JPH079868B2 - Electrode material for electrolytic capacitors - Google Patents
Electrode material for electrolytic capacitorsInfo
- Publication number
- JPH079868B2 JPH079868B2 JP25243586A JP25243586A JPH079868B2 JP H079868 B2 JPH079868 B2 JP H079868B2 JP 25243586 A JP25243586 A JP 25243586A JP 25243586 A JP25243586 A JP 25243586A JP H079868 B2 JPH079868 B2 JP H079868B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode material
- conductive metal
- etching
- electrolytic capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007772 electrode material Substances 0.000 title claims description 21
- 239000003990 capacitor Substances 0.000 title claims description 16
- 239000000463 material Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 16
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 15
- 229910001593 boehmite Inorganic materials 0.000 claims description 12
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 239000011888 foil Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 9
- 238000007788 roughening Methods 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 4
- 238000003486 chemical etching Methods 0.000 claims description 2
- 238000001312 dry etching Methods 0.000 claims description 2
- 238000001020 plasma etching Methods 0.000 claims description 2
- 238000001039 wet etching Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 この発明は電解コンデンサ用電極材料に関する。TECHNICAL FIELD The present invention relates to an electrode material for an electrolytic capacitor.
従来の技術 従来、電解コンデンサの静電容量を高めるために、電極
材料の基材であるアルミニウム箔の表面積をエッチング
により拡大することが行われているが、エッチングが過
度によるとアルミニウム箔表面の溶解が同時に進行して
却って拡面率の増大を防げることなどから、エッチング
技術による電極材料の静電容量の増大化には限界があっ
た。Conventional technology Conventionally, in order to increase the capacitance of electrolytic capacitors, the surface area of the aluminum foil that is the base material of the electrode material has been expanded by etching. However, there is a limit to the increase in the capacitance of the electrode material by the etching technique because the progress of the above-mentioned process and the increase in the surface expansion ratio can be prevented.
そこで、本出願人は先に、アルミニウム箔表面をエッチ
ング等により粗面化したうえで、さらにこの粗面化表面
に、導電性金属皮膜を被覆形成することにより、基材の
粗面化効果をそれ自体微細凹凸状態を呈する導電性皮膜
表面へ顕出せしめ、もって拡面率を向上しうるものとし
た電極材料を提案した（特開昭61−180420号）。この電
極材料によれば、従来のエッチングを施したのみの電極
材料に比べて大きな静電容量の電解コンデンサが得られ
るものであった。Therefore, the present applicant firstly roughens the surface of the aluminum foil by etching or the like, and further forms a conductive metal film on the roughened surface to form a roughening effect on the base material. We have proposed an electrode material that can be made to appear on the surface of a conductive film that itself exhibits fine irregularities, thereby improving the surface expansion rate (Japanese Patent Laid-Open No. 61-180420). According to this electrode material, an electrolytic capacitor having a larger electrostatic capacitance than that of the conventional electrode material only subjected to etching can be obtained.
発明が解決しようとする問題点 ところが、上記の電極材料でさえ、昨今のエレクトロニ
クス製品の小型化、高性能化に伴って要請される電解コ
ンデンサの小型、高性能化に対処するにはなお拡面効果
が充分でなく、静電容量の点で物足りないものであっ
た。The problem to be solved by the invention is that even with the above-mentioned electrode materials, the surface area is still expanded to cope with the demands for downsizing and higher performance of electrolytic capacitors, which are required with the recent downsizing and higher performance of electronic products. The effect was not sufficient, and was insufficient in terms of capacitance.
この発明はかかる技術的背景のもとになされたものであ
って、より一層の静電容量の増大を図った電解コンデン
サ用電極材料の提供を目的とするものである。The present invention has been made under such a technical background, and an object thereof is to provide an electrode material for an electrolytic capacitor in which the capacitance is further increased.
問題点を解決するための手段 上記目的において、この発明は、導電性金属皮膜の形成
前に、粗面化したアルミニウム箔基材表面にまず針状、
鱗片状等の微細突起を有する酸化皮膜を形成し、この酸
化皮膜表面に導電性金属皮膜を形成せしめたものとする
ことにより、基材の粗面化効果のみならず酸化皮膜の微
細凹凸効果をも金属皮膜表面に波及せしめ、もって電極
材料の表面積の一層の拡大、ひいては静電容量の増大化
を図ったものである。Means for Solving the Problems In the above object, the present invention is, prior to the formation of a conductive metal film, first needle-like on the roughened aluminum foil substrate surface,
By forming an oxide film having fine projections such as scales and forming a conductive metal film on the surface of this oxide film, not only the roughening effect of the base material but also the fine unevenness effect of the oxide film Is also intended to further spread the surface area of the electrode material and thus increase the electrostatic capacity.
即ちこの発明は、第１図に示すように、粗面化されたア
ルミニウム箔基材（１）の表面に、針状、鱗片状等の微
細突起（2a）を有する酸化皮膜（２）が被覆形成され、
さらに該酸化皮膜の表面に導電性金属皮膜（３）が被覆
形成されてなることを特徴とする電解コンデンサ用電極
材料を要旨とするものである。That is, according to the present invention, as shown in FIG. 1, the surface of a roughened aluminum foil substrate (1) is coated with an oxide film (2) having fine protrusions (2a) such as needles and scales. Formed,
Further, the subject matter is an electrode material for an electrolytic capacitor, characterized in that a conductive metal film (3) is formed on the surface of the oxide film.
基材（１）となるアルミニウム箔の組成は特に限定され
るものではなく、従来より使用実績のある高純度アルミ
ニウム箔を始め各種組成のものを用いることができる。The composition of the aluminum foil as the base material (1) is not particularly limited, and various compositions such as high-purity aluminum foil, which has been used in the past, can be used.
基材（１）表面の粗面化は、一般的にはエッチングによ
り行うが、このエッチングは化学的あるいは電気化学的
エッチング等の湿式エッチングによっても良く、あるい
はプラズマエッチング、イオンビーム・エッチング、レ
ーザビーム・エッチング等の乾式エッチングにより行う
ものとしても良い。この粗面化は基材の片面のみに施し
ても良く、両面に施すものとしても良い。The roughening of the surface of the substrate (1) is generally performed by etching, but this etching may be performed by wet etching such as chemical or electrochemical etching, or plasma etching, ion beam etching, laser beam etching. -It may be performed by dry etching such as etching. This roughening may be performed on only one side of the base material, or on both sides.
粗面化された基材（１）表面に被覆形成される酸化皮膜
（２）は、該酸化皮膜表面に被覆形成されるチタン皮膜
（３）に拡面効果を波及せしめて拡面率の向上を助長す
る趣旨から、針状または鱗片状等の微細突起（2a）を有
するものであることを要件とする。このような酸化皮膜
（２）の好適例として、ベーマイト皮膜をあげうる。こ
のベーマイト皮膜はベーマイト法、すなわち高温純水中
あるいは少量のアンモニア、トリエタノールアミン等を
添加した高温溶液中で基材（１）を浸漬処理する方法に
より生成される酸化皮膜である。もとより酸化皮膜はベ
ーマイト皮膜に限定されるものではなく、微細突起（2
a）を有する皮膜であれば良い。The oxide film (2) formed by coating on the surface of the roughened base material (1) has an effect of expanding the surface of the titanium film (3) formed by coating on the surface of the oxide film, thereby improving the surface expansion rate. In order to promote the above, it is required to have fine protrusions (2a) such as needles or scales. A preferred example of such an oxide film (2) is a boehmite film. This boehmite film is an oxide film formed by the boehmite method, that is, a method of immersing the substrate (1) in high temperature pure water or a high temperature solution containing a small amount of ammonia, triethanolamine or the like. Of course, the oxide film is not limited to the boehmite film, and it is possible to use fine protrusions (2
Any film that has a) may be used.
上記酸化皮膜（２）表面に被覆形成される導電性金属皮
膜（３）の材料としては、特に限定されるものではない
が、例えばTi、Cr、Ag、Sn、Co、Zr、Ta、Si、Cu、Fe、
Nbあるいはこれらの合金等が使用される。この導電性金
属皮膜（３）の厚さは0.1〜５μｍの範囲とするのが好
ましい。0.1μｍ未満では充分な拡面効果が得られない
虞れがあるからであり、逆に５μｍを超えても使用チタ
ン量の増大、コスト上昇、作業性の悪化等にみあうだけ
の拡面効果が得られない虞れあがるからである。このよ
うな導電性金属皮膜の酸化皮膜表面への被覆形成方法と
しては、真空蒸着法、不活性ガス中蒸着法、スパツタリ
ング法等を用いることができる。ここで、上記した導電
性金属の種類及び金属皮膜の形成方法については、これ
らを任意に選択して組合せることが可能であるが、特に
導電性金属としてのチタンをAr等の不活性ガス雰囲気中
で蒸着した蒸着皮膜とするのが、耐久性に優れたものと
なしえ、ひいてはコンデンサの超寿命化、高信頼性を実
現しうるものとなる点で好ましい。この場合さらに、前
記酸化皮膜（２）がベーマイト皮膜であれば、析出した
チタン粒子のモビリティが小さく、皮膜表面上をあまり
移動することなく凝固する。従って、ベーマイト皮膜の
微細凹凸面に沿ってチタン皮膜を成長せしめることがで
き、より拡面率の大きなものとすることができる。ここ
で、チタンの蒸着を行う不活性ガス中の圧力は１×10-5
〜１×10-3Torrの範囲とするのが好ましい。下限値未満
の圧力では、皮膜が平滑化して静電容量の小さいものと
なる虞れがあるためであり、逆に上限値を超えて大きく
なると、チタンが蒸着しにくくなるうえ、皮膜がすす状
となって密着性が悪くなる虞れがあるからであるるから
である。なおチタン蒸着の際の蒸発源と基材との蒸着距
離、蒸着速度等は、雰囲気圧、膜厚等との関連で適宜選
択すれば良い。The material of the conductive metal film (3) formed on the surface of the oxide film (2) is not particularly limited, but for example, Ti, Cr, Ag, Sn, Co, Zr, Ta, Si, Cu, Fe,
Nb or alloys thereof are used. The thickness of the conductive metal film (3) is preferably in the range of 0.1 to 5 μm. If it is less than 0.1 μm, it may not be possible to obtain a sufficient surface-expanding effect. Conversely, if it exceeds 5 μm, the surface-expanding effect is sufficient to increase the amount of titanium used, increase costs, and deteriorate workability. This is because there is a risk that the As a method for forming a coating on the oxide film surface of such a conductive metal film, a vacuum deposition method, an inert gas deposition method, a sputtering method, or the like can be used. Here, with respect to the type of the conductive metal and the method for forming the metal film described above, it is possible to arbitrarily select and combine them, and particularly titanium as a conductive metal is used in an inert gas atmosphere such as Ar. It is preferable to use a vapor-deposited film vapor-deposited therein because it has excellent durability and, in turn, can realize a long life of the capacitor and high reliability. In this case, further, if the oxide film (2) is a boehmite film, the precipitated titanium particles have a small mobility and solidify without much movement on the film surface. Therefore, the titanium film can be grown along the fine irregular surface of the boehmite film, and the surface expansion rate can be further increased. Here, the pressure in the inert gas for vapor deposition of titanium is 1 × 10 −5.
It is preferably in the range of up to 1 × 10 -3 Torr. This is because if the pressure is less than the lower limit value, the film may be smoothed and the electrostatic capacity may become small. On the other hand, if the pressure exceeds the upper limit value, titanium is less likely to be vapor-deposited and the film becomes soot-like. This is because there is a risk that the adhesion will deteriorate. The vapor deposition distance between the vaporization source and the substrate during vapor deposition of titanium, the vapor deposition rate, and the like may be appropriately selected in relation to the atmospheric pressure, the film thickness, and the like.
上記のような酸化皮膜（２）の形成処理及び次段の導電
性金属皮膜（３）の形成処理は、粗面化工程を経たコイ
ル状の基材を巻き取りながら連続的に行うものとするの
が、作業性等の点から推奨される。The oxide film (2) forming process and the next-stage conductive metal film (3) forming process as described above are continuously performed while winding the coiled base material that has undergone the roughening process. However, it is recommended in terms of workability.
酸化皮膜及び導電性金属皮膜を被覆形成された基材は、
それをそのまま電解コンデンサ用陰極材料として使用し
ても良く、あるいはその後ホウ酸等の浴中で化成処理
し、誘電体皮膜を形成して陽極材料として使用しても良
い。The base material coated with an oxide film and a conductive metal film is
It may be used as it is as a cathode material for an electrolytic capacitor, or may be subsequently subjected to chemical conversion treatment in a bath of boric acid or the like to form a dielectric film and used as an anode material.
発明の効果 以上説明したように、この発明に係る電極材料は、粗面
化されたアルミニウム箔基材の表面に、まず針状、鱗片
状等の微細突起を有する酸化皮膜が被覆形成され、該酸
化皮膜の表面に導電性金属皮膜が被覆形成されるもので
あることにより、基材の粗面化による凹凸状態と酸化皮
膜の微細凹凸状態とが、併せて金属皮膜の表面に顕出さ
れる結果、金属皮膜表面を著しく粗な状態となしえて著
しい拡面率の向上による大きな静電容量を有するものと
なしうる。EFFECTS OF THE INVENTION As described above, the electrode material according to the present invention is such that the surface of the roughened aluminum foil substrate is first coated with an oxide film having fine protrusions such as needles and scales. As a result of the conductive metal film being formed on the surface of the oxide film, the uneven condition due to the roughening of the base material and the fine uneven condition of the oxide film are simultaneously exposed on the surface of the metal film. In addition, the surface of the metal film can be made to be extremely rough, and the surface expansion ratio can be remarkably improved to provide a large capacitance.
実施例 次にこの発明の実施例を比較例とともに示す。Examples Next, examples of the present invention will be shown together with comparative examples.
実施例１ 厚さ0.05mm、純度99.8％のアルミニウム箔を基材とし、
該基材を液温60℃、2.5％塩酸溶液中に浸漬し、20A/50c
m2の電流密度で300秒間電解エッチングした。次に上記
基材を100℃、0.3％トリエタノールアミン溶液中に15分
間浸漬し、ベーマイト皮膜を被覆形成した。次いで、１
×10-3TorrのAr雰囲気中でチタンを蒸発させ、ベーマイ
ト皮膜表面に厚さ1.2μｍのチタン蒸着皮膜を被覆形成
した。Example 1 With an aluminum foil having a thickness of 0.05 mm and a purity of 99.8% as a base material,
The base material is immersed in a 2.5% hydrochloric acid solution at a liquid temperature of 60 ° C., and 20 A / 50 c
Electrolytic etching was performed at a current density of m 2 for 300 seconds. Next, the substrate was immersed in a 0.3% triethanolamine solution at 100 ° C for 15 minutes to form a boehmite film. Then 1
Titanium was evaporated in an Ar atmosphere of 10 -3 Torr to form a vapor-deposited titanium film having a thickness of 1.2 µm on the surface of the boehmite film.
実施例２ 厚さ0.05mm、純度99.0％アルミニウム箔を基材とし、該
基材を液温50℃、５％塩酸溶液中に５分間浸漬して化学
エッチングを施した。次に上記基材を60℃、0.5％トリ
エタノールアミン溶液中に60分浸漬し、ベーマイト皮膜
を被覆形成した。次いで、１×10-3TorrのAr雰囲気中で
チタンを蒸発させ、ベーマイト皮膜表面に厚さ1.0μｍ
のチタン蒸着皮膜を被覆形成した。Example 2 An aluminum foil having a thickness of 0.05 mm and a purity of 99.0% was used as a base material, and the base material was immersed in a 5% hydrochloric acid solution at a liquid temperature of 5 ° C. for 5 minutes for chemical etching. Next, the substrate was immersed in a 0.5% triethanolamine solution at 60 ° C. for 60 minutes to form a boehmite film. Then, titanium is evaporated in an Ar atmosphere of 1 × 10 -3 Torr, and the thickness of the boehmite film surface is 1.0 μm.
The titanium vapor-deposited film was formed by coating.
比較例１ 実施例１と同一材質、同一形状のアルミニウム箔を基材
とし、該基材に実施例１と同一条件でエッチングを施し
たのち、酸化皮膜を形成することなく該基材表面に直
接、１×10-3TorrのAr雰囲気中でチタンを蒸発させ、厚
さ1.2μｍのチタン蒸着皮膜を被覆形成した。Comparative Example 1 An aluminum foil having the same material and shape as in Example 1 was used as a base material, and the base material was etched under the same conditions as in Example 1 and then directly applied to the surface of the base material without forming an oxide film. Titanium was evaporated in an Ar atmosphere of 1 × 10 −3 Torr to form a titanium vapor deposition film having a thickness of 1.2 μm.
以上のようにして得た３種類の電解コンデンサ用陰極材
料としての電極材料の静電容量を、30℃、10％ホウ酸ア
ンモニウム溶液中で測定した。その結果を次表に示す。The electrostatic capacities of the three types of electrode materials as cathode materials for electrolytic capacitors obtained as described above were measured in a 10% ammonium borate solution at 30 ° C. The results are shown in the table below.
上記結果から明らかなように、この発明に係る電極材料
は、静電容量に優れたものであることを確認し得た。 As is clear from the above results, it can be confirmed that the electrode material according to the present invention has excellent capacitance.
第１図はこの発明に係る電極材料の模式的断面拡大図で
ある。 （１）…基材、（２）…酸化皮膜、（2a）…微細突起、
（３）…導電性金属皮膜。FIG. 1 is a schematic enlarged cross-sectional view of an electrode material according to the present invention. (1) ... Base material, (2) ... Oxide film, (2a) ... Fine protrusions,
(3) ... Conductive metal film.
Claims (6)
に、針状、鱗片状等の微細突起を有する酸化皮膜が被覆
形成され、さらに該酸化皮膜の表面に導電性金属皮膜が
被覆形成されてなることを特徴とする電解コンデンサ用
電極材料。1. An oxide film having fine protrusions such as needles and scales is formed on the surface of a roughened aluminum foil substrate, and a conductive metal film is formed on the surface of the oxide film. An electrode material for an electrolytic capacitor, characterized in that
湿式エッチングにより行われたものである特許請求の範
囲第１項記載の電解コンデンサ用電極材料。2. The electrode material for an electrolytic capacitor according to claim 1, wherein the surface of the base material is roughened by wet etching such as chemical etching.
の乾式エッチングにより行われたものである特許請求の
範囲第１項記載の電解コンデンサ用電極材料。3. The electrode material for an electrolytic capacitor according to claim 1, wherein the roughening of the surface of the base material is performed by dry etching such as plasma etching.
ベーマイト皮膜である特許請求の範囲第１項ないし第３
項のいずれか１に記載の電解コンデンサ用電極材料。4. The boehmite film formed by the boehmite method, as claimed in any one of claims 1 to 3.
The electrode material for electrolytic capacitors as described in any one of 1 above.
る特許請求の範囲第１項ないし第４項のいずれか１に記
載の電解コンデンサ用電極材料。5. The electrode material for an electrolytic capacitor according to claim 1, wherein the conductive metal film has a thickness of 0.1 to 5 μm.
の不活性ガス雰囲気中で形成されたチタン蒸着皮膜であ
る特許請求の範囲第１項ないし第５項のいずれか１に記
載の電解コンデンサ用電極材料。6. The conductive metal film is 1 × 10 −5 to 1 × 10 −3 Torr.
The electrode material for an electrolytic capacitor according to any one of claims 1 to 5, which is a titanium vapor deposition film formed in an inert gas atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25243586A JPH079868B2 (en) | 1986-10-22 | 1986-10-22 | Electrode material for electrolytic capacitors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25243586A JPH079868B2 (en) | 1986-10-22 | 1986-10-22 | Electrode material for electrolytic capacitors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63104416A JPS63104416A (en) | 1988-05-09 |
| JPH079868B2 true JPH079868B2 (en) | 1995-02-01 |
Family
ID=17237330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25243586A Expired - Lifetime JPH079868B2 (en) | 1986-10-22 | 1986-10-22 | Electrode material for electrolytic capacitors |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH079868B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012195527A (en) * | 2011-03-18 | 2012-10-11 | Lin Sei Kou | Cathode carbon-containing aluminum foil structure of solid aluminum electrolytic capacitor and formation method therefor |
-
1986
- 1986-10-22 JP JP25243586A patent/JPH079868B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63104416A (en) | 1988-05-09 |
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