JPH0811287B2 - Electromagnetic pouring device - Google Patents
Electromagnetic pouring deviceInfo
- Publication number
- JPH0811287B2 JPH0811287B2 JP22295086A JP22295086A JPH0811287B2 JP H0811287 B2 JPH0811287 B2 JP H0811287B2 JP 22295086 A JP22295086 A JP 22295086A JP 22295086 A JP22295086 A JP 22295086A JP H0811287 B2 JPH0811287 B2 JP H0811287B2
- Authority
- JP
- Japan
- Prior art keywords
- molten metal
- electromagnetic pump
- container
- electromagnetic
- thrust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 230000000694 effects Effects 0.000 claims description 11
- 230000006698 induction Effects 0.000 claims description 3
- 230000007423 decrease Effects 0.000 description 8
- 230000003321 amplification Effects 0.000 description 6
- 238000003199 nucleic acid amplification method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Casting Support Devices, Ladles, And Melt Control Thereby (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、容器内に蓄積された溶湯(例えば、鉄を主
成分として高価な添加剤を加えた高価な溶湯)を、加熱
器の温度低下補償のもとに、容器側底部より斜め上方に
延びる電磁ポンプの作用により定量供給する電磁注湯装
置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to the temperature of a heater when the molten metal accumulated in a container (for example, an expensive molten metal containing iron as a main component and an expensive additive is added) is used. The present invention relates to an electromagnetic pouring device that supplies a fixed amount by the action of an electromagnetic pump that extends obliquely upward from the bottom portion on the container side under compensation for deterioration.
[従来技術] 一般に、電磁注湯装置の制御部を除く基本構成は第2
図に示すような構成をなしている。同第2図において1
は溶湯容器で、外部より供給された溶湯2を保有し、当
該容器2の下底部に配置された誘導加熱器3により上記
溶湯2の温度を一定に維持する(この作用は、容器内の
溶湯2の表面温度を一定にするように加熱器3の通電時
間を制御する周知手段により達成できる)。4は電磁ポ
ンプで、溶湯容器1の側底部より斜上方に溶湯2を案内
する耐火管4a及び当該耐火管4a内の溶湯2に斜上方に押
上げる推力をもたらす誘導子4bからなる。[Prior Art] Generally, the basic configuration except the control unit of the electromagnetic pouring device is the second
The configuration is as shown in the figure. In FIG. 2, 1
Is a molten metal container, which holds the molten metal 2 supplied from the outside, and keeps the temperature of the molten metal 2 constant by an induction heater 3 arranged at the bottom of the container 2 (this action is performed by the molten metal in the container). This can be achieved by known means for controlling the energization time of the heater 3 so that the surface temperature of 2 becomes constant). Reference numeral 4 denotes an electromagnetic pump, which comprises a refractory tube 4a for guiding the molten metal 2 obliquely upward from the side bottom of the molten metal container 1 and an inductor 4b for providing thrust to the molten metal 2 in the refractory tube 4a obliquely upward.
上記構成において、電磁ポンプ誘導子4bの縦端効果に
基づく吸力低下が生ずる構成(誘電子4bの長さLに対し
てほぼ下方よりL/3の領域)までの範囲で溶湯の定量供
給を行い、溶湯2を容器1に補給して定量供給を行って
いた。In the above configuration, a fixed amount of molten metal is supplied within a range up to a configuration (a region L / 3 below the length L relative to the length L of the dielectric 4b) in which the suction force is reduced due to the vertical end effect of the electromagnetic pump inductor 4b. The molten metal 2 was replenished to the container 1 for constant quantity supply.
[発明が解決しようとする問題点] 上記従来の溶湯定量供給は、溶湯の補給、注湯を繰返
している過程は問題ないにしても、残湯量がかなりの量
に達し、例えば夜間の操業停止時に残湯の保温に際し
て、かなりの電力を要することになるとともに溶湯補給
回数が増し、作業能率が低下する欠点があった。[Problems to be Solved by the Invention] In the above-mentioned conventional fixed amount of molten metal supply, even though there is no problem in the process of repeatedly supplying and pouring molten metal, the amount of remaining molten metal reaches a considerable amount, and for example, operation is stopped at night. At the time of keeping the temperature of the residual hot water, a considerable amount of electric power is required and the number of times of replenishment of the molten metal is increased, resulting in a decrease in work efficiency.
[問題点を解決するための手段] 本発明は、溶湯容器からの溶湯の定量供給を電磁ポン
プ誘導子の端効果発生領域まで継続する制御手段を要旨
とする。[Means for Solving Problems] The gist of the present invention is a control means for continuing the constant supply of the molten metal from the molten metal container to the end effect generation region of the electromagnetic pump inductor.
[作用] 電磁ポンプ用誘導子の端効果発生領域にまで容器内の
保有溶湯が減少した時点より端効果に応じた推力減少を
補償すべく電力供給量の増加率を増す。[Operation] The increase rate of the power supply amount is increased to compensate for the thrust decrease corresponding to the end effect from the time when the molten metal held in the container decreases to the end effect generation region of the electromagnetic pump inductor.
[実施例] 以下、第1図に示す制御回路について具体的に説明す
る。同第1図において11はポテンショメータで、容器1
内の溶湯レベルに応じた出力(溶湯レベルが高いときは
出力小で、溶湯レベルが低くなるに従って出力を増す)
を供給する。12は増幅器で、その入出力側に接続される
抵抗値によって増幅度が変化する。13は電力制御回路
で、上記増幅器12からの入力によって供給電力を制御
(サイリスタの位相制御)し、誘導子4bに電力を供給す
る。14、15はコンパレータで、それぞれ上記ポテンショ
メータ11より入力を得て、例えば、入力0〜5Vにおい
て、コンパレータ14は3Vにて反転し、コンパレータ15は
4Vにて反転するように設定(入力3Vにて電磁ポンプ用誘
電子4bの端効果発生と設定)する。16、17はリレーでそ
れぞれコンパレータ14、15からの出力を得て励磁され
る。R1、R2、R3、R4は抵抗器、16aはリレー16のA接
点、16bはリレー16のB接点、17aはリレー17のA接点、
17b1、17b2はリレー17のB接点で、図示のとうりに接続
される。[Embodiment] The control circuit shown in FIG. 1 will be specifically described below. In FIG. 1, 11 is a potentiometer, which is a container 1
Output according to the molten metal level inside (the output is small when the molten metal level is high, and increases as the molten metal level decreases)
Supply. Reference numeral 12 is an amplifier, the amplification degree of which changes depending on the resistance value connected to the input / output side. Reference numeral 13 denotes a power control circuit, which controls the power supplied by the input from the amplifier 12 (phase control of the thyristor) and supplies the power to the inductor 4b. Reference numerals 14 and 15 denote comparators, which receive inputs from the potentiometer 11 respectively. For example, at inputs 0 to 5V, the comparator 14 is inverted at 3V, and the comparator 15 is
Set to invert at 4V (set to generate the edge effect of the electromagnetic pump inductor 4b at 3V input). The relays 16 and 17 are excited by the outputs from the comparators 14 and 15, respectively. R 1 , R 2 , R 3 , and R 4 are resistors, 16a is an A contact of the relay 16, 16b is a B contact of the relay 16, 17a is an A contact of the relay 17,
17b 1 and 17b 2 are B contacts of the relay 17, which are connected as shown in the drawing.
上記構成において、その作用を第3図(容器内の溶湯
レベルL−電磁ポンプへの供給電力Wとの関係図)に基
づいて説明する。まず、容器1内に溶湯2が容器1一杯
に満たされている状態(溶湯レベルL0)では、ポテンシ
ョメータ11の出力はごく僅かな出力にて増幅器12は抵抗
器R1、R2とで定まる増幅率にて電力供給回路13を制御
(このときの電磁ポンプへの供給電力W0とする)し、電
磁ポンプ4より注湯を開始する。この過程において、容
器1内の溶湯レベルが低下していくと、これに応じてポ
テンショメータ11の出力は増していく。これに伴って電
力供給回路13内のサイリスタの導通時間を長くすること
により電磁ポンプ用誘電子4bへの電力をほぼ一定の増幅
率にて増していく。The operation of the above-described structure will be described with reference to FIG. 3 (a relationship diagram between the molten metal level L in the container and the electric power W supplied to the electromagnetic pump). First, in a state where the molten metal 2 is fully filled in the container 1 (molten metal level L 0 ), the output of the potentiometer 11 is very small and the amplifier 12 is determined by the resistors R 1 and R 2. The power supply circuit 13 is controlled by the amplification factor (supplied power W 0 to the electromagnetic pump at this time), and pouring is started from the electromagnetic pump 4. In this process, as the molten metal level in the container 1 decreases, the output of the potentiometer 11 correspondingly increases. Along with this, by increasing the conduction time of the thyristor in the power supply circuit 13, the power to the electromagnetic pump inductor 4b is increased at a substantially constant amplification factor.
今、注湯過程において、容器1内の溶湯レベルがL1に
達したときポテンショメータ11の出力が3Vに増加(この
ときから端効果により電磁ポンプの推力低下)にて電磁
ポンプへの入力W1とすると、コンパレータ14からの出力
が得られる。これに伴い、リレー16が作動し、当該リレ
ー16のA接点16aが閉路すると同時に、B接点16bが開路
する。従って、増幅器12の増幅率は抵抗R1、R3で定まる
増幅率(従前より増幅率大)にて電磁ポンプ4のコイル
4bへの入力を増し、電磁ポンプ4の推力を増加させる。Now, in the pouring process, when the molten metal level in the container 1 reaches L 1 , the output of the potentiometer 11 increases to 3V (from this time, the thrust of the electromagnetic pump decreases due to the end effect), and the input to the electromagnetic pump W 1 Then, the output from the comparator 14 is obtained. Along with this, the relay 16 operates and the A contact 16a of the relay 16 is closed, and at the same time, the B contact 16b is opened. Therefore, the amplification factor of the amplifier 12 is determined by the resistors R 1 and R 3 (the amplification factor is larger than before) and the coil of the electromagnetic pump 4 is amplified.
The input to 4b is increased and the thrust of the electromagnetic pump 4 is increased.
さらに、容器1内の溶湯2のレベルがL2まで低下して
ポテンショメータ11の出力が増して4Vで、電磁ポンプ4
への入力がW2kWに達すると、コンパレータ14に加えてコ
ンパレータ15からの出力が得られ、リレー17のB接点17
b1、17b2が開路し、A接点17aが閉路する。これによっ
て増幅器12の増幅率は抵抗R1、R4により規制され、溶湯
レベルの一定減少率に対する電磁ポンプ4への供給電力
の増加率を増す。Further, the level of the molten metal 2 in the container 1 is lowered to L 2 and the output of the potentiometer 11 is increased to 4 V, so that the electromagnetic pump 4
When the input to the relay reaches W 2 kW, the output from the comparator 15 is obtained in addition to the comparator 14, and the B contact 17 of the relay 17
b 1 and 17b 2 are opened, and A contact 17a is closed. As a result, the amplification factor of the amplifier 12 is regulated by the resistors R 1 and R 4 , and the increase rate of the power supplied to the electromagnetic pump 4 relative to the constant reduction rate of the molten metal level is increased.
なお、上記実施例においては、容器内の溶湯レベルが
電磁ポンプ4の端効果に基づく推力低下を来すときか
ら、推力増強の目的のために電力供給量を増す際2段階
にわたり、電磁ポンプへの供給電力の増加率の変化を持
たした例を示しているが、さほど定量供給の精度を問わ
ない溶湯の定量供給では、1段の制御でも良く、また、
特に高精度を要求する場合には3段以上の特性を持たせ
るようにすればよい。It should be noted that in the above embodiment, since the molten metal level in the container causes the thrust to decrease due to the end effect of the electromagnetic pump 4, the electromagnetic pump is connected to the electromagnetic pump in two stages when the power supply amount is increased for the purpose of increasing the thrust. Although the example in which there is a change in the increase rate of the supply power of is shown, in the fixed amount supply of the molten metal regardless of the accuracy of the fixed amount supply, one-stage control may be used.
In particular, when high accuracy is required, the characteristics of three or more steps may be given.
[効果] 以上述べたように、本発明に係る電磁注湯装置は、容
器側底部より斜上方に延びる電磁ポンプで単位時間当た
りの定量注湯を行うに際して、電磁ポンプの端効果によ
り同一割合の電力供給増では推力が減少する領域に達す
ると、端効果による電磁ポンプの推力減少を補償すべく
電力供給の増加率1ないし複数段に変化させるようにし
たものである。かかる構成に基づいて、溶湯の定量供給
に際して、容器内の残湯量を著しく減少でき、これまで
残湯の廃棄によるロスの減少ないし特に高価な溶湯の保
温エネルギーの減少を図ることができる。[Effect] As described above, in the electromagnetic pouring device according to the present invention, when performing fixed quantity pouring per unit time by the electromagnetic pump extending obliquely upward from the bottom of the container side, the same ratio is obtained due to the end effect of the electromagnetic pump. When the region where the thrust is reduced by increasing the power supply is reached, the increase rate of the power supply is changed to one or a plurality of stages in order to compensate for the thrust decrease of the electromagnetic pump due to the end effect. Based on this configuration, when the molten metal is supplied in a fixed amount, the amount of the residual molten metal in the container can be remarkably reduced, and it is possible to reduce the loss due to the discard of the residual molten metal or the energy for keeping the expensive molten metal.
第1図は本発明の1実施例を示す回路図、第2図は本発
明を実施する装置の断面図、第3図は動作を説明するた
めのグラフである。 1……溶湯容器 2……溶湯 3……誘導加熱器 4……電磁ポンプ 11……ポテンショメータ 12……増幅器 14、15……コンパレータ 16、17……リレーFIG. 1 is a circuit diagram showing one embodiment of the present invention, FIG. 2 is a sectional view of an apparatus for carrying out the present invention, and FIG. 3 is a graph for explaining the operation. 1 …… Molten container 2 …… Molten metal 3 …… Induction heater 4 …… Electromagnetic pump 11 …… Potentiometer 12 …… Amplifier 14, 15 …… Comparator 16, 17 …… Relay
Claims (1)
する誘導加熱器 (C) 上記溶湯容器の側底部より斜上方に向けて配置
され、溶湯の定量供給を担う電磁ポンプ (D) 上記電磁ポンプに対して、その下方部の端効果
に基づく推力低下を来す領域に至るまでは溶湯レベルに
逆比例した電力を供給し、上記推力低下を起す領域から
は溶湯供給可能の範囲内において電力供給増加率を1な
いし複数段階に増して定量供給の維持を図る上記電磁ポ
ンプの電力供給制御手段1. An electromagnetic pouring device (A) a molten metal container (B) having the following items: an induction heater for maintaining the temperature of the molten metal contained in the molten metal container (C) a bottom portion of the molten metal container Electromagnetic pump that is arranged more obliquely upward and is responsible for the constant supply of molten metal (D) Inversely proportional to the level of molten metal until it reaches a region where thrust is reduced due to the end effect of the lower part of the electromagnetic pump. Power supply control means for the electromagnetic pump, which supplies a fixed amount of power to increase the power supply increase rate to one or a plurality of steps within a range where molten metal can be supplied from the region where the thrust is reduced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22295086A JPH0811287B2 (en) | 1986-09-19 | 1986-09-19 | Electromagnetic pouring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22295086A JPH0811287B2 (en) | 1986-09-19 | 1986-09-19 | Electromagnetic pouring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6376750A JPS6376750A (en) | 1988-04-07 |
| JPH0811287B2 true JPH0811287B2 (en) | 1996-02-07 |
Family
ID=16790415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22295086A Expired - Lifetime JPH0811287B2 (en) | 1986-09-19 | 1986-09-19 | Electromagnetic pouring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0811287B2 (en) |
-
1986
- 1986-09-19 JP JP22295086A patent/JPH0811287B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6376750A (en) | 1988-04-07 |
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