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JPH0812808B2 - Method of manufacturing voltage non-linear resistor - Google Patents
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JPH0812808B2 - Method of manufacturing voltage non-linear resistor - Google Patents

Method of manufacturing voltage non-linear resistor

Info

Publication number
JPH0812808B2
JPH0812808B2 JP63286885A JP28688588A JPH0812808B2 JP H0812808 B2 JPH0812808 B2 JP H0812808B2 JP 63286885 A JP63286885 A JP 63286885A JP 28688588 A JP28688588 A JP 28688588A JP H0812808 B2 JPH0812808 B2 JP H0812808B2
Authority
JP
Japan
Prior art keywords
resistance layer
compound
voltage non
linear resistor
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63286885A
Other languages
Japanese (ja)
Other versions
JPH02133902A (en
Inventor
今井  修
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP63286885A priority Critical patent/JPH0812808B2/en
Publication of JPH02133902A publication Critical patent/JPH02133902A/en
Publication of JPH0812808B2 publication Critical patent/JPH0812808B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Thermistors And Varistors (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は酸化亜鉛を主成分とする電圧非直線抵抗体の
製造方法に関するものである。
TECHNICAL FIELD The present invention relates to a method for producing a voltage nonlinear resistor containing zinc oxide as a main component.

(従来の技術) 従来から酸化亜鉛を主成分としBi2O3,Sb2O3,SiO2
CO2O3,MnO2等の少量の添加物を含有した抵抗体は、優
れた電圧非直線性を示すことが広く知られており、その
性質を利用して避雷器等に使用されている。
(Prior art) Bi 2 O 3 , Sb 2 O 3 , SiO 2 , mainly containing zinc oxide,
It is widely known that resistors containing a small amount of additives such as CO 2 O 3 and MnO 2 exhibit excellent voltage non-linearity, and the properties thereof are used for lightning arresters and the like.

この電圧非直線抵抗体では、雷等のサージ電流が素子
に印加された場合に主として素子側面に沿った放電いわ
ゆる沿面放電が生じ素子が破壊することがあるため、円
周側面にBi−Sb−Si系化合物またはBi−Sb−Si−Zn系化
合物よりなる高抵抗層を設けるのが一般的である。
In this voltage non-linear resistor, when a surge current such as lightning is applied to the element, discharge may occur mainly along the side surface of the element, so-called creeping discharge may occur, and the element may be destroyed, so Bi-Sb- It is common to provide a high resistance layer made of a Si-based compound or a Bi-Sb-Si-Zn-based compound.

(発明が解決しようとする課題) このうち、Si成分は高抵抗層中にケイ酸亜鉛を生成
し、雷サージ耐量向上に効果がある。しかしながら、従
来はSi成分付与として結晶質のSiO2等を粉砕せずそのま
ま使用していたため粒度も粗く、連続的に均一に生成し
てはじめてその効果のあるケイ酸亜鉛相が不均一に生成
する場合があった。そのような場合は、雷サージ耐量も
向上せずそのバラツキが大となるとともに、側面高抵抗
層も吸湿を示し長期信頼性に欠ける等良好な特性を有す
る電圧非直線抵抗体を得られない問題があった。
(Problems to be Solved by the Invention) Of these, the Si component produces zinc silicate in the high-resistance layer and is effective in improving the lightning surge withstand capability. However, conventionally, crystalline SiO 2 or the like was used as it was without crushing as a Si component addition, so that the particle size is coarse, and the zinc silicate phase, which is effective, is not uniformly generated until it is continuously and uniformly generated. There were cases. In such a case, the lightning surge withstand capability will not be improved and its variation will be large, and the side surface high resistance layer will also absorb moisture, and it will not be possible to obtain a voltage nonlinear resistor with good characteristics such as lack of long-term reliability. was there.

本発明の目的は上述した課題を解消して、雷サージ耐
量の向上が可能でそのバラツキも少ないとともに側面高
抵抗層の吸湿性をも改善できる電圧非直線抵抗体の製造
方法を提供しようとするものである。
An object of the present invention is to solve the above-mentioned problems, and to provide a method of manufacturing a voltage non-linear resistor capable of improving the lightning surge withstand capability, having less variation, and improving the hygroscopicity of the lateral high-resistance layer. It is a thing.

(課題を解決するための手段) 本発明の電圧非直線抵抗体の製造方法は、酸化亜鉛を
主成分とする電圧非直線抵抗体の側面に、少なくともケ
イ素化合物、アンチモン化合物、ビスマス化合物よりな
る側面高抵抗層用の混合物を塗布し次いで焼成する電圧
非直線抵抗体の製造方法において、前記混合物中のケイ
素化合物が非晶質シリカであり、その平均粒径が9.5μ
m以下であることを特徴とするものである。
(Means for Solving the Problems) A method of manufacturing a voltage non-linear resistor according to the present invention comprises a side surface of a voltage non-linear resistor containing zinc oxide as a main component and a side surface including at least a silicon compound, an antimony compound, and a bismuth compound. In the method for producing a voltage non-linear resistor in which a mixture for a high resistance layer is applied and then fired, the silicon compound in the mixture is amorphous silica and its average particle size is 9.5 μm.
It is characterized by being m or less.

(作用) 上述した構成において、本発明者らはSi成分の付与方
法について種々検討した結果、高抵抗層を形成する混合
物中のSi成分として非晶質シリカを使用するとともに、
その平均粒径が9.5μm以下好ましくは6μm以下であ
ると、良好なケイ酸亜鉛相が得られ、その結果後述する
実施例からも明らかなように雷サージ耐量が向上しその
バラツキが減少するとともに、側面高抵抗層の吸湿性も
改善されることを見出した。
(Operation) In the above-mentioned configuration, the present inventors have variously studied the method of applying the Si component, and as a result, using amorphous silica as the Si component in the mixture forming the high resistance layer,
When the average particle size is 9.5 μm or less, preferably 6 μm or less, a good zinc silicate phase is obtained, and as a result, the lightning surge withstand capability is improved and its variation is reduced as will be apparent from the examples described later. It was also found that the hygroscopicity of the side surface high resistance layer is also improved.

なお、非晶質シリカの製造方法については特に限定す
るものではないが、ケイ酸ナトリウムの複分解反応から
得られたものまたは四塩化ケイ素の熱分解により得られ
たものを使用すると、後述する実施例から明らかなよう
により特性が良好になるため好ましい。また、その純度
はSiO2として95%以上であると好ましい。
The method for producing the amorphous silica is not particularly limited, but if the one obtained from the metathesis reaction of sodium silicate or the one obtained by the thermal decomposition of silicon tetrachloride is used, the examples described below are used. As is clear from the above, the characteristics are improved, which is preferable. The purity of SiO 2 is preferably 95% or more.

さらに、側面高抵抗層を形成する混合物としては、非
晶質シリカ、ビスマス化合物、アンチモン化合物をSi
O2,Bi2O3,Sb2O3に換算して、SiO270〜95モル%、好ま
しくは80〜90モル%、Bi2O31〜15モル%、好ましくは
3〜10モル%、Sb2O33〜20モル%、好ましくは5〜15
モル%、必要に応じて亜鉛化合物を外配でZnOに換算し
て150モル%以下好ましくは80モル%以下に添加したし
たものが好ましく、全体の平均粒径が10μm以下である
と好ましい。また、側面高抵抗層の厚さは30〜150μm
であると好ましい。
Further, as a mixture for forming the lateral high-resistance layer, amorphous silica, a bismuth compound, and an antimony compound are used as Si.
In terms of O 2, Bi 2 O 3, Sb 2 O 3, SiO 2 70~95 mol%, preferably 80 to 90 mol%, Bi 2 O 3 1 to 15 mol%, preferably 3 to 10 mol% , Sb 2 O 3 3 to 20 mol%, preferably 5 to 15
It is preferable to add a zinc compound in an amount of 150 mol% or less, preferably 80 mol% or less in terms of ZnO by external distribution, if necessary, in terms of ZnO, and the average particle size of the whole is preferably 10 μm or less. The thickness of the side surface high resistance layer is 30 to 150 μm.
Is preferred.

ここで側面高抵抗層用の混合物の組成として、ビスマ
ス化合物、アンチモン化合物、亜鉛化合物を規定した
が、各化合物とも1000℃以下、好ましくは800℃以下で
酸化物に変化するものであればよい。具体的には酸化
物、炭酸塩、硝酸塩、水酸化物等があげられるが、酸化
物が最も好ましい。
Although a bismuth compound, an antimony compound, and a zinc compound are specified as the composition of the mixture for the lateral high-resistance layer, any compound can be converted into an oxide at 1000 ° C. or lower, preferably 800 ° C. or lower. Specific examples thereof include oxides, carbonates, nitrates and hydroxides, with oxides being most preferred.

(実施例) 酸化亜鉛を主成分とする電圧非直線抵抗体を得るに
は、まず所定の粒度に調整した酸化亜鉛原料と所定の粒
度に調整したBi2O3,CO3O4,MnO2,Sb2O3,Cr2O3,Si
O2,NiO等よりなる添加物の所定量を混合する。この際、
これらの原料粉末に対して所定量のポリビニルアルコー
ル水溶液等を加え、好ましくはディスパーミルにより混
合した後、好ましくはスプレードライヤにより造粒して
造粒物を得る。造粒後、成形圧力800〜1000kg/cm2の下
で所定の形成に成形する。その成形体を昇降温速度50〜
70℃/hrで800〜1000℃保持時間1〜5時間という条件で
仮焼成する。
(Example) In order to obtain a voltage nonlinear resistor containing zinc oxide as a main component, first, a zinc oxide raw material adjusted to a predetermined particle size and Bi 2 O 3 , CO 3 O 4 , MnO 2 adjusted to a predetermined particle size were prepared. , Sb 2 O 3 , Cr 2 O 3 , Si
A predetermined amount of an additive such as O 2 or NiO is mixed. On this occasion,
A predetermined amount of an aqueous polyvinyl alcohol solution or the like is added to these raw material powders, preferably mixed by a disper mill, and then preferably granulated by a spray dryer to obtain a granulated product. After granulation, it is molded into a predetermined shape under a molding pressure of 800 to 1000 kg / cm 2 . The temperature rise / fall rate of the molded body is 50 ~
Preliminary calcination is performed at a temperature of 70 ° C / hr and a holding time of 800 to 1000 ° C for 1 to 5 hours.

なお、仮焼の前に成形体を昇降温速度10〜100℃/hrで
400〜600℃で1〜10時間保持し、結合剤を飛散除去する
ことが好ましい。そして本発明の素体とは成形体を前記
条件で熱処理した脱脂体をいう。
Before calcination, the molded body should be heated / cooled at a rate of 10-100 ° C / hr.
It is preferable to keep the binder at 400 to 600 ° C. for 1 to 10 hours to scatter and remove the binder. The element body of the present invention means a degreased body obtained by heat-treating a molded body under the above conditions.

次に、仮焼成した仮焼体の側面に側面高抵抗層を形成
する。本発明では、ビスマス化合物、アンチモン化合
物、ケイ素化合物等の所定量に有機結合剤としてエチル
セルロース、ブチルカルビトール、酢酸nブチル等を加
えた側面高抵抗層用の混合物ペーストを、60〜300μm
の厚さに仮焼体の側面に塗布する。この際、本発明では
ケイ素化合物として、平均粒径が9.5μm以下の非晶質
シリカを使用する。なお、前記混合物ペーストは素体に
塗布してもよい。次に、これを昇降温速度40〜60℃/hr,
1000〜1300℃好ましくは1100〜1250℃、3〜7時間とい
う条件で本焼成する。なお、ガラス粉末に有機結合剤と
してエチルセルロース、ブチルカルビトール、酢酸nブ
チル等を加えたガラスペーストを前記の側面高抵抗層上
に100〜300μmの厚さに塗布し、空気中で昇降温速度10
0〜200℃/hr、400〜600℃保持時間0.5〜2時間という条
件で熱処理することによりガラス層を形成すると好まし
い。
Next, a side surface high resistance layer is formed on the side surface of the calcined body that has been calcined. In the present invention, a mixture paste for a lateral high-resistance layer having a predetermined amount of a bismuth compound, an antimony compound, a silicon compound, etc., added with ethyl cellulose, butyl carbitol, n-butyl acetate or the like as an organic binder, is 60 to 300 μm
Apply to the side of the calcined body to the thickness of. At this time, in the present invention, as the silicon compound, amorphous silica having an average particle diameter of 9.5 μm or less is used. The mixture paste may be applied to the element body. Next, this is heated / cooled at a temperature of 40-60 ° C / hr,
The main calcination is performed at 1000 to 1300 ° C, preferably 1100 to 1250 ° C for 3 to 7 hours. In addition, a glass paste obtained by adding ethyl cellulose, butyl carbitol, n-butyl acetate, etc. as an organic binder to glass powder is applied on the above-mentioned lateral high-resistance layer to a thickness of 100 to 300 μm, and the temperature rising / falling rate is 10 in air.
It is preferable to form the glass layer by heat treatment under the conditions of 0 to 200 ° C./hr and 400 to 600 ° C. holding time of 0.5 to 2 hours.

その後、得られた電圧非直線抵抗体の両端面をSiC,Al
2O3,ダイヤモンド等の#400〜2000相当の研磨剤により
水好ましくは油を使用して研磨する。次に、研磨面を洗
浄後、研磨した両端面に例えばアルミニウムによって電
極を例えば溶射により設けて電圧非直線抵抗体を得てい
る。
After that, both end surfaces of the obtained voltage nonlinear resistor are
Polishing is carried out with water, preferably oil, with an abrasive corresponding to # 400 to 2000 such as 2 O 3 or diamond. Next, after cleaning the polished surface, electrodes are provided on the polished both end surfaces by, for example, aluminum, for example, by thermal spraying to obtain a voltage nonlinear resistor.

以下、実際に本発明範囲内および範囲外の電圧非直線
抵抗体について各種特性を測定した結果について説明す
る。
Hereinafter, the results of actually measuring various characteristics of the voltage nonlinear resistor within and outside the range of the present invention will be described.

実施例 上述した方法で作成した直径47mm、厚さ20mmの電圧非
直線抵抗体において、側面高抵抗層用の混合物中のケイ
素化合物の状態および平均粒径の影響を調べるため、素
子本体の組成はBi2O31.0モル%、Co3O40.7モル%、MnO2
0.5モル%、Sb2O31.0モル%、Cr2O30.5モル%、NiO0.5
モル%、Al2O30.005モル%、SiO22モル%および残部が
ZnOとしてケイ素化合物として非晶質シリカを使用する
とともに平均粒径が9.5μm以下である本発明範囲内の
試料No.1〜9と、いずれかの点で本発明の範囲を満たさ
ない比較例No.1〜4を準備し、それぞれの雷サージ耐量
破壊率と側面高抵抗層の吸湿性を測定した。ここで、側
面高抵抗層用のケイ素化合物以外の混合物はビスマス化
合物としては平均粒径5μmの酸化ビスマスを、アンチ
モン化合物としては平均粒径3μmの酸化アンチモンを
使用した。また、側面高抵抗層用の混合物はSiO285モル
%、Bi2O35モル%、Sb2O310モル%の三元系とした。使
用したケイ素化合物のうち非晶質シリカについては、第
1図(a)〜(c)の製造方法に従って作成したものを
使用し、第1図(a)に従ったものをA、第1図(b)
に従ったものをB、第1図(c)に従ったものをCと第
1表中に表記した。結果を第1表に示す。
In a voltage nonlinear resistor having a diameter of 47 mm and a thickness of 20 mm prepared by the method described above, in order to investigate the influence of the state and average particle size of the silicon compound in the mixture for the lateral high resistance layer, the composition of the element body was Bi 2 O 3 1.0 mol%, Co 3 O 4 0.7 mol%, MnO 2
0.5 mol%, Sb 2 O 3 1.0 mol%, Cr 2 O 3 0.5 mol%, NiO 0.5
Mol%, Al 2 O 3 0.005 mol%, SiO 2 2 mol% and the balance
Sample Nos. 1 to 9 within the scope of the present invention in which amorphous silica is used as the silicon compound as ZnO and the average particle size is 9.5 μm or less, and Comparative Example No. which does not satisfy the scope of the present invention in any point .1 to 4 were prepared, and the lightning surge withstand destruction rate and the hygroscopicity of the side surface high resistance layer were measured. Here, in the mixture other than the silicon compound for the side surface high resistance layer, bismuth oxide having an average particle size of 5 μm was used as the bismuth compound, and antimony oxide having an average particle size of 3 μm was used as the antimony compound. Mixtures for side high-resistance layer is SiO 2 85 mol%, Bi 2 O 3 5 mole%, and the ternary Sb 2 O 3 10 mol%. Regarding the amorphous silica among the silicon compounds used, those produced according to the manufacturing method of FIGS. 1 (a) to (c) are used, and those according to FIG. 1 (a) are A and FIG. (B)
In Table 1, those according to the above are shown as B, and those according to FIG. 1 (c) are shown as C. The results are shown in Table 1.

第1表において、雷サージ耐量破壊率は、100KA,110K
A,120KAのパルス電流を4/10μsの電流波形で2回印加
た後破壊したものの割合を示した。また、側面高抵抗層
の吸湿性は、素子を蛍光探傷液中に圧力200kg/cm2の状
態で24時間浸漬した後の吸湿状態を検査し、高抵抗層に
滲みのないものを○、滲みの若干あるものを△、滲みの
多いものを×として表示した。
In Table 1, lightning surge withstand destruction rate is 100KA, 110K
The proportion of the pulse currents of A and 120 KA that were destroyed after being applied twice with a current waveform of 4/10 μs is shown. Regarding the hygroscopicity of the side surface high resistance layer, the element was immersed in the fluorescent flaw detection liquid at a pressure of 200 kg / cm 2 for 24 hours, and then the hygroscopic state was inspected. The sample with a small number was marked with Δ, and the sample with a large amount of blurring was marked with x.

第1表の結果から、ケイ素化合物として非晶質シリカ
を使用するとともにその平均粒径を9.5μm以下とした
本発明試料No.1〜9は、いずれかの点で本発明を満足し
ない比較例No.1〜4と比較して、良好な雷サージ耐量と
良好な吸湿性を示すことがわかった。また、本発明の中
でも、非晶質シリカとしてケイ酸ナトリウムの複分解反
応を利用して得たものまたは四塩化ケイ素の熱分解反応
を利用して得たものを使用すると、雷サージ耐量がより
減少し好ましいことがわかる。さらに、ケイ素化合物の
平均粒径については、6μm以下であるとさらに雷サー
ジ耐量破壊率が減少し好ましいことがわかる。
From the results shown in Table 1, the present invention samples Nos. 1 to 9 in which amorphous silica was used as the silicon compound and whose average particle diameter was 9.5 μm or less were comparative examples which did not satisfy the present invention in any respect. It was found that, as compared with Nos. 1 to 4, excellent lightning surge resistance and good hygroscopicity were exhibited. Further, among the present invention, when the one obtained by utilizing the metathesis reaction of sodium silicate as the amorphous silica or the one obtained by utilizing the thermal decomposition reaction of silicon tetrachloride is used, the lightning surge withstand capability is further reduced. It turns out that it is preferable. Further, it is found that the average particle size of the silicon compound is preferably 6 μm or less because the lightning surge withstand breakdown rate is further reduced.

(発明の効果) 以上の説明から明らかなように、本発明の電圧非直線
抵抗体の製造方法によれば、側面高抵抗層用の混合物中
のケイ素化合物の状態および平均粒径を規定することに
より、良好でバラツキも少ない雷サージ耐量を有すると
ともに側面高抵抗層の吸湿性も改善された電圧非直線抵
抗体を得ることができる。
(Effects of the Invention) As is clear from the above description, according to the method for producing a voltage non-linear resistor of the present invention, the state and average particle size of the silicon compound in the mixture for the lateral high-resistance layer should be defined. As a result, it is possible to obtain a voltage non-linear resistor having good lightning surge withstand capability and less variation, and having improved moisture absorption of the side surface high resistance layer.

また、開閉サージ耐量、課電寿命、制限電圧について
も良好な特性が確認された。
In addition, good characteristics were confirmed with respect to switching surge withstand capability, voltage application life, and limiting voltage.

【図面の簡単な説明】[Brief description of drawings]

第1図(a)〜(c)はそれぞれ本発明で使用する非晶
質シリカの製造方法の一例を示すフローチャートであ
る。
1 (a) to 1 (c) are flow charts showing an example of a method for producing amorphous silica used in the present invention.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】酸化亜鉛を主成分とする電圧非直線抵抗体
の側面に、少なくともケイ素化合物、アンチモン化合
物、ビスマス化合物よりなる側面高抵抗層用の混合物を
塗布し次いで焼成する電圧非直線抵抗体の製造方法にお
いて、前記混合物中のケイ素化合物が非晶質シリカであ
り、その平均粒径が9.5μm以下であることを特徴とす
る電圧非直線抵抗体の製造方法。
1. A voltage non-linear resistor in which a mixture of at least a silicon compound, an antimony compound and a bismuth compound for a side surface high resistance layer is applied to the side surface of a voltage non-linear resistor containing zinc oxide as a main component and then fired. 5. The method for producing a voltage non-linear resistor according to item 2, wherein the silicon compound in the mixture is amorphous silica and the average particle size is 9.5 μm or less.
JP63286885A 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor Expired - Lifetime JPH0812808B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63286885A JPH0812808B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63286885A JPH0812808B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

Publications (2)

Publication Number Publication Date
JPH02133902A JPH02133902A (en) 1990-05-23
JPH0812808B2 true JPH0812808B2 (en) 1996-02-07

Family

ID=17710261

Family Applications (1)

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JP63286885A Expired - Lifetime JPH0812808B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

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JP2020119935A (en) * 2019-01-21 2020-08-06 パナソニックIpマネジメント株式会社 Multilayer varistor and manufacturing method thereof

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