JPH0813773B2 - Method for producing 2-chloropropionaldehyde - Google Patents
Method for producing 2-chloropropionaldehydeInfo
- Publication number
- JPH0813773B2 JPH0813773B2 JP62165439A JP16543987A JPH0813773B2 JP H0813773 B2 JPH0813773 B2 JP H0813773B2 JP 62165439 A JP62165439 A JP 62165439A JP 16543987 A JP16543987 A JP 16543987A JP H0813773 B2 JPH0813773 B2 JP H0813773B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- reaction
- rhodium
- chloropropionaldehyde
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- UAARVZGODBESIF-UHFFFAOYSA-N 2-chloropropanal Chemical compound CC(Cl)C=O UAARVZGODBESIF-UHFFFAOYSA-N 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 44
- 239000002253 acid Substances 0.000 claims description 30
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 21
- 150000002903 organophosphorus compounds Chemical class 0.000 claims description 19
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 18
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- 239000001257 hydrogen Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 150000003284 rhodium compounds Chemical class 0.000 claims description 13
- 150000001735 carboxylic acids Chemical class 0.000 claims description 5
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 3
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical compound OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 claims description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 239000007789 gas Substances 0.000 description 19
- 239000010948 rhodium Substances 0.000 description 19
- 239000003054 catalyst Substances 0.000 description 17
- 229910052703 rhodium Inorganic materials 0.000 description 17
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 16
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 16
- 239000007788 liquid Substances 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 13
- 239000010410 layer Substances 0.000 description 10
- -1 nitrogen-containing compound Chemical class 0.000 description 10
- 229960005215 dichloroacetic acid Drugs 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 150000007513 acids Chemical class 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 239000007810 chemical reaction solvent Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 150000003003 phosphines Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 2
- LULAYUGMBFYYEX-UHFFFAOYSA-N 3-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 125000000000 cycloalkoxy group Chemical group 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- SIEILFNCEFEENQ-UHFFFAOYSA-N dibromoacetic acid Chemical compound OC(=O)C(Br)Br SIEILFNCEFEENQ-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910003450 rhodium oxide Inorganic materials 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- BDDWSAASCFBVBK-UHFFFAOYSA-N rhodium;triphenylphosphane Chemical compound [Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 BDDWSAASCFBVBK-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 230000001502 supplementing effect Effects 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- IQVLXQGNLCPZCL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 2,6-bis[(2-methylpropan-2-yl)oxycarbonylamino]hexanoate Chemical compound CC(C)(C)OC(=O)NCCCCC(NC(=O)OC(C)(C)C)C(=O)ON1C(=O)CCC1=O IQVLXQGNLCPZCL-UHFFFAOYSA-N 0.000 description 1
- MTCFGRXMJLQNBG-REOHCLBHSA-N (2S)-2-Amino-3-hydroxypropansäure Chemical compound OC[C@H](N)C(O)=O MTCFGRXMJLQNBG-REOHCLBHSA-N 0.000 description 1
- AFENDNXGAFYKQO-VKHMYHEASA-N (S)-2-hydroxybutyric acid Chemical compound CC[C@H](O)C(O)=O AFENDNXGAFYKQO-VKHMYHEASA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UHFFFAOYSA-N -2,3-Dihydroxypropanoic acid Natural products OCC(O)C(O)=O RBNPOMFGQQGHHO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- MNZAKDODWSQONA-UHFFFAOYSA-N 1-dibutylphosphorylbutane Chemical compound CCCCP(=O)(CCCC)CCCC MNZAKDODWSQONA-UHFFFAOYSA-N 0.000 description 1
- ZSSWXNPRLJLCDU-UHFFFAOYSA-N 1-diethylphosphorylethane Chemical compound CCP(=O)(CC)CC ZSSWXNPRLJLCDU-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- BKYWPNROPGQIFZ-UHFFFAOYSA-N 2,4-dimethylbenzoic acid Chemical compound CC1=CC=C(C(O)=O)C(C)=C1 BKYWPNROPGQIFZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- GAWAYYRQGQZKCR-UHFFFAOYSA-N 2-chloropropionic acid Chemical compound CC(Cl)C(O)=O GAWAYYRQGQZKCR-UHFFFAOYSA-N 0.000 description 1
- CGMMPMYKMDITEA-UHFFFAOYSA-N 2-ethylbenzoic acid Chemical compound CCC1=CC=CC=C1C(O)=O CGMMPMYKMDITEA-UHFFFAOYSA-N 0.000 description 1
- NSTREUWFTAOOKS-UHFFFAOYSA-N 2-fluorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1F NSTREUWFTAOOKS-UHFFFAOYSA-N 0.000 description 1
- SLAMLWHELXOEJZ-UHFFFAOYSA-N 2-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1[N+]([O-])=O SLAMLWHELXOEJZ-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- IQVAERDLDAZARL-UHFFFAOYSA-N 2-phenylpropanal Chemical compound O=CC(C)C1=CC=CC=C1 IQVAERDLDAZARL-UHFFFAOYSA-N 0.000 description 1
- QEYMMOKECZBKAC-UHFFFAOYSA-N 3-chloropropanoic acid Chemical compound OC(=O)CCCl QEYMMOKECZBKAC-UHFFFAOYSA-N 0.000 description 1
- IBFJDBNISOJRCW-UHFFFAOYSA-N 3-methylphthalic acid Chemical compound CC1=CC=CC(C(O)=O)=C1C(O)=O IBFJDBNISOJRCW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UWTATZPHSA-N D-glyceric acid Chemical compound OC[C@@H](O)C(O)=O RBNPOMFGQQGHHO-UWTATZPHSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- KZSNJWFQEVHDMF-BYPYZUCNSA-N L-valine Chemical compound CC(C)[C@H](N)C(O)=O KZSNJWFQEVHDMF-BYPYZUCNSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 description 1
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- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 108010077895 Sarcosine Proteins 0.000 description 1
- MTCFGRXMJLQNBG-UHFFFAOYSA-N Serine Natural products OCC(N)C(O)=O MTCFGRXMJLQNBG-UHFFFAOYSA-N 0.000 description 1
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- 235000011054 acetic acid Nutrition 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 239000012346 acetyl chloride Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
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- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
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- 238000000998 batch distillation Methods 0.000 description 1
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- 239000006227 byproduct Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
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- 229960004106 citric acid Drugs 0.000 description 1
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- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
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- 230000007850 degeneration Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000002283 diesel fuel Substances 0.000 description 1
- RVDJLKVICMLVJQ-UHFFFAOYSA-N diethoxy(phenyl)phosphane Chemical compound CCOP(OCC)C1=CC=CC=C1 RVDJLKVICMLVJQ-UHFFFAOYSA-N 0.000 description 1
- VZEGPPPCKHRYGO-UHFFFAOYSA-N diethoxyphosphorylbenzene Chemical compound CCOP(=O)(OCC)C1=CC=CC=C1 VZEGPPPCKHRYGO-UHFFFAOYSA-N 0.000 description 1
- KTLIMPGQZDZPSB-UHFFFAOYSA-N diethylphosphinic acid Chemical compound CCP(O)(=O)CC KTLIMPGQZDZPSB-UHFFFAOYSA-N 0.000 description 1
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- GOJNABIZVJCYFL-UHFFFAOYSA-N dimethylphosphinic acid Chemical compound CP(C)(O)=O GOJNABIZVJCYFL-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- BEQVQKJCLJBTKZ-UHFFFAOYSA-N diphenylphosphinic acid Chemical compound C=1C=CC=CC=1P(=O)(O)C1=CC=CC=C1 BEQVQKJCLJBTKZ-UHFFFAOYSA-N 0.000 description 1
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- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
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- 238000002474 experimental method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
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- 239000004220 glutamic acid Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- YACKEPLHDIMKIO-UHFFFAOYSA-N methylphosphonic acid Chemical compound CP(O)(O)=O YACKEPLHDIMKIO-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002780 morpholines Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- CGNKSELPNJJTSM-UHFFFAOYSA-N phenylphosphonous acid Chemical compound OP(O)C1=CC=CC=C1 CGNKSELPNJJTSM-UHFFFAOYSA-N 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical compound [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- KXAHUXSHRWNTOD-UHFFFAOYSA-K rhodium(3+);triiodide Chemical compound [Rh+3].[I-].[I-].[I-] KXAHUXSHRWNTOD-UHFFFAOYSA-K 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229940043230 sarcosine Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000004400 serine Nutrition 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229960001367 tartaric acid Drugs 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- KKFOMYPMTJLQGA-UHFFFAOYSA-N tribenzyl phosphite Chemical compound C=1C=CC=CC=1COP(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 KKFOMYPMTJLQGA-UHFFFAOYSA-N 0.000 description 1
- IFXORIIYQORRMJ-UHFFFAOYSA-N tribenzylphosphane Chemical compound C=1C=CC=CC=1CP(CC=1C=CC=CC=1)CC1=CC=CC=C1 IFXORIIYQORRMJ-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- FICPQAZLPKLOLH-UHFFFAOYSA-N tricyclohexyl phosphite Chemical compound C1CCCCC1OP(OC1CCCCC1)OC1CCCCC1 FICPQAZLPKLOLH-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- ZMBHCYHQLYEYDV-UHFFFAOYSA-N trioctylphosphine oxide Chemical compound CCCCCCCCP(=O)(CCCCCCCC)CCCCCCCC ZMBHCYHQLYEYDV-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- QOPBTFMUVTXWFF-UHFFFAOYSA-N tripropyl phosphite Chemical compound CCCOP(OCCC)OCCC QOPBTFMUVTXWFF-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
- 235000014393 valine Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、次の反応式(1) CH2=CHCl+CO+H2→CH3−CHCl−CHO (1) に従った塩化ビニル、一酸化炭素および水素を原料とす
る2−クロロプロピオンアルデヒドの製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to vinyl chloride, carbon monoxide and carbon monoxide according to the following reaction formula (1) CH 2 = CHCl + CO + H 2 → CH 3 -CHCl-CHO (1). The present invention relates to a method for producing 2-chloropropionaldehyde using hydrogen as a raw material.
2−クロロプロピオンアルデヒドは化学品および農医
薬等の有用な中間体として用いることができる。2-Chloropropionaldehyde can be used as a useful intermediate for chemicals and agricultural medicine.
(従来の技術および発明が解決しようとする問題点) 塩化ビニル、一酸化炭素および水素を原料とする2−
クロロプロピオンアルデヒドの製造方法は公知で、例え
ば、フランス特許第1,397,779号やヘルベチカ・キミカ
・アクタ(HELVETICA CHIMICA ACTA)、48巻、第5号、
1151頁〜1157頁に示されている。これらの方法はいずれ
もコバルトカルボニルを触媒として用い、例えば、前記
フランス特許第1,397,779号によれば、反応温度110℃、
反応圧力200気圧の条件下において、90分間反応を行わ
せ、塩化ビニルの転化率57.4%、2−クロロプロピオン
アルデヒドの選択率86.2%の反応成績を得ている。しか
し、これらのコバルトカルボニルを触媒として用いる方
法では、コバルト当りの触媒活性は極めて低く、この為
に、多量のコバルトカルボニルと160〜200気圧という高
い反応圧力を必要とする上に、反応温度75〜125℃のも
とで90〜120分間にわたり反応を行わせる方法がとられ
ている。目的生成物である2−クロロプロピオンアルデ
ヒドは熱的に不安定な物質で、このような反応温度と反
応時間のもとではかなりの割合が逐次反応で消費されて
反応収率を低めるために、この方法は再現性に乏しく、
さらにはこの逐次反応または他の副反応により塩化水素
が副生し、これが反応器の材料を激しく腐食する上にコ
バルトカルボニル触媒と反応して塩化コバルトとなるた
めに触媒の再使用にも支障をきたすという問題点を有し
ている。(Problems to be Solved by Prior Art and Invention) Using vinyl chloride, carbon monoxide and hydrogen as raw materials 2-
Methods for producing chloropropionaldehyde are known, for example, French Patent No. 1,397,779 and HELVETICA CHIMICA ACTA, Volume 48, No. 5,
It is shown on pages 1151 to 1157. All of these methods use cobalt carbonyl as a catalyst, for example, according to the above-mentioned French Patent No. 1,397,779, a reaction temperature of 110 ° C.,
The reaction was carried out for 90 minutes under the reaction pressure of 200 atm, and the reaction results were 54.5% conversion of vinyl chloride and 86.2% selectivity of 2-chloropropionaldehyde. However, in the method of using these cobalt carbonyls as a catalyst, the catalytic activity per cobalt is extremely low. Therefore, a large amount of cobalt carbonyl and a high reaction pressure of 160 to 200 atm are required, and the reaction temperature of 75 to The method is such that the reaction is carried out at 125 ° C for 90 to 120 minutes. The target product, 2-chloropropionaldehyde, is a thermally unstable substance, and in order to reduce the reaction yield by consuming a considerable proportion in the sequential reaction under such reaction temperature and reaction time, This method has poor reproducibility,
Further, hydrogen chloride is by-produced by this sequential reaction or other side reaction, which corrodes the material of the reactor violently and reacts with the cobalt carbonyl catalyst to form cobalt chloride, which hinders the reuse of the catalyst. It has a problem that it brings it.
本発明者等は、これらの改良法として、特開昭61−12
6046号、特開昭62−10038号、特開昭62−22738号及び特
開昭62−96444号に示す様に塩化ビニル、一酸化炭素お
よび水素とを、ロジウム化合物、塩基及び水の存在下に
反応させる方法を見出している。この方法によると、従
来のコバルトカルボニル触媒を用いる方法にくらべ、よ
り低温・低圧下で反応が進行し、かつ、充分な目的生成
物への選択性が得られる。この方法では、塩基として一
般式、P(R1R2R3)(ここに、Pは燐原子を示し、R1、
R2、R3はそれぞれアルキル基、アリール基、シクロアル
キル基、アルコキシ基、アリールオキシ基またはシクロ
アルコキシ基を示す)で表わされる化合物の少なくとも
一種以上と、pKaが3〜11の含窒素化合物との組合せが
好ましく用いられる。これらpKaが3〜11の含窒素化合
物の中でも、ピリジン化合物、キノリン化合物、イミダ
ゾール化合物、トリアゾール化合物及びモルフォリン化
合物等が反応成績等の面から特に好ましく用いられる。
しかし、詳細な研究の結果、これらの化合物はいずれも
反応性に富む化合物であるために1月以上の長時間にわ
たる使用に際しその一部が変質し、触媒活性が徐々に低
下していくことがわかった。この触媒活性は、これらの
塩基を補給してやればほぼ一定値に保つことは可能であ
るが、これらの化合物の補給は製造コストの増加につな
がる。又、これらの化合物が反応系内において変質した
結果生成する化合物は、構造式は不詳であるが、かなり
沸点が高く、通常の操作では触媒成分を含む反応器内の
液から分離することが難しい為に更に長時間にわたる反
応を継続するのに支障をきたすという問題点をも有して
いる。The inventors of the present invention have disclosed, as an improvement method for these, in JP-A-61-12.
6046, JP-A-62-10038, JP-A-62-22738 and JP-A-62-96444, vinyl chloride, carbon monoxide and hydrogen in the presence of a rhodium compound, a base and water. Have found a way to react to. According to this method, the reaction proceeds at a lower temperature and a lower pressure and sufficient selectivity to the desired product is obtained, as compared with the conventional method using a cobalt carbonyl catalyst. In this method, the base is represented by the general formula P (R 1 R 2 R 3 ) (wherein P represents a phosphorus atom, R 1
R 2 and R 3 each represent an alkyl group, an aryl group, a cycloalkyl group, an alkoxy group, an aryloxy group or a cycloalkoxy group), and a nitrogen-containing compound having a pKa of 3 to 11 Is preferably used. Among these nitrogen-containing compounds having a pKa of 3 to 11, pyridine compounds, quinoline compounds, imidazole compounds, triazole compounds, morpholine compounds and the like are particularly preferably used from the viewpoint of reaction results and the like.
However, as a result of detailed research, since all of these compounds are highly reactive compounds, some of them are deteriorated when used for a long time of one month or more, and the catalytic activity gradually decreases. all right. This catalytic activity can be maintained at a substantially constant value by supplementing these bases, but supplementing these compounds leads to an increase in production cost. The structural formulas of the compounds formed as a result of degeneration of these compounds in the reaction system are unknown, but the boiling points are considerably high, and it is difficult to separate them from the liquid in the reactor containing the catalyst component by normal operation. Therefore, it also has a problem that it hinders the reaction from continuing for a longer time.
本発明の課題は従来技術のこのような問題点を解決し
た2−クロロプロピオンアルデヒドの製造方法を提供す
ることである。An object of the present invention is to provide a method for producing 2-chloropropionaldehyde, which solves the above problems of the prior art.
(問題点を解決するための手段および作用) 本発明者等は、これらの課題解決のため詳細な研究を
行った。その結果、塩化ビニル、一酸化炭素および水素
とを、ロジウム化合物及び塩基の存在下に反応させて2
−クロロプロピオンアルデヒドを製造するにあたり、塩
基として三価の有機燐化合物又は三価の有機燐化合物の
オキサイドを用い、反応をpKaが0.5〜5の範囲にある酸
の存在下で行えば効率良く反応が進行する上に先に述べ
たような問題点が解決されることを見い出し本発明を完
成するに至った。(Means and Actions for Solving Problems) The present inventors have conducted detailed research for solving these problems. As a result, vinyl chloride, carbon monoxide and hydrogen are reacted in the presence of a rhodium compound and a base to give 2
-In the production of chloropropionaldehyde, a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound is used as a base, and the reaction is efficiently performed in the presence of an acid having a pKa in the range of 0.5 to 5. The present invention has been completed by finding that the problems described above are solved in addition to the progress of the above.
即ち、本発明は、ロジウム化合物及び三価の有機燐化
合物または三価の有機燐化合物のオキサイドの存在下
に、塩化ビニル、一酸化炭素および水素を反応させて2
−クロロプロピオンアルデヒドを製造するにあたり、反
応をpKaが0.5〜5の範囲にある酸の少なくとも一種の共
存下で行うことを特徴とする2−クロロプロピオンアル
デヒドの製造方法である。That is, according to the present invention, vinyl chloride, carbon monoxide and hydrogen are reacted in the presence of a rhodium compound and a trivalent organophosphorus compound or an oxide of a trivalent organophosphorus compound to react with 2
-A method for producing 2-chloropropionaldehyde, characterized in that in producing chloropropionaldehyde, the reaction is carried out in the presence of at least one acid having a pKa in the range of 0.5 to 5.
本発明の方法において用いるpKaが0.5〜5の酸として
は各種の有機酸や無機の酸が挙げられる。このような酸
を用いることによって前記ロジウム及び塩基よりなる触
媒は高活性を示す上に、且つ、2−クロロプロピオンア
ルデヒドの長時間にわたる製造を継続した際にも反応系
内にはこれらの酸に由来する高沸物の蓄積は見られず、
長時間にわたる安定した操業が可能となる。同時に、触
媒液の再生等の回数も減らすことができるので触媒とし
て用いている高価なロジウムの損失も軽減させることが
できる。本発明の方法においてはこのような酸としては
カルボン酸が好ましく用いられる。カルボン酸の例とし
ては、具体的には蟻酸、酢酸、プロピオン酸、酪酸、イ
ソ酪酸、ヘプタン酸、アクリル酸、メタアクリル酸、ク
ロトン酸、蓚酸、マロン酸、メチルマロン酸、コハク
酸、アジピン酸、マレイン酸、フマル酸、1,2,3−プロ
パントリカルボン酸等の脂肪族飽和又は不飽和モノまた
はポリカルボン酸、及び、安息香酸、トルイル酸、o−
エチル安息香酸、2,4−ジメチル安息香酸、フタル酸、
イソフタル酸、テレフタル酸、3−メチルフタル酸、ト
リメリット酸、トリメシン酸、ピロメリット酸、ベンゼ
ンペンタカルボン酸、メリット酸等の一価または多価芳
香族カルボン酸等が挙げられる。また、これらのカルボ
ン酸のアルキル基またはアリール基にハロゲン、アミノ
基、水酸基等の置換基のついたカルボン酸類も好まし
く、これらの例としてはモノフルオロ酢酸、ジフルオロ
酢酸、トリフルオロ酢酸、モノクロロ酢酸、ジクロロ酢
酸、トリクロロ酢酸、モノブロモ酢酸、ジブロモ酢酸、
2−クロロプロピオン酸、3−クロロプロピオン酸、2,
2−ジクロロプロピオン酸等のハロゲン置換脂肪族カル
ボン酸や、o−クロロ安息香酸、m−クロロ安息香酸、
p−クロロ安息香酸、o−フルオロ安息香酸等のハロゲ
ン置換芳香族カルボン酸、グリシン、サルコシン、アラ
ニン、β−アラニン、4−アミノ酪酸、バリン、セリ
ン、アスパラギン酸、グルタミン酸等のアミノ酸、グリ
コール酸、乳酸、2−ヒドロキシ酪酸、グリセリン酸、
リンゴ酸、酒石酸、クエン酸、p−ヒドロキシ安息香
酸、サリチル酸、2,4−ジヒドロキシ安息香酸等のヒド
ロキシカルボン酸等がある。このほか、フェニル酢酸、
ピルビン酸、アニス酸、o−ニトロ安息香酸、桂皮酸等
の前記以外の置換基のついたカルボン酸も好ましい例と
して挙げられる。本発明の方法においては、これらのカ
ルボン酸の中でもハロゲン置換脂肪族カルボン酸及び一
価または多価芳香族カルボン酸が特に好ましく用いられ
る。Examples of the acid having a pKa of 0.5 to 5 used in the method of the present invention include various organic acids and inorganic acids. By using such an acid, the catalyst consisting of the rhodium and the base shows high activity, and when the production of 2-chloropropionaldehyde is continued for a long time, the acid is converted to these acids in the reaction system. No accumulation of high boiling substances derived from
It enables stable operation for a long time. At the same time, the number of times the catalyst liquid is regenerated can be reduced, so that the loss of expensive rhodium used as a catalyst can be reduced. In the method of the present invention, a carboxylic acid is preferably used as such an acid. Specific examples of the carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, heptanoic acid, acrylic acid, methacrylic acid, crotonic acid, oxalic acid, malonic acid, methylmalonic acid, succinic acid, adipic acid. , Aliphatic saturated or unsaturated mono- or polycarboxylic acids such as maleic acid, fumaric acid and 1,2,3-propanetricarboxylic acid, and benzoic acid, toluic acid, o-
Ethylbenzoic acid, 2,4-dimethylbenzoic acid, phthalic acid,
Examples thereof include mono- or polyvalent aromatic carboxylic acids such as isophthalic acid, terephthalic acid, 3-methylphthalic acid, trimellitic acid, trimesic acid, pyromellitic acid, benzenepentacarboxylic acid and meritic acid. In addition, halogens, amino groups, carboxylic acids having a substituent such as a hydroxyl group in the alkyl group or aryl group of these carboxylic acids are also preferable, and examples of these include monofluoroacetic acid, difluoroacetic acid, trifluoroacetic acid, monochloroacetic acid, Dichloroacetic acid, trichloroacetic acid, monobromoacetic acid, dibromoacetic acid,
2-chloropropionic acid, 3-chloropropionic acid, 2,
Halogen-substituted aliphatic carboxylic acids such as 2-dichloropropionic acid, o-chlorobenzoic acid, m-chlorobenzoic acid,
Halogen-substituted aromatic carboxylic acids such as p-chlorobenzoic acid and o-fluorobenzoic acid, glycine, sarcosine, alanine, β-alanine, 4-aminobutyric acid, valine, serine, aspartic acid, amino acids such as glutamic acid, glycolic acid, Lactic acid, 2-hydroxybutyric acid, glyceric acid,
Examples include hydroxycarboxylic acids such as malic acid, tartaric acid, citric acid, p-hydroxybenzoic acid, salicylic acid, and 2,4-dihydroxybenzoic acid. In addition, phenylacetic acid,
Preferable examples also include carboxylic acids having a substituent other than the above, such as pyruvic acid, anisic acid, o-nitrobenzoic acid, and cinnamic acid. Among these carboxylic acids, halogen-substituted aliphatic carboxylic acids and monovalent or polyvalent aromatic carboxylic acids are particularly preferably used in the method of the present invention.
また、本発明の方法においては、酸としてホスホン酸
類、亜ホスホン酸類、ホスフィン酸類、または亜ホスフ
ィン酸類も好ましく用いられる。これらの例としては、
メチルホスホン酸、エチルホスホン酸、フェニルホスホ
ン酸、フェニル亜ホスホン酸、ジメチルホスフィン酸、
ジエチルホスフィン酸、ジフェニルホスフィン酸、ジフ
ェニル亜ホスフィン酸等が挙げられる。Further, in the method of the present invention, phosphonic acids, phosphonous acids, phosphinic acids, or phosphinic acids are preferably used as the acid. Examples of these are
Methylphosphonic acid, ethylphosphonic acid, phenylphosphonic acid, phenylphosphonous acid, dimethylphosphinic acid,
Examples thereof include diethylphosphinic acid, diphenylphosphinic acid, diphenylphosphinous acid and the like.
本発明の方法では、後述するように、反応を水の共存
下において行うことが特に好ましく行われる。この時に
は、前記の酸はエステルや、酸クロリドまたは酸無水物
等、水の共存下においてこれらの酸を生成せしめる前駆
体の形で供給することも本発明の方法の好ましい例とし
て挙げられる。例えば、酢酸エチル、安息香酸メチル、
フタル酸ジブチル、フェニルホスホン酸ジエチル、フェ
ニル亜ホスホン酸ジエチル等のエステル類、アセチルク
ロリド、安息香酸クロリド、ジフェニル亜ホスフィン酸
クロリド等の酸クロリド類、及び、無水酢酸、無水マレ
イン酸、無水フタル酸等の酸無水物等が例示される。In the method of the present invention, it is particularly preferable to carry out the reaction in the presence of water, as will be described later. At this time, it is also mentioned as a preferable example of the method of the present invention that the above-mentioned acid is supplied in the form of a precursor such as an ester, an acid chloride or an acid anhydride, which produces these acids in the presence of water. For example, ethyl acetate, methyl benzoate,
Esters such as dibutyl phthalate, diethyl phenylphosphonate, diethyl phenylphosphonite, acid chlorides such as acetyl chloride, benzoic acid chloride, diphenylphosphinic acid chloride, and acetic anhydride, maleic anhydride, phthalic anhydride, etc. The acid anhydride and the like are exemplified.
一方、本発明の方法において好ましく用いられる三価
の有機燐化合物または三価の有機燐化合物のオキサイド
は次のように例示される。On the other hand, trivalent organic phosphorus compounds or oxides of trivalent organic phosphorus compounds preferably used in the method of the present invention are exemplified as follows.
即ち、三価の有機燐化合物としては、一般式P(R1R2
R3)(ここにPは燐原子を示し、R1、R2、3はそれぞれ
同一もしくは異種のアルキル、アリール、シクロアルキ
ル、アルコキシ、アリールオキシまたはシクロアルコキ
シ基を示す)で表わされる三価の有機燐化合物が挙げら
れ、具体的には、トリメチルホスフィン、トリエチルホ
スフィン、トリプロピルホスフィン、トリブチルホスフ
ィン、トリオクチルホスフィン、トリフェニルホスフィ
ン、トリシクロヘキシルホスフィン、トリベンジルホス
フィンなどのホスフィン類や、トリメチルホスファイ
ト、トリエチルホスファイト、トリプロピルホスファイ
ト、トリブチルホスファイト、トリオクチルホスファイ
ト、トリフェニルホスファイト、トリシクロヘキシルホ
スファイト、トリベンジルホスファイトなどのホスファ
イト類があげられる。That is, as the trivalent organic phosphorus compound, a compound represented by the general formula P (R 1 R 2
R 3 ) (wherein P represents a phosphorus atom, and R 1 , R 2 and 3 each represent the same or different alkyl, aryl, cycloalkyl, alkoxy, aryloxy or cycloalkoxy group) Specific examples of the organic phosphorus compound include phosphines such as trimethylphosphine, triethylphosphine, tripropylphosphine, tributylphosphine, trioctylphosphine, triphenylphosphine, tricyclohexylphosphine, and tribenzylphosphine, and trimethylphosphite. Examples of phosphites such as triethyl phosphite, tripropyl phosphite, tributyl phosphite, trioctyl phosphite, triphenyl phosphite, tricyclohexyl phosphite, and tribenzyl phosphite. You.
また、ホスフィン類の特殊なものとして、上記一般式
P(R1R2R3)で表わされるもののほかに、ビスジフェニ
ルホスフィノメタン、ビスジフェニルホスフィノエタン
などのジホスフィン類や、架橋ポリスチレンに結合した
ホスフィン類等も好ましく用いられる。In addition to the compounds represented by the above general formula P (R 1 R 2 R 3 ) as special phosphines, they are bonded to diphosphines such as bisdiphenylphosphinomethane and bisdiphenylphosphinoethane and crosslinked polystyrene. Phosphines and the like are also preferably used.
また、三価の有機燐化合物のオキサイドとしてはトリ
エチルホスフィンオキサイド、トリブチルホスフィンオ
キサイド、トリオクチルホスフィンオキサイド等のアル
キルホスフィンオキサイド、トリフェニルホスフィンオ
キサイド、トリトリルホスフィンオキサイド等のアリー
ルホスフィンオキサイド、もしくはアルキル基とアリー
ル基とを合わせもつアルキルアリールホスフィンオキサ
イド等が例示される。またこのほか、トリエチルホスフ
ァイトオキサイド、トリブチルホスファイトオキサイ
ド、トリフェニルホスファイトオキサイド等のアルキル
もしくはアリールホスファイトオキサイド類や、アルキ
ル基とアリール基とを合わせもつアルキルアリールホス
ファイトオキサイド類等も用いることができる。さらに
は、ビス−1,2−ジフェニルホスフィノメタンジオキサ
イドなどの多座ホスフィンのオキサイド等も用いること
ができる。Further, as an oxide of a trivalent organic phosphorus compound, an alkylphosphine oxide such as triethylphosphine oxide, tributylphosphine oxide or trioctylphosphine oxide, an arylphosphine oxide such as triphenylphosphine oxide or tritolylphosphine oxide, or an alkyl group and an aryl Examples thereof include alkylarylphosphine oxide having a group. In addition to these, alkyl or aryl phosphite oxides such as triethyl phosphite oxide, tributyl phosphite oxide, and triphenyl phosphite oxide, and alkylaryl phosphite oxides having an alkyl group and an aryl group together can also be used. it can. Furthermore, oxides of polydentate phosphines such as bis-1,2-diphenylphosphinomethanedioxide can also be used.
本発明の方法において用いられるロジウム化合物とし
ては、ロジウムの酸化物、鉱酸塩、有機酸塩またはロジ
ウム錯化合物などがある。これらの各種ロジウム化合物
の中でも、特にハロゲンを含まないロジウム化合物が好
ましい。これらの例としては酸化ロジウム、硝酸ロジウ
ム、硫酸ロジウム、酢酸ロジウム、トリアセチルアセト
ナートロジウム、ジカルボニルアセチルアセトナートロ
ジウム、ドデカカルボニルテトラロジウム、ヘキサデカ
カルボニルヘキサロジウム等が挙げられ、また、ロジウ
ム錯化合物としてはこれらのほかに、ロジウムと塩基と
で錯化合物を形成したものも更に好ましく用いられる。
該塩基としては、本発明の方法において好ましく用いら
れる三価の有機燐化合物又は三価の有機燐化合物のオキ
サイド等の塩基であっても良いが、他の塩基でも良い。
これらの例としては、例えば、ヒドリドカルボニルトリ
ストリフェニルホスフィンロジウム〔RhH(CO)(PP
h3)3〕、ニトロシルトリストリフェニルホスフィンロ
ジウム〔Rh(NO)(PPh3)3〕、η−シクロペンタジエ
ニルビストリフェニルホスフィンロジウム〔Rh(C5H5)
(PPh3)2〕等が挙げられる。又、塩化ロジウム、臭化
ロジウム、沃化ロジウムまたはジクロロテトラカルボニ
ルジロジウム等のハロゲン含有ロジウム化合物を用い、
反応系内にこれらのハロゲン原子に対し当量以上のアル
カリ性化合物、例えば、水酸化ナトリウム、水酸化カリ
ウム、炭酸カリウム、トリメチルアミン、トリエチルア
ミン等を加えることも、ハロゲンを含有しないロジウム
化合物を反応系内において生成させる手段として用いる
ことができる。Examples of the rhodium compound used in the method of the present invention include rhodium oxide, mineral acid salt, organic acid salt, and rhodium complex compound. Among these various rhodium compounds, a halogen-free rhodium compound is particularly preferable. Examples of these include rhodium oxide, rhodium nitrate, rhodium sulfate, rhodium acetate, triacetylacetonato rhodium, dicarbonyl acetylacetonato rhodium, dodecacarbonyl tetrarhodium, hexadecacarbonyl hexarhodium, and the like, and rhodium complex compounds. In addition to these, those in which a complex compound is formed with rhodium and a base are more preferably used.
The base may be a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound which is preferably used in the method of the present invention, or may be another base.
Examples of these include hydridocarbonyltristriphenylphosphine rhodium [RhH (CO) (PP
h 3) 3], nitro silt list Li triphenylphosphine rhodium [Rh (NO) (PPh 3) 3 ], .eta. cyclopentadienyl bis triphenylphosphine rhodium [Rh (C 5 H 5)
(PPh 3 ) 2 ] and the like. Further, using a halogen-containing rhodium compound such as rhodium chloride, rhodium bromide, rhodium iodide or dichlorotetracarbonyl dirhodium,
It is also possible to add halogen compounds containing no halogen to the reaction system in an amount equal to or more than the amount of an alkaline compound such as sodium hydroxide, potassium hydroxide, potassium carbonate, trimethylamine or triethylamine. It can be used as a means.
本発明の方法では、前記ロジウム化合物は、反応系内
の液相1リットルあたりロジウム原子として、0.0001〜
1000ミリグラム原子、好ましくは0.001〜100ミリグラム
原子の範囲に相当する量で使用される。又、本発明の方
法で使用される三価の有機燐化合物又は三価の有機燐化
合物のオキサイド及びpKaが0.5〜5の範囲にある酸は、
それぞれロジウム1グラム原子に対し0.1〜500モル、好
ましくは0.5〜100モルの範囲で使用される。In the method of the present invention, the rhodium compound has a rhodium atom content of 0.0001 to 1 per liter of liquid phase in the reaction system.
It is used in an amount corresponding to 1000 milligram atoms, preferably in the range of 0.001 to 100 milligram atoms. Further, the trivalent organic phosphorus compound used in the method of the present invention or the oxide of the trivalent organic phosphorus compound and the acid having a pKa in the range of 0.5 to 5 are:
Each is used in an amount of 0.1 to 500 mol, preferably 0.5 to 100 mol, per 1 gram atom of rhodium.
本発明の方法においては、反応溶媒を用いなくとも反
応は進行するが、通常は反応溶媒の存在下に反応を行わ
せる。反応溶媒としては、反応に悪影響を及ぼさないも
のであればいずれも用いることが可能である。このよう
な溶媒として特に好ましいのは炭化水素類である。より
具体的には、ヘキサン、ヘプタン、オクタン、ノナン、
デカン等の飽和炭化水素や、ベンゼン、トルエン、キシ
レン等の芳香族炭化水素などが好ましく用いられ、ま
た、炭化水素類の混合物として工業的に得られるリグロ
イン、ケロシン、軽油、ディーゼル油等もこれらの例に
含まれる。このほか、ジプロピルエーテル、ジブチルエ
ーテルなどのエーテル類、ジイソブチルケトン、ホロン
などのケトン類、酪酸ブチル、安息香酸ブチルなどのエ
ステル類なども好ましい溶媒の例として挙げられる。In the method of the present invention, the reaction proceeds without using a reaction solvent, but the reaction is usually performed in the presence of the reaction solvent. Any reaction solvent can be used as long as it does not adversely affect the reaction. Hydrocarbons are particularly preferable as such a solvent. More specifically, hexane, heptane, octane, nonane,
Saturated hydrocarbons such as decane and aromatic hydrocarbons such as benzene, toluene and xylene are preferably used, and ligroin, kerosene, gas oil, diesel oil and the like which are industrially obtained as a mixture of hydrocarbons are also used. Included in the example. In addition to these, ethers such as dipropyl ether and dibutyl ether, ketones such as diisobutyl ketone and holone, and esters such as butyl butyrate and butyl benzoate are also exemplified as preferable solvents.
本発明の方法においては、反応系内に水を共存させる
方法が更に好ましく行われる。このような方法をとるこ
とにより触媒活性は更に向上する。本発明の方法におい
て反応時に存在させる水の量については特に制限はない
が、極端に少量の場合にはその効果は小さくなり、ま
た、極端に多量用いても反応成績はある程度以上は上が
らない。通常、水の量は原料として反応器へ供給する塩
化ビニルに対して重量比で0.01以上、1000以下の範囲が
好ましい。特に、0.1〜100の範囲が更に好ましく用いら
れる。又、本発明の方法において用いるpKaが0.5〜5の
範囲にある酸が水溶性の場合には、これらの酸を水溶液
の形で反応系内へ導入したり反応系から取り出したりす
る方法が反応操作を簡易にするために好ましく用いられ
る。In the method of the present invention, a method in which water coexists in the reaction system is more preferably carried out. By taking such a method, the catalytic activity is further improved. In the method of the present invention, the amount of water to be present during the reaction is not particularly limited, but when the amount is extremely small, the effect is small, and even when the amount is extremely large, the reaction result does not increase to some extent. Usually, the amount of water is preferably 0.01 or more and 1000 or less in weight ratio with respect to vinyl chloride supplied to the reactor as a raw material. Particularly, the range of 0.1 to 100 is more preferably used. When the acid having a pKa of 0.5 to 5 used in the method of the present invention is water-soluble, a method of introducing these acids into the reaction system in the form of an aqueous solution or removing them from the reaction system is used. It is preferably used to simplify the operation.
本発明の方法は、通常、反応温度10〜150℃、反応圧
力10〜300Kg/cm2ゲージの範囲、好ましくは30〜150Kg/c
m2ゲージの範囲で行われる。反応温度は生成する2−ク
ロロプロピオンアルデヒドの熱安定性の面から低温ほど
好ましく、このため、20〜80℃が特に好ましい温度範囲
である。また、原料の一酸化炭素および水素の混合モル
比は、通常、10〜0.1の範囲であり、好ましくは4〜0.2
の範囲である。一酸化炭素および水素は前記の組成比で
両成分を含有する混合ガスであればよく、水性ガスや、
水性ガスにメタン、窒素などの反応に不活性なガス、ま
たは二酸化炭素などが含有されたものが用いられる。も
う一方の原料である塩化ビニルは、ガス状、液状、ある
いは反応に用いる溶媒に溶解した溶液の形で使用され
る。本発明の方法は、回分法、半回分法、連続法のいず
れの方法によっても実施できる。例えば、回分法の場合
の例としては、ロジウム化合物、三価の有機燐化合物ま
たは三価の有機燐化合物のオキサイド及びpKaが0.5〜5
の範囲にある酸および必要に応じて反応溶媒および水を
仕込んだオートクレーブに、塩化ビニルをガス、液、あ
るいは溶液状で加え、これに一酸化炭素および水素を含
有するガスを所定の圧力まで導入し、好ましくは攪拌下
で加温することにより反応は進行する。また、連続法の
場合の例としては、ロジウム化合物、三価の有機燐化合
物または三価の有機燐化合物のオキサイドおよびpKaが
0.5〜5の範囲にある酸および必要に応じて反応溶媒お
よび水と、原料の塩化ビニル、一酸化炭素および水素と
を、耐圧の反応器の一方に連続的に供給し、反応温度
下、攪拌条件下に、他方から反応混合物と、未反応塩化
ビニル、一酸化炭素および水素とを連続的に抜出すこと
により反応が行われる。The method of the present invention is usually carried out at a reaction temperature of 10 to 150 ° C. and a reaction pressure of 10 to 300 Kg / cm 2 gage, preferably 30 to 150 Kg / c.
It is done in the m 2 gauge range. The reaction temperature is preferably as low as possible from the viewpoint of the thermal stability of the produced 2-chloropropionaldehyde, and for this reason, 20-80 ° C is a particularly preferred temperature range. The mixing molar ratio of carbon monoxide and hydrogen of the raw materials is usually in the range of 10 to 0.1, preferably 4 to 0.2.
Range. Carbon monoxide and hydrogen may be mixed gas containing both components in the above composition ratio, water gas,
A water gas containing methane, a gas inert to the reaction such as nitrogen, or carbon dioxide is used. The other raw material, vinyl chloride, is used in the form of gas, liquid, or solution dissolved in the solvent used for the reaction. The method of the present invention can be carried out by any of a batch method, a semi-batch method and a continuous method. For example, in the case of the batch method, the rhodium compound, the trivalent organic phosphorus compound or the oxide and pKa of the trivalent organic phosphorus compound are 0.5 to 5
To the autoclave charged with the acid in the range of 1 and the reaction solvent and water as required, add vinyl chloride in the form of gas, liquid or solution, and introduce the gas containing carbon monoxide and hydrogen up to the specified pressure. However, the reaction proceeds preferably by heating with stirring. Examples of the continuous method include rhodium compounds, trivalent organic phosphorus compounds or oxides and pKa of trivalent organic phosphorus compounds.
An acid in the range of 0.5 to 5 and optionally a reaction solvent and water, and raw materials vinyl chloride, carbon monoxide and hydrogen are continuously supplied to one of the pressure resistant reactors and stirred at a reaction temperature. The reaction is carried out under the conditions by continuously withdrawing the reaction mixture from the other and unreacted vinyl chloride, carbon monoxide and hydrogen.
(実施例) 以下、実施例により本発明の方法を更に具体的に説明
する。(Examples) Hereinafter, the method of the present invention will be described more specifically with reference to Examples.
実施例1 攪拌装置を備えた内容積100mlのステンレス製オート
クレーブの内部を窒素ガスで置換した後、ヘキサデカカ
ルボニルヘキサロジウム36mg(Rh0.2ミリグラム原子)
とトリフェニルホスフィン208mg(0.8ミリモル)、ジク
ロロ酢酸194mg(1.5ミリモル)および水20gを入れ、こ
れに塩化ビニル1.88g(30ミリモル)を含む塩化ビニル
のトルエン溶液20mlを加えた。このオートクレーブに、
一酸化炭素および水素のモル比が1:2の混合ガスを室温
で圧力が80Kg/cm2ゲージになるまで圧入した後に55℃ま
で昇温し、40分間反応させた。オートクレーブを室温ま
で冷却してから未反応の原料混合ガスをガスサンプリン
グ用袋に捕集した後オートクレーブを開け、触媒、溶媒
及び反応生成物を含む反応混合液を取り出した。ガスお
よび液をガスクロマトグラフィーで定量した結果、塩化
ビニルの転化率は32.4%、2−クロロプロピオンアルデ
ヒドの生成量は8.8ミリモル(転化した塩化ビニル基準
の選択率は90.5%)であった。Example 1 After replacing the inside of a stainless steel autoclave with an internal volume of 100 ml equipped with a stirrer with nitrogen gas, 36 mg of hexadecacarbonylhexarodium (Rh 0.2 mg atom)
Then, 208 mg (0.8 mmol) of triphenylphosphine, 194 mg (1.5 mmol) of dichloroacetic acid and 20 g of water were added, and 20 ml of a toluene solution of vinyl chloride containing 1.88 g (30 mmol) of vinyl chloride was added thereto. In this autoclave,
A mixed gas of carbon monoxide and hydrogen in a molar ratio of 1: 2 was injected at room temperature until the pressure reached 80 kg / cm 2 gauge, then the temperature was raised to 55 ° C., and the reaction was carried out for 40 minutes. After cooling the autoclave to room temperature, the unreacted raw material mixed gas was collected in a gas sampling bag, the autoclave was opened, and the reaction mixed solution containing the catalyst, the solvent and the reaction product was taken out. As a result of quantifying the gas and the liquid by gas chromatography, the conversion rate of vinyl chloride was 32.4%, and the production amount of 2-chloropropionaldehyde was 8.8 mmol (selectivity based on the converted vinyl chloride was 90.5%).
実施例2〜5 実施例1の方法において反応温度、反応圧力、一酸化
炭素と水素のモル比および反応時間を変えて反応を行わ
せた。結果を表1に示す。Examples 2 to 5 The reaction was carried out by changing the reaction temperature, the reaction pressure, the molar ratio of carbon monoxide and hydrogen, and the reaction time in the method of Example 1. The results are shown in Table 1.
実施例6〜9 実施例1の方法において、ロジウム化合物、塩基およ
び酸の種類を変えて反応を行わせた。ロジウム化合物の
量は、いずれもロジウムが0.2ミリグラム原子となるよ
うな量とした。結果を表2に示す。 Examples 6 to 9 In the method of Example 1, the types of rhodium compound, base and acid were changed to carry out the reaction. The amount of the rhodium compound was set so that rhodium would be 0.2 mg atom. Table 2 shows the results.
実施例10〜13 実施例1の方法において、ジクロロ酢酸の代わりに各
種の酸または酸の前駆体を用いて反応を行った。結果を
表3に示す。 Examples 10 to 13 In the method of Example 1, the reaction was carried out using various acids or acid precursors instead of dichloroacetic acid. The results are shown in Table 3.
実施例14 実施例1において、水の不存在以外は同じ方法で反応
を行わせた。 Example 14 The reaction was performed in the same manner as in Example 1 except that water was not used.
分析の結果、塩化ビニルの転化率9.8%、2−クロロ
プロピオンアルデヒド選択率89.1%の反応成績を得た。As a result of the analysis, a reaction result was obtained in which the conversion of vinyl chloride was 9.8% and the selectivity of 2-chloropropionaldehyde was 89.1%.
実施例15 7段の翼の攪拌機および温水ジャケットを備えた耐圧
200Kg/cm2ゲージの反応器(SUS 316製、内径30mm、高さ
450mm、実容積約300cm3)を、温度50℃、圧力80Kg/cm2
ゲージに保ち、該反応器の下部に設けた導入管から、ロ
ジウム触媒液(1あたり、ヒドリドカルボニルトリス
トリフェニルホスフィンロジウム20mmol、トリフェニル
ホスフィン40mmol、2−クロロプロピオンアルデヒド4.
8gおよびジクロロ酢酸15mmolを含有する、トルエン溶
液)800cm3/時、ジクロロ酢酸水溶液(1あたりジク
ロロ酢酸1molを含有)900ml/時、塩化ビニル2.2mol/
時、およびモル比1:2の、一酸化炭素および水素の混合
ガス320/時を連続的に供給し、同時に、反応器上部
に設けた取り出し管から、水層と有機層とを含む反応混
合液と、未反応の塩化ビニル、一酸化炭素および水素と
を、35℃で反応器と同じ圧力で操作されている気液分離
器に連続的に取り出した。該気液分離器において、未反
応の塩化ビニルの大部分と未反応の一酸化炭素及び水素
が該気液分離器の上部に設けたガス取り出し口から取り
出され、圧力調節弁を経て大気圧に保たれた未反応ガス
ホルダーに送られた。一方、反応混合液は該気液分離器
の下部に設けた液取り出し口から取り出され、液面調節
弁を経て大気圧で操作されている静置分離槽に送られ
た。ここで、反応混合液は上層の有機層(トルエン層)
と下層の水層とに分けられた。この有機層の中には22g
の2−クロロプロピオンアルデヒドが含有されており、
これを水で洗滌することにより2−クロロプロピオンア
ルデヒドの含有量を4.8gまで下げた。この液は、先に述
べたロジウム触媒液と実質的に同一組成であり、反応器
へ供給するロジウム触媒液に混合して再使用に供した。
一方、水層を回分蒸留にかけて2−クロロプロピオンア
ルデヒドを分離するとともに、ジクロロ酢酸は回収して
再使用に供した。この様な方法で96時間にわたって連続
運転を行った。2−クロロプロピオンアルデヒドの1時
間あたりの生成量は運転開始後約6時間目当りから約±
5%程度の範囲内でほぼ一定となり,その後96時間目ま
でほぼ一定の値を保った。反応開始後、80時間目から84
時間目までの4時間の平均では、1時間当り約85gの2
−クロロプロピオンアルデヒドが生成していることが水
層のガスクロマトグラフによる分析からわかった。Example 15 Pressure resistance with 7-stage impeller and hot water jacket
200Kg / cm 2 gauge reactor (made of SUS 316, inner diameter 30mm, height
450mm, actual volume about 300cm 3 ), temperature 50 ℃, pressure 80Kg / cm 2
A rhodium catalyst solution (20 mmol of hydridocarbonyltristriphenylphosphine rhodium, 40 mmol of triphenylphosphine, 40 mmol of 2-phenylpropionaldehyde, 4.
Toluene solution containing 8 g and 15 mmol of dichloroacetic acid) 800 cm 3 / hour, dichloroacetic acid aqueous solution (containing 1 mol of dichloroacetic acid per 1) 900 ml / hour, vinyl chloride 2.2 mol / hour
Hourly, and a mixed gas of carbon monoxide and hydrogen at a molar ratio of 1: 2, 320 / hour, is continuously supplied, and at the same time, a reaction mixture including an aqueous layer and an organic layer is obtained from a take-out pipe provided at the upper part of the reactor. The liquid and unreacted vinyl chloride, carbon monoxide and hydrogen were continuously withdrawn to a gas-liquid separator operating at 35 ° C. and at the same pressure as the reactor. In the gas-liquid separator, most of unreacted vinyl chloride and unreacted carbon monoxide and hydrogen are taken out from a gas outlet provided in the upper part of the gas-liquid separator, and are brought to atmospheric pressure through a pressure control valve. It was sent to the retained unreacted gas holder. On the other hand, the reaction liquid mixture was taken out from a liquid outlet provided in the lower part of the gas-liquid separator and sent to a stationary separation tank operated at atmospheric pressure via a liquid level control valve. Here, the reaction mixture is the upper organic layer (toluene layer)
And the lower water layer. 22g in this organic layer
Contains 2-chloropropionaldehyde,
By washing this with water, the content of 2-chloropropionaldehyde was lowered to 4.8 g. This liquid had substantially the same composition as the rhodium catalyst liquid described above, and was mixed with the rhodium catalyst liquid supplied to the reactor and reused.
On the other hand, the aqueous layer was subjected to batch distillation to separate 2-chloropropionaldehyde, and dichloroacetic acid was recovered and reused. In this way, continuous operation was carried out for 96 hours. The amount of 2-chloropropionaldehyde produced per hour is about ± 6 hours after the start of operation.
It became almost constant within the range of about 5%, and remained almost constant until 96 hours thereafter. 84 hours from the 80th hour after the reaction started
By the average of 4 hours until the hour, about 85g per hour 2
It was found from gas chromatographic analysis of the aqueous layer that chloropropionaldehyde had been produced.
この連続反応の開始直後及び96時間後にトルエン層の
一部を取り出し、ガスクロマトグラフによって高沸点成
分の蓄積の有無を調べた。ガスクロマトグラフにはSE−
30を充填した1mのガラスカラムを用いた。カラム温度は
180℃(恒温)とし、キャリアーガスとして窒素を用
い、検出器としてFID検出器を用いた。分析の結果、該
トルエン層中にはガスクロマトグラフの検出範囲内で高
沸点成分の蓄積は認められなかった。Immediately after the start of this continuous reaction and 96 hours later, a part of the toluene layer was taken out, and it was examined by gas chromatography whether or not high boiling point components were accumulated. SE-for gas chromatograph
A 1 m glass column packed with 30 was used. Column temperature is
The temperature was set to 180 ° C. (constant temperature), nitrogen was used as a carrier gas, and a FID detector was used as a detector. As a result of the analysis, accumulation of high boiling point components was not observed in the toluene layer within the detection range of the gas chromatograph.
比較例1 実施例15の方法において、ジクロロ酢酸のかわりに同
じモル数のイミダゾールを用いて実験を行った。反応開
始後約72時間あたりから若干の活性低下が見られたので
イミダゾールを水1あたり約15g補給したところ、活
性はほぼ同じレベルまで回復した。しかし、96時間後の
トルエン層のガスクロマトグラフによる分析では、実施
例11において認められなかった高沸点成分が検出され
た。この成分はガスクロマトグラフによる分析から沸点
はおおよそ350℃程度と推定された。更に、この成分に
ついてガスクロマトグラフ−質量分析計で調べたとこ
ろ、構造は不詳であるが窒素を含有する化合物で、分子
量は349であることがわかった。この化合物は該トルエ
ン層からは蒸留では留出させることができない為に、触
媒を新触媒と同じ組成に戻すには、例えば、トルエン層
を燃やしてから王水で処理してロジウムを回収し、これ
を一旦塩化ロジウムの形とした後にロジウムカルボニル
に転化後、ホスフィン等の他の触媒成分を添加する等の
手段を必要とした。Comparative Example 1 In the method of Example 15, an experiment was conducted using the same number of moles of imidazole instead of dichloroacetic acid. Since a slight decrease in activity was observed from about 72 hours after the start of the reaction, about 15 g of imidazole was replenished per water, and the activity was recovered to almost the same level. However, in the analysis of the toluene layer after 96 hours by the gas chromatography, a high boiling point component which was not observed in Example 11 was detected. The boiling point of this component was estimated to be approximately 350 ° C from analysis by gas chromatography. Furthermore, when this component was examined by a gas chromatograph-mass spectrometer, it was found that it was a compound containing nitrogen although its structure was unknown and its molecular weight was 349. Since this compound cannot be distilled from the toluene layer by distillation, in order to return the catalyst to the same composition as the new catalyst, for example, the toluene layer is burned and then treated with aqua regia to recover rhodium, This was once converted to rhodium chloride, converted to rhodium carbonyl, and then a means such as addition of another catalyst component such as phosphine was required.
(発明の効果) 本発明の方法により、塩化ビニル、一酸化炭素および
水素を原料として、低温・低圧下において高選択率で2
−クロロプロピオンアルデヒドを製造することができ
る。特に、本発明の方法によれば、反応系内に副生物の
蓄積なしに長時間にわたって安定して高活性を維持する
ことが可能となる。又、本発明の方法によると、触媒の
再生等を頻繁に行う必要性が少なくなるために、これに
伴うロジウムの損失を軽減させることができる。(Effects of the Invention) By the method of the present invention, vinyl chloride, carbon monoxide and hydrogen are used as raw materials at a low temperature and a low pressure to achieve high selectivity.
-Chloropropionaldehyde can be produced. In particular, according to the method of the present invention, it becomes possible to stably maintain a high activity for a long time without accumulating by-products in the reaction system. Further, according to the method of the present invention, since it is less necessary to frequently regenerate the catalyst, it is possible to reduce the loss of rhodium that accompanies this.
Claims (6)
たは三価の有機燐化合物のオキサイドの存在下に、塩化
ビニル、一酸化炭素および水素を反応させて2−クロロ
プロピオンアルデヒドを製造するにあたり、反応をpKa
が0.5〜5の範囲にある酸の少なくとも一種の共存下で
行うことを特徴とする2−クロロプロピオンアルデヒド
の製造方法。1. To produce 2-chloropropionaldehyde by reacting vinyl chloride, carbon monoxide and hydrogen in the presence of a rhodium compound and a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound, PKa the reaction
The method for producing 2-chloropropionaldehyde is carried out in the coexistence of at least one acid having a ratio of 0.5 to 5.
項に記載の方法。2. The first claim in which the acid is a carboxylic acid.
The method described in the section.
ン酸、又は亜ホスフィン酸である特許請求の範囲第1項
に記載の方法。3. The method according to claim 1, wherein the acid is phosphonic acid, phosphonous acid, phosphinic acid, or phosphinic acid.
特許請求の範囲第2項に記載の方法。4. The method according to claim 2, wherein the acid is a halogen-substituted aliphatic carboxylic acid.
る特許請求の範囲第2項に記載の方法。5. The method according to claim 2, wherein the acid is a monovalent or polyvalent aromatic carboxylic acid.
1項ないし第5項に記載の方法。6. The method according to any one of claims 1 to 5, wherein the reaction is carried out in the presence of water.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62165439A JPH0813773B2 (en) | 1987-07-03 | 1987-07-03 | Method for producing 2-chloropropionaldehyde |
| US07/095,218 US4825003A (en) | 1986-09-17 | 1987-09-11 | Production process of 2-chloropropionaldehyde |
| DE8787308184T DE3773602D1 (en) | 1986-09-17 | 1987-09-16 | PRODUCTION PROCESS FOR 2-CHLORINE PROPIONALDEHYDE. |
| EP87308184A EP0260944B1 (en) | 1986-09-17 | 1987-09-16 | Production process of 2- chloropropionaldehyde |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62165439A JPH0813773B2 (en) | 1987-07-03 | 1987-07-03 | Method for producing 2-chloropropionaldehyde |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS649948A JPS649948A (en) | 1989-01-13 |
| JPH0813773B2 true JPH0813773B2 (en) | 1996-02-14 |
Family
ID=15812453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62165439A Expired - Lifetime JPH0813773B2 (en) | 1986-09-17 | 1987-07-03 | Method for producing 2-chloropropionaldehyde |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0813773B2 (en) |
-
1987
- 1987-07-03 JP JP62165439A patent/JPH0813773B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS649948A (en) | 1989-01-13 |
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