JPH079864B2 - Method for producing Co-based amorphous magnetic film - Google Patents
Method for producing Co-based amorphous magnetic filmInfo
- Publication number
- JPH079864B2 JPH079864B2 JP23918286A JP23918286A JPH079864B2 JP H079864 B2 JPH079864 B2 JP H079864B2 JP 23918286 A JP23918286 A JP 23918286A JP 23918286 A JP23918286 A JP 23918286A JP H079864 B2 JPH079864 B2 JP H079864B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- oxygen
- based amorphous
- magnetic film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 21
- 239000001301 oxygen Substances 0.000 claims description 21
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000035699 permeability Effects 0.000 description 8
- 230000004907 flux Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 （技術分野） 本発明はCo系アモルフアス磁性膜の形成方法に関し、特
に耐摩耗性が改善されたCo系アモルフアス磁性膜の形成
方法に関する。TECHNICAL FIELD The present invention relates to a method for forming a Co-based amorphous magnetic film, and more particularly to a method for forming a Co-based amorphous magnetic film having improved wear resistance.
（従来技術） CoM（ただしZr、Nb、Hf、Ti、Ta、Ｗ、Mo等）は高い飽
和磁束密度、高い透磁率を有し、すぐれた軟磁性を示す
ので磁気ヘツド用材料として有望である。しかし、フエ
ライト材料等に比べれば耐摩耗性に劣るという欠点があ
る。このような磁性膜はフエライト等のヘツドヨークの
突き合せ端面に形成され間にガラス層を挟んで合着され
て磁気ヘツドギヤツプ部を構成している。磁気ヘツドの
使用時に磁気テープ等の記録媒体がヘツド表面と摩耗状
態で走行するとき、アモルフアス合金の硬度がフエライ
トよりも低いために片減りを生じ、記録再生特性が次第
に低下する。従つて、耐摩耗性の高い磁性膜が望まれる
が、高飽和磁束密度、高透磁率の要請と高耐摩耗性を十
分に満足する磁性層は提案されていない。(Prior Art) CoM (however, Zr, Nb, Hf, Ti, Ta, W, Mo, etc.) is a promising material for magnetic heads because it has high saturation magnetic flux density, high magnetic permeability, and excellent soft magnetism. . However, it has a drawback that it is inferior in wear resistance as compared with a ferrite material or the like. Such a magnetic film is formed on the abutting end face of a head yoke such as a ferrite and bonded together with a glass layer sandwiched therebetween to form a magnetic headgear portion. When a recording medium such as a magnetic tape travels in a worn state with the head surface when the magnetic head is used, the hardness of the amorphous alloy is lower than that of the ferrite, causing uneven wear, and the recording / reproducing characteristics gradually deteriorate. Therefore, a magnetic film having high wear resistance is desired, but a magnetic layer satisfying the requirements of high saturation magnetic flux density and high permeability and high wear resistance has not been proposed.
（発明の目的） 本発明は耐摩耗性の高いCo系アモルフアス合金磁性膜を
提供することを目的とする。(Object of the Invention) An object of the present invention is to provide a Co-based amorphous alloy magnetic film having high wear resistance.
（発明の概要） 本発明はCoM（ただしＭはZr、Nb、Hf、Ti、Ta、Ｗ、Mo
より成る群より選ばれた少なくとも１種）で表わされる
合金をターゲツトとし、Ar等の不活性ガス中でスパツタ
成膜することによりCo系アモルフアス合金磁性膜を成膜
するに当り、不活性ガス中に酸素、または酸素と窒素の
両者を含有させることにより、酸素または窒素または両
者を含有するCo系アモルフアス合金磁性膜を形成するこ
とを特徴とする。(Outline of the Invention) The present invention is CoM (where M is Zr, Nb, Hf, Ti, Ta, W, Mo).
At least one selected from the group consisting of) is used as a target, and a sputtering method is used to form a Co-based amorphous alloy magnetic film in an inert gas such as Ar. Incorporating oxygen, or both oxygen and nitrogen, into the alloy forms a Co-based amorphous alloy magnetic film containing oxygen, nitrogen, or both.
本発明によると、Co系アモルフアス合金磁性膜の磁気特
性を低下させないで、耐摩耗性を向上させることがで
き、磁気ヘツド等における特性を改善することができ
る。According to the present invention, the wear resistance can be improved without lowering the magnetic characteristics of the Co-based amorphous alloy magnetic film, and the characteristics in the magnetic head and the like can be improved.
（発明の具体的な発明） 本発明者はCo系アモルフアス合金磁性膜特性向上のため
にスパツタ雰囲気、スパツタ条件を変えて数多くの実験
を行つたところ、スパツタガスである不活性ガスに少量
の酸素または酸素と窒素を含有させたとき耐摩耗性が高
くなるが、磁気ヘツドの磁性膜として必要な飽和磁束密
度及び透磁率がこれらのガスが存在しない場合に比べて
ほんど差がないことを見出した。(Detailed Invention of the Invention) The present inventor has carried out many experiments by changing the sputter atmosphere and the sputter condition to improve the characteristics of the Co-based amorphous alloy magnetic film. As a result, a small amount of oxygen or It was found that the wear resistance increases when oxygen and nitrogen are contained, but the saturation magnetic flux density and permeability necessary for the magnetic film of the magnetic head are not so different from those in the absence of these gases. .
このような酸化または酸窒化処理の効果は、Co系アモル
フアス合金CoM（Ｍは上記の通り）の種類によつてほと
んど差がないことが分つた。It has been found that the effect of such oxidation or oxynitriding treatment has almost no difference depending on the type of Co-based amorphous alloy CoM (M is as described above).
Ar等の不活性ガスに混入するガスが酸素の場合には、ガ
ス全量に対して酸素を0.01〜10vol％混入させると良い
ことが分つた。この量が0.01vol％未満の場合には耐摩
耗性（硬度を指標にする）が充分に改善されない。また
この量が10vol％までは透磁率が向上するが10vol％を超
えると、急に減少する。なお、飽和磁束密度は酸素量の
増大と共に漸次減少するが、酸素10vol％では余り目立
つた減少ではない。It was found that when the gas mixed with the inert gas such as Ar is oxygen, 0.01 to 10 vol% of oxygen should be mixed with the total amount of the gas. If this amount is less than 0.01 vol%, the wear resistance (based on hardness) is not sufficiently improved. Further, the magnetic permeability is improved up to this amount of 10 vol%, but suddenly decreases when the amount exceeds 10 vol%. The saturation magnetic flux density gradually decreases as the amount of oxygen increases, but it does not decrease significantly at 10 vol% oxygen.
一方、混入ガスが酸素と窒素ガスの場合には総量が15vo
l％を超えない範囲で酸素が0.01〜10vol％、窒素が0.01
〜15vol％未満の範囲で混入すれば同様な効果が得ら
れ、下限以下では硬度が向上せず、また15vol％以上で
は透磁率が急に減少する。飽和磁束密度はこの範囲では
目立つた減少を示さない。On the other hand, if the mixed gas is oxygen and nitrogen gas, the total amount is 15 vo
Oxygen 0.01-10vol%, nitrogen 0.01
Similar effects can be obtained by mixing in the range of less than 15 vol%, the hardness is not improved below the lower limit, and the magnetic permeability is sharply reduced above 15 vol%. The saturation magnetic flux density shows no noticeable decrease in this range.
スパツタ法は従来良く知られている方法に従えば良い。
ターゲツトには所定の合金組成に予め調製された板を用
い、真空容器内にターゲツト−基板間距離数10mmでター
ゲツト及び成膜基板を配し、10-6Torr程度に減圧し、A
r、Heなどの不活性ガスを酸素、窒素ガスと共に10-3Tor
r程度のガス圧で導入し、電離した不活性ガスによりタ
ーゲツトから所定金属原子を放出させて基板、例えば磁
性フエライト製ヘツドヨークの突き合せ面の上に成膜さ
せてCo系アモルフアス合金膜を形成させるものである。As the sputtering method, a method well known in the art may be used.
A plate prepared in advance with a predetermined alloy composition is used as the target, and the target and the film-forming substrate are arranged at a distance between the target and the substrate of 10 mm in a vacuum container, and the pressure is reduced to about 10 -6 Torr.
Inert gas such as r and He together with oxygen and nitrogen gas 10 -3 Tor
It is introduced at a gas pressure of about r, and the target metal atoms are released from the target by the ionized inert gas to form a Co-based amorphous alloy film on the substrate, for example, on the abutting surface of the magnetic ferrite head yoke. It is a thing.
以下、本発明の実施例を説明する。Examples of the present invention will be described below.
実施例１ ターゲツトとしてCo83Zr4Nb13（数字は原子％）を用
い、不活性ガスとしてArを用い、これに酸素を種々の割
合いで混入させ、スパツタし、結晶化ガラス基板上にCo
−Zr−Nb系の膜を生成した。その条件は次の通りであつ
た。Example 1 Co 83 Zr 4 Nb 13 (numerical value: atomic%) was used as a target, Ar was used as an inert gas, and oxygen was mixed in various proportions thereto, and the mixture was sputtered to form Co on a crystallized glass substrate.
A -Zr-Nb based film was produced. The conditions are as follows.
RF電力 500W ターゲツト・基板間距離 60mm 基板温度 水冷 到達圧力 1.0×10-6Torr ガス圧力 5.0×10-3Torr 膜厚 約５μ その後回転磁界中アニールを次の条件で行つた。RF power 500W Target-substrate distance 60mm Substrate temperature Water cooling Ultimate pressure 1.0 × 10 -6 Torr Gas pressure 5.0 × 10 -3 Torr Film thickness about 5μ After that, annealing in a rotating magnetic field was performed under the following conditions.
印加磁界 10KGauss 温度 360℃ 回転数 400rpm 時間 60min 雰囲気 Arガス中 得られたアモルフアス磁性膜のピツカース硬度、透磁率
（5MHzで）、及び飽和磁束密度を測定したところ第１図
及び第２図のグラフに示す結果を得た。なおビツカース
硬度は重量10gで15秒間加重して測定した。Applied magnetic field 10KGauss Temperature 360 ℃ Rotation speed 400rpm Time 60min Atmosphere Ar gas The Pickers hardness, permeability (at 5MHz) and saturation magnetic flux density of the obtained amorphous magnetic film were measured. The results shown were obtained. The Vickers hardness was measured by applying a weight of 10 g for 15 seconds.
第１〜２図から分るように、酸素が全ガス量の10vol％
以下ならば飽和磁束密度はほとんど変化せず、透磁率は
上がり、硬度も上がる。酸素が0.01vol％未満ならばビ
ツカース硬度はほとんど向上せず、10vol％より多くな
ると透磁率が急激に減少する。従つて、0.01〜10vol％
の酸素を含有するArガスを用いて磁気ヘツドの磁性膜を
スパツタ成膜すると、耐摩耗性にすぐれていることが分
る。As can be seen from Figs. 1 and 2, oxygen is 10 vol% of the total gas amount.
If it is below, the saturation magnetic flux density hardly changes, the magnetic permeability increases, and the hardness also increases. If the oxygen content is less than 0.01 vol%, the Vickers hardness hardly improves, and if it exceeds 10 vol%, the magnetic permeability decreases sharply. Therefore, 0.01-10 vol%
It is found that the wear resistance is excellent when the magnetic film of the magnetic head is sputtered using Ar gas containing oxygen.
実施例２ ターゲツトとしてCo83Ta15（数子は原子％）を用い、不
活性ガスとしてArを用い、これに酸素を種々の割合いで
混入させてスパツタし、結晶化ガラス基板上にCo−Ta膜
を生成した。その条件は次の通りであつた。Example 2 Co 83 Ta 15 (numerical value is atomic%) was used as a target, Ar was used as an inert gas, and oxygen was mixed in various proportions to the resultant to sputter the Co-Ta film on the crystallized glass substrate. Was generated. The conditions are as follows.
RF電力 600W ターゲツト・基板間距離 60mm 基板温度 水冷 到達圧力 1.0×10-6Torr ガス圧力 3.0×10-3Torr 膜厚 約５μ その後、実施例１、２と同様の回転磁界中アニールを行
いビツカース硬度および磁気特性を測定した。その結果
を第１図及び第２図に示す。効果は実施例１とほぼ同様
であつた。RF power 600W Target-substrate distance 60mm Substrate temperature Water cooling Ultimate pressure 1.0 × 10 -6 Torr Gas pressure 3.0 × 10 -3 Torr Film thickness about 5μ After that, annealing is performed in the same rotating magnetic field as in Examples 1 and 2 to Vickers hardness. And the magnetic properties were measured. The results are shown in FIGS. 1 and 2. The effect was almost the same as in Example 1.
（効果のまとめ） 以上から明らかなように、本発明の方法によるCo系アモ
ルフアス合金膜は高い磁気特性と向上した硬度を有し、
耐摩耗性の高い磁性膜であり、磁気ヘツド等の用途で大
きい効果を奏する。(Summary of Effects) As is clear from the above, the Co-based amorphous alloy film according to the method of the present invention has high magnetic properties and improved hardness,
It is a magnetic film with high wear resistance and has a great effect in applications such as magnetic heads.
第１図は酸素ガスの混入量と磁性膜の硬度の関係を示す
グラフ、第２図は酸素ガスの混入量と磁性膜の磁気特性
の関係を示すグラフである。FIG. 1 is a graph showing the relationship between the mixed amount of oxygen gas and the hardness of the magnetic film, and FIG. 2 is a graph showing the relationship between the mixed amount of oxygen gas and the magnetic characteristics of the magnetic film.
Claims (3)
Ｗ、Moより成る群より選ばれた少なくとも１種）をター
ゲットとし、酸素又は酸素と窒素の混合ガスを含む不活
性ガス中でスパッタすることより成るCo系アモルファス
磁性膜の製造方法。1. CoM (where M is Zr, Nb, Hf, Ti, Ta,
A method for producing a Co-based amorphous magnetic film, which comprises sputtering at least one selected from the group consisting of W and Mo) in an inert gas containing oxygen or a mixed gas of oxygen and nitrogen.
第１項記載の製造方法。2. The production method according to claim 1, wherein oxygen alone is contained in an amount of 0.01 to 10 vo1%.
1〜10vo1％、窒素が0.01〜15vo1％含有されている前記
第１項記載の製造方法。3. Oxygen is 0.0 within the range where the total amount does not exceed 15 vo1%.
The manufacturing method according to claim 1, wherein the content of nitrogen is 0.01 to 15 vo1% and 1 to 10 vo1%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23918286A JPH079864B2 (en) | 1986-10-09 | 1986-10-09 | Method for producing Co-based amorphous magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23918286A JPH079864B2 (en) | 1986-10-09 | 1986-10-09 | Method for producing Co-based amorphous magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6394611A JPS6394611A (en) | 1988-04-25 |
| JPH079864B2 true JPH079864B2 (en) | 1995-02-01 |
Family
ID=17040938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23918286A Expired - Lifetime JPH079864B2 (en) | 1986-10-09 | 1986-10-09 | Method for producing Co-based amorphous magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH079864B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165761A (en) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | Member ensuring slight friction, seizing resistance and slight wear in atmosphere |
-
1986
- 1986-10-09 JP JP23918286A patent/JPH079864B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6394611A (en) | 1988-04-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4232061A (en) | Magnetic recording medium and process for producing the same | |
| JPH079864B2 (en) | Method for producing Co-based amorphous magnetic film | |
| JPH0199203A (en) | Soft magnetic laminated layer film | |
| US4615748A (en) | Amorphous soft magnetic thin film | |
| JPS61188908A (en) | Amorphous soft magnetic film | |
| JPH03263306A (en) | Magnetic film and magnetic head | |
| JPS6313256B2 (en) | ||
| JPS62117143A (en) | Production of magnetic recording medium | |
| JPH0744107B2 (en) | Soft magnetic thin film | |
| JPS61115257A (en) | Photomagnetic recording medium | |
| JPH0448868B2 (en) | ||
| JPS6059729B2 (en) | Method for manufacturing magnetic recording media | |
| JPH03246913A (en) | Forming method of thin soft magnetic film | |
| JP2546275B2 (en) | Soft magnetic thin film | |
| JPH02152209A (en) | Soft magnetic film | |
| JPH04214831A (en) | Soft magnetic film | |
| JPH0261030A (en) | Magnetic materials and magnetic heads | |
| JPS62104107A (en) | Soft magnetic thin film | |
| JPS58118033A (en) | Production of magnetic recording medium | |
| JPH03162736A (en) | Production of magneto-optical recording medium | |
| JPH02227815A (en) | Magnetic recording medium and production thereof | |
| JPS63281250A (en) | Magnetooptics thin film material and manufacture thereof | |
| JPS62120627A (en) | Magnetic recording medium | |
| JPH0746654B2 (en) | Soft magnetic thin film | |
| JPH0828298B2 (en) | Soft magnetic thin film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |