method, and the relative refractive index difference was Δn = 0.01, the numerical aperture NA = 0.20, and the focusing constant g = 0.09 mm −1 . .
また、得られたガラスロッドの純度分析を行なったとこ
ろ、光損失の大きな原因となるFe,Ti,Cr,その他遷移金
属などの不純物は検出されなかった。In addition, when the purity of the obtained glass rod was analyzed, impurities such as Fe, Ti, Cr, and other transition metals, which largely cause optical loss, were not detected.
〔実施例2〕 I ゲル作製 実施例1と同様にして、ゲルを作製した。[Example 2] I Preparation of gel A gel was prepared in the same manner as in Example 1.
II スタッフィング 80℃においてTlSO4の飽和水溶液を調製し、上記ゲルを
2時間浸漬した。II Stuffing A saturated aqueous solution of TlSO 4 was prepared at 80 ° C, and the above gel was immersed for 2 hours.
III アンスタッフィング 上記、スタッフィング後のゲルを60℃のエタノール40vo
l%水溶液に40分間浸漬した後、0℃の水に1分間浸し
た。III Unstuffing The gel after stuffing above was treated with ethanol 40 vo at 60 ° C.
After being immersed in a 1% aqueous solution for 40 minutes, it was immersed in water at 0 ° C. for 1 minute.
IV 焼結 上記、アンスタッフィング後のゲルを60℃の恒温室内で
一昼夜乾燥させた後、以下のプログラムに従い拡散炉内
で焼結した。IV Sintering The above-mentioned gel after unstuffing was dried in a constant temperature room at 60 ° C. for one day and then sintered in a diffusion furnace according to the following program.
まず、室温から700℃まで60℃/時で昇温しこの温度で1
0時間保持した。次に1000℃まで30℃/時で昇温したと
ころで、炉心管内をロータリーポンプで減圧にした。内
圧は100mmHgに保持した。この状態で1200℃まで30℃/
時で昇温し、この温度で20時間保持して、焼結を終了し
た。First, raise the temperature from room temperature to 700 ° C at 60 ° C / hour and
Hold for 0 hours. Next, when the temperature was raised to 1000 ° C. at 30 ° C./hour, the pressure inside the core tube was reduced by a rotary pump. The internal pressure was maintained at 100 mmHg. In this state, up to 1200 ℃, 30 ℃ /
The temperature was raised over time, and the temperature was maintained for 20 hours to complete the sintering.
以上の焼結により、外径5mm、長さ100mmの透明ガラスロ
ッドが得られた。By the above sintering, a transparent glass rod having an outer diameter of 5 mm and a length of 100 mm was obtained.
V 分析 実施例1と同様に、上記ガラスロッドの径方向のタリウ
ム濃度分布を測定したところ、分布形状的には、実施例
1のものとほとんど差はなかった。V. Analysis The thallium concentration distribution in the radial direction of the glass rod was measured in the same manner as in Example 1, and there was almost no difference in distribution shape from that in Example 1.
VI 光学測定 実施例1と同様に、上記ロッドレンズの光学特性を測定
した。VI Optical Measurement The optical characteristics of the rod lens were measured in the same manner as in Example 1.
△n=0.02,NA=0.29 g=0.120であった。Δn = 0.02, NA = 0.29 g = 0.120.
〔実施例3〕 I ゲル作製 精製した市販のエチルシリケート500gに、0.02規定塩酸
165gを加え撹拌し加水分解を行なった。これにさらに水
165gを加えた後、市販のシリカ微粉末(Aerosil OX−50
deggusa社製)を145g加えて2時間撹拌、2時間超音波
振動を印加し、分散性の高いシリカゾル溶液とした。0.
1規定のアンモニア水によりPHを4.50に調整した後、ポ
リプロピレン性円筒容器(内径10mm×長さ200mm)多数
本に流し入れた50分後にゲル化したものを、ポリプロピ
レン性箱型容器に移し替え、開口率5%のフタをして、
60℃の恒温室内で乾燥させたところ、10日間で乾燥が終
了した。[Example 3] Preparation of I gel In 500 g of purified commercially available ethyl silicate, 0.02 N hydrochloric acid was added.
165 g was added and stirred for hydrolysis. More water on this
After adding 165 g, commercially available silica fine powder (Aerosil OX-50
145 g (manufactured by Deggusa) was added and stirred for 2 hours and ultrasonic vibration was applied for 2 hours to obtain a silica sol solution having high dispersibility. 0.
After adjusting the pH to 4.50 with 1N ammonia water, pour it into a large number of polypropylene cylindrical containers (inner diameter 10 mm x length 200 mm) 50 minutes later, transfer the gelled material to a polypropylene box container, and open it. Cover with a 5% rate,
When dried in a thermostatic chamber at 60 ° C, the drying was completed in 10 days.
上記ドライゲルを実施例1と同様な工程で、ロッドレン
ズの作製したところ、ほぼ同様な光学特性が得られた。When the rod lens was manufactured using the above dry gel in the same process as in Example 1, almost the same optical characteristics were obtained.
〔実施例4〕 スタッフィング工程までを実施例1と全く同様に行な
い、アンスタッフィング工程を以下のように変えた。Example 4 Up to the stuffing step was performed in exactly the same way as in Example 1, and the unstuffing step was changed as follows.
まず、スタッフィング後のゲルを50℃のエタノール40vo
l.%水溶液に3時間浸漬した後、すばやく70℃のエタノ
ール20vol.%水溶液にうつしかえ、20分間浸漬した後、
0℃の水に2分間浸した。First, the gel after stuffing is treated with ethanol 40 vo at 50 ° C.
After soaking in l.% aqueous solution for 3 hours, quickly change to 20vol.% ethanol aqueous solution at 70 ℃ and soak for 20 minutes.
Immerse in 0 ° C. water for 2 minutes.
焼結も実施例1と同様に行ない、得られた透明ガラスロ
ッドの径方向のセシウム濃度分布を測定した。図2にそ
れを示すが、実施例1(図1)のものに比べ、外周付近
での2乗分布からのかい離がかなり改善されていること
がわかる。Sintering was also performed in the same manner as in Example 1, and the cesium concentration distribution in the radial direction of the obtained transparent glass rod was measured. As shown in FIG. 2, it can be seen that the deviation from the square distribution in the vicinity of the outer circumference is considerably improved as compared with that of Example 1 (FIG. 1).
光学特性についても、△n=0.018,開口数NA=0.025,g
=0.095と実施例1のものに比べかなり高特性のものが
得られた。As for optical characteristics, △ n = 0.018, numerical aperture NA = 0.025, g
= 0.095, which is considerably higher than that of Example 1.
〔実施例5〕 I ゲル作製 外径30mm長さ200mmのポリプロピレン製円筒容器に、実
施例1と同様のゾルを流し入れゲル化させ、これを乾燥
させることにより大型のドライゲルを得た。これを同様
に仮焼を行なった。Example 5 I Preparation of gel A sol similar to that of Example 1 was poured into a polypropylene cylindrical container having an outer diameter of 30 mm and a length of 200 mm to cause gelation, and the gel was dried to obtain a large dry gel. This was similarly calcined.
II スタッフィング 100℃においてTlNO3の飽和水溶液を調製し上記ゲルを4
時間浸漬した。II Stuffing Prepare a saturated aqueous solution of TlNO 3 at 100 ° C and
Soak for hours.
III アンスタッフィング 70℃のエタノール40vol.%水溶液に1時間浸漬した後、
さらに90℃の温水中に5分間浸し、0℃の水に30秒間浸
した。III Unstuffing After soaking in an aqueous solution of 40 vol.% Ethanol at 70 ℃ for 1 hour,
Further, it was dipped in warm water of 90 ° C. for 5 minutes and dipped in water of 0 ° C. for 30 seconds.
IV 焼結 焼結は実施例1と同様に行なった。IV Sintering Sintering was performed as in Example 1.
以上により、外径15mm長さ100mmの大型ガラスロッドが
得られた。From the above, a large glass rod having an outer diameter of 15 mm and a length of 100 mm was obtained.
タリウムの濃度分布形状については、ほぼ図2に示した
のと同様で、外周付近まで2乗分布に近いものであっ
た。The concentration distribution shape of thallium was almost the same as that shown in FIG. 2, and was close to a square distribution up to the outer periphery.
〔実施例6〕 実施例1で得られたロッドレンズの外周を光学研磨し、
充分洗浄を行なった後、市販の石英ガラス管でジャツケ
ットし、通常の方法で外径125μmの太さに線引し光損
失測定を行なったところ、0.85μmの波長帯で10dB/km
と低損失であった。[Example 6] The outer periphery of the rod lens obtained in Example 1 was optically polished,
After thorough washing, jacketing with a commercially available quartz glass tube and drawing the optical loss to an outer diameter of 125 μm by the usual method and measuring the optical loss showed that it was 10 dB / km in the 0.85 μm wavelength band.
And low loss.
同様にして、実施例3で得られたロッドレンズについて
も光損失を測定したところ500dB/kmと高損失で、少なく
とも通信用には使用できないことがわかった。Similarly, the optical loss of the rod lens obtained in Example 3 was measured and found to be as high as 500 dB / km, which means that it cannot be used for at least communication.
以上述べたように、アルキルシリケートを酸性触媒下で
加水分解して得られる溶液とアルキルシリケートを塩基
製触媒下で加水分解して得られる溶液を混合したゾルを
原料ゾルとし、該ゾル液をゲル化乾燥させ、必要ならば
熱処理を加えてなる多孔質体をドーパントを含む溶液に
浸漬し、ドーパントを細孔内部に沈積(スタッフィン
グ)した後、該多孔質体をさらにドーパント可溶液に浸
漬することにより部分的にドーパントを溶出させ(アン
スタッフィング)、該多孔質体内部にドーパント濃度分
布すなわち屈折率分布を生じせしめ、これを焼結するこ
とによって高純度で大型の屈折率分布型レンズが低コス
トで得られる。即ち、本発明の効果は、以下の通りであ
る。As described above, a sol obtained by mixing a solution obtained by hydrolyzing an alkyl silicate under an acidic catalyst and a solution obtained by hydrolyzing an alkyl silicate under a base catalyst is used as a raw material sol, and the sol liquid is a gel. Immersing the porous body, which has been dried and dried and, if necessary, subjected to heat treatment, in a solution containing the dopant, stuffing the dopant inside the pores (stuffing), and then immersing the porous body in a solution containing a dopant. To partially elute the dopant (unstuffing) to generate a dopant concentration distribution, that is, a refractive index distribution inside the porous body, and by sintering this, a high-purity large-sized gradient index lens can be manufactured at low cost. Can be obtained at. That is, the effects of the present invention are as follows.
特許請求の範囲A)〜D)の工程で、アルキルシリケ
ートを酸性触媒下で加水分解して得られる溶液とアルキ
ルシリケートを塩基性触媒下で加水分解して得られる溶
液とを混合して得られるゾルを用いているので、ゾル中
は純度の高い粒子が分散しているために、不純物の少な
いガラス体を歩留まり良く安価なコストで製造すること
ができる。Obtained by mixing a solution obtained by hydrolyzing an alkyl silicate under an acidic catalyst with a solution obtained by hydrolyzing an alkyl silicate under a basic catalyst in the steps of claims A) to D). Since the sol is used, since particles of high purity are dispersed in the sol, it is possible to manufacture a glass body having a small amount of impurities with a high yield and at a low cost.
特許請求の範囲のE)〜F)の工程で、連続した細孔
を内部に有する焼結ゲルを用いているので、ドーパント
を含む溶液に浸漬すべき多孔質体の強度が大きくなりま
す。従いまして、大きな屈折率分布型レンズを歩留まり
良く製造することができる。本発明においてはシリカ系
ガラスによる屈折率分布型レンズについて述べたが、他
の金属アルコキシド及び金属酸化物微粒子等を用いても
同様な効果が得られることは言うまでもない。また多孔
質体の形状、スタッフィングの手法等を少し変えるだけ
で、様々な屈折率分布を有する光学部品、例えば、光通
信における光結合器、光分波器用のスラブレンズ、各種
光導波路、マイクロレンズアレーなどが作製でき、今後
のオプトエレクトロニクス機器部品として多様な発展,
応用が考えられよう。In the steps E) to F) of the claims, since the sintered gel having continuous pores inside is used, the strength of the porous body to be immersed in the solution containing the dopant becomes large. Therefore, a large gradient index lens can be manufactured with high yield. Although the gradient index lens made of silica-based glass has been described in the present invention, it is needless to say that the same effect can be obtained by using other metal alkoxide, metal oxide fine particles and the like. In addition, optical components with various refractive index distributions, such as optical couplers in optical communication, slab lenses for optical demultiplexers, various optical waveguides, and microlenses, can be obtained by slightly changing the shape of the porous body and the stuffing method. Arrays can be produced, and various developments as optoelectronic device parts in the future,
Applications could be considered.
第1図はCsの濃度分布図。 実線は本発明における実測値を示す。 破線は最適2乗分布曲線を示す。 第2図はCsの濃度分布図。 実線は本発明における実測値を示す。 破線は最適2乗分布曲線を示す。 Figure 1 is a Cs concentration distribution map. The solid line indicates the measured value in the present invention. The broken line shows the optimum square distribution curve. Figure 2 is a Cs concentration distribution chart. The solid line indicates the measured value in the present invention. The broken line shows the optimum square distribution curve.
Claims (1)
水分解して得られる溶液とアルキルシリケートを塩基性
触媒下で加水分解して得られる溶液を混合してゾルを製
造する工程と、 B)前記ゾルを円筒状容器に注入し、前記円筒状容器の
中でゲル化してウェットゲルを製造する工程と、 C)前記ウェットゲルを乾燥してドライゲルを製造する
工程と、 D)前記ドライゲルを焼結して、連続した細孔を有する
焼結ゲル(I)を製造する工程と、 E)前記焼結ゲル(I)をドーパントを含む溶液に浸漬
し、前記ドーパントが前記細孔の内部に沈積した焼結ゲ
ル(II)を製造する工程と、 F)前記焼結ゲル(II)をドーパント可溶液に浸漬し
て、部分的にドーパントを溶出させ、内部にドーパント
の濃度分布を有する焼結ゲル(III)を製造する工程
と、 G)前記焼結ゲル(III)を焼結して透明ガラス化する
工程と、 をこの順序で有することを特徴とする屈折率分布型レン
ズの製造方法。1. A step of preparing a sol by mixing a solution obtained by hydrolyzing an alkyl silicate under an acidic catalyst with a solution obtained by hydrolyzing an alkyl silicate under a basic catalyst, and B). Injecting the sol into a cylindrical container and gelling in the cylindrical container to produce a wet gel; C) drying the wet gel to produce a dry gel; and D) baking the dry gel. And a step of producing a sintered gel (I) having continuous pores, and E) immersing the sintered gel (I) in a solution containing a dopant to deposit the dopant inside the pores. And (F) a sintered gel having the concentration distribution of the dopant inside, by immersing the sintered gel (II) in a dopant-solvable solution to partially elute the dopant. Manufacture (III) Degree and, G) production method of the sintered gel (III) a step of transparent vitrification by sintering, a gradient index lens, characterized in that it comprises in that order.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61180719A JPH0788224B2 (en) | 1986-07-31 | 1986-07-31 | Method of manufacturing gradient index lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61180719A JPH0788224B2 (en) | 1986-07-31 | 1986-07-31 | Method of manufacturing gradient index lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6340731A JPS6340731A (en) | 1988-02-22 |
| JPH0788224B2 true JPH0788224B2 (en) | 1995-09-27 |
Family
ID=16088119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61180719A Expired - Fee Related JPH0788224B2 (en) | 1986-07-31 | 1986-07-31 | Method of manufacturing gradient index lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0788224B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55104939A (en) * | 1979-02-01 | 1980-08-11 | Sumitomo Electric Ind Ltd | Production of optical transmission glass |
-
1986
- 1986-07-31 JP JP61180719A patent/JPH0788224B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6340731A (en) | 1988-02-22 |
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