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JPH0790163B2 - Pumped liquid supply device - Google Patents
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JPH0790163B2 - Pumped liquid supply device - Google Patents

Pumped liquid supply device

Info

Publication number
JPH0790163B2
JPH0790163B2 JP62218689A JP21868987A JPH0790163B2 JP H0790163 B2 JPH0790163 B2 JP H0790163B2 JP 62218689 A JP62218689 A JP 62218689A JP 21868987 A JP21868987 A JP 21868987A JP H0790163 B2 JPH0790163 B2 JP H0790163B2
Authority
JP
Japan
Prior art keywords
pressure
liquid
pipe system
storage tank
liquid supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62218689A
Other languages
Japanese (ja)
Other versions
JPS6458340A (en
Inventor
義彰 大杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP62218689A priority Critical patent/JPH0790163B2/en
Publication of JPS6458340A publication Critical patent/JPS6458340A/en
Publication of JPH0790163B2 publication Critical patent/JPH0790163B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/008Feed or outlet control devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0046Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Saccharide Compounds (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Control Of Non-Electrical Variables (AREA)

Description

【発明の詳細な説明】 (イ)産業上の利用分野 この発明は、圧送式液体供給装置に関する。さらに詳し
くは、種々の液体をガス圧により所定量供給することが
でき、ことに自動DNA合成装置等の連続化学処理を行な
う装置における各種試薬や溶媒の供給装置として有用な
圧送式液体供給装置に関する。
TECHNICAL FIELD The present invention relates to a pressure-feed type liquid supply device. More specifically, the present invention relates to a pressure-feeding liquid supply device which can supply various liquids in a predetermined amount by gas pressure and is particularly useful as a supply device for various reagents and solvents in a device that performs continuous chemical treatment such as an automatic DNA synthesizer. .

(ロ)従来の技術 従来、自動DNA合成装置等の化学合成処理装置において
は、種々の試薬や溶媒が用いられており、これらの液体
を各々圧送により反応容器や分析セル等に所定量送液す
るシステムが知られている。かかるシステムにおいて
は、通常、圧送用ガス導入口及び排出口を上部に備え、
下部に液体排出口を備えた液体貯留槽(リザーバ)が用
いられている。
(B) Conventional technology Conventionally, various reagents and solvents have been used in chemical synthesis processing devices such as automatic DNA synthesizers, and these liquids are pumped by a predetermined amount to a reaction container or analysis cell. There are known systems for doing this. In such a system, normally, a pressure-feeding gas inlet and outlet are provided in the upper part,
A liquid storage tank (reservoir) having a liquid discharge port at the bottom is used.

そしてこれらリザーバにおける試薬や溶媒の残液量の管
理は、通常オペレータの目視や、送液路に設けられた液
センサを用いて行なわれている。
The management of the residual liquid amount of the reagent or the solvent in these reservoirs is usually performed by the operator's visual observation or using a liquid sensor provided in the liquid feeding path.

(ハ)発明が解決しようとする問題点 しかしながら、前記した自動DNA合成装置のごとき化学
合成処理装置に用いる試薬は一般に高価である。従って
溶媒や試薬の不足によって合成反応工程が中断されるこ
とは、合成のやり直し等の事態を招き、避けるべきであ
る。この点、試薬や溶媒の残液管理を注意深く行なう必
要があるが、前述のごとく、この管理をオペレータの目
視によって行なう方法では完全を期し難くしばしば失敗
の原因となる。また、液センサを送液路に設けて液不足
を検出する方法では、すでに合成が開始されてしまった
後に液不足が検出されて無意味な場合が多かった。
(C) Problems to be Solved by the Invention However, the reagents used in the chemical synthesis processing apparatus such as the above-mentioned automatic DNA synthesis apparatus are generally expensive. Therefore, interruption of the synthesis reaction step due to lack of a solvent or reagents causes a situation such as re-synthesis and should be avoided. In this respect, it is necessary to carefully manage the residual liquid of the reagents and solvents, but as described above, the method of performing this management by the operator's eyes is difficult to complete and often causes failure. In addition, in the method of detecting a liquid shortage by providing a liquid sensor in the liquid feeding path, it is often meaningless because the liquid shortage is detected after the synthesis has already started.

このため、リザーバに光学検出式の液面センサを設ける
ことも行なわれているが、この場合には液面検出用の専
用の細管状の液面水準管をリザーバに設ける必要があ
り、リザーバの脱着や洗浄等の取扱い上不便であり、し
かもリザーバ毎に高価な液面センサを設ける必要がある
点で不利である。
For this reason, an optical detection type liquid level sensor is also provided in the reservoir. In this case, however, it is necessary to provide a dedicated thin liquid level tube for liquid level detection in the reservoir. It is inconvenient in handling such as desorption and cleaning, and is disadvantageous in that an expensive liquid level sensor needs to be provided for each reservoir.

また、リザーバに重量計を設けて残量を管理することも
考えられるが、この場合も個々に高価な重量計を設ける
必要があり不利である。
Further, it is conceivable to provide a weight scale in the reservoir to manage the remaining amount, but in this case as well, it is necessary to provide an expensive weight scale individually, which is disadvantageous.

この発明は、かかる状況下なされたものであり、ことに
多数のリザーバについて残液量の管理を簡便かつ経済的
に行ないうる液体供給装置を提供しようとするものであ
る。
The present invention has been made under such circumstances, and particularly aims to provide a liquid supply device capable of easily and economically managing the residual liquid amount for a large number of reservoirs.

(ニ)問題点を解決するための手段 かくしてこの発明によれば、加圧手段を備えた加圧管系
と、(b)開閉弁を有するガス排出管系と、(c)上部
が閉鎖状の容器からなり、その内部に、上記加圧管系に
接続される圧送用ガス導入口及び上記ガス排出管系に接
続されるガス排出口を、下方に、液体供給管に接続され
る液体排出口を備えてなる液体貯留槽と、(d)上記加
圧管系内又はガス排出管系内に設けられた圧力センサ
と、(e)予め入力された上記液体貯留槽内の空隙容積
と圧力変化率との検量線と、実測される圧力変化率とを
対比して実際の空隙容積を算出し、さらに上記液体貯留
槽内の全容積から上記算出された空隙容積を減算して残
液量を算出し、表示する演算部、とから構成されてなる
圧送式液体供給装置が提供される。
(D) Means for Solving the Problems Thus, according to the present invention, a pressurizing pipe system having pressurizing means, (b) a gas exhaust pipe system having an opening / closing valve, and (c) a closed upper part It is composed of a container, and inside thereof, a gas feed port for pressure feed connected to the pressure pipe system and a gas discharge port connected to the gas discharge pipe system, and a liquid discharge port connected to a liquid supply pipe below. A liquid storage tank provided; (d) a pressure sensor provided in the pressurizing pipe system or the gas exhaust pipe system; and (e) a void volume and a pressure change rate in the liquid storage tank, which are input in advance. The actual void volume is calculated by comparing the calibration curve with the measured pressure change rate, and the residual liquid amount is calculated by further subtracting the calculated void volume from the total volume in the liquid storage tank. There is provided a pressure-feeding type liquid supply device including a display unit and a display unit.

この発明の最大の特徴は、圧送用のガス導入開始時や、
ガス排出管系の開閉弁の開放による加圧管系内やガス排
出管系内の圧力変動特性、すなわち圧力上昇曲線や圧力
減少曲線が液体貯留槽内における空隙部分の容量によっ
て異なる事実に基づき、これらの圧力変動に基づいて空
隙部分ひいては液体貯留槽内の残液量をモニターできる
ように構成した点にある。
The most important feature of this invention is when starting the introduction of gas for pressure feeding,
Based on the fact that the pressure fluctuation characteristics in the pressure pipe system and the gas discharge pipe system due to opening of the on-off valve of the gas discharge pipe system, that is, the pressure rising curve and pressure decrease curve differ depending on the volume of the void portion in the liquid storage tank, It is configured so that the amount of residual liquid in the void space, and hence in the liquid storage tank, can be monitored based on the pressure fluctuation.

この発明の液体供給装置は、一つの加圧管系及び一つの
ガス排出管系に複数の液体貯留槽を分岐状に接続して構
成されていてもよく、これにより複数の液体貯留槽の残
液量管理を効率良く行なうことができる。ただし、この
場合は、圧送時のガス導入をいずれかの液体貯留槽につ
いて選択して行なえるように各々の分岐路に開閉弁を設
けておくことが必要である。
The liquid supply apparatus of the present invention may be configured by connecting a plurality of liquid storage tanks to one pressurization pipe system and one gas discharge pipe system in a branched manner, whereby the residual liquid of the plurality of liquid storage tanks is formed. The quantity can be managed efficiently. However, in this case, it is necessary to provide an opening / closing valve in each branch passage so that gas introduction at the time of pressure feeding can be selectively performed for any of the liquid storage tanks.

なお、この発明における圧力センサとしては例えば、半
導体圧力センサ等を用いるのが好ましく、二つ以上設け
られていてもよい。
As the pressure sensor in this invention, for example, a semiconductor pressure sensor is preferably used, and two or more pressure sensors may be provided.

(ホ)作用 液体貯留槽内の空隙部が小さい場合(即ち残液量が多い
場合)の加圧開始時の系内の圧力上昇は、空隙部が大き
い場合(即ち残液量が少ない場合)に比して速い。従っ
て圧力が一定値になるまでの時間や圧力値の変化率をフ
ァクターとすることにより、上記空隙体積や残液量が算
出されることとなる。
(E) Action The pressure increase in the system at the start of pressurization when the void in the liquid storage tank is small (that is, when the residual liquid amount is large) is when the void is large (that is, when the residual liquid amount is small). Faster than. Therefore, the void volume and the residual liquid amount are calculated by using the time until the pressure reaches a constant value and the rate of change of the pressure value as factors.

また減圧時の系内の圧力低下は空隙部が大きい程遅いた
め、同様に空隙部体積や残液量の算出が可能となる。
Further, since the pressure drop in the system during depressurization is slower as the size of the void is larger, the volume of the void and the residual liquid amount can be calculated similarly.

(ヘ)実施例 第1図に示す1は、この発明の圧送式液体供給装置の一
実施例のDNA合成装置用液体供給装置を示す構成説明図
である。図において液体供給装置1は、液体供給管系
(A)と、加圧管系(B)と、ガス排出管系(C)の三
つの管路系と各液体貯留槽2〜11を備えてなる。ここで
貯留槽のうち2〜4は各々ヌクレオチド試薬液を、5は
活性化試薬液を、6,7は各々マスキング用試薬液を、8
は酸化剤溶液を、9は脱保護試薬液を、10は合成用溶媒
を、11は洗浄用溶媒を各々貯溜する、上方が閉鎖された
容器からなる。液体供給管系(A)はパージ用ガス供給
手段24から電磁弁23、三方弁(切換弁)13〜22を介して
液センサ48迄延設されかつ各切換弁から分岐管(a)を
各々接続してなる管路からなる。加圧管系(B)は、圧
送用ガス供給手段36から電磁弁35を介して延設されその
途中に分岐管(b)を複数接続してなる管路から構成さ
れ、その閉塞端には圧力センサ12が内設されている。
(F) Embodiment 1 FIG. 1 is a structural explanatory view showing a liquid supply device for a DNA synthesizer of an embodiment of the pressure-feeding liquid supply device of the present invention. In the figure, a liquid supply apparatus 1 comprises a liquid supply pipe system (A), a pressurization pipe system (B), three pipe line systems of a gas discharge pipe system (C), and respective liquid storage tanks 2 to 11. . Here, 2 to 4 of the reservoirs are nucleotide reagent solutions, 5 are activation reagent solutions, 6 and 7 are masking reagent solutions, and 8
Is an oxidant solution, 9 is a deprotection reagent solution, 10 is a synthesis solvent, and 11 is a washing solvent. The liquid supply pipe system (A) is extended from the purge gas supply means 24 to the liquid sensor 48 via the solenoid valve 23 and the three-way valves (switching valves) 13 to 22, and the branch pipes (a) are respectively provided from the switching valves. It consists of a pipeline that is connected. The pressurizing pipe system (B) is composed of a pipe line extending from the gas supply means 36 for pressure feeding through the electromagnetic valve 35 and connecting a plurality of branch pipes (b) in the middle of the pipe line. The sensor 12 is internally provided.

ここで、液体供給管路(A)の分岐管(a)の先端は各
貯留槽の底部付近迄挿入されており、それにより液体排
出口が貯留槽下方に設定されている。一方、加圧管系
(B)の分岐管(b)の先端は各貯留槽の上部に挿入さ
れており、これにより圧送用ガス導入口が貯留槽内上方
に設定されている。
Here, the tip of the branch pipe (a) of the liquid supply pipeline (A) is inserted up to near the bottom of each storage tank, whereby the liquid discharge port is set below the storage tank. On the other hand, the tip of the branch pipe (b) of the pressurizing pipe system (B) is inserted in the upper part of each storage tank, whereby the pressure-feeding gas introduction port is set above the storage tank.

一方、ガス排出管系(B)は、電磁弁47を介してガス排
出口へ接続されかつ分岐管(c)を各々有する管路から
構成され、その分岐管(c)の先端は各貯留槽の上部に
挿入されており、これによりガス排出口が貯留槽内上方
に設定されている。
On the other hand, the gas discharge pipe system (B) is composed of pipe lines connected to the gas discharge port via the solenoid valve 47 and each having a branch pipe (c), and the tip of the branch pipe (c) is a reservoir tank. Is inserted in the upper part of the storage tank, so that the gas outlet is set above the storage tank.

圧力センサ12は、A/Dコンバータ52を介して演算部53に
接続されており、この演算部53は圧力センサの検知出力
に基づいて各貯留槽内の空隙容積及び残液量の算出を行
なう。
The pressure sensor 12 is connected to the calculation unit 53 via the A / D converter 52, and the calculation unit 53 calculates the void volume and the residual liquid amount in each storage tank based on the detection output of the pressure sensor. .

また、分岐管(b)及び(c)には各々電磁弁25〜34及
び37〜46が設けられており、これらの開閉制御により圧
送の開始や停止等が行なわれることとなる。
Further, the branch pipes (b) and (c) are provided with electromagnetic valves 25 to 34 and 37 to 46, respectively, and start and stop of pressure feeding are performed by controlling opening and closing of these valves.

なお、液体供給管路(A)は三方弁49を介してDNA合成
用反応容器50に接続されており、この容器50はさらに電
磁弁51を介してドレインに延設されている。
The liquid supply conduit (A) is connected to a DNA synthesis reaction container 50 via a three-way valve 49, and this container 50 is further extended to the drain via an electromagnetic valve 51.

この液体供給装置は液体貯留槽2〜11に貯留された液体
のいずれかを圧送により反応容器50へ供給するよう機能
する。この動作並びに演算部の動作について以下説明す
る。
This liquid supply device functions to supply one of the liquids stored in the liquid storage tanks 2 to 11 to the reaction container 50 by pressure feeding. This operation and the operation of the arithmetic unit will be described below.

まず、例えば貯留槽11内の洗浄用溶媒を反応容器50へ供
給する際には、電磁弁34を開状態とし、電磁弁46を閉状
態とし、この状態で電磁弁35を開いてポンプ36を駆動す
る。なお、この際三方弁13〜22は各々横連結位置に設定
されており各々分岐管(a)とは非接続位置にある。ま
た、三方弁49は反応容器50との接続位置、電磁弁51は開
状態とされている。
First, for example, when supplying the cleaning solvent in the storage tank 11 to the reaction container 50, the solenoid valve 34 is opened and the solenoid valve 46 is closed. In this state, the solenoid valve 35 is opened and the pump 36 is turned on. To drive. At this time, the three-way valves 13 to 22 are set to the lateral connection positions and are not connected to the branch pipe (a). Further, the three-way valve 49 is in a connection position with the reaction container 50, and the solenoid valve 51 is in an open state.

これにより、加圧管系(B)内及び貯留槽11内の上部空
隙の圧力が上昇する。この圧力が所定値を越えた場合
に、三方弁22を分岐管(a)との接続位置に切換えるこ
とにより、貯留槽11内の溶媒は該分岐管(a)、三方弁
22を介して反応管50へ移送されることとなる。
As a result, the pressure in the upper voids in the pressure pipe system (B) and in the storage tank 11 increases. When the pressure exceeds a predetermined value, the solvent in the storage tank 11 is switched to the connecting position of the branch pipe (a) by switching the three-way valve 22 to the branch pipe (a) and the three-way valve.
It is transferred to the reaction tube 50 via 22.

この際、ガス供給手段36による加圧開始後の加圧管系
(B)内の圧力変動、ことに圧力センサ12によって検出
される圧力Pは、該加圧管系(B)内の圧力抵抗をRと
し、貯留槽11内の空隙容積をCとし、送液ガスの圧力を
Poとすると、下式: で示される値を示す。ここでRは装置の構成により決定
される値であり、Poはガス供給量によって決定されガス
供給手段36の駆動時間と共に上昇する。従って初期の圧
力変動は時間と共に曲線状に上昇する特性を示し、この
曲線の傾きは、空隙容積Cの大小により異なる。この状
態を第2図に示した。図中(イ)は空隙容積Cが小さい
場合(ロ)は大きい場合の圧力−時間特性を相対的に示
すものであり、このように時間と共に一定値迄上昇する
がその立ち上り角度は異なる 従ってこの圧力変動に基づいて、より具体的には閾値T
までの上昇時間や、各立ち上りの圧力変化率は空隙容積
Cの関数となる。ここで演算部53は予め入力された空隙
容積と圧力変化率(傾き)との検量線と実測される圧力
変化率とを対比して実際の空隙容積を算出し、さらに貯
留槽11内の全容積からこの算出空隙容積を減出して残液
量を算出し表示する。
At this time, the pressure fluctuation in the pressurizing pipe system (B) after the start of pressurization by the gas supply means 36, especially the pressure P detected by the pressure sensor 12, is the pressure resistance in the pressurizing pipe system (B) R And the void volume in the storage tank 11 as C, and the pressure of the feed gas as
If P o , then the following formula: Indicates the value indicated by. Here, R is a value determined by the configuration of the apparatus, and P o is determined by the gas supply amount and increases with the drive time of the gas supply means 36. Therefore, the initial pressure fluctuation has a characteristic that it rises in a curve with time, and the slope of this curve varies depending on the size of the void volume C. This state is shown in FIG. In the figure, (a) shows a relative pressure-time characteristic when the void volume C is small (b) and is large, and thus rises to a certain value with time, but its rising angle is different. Therefore, based on this pressure fluctuation, more specifically, the threshold value T
The rise time up to and the pressure change rate at each rise are functions of the void volume C. Here, the arithmetic unit 53 calculates the actual void volume by comparing the calibration curve of the void volume and the pressure change rate (slope) input in advance with the actually measured pressure change rate, and further calculates the total void volume in the storage tank 11. This calculated void volume is subtracted from the volume to calculate and display the residual liquid amount.

同様にして各電磁弁や三方弁を切換えることにより、各
液体の圧送前に残液量のチェックが自動的になされるこ
ととなる。
Similarly, by switching each solenoid valve or three-way valve, the remaining liquid amount can be automatically checked before the pressure feeding of each liquid.

なお、この実施例では、さらに、上記残液量が一定値以
下になった際に、ブザーを発する回路が演算部に付設さ
れてなり、これに基づいてオペレータが送液を容易に停
止することができるように構成されている。
In addition, in this embodiment, when the residual liquid amount becomes a certain value or less, a circuit that emits a buzzer is attached to the arithmetic unit, and the operator can easily stop the liquid delivery based on this. It is configured to be able to.

一方、上記実施例において、例えば一定値に加圧された
後、電磁弁35を閉じた状態で、ガス排出管系(C)の電
磁弁46を開くと、所定時間後圧力P(t)は下式: で示され、時間と共に低下するが、この圧力低下曲線は
空隙容積が大きいとその傾きは小さい。従って、所定の
閾値までの圧力低下時間又は立ち下りの圧力変化率に基
づいて、空隙容積の算出及び/又は残液量の算出を行な
うこともできる。
On the other hand, in the above embodiment, when the solenoid valve 35 is closed and the solenoid valve 46 of the gas exhaust pipe system (C) is opened after being pressurized to a constant value, for example, the pressure P (t) after a predetermined time is changed. The following formula: The pressure drop curve has a small slope when the void volume is large. Therefore, the void volume and / or the residual liquid amount can be calculated based on the pressure decrease time to the predetermined threshold value or the falling pressure change rate.

なお、前記加圧時の検出において、算出される空隙容積
が貯留槽容積よりも大きい場合には、貯留槽の接続が不
完全であったり、管路系内にガズ漏れ等が生じているこ
とを意味する。従って演算部による空隙容積の算出によ
り、このような漏れチェックも行なうこともできる。
When the calculated void volume is larger than the storage tank volume in the detection at the time of pressurization, it means that the connection of the storage tank is incomplete, or that gas leakage has occurred in the pipeline system. Means Therefore, such a leak check can be performed by calculating the void volume by the calculation unit.

(ト)発明の効果 この発明の圧送式液体供給装置によれば、少なくとも一
つの圧力センサにより、複数の液体貯留槽の残液管理を
行なうことができる。従って、簡便かつ経済的に残液管
理が行なえ、とくに高価な試薬を用いる自動化学合成装
置用の液体供給装置としてその有用性は極めて大きなも
のである。
(G) Effect of the Invention According to the pressure-feeding type liquid supply apparatus of the present invention, it is possible to manage the residual liquid in the plurality of liquid storage tanks with at least one pressure sensor. Therefore, the residual liquid can be managed simply and economically, and its usefulness is extremely great as a liquid supply device for an automatic chemical synthesis device using a particularly expensive reagent.

【図面の簡単な説明】[Brief description of drawings]

第1図は、この発明の圧送式液体供給装置の一実施例を
示す構成説明図、第2図は、圧力センサによる検知出力
の変動を例示するためのグラフ図である。 1……圧送式液体供給装置、2〜11……液体貯留槽、12
〜圧力センサ、13〜22,49……三方弁、23,25〜35,37〜4
7,51……電磁弁、24……パージ用ガス供給手段、36……
圧送用ガス供給手段、48……液センサ、52……A/Dコン
バータ、53……演算部、(A)……液体供給管系、
(B)……加圧管系、(C)……ガス排出管系。
FIG. 1 is a configuration explanatory view showing an embodiment of a pressure-feeding type liquid supply apparatus of the present invention, and FIG. 2 is a graph for illustrating a variation of detection output by a pressure sensor. 1 ... Pressure-feeding type liquid supply device, 2-11 ... liquid storage tank, 12
〜 Pressure sensor, 13〜22,49 …… 3-way valve, 23,25〜35,37〜4
7,51 …… Solenoid valve, 24 …… Purging gas supply means, 36 ……
Gas supply means for pressure feed, 48 ... Liquid sensor, 52 ... A / D converter, 53 ... Computing unit, (A) ... Liquid supply pipe system,
(B) ... Pressure pipe system, (C) ... Gas discharge pipe system.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】(a)加圧手段を備えた加圧管系と、 (b)開閉弁を有するガス排出管系と、 (c)上部が閉鎖状の容器からなり、その内部に、上記
加圧管系に接続される圧送用ガス導入口及び上記ガス排
出管系に接続されるガス排出口を、同じく内部下方に、
液体供給管に接続される液体排出口を備えてなる液体貯
留槽と、 (d)上記加圧管系内又はガス排出管系内に設けられた
圧力センサと、 (e)予め入力された上記液体貯留槽内の空隙容積と圧
力変化率との検量線と、実測される圧力変化率とを対比
して実際の空隙容積を算出し、さらに上記液体貯留槽内
の全容積から上記算出された空隙容積を減算して残液量
を算出し、表示する演算部、 とから構成されてなる圧送式液体供給装置。
1. A pressurizing pipe system provided with (a) a pressurizing means, (b) a gas exhaust pipe system having an on-off valve, and (c) a container whose upper part is closed, the inside of which is the above-mentioned pressurizing member. A gas feed port for pressure feed connected to the pressure pipe system and a gas discharge port connected to the gas discharge pipe system are also provided in the inner lower part,
A liquid storage tank having a liquid outlet connected to a liquid supply pipe; (d) a pressure sensor provided in the pressurizing pipe system or in a gas exhaust pipe system; (e) the liquid inputted in advance The actual void volume is calculated by comparing the calibration curve of the void volume and pressure change rate in the storage tank with the actually measured pressure change rate, and the void calculated from the total volume in the liquid storage tank is calculated. A pressure-feeding type liquid supply device comprising: a calculation unit that calculates the remaining liquid amount by subtracting the volume and displays the remaining liquid amount.
【請求項2】液体貯留槽が複数設けられてなる特許請求
の範囲第1項記載の液体供給装置。
2. The liquid supply apparatus according to claim 1, wherein a plurality of liquid storage tanks are provided.
JP62218689A 1987-08-31 1987-08-31 Pumped liquid supply device Expired - Fee Related JPH0790163B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218689A JPH0790163B2 (en) 1987-08-31 1987-08-31 Pumped liquid supply device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218689A JPH0790163B2 (en) 1987-08-31 1987-08-31 Pumped liquid supply device

Publications (2)

Publication Number Publication Date
JPS6458340A JPS6458340A (en) 1989-03-06
JPH0790163B2 true JPH0790163B2 (en) 1995-10-04

Family

ID=16723872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218689A Expired - Fee Related JPH0790163B2 (en) 1987-08-31 1987-08-31 Pumped liquid supply device

Country Status (1)

Country Link
JP (1) JPH0790163B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590120Y2 (en) * 1990-11-30 1999-02-10 コニカ株式会社 Photosensitive material processing apparatus with processing solution container for silver halide photographic material
EP0649341B1 (en) * 1992-07-06 1996-09-04 Beckman Instruments, Inc. On-line process flow and reaction monitor
US5368823A (en) * 1993-02-11 1994-11-29 University Of Georgia Research Foundation, Inc. Automated synthesis of oligonucleotides
JP4927444B2 (en) * 2006-05-25 2012-05-09 日立アロカメディカル株式会社 Liquid preparation equipment
JP5478101B2 (en) * 2009-03-31 2014-04-23 シスメックス株式会社 Reagent preparation apparatus and specimen processing system
JP7772697B2 (en) * 2019-12-02 2025-11-18 バッヘン・アクチエンゲゼルシャフト Oligonucleotide synthesizing device and method for producing the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244333A (en) * 1984-05-21 1985-12-04 Sumitomo Electric Ind Ltd Stock solution replenishment apparatus

Also Published As

Publication number Publication date
JPS6458340A (en) 1989-03-06

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