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JPH0812281B2 - Light attenuator - Google Patents
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JPH0812281B2 - Light attenuator - Google Patents

Light attenuator

Info

Publication number
JPH0812281B2
JPH0812281B2 JP60252643A JP25264385A JPH0812281B2 JP H0812281 B2 JPH0812281 B2 JP H0812281B2 JP 60252643 A JP60252643 A JP 60252643A JP 25264385 A JP25264385 A JP 25264385A JP H0812281 B2 JPH0812281 B2 JP H0812281B2
Authority
JP
Japan
Prior art keywords
film
attenuation
light
wavelength
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60252643A
Other languages
Japanese (ja)
Other versions
JPS62113107A (en
Inventor
敏 日下
秀樹 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60252643A priority Critical patent/JPH0812281B2/en
Publication of JPS62113107A publication Critical patent/JPS62113107A/en
Publication of JPH0812281B2 publication Critical patent/JPH0812281B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)

Description

【発明の詳細な説明】 〔概 要〕 誘電体多層膜は設計による波長依存性の変更がかなり
自由であるので、これを光減衰膜と組み合わせることに
より、所望の減衰波長特性を有する光減衰板を作成する
ことが可能になる。
DETAILED DESCRIPTION OF THE INVENTION [Outline] Since the dielectric multilayer can change the wavelength dependence by design considerably, by combining this with an optical attenuating film, an optical attenuating plate having a desired attenuating wavelength characteristic can be obtained. It will be possible to create.

〔産業上の利用分野〕[Industrial applications]

本発明は光減衰板、特に波長特性の選択の自由度が大
きい光減衰板に係る。
The present invention relates to an optical attenuating plate, and more particularly to an optical attenuating plate having a large degree of freedom in selecting wavelength characteristics.

〔従来の技術〕[Conventional technology]

光減衰板は光学測定装置その他の光学系において光を
減衰して所期の光量に調整するために用いられ、通常、
ガラス等の基板の表面に金属膜を蒸着し、その厚さを調
整して所望の光減衰量を得ている。
The light attenuating plate is used for attenuating light in an optical measuring device or other optical system to adjust it to a desired light amount, and usually,
A metal film is vapor-deposited on the surface of a substrate such as glass and the thickness thereof is adjusted to obtain a desired light attenuation amount.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

上記の如き光減衰板の特性は金属膜の特性に依存す
る。使用する光の波長帯域が狭い場合には比較的問題は
ないが、広い波長帯域にわたる光を減衰する必要がある
場合には、金属膜の減衰特性が波長に関して必ずしも一
定ではないので、波長によって減衰量が一定でない光が
得られ、用途によっては問題がある。
The characteristics of the light attenuating plate as described above depend on the characteristics of the metal film. There is no problem if the wavelength band of the light used is narrow, but when it is necessary to attenuate the light over a wide wavelength band, the attenuation characteristics of the metal film are not always constant with respect to the wavelength. Light of varying quantity is obtained, which is problematic for some applications.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記問題点を解決するものであり、その基
本構成を第1図に示す。光減衰膜2を被着した基板1の
裏面もしくは同じ面に誘電体多層膜3,4,5,6を形成す
る。なお、図では光減衰膜2の裏面に誘電体多層膜を形
成した場合を示している。
The present invention solves the above problems, and its basic configuration is shown in FIG. Dielectric multilayer films 3, 4, 5 and 6 are formed on the back surface or the same surface of the substrate 1 on which the light attenuation film 2 is applied. The figure shows a case where a dielectric multilayer film is formed on the back surface of the light attenuation film 2.

こうして、本発明は光減衰膜(2,12)を被着した基板
(1,11)からなる光減衰板の該光減衰膜と同一面または
裏面に誘電体多層膜(3,4,5,6;13,14,15,16,17,18)を
形成して、前記光減衰板の減衰−波長依存性をなくしま
たは低減したことを特徴とする光減衰板を提供する。
Thus, according to the present invention, the dielectric multi-layered film (3, 4, 5, 4) is formed on the same surface or the back surface of the light attenuating plate composed of the substrate (1, 11) on which the light attenuating film (2, 12) is adhered. 6; 13,14,15,16,17,18) to eliminate or reduce the attenuation-wavelength dependence of the optical attenuating plate.

〔作 用〕[Work]

誘電体多層膜は反射防止膜その他に用いられているの
で、その特性についてはすでに評価、解明され、誘電体
の種類、膜厚、膜の構成を適当に選択することによって
かなり自由に波長特性を設計できることが知られてい
る。そこで、適当な誘電体多層膜を選択することによっ
て従来の光減衰板の光減衰特性(光透過率特性)の波長
依存性を相殺することが可能である。
Since the dielectric multilayer film is used as an antireflection film and others, its characteristics have already been evaluated and clarified, and the wavelength characteristics can be set quite freely by appropriately selecting the type of dielectric, film thickness, and film structure. It is known that it can be designed. Therefore, it is possible to cancel the wavelength dependence of the light attenuation characteristic (light transmittance characteristic) of the conventional light attenuating plate by selecting an appropriate dielectric multilayer film.

〔実施例〕〔Example〕

第1図は本発明の実施例をなす10dB光減衰板を示す。
同図中、1はガラス基板、2はチタン膜、3と5はTiO2
膜、4と6はSiO2膜である。膜厚はチタン膜2が約50n
m、そして誘電体多層膜が設計中心波長λ=800nmのλ/4
=1.00で規格化してそれぞれTiO2膜が0.216,SiO2膜4が
0.331,TiO2膜5が1.848,SiO2膜6が0.864である。ガラ
ス基板1は厚さ0.5〜1mm程度である。
FIG. 1 shows a 10 dB optical attenuating plate which constitutes an embodiment of the present invention.
In the figure, 1 is a glass substrate, 2 is a titanium film, and 3 and 5 are TiO 2.
The films 4, 4 and 6 are SiO 2 films. Titanium film 2 is about 50n
m, and the dielectric multilayer film is λ / 4 with the design center wavelength λ = 800 nm
= 1.00, the TiO 2 film is 0.216 and the SiO 2 film 4 is
0.331, TiO 2 film 5 is 1.848, and SiO 2 film 6 is 0.864. The glass substrate 1 has a thickness of about 0.5 to 1 mm.

この光減衰板を製造するに当っては、ガラス基板(BK
−7)1の両表面を研磨および洗浄後、電子ビーム蒸着
装置を用いて、ガラス基板1の一面にチタン膜2を堆積
して10dB光減衰膜とし、次いで光減衰膜と反対側表面に
TiO2膜3,SiO2膜4,TiO2膜5,SiO2膜6を順に堆積して誘電
体多層膜を形成する。この誘電体多層膜は光減衰膜の上
に形成してもよく、また逆に誘電体多層膜上に光減衰膜
を形成してもよい。
The glass substrate (BK
-7) After polishing and cleaning both surfaces of 1, a titanium film 2 was deposited on one surface of the glass substrate 1 to form a 10 dB optical attenuation film by using an electron beam evaporation apparatus, and then on the surface opposite to the optical attenuation film.
The TiO 2 film 3, the SiO 2 film 4, the TiO 2 film 5, and the SiO 2 film 6 are sequentially deposited to form a dielectric multilayer film. This dielectric multilayer film may be formed on the light attenuating film, or conversely, the light attenuating film may be formed on the dielectric multilayer film.

このような光減衰膜の減衰特性を評価するには、特定
波長の光を光減衰板を通した場合と通さない場合の受光
強度を比較し、かつ波長を連続的に変えることによって
行なうことができる。
In order to evaluate the attenuation characteristics of such a light attenuating film, it is necessary to compare the received light intensity with and without passing the light of a specific wavelength through the light attenuating plate and to change the wavelength continuously. it can.

第2図は、第1図と同じようにガラス基板上にチタン
膜を形成し、但し誘電体多層膜をその後形成しない従来
通りの光減衰板について減衰−波長依存特性を調べたも
のである。第2図に見られるように波長の増加とともに
ロスが減少し、波長1300nmでは、設計波長800〜850nm付
近に対して0.5dBの減少となる。このようなロスの波長
依存性は使用目的によっては決して無視できないもので
ある。
FIG. 2 shows the results of examining the attenuation-wavelength dependence characteristics of a conventional optical attenuating plate in which a titanium film is formed on a glass substrate similarly to FIG. 1, but a dielectric multilayer film is not subsequently formed. As shown in Fig. 2, the loss decreases as the wavelength increases, and at the wavelength of 1300 nm, it decreases by 0.5 dB at around the design wavelength of 800 to 850 nm. Such wavelength dependence of loss cannot be ignored depending on the purpose of use.

第2図を見ると、チタン膜の減衰(ロス)の波長依存
性は800nm〜1300nmの波長領域において僅かに波こそ打
っているがほぼ単調に減小しつづけている。第3図は第
1図に関連して説明した誘電体多層膜の減衰特性を示し
ているが、波長800nm〜1300nmに関してほぼ単調に減衰
量(ロス)が増加している。そこで、この誘電体多層膜
を前記のチタン膜と組み合わせて使用すれば、波長800n
m〜1300nmにおける減衰特性を波長に依存せずほぼ一定
にすることが可能になると考えられる。
As shown in FIG. 2, the wavelength dependence of the attenuation (loss) of the titanium film is slightly wavy in the wavelength region of 800 nm to 1300 nm, but it is decreasing almost monotonically. FIG. 3 shows the attenuation characteristics of the dielectric multilayer film described with reference to FIG. 1, but the attenuation amount (loss) increases almost monotonically with wavelengths of 800 nm to 1300 nm. Therefore, if this dielectric multilayer film is used in combination with the above titanium film,
It is considered that the attenuation characteristic at m to 1300 nm can be made almost constant without depending on the wavelength.

第4図は、このような考えに基づいて作成した、第1
図に示した光減衰板の減衰−波長依存特性である。同図
から、波長700nm〜1300nmにおいてほぼ一定の減衰特性
が達成されていることが見られる。
Fig. 4 shows the first diagram, which was created based on this idea.
It is the attenuation-wavelength dependence characteristic of the optical attenuating plate shown in the figure. From the figure, it can be seen that almost constant attenuation characteristics are achieved in the wavelength range of 700 nm to 1300 nm.

第5図は本発明の別の実施例をなす20dB光減衰板を示
す。同図中、11はガラス基板、12はチタン膜、13〜18は
6層からなる誘電体多層膜であり、13,15,17がTiO2膜、
14,16,18がSiO2膜である。膜厚は、チタン膜12が約100n
mであり、誘電体多層膜は設計中心波長λ=850nmのλ/4
=1.00で規格化してそれぞれTiO2膜13が0.20,SiO2膜14
が0.33,TiO2膜15が1.80,SiO2膜16が1.85,TiO2膜17が1.4
0,SiO2膜18が0.85である。ガラス基板11は厚さ0.5〜1mm
程度である。
FIG. 5 shows a 20 dB optical attenuating plate which is another embodiment of the present invention. In the figure, 11 is a glass substrate, 12 is a titanium film, 13-18 are dielectric multilayer films consisting of 6 layers, 13, 15, 17 are TiO 2 films,
14, 16 and 18 are SiO 2 films. The thickness of titanium film 12 is about 100n
m, and the dielectric multilayer film has a design center wavelength λ = 850 nm λ / 4
= 1.00, the TiO 2 film 13 is 0.20 and the SiO 2 film 14 is
Is 0.33, the TiO 2 film 15 is 1.80, the SiO 2 film 16 is 1.85, and the TiO 2 film 17 is 1.4.
0, the SiO 2 film 18 is 0.85. Glass substrate 11 has a thickness of 0.5-1 mm
It is a degree.

この光減衰板は、第1図の光減衰板と同様の手法で作
成することができる。
This light attenuating plate can be manufactured by the same method as the light attenuating plate of FIG.

この光減衰膜についても第1図の光減衰板の場合と同
様の手法で減衰特性を評価した場合の結果を第6図〜第
8図に示す。
The results of evaluating the attenuation characteristics of this light attenuating film by the same method as in the case of the light attenuating plate of FIG. 1 are shown in FIGS. 6 to 8.

第6図および第8図の・印は誘電体多層膜を適用しな
い従来の20dB光減衰板の光減衰特性の波長依存性を示
す。この光減衰板は850nmを設計中心波長としている
が、波長700nmから波長の増加とともに減衰(ロス)が
減少し、波長1400nmでは波長700nmに対して4.5dBの減衰
の減少が認められる。第7図は第5図に示した6層から
なる誘電体多層膜の減衰特性であるが、波長700nm〜140
0nmにおいて減衰はほぼ単調に増加する傾向がみられ
る。そして、第8図の○印は第7図の減衰特性を有する
誘電体多層膜を第6図の減衰特性を有する20dB光減衰板
に適用した場合の最終的な減衰特性すなわち第5図の光
減衰板の減衰特性である。こうして誘電体多層膜を適用
することにより、波長700nm〜1400nmにおいて減衰が4.5
dBから1.5dBに減少していることが認められる。
6 and 8 indicate the wavelength dependence of the optical attenuation characteristic of the conventional 20 dB optical attenuating plate to which the dielectric multilayer film is not applied. Although this optical attenuator has a design center wavelength of 850 nm, the attenuation (loss) decreases with increasing wavelength from 700 nm, and at 1400 nm, a decrease of 4.5 dB is observed with respect to 700 nm. FIG. 7 shows the attenuation characteristics of the dielectric multilayer film composed of 6 layers shown in FIG.
At 0 nm, the attenuation tends to increase almost monotonically. The circles in FIG. 8 indicate the final attenuation characteristics when the dielectric multilayer film having the attenuation characteristics in FIG. 7 is applied to the 20 dB optical attenuating plate having the attenuation characteristics in FIG. 6, that is, the light in FIG. It is the damping characteristic of the damping plate. By applying the dielectric multi-layer film in this way, the attenuation is 4.5 at wavelengths of 700 nm to 1400 nm.
It can be seen that it has decreased from dB to 1.5 dB.

〔発明の効果〕〔The invention's effect〕

本発明により、光減衰板の減衰の波長依存性を補正し
た光減衰板を作成することが可能である。こうして、本
発明の光減衰板は広い波長範囲を使用する光学系におい
て使用でき、非常に有用である。
According to the present invention, it is possible to create a light attenuating plate in which the wavelength dependence of the attenuation of the light attenuating plate is corrected. Thus, the light attenuating plate of the present invention can be used in an optical system using a wide wavelength range and is very useful.

【図面の簡単な説明】[Brief description of drawings]

第1図は実施例の10dB光減衰板の模式断面図、第2図は
従来の10dB光減衰板の減衰特性を表わすグラフ図、第3
図は補正用誘電体多層膜の減衰特性を表わすグラフ図、
第4図は実施例の10dB光減衰板の減衰特性を表わすグラ
フ図、第5図は別の実施例の20dB光減衰板の模式断面
図、第6図は従来の20dB光減衰板の減衰特性を表わすグ
ラフ図、第7図は補正用誘電体多層膜の減衰特性を表わ
すグラフ図、第8図は第5図の実施例および従来例の20
dB光減衰板の減衰特性を表わすグラフ図である。 1……ガラス基板、11……ガラス板、 2……チタン膜、12…… 3,5……TiO2膜、13,15,17……TiO2膜、 4,6……SiO2膜、14,16,18……SiO2膜。
FIG. 1 is a schematic sectional view of a 10 dB optical attenuating plate of the embodiment, FIG. 2 is a graph showing the attenuation characteristics of a conventional 10 dB optical attenuating plate, and FIG.
The figure is a graph showing the attenuation characteristics of the correction dielectric multilayer film.
FIG. 4 is a graph showing the attenuation characteristic of the 10 dB optical attenuating plate of the embodiment, FIG. 5 is a schematic sectional view of the 20 dB optical attenuating plate of another embodiment, and FIG. 6 is the attenuation characteristic of the conventional 20 dB optical attenuating plate. FIG. 7 is a graph showing the attenuation characteristics of the correction dielectric multilayer film, and FIG. 8 is the graph of the embodiment of FIG.
It is a graph showing the attenuation characteristic of the dB optical attenuating plate. 1 …… glass substrate, 11 …… glass plate, 2 …… titanium film, 12 …… 3,5 …… TiO 2 film, 13,15,17 …… TiO 2 film, 4,6 …… SiO 2 film, 14,16,18 …… SiO 2 film.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】光減衰膜(2,12)を被着した基板(1,11)
からなる光減衰板の該光減衰膜と同一面または裏面に誘
電体多層膜(3,4,5,6;13,14,15,16,17,18)を形成し
て、前記光減衰板の減衰−波長依存性をなくしまたは低
減したことを特徴とする光減衰板。
1. A substrate (1,11) coated with an optical attenuation film (2,12).
A dielectric multi-layered film (3,4,5,6; 13,14,15,16,17,18) is formed on the same surface or the back surface of the light attenuating plate made of Attenuation-wavelength dependence is eliminated or reduced.
JP60252643A 1985-11-13 1985-11-13 Light attenuator Expired - Fee Related JPH0812281B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60252643A JPH0812281B2 (en) 1985-11-13 1985-11-13 Light attenuator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60252643A JPH0812281B2 (en) 1985-11-13 1985-11-13 Light attenuator

Publications (2)

Publication Number Publication Date
JPS62113107A JPS62113107A (en) 1987-05-25
JPH0812281B2 true JPH0812281B2 (en) 1996-02-07

Family

ID=17240203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60252643A Expired - Fee Related JPH0812281B2 (en) 1985-11-13 1985-11-13 Light attenuator

Country Status (1)

Country Link
JP (1) JPH0812281B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3829962B2 (en) 1998-01-22 2006-10-04 富士通株式会社 Optical attenuator, system including the optical attenuator, optical amplifier, and terminal device
US7308185B2 (en) 2004-12-13 2007-12-11 Asml Holding N.V. Ultra-thin high-precision glass optic
JP4552733B2 (en) * 2005-03-31 2010-09-29 ソニー株式会社 Screen and manufacturing method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5932965Y2 (en) * 1979-01-19 1984-09-14 横河電機株式会社 optical interference filter
JPS57144504A (en) * 1981-03-02 1982-09-07 Murakami Kaimeidou:Kk Reflector for car
JPS58128401U (en) * 1982-02-23 1983-08-31 日本電気株式会社 light attenuation plate
JPS6015604A (en) * 1983-07-07 1985-01-26 Nippon Soken Inc Reflection mirror for automobile
JPS60154902U (en) * 1984-03-26 1985-10-16 富士通株式会社 light attenuation plate

Also Published As

Publication number Publication date
JPS62113107A (en) 1987-05-25

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