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JPH0793053B2 - Polyimide film molding - Google Patents
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JPH0793053B2 - Polyimide film molding - Google Patents

Polyimide film molding

Info

Publication number
JPH0793053B2
JPH0793053B2 JP62216754A JP21675487A JPH0793053B2 JP H0793053 B2 JPH0793053 B2 JP H0793053B2 JP 62216754 A JP62216754 A JP 62216754A JP 21675487 A JP21675487 A JP 21675487A JP H0793053 B2 JPH0793053 B2 JP H0793053B2
Authority
JP
Japan
Prior art keywords
molded product
film
conductive particles
polyimide
polyimide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62216754A
Other languages
Japanese (ja)
Other versions
JPS6459705A (en
Inventor
豊 山口
功 塚越
敦夫 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP62216754A priority Critical patent/JPH0793053B2/en
Publication of JPS6459705A publication Critical patent/JPS6459705A/en
Publication of JPH0793053B2 publication Critical patent/JPH0793053B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives

Landscapes

  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は成形物の表裏に露出した導電粒子を介して厚み
方向にのみ導電性を有する高耐熱性、異方導電性のポリ
イミドフィルム状成形物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention is a highly heat-resistant, anisotropically conductive polyimide film-shaped molding having conductivity only in the thickness direction through conductive particles exposed on the front and back of a molded product. Regarding things.

〔従来の技術〕[Conventional technology]

ポリイミドフィルムは、高耐熱性のエレクトロニクス用
素材として有用であり、回路基板材料、絶縁材料として
広く使用されている。一方、異方導電性のフィルム状成
形物は例えば特開昭51−21192号公報に代表されるよう
に、回路の接続材料に使用されるものであるが、この成
形物は回路接続時の加圧加熱時に樹脂が流動し、それに
よって成形物内部の導電粒子が露出して回路間の導通が
達せられるものであり必然的に成形物の耐熱性には限界
がある。また、ポリイミド成形物のような完全硬化工程
の後に初めて優秀な特性を発揮する材料にあっては、成
形物の流動性が失われ、上記のような接続方法(異方導
電化の方法)は採用することができない。
The polyimide film is useful as a high heat resistant material for electronics, and is widely used as a circuit board material and an insulating material. On the other hand, an anisotropically conductive film-shaped molded product is used as a circuit connecting material as represented by, for example, JP-A-51-21192. The resin flows at the time of pressure heating, whereby the conductive particles inside the molded product are exposed and electrical continuity between the circuits is achieved. Therefore, the heat resistance of the molded product is necessarily limited. Also, in the case of a material that exhibits excellent properties only after a complete curing process such as a polyimide molded product, the fluidity of the molded product is lost, and the connection method (method of anisotropic conductivity) as described above is Cannot be adopted.

同じ用途に、例えば特開昭53−53796号公報、特開昭53
−33390号公報、特開昭54−57680号公報、特開昭53−14
7991号公報のように弾性体マトリックスに導電粒子を混
合してシート状成形物となし接続回路間に挿入して加圧
操作を施すことによって両回路の接続を可能とする材料
も公知であるが、この成形物は厚みが大きく、嵩高くな
る欠点があった。また、成形の厚みが大きいために粒径
の大きい導電粒子を使用する必要があり、結果的に接続
の分解能が低く、微細な回路の接続には不向きであっ
た。
For the same purpose, for example, JP-A-53-53796 and JP-A-53-5396
-33390, JP-A-54-57680, JP-A-53-14
There is also known a material capable of connecting both circuits by mixing conductive particles into an elastic matrix and inserting it between a sheet-shaped molded article and a connection circuit without a pressurizing operation as in 7991 publication. However, this molded product had a drawback that it was thick and bulky. Further, since the molding thickness is large, it is necessary to use conductive particles having a large particle diameter, and as a result, the resolution of the connection is low, which is not suitable for connecting fine circuits.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明は耐熱性にすぐれた、微細回路の接続等に有用な
異方導電性を有するポリイミドフィルム状成形物を提供
することを目的とする。
An object of the present invention is to provide a polyimide film-like molded product having excellent heat resistance and having anisotropic conductivity, which is useful for connecting fine circuits.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は導電粒子を含むポリイミドフィルム状成形物に
おいて、導電粒子をフィルム状成形物の表面に露出さ
せ、この導電粒子を介して厚み方向にのみ導電性を有す
るようにしたことを特徴とする。
The present invention is characterized in that, in a polyimide film-shaped molded product containing conductive particles, the conductive particles are exposed on the surface of the film-shaped molded product so as to have conductivity only in the thickness direction through the conductive particles.

本発明のポリイミドフィルム状成形物の製造に用いられ
るポリイミドは、一般式〔I〕で示される繰り返し単位
を有するものが好適に用いられる。
As the polyimide used for producing the polyimide film-shaped molded product of the present invention, those having a repeating unit represented by the general formula [I] are preferably used.

ここで、R1は4価の芳香族基、R2は2価の芳香族基また
は脂肪族基を示す。〔I〕は具体的にはピロメリット酸
二無水物、3,3′,4,4′−ビフェニルテトラカルボン酸
二無水物などのR1を含むテトラカルボン酸二無水物と4,
4′−ジアミノジフェニルエーテル、パラフェニレンジ
アミンなどのR2を含むジアミンとの反応生成物として得
られる。
Here, R 1 represents a tetravalent aromatic group, and R 2 represents a divalent aromatic group or an aliphatic group. [I] is specifically a tetracarboxylic dianhydride containing R 1 such as pyromellitic dianhydride or 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride;
Obtained as a reaction product with a diamine containing R 2 such as 4′-diaminodiphenyl ether and paraphenylenediamine.

またポリイミドはポリイミドの前駆物質である下記一般
式〔II〕で示される繰り返し単位を有するポリアミド酸
を脱水閉環イミド化し、ポリイミドに転化して得られ
る。
Further, polyimide is obtained by converting a polyamic acid having a repeating unit represented by the following general formula [II], which is a precursor of polyimide, into a polyimide by dehydration ring-closing imide conversion.

本発明においては、好ましくは上記〔I〕または〔II〕
の繰り返し単位を有するポリマーを有材溶剤に溶解し、
導電粒子を混合するが、必要に応じて、滑剤、酸化防止
剤、着色剤、導伝性付与剤などの添加剤を加えることが
できる。また、導電粒子は重合前のモノマー混合物に添
加しておいてポリイミドフィルム状成形物に含有させて
もよい。また他の耐熱性樹脂、例えば、ポリエーテルス
ルホン、ポリスルホン、ポリアリレート、ポリフェニレ
ンサルファイド、ポリエーテルイミドなどの樹脂を混合
することもできる。
In the present invention, preferably the above [I] or [II]
A polymer having a repeating unit of is dissolved in a material solvent,
The conductive particles are mixed, but if necessary, additives such as a lubricant, an antioxidant, a colorant, and a conductivity-imparting agent can be added. Further, the conductive particles may be added to the monomer mixture before polymerization and then contained in the polyimide film-shaped molded product. Further, other heat resistant resins, for example, resins such as polyether sulfone, polysulfone, polyarylate, polyphenylene sulfide, and polyetherimide can be mixed.

上記有機溶剤としては、例えばN,N−ジメチルホルムア
ミド、N,N−ジメチルアセトアミド、N,N−ジエチルホル
ムアミド、N,N−ジエチルアセトアミド、N−メチル−
2−ピロリドン、p−クロルフェノール、m−クロルフ
ェノール、p−クレゾール、m−クレゾール、ジメチル
スルホン、テトラメチルスルホン、ジメチルスルホキシ
ドなど通常公知のものが用いられ、これらを単独または
2種以上混合して用いる。さらに、ベンゼン、トルエ
ン、キシレン、ジオキサン、シクロヘキサン、アセトン
などの非溶剤と組み合わせて用いることもできる。
Examples of the organic solvent include N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylformamide, N, N-diethylacetamide, N-methyl-
2-pyrrolidone, p-chlorophenol, m-chlorophenol, p-cresol, m-cresol, dimethyl sulfone, tetramethyl sulfone, dimethyl sulfoxide, and the like, which are commonly known, are used alone or in admixture of two or more. To use. Further, it can be used in combination with a non-solvent such as benzene, toluene, xylene, dioxane, cyclohexane and acetone.

本発明の導電粒子は、もっとも一般的には金属粒子が用
いられるが、これら金属粒子の例としては、Fe,Ni,Cr,C
o,Al,Sb,Mo,Cu,Ag,Pt,Au等があり、これらの単体あるい
は合金や酸化物などでもよく、これらの2種以上を複合
して用いることも可能である。また金属粒子の中には、
ガラスや合成樹脂の表面に前記金属層を設けた物でも適
用可能である。
The conductive particles of the present invention, the most commonly used metal particles, as examples of these metal particles, Fe, Ni, Cr, C
There are o, Al, Sb, Mo, Cu, Ag, Pt, Au, etc., and these may be used alone or as an alloy or oxide, and it is also possible to use two or more kinds of them in combination. Also, in the metal particles,
The thing which provided the said metal layer on the surface of glass or synthetic resin is also applicable.

これら導電金属粒子の含有量は、ポリイミドフィルム状
成形物の0.1〜10体積%が好ましく、良好な異方導電性
を示す。導電粒子が0.1体積%より少ないと導通点の数
が少なく、また10体積%を超えると成形物の面方向の絶
縁性が損なわれ、異方導電性が保持できなくなることが
ある。導電粒子の大きさには特に重要でありフィルム状
成形物において存在する実質的な導電粒子の大きさをい
うのであって、導電粒子は1個で独立していても、ある
いは凝集していてもそれは問わない。フィルム状成形物
の厚みは特に限定するものではないが、0.005mm〜0.1mm
が適当である。0.005mmより薄くなると、取り扱いが容
易でなく、また、しわの発生などのために製造が困難に
なってくる。また0.1mmより厚くなると、使用する粒子
が大きくなり分解能が低下するため微細な回路の接続に
不向きになってくる。
The content of these conductive metal particles is preferably 0.1 to 10% by volume of the polyimide film-shaped molded product, and shows good anisotropic conductivity. When the conductive particles are less than 0.1% by volume, the number of conducting points is small, and when it exceeds 10% by volume, the insulating property in the surface direction of the molded product is impaired and anisotropic conductivity may not be maintained. The size of the conductive particles is particularly important and refers to the substantial size of the conductive particles present in the film-shaped molded product, and the conductive particles may be independent or aggregated. It doesn't matter. The thickness of the film-shaped molded product is not particularly limited, but 0.005 mm to 0.1 mm
Is appropriate. If it is thinner than 0.005 mm, it will be difficult to handle and it will be difficult to manufacture due to wrinkles. On the other hand, if the thickness is more than 0.1 mm, the particles used will become large and the resolution will decrease, making it unsuitable for connecting minute circuits.

導電粒子を混合したポリイミド組成物の製膜は通常のポ
リイミドフィルムの製膜方法をそのまま応用することが
できる。工業的には、例えば金属ベルト上にポリイミド
組成物を均一厚みに流延し、溶剤を乾燥したのちフィル
ムを基材から剥離し、ついで高温度雰囲気で硬化熱処理
する方法がある。一般に溶剤の乾燥は80〜150℃、硬化
熱処理は200〜450℃で実施することができる。
For the film formation of the polyimide composition in which the conductive particles are mixed, the usual method for forming a polyimide film can be applied as it is. Industrially, for example, there is a method in which a polyimide composition is cast on a metal belt to a uniform thickness, the solvent is dried, the film is peeled from the substrate, and then the film is cured and heat-treated in a high temperature atmosphere. Generally, the solvent can be dried at 80 to 150 ° C and the heat treatment for curing can be performed at 200 to 450 ° C.

導電粒子を含むポリイミドフィルム状成形物は未硬化の
状態(硬化熱処理前)あるいは硬化熱処理後において、
成形物表面のポリイミド組成物を除去し、導電粒子を成
形物の表面に露出させ、導電性粒子を介して厚み方向に
のみ導電性を有するようにする。
The polyimide film-shaped molded product containing conductive particles is in an uncured state (before curing heat treatment) or after curing heat treatment,
The polyimide composition on the surface of the molded product is removed, the conductive particles are exposed on the surface of the molded product, and the conductive particles have conductivity only in the thickness direction through the conductive particles.

このように成形物の表面に導電性粒子を露出させる方法
としては、成形物をエッチング処理することが好まし
い。前記方法で得たポリイミドフィルム状成形物はエッ
チング前においては、若干の導電粒子が成形物表面に露
出しているが、多くの導電粒子はその表面がポリイミド
組成物の薄膜で被覆されている。従ってエッチング等に
よりこの皮膜を除去することは極めて好ましいことであ
る。
As a method of exposing the conductive particles on the surface of the molded product as described above, it is preferable to etch the molded product. In the polyimide film-shaped molded product obtained by the above method, some conductive particles are exposed on the surface of the molded product before etching, but the surface of many conductive particles is covered with a thin film of the polyimide composition. Therefore, it is extremely preferable to remove this film by etching or the like.

エッチングはポリイミド組成物について通常行われる手
段をそのまま使用することができる。一般に良く知られ
たエッチング溶液としてはテトラメチル水酸化アンモニ
ウム、ヒドラジン水和物、水酸化カリウム水溶液、水酸
化ナトリウム水溶液などがある。またこれらの湿式エッ
チングの他に、酸素プラズマエッチング、酸素スパッタ
エッチングなど乾式方法をとることもできる。エッチン
グ除去する組成物の厚みは、特に限定しないが通常0.1
〜1μm程度で十分であり、このために要するエッチン
グ処理時間は10〜300秒である。
For the etching, the means usually used for polyimide compositions can be used as it is. Commonly known etching solutions include tetramethyl ammonium hydroxide, hydrazine hydrate, potassium hydroxide aqueous solution, sodium hydroxide aqueous solution and the like. In addition to these wet etching methods, a dry method such as oxygen plasma etching or oxygen sputter etching can be used. The thickness of the composition to be removed by etching is not particularly limited, but is usually 0.1.
.About.1 .mu.m is sufficient, and the etching treatment time required for this is 10 to 300 seconds.

また、高温度の硬化熱処理の影響によって、導電粒子の
表面に絶縁性酸化皮膜が形成される場合には希薄な酸で
洗浄する等の処理を施すことが好ましい。
Further, when an insulating oxide film is formed on the surface of the conductive particles due to the influence of the curing heat treatment at a high temperature, it is preferable to perform a treatment such as washing with a dilute acid.

本発明の異方導電性ポリイミドフィルム状成形物を、例
えば回路の接続材料に使用する場合には、接続せんとす
る回路間に本発明の成形物を挿入し、しかるのち両回路
を押圧保持する、または押圧した状態で液状接着剤を回
路間の空隙に注入し、しかるのち硬化固定化するなどの
方法により、目的を達することができる。また、本発明
のポリイミドフィルム状成形物は上記した回路の接続材
料だけではなく、スイッチ部材、多層回路部材等への応
用が可能である。
When the anisotropic conductive polyimide film-like molded product of the present invention is used as a connecting material for a circuit, for example, the molded product of the present invention is inserted between the circuits to be connected, and then both circuits are pressed and held. Alternatively, the object can be achieved by a method of injecting the liquid adhesive into the space between the circuits in a pressed state and then curing and fixing. Further, the polyimide film-shaped molded product of the present invention can be applied not only to the above-mentioned circuit connecting material but also to a switch member, a multilayer circuit member and the like.

〔実施例〕〔Example〕

以下本発明を実施例に基づいて説明するが本発明はこれ
に限定されるものではない。
Hereinafter, the present invention will be described based on examples, but the present invention is not limited thereto.

実施例 温度計、撹拌機及び塩化カルシウム管をつけた300ml4つ
口フラスコに4,4′−ジアミノジフェニルエーテル17.0
g、パラフェニレンジアミン1.62gとN,N−ジメチルホル
ムアミド229.1gを入れ、撹拌し溶解する。この溶液を10
℃前後に保ちながらピロメリット酸二無水物21.8gを徐
々に添加した後、3時間撹拌して還元粘度2.34dl/g(溶
媒N,N−ジメチルホルムアミド、濃度0.1g/dl、濃度25
℃)のポリアミド酸ワニスを得た。このワニスの固形分
濃度は15%である。このワニスに平均粒径が8μmの表
面がAuめっきされたNi粒子を、ワニス固形分に対して5
体積%混合し十分に撹拌したのち、ガラス板上に流延
し、90℃で乾燥し、厚みが10μmの導電粒子混合ポリイ
ミド酸フィルムを得た。ついでこのフィルムを鉄枠に固
定し、緊張下に250℃の乾燥機内に5分間保持し、イミ
ド化した。さらにこのフィルムを75℃のKOH水溶液(KOH
1.0N エチルアルコール/水=80/20)に約5秒浸漬
し、水洗乾燥し、厚みが8μmのエッチング処理フィル
ムを得た。この工程におけるエッチング前後のフィルム
について、第1図に示すような方法により導通抵抗を測
定した。第1図において1はポリイミドフィルム状成形
物、2は35μmの厚みを有する銅箔、3は先端が0.5×
0.5mmの大きさを有する金めっきプローブ(プローブ
A)であり、このプローブを1に軽く押しあて、フィル
ム厚み方向の導通抵抗Rを測定した。またプローブを第
2図に示す形状のものとし、フィルム面方向の抵抗を測
定し、絶縁分解能の尺度を求めた。第2図の4のプロー
ブ(プローブB)において金めっき端子5は0.5×3mmで
あり、6は絶縁層でありポリエステルフィルムを重ねて
0.1mmとし、接着剤で固定したものである。測定点は1
試料について100点とした。エッチング前後のフィルム
についての結果は以下のようであった。
Example 4,4'-diaminodiphenyl ether 17.0 in a 300 ml four-necked flask equipped with a thermometer, stirrer and calcium chloride tube.
g, 1.62 g of para-phenylenediamine and 229.1 g of N, N-dimethylformamide are added and dissolved by stirring. Add this solution to 10
21.8 g of pyromellitic dianhydride was gradually added while keeping the temperature around ℃, and then stirred for 3 hours to give a reduced viscosity of 2.34 dl / g (solvent N, N-dimethylformamide, concentration 0.1 g / dl, concentration 25
C.) was obtained. The solid content concentration of this varnish is 15%. The surface of the varnish was plated with Au particles having an average particle size of 8 μm by Au plating.
The mixture was mixed by volume% and sufficiently stirred, then cast on a glass plate and dried at 90 ° C. to obtain a conductive particle-containing polyimide acid film having a thickness of 10 μm. Then, this film was fixed to an iron frame and kept in a dryer at 250 ° C. for 5 minutes under tension to be imidized. Furthermore, this film is treated with KOH aqueous solution (KOH
It was dipped in 1.0N ethyl alcohol / water = 80/20) for about 5 seconds, washed with water and dried to obtain an etching-treated film having a thickness of 8 μm. The conduction resistance of the film before and after etching in this step was measured by the method shown in FIG. In FIG. 1, 1 is a polyimide film-shaped molded product, 2 is a copper foil having a thickness of 35 μm, and 3 is 0.5 × at the tip.
The probe was a gold-plated probe (probe A) having a size of 0.5 mm, and this probe was lightly pressed against 1 to measure the conduction resistance R in the film thickness direction. Further, the probe was formed into the shape shown in FIG. 2 and the resistance in the film surface direction was measured to obtain a measure of insulation resolution. In the probe (probe B) 4 in FIG. 2, the gold-plated terminal 5 is 0.5 × 3 mm, 6 is an insulating layer, and a polyester film is overlaid.
It is set to 0.1 mm and fixed with an adhesive. The measurement point is 1
The sample was set to 100 points. The results for the film before and after etching were as follows.

〔発明の効果〕 本発明の高耐熱性ポリイミド組成物よりなる異方導電性
フィルム状成形物は微小点の導通が可能であり、また面
方向の絶縁分解能もすぐれている。
[Effects of the Invention] The anisotropic conductive film-like molded product made of the highly heat-resistant polyimide composition of the present invention is capable of conducting minute dots and has excellent insulation resolution in the plane direction.

【図面の簡単な説明】[Brief description of drawings]

第1図は、フィルム状成形物の厚み方向の抵抗を測定す
る方法を示す説明図で、第2図は、フィルム状成形物の
面方向の抵抗を測定し、絶縁分解能を判断する方法を示
す説明図である。 符号の説明 1……試料、2……銅箔 3……プローブ(A)、4……プローブ(B) 5……端子、6……絶縁層
FIG. 1 is an explanatory view showing a method for measuring the resistance in the thickness direction of a film-shaped molded product, and FIG. 2 shows a method for measuring the resistance in the surface direction of the film-shaped molded product to judge the insulation resolution. FIG. Explanation of symbols 1 ... Sample, 2 ... Copper foil 3 ... Probe (A), 4 ... Probe (B) 5 ... Terminal, 6 ... Insulating layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】導電粒子を含むポリアミド酸ワニスをイミ
ド化してポリイミドフィルム状の成形物となし、該成形
物の少なくとも一表面をアルカリ系エッチング剤により
湿式エッチングすることにより前記フィルム状成形物の
表面に導電粒子を露出させ、この導電粒子を介して厚み
方向にのみ導電性を有するようにしたことを特徴とする
ポリイミドフィルム状成形物。
1. A polyamic acid varnish containing conductive particles is imidized to form a polyimide film-shaped molded product, and at least one surface of the molded product is wet-etched with an alkaline etching agent to obtain a surface of the film-shaped molded product. A conductive film is exposed to the inside of the polyimide film, and the conductive film is made to have conductivity only in the thickness direction through the conductive film.
JP62216754A 1987-08-31 1987-08-31 Polyimide film molding Expired - Fee Related JPH0793053B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62216754A JPH0793053B2 (en) 1987-08-31 1987-08-31 Polyimide film molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62216754A JPH0793053B2 (en) 1987-08-31 1987-08-31 Polyimide film molding

Publications (2)

Publication Number Publication Date
JPS6459705A JPS6459705A (en) 1989-03-07
JPH0793053B2 true JPH0793053B2 (en) 1995-10-09

Family

ID=16693398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62216754A Expired - Fee Related JPH0793053B2 (en) 1987-08-31 1987-08-31 Polyimide film molding

Country Status (1)

Country Link
JP (1) JPH0793053B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997029490A1 (en) * 1996-02-08 1997-08-14 Asahi Kasei Kogyo Kabushiki Kaisha Anisotropic conductive composition

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03108210A (en) * 1989-09-21 1991-05-08 Hitachi Chem Co Ltd Manufacture of anisotropic conductive resin film mold
EP1081778A4 (en) 1998-04-21 2006-03-01 Toto Ltd Solid electrolyte fuel cell and method of producing the same
JP5363793B2 (en) * 2008-11-28 2013-12-11 積水化学工業株式会社 Conductive particle, anisotropic conductive material, connection structure, and method for producing conductive particle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6077309A (en) * 1983-10-03 1985-05-01 積水化学工業株式会社 Anisotropic conductive sheet and electric material using same
JPS61188818A (en) * 1985-02-15 1986-08-22 日東電工株式会社 Anisotropic conducting sheet
JPS61200616A (en) * 1985-03-04 1986-09-05 日東電工株式会社 Manufacture of anisotropic conducting sheet

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997029490A1 (en) * 1996-02-08 1997-08-14 Asahi Kasei Kogyo Kabushiki Kaisha Anisotropic conductive composition

Also Published As

Publication number Publication date
JPS6459705A (en) 1989-03-07

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