JPH0791217B2 - Process for producing optically active 2-phenoxybutanoic acid - Google Patents
Process for producing optically active 2-phenoxybutanoic acidInfo
- Publication number
- JPH0791217B2 JPH0791217B2 JP63292442A JP29244288A JPH0791217B2 JP H0791217 B2 JPH0791217 B2 JP H0791217B2 JP 63292442 A JP63292442 A JP 63292442A JP 29244288 A JP29244288 A JP 29244288A JP H0791217 B2 JPH0791217 B2 JP H0791217B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- optically active
- phenoxybutanoic
- phenoxybutanoic acid
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、農薬の合成中間体として有用な光学活性な2
−フェノキシブタン酸の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention provides an optically active compound useful as a synthetic intermediate for agricultural chemicals.
-A method for producing phenoxybutanoic acid.
フェノキシブタン酸誘導体には生物活性を示す化合物が
多く知られている。例えば特開昭58−113155号、特開昭
58−67653号、特開昭59−29645号公報に示されている2
−フェノキシブタン酸アミド類は、農薬とくに除草剤と
して有用である。Many compounds having biological activity are known as phenoxybutanoic acid derivatives. For example, JP-A-58-113155 and JP-A-58-113155
No. 2 disclosed in JP-A-58-67653 and JP-A-59-29645
-Phenoxybutanoic acid amides are useful as agricultural chemicals, especially as herbicides.
(従来の技術及び発明が解決しようとする課題) 2−フェノキシブタン酸は2位に不斉炭素原子を有し、
光学活性な2−フェノキシブタン酸を製造する方法は、
従来全く知られていない。そこで光学活性なアミン類と
(±)−2−フェノキシブタン酸とのジアステレオマ−
塩による光学分割法を試みた。(Prior Art and Problems to be Solved by the Invention) 2-phenoxybutanoic acid has an asymmetric carbon atom at the 2-position,
The method for producing optically active 2-phenoxybutanoic acid is
Conventionally unknown. Therefore, diastereomers of optically active amines and (±) -2-phenoxybutanoic acid
An optical resolution method with salt was tried.
しかしながら、この方法で光学純度の高い2−フェノキ
シブタン酸を得るには、数回以上の再結晶を必要とし、
さらにごく限られた条件でしか分割できないなど、操作
上大きな問題があった。さらに用いたラセミ体に対する
光学活性体の回収率も不充分であった。However, in order to obtain 2-phenoxybutanoic acid with high optical purity by this method, recrystallization is required several times or more,
Furthermore, there was a big problem in operation such that it could be divided only under very limited conditions. Furthermore, the recovery rate of the optically active substance relative to the racemate used was insufficient.
従って、このような分割法は少量の場合には適用可能で
あるが、工業的に大量に製造するのにこの方法を適用す
ることは非常に困難であった。Therefore, although such a dividing method can be applied in the case of a small amount, it was very difficult to apply this method to industrially produce a large amount.
(課題を解決するための手段) 本発明者等は、工業的に光学活性な2−フェノキシブタ
ン酸の製造法を鋭意研究し、本発明をなすに至った。(Means for Solving the Problem) The inventors of the present invention have earnestly studied the method for producing industrially optically active 2-phenoxybutanoic acid, and have completed the present invention.
本発明は、式 (式中、Xは塩素原子又は臭素原子を表し、Mはアルカ
リ金属原子を表す)で示されるR−(+)−2−ハロゲ
ノブタン酸のアルカリ金属塩と 式 (式中、Mアルカリ金属原子を表す)で示されるフェノ
ールのアルカリ金属塩とを、双極性非プロトン性溶媒、
又は双極非プロトン性溶媒と非プロトン性溶媒との混合
溶媒中で、20〜50℃で反応させることを特徴とする。The present invention has the formula (Wherein, X represents a chlorine atom or a bromine atom, and M represents an alkali metal atom), and an alkali metal salt of R-(+)-2-halogenobutanoic acid represented by the formula: (Wherein M represents an alkali metal atom), an alkali metal salt of phenol, and a dipolar aprotic solvent,
Alternatively, the reaction is carried out at 20 to 50 ° C. in a mixed solvent of a bipolar aprotic solvent and an aprotic solvent.
式 で示されるS−(−)−2−フェノキシブタン酸の製造
法である。formula Is a method for producing S-(−)-2-phenoxybutanoic acid.
上記式(I)及び式(II)の原料化合物は、各々あらか
じめ別途合成して用いるか、溶媒中で合成してそのまま
用いてもよい。反応は以下のような溶媒中で行われる。The starting compounds of the above formulas (I) and (II) may be separately synthesized beforehand and used, or may be synthesized in a solvent and used as they are. The reaction is carried out in the following solvent.
この反応に用いる溶媒としては、N,N−ジメチルホルム
アミド(DMF)、ジメチルスルホキサイド(DMSO)、1,3
−ジメチル−2−イミダゾリジノン(DMI)、ヘキサメ
チルホスホリックアミドなどの双極性非プロトン溶媒あ
るいは双極性非プロトン溶媒の場合はベンゼン、トルエ
ン、キシレン等の非プロトン溶媒との混合溶媒として用
いることができる。As the solvent used in this reaction, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), 1,3
-Use as a dipolar aprotic solvent such as dimethyl-2-imidazolidinone (DMI) and hexamethylphosphoric amide, or in the case of dipolar aprotic solvent, as a mixed solvent with aprotic solvent such as benzene, toluene and xylene. You can
溶媒量としては、基質1重量部に対し、単独溶媒の場合
は1〜10重量部の溶媒を用い、混合溶媒の場合は、双極
性非プロトン溶媒を0.3〜5重量部と非プロトン性溶媒
1〜10重量部を混合して用いると良好に反応が進行し好
ましい。As for the amount of solvent, 1 to 10 parts by weight of the solvent is used for 1 part by weight of the substrate, and 0.3 to 5 parts by weight of the dipolar aprotic solvent and 1 to the aprotic solvent are used for the mixed solvent. It is preferable to use a mixture of 10 to 10 parts by weight because the reaction proceeds well.
反応温度は特に20〜50℃が好ましい。反応時間は特に限
定されないが、溶媒等により異なり、5〜20時間でほぼ
完結する。The reaction temperature is particularly preferably 20 to 50 ° C. The reaction time is not particularly limited, but varies depending on the solvent and the like, and is almost completed in 5 to 20 hours.
出発原料は、R−(+)−2−ハロゲノブタン酸のアル
カリ金属塩(I)1当量に対し、フェノールのアルカリ
金属塩(II)0.8〜5当量を用いるとよい。As the starting material, 0.8 to 5 equivalents of the alkali metal salt (II) of phenol may be used with respect to 1 equivalent of the alkali metal salt (I) of R-(+)-2-halogenobutanoic acid.
以下に実施例を示し、さらに説明する。Examples will be shown below for further description.
また、ここで用いたR−(+)−2−ハロゲノブタン酸
の光学純度は光学活性を維持したままでメチルエステル
に導き、シフト試薬(ユーロピウム(HFC)3)を用
い、NMRより求めた。さらに得られた2−フェノキシブ
タン酸の光学純度は、あらかじめ光学分割により得られ
た光学純度が100%の標準品の施光度を基に算出した。Further, the optical purity of R-(+)-2-halogenobutanoic acid used here was determined by NMR using a shift reagent (Europium (HFC) 3) while leading to methyl ester while maintaining the optical activity. Further, the optical purity of the obtained 2-phenoxybutanoic acid was calculated based on the degree of optical rotation of a standard product having an optical purity of 100% which was previously obtained by optical resolution.
実施例1 DMF中でのS−(−)−2−(4−フルオロ
−3−トリフルオロメチル)フェノキシブタン酸の製造 R−(+)−2−クロロブタン酸のカリウム塩16.05g
(0.1mol)と、4−フルオロ−3−トリフルオロメチル
フェノールのカリウム塩32.7g(0.15mol)を、60mlのDM
F中に加え、27〜30℃で10時間撹拌した。撹拌終了後、2
N塩酸水溶液でpH1として遊離した油状物をエーテルで抽
出後、エーテル層を飽和重曹水溶液で洗浄した。この飽
和重曹水溶液を2N−塩酸でpH1とし、再び遊離した油状
物をエーテル抽出した。エーテルを無水硫酸マグネシウ
ムで乾燥後、減圧留去し、残渣を減圧蒸留して目的物を
得た。Example 1 Preparation of S-(-)-2- (4-fluoro-3-trifluoromethyl) phenoxybutanoic acid in DMF 16.05 g of potassium salt of R-(+)-2-chlorobutanoic acid
(0.1 mol) and potassium salt of 4-fluoro-3-trifluoromethylphenol (32.7 g, 0.15 mol) in 60 ml of DM
It was added to F and stirred at 27 to 30 ° C. for 10 hours. After stirring, 2
The oily substance was adjusted to pH 1 with an aqueous N hydrochloric acid solution and the oily substance was extracted with ether, and the ether layer was washed with a saturated aqueous sodium hydrogen carbonate solution. The saturated aqueous sodium hydrogen carbonate solution was adjusted to pH 1 with 2N-hydrochloric acid, and the liberated oily substance was extracted with ether. The ether was dried over anhydrous magnesium sulfate, evaporated under reduced pressure, and the residue was distilled under reduced pressure to obtain the desired product.
b.p.155〜160℃/4mmHg 収率80% 用いた光学活性な2−クロロブタン酸の光学純度はee=
92%、得られたフェノキシブタン酸の光学純度はee=90
%であった。bp155-160 ℃ / 4mmHg 80% yield The optical purity of the optically active 2-chlorobutanoic acid used is ee =
92%, the optical purity of the obtained phenoxybutanoic acid is ee = 90
%Met.
実施例2 DMI−ベンゼン系でのS−(−)−2−(4
−フルオロ−3−トリフルオロメチル)フェノキシブタ
ン酸の合成 R−(+)−2−クロロブタン酸のカリウム塩16.05g
(0.1mol)と、4−フルオロ−3−トリフルオロメチル
フェノールのカリウム塩21.8g(0.1mol)を、ベンゼン7
0mlとDMI12mlの混合溶媒中に加え、30℃で8時間撹拌し
た。撹拌終了後、2N塩酸水溶液でpH1とし、さらにベン
ゼン200mlを加え、ベンゼン層を分離後、水洗、ベンゼ
ンを減圧留去し、残渣を減圧蒸留して目的物22gを得
た。収率80%。Example 2 S-(-)-2- (4 in DMI-benzene system
Synthesis of -fluoro-3-trifluoromethyl) phenoxybutanoic acid 16.05 g of potassium salt of R-(+)-2-chlorobutanoic acid
(0.1 mol) and 4-fluoro-3-trifluoromethylphenol potassium salt 21.8 g (0.1 mol), benzene 7
The mixture was added to a mixed solvent of 0 ml and DMI (12 ml) and stirred at 30 ° C for 8 hours. After completion of stirring, the pH was adjusted to 1 with a 2N aqueous hydrochloric acid solution, 200 ml of benzene was further added, the benzene layer was separated, washed with water, benzene was distilled off under reduced pressure, and the residue was distilled under reduced pressure to obtain 22 g of the target product. Yield 80%.
用いた光学活性な2−クロロブタン酸の光学純度ee=98
%、得られたフェノキシブタン酸の光学純度はee=96%
であった。Optical purity of optically active 2-chlorobutanoic acid used ee = 98
%, The optical purity of the obtained phenoxybutanoic acid is ee = 96%
Met.
以上の実施例および種々の条件での実施例を表−1にま
とめて示す。Table 1 collectively shows the above-described examples and examples under various conditions.
(発明の効果) 上記実施例から明らかなように、本発明の方法によれば
高収率で、また高い光学純度で目的とする光学活性のフ
ェノキシブタン酸を得ることができる。 (Effects of the Invention) As is clear from the above examples, according to the method of the present invention, the desired optically active phenoxybutanoic acid can be obtained with a high yield and a high optical purity.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭55−62043(JP,A) 特開 昭52−17431(JP,A) 特開 昭50−140632(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-55-62043 (JP, A) JP-A 52-17431 (JP, A) JP-A 50-140632 (JP, A)
Claims (1)
ル金属原子を表す)で示されるR−(+)−2−ハロゲ
ノブタン酸のアルカリ金属塩と 式 (式中、Mはアルカリ金属原子を表す)で示されるフェ
ノールのアルカリ金属塩とを、双極性非プロトン性溶
媒、又は双極性非プロトン性溶媒と非プロトン性溶媒と
の混合溶媒中で、20〜50℃で反応させることを特徴とす
る。 式 で示されるS−(−)−2−フェノキシブタン酸の製造
法。1. A formula (Wherein, X represents a chlorine atom or a bromine atom, and M represents an alcar metal atom), and an alkali metal salt of R-(+)-2-halogenobutanoic acid represented by the formula: (Wherein M represents an alkali metal atom), and an alkali metal salt of phenol, in a dipolar aprotic solvent or a mixed solvent of a dipolar aprotic solvent and an aprotic solvent, 20 It is characterized by reacting at -50 ° C. formula The manufacturing method of S-(-)-2-phenoxybutanoic acid shown by these.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63292442A JPH0791217B2 (en) | 1988-11-21 | 1988-11-21 | Process for producing optically active 2-phenoxybutanoic acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63292442A JPH0791217B2 (en) | 1988-11-21 | 1988-11-21 | Process for producing optically active 2-phenoxybutanoic acid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02138148A JPH02138148A (en) | 1990-05-28 |
| JPH0791217B2 true JPH0791217B2 (en) | 1995-10-04 |
Family
ID=17781848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63292442A Expired - Lifetime JPH0791217B2 (en) | 1988-11-21 | 1988-11-21 | Process for producing optically active 2-phenoxybutanoic acid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0791217B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL2961727T3 (en) * | 2013-02-28 | 2017-06-30 | Pronova Biopharma Norge As | Method of preparing 2-((5z,8z,11z,14z,17z)-icosa-5,8,11,14,17-pentaenyloxy)butanoic acid |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2417487C2 (en) * | 1974-04-10 | 1983-01-20 | Hoechst Ag, 6000 Frankfurt | Benzylphenoxyalkanecarboxylic acids, their derivatives and processes for their preparation |
| CA1071233A (en) * | 1975-06-26 | 1980-02-05 | Don R. Baker | Phenoxy alkylamides and their use as miticides |
| JPS5562043A (en) * | 1978-11-01 | 1980-05-10 | Ihara Chem Ind Co Ltd | Preparation of phenoxycarboxylic acid derivative |
-
1988
- 1988-11-21 JP JP63292442A patent/JPH0791217B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02138148A (en) | 1990-05-28 |
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