JPH0797486B2 - Method for manufacturing field emission ion source - Google Patents
Method for manufacturing field emission ion sourceInfo
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- JPH0797486B2 JPH0797486B2 JP61179875A JP17987586A JPH0797486B2 JP H0797486 B2 JPH0797486 B2 JP H0797486B2 JP 61179875 A JP61179875 A JP 61179875A JP 17987586 A JP17987586 A JP 17987586A JP H0797486 B2 JPH0797486 B2 JP H0797486B2
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- ion source
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- ionized
- ion
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、金属等のイオン化すべき物質を加熱溶融して
針状電極の先端を濡らし、該針状電極の先端に高電界を
与えてイオンビームを放射させる電界放射型イオン源に
関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention applies a high electric field to the tip of the needle electrode by heating and melting a substance to be ionized such as metal to wet the tip of the needle electrode. The present invention relates to a field emission type ion source that emits an ion beam.
電界放射型イオン源は0.1μm以下の細いイオンビーム
が得られるので、ナノメーターの微細加工用に大いに注
目されている。また、マスクレスイオン注入、ミーリン
グ、X線マスクの修正用などに応用が可能である。Since the field emission ion source can obtain a thin ion beam of 0.1 μm or less, it has attracted a great deal of attention for nanofabrication. Further, it can be applied to maskless ion implantation, milling, X-ray mask correction, and the like.
電界放射型イオン源は、イオン化すべき物質を加熱溶融
して針状電極の先端に供給し、そこで前記物質の薄い被
膜を形成し、針状電極の先端に高電界を与えると、該被
膜が電界によつてテーラーコーンと呼ばれる突出部を生
じ、ここからイオン放射させるものである。針状電極へ
のイオン化すべき物質の漏れが均一でないと、安定なイ
オンビームが得られない。イオンビームを安定化させる
ためには、引出し電極の電源にフイードバツク回路を設
ける方法や針状電極と引出し電極との間に制御電極を設
ける方法が提案されている(特開昭56-102046号公
報)。The field emission ion source heats and melts a substance to be ionized and supplies it to the tip of a needle electrode, forms a thin coating of the substance there, and when a high electric field is applied to the tip of the needle electrode, the coating is The electric field produces a protrusion called a Taylor cone, from which ions are emitted. If the leakage of the substance to be ionized into the needle electrode is not uniform, a stable ion beam cannot be obtained. In order to stabilize the ion beam, a method of providing a feed back circuit in the power source of the extraction electrode and a method of providing a control electrode between the needle electrode and the extraction electrode have been proposed (Japanese Patent Laid-Open No. 56-102046). ).
しかしながら、このような方法によつても数分間に1回
ていど発生するスパイク状ノイズを抑えることはでき
ず、電流変動率を常に1%/10分以下に維持することは
難しかつた。However, even with such a method, it is not possible to suppress spike-like noise that occurs once every several minutes, and it has been difficult to always maintain the current fluctuation rate at 1% / 10 minutes or less.
本発明の目的は安定なイオンビームを得ることのできる
電界放射型イオン源を製造する方法を提供することにあ
る。An object of the present invention is to provide a method of manufacturing a field emission type ion source capable of obtaining a stable ion beam.
本発明者らは上記目的を達成するために電界放射型イオ
ン源を組立てた後のエージングについて種々検討を行な
つた結果、この発明に至つたものである。The present inventors have accomplished the present invention as a result of various studies on aging after assembling a field emission type ion source to achieve the above object.
すなわち、本発明は針状電極と、イオン化すべき物質を
貯蔵する貯蔵部と、前記針状電極および貯蔵部を加熱す
るための加熱部と、前記針状電極の先端に電界を与える
ための引出し電極とを備えてなる電界放射型イオン源に
おいて、下記第1工程〜第3工程で処理することを特徴
とする電界放射型イオン源の製造方法である。That is, the present invention is a needle electrode, a storage unit for storing a substance to be ionized, a heating unit for heating the needle electrode and the storage unit, and a drawer for applying an electric field to the tip of the needle electrode. A field emission ion source comprising electrodes, wherein the field emission ion source is treated in the following first to third steps.
第1工程…真空中で前記電界を与えることなく前記加熱
を行ない、貯蔵部の温度を動作温度より50℃以上高い温
度に到達させる。First step: The heating is performed in a vacuum without applying the electric field, and the temperature of the storage section reaches a temperature higher than the operating temperature by 50 ° C. or more.
第2工程…第1工程の温度および真空を維持しながら前
記電界を与える。Second step ... The electric field is applied while maintaining the temperature and vacuum of the first step.
第3工程…真空を維持し、前記電界を与えながら、貯蔵
部の温度を動作温度まで下げる。Third step: The temperature of the storage is lowered to the operating temperature while maintaining the vacuum and applying the electric field.
以下、本発明について詳しく説明する。本発明において
動作温度とは本発明の電界放射型イオン源(以下、イオ
ン源という)を使用するときの貯蔵部の温度であつて、
次に記す実験で定められる。Hereinafter, the present invention will be described in detail. In the present invention, the operating temperature is the temperature of the storage section when the field emission type ion source (hereinafter referred to as ion source) of the present invention is used,
It is determined by the experiment described below.
すなわち、組立てを終え所望のイオン化すべき物質を貯
蔵したイオン源をまず加熱して貯蔵部内のイオン化すべ
き物質を溶融させ、貯蔵部の温度を該物質の融点より40
0〜700℃高い温度にする。つぎに引出し電極に引出し電
圧を印加し、その引出し電圧を調節することによつてイ
オン電流値を5〜10μA程度にさせる。ついで加熱電源
の調節により、貯蔵部の温度をゆつくり降下させなが
ら、その時のイオン電流の変動率を測定する。イオン源
をあらかじめ加熱する温度は、イオン化すべき物質によ
つて異なるものであり、蒸気圧が高くならない範囲で出
来るだけ高くすることが望ましい。That is, the ion source that has completed the assembly and stores the desired substance to be ionized is first heated to melt the substance to be ionized in the storage unit, and the temperature of the storage unit is set to 40 ° C or higher than the melting point of the substance.
Increase the temperature by 0-700 ℃. Next, an extraction voltage is applied to the extraction electrode, and the extraction voltage is adjusted so that the ion current value is about 5 to 10 μA. Then, by adjusting the heating power source, the fluctuation rate of the ion current at that time is measured while the temperature of the storage part is gradually lowered. The temperature at which the ion source is preheated varies depending on the substance to be ionized, and it is desirable to raise the temperature as high as possible within the range where the vapor pressure does not increase.
上記実験の結果、イオン電流の変動率が最も小さいとき
の貯蔵部の温度が望ましい動作温度である。なお、当然
のことながら、上記動作温度はイオン源の構造、針状電
極の材質、寸法およびイオン化物質の種類により変る
が、前記の方法によりあらかじめ求めることができる。As a result of the above experiment, the temperature of the storage section when the fluctuation rate of the ionic current is the smallest is the desired operating temperature. Of course, the operating temperature varies depending on the structure of the ion source, the material and size of the needle electrode, and the type of ionized substance, but it can be obtained in advance by the method described above.
つぎに、第1工程における貯蔵部の温度は動作温度より
50℃以上高い温度でなければならない。動作温度より50
℃以上高くないと、イオンビームを安定化させる効果が
ない。また、前記貯蔵部の温度の上限は種々の条件によ
り変るが、一般には動作温度より300℃以上高いと針状
電極又は貯蔵部とイオン化すべき物質が著しい反応を起
したり、イオン化すべき物質が著しく蒸発したりするの
で好ましくない。Next, the temperature of the storage unit in the first step is higher than the operating temperature.
The temperature should be higher than 50 ° C. 50 from operating temperature
If it is not higher than ℃, there is no effect of stabilizing the ion beam. Further, the upper limit of the temperature of the storage part varies depending on various conditions, but generally, when the temperature is higher than the operating temperature by 300 ° C. or more, the substance to be ionized with the needle electrode or the storage part causes a remarkable reaction, or the substance to be ionized. Is significantly vaporized, which is not preferable.
この温度域で針状電極の先端にイオン化すべき物質が良
く濡れ広がる。この状態でイオン化すべき物質は粘性が
小さくなつているので、ここで第2工程として引出し電
極に引出し電圧の印加を行なうと、針状電極の先端をイ
オン化すべき物質で完全に覆うことができる。動作温度
よりも高い温度でイオンビームの放出を行うと、必ずし
も安定なイオンビームは得られないが、ついで第3工程
で貯蔵部の温度を動作温度まで下げるとイオンビームが
安定化する。この状態で少なくとも10分間保持すれば、
針状電極の先端部に薄くて均一なイオン化すべき物質の
被膜が形成されイオン源が完成する。In this temperature range, the substance to be ionized spreads well on the tip of the needle electrode. In this state, the viscosity of the substance to be ionized is reduced, so that when the extraction voltage is applied to the extraction electrode in the second step, the tip of the needle electrode can be completely covered with the substance to be ionized. . If the ion beam is emitted at a temperature higher than the operating temperature, a stable ion beam cannot always be obtained, but if the temperature of the storage section is then lowered to the operating temperature in the third step, the ion beam will be stabilized. If you hold this state for at least 10 minutes,
A thin and uniform coating of the substance to be ionized is formed on the tip of the needle electrode to complete the ion source.
このようにして得られたイオン源はそのまま引続いて使
用状態に入ることができる。また、すぐに使用しないと
きには電源を切つて放置してもよい。このようにして製
造されたイオン源は次に使用する場合、所定の動作温度
に加熱して引出し電極に引出し電圧を印加するのみで安
定なイオンビームが得られる。また、イオン源の使用方
法を誤つて低すぎる温度でイオンビームの放出を行なつ
たり放電を起したりすると、針状電極先端のイオン化す
べき物質の被膜が乱れ、イオンビームが不安定になるこ
とがある。この様な場合には、前記第1工程から第3工
程までの処理を行うことでイオンビームを安定化させる
ことができる。このように本発明のイオン源の製造方法
は不調になつたイオン源の修復方法としても利用可能で
ある。The ion source thus obtained can be directly put into use as it is. Also, when not in use immediately, the power may be turned off and left. When the ion source manufactured in this way is used next time, a stable ion beam can be obtained only by heating it to a predetermined operating temperature and applying an extraction voltage to the extraction electrode. Also, if the ion source is misused and the ion beam is emitted at a temperature that is too low or if a discharge is generated, the coating of the substance to be ionized at the tip of the needle electrode is disturbed and the ion beam becomes unstable. Sometimes. In such a case, the ion beam can be stabilized by performing the processes from the first step to the third step. As described above, the method for producing an ion source according to the present invention can be used as a method for repairing a disordered ion source.
以下、本発明の実施例を第1図を用いて説明する。 An embodiment of the present invention will be described below with reference to FIG.
実施例1 炭化タングステン焼結体を0.5×0.5×4.7mmの棒状と
し、長手方向の先端を機械研磨法で円錐角30°、曲率半
径1μmにしたものを針状電極3とした。針状電極にタ
ンタル製の貯蔵部2を取付け、針状電極基部5に加熱支
持体7a,7bを配設した。Example 1 A needle-shaped electrode 3 was prepared by forming a tungsten carbide sintered body into a rod shape of 0.5 × 0.5 × 4.7 mm, and having a longitudinal end made by a mechanical polishing method to have a cone angle of 30 ° and a radius of curvature of 1 μm. The tantalum reservoir 2 was attached to the needle electrode, and the heating supports 7a and 7b were provided on the needle electrode base 5.
イオン化すべき物質1として窒化ほう素製のルツボ中で
溶融したAu60Si26Be14(原子比)合金に、針状電極及び
貯蔵部の一部を浸すことによつて貯蔵部内に前記物質を
充てんした。As a substance 1 to be ionized, a needle electrode and a part of the reservoir were immersed in an Au 60 Si 26 Be 14 (atomic ratio) alloy melted in a crucible made of boron nitride. Filled.
本イオン源の環境を真空度3×10-5Paの真空とし、まず
貯蔵部の温度を800℃とし、800℃におけるイオン電流の
変動率を測定したところ2%/10分であつた。徐々に温
度を下げてイオン電流の変動率を測定した結果、第2図
のイオン源aに示す様に、720°〜800℃では2%/10分
ていど、700〜490℃では1%/10分であつた。The environment of this ion source was set to a vacuum with a vacuum degree of 3 × 10 −5 Pa, the temperature of the storage part was set to 800 ° C., and the fluctuation rate of the ion current at 800 ° C. was measured and found to be 2% / 10 minutes. As a result of measuring the fluctuation rate of the ion current while gradually lowering the temperature, as shown in the ion source a in FIG. 2, it was 2% / 10 minutes at 720 ° to 800 ° C, but 1% / at 700 to 490 ° C. It took 10 minutes.
つぎに、同一構造で同一イオン化物質を有する別のイオ
ン源bで同様の実験を行うと、第2図に示すとおり800
℃では1.5%/10分の電流変動率であつたが、750〜500℃
の範囲では1%/10分であつた。これらの結果より、イ
オン化すべき物質がAu60Si26Be14の場合には700〜500℃
が安定温度域であり、とくに700℃が望ましい動作温度
であることが判明した。そこで、まず前記の真空を維持
しながら貯蔵部2の温度を800℃とし、10分間維持した
(第1工程)。Next, when a similar experiment is performed using another ion source b having the same structure and the same ionized substance, as shown in FIG.
At ℃, the current fluctuation rate was 1.5% / 10 minutes, but 750 to 500 ℃
In the range of 1%, it was 1% / 10 minutes. From these results, when the substance to be ionized is Au 60 Si 26 Be 14 , 700-500 ℃
Is a stable temperature range, and 700 ° C is especially desirable operating temperature. Therefore, first, the temperature of the storage unit 2 was set to 800 ° C. while maintaining the above-mentioned vacuum and maintained for 10 minutes (first step).
その後、針状電極と引出し電極10の間に4.24KVの引出し
電圧を印加して、10μAのイオンビーム11の放出を10分
間行なつた(第2工程)。ついで、貯蔵部の温度を700
℃まで下げた(第3工程)。After that, an extraction voltage of 4.24 KV was applied between the needle-shaped electrode and the extraction electrode 10 to emit an ion beam 11 of 10 μA for 10 minutes (second step). Then, raise the temperature of the storage to 700
The temperature was lowered to ℃ (3rd step).
このようにして製造したイオン源を動作温度700℃で延3
00時間使用した。その間に使用中断による通電停止は30
回あつたにもかかわらず、その間のイオン電流変動率は
1%/10分以下であつた。The ion source manufactured in this way is extended at an operating temperature of 700 ° C.
I used it for 00 hours. During that time, the power is stopped for 30 days due to interruption of use.
Despite the number of turns, the ion current fluctuation rate during that time was 1% / 10 minutes or less.
実施例2 実施例1で作成したイオン源を故意に故障させてイオン
電流の変動率を大きくさせたものを本発明の方法により
修復させる実験を行なつた。すなわち、実施例1で作成
したイオン源bを400℃で引出し電圧を印加してイオン
放出させながら、徐々に昇温していくと、貯蔵部の温度
が800℃でイオン電流変動率が7%/10分以上になつた。
この原因はイオン化すべき物質の温度が低くて粘性が大
きい状態でイオン放出をさせたため、イオン化すべき物
質の均一な被膜が乱れたためである。この様に不安定に
なつたイオン源の通電を止めて貯蔵部の温度を300℃以
下まで下げた。Example 2 An experiment was conducted in which the ion source prepared in Example 1 was intentionally broken down to increase the fluctuation rate of the ion current and repaired by the method of the present invention. That is, when the ion source b prepared in Example 1 is gradually heated while applying an extraction voltage at 400 ° C. to eject ions, the temperature of the storage part is 800 ° C. and the ion current fluctuation rate is 7%. / 10 minutes or more.
This is because the substance to be ionized is discharged at a low temperature and has a high viscosity, so that the uniform coating of the substance to be ionized is disturbed. The instability of the ion source was stopped and the storage temperature was lowered to 300 ° C or lower.
まずこのイオン源の環境を真空度3×10-5Paの真空の状
態で貯蔵部の温度を800℃に加熱した(第1工程)。つ
ぎに引出し電圧4.25KVの印加を行なつた(第2工程)。
ついで、真空を維持し、前記引出し電圧の印加を続けな
がら第3図に示す様に、800℃から700℃に温度を下げ
て、60μAのイオンビーム放出を1分間行なつた(第3
工程)。以上の処理によりこのイオン源のイオン電流変
動率は1%/10分の安定状態に戻つた。First, the temperature of the storage section was heated to 800 ° C. in the environment of this ion source in a vacuum state with a vacuum degree of 3 × 10 −5 Pa (first step). Next, an extraction voltage of 4.25 KV was applied (second step).
Then, while maintaining the vacuum and continuing to apply the extraction voltage, as shown in FIG. 3, the temperature was lowered from 800 ° C. to 700 ° C., and ion beam emission of 60 μA was performed for 1 minute (3rd step).
Process). By the above processing, the ion current fluctuation rate of this ion source returned to a stable state of 1% / 10 minutes.
実施例3 直径0.15mmのタングステン線の先端を電解研磨で曲率半
径1μm以下に尖らせたものを針状電極3として第1図
に示すイオン源の構造体を作成した。Example 3 A structure of the ion source shown in FIG. 1 was prepared by using a tip of a tungsten wire having a diameter of 0.15 mm, which was sharpened to have a radius of curvature of 1 μm or less by electrolytic polishing as a needle electrode 3.
アルミナ製のルツボの中でガリウムを溶融し、これに針
状電極と貯蔵部を浸すことによつて貯蔵部内にガリウム
を充てんした。Gallium was melted in an alumina crucible and the acicular electrode and the reservoir were dipped in the crucible to fill the reservoir with gallium.
実施例1に記載した方法でこのイオン源の実用可能な動
作温度を求めたところ500〜600℃であつた。このイオン
源の環境を真空度7×10-5Paとし、まず、貯蔵部の温度
を650℃として15分間保持した(第1工程)。つぎに針
状電極と引出し電極との間に5.22KVの引出し電圧を印加
して、イオン電流20μAのイオン放出を10分間行なつた
(第2工程)。When the practical operating temperature of this ion source was determined by the method described in Example 1, it was 500 to 600 ° C. The environment of this ion source was set to a vacuum degree of 7 × 10 −5 Pa, and the temperature of the storage section was first set to 650 ° C. and maintained for 15 minutes (first step). Next, an extraction voltage of 5.22 KV was applied between the needle-shaped electrode and the extraction electrode, and ion emission with an ion current of 20 μA was performed for 10 minutes (second step).
徐々に温度を下げて、貯蔵部の温度を600℃とし、電流
変動率が1%/10分以下になつたことを確かめてから10
分間保持した(第3工程)。このような処理を行なつて
製造されたイオン源はその後700時間にわたつて500〜60
0℃の動作温度で5〜10μAのイオン電流を電流変動率
1%/10分以下の安定性で得ることができた。Gradually lower the temperature to 600 ℃ in the storage section and confirm that the current fluctuation rate is 1% / 10 minutes or less.
Hold for 3 minutes (3rd step). The ion source produced by such treatment is 500-60 after 700 hours.
At an operating temperature of 0 ° C., an ion current of 5 to 10 μA could be obtained with a stability of a current fluctuation rate of 1% / 10 minutes or less.
本発明の第1工程〜第3工程の処理工程を経て製造され
たイオン源はイオン電流の安定性に優れ、とくにエージ
ング操作を行なうことなく使用することができる。The ion source manufactured through the treatment steps of the first step to the third step of the present invention is excellent in the stability of the ion current, and can be used without performing an aging operation.
第1図は本発明のイオン源の説明図、第2図および第3
図は実施例で用いたイオン源の加熱温度と電流変動率と
の関係を示すグラフである。 符号1……イオン化すべき物質、2……貯蔵部、3……
針状電極、4……針状電極先端、5……針状電極基部、
6……接着剤、7a,7b……加熱支持体、8a,8b……導電性
支持体、9a,9b……導電性隔壁、10……引出し電極、11
……イオンビーム、12a,12b……絶縁材、13a,13b……ナ
ツト、14……連接棒、15a,15b……帯板、16a,16b……電
極、17……加熱電源、18……引出し電源FIG. 1 is an explanatory view of an ion source of the present invention, FIG. 2 and FIG.
The figure is a graph showing the relationship between the heating temperature of the ion source used in the examples and the current fluctuation rate. Reference numeral 1 ... a substance to be ionized, 2 ... a storage unit, 3 ...
Needle electrode, 4 ... Needle electrode tip, 5 ... Needle electrode base,
6 ... Adhesive, 7a, 7b ... Heating support, 8a, 8b ... Conductive support, 9a, 9b ... Conductive partition, 10 ... Extraction electrode, 11
...... Ion beam, 12a, 12b ...... Insulation material, 13a, 13b ...... Nut, 14 ...... Connecting rod, 15a, 15b …… Strip plate, 16a, 16b …… Electrode, 17 …… Heating power supply, 18 …… Drawer power supply
Claims (1)
る貯蔵部と、前記針状電極および貯蔵部を加熱するため
の加熱部と、前記針状電極の先端に電界を与えるための
引出し電極とを備えてなる電界放射型イオン源におい
て、下記第1工程〜第3工程で処理することを特徴とす
る電界放射型イオン源の製造方法。 第1工程…真空中で前記電界を与えることなく前記加熱
を行ない、貯蔵部の温度を動作温度より50℃以上高い温
度に到達させる。 第2工程…第1工程の温度および真空を維持しながら前
記電界を与える。 第3工程…真空を維持し、前記電界を与えながら貯蔵部
の温度を動作温度まで下げる。1. A needle electrode, a storage unit for storing a substance to be ionized, a heating unit for heating the needle electrode and the storage unit, and a drawer for applying an electric field to the tip of the needle electrode. A field emission ion source comprising an electrode, wherein the field emission ion source is treated in the following first to third steps. First step: The heating is performed in a vacuum without applying the electric field, and the temperature of the storage section reaches a temperature higher than the operating temperature by 50 ° C. or more. Second step ... The electric field is applied while maintaining the temperature and vacuum of the first step. Third step ... Maintaining a vacuum and lowering the temperature of the reservoir to the operating temperature while applying the electric field.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61179875A JPH0797486B2 (en) | 1986-08-01 | 1986-08-01 | Method for manufacturing field emission ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61179875A JPH0797486B2 (en) | 1986-08-01 | 1986-08-01 | Method for manufacturing field emission ion source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6337542A JPS6337542A (en) | 1988-02-18 |
| JPH0797486B2 true JPH0797486B2 (en) | 1995-10-18 |
Family
ID=16073427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61179875A Expired - Lifetime JPH0797486B2 (en) | 1986-08-01 | 1986-08-01 | Method for manufacturing field emission ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0797486B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL443024A1 (en) * | 2022-12-01 | 2024-06-03 | Politechnika Łódzka | Elastomer composition with increased resistance to oxidation and changing color during aging |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2807719B2 (en) * | 1990-04-04 | 1998-10-08 | セイコーインスツルメンツ株式会社 | Operation method of liquid metal ion source of focused ion beam device |
-
1986
- 1986-08-01 JP JP61179875A patent/JPH0797486B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL443024A1 (en) * | 2022-12-01 | 2024-06-03 | Politechnika Łódzka | Elastomer composition with increased resistance to oxidation and changing color during aging |
| PL249428B1 (en) * | 2022-12-01 | 2026-04-13 | Politechnika Łódzka | An elastomer composition with increased resistance to oxidation and changing color during aging |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6337542A (en) | 1988-02-18 |
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