JPH0810778B2 - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- JPH0810778B2 JPH0810778B2 JP61243847A JP24384786A JPH0810778B2 JP H0810778 B2 JPH0810778 B2 JP H0810778B2 JP 61243847 A JP61243847 A JP 61243847A JP 24384786 A JP24384786 A JP 24384786A JP H0810778 B2 JPH0810778 B2 JP H0810778B2
- Authority
- JP
- Japan
- Prior art keywords
- waveguide
- semiconductor laser
- branch
- connecting portion
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4068—Edge-emitting structures with lateral coupling by axially offset or by merging waveguides, e.g. Y-couplers
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体レーザ、特にその導波路が、その光端
面より内側において相互に連結され、この連結部から両
光端面に向ってそれぞれ複数のストライプ状分岐導波路
が配列されてなるアレイ型の半導体レーザに関わる。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor laser, in particular, its waveguides are interconnected to each other on the inner side of the optical end face thereof, and a plurality of semiconductor lasers are provided from the connecting portion toward both optical end faces. The present invention relates to an array type semiconductor laser in which stripe-shaped branched waveguides are arranged.
本発明は、その光端面より内側の例えば中央で相互に
連結され、この連結部から両光端面に向ってそれぞれ複
数のストライプ状分岐導波路が配列されてなる導波路を
有する半導体レーザにおいて、その分岐導波路をその各
光端面から連結部に向って幅広として各分岐導波路の結
合を強めてファーフィールドパターン(以下FFPとい
う)の半値幅の狭小化と、さらに或る場合はFFPが単峰
の半導体レーザを容易かつ確実に得るごとができるよう
にする。The present invention relates to a semiconductor laser having a waveguide which is interconnected to each other, for example, at the center inside the optical end face, and in which a plurality of striped branch waveguides are arranged from the connecting portion toward both optical end faces, respectively. The branch waveguide is widened from each optical end face toward the coupling part to strengthen the coupling of each branch waveguide and narrow the half width of the far field pattern (hereinafter referred to as FFP), and in some cases, FFP is a single peak. The semiconductor laser can be easily and surely obtained.
従来の大出力半導体レーザとしては、第5図にその導
波路のパターン図を示すように複数のストライプ状導波
路(1)が互いに狭小な間隔dをもって平行配列された
構成によるいわゆるアレイ型構造をとるものがある。As a conventional high-power semiconductor laser, a so-called array type structure having a configuration in which a plurality of stripe-shaped waveguides (1) are arranged in parallel with each other at a narrow interval d as shown in the pattern diagram of the waveguide in FIG. There is something to take.
ところがこのような構成による場合、ストライプ本数
をNとすると、その各レーザ発振部すなわち各ストライ
プ状の導波路間における光の伝播の位相が180゜ずれる
N−1)次モード(1次モード)が位相差0゜の0次モ
ードよりも利得が得やすいためにFFPの半値幅が広がる
という問題点があり、またそのFFPが第6図にしめすよ
うに双峰になる。However, in the case of such a configuration, when the number of stripes is N, there is an N-1) th mode (first-order mode) in which the phase of the light propagation between the laser oscillation parts, that is, the waveguides in each stripe is shifted by 180 °. There is a problem that the full width at half maximum of the FFP is widened because the gain is easier to obtain than the 0th-order mode with a phase difference of 0 °, and the FFP becomes a double peak as shown in Fig. 6.
これに対して、例えば米国特許第4,255,717号明細書
及びエレクトロニックス・レターズ(Electronics Lett
ers)13 March 1986 Vol.22 No,6第293頁〜第294頁に開
示されている半導体レーザでは第7図にその導波路パタ
ーンを略線的に示すように導波路(1)として連結部
(2)を有し、これより両光端面(3a)及び(3b)に向
ってそれぞれ複数の分岐導波路(3)をそれぞれ所要の
狭小な間隔dをもって配列した構成をとる。この場合、
各分岐導波路(3)に関する共振器相互の連結によって
隣りどうしの光の伝播の位相差が0゜の0次モードが立
ち易くなるとされている。このような構成による半導体
レーザにおけるFFPは、第8図に示すように単峰性を有
するものの、その半値幅が大となりがちである。In contrast, for example, U.S. Pat. No. 4,255,717 and Electronics Letters
ers) 13 March 1986 Vol.22 No, 6 In the semiconductor lasers disclosed on pages 293 to 294, the waveguide pattern is schematically shown in FIG. (2), from which a plurality of branch waveguides (3) are respectively arranged toward both optical end faces (3a) and (3b) with a required narrow spacing d. in this case,
It is said that the 0th-order mode in which the phase difference of the propagation of light between adjacent ones is 0 ° is easily established by connecting the resonators with respect to each branch waveguide (3). Although the FFP in the semiconductor laser having such a structure has a single peak as shown in FIG. 8, its half-value width tends to be large.
本発明は前述したアレイ型半導体レーザ、すなわちマ
ルチ光放出型の半導体レーザにおいて、そのFFPの半値
幅の狭小化とさらに必要に応じて単峰FFPを確実に得る
ことのできる半導体レーザを提供するものである。The present invention provides an array-type semiconductor laser described above, that is, a semiconductor laser capable of reliably obtaining a single-peak FFP, if necessary, in a narrower half-value width of the FFP in the multi-light-emission type semiconductor laser. Is.
すなわち、本発明においては、第7図に示した半導体
レーザにおいてその半値幅が大となる原因が中央連結部
(2)において各分岐導波路(3)の光のカップリング
が充分に行われずにフェーズロッキング動作がなされな
い場合が生じてくることによることを究明し、これに基
づいて上述した諸問題の解決を図るものである。That is, in the present invention, the reason why the full width at half maximum of the semiconductor laser shown in FIG. 7 is large is that the optical coupling of each branch waveguide (3) is not sufficiently performed in the central coupling portion (2). It is intended to solve the problems described above based on the fact that the phase locking operation may not be performed.
本発明は第1図にその導波路の拡大パターン図を略線
的に示すように、その導波路(11)が、両光端面より内
側の中央に設けられた連結部(12)から両光端面(11
a)及び(11b)に向ってそれぞれ複数のストライプ状分
岐導波路(13)が平行配列されてなり、特にその分岐導
波路(13)がそれぞれの光端面(11a)及び(11b)から
連結部(12)に向かって滑らかに連続的に幅広となる構
成をとり、さらに光端面(11a)側の各分岐導波路の連
結部(12)側の端部と光端面(11b)側の各分岐導波路
の連結部(12)側の端部とが、互いに導波路長方向に所
定の間隔L2を保持して離間して位置する構成とする。In the present invention, as shown in the enlarged pattern diagram of the waveguide in FIG. 1, the waveguide (11) is connected to both optical fibers from a connecting portion (12) provided in the center inside both optical end faces. End face (11
A plurality of striped branch waveguides (13) are arranged in parallel toward a) and (11b), and particularly, the branch waveguides (13) are connected from the respective optical end faces (11a) and (11b) to a connecting portion. It has a structure in which the width is smoothly and continuously widened toward (12), and further, each branch on the optical end facet (11a) side is connected to the connecting part (12) side end and each optical end facet (11b) side branch. The end portion of the waveguide on the side of the coupling portion (12) is arranged so as to be spaced apart from each other while maintaining a predetermined distance L 2 in the waveguide length direction.
上述したように本発明においては、複数の分岐導波路
(13)が設けられたマルチ光放出構造によるアレイ型半
導体構造をとるものであるが、その各分岐導波路(13)
を連結部(12)に向って幅広としたことによって中央連
結部(12)における相互の光のカップリングが確実にな
されることによってそのフェーズロッキングが確実にな
され、これによってFFPの半値幅の狭小化がなされる。As described above, in the present invention, an array type semiconductor structure having a multi-light emitting structure provided with a plurality of branch waveguides (13) is adopted, and each branch waveguide (13)
By making the width wider toward the connecting part (12), the mutual coupling of light in the central connecting part (12) is surely achieved so that the phase locking is assured, and thereby the half width of the FFP is narrowed. Is made.
第2図及び第3図を参照して本発明による半導体レー
ザの一例を詳細に説明する。この例においては利得ガイ
ド型構成とした場合で、その導波路(11)を第1図に説
明したパターンとした場合である。第2図は本発明によ
る半導体レーザの一部を破断した拡大略線的平面図で、
第3図は第2図のA−A線上の拡大略線的断面図を示
す。An example of the semiconductor laser according to the present invention will be described in detail with reference to FIGS. 2 and 3. In this example, the structure is a gain guide type structure, and the waveguide (11) has the pattern described in FIG. FIG. 2 is an enlarged schematic plan view in which a part of the semiconductor laser according to the present invention is cut away.
FIG. 3 is an enlarged schematic sectional view taken along line AA of FIG.
図示の例ではn型の半導体基板、例えばGaAs半導体基
板(21)上に、これと同導電型のn型の例得ばGaAlAsよ
りなる第1のクラット層(22)と、例えばGaAsよりなる
活性層(23)と、第1のクラッド層(22)とは異なる導
電型のp型の例えばGaAlAsよりなる第2のクラッド層
(24)と、これと同導電型のp型の例えばGaAsよりなる
キャップ層(25)とを順次周知の技術、例えばMOCVD法
(Metal−Organic Chemical Vapor Deposition法)ある
いはMBE(Molecular Beam Epitaxy法)によって順次形
成し、キャップ層(25)側より選択的に例えばプロトン
あるいはボロンをイオン注入することによって高抵抗の
電流遮断領域(26)より成る電流狭窄手段を形成する。
この電流遮断領域(26)は、例えば第1図に示したパタ
ーンの導波路(11)を活性層(23)に形成することがで
きるようにこれに対応するパターンの電流通路(30)が
形成されるように第1図に示した導波路(11)の反転パ
ターンに形成される。(27)及び(28)はキャップ層
(25)上及び基板(21)の裏面に被着された電極を示
す。In the illustrated example, on a n-type semiconductor substrate, for example, a GaAs semiconductor substrate (21), an n-type semiconductor layer of the same conductivity type as the first clad layer (22) made of GaAlAs and an active layer made of GaAs, for example, are used. The layer (23), the second clad layer (24) made of a p-type conductivity type different from that of the first clad layer (22), eg, GaAlAs, and the p-type conductivity type of the same, for example, GaAs. The cap layer (25) and the cap layer (25) are sequentially formed by a well-known technique such as MOCVD (Metal-Organic Chemical Vapor Deposition) or MBE (Molecular Beam Epitaxy), and the cap layer (25) is selectively exposed to, for example, protons or By ion-implanting boron, the current confinement means consisting of the high resistance current interruption region (26) is formed.
In the current cutoff region (26), for example, a current path (30) having a corresponding pattern is formed so that the waveguide (11) having the pattern shown in FIG. 1 can be formed in the active layer (23). As a result, the waveguide (11) shown in FIG. 1 is formed in an inverted pattern. Reference numerals (27) and (28) denote electrodes deposited on the cap layer (25) and the back surface of the substrate (21).
このような構成において電極(27)及び(28)間に順
方向電圧を印加すると、電流遮断領域(26)が設けられ
た部分においては電流が遮断され、電流遮断領域(26)
が設けられていない部分に選択的に電流通路(30)が形
成されることによって活性層(23)に第1図に示すパタ
ーンの利得ガイド型の導波路(11)すなわち光共振器が
形成される。When a forward voltage is applied between the electrodes (27) and (28) in such a configuration, the current is cut off at the portion where the current cutoff region (26) is provided, and the current cutoff region (26)
By selectively forming a current path (30) in a portion where no gate is provided, a gain guide type waveguide (11), that is, an optical resonator having the pattern shown in FIG. 1 is formed in the active layer (23). It
また、導波路(11)は、第1図に示すように連結部
(12)から両光端面(11a)及び(11b)に向って延びる
ストライプ状の分岐導波路(13)を有し、その各光端面
(11a)及び(11b)における幅Wsとこの各光端面(11
a)間,(11b)間の間隔Dsは例えばWs=Ds=4μmと
し、ピッチPsは8μmに選定し得る。また、各分岐導波
路(13)の長さL1は例えば110μmとし、連結部(12)
の長さL2は例えば30μmに選定し得る。また、図示の例
では中央の連結部(12)に関して一側法の分岐導波路
(13)と他側方の分岐導波路(13)とを半ピッチ齟齬さ
せた場合で、一方の分岐導波路(13)の数をNa本とする
とき他方の分岐導波路(13)の本数Nbを(Na−1)に選
定した場合である。そして、各分岐導波路(13)はその
光端面(11a)及び(11b)からそれぞれ中央の連結部
(12)に向って漸次幅広の例えばそれぞれ中央の連結部
(12)側において隣合う側面が一致するように、隣合う
分岐導波路(13)間の間隙が例えば2等辺3角形を呈す
るようになし得るが、この間隙の3角形状の各辺すなわ
ち、各分岐導波路(13)の両辺が直線とするに限られ
ず、湾曲形状とすることもできる。The waveguide (11) has a striped branch waveguide (13) extending from the connecting portion (12) toward both optical end faces (11a) and (11b) as shown in FIG. The width Ws at each light end facet (11a) and (11b) and each light end facet (11
The distance Ds between the intervals a) and (11b) may be Ws = Ds = 4 μm, and the pitch Ps may be selected to be 8 μm. The length L 1 of each branch waveguide (13) is, for example, 110 μm, and the connecting portion (12)
The length L 2 can be selected to be 30 μm, for example. Further, in the illustrated example, when the branch waveguide (13) of the one side method and the branch waveguide (13) of the other side with respect to the central coupling portion (12) are displaced by a half pitch, one branch waveguide This is a case where the number Nb of the other branching waveguide (13) is selected as (Na-1) when the number of (13) is Na. Then, in each branch waveguide (13), side faces that are gradually wider from the optical end faces (11a) and (11b) toward the central connecting part (12), for example, adjacent side faces on the central connecting part (12) side, respectively. To be coincident, the gap between the adjacent branch waveguides (13) can be formed to have, for example, an isosceles triangle, but each side of the triangle of the gap, that is, both sides of each branch waveguide (13). Is not limited to a straight line, but may have a curved shape.
尚、上述した例においては高抵抗の電流遮断領域(2
6)を設けて、例えば第1図に示すパターンの導波路(1
1)が活性層に生ずるようにした場合であるが、電流遮
断領域(26)としてn型の不純物をキャップ層(25)及
びクラッド層(24)に至る深さに選択的にイオン注入あ
るいは拡散してpn接合による電流遮断領域を形成するよ
うになすなど種々の利得ガイド型の構成をとることがで
きる。In the above example, the high resistance current interruption region (2
6) is provided, and the waveguide (1
1) is generated in the active layer, the n-type impurity is selectively ion-implanted or diffused to the depth reaching the cap layer (25) and the clad layer (24) as the current blocking region (26). Then, various gain guide type configurations can be adopted such as forming a current blocking region by a pn junction.
また、本発明による半導体レーザは利得ガイド型構成
によるばかりでなく、例えば屈折率ガイド型構成とする
こともできる。この場合の一例を第4図を参照して説明
する。第4図において第3図と対応する部分には同一符
号を付して重複説明を省略するが、この場合においては
第2のクラッド層(24)中に活性層(23)からの光を吸
収し、かつ或る場合は電流遮断効果をも有する例えばn
型の光吸収領域(29)を設けて活性層(23)に屈折率ガ
イド型による導波路を形成することができる。すなわ
ち、この場合においても光吸収層(29)のパターンは、
例えば第1図で説明した導波路パターンと反転したパタ
ーンに形成し、光吸収層(29)が存在しない直下におい
て導波路を形成する。The semiconductor laser according to the present invention may have not only a gain guide type structure but also a refractive index guide type structure, for example. An example of this case will be described with reference to FIG. In FIG. 4, the portions corresponding to those in FIG. 3 are designated by the same reference numerals and the duplicate description is omitted, but in this case, the light from the active layer (23) is absorbed in the second cladding layer (24). And, in some cases, also has a current interruption effect, for example n
A light guide region of a refractive index guide type can be formed in the active layer (23) by providing a light absorption region (29) of a mold. That is, even in this case, the pattern of the light absorption layer (29) is
For example, it is formed in a pattern that is the reverse of the waveguide pattern described in FIG. 1, and the waveguide is formed immediately below the light absorption layer (29).
また、第1図で説明した導波路においては、連結部
(12)を挟んでその一方と他方の分岐導波路(13)が互
いに半ピッチ齟齬するようにした場合であるが、或る場
合は両分岐導波路が直線上に同数をもって配列した構造
とすることもできる。Further, in the waveguide described in FIG. 1, there is a case where one and the other branch waveguides (13) sandwiching the coupling portion (12) are displaced from each other by a half pitch. It is also possible to have a structure in which both branch waveguides are arranged in a straight line with the same number.
また、第3図及び第4図の利得ガイド型半導体レーザ
あるいは屈折率ガイド型半導体レーザに限らず、種々の
利得ガイド型あるいは屈折率ガイド型またはこれらの組
合わせによるガイド型構造を有する半導体レーザ等に本
発明を適用することができる。Further, the invention is not limited to the gain guide type semiconductor laser or the refractive index guide type semiconductor laser shown in FIGS. 3 and 4, but a semiconductor laser having various gain guide type or refractive index guide type or a guide type structure by a combination thereof. The present invention can be applied to.
さらに、第3図及び第4図に示した各部の導電型と逆
の導電型を有する半導体レーザとすることもできる。Further, a semiconductor laser having a conductivity type opposite to the conductivity type of each part shown in FIGS. 3 and 4 can be used.
上述したように本発明においては、複数の分岐導波路
(13)が配列されたマルチ光放出型の大出力半導体レー
ザ構造をとるものであるが、連結部(12)を設けたこと
により、また各分岐導波路(13)を連結部(12)に向っ
て幅広としたことによって各分岐路間の結合が強めら
れ、これによって0次モードの光電界分布が強められる
と同時にフェーズロッキングが確実になされたもとによ
ってFFPの半値幅が狭小となる。また第1図で説明した
ように連結部(12)を挟んで両側の各分岐導波路を半ピ
ッチずらす構造とするときには0次モードが立ちやすく
確実に単峰のFFPを示す半導体レーザを構成することが
できる。As described above, the present invention has a multi-light emitting type high power semiconductor laser structure in which a plurality of branch waveguides (13) are arranged. By making each branch waveguide (13) wider toward the connecting portion (12), the coupling between the branch paths is strengthened, which strengthens the optical electric field distribution of the 0th mode and at the same time ensures phase locking. The full width at half maximum of the FFP will be narrowed depending on what was done. Further, as described in FIG. 1, when the branched waveguides on both sides of the connecting portion (12) are shifted by a half pitch, the 0th mode is apt to occur and a semiconductor laser showing a single-peak FFP is surely constructed. be able to.
第1図は本発明による半導体レーザの一例の導波路の略
線的パターン図、第2図は本発明による半導体レーザの
一例の一部破断の拡大平面図、第3図は第2図のA−A
線上の拡大断面図、第4図は本発明による半導体レーザ
の他の例の拡大断面図、第5図は従来のアレイ型半導体
レーザの導波路のパターン図、第6図はそのファーフィ
ールドパターン図、第7図は従来の半導体レーザの導波
路のパターン図、第8図はそのファーフィールドパター
ン図である。 (11)は導波路、(12)は連結部、(13)は分岐導波路
である。FIG. 1 is a schematic pattern diagram of a waveguide of an example of a semiconductor laser according to the present invention, FIG. 2 is an enlarged plan view of a partially cutaway example of a semiconductor laser according to the present invention, and FIG. -A
FIG. 4 is an enlarged cross-sectional view of the semiconductor laser according to the present invention, FIG. 5 is a waveguide pattern diagram of a conventional array-type semiconductor laser, and FIG. 6 is a far-field pattern diagram thereof. FIG. 7 is a pattern diagram of a waveguide of a conventional semiconductor laser, and FIG. 8 is a far field pattern diagram thereof. Reference numeral (11) is a waveguide, (12) is a connecting portion, and (13) is a branching waveguide.
Claims (1)
対向する第1の光端面と第2の光端面とに向かってそれ
ぞれ複数のストライプ状分岐導波路が配列されてなり、 上記分岐導波路が上記連結部に向かって幅広とされると
共に、上記第1の光端面側の分岐導波路と上記第2の光
端面側の分岐導波路との上記連結部側の端部が、各分岐
導波路間の光結合を強め、そのフェーズロッキングを確
保するための間隔を互いに導波路長方向に保持して離間
して位置し、ファーフィルドパターンの半値幅の狭小化
をはかることを特徴とする半導体レーザ。1. A plurality of striped branch waveguides are arranged from a connecting portion provided at an intermediate portion of the waveguide toward a first optical end surface and a second optical end surface facing each other, respectively. The branch waveguide is widened toward the connecting portion, and the end portion on the connecting portion side of the branch waveguide on the first optical end face side and the branch waveguide on the second optical end face side, Characterized by strengthening the optical coupling between the branch waveguides and maintaining the spacing for securing the phase locking in the waveguide length direction so that they are spaced from each other, and narrowing the half-width of the far-filled pattern. And a semiconductor laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61243847A JPH0810778B2 (en) | 1986-10-14 | 1986-10-14 | Semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61243847A JPH0810778B2 (en) | 1986-10-14 | 1986-10-14 | Semiconductor laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6396987A JPS6396987A (en) | 1988-04-27 |
| JPH0810778B2 true JPH0810778B2 (en) | 1996-01-31 |
Family
ID=17109835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61243847A Expired - Fee Related JPH0810778B2 (en) | 1986-10-14 | 1986-10-14 | Semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0810778B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220029388A1 (en) * | 2018-09-19 | 2022-01-27 | Osram Oled Gmbh | Gain-guided semiconductor laser and method of manufacturing the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6070147B2 (en) * | 2012-12-14 | 2017-02-01 | 三菱電機株式会社 | Semiconductor laser diode |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5681993A (en) * | 1979-12-10 | 1981-07-04 | Hitachi Ltd | Semiconductor laser element |
| JPS61164292A (en) * | 1985-01-16 | 1986-07-24 | Sharp Corp | Semiconductor laser array device |
| JPS62140486A (en) * | 1985-12-13 | 1987-06-24 | Sharp Corp | Semiconductor laser array device |
-
1986
- 1986-10-14 JP JP61243847A patent/JPH0810778B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220029388A1 (en) * | 2018-09-19 | 2022-01-27 | Osram Oled Gmbh | Gain-guided semiconductor laser and method of manufacturing the same |
| US11984704B2 (en) * | 2018-09-19 | 2024-05-14 | Osram Oled Gmbh | Gain-guided semiconductor laser and method of manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6396987A (en) | 1988-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |