JPH081795B2 - Sputter ion pump - Google Patents
Sputter ion pumpInfo
- Publication number
- JPH081795B2 JPH081795B2 JP4112424A JP11242492A JPH081795B2 JP H081795 B2 JPH081795 B2 JP H081795B2 JP 4112424 A JP4112424 A JP 4112424A JP 11242492 A JP11242492 A JP 11242492A JP H081795 B2 JPH081795 B2 JP H081795B2
- Authority
- JP
- Japan
- Prior art keywords
- pump
- heater
- magnet
- container
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 108010083687 Ion Pumps Proteins 0.000 title claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 21
- 230000000694 effects Effects 0.000 description 5
- 102000006391 Ion Pumps Human genes 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、加熱機構を備えたスパ
ッタイオンポンプに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sputter ion pump having a heating mechanism.
【０００２】[0002]
【従来の技術】図３は、シース型ヒーターを加熱機構と
して備えた従来のスパッタイオンポンプの斜視図であ
り、その一部を破断して内部が見えるようにしたもので
ある。ポンプ素子２は、ポンプ容器４の内部に収納され
ており、ポンプ素子２に平行磁場を印加する為のマグネ
ット６は、ポンプ容器４の外部からポンプ素子２をはさ
み込む状態で取り付けられる。シース型ヒーター８はマ
グネット６の外側に巻き付けられており、場合によって
はさらにこの上からアルミ箔等の保温材を貼り付けて、
シース型ヒーター８に通電することにより、ポンプ容器
４並びにポンプ素子２の加熱を行っている。この加熱に
より、ポンプ容器４の内壁やポンプ素子２に吸着してい
るガス分子などを放出させている。2. Description of the Related Art FIG. 3 is a perspective view of a conventional sputter ion pump provided with a sheath type heater as a heating mechanism, and a part of the sputter ion pump is cut away so that the inside can be seen. The pump element 2 is housed inside the pump container 4, and a magnet 6 for applying a parallel magnetic field to the pump element 2 is attached in a state of sandwiching the pump element 2 from the outside of the pump container 4. The sheath-type heater 8 is wound around the outer side of the magnet 6, and in some cases, a heat insulating material such as aluminum foil is further attached on the sheath-type heater 8,
By energizing the sheath-type heater 8, the pump container 4 and the pump element 2 are heated. By this heating, gas molecules adsorbed on the inner wall of the pump container 4 and the pump element 2 are released.
【０００３】[0003]
【発明が解決しようとする課題】ポンプの加熱は、ポン
プの再生、到達圧力の向上、並びに超高真空、極高真空
を作る上で、必要不可欠の操作である。しかしながら、
上記従来の加熱機構ではシース型ヒーター８とポンプ容
器４との間にマグネット６があるため、このマグネット
６が熱の伝導を妨げ、ポンプ容器４並びにポンプ素子２
の効率的な加熱が行えないという問題があった。The heating of the pump is an indispensable operation for regeneration of the pump, improvement of ultimate pressure, and production of ultra-high vacuum and ultra-high vacuum. However,
In the conventional heating mechanism described above, since the magnet 6 is provided between the sheath-type heater 8 and the pump container 4, the magnet 6 impedes heat conduction, and the pump container 4 and the pump element 2 are prevented.
There was a problem that the efficient heating of could not be performed.
【０００４】さらに、スパッタイオンポンプに使用され
るマグネット６は、フェライトマグネット、希土類マグ
ネット等に代表される高出力マグネットが主であるた
め、比較的熱的影響を受けやすく、ポンプ容器４とポン
プ素子２の加熱温度を上昇させようとすると、マグネッ
ト６の減磁を引きおこしやすいという問題があった。Further, since the magnet 6 used in the sputter ion pump is mainly a high-power magnet typified by a ferrite magnet, a rare earth magnet, etc., it is relatively easily affected by heat, and the pump container 4 and the pump element are easily affected. When the heating temperature of 2 is raised, there is a problem that the magnet 6 is easily demagnetized.
【０００５】このように、従来の加熱機構では、ポンプ
容器４とポンプ素子２の加熱温度はできるだけ高くした
いが、一方で、マグネットの加熱温度はできるだけ低く
したい、という相反する条件で加熱を行わなければなら
ないという欠点があった。As described above, in the conventional heating mechanism, the heating temperature of the pump container 4 and the pump element 2 should be as high as possible, while the heating temperature of the magnet should be as low as possible. It had the drawback that it had to be.
【０００６】本発明の目的は、従来技術の問題点を解決
し、ポンプ容器並びにポンプ素子の高効率の加熱が可能
となるとともに、加熱時のマグネットの温度上昇を低減
した加熱機構を備えたスパッタイオンポンプを提供する
ことにある。An object of the present invention is to solve the problems of the prior art, to enable highly efficient heating of the pump container and the pump element, and to provide a spatter equipped with a heating mechanism that reduces the temperature rise of the magnet during heating. It is to provide an ion pump.
【０００７】[0007]
【課題を解決するための手段】前記の目的を達成するた
めに、本発明のスパッタイオンポンプは、ポンプ容器と
マグネットとの間にポンプ加熱用ヒーターを設けてい
る。ここで、ポンプ容器とは、ポンプ素子を収納する真
空容器を意味する。In order to achieve the above object, the sputter ion pump of the present invention is provided with a pump heating heater between the pump container and the magnet. Here, the pump container means a vacuum container that houses the pump element.
【０００８】また、マグネットとヒーターとの間にステ
ンレス鋼などの金属製ヒーターカバーを配置すれば、よ
り効果的である。ヒーターとしてはフレキシブルヒータ
ーを用いることができる。It is more effective to dispose a heater cover made of metal such as stainless steel between the magnet and the heater. A flexible heater can be used as the heater.
【０００９】[0009]
【作用】上記構成において、ポンプ容器とマグネットと
の間にヒーターを配置することにより、マグネットを介
することなくポンプ容器並びにポンプ素子へヒーターか
ら直接熱が伝わることになるため、高効率な加熱が可能
となる。さらに、マグネット表面がヒーターに覆われず
に常に露出した状態となるため、マグネットの放熱効果
が高くなり、加熱によるマグネットの温度上昇を最小限
に抑えることができる。In the above structure, by disposing the heater between the pump container and the magnet, the heat is directly transmitted from the heater to the pump container and the pump element without passing through the magnet, so that highly efficient heating is possible. Becomes Furthermore, since the surface of the magnet is not covered with the heater and is always exposed, the heat dissipation effect of the magnet is enhanced, and the temperature rise of the magnet due to heating can be minimized.
【００１０】また、マグネットとヒーターの間にヒータ
ーカバーを取り付けると、ヒーターの熱を遮蔽してマグ
ネットへの熱の伝わりを抑えるとともに、ヒーターの取
付けを確実なものにする作用がある。When the heater cover is attached between the magnet and the heater, the heat of the heater is shielded to prevent the heat from being transmitted to the magnet, and the heater can be attached securely.
【００１１】[0011]
【実施例】図１は、各種スパッタイオンポンプの中でも
一般的な二極型スパッタイオンポンプに本発明を適用し
た実施例であり、ポンプの一部を破断して内部が見える
ようにした斜視図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an embodiment in which the present invention is applied to a general bipolar sputter ion pump among various sputter ion pumps, and is a perspective view in which a part of the pump is cut away so that the inside can be seen. Is.
【００１２】ポンプ容器１０の内部には、ポンプ効果を
発生するためのポンプ素子１２が収納されている。ポン
プ容器１０の外側には、ポンプ素子１２を取り囲むよう
にフレキシブルヒーター１４が取付けられており、その
上からヒーターカバー１６がフレキシブルヒーター１４
を押さえ込むように取り付けられている。さらに、マグ
ネット１８はヒーターカバー１６の外側に配置されてい
る。図２は本実施例のスパッタイオンポンプの一部を示
す正面断面図であり、ヒーターカバー１６の取り付け方
法を示している。ヒーターカバー１６の下端はカバー押
さえ２０でポンプ容器１０に固定され、ヒーターカバー
１６の上端はカバー押さえ２２でポンプ容器１０に固定
されている。ヒーターカバー１６はＳＵＳ３０４または
ＳＵＳ３１６ステンレス鋼で製作される。A pump element 12 for generating a pump effect is housed inside the pump container 10. A flexible heater 14 is attached to the outside of the pump container 10 so as to surround the pump element 12, and a heater cover 16 is provided on the flexible heater 14 to cover the pump element 12.
It is attached so as to hold down. Further, the magnet 18 is arranged outside the heater cover 16. FIG. 2 is a front cross-sectional view showing a part of the sputter ion pump of this embodiment, showing a method of attaching the heater cover 16. The lower end of the heater cover 16 is fixed to the pump container 10 by a cover retainer 20, and the upper end of the heater cover 16 is fixed to the pump container 10 by a cover retainer 22. The heater cover 16 is made of SUS304 or SUS316 stainless steel.
【００１３】フレキシブルヒーター１４は、ヒーターカ
バー１６に押さえられてポンプ容器１０に密着している
ため、加熱時の熱は、ポンプ容器１０とその内部のポン
プ素子１２を直接加熱することになり、特に、ポンプ素
子１２が高効率で加熱されることになる。また、フレキ
シブルヒーター１４やヒーターカバー１６等の加熱機構
をマグネット１８の内側に配置することにより、マグネ
ット１８の表面が常に外部に露出した構造となり、その
効果としてマグネット１８の放熱効果が向上し、加熱に
よるマグネット１８の温度上昇を最小限に抑えることが
できる。Since the flexible heater 14 is pressed by the heater cover 16 and is in close contact with the pump container 10, the heat at the time of heating directly heats the pump container 10 and the pump element 12 inside thereof. Therefore, the pump element 12 is heated with high efficiency. Further, by disposing the heating mechanism such as the flexible heater 14 and the heater cover 16 inside the magnet 18, the surface of the magnet 18 is always exposed to the outside, and as a result, the heat dissipation effect of the magnet 18 is improved, and the heating is performed. It is possible to minimize the temperature rise of the magnet 18 due to.
【００１４】ヒーターカバー１６でフレキシブルヒータ
ー１４をつつみ込む効果としては、フレキシブルヒータ
ー１４の熱を遮断してマグネット１８への熱の伝わりを
抑えるとともに、フレキシブルヒーター１４の取付けを
確実なものにする効果がある。The effect of encasing the flexible heater 14 with the heater cover 16 is that the heat of the flexible heater 14 is cut off to suppress the transfer of heat to the magnet 18, and the flexible heater 14 is securely attached. is there.
【００１５】以上の実施例では、二極型イオンポンプに
本発明を適用した場合について説明したが、本発明はそ
の他のタイプのイオンポンプにも適用でき、例えば三極
型イオンポンプ、ポスト型イオンポンプ、マグネトロン
型イオンポンプなど、磁場を利用する全てのイオンポン
プに適用できる。なお、マグネットは、永久磁石に限ら
ず、電磁石を利用してもよい。また、ヒーターとして
は、フレキシブルヒーターのような柔軟性をもつヒータ
ーに限らず、固定式のプレートヒーター等を利用しても
よい。In the above embodiments, the case where the present invention is applied to the bipolar electrode pump has been described, but the present invention can also be applied to other types of ion pumps, for example, a tripolar ion pump and a post type ion pump. It can be applied to all ion pumps that use magnetic fields, such as pumps and magnetron type ion pumps. The magnet is not limited to a permanent magnet, and an electromagnet may be used. Further, the heater is not limited to a flexible heater such as a flexible heater, and a fixed plate heater or the like may be used.
【００１６】[0016]
【発明の効果】本発明は、ポンプ容器とマグネットの間
にヒーターを配置することにより、ポンプ容器並びにポ
ンプ素子への高効率の加熱が可能となるとともに、加熱
時のマグネットの放熱効果を向上させて、マグネットの
温度上昇を最小限に抑える効果がある。According to the present invention, by disposing a heater between the pump container and the magnet, it is possible to heat the pump container and the pump element with high efficiency, and improve the heat radiation effect of the magnet during heating. This has the effect of minimizing the temperature rise of the magnet.
【図１】本発明の一実施例の一部を破断して示した斜視
図である。FIG. 1 is a partially cutaway perspective view of an embodiment of the present invention.
【図２】図１のスパッタイオンポンプの一部を示す正面
断面図である。FIG. 2 is a front sectional view showing a part of the sputter ion pump of FIG.
【図３】従来のスパッタイオンポンプの一部を破断して
示した斜視図である。FIG. 3 is a perspective view showing a conventional sputter ion pump with a part thereof broken away.
【符号の説明】 １０…ポンプ容器 １２…ポンプ素子 １４…フレキシブルヒーター １６…ヒーターカバー １８…マグネット[Explanation of Codes] 10 ... Pump Container 12 ... Pump Element 14 ... Flexible Heater 16 ... Heater Cover 18 ... Magnet
Claims (1)
加熱用のフレキシブルヒーターを設け、このフレキシブ
ルヒーターをヒーターカバーで押さえることによって、
フレキシブルヒーターをポンプ容器に密着させたことを
特徴とするスパッタイオンポンプ。1. A flexible heater for heating the pump is provided between the pump container and the magnet, and the flexible heater is provided.
By pressing the heater with the heater cover,
A sputter ion pump characterized in that a flexible heater is closely attached to the pump container .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4112424A JPH081795B2 (en) | 1992-04-06 | 1992-04-06 | Sputter ion pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4112424A JPH081795B2 (en) | 1992-04-06 | 1992-04-06 | Sputter ion pump |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05290791A JPH05290791A (en) | 1993-11-05 |
| JPH081795B2 true JPH081795B2 (en) | 1996-01-10 |
Family
ID=14586300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4112424A Expired - Fee Related JPH081795B2 (en) | 1992-04-06 | 1992-04-06 | Sputter ion pump |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH081795B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4557681B2 (en) * | 2004-11-09 | 2010-10-06 | 株式会社アルバック | Sputter ion pump |
-
1992
- 1992-04-06 JP JP4112424A patent/JPH081795B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05290791A (en) | 1993-11-05 |
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